JP2000343015A - 塗布装置 - Google Patents

塗布装置

Info

Publication number
JP2000343015A
JP2000343015A JP11160912A JP16091299A JP2000343015A JP 2000343015 A JP2000343015 A JP 2000343015A JP 11160912 A JP11160912 A JP 11160912A JP 16091299 A JP16091299 A JP 16091299A JP 2000343015 A JP2000343015 A JP 2000343015A
Authority
JP
Japan
Prior art keywords
coating liquid
coating
nozzle
substrate
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP11160912A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000343015A5 (2
Inventor
Eiji Okuno
英治 奥野
Kazuto Ozaki
一人 尾崎
Kazuo Kise
一夫 木瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP11160912A priority Critical patent/JP2000343015A/ja
Publication of JP2000343015A publication Critical patent/JP2000343015A/ja
Publication of JP2000343015A5 publication Critical patent/JP2000343015A5/ja
Abandoned legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11160912A 1999-06-08 1999-06-08 塗布装置 Abandoned JP2000343015A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11160912A JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11160912A JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Publications (2)

Publication Number Publication Date
JP2000343015A true JP2000343015A (ja) 2000-12-12
JP2000343015A5 JP2000343015A5 (2) 2005-03-17

Family

ID=15725018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11160912A Abandoned JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Country Status (1)

Country Link
JP (1) JP2000343015A (2)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311327A (ja) * 2007-06-13 2008-12-25 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2009020378A (ja) * 2007-07-13 2009-01-29 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2010139876A (ja) * 2008-12-12 2010-06-24 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
WO2015141513A1 (ja) * 2014-03-19 2015-09-24 東レ株式会社 塗布装置、塗布方法、及びディスプレイ用部材の製造方法
JP2018513010A (ja) * 2015-04-21 2018-05-24 ユミコア・アクチエンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフトＵｍｉｃｏｒｅ ＡＧ ＆ Ｃｏ．ＫＧ 基材の内側表面をコーティングするための方法、デバイス及び装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008311327A (ja) * 2007-06-13 2008-12-25 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2009020378A (ja) * 2007-07-13 2009-01-29 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
TWI402614B (zh) * 2007-07-13 2013-07-21 Ｈｏｙａ股份有限公司 空白光罩之製造方法及光罩之製造方法
JP2010139876A (ja) * 2008-12-12 2010-06-24 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
WO2015141513A1 (ja) * 2014-03-19 2015-09-24 東レ株式会社 塗布装置、塗布方法、及びディスプレイ用部材の製造方法
JP2018513010A (ja) * 2015-04-21 2018-05-24 ユミコア・アクチエンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフトＵｍｉｃｏｒｅ ＡＧ ＆ Ｃｏ．ＫＧ 基材の内側表面をコーティングするための方法、デバイス及び装置
US10569296B2 (en) 2015-04-21 2020-02-25 Umicore Ag & Co. Kg Method, device and apparatus for coating an inner surface of a substrate

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