JP2004134741A5 - - Google Patents
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- Publication number
- JP2004134741A5 JP2004134741A5 JP2003171797A JP2003171797A JP2004134741A5 JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5 JP 2003171797 A JP2003171797 A JP 2003171797A JP 2003171797 A JP2003171797 A JP 2003171797A JP 2004134741 A5 JP2004134741 A5 JP 2004134741A5
- Authority
- JP
- Japan
- Prior art keywords
- solid
- precursor
- mixture
- heat
- precursors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002243 precursor Substances 0.000 description 22
- 239000007787 solid Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 239000004020 conductor Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 239000008247 solid mixture Substances 0.000 description 2
- -1 spheres Substances 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38952802P | 2002-06-17 | 2002-06-17 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004134741A JP2004134741A (ja) | 2004-04-30 |
| JP2004134741A5 true JP2004134741A5 (de) | 2006-07-20 |
| JP4486794B2 JP4486794B2 (ja) | 2010-06-23 |
Family
ID=32298203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003171797A Expired - Lifetime JP4486794B2 (ja) | 2002-06-17 | 2003-06-17 | 固体の先駆物質から蒸気を生成する方法、基板処理システム及び混合物 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4486794B2 (de) |
| TW (1) | TWI271443B (de) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080191153A1 (en) * | 2005-03-16 | 2008-08-14 | Advanced Technology Materials, Inc. | System For Delivery Of Reagents From Solid Sources Thereof |
| EP2021528A4 (de) | 2006-04-26 | 2011-03-23 | Advanced Tech Materials | Reinigung von halbleiterverarbeitungssystemen |
| US7678458B2 (en) | 2007-01-24 | 2010-03-16 | Asml Holding N.V. | Bonding silicon silicon carbide to glass ceramics |
| EP2248153B1 (de) | 2008-02-11 | 2016-09-21 | Entegris, Inc. | Ionenquellenreinigung in halbleiterverarbeitungssystemen |
| US8741062B2 (en) * | 2008-04-22 | 2014-06-03 | Picosun Oy | Apparatus and methods for deposition reactors |
| US20160046408A1 (en) * | 2015-10-27 | 2016-02-18 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Internally coated vessel for housing a metal halide |
| KR20190073788A (ko) | 2017-12-19 | 2019-06-27 | 주식회사 티씨케이 | CVD를 이용한 TaC 코팅층의 제조방법 및 그를 이용하여 제조한 TaC의 물성 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0620051B2 (ja) * | 1987-08-27 | 1994-03-16 | 宇部興産株式会社 | 有機金属化合物のボンベ充填方法 |
| JP2651530B2 (ja) * | 1988-04-15 | 1997-09-10 | 住友化学工業株式会社 | 気相成長用有機金属化合物供給装置 |
| JPH06173011A (ja) * | 1992-12-02 | 1994-06-21 | Shin Etsu Chem Co Ltd | 気化容器 |
| FR2727322B1 (fr) * | 1994-11-30 | 1996-12-27 | Kodak Pathe | Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede |
| JP2964313B2 (ja) * | 1995-03-09 | 1999-10-18 | 信越化学工業株式会社 | 固体有機金属化合物供給装置及びその製造方法 |
| JPH09148257A (ja) * | 1995-11-29 | 1997-06-06 | Sumitomo Electric Ind Ltd | 原料供給装置 |
| JPH10152779A (ja) * | 1996-11-25 | 1998-06-09 | Matsushita Electric Ind Co Ltd | 気化装置及びｃｖｄ装置 |
| TW576873B (en) * | 2000-04-14 | 2004-02-21 | Asm Int | Method of growing a thin film onto a substrate |
| JP4757403B2 (ja) * | 2001-06-01 | 2011-08-24 | 東京エレクトロン株式会社 | 固体原料気化装置 |
-
2003
- 2003-06-17 TW TW92116365A patent/TWI271443B/zh not_active IP Right Cessation
- 2003-06-17 JP JP2003171797A patent/JP4486794B2/ja not_active Expired - Lifetime
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