JP2000343015A5 - - Google Patents

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Publication number
JP2000343015A5
JP2000343015A5 JP1999160912A JP16091299A JP2000343015A5 JP 2000343015 A5 JP2000343015 A5 JP 2000343015A5 JP 1999160912 A JP1999160912 A JP 1999160912A JP 16091299 A JP16091299 A JP 16091299A JP 2000343015 A5 JP2000343015 A5 JP 2000343015A5
Authority
JP
Japan
Prior art keywords
coating
coating liquid
nozzle means
nozzle
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP1999160912A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000343015A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11160912A priority Critical patent/JP2000343015A/ja
Priority claimed from JP11160912A external-priority patent/JP2000343015A/ja
Publication of JP2000343015A publication Critical patent/JP2000343015A/ja
Publication of JP2000343015A5 publication Critical patent/JP2000343015A5/ja
Abandoned legal-status Critical Current

Links

JP11160912A 1999-06-08 1999-06-08 塗布装置 Abandoned JP2000343015A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11160912A JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11160912A JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Publications (2)

Publication Number Publication Date
JP2000343015A JP2000343015A (ja) 2000-12-12
JP2000343015A5 true JP2000343015A5 (2) 2005-03-17

Family

ID=15725018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11160912A Abandoned JP2000343015A (ja) 1999-06-08 1999-06-08 塗布装置

Country Status (1)

Country Link
JP (1) JP2000343015A (2)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5073375B2 (ja) * 2007-06-13 2012-11-14 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP5185096B2 (ja) * 2008-12-12 2013-04-17 Ｈｏｙａ株式会社 フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP6490409B2 (ja) * 2014-03-19 2019-03-27 東レエンジニアリング株式会社 塗布装置、塗布方法、及びディスプレイ用部材の製造方法
PL3285936T3 (pl) 2015-04-21 2023-02-06 Umicore Ag & Co. Kg Sposób, urządzenie i aparat do powlekania wewnętrznej powierzchni podłoża

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