JP2000500930A5 - - Google Patents

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Publication number: JP2000500930A5
Authority: JP; Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Ceased

Application number

JP1998514431A

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Filing date

1997-07-15

Publication date

2005-04-07

1997-07-15 Application filed filed Critical

1997-07-15 Priority claimed from PCT/IB1997/000877 external-priority patent/WO1998012604A1/en

2000-01-25 Publication of JP2000500930A publication Critical patent/JP2000500930A/ja

2005-04-07 Publication of JP2000500930A5 publication Critical patent/JP2000500930A5/ja

Status Ceased legal-status Critical Current

JP10514431A 1996-09-19 1997-07-15 フォトリソグラフィー過程を監視する方法 Ceased JP2000500930A (ja)

Application Number	Priority Date	Filing Date	Title
EP96202617		1996-09-19
EP96202617.5		1996-09-19
PCT/IB1997/000877 WO1998012604A1 (en)	1996-09-19	1997-07-15	Method of monitoring a photolithographic process

Publication Number	Publication Date
JP2000500930A JP2000500930A (ja)	2000-01-25
JP2000500930A5 true JP2000500930A5 (ja)	2005-04-07

Application Number	Title	Priority Date	Filing Date
JP10514431A Ceased JP2000500930A (ja)	1996-09-19	1997-07-15	フォトリソグラフィー過程を監視する方法

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JP2005308896A (ja) *	2004-04-19	2005-11-04	Fujitsu Ltd	フォトマスク及びその管理方法
US8042405B2 (en) *	2008-07-23	2011-10-25	University Of Kentucky Research Foundation	Method and apparatus for characterizing microscale formability of thin sheet materials

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6120325A (ja) *	1984-07-07	1986-01-29	Ushio Inc	水銀灯による半導体ウエハ−材料の露光方法
JPH06224099A (ja) *	1993-01-26	1994-08-12	Sony Corp	半導体装置の製造方法
KR0137636B1 (ko) *	1993-11-25	1998-06-01	김주용	현상률 측정 패턴을 구비한 포토마스크 및 현상률 측정방법