JP2006281176A - Thin film forming apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a thin film forming apparatus uniformly forming the whole thickness of a film which is formed on a continuous strip support with a droplet ejection head. <P>SOLUTION: The wetting tension on the surface of the continuously supplied support is 30 to 70 dyne/cm. The surface tension of the coating liquid is 15 to 50 dyne/cm. The wetting tension on the surface of the support is made higher than the surface tension of the coating liquid. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a thin film forming apparatus that forms a thin film by applying a coating solution in which a film material is dissolved or dispersed in a solvent onto a belt-like support.

Conventionally, as a thin film forming technique, for example, a spin coating method which is one of thin film coating methods is generally used. This spin coating method is a method of forming a thin film by dropping a coating solution onto a belt-like support, and then rotating the belt-like support to apply the entire surface of the belt-like support by centrifugal force to form a thin film. The film thickness is controlled by time or the viscosity of the coating solution. In this spin coating method, for example, a photoresist film used in a semiconductor manufacturing process or the like, an interlayer insulating film such as SOG (spin on glass), an overcoat film (planarization film) or an alignment film in a liquid crystal device manufacturing process or the like is formed. Furthermore, it is widely used for forming a protective film in the manufacturing process of an optical disk or the like.
However, in this spin coating method, it is not possible to continuously apply to the belt-like support, and it is necessary to replace the application support every time. There was inconvenience that it became high. For these measures, in recent years, a technique using a so-called inkjet method has been proposed.
For example, Patent Document 1 describes a technique in which a thin film is formed by applying a coating liquid onto a belt-like support by applying an inkjet method. In this technique, the head is linearly moved relative to the belt-like support by relative movement means, whereby the coating liquid can be uniformly applied onto the rectangular belt-like support.
Also, Patent Document 2 is a thin film forming apparatus that similarly applies the ink jet method and applies a coating liquid L in which a film material is dissolved or dispersed in a solvent to form a thin film on a substrate SUB. In addition, it is described that a solvent vapor supply mechanism for supplying solvent vapor in the vicinity of the coating liquid can be applied uniformly.
JP-A-8-250389 JP 2003-245582 A

However, the techniques described in Patent Documents 1 and 2 cannot continuously perform high-quality coating on a belt-like support necessary for obtaining high productivity. Because, in order to continuously apply to the belt-shaped support, an unwinding machine that supplies the belt-shaped support and a constant speed, and an accumulator machine for maintaining a time margin for replacement work between the original winding and the original winding, In order to stabilize the tension of the support to be transported, dancer rolls, nip rolls, and many transport rolls connecting these devices are required, and the physical properties of the surface of the support change with each contact with the roll. To do. For example, when the support is brought into contact with the metal roll and then peeled off from the metal roll, the charge amount on the support surface changes due to peeling charging.
In particular, in order to improve transportability at high speed, it is known that the surface of the transport roll is matted or part or all of the roll is grooved. When peeled off, the charge amount changes due to the difference in surface condition.
Moreover, the support body surface temperature after contacting a conveyance roll changes with the heat transfer from a conveyance roll. Also in this case, if the surface of the transport roll is matted or grooved to improve the transportability at high speeds, the amount of heat transfer will change due to the difference in surface condition, resulting in variations in the surface temperature of the support. Let
When applying a coating liquid on a belt-like support by applying the inkjet method to a support with a high charge amount, and forming a thin film, the droplets ejected from the droplet ejection head are very small, a few picoliters. In addition to landing at a position different from the predetermined landing position due to static electricity, or in severe cases, the landing itself will not occur, and not only a uniform film thickness cannot be obtained, but also the coating machine will be contaminated and the productivity will be extremely deteriorated . Even if it lands, the leveling is hindered thereafter, the film thickness distribution is deteriorated, and alignment unevenness and color unevenness may occur.

Further, when the charge amount is not uniform on the surface of the support, the film thickness distribution, the alignment unevenness, the color unevenness, etc. that occur along with it occur.
In addition, when handling another film material on the surface of the support on which the film material has already been formed, the film already peeled off by the transport roll is transferred to the roll and then reattached to the support surface. As a result, the liquid droplets ejected from the liquid droplet ejection head are not uniformly applied to the surface of the support, and dot-like color unevenness occurs.
As for the support surface temperature, if the support surface temperature is lowered, the viscosity of the coating liquid after landing increases and the leveling is inhibited, and the film thickness distribution may be deteriorated, resulting in uneven alignment and uneven color. .
Similarly, when the temperature of the support surface is not uniform, the film thickness distribution, the alignment unevenness, the color unevenness, and the like that occur along with this also occur. In order to avoid these, it is very expensive to modify the transport roll, and the productivity is deteriorated.

  The present invention has been made in view of the above circumstances, and an object of the present invention is to make the thickness of the entire film formed uniform by using a droplet discharge head on a continuous belt-like support. An object of the present invention is to provide a thin film forming apparatus.

The above object can be achieved by the following constitution.
(Claim 1)
In a thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head that discharges a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support.
The wetting tension of the surface of the support that is continuously supplied is 30 to 70 dyne / cm, the surface tension of the coating solution is 15 to 50 dyne / cm, and the wetting tension of the surface of the support is the coating solution. A thin film forming apparatus characterized by being higher than the surface tension of the film.
(Claim 2)
2. The thin film forming apparatus according to claim 1, further comprising corona discharge treatment means for controlling surface wetting tension of the support.
(Claim 3)
The thin film forming apparatus according to claim 1, wherein there is no roll contact on the surface of the support from the position where the corona discharge treatment is performed to the discharge mechanism.
(Claim 4)
A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
A thin film forming apparatus comprising control means for controlling the amount of charge on the surface of the support immediately before applying the coating liquid to be within a range of -1 kV to +1 kV.
(Claim 5)
5. The thin film forming apparatus according to claim 4, wherein there is no roll contact on the surface of the support from the position of the control means for controlling the charge amount on the surface of the support to the discharge mechanism.
(Claim 6)
A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
6. The thin film forming apparatus according to claim 4, further comprising dust removal processing means for performing dust removal processing after performing uniform charge removal treatment on the surface of the support that is continuously supplied.
(Claim 7)
A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
A thin film forming apparatus comprising a heating means for performing a process of heating the surface temperature of the support that is continuously supplied within a range of 20 to 80 ° C.
(Claim 8)
The thin film forming apparatus according to claim 7, wherein there is no roll contact on the surface of the support body from a position of the heating means for performing a heating process to the discharge mechanism.
(Claim 9)
A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
The surface roughness Ra of the support continuously supplied is 0.01 to 10 μm, the coating film thickness is 0.5 to 50 μm, and the surface roughness Ra of the support is 0.1 of the coating film thickness. The thin film forming apparatus is characterized by being 10% to 10%.
(Claim 10)
The thin film forming apparatus according to claim 1, wherein the coating liquid is a coating liquid for an antireflection film.
(Claim 11)
The thin film forming apparatus according to claim 1, wherein the coating liquid is a liquid crystal display film coating liquid.
(Claim 12)
The thin film forming apparatus according to claim 1, wherein the coating liquid is a coating liquid for an organic EL display film.

  According to the present invention, the corona discharge treatment is performed so that the wetting tension of the support surface is 30 to 70 dyne / cm, the surface tension of the coating solution is 15 to 50 dyne / cm, and the wetting tension of the support surface is By making it higher than the surface tension of the coating liquid, not only does the discharged liquid easily land on the support, but also the contact angle between the coating liquid after landing and the support is reduced, and the fluidity of the coating liquid is reduced. And leveling becomes faster. Leveling causes a flow from a place where the coating thickness is thick to a place where the coating thickness is thin, so that the thicker location is thinner and the thinner location is thicker. .

  By controlling the amount of charge on the surface of the support that is continuously supplied to be −1 kV to +1 kV, the generation of an electric repulsive force between the support surface and the discharged droplets is eliminated. The discharged droplets move straight toward the support and the landing position is stabilized, so there is no contamination of the coating machine.

  From the position where the corona discharge treatment is performed to the discharge mechanism, there is no roll contact on the support surface, so that wetting tension increase due to peeling charging to the support surface can be suppressed, the film thickness can be made uniform, Color unevenness can be improved.

  By having a dust removal processing means for performing dust removal processing after the charge amount on the surface of the support is controlled to be uniform, foreign matter adhering to the support due to static electricity is easily detached.

  Further, by heating the surface temperature of the continuously supplied support to 20 ° C. to 80 ° C., the viscosity of the coating solution increases, the leveling speed increases, the film thickness can be made uniform, and the orientation Unevenness and color unevenness can be improved.

  By making the surface roughness Ra of the continuously supplied support 10% or less of the coating film thickness, it is possible to suppress the flow generated by the unevenness of the coating film and improve the alignment unevenness and color unevenness. it can. By making the surface roughness Ra of the continuously supplied support 0.1% or more of the coating film thickness, the wetting tension of the support surface is increased, and the film thickness uniformity is improved as described above, Unevenness of alignment and color can be improved.

  Embodiments according to the present invention will be described with reference to FIG. 1 to FIG. 1, but the present invention is not limited thereto.

  FIG. 1 is a schematic view showing a conventional example of a thin film forming apparatus using an ejection mechanism (referred to as an inkjet head). In the figure, 1 indicates a coating apparatus. The coating apparatus 1 includes an unwinder 3 that unwinds a continuous support 2 wound in a roll shape, a dancer roll 4 that keeps the tension of the support constant, a suction roll 5 that provides the transport resistance of the support, and an apparatus An accumulator 6 that is used when connecting the support without stopping, a meandering control roll 7 that controls meandering while the support is being transported, and a backup roller 8. An inkjet head 9 is fixed above the backup roller 8. Are arranged with an interval of.

  FIG. 2 is a schematic view showing an example of a thin film forming apparatus according to claim 2 of the present invention. The difference from the conventional example (FIG. 1) is that the corona discharge treatment means 15 is provided before the continuous support 2 passes through the inkjet head 9.

  FIG. 3 is a schematic view showing an example of a thin film forming apparatus according to claim 3 of the present invention. In FIG. 3, contactless conveying means 16 is provided that floats the support by air so that there is no roll contact on the surface of the support 2 up to the corona discharge treatment means 15 and the inkjet head 9 shown in FIG. 2.

  FIG. 4 is a schematic view showing an example of a thin film forming apparatus according to claim 6 of the present invention. 4, in place of the non-contact conveyance means 16 shown in FIG. 3, a charge removal bar 17 for controlling the charge amount on the surface of the support 2 and a dust removal processing means 18 for performing dust removal processing are provided.

FIG. 5 is a schematic view showing an example of a thin film forming apparatus according to claim 6 of the present invention. In FIG. 5, FIG.
In place of the charge removal bar 17 and the dust removal treatment means 18 shown in FIG.

  FIG. 6 shows a solvent ejection mechanism having an inkjet head 9, a coating liquid supply unit 10, and a drive control unit 903 for driving and controlling the inkjet head. The ink jet head 9 is formed by arranging a plurality of the same type of heads in the surface width direction of the support 2, and the number of the ink jet heads 9 can be appropriately changed depending on the width of the support 2. Further, a plurality of rows may be arranged in the width direction. Alternatively, the ink-jet head 9 may be a moving-type ink-jet head in which the ink-jet head 9 is applied (not shown) from the standby section along the moving rail by a moving means (not shown) at the time of application.

  The inkjet head according to the present invention is not particularly limited, and may be, for example, a thermal head that has a heating element and ejects ink from nozzles due to a rapid volume change due to ink film boiling due to thermal energy from the heating element. It may be a shear mode type (piezo type) ink jet head that has a vibration plate provided with a piezoelectric element in the ink pressure chamber and discharges ink by a pressure change of the ink pressure chamber by the vibration plate. Particularly preferred is a shear mode type (piezo type) ink jet head.

  In the present invention, the case where the ink jet head 9 is a shear mode type (piezo type) ink jet head is described.

  The ink jet head used in the present invention will be described with reference to FIG. The coating liquid supply unit 10 controls the coating liquid storage tank 101, the pipe 103 that supplies the coating liquid 102 (see FIG. 6) in the coating liquid storage tank 101 to the inkjet head 9, and the supply amount of the coating liquid 102. A valve 104 and a pipe 105 for partially communicating with outside air are provided. The pipe 103 is joined to the ink jet head 9 and is preferably made of a flexible material. Examples thereof include a flexible hose, a polyethylene hose, and a polypropylene hose.

  In addition, it is preferable to pass the coating liquid 102 at least once through the filter medium having an absolute filtration accuracy or a semi-absolute filtration accuracy of 0.4 to 50 μm.

  Reference numeral 903 denotes a control unit for driving the piezoelectric vibration element 91 of the inkjet head 9. The control unit 903 is connected to the inkjet head 9 via a connector (not shown). By this control unit 903, operation intensity and frequency of the piezoelectric vibration element 91, selection of a nozzle at the time of discharging the coating liquid, and the like are performed. Reference numeral 105 denotes a pipe 105 for partially communicating with outside air. Reference numeral 910 denotes a solution storage tank, and the solution 911 can be changed depending on the application. For example, the cleaning liquid can be used when cleaning the ink jet head, and the coating liquid can be used when the ink jet head is filled with the coating liquid before coating.

  FIG. 7 is a schematic perspective view having a partially broken surface of a shear mode type ink jet head. In the figure, reference numeral 901d1 denotes a nozzle discharge port for discharging the coating liquid as droplets, and 901a denotes the surface of the nozzle plate 901d of the inkjet head 9. The interval between the nozzle outlets 901d1 is preferably 0.02 to 0.3 mm.

Examples of the present invention will be specifically described below, but the embodiments of the present invention are not limited to these examples.
<Preparation of sample>
[Preparation of coating solution]
Dipentaerythritol hexaacrylate monomer 60 parts by weight Dipentaerythritol hexaacrylate dimer 20 parts by weight Dipentaerythritol hexaacrylate trimer component 20 parts by weight Dimethoxybenzophenone 4 parts by weight Ethyl acetate 45 parts by weight Methyl ethyl ketone 45 parts by weight Isopropyl alcohol 60 parts by mass [Preparation of coating solution, preparation of support]
Coating solution viscosity 5.2 mPa · s (B-type viscometer 25 ° C)
Support Polyethylene terephthalate film (thickness 75μm width 600mm length 1000m)
[Coating formation]
The coating apparatus shown in FIG. 2 was used. Droplets were ejected from an inkjet head onto a support supported on a backup roll to obtain a coating film. The ink jet head is a shear mode type (piezo type), which has a nozzle discharge port diameter of 0.04 mm, an average discharge amount of 50 pl per droplet of coating liquid, a pitch between nozzles of 0.07 mm, and a nozzle number of 500. . A plurality of inkjet heads were arranged in a staggered manner so that a coating width of 550 mm was obtained. The conveyance speed of the support as the coating object was 10 m / min, and the injection cycle was controlled so that the wet film thickness upon landing was 5 μm. Thereafter, the support provided with the coating film was continuously conveyed, and the solvent was dried in a drying process provided on the downstream side of the coating process to obtain a dried coating film. Drying conditions were 100 ° C. and 20 seconds. The environmental temperature of the coating part was 25 ° C., and the temperature of the coating solution was kept at 25 ° C.

[Adjustment of the wetting tension of the support surface]
The wetting tension of the support was adjusted by changing the voltage of the corona treatment and the type of the support.

[Measurement of wetting tension on support surface]
The measurement was carried out using a mixture for wet tension test manufactured by Kasuga Electric Co., Ltd.

[Adjustment of surface tension of coating liquid]
The surface tension is adjusted by changing the solvent type and changing the amount of the surfactant.

[Measurement of surface tension of coating liquid]
Measurement was performed using a surface tension meter CBVP-Z manufactured by Kyowa Interface Science Co., Ltd. using the Wilhelmi (plate) method.

[Measurement of coating film thickness variation]
A value obtained by measuring an in-plane film thickness of 20 cm square at intervals of 2 mm using an optical interference film thickness meter FE-3000 manufactured by Otsuka Electronics Co., Ltd., and dividing the difference between the maximum film thickness and the minimum film thickness by the average film thickness A Was defined as the variation in coating film thickness.

<Example 1>
The relationship between the surface tension of the support surface and the surface tension of the coating solution was expressed by coating film thickness variation.

[Evaluation rank of coating film thickness variation]
A: A ≦ 0.05
○: 0.05 <A ≦ 0.1
Δ: 0.1 <A ≦ 0.5
×: 0.5 <A

As you can see from the table,
1-1 When the support surface wet tension is higher than the surface tension of the coating solution, there is less variation in the coating film thickness. (Sample Nos. 101 and 115)
1-2 When the surface tension of the coating solution is 15 dyne / cm to 50 dyne / cm, there is little variation in the coating film thickness. (Sample Nos. 108 and 115)
1-3 When the support has a wetting tension of 30 dyne / cm to 70 dyne / cm, there is little variation in the coating film thickness. (Sample Nos. 101 and 107)
From 1-1, 1-2, and 1-3, the surface tension of the support is 30 to 70 dyne / cm, and the surface tension of the coating solution is 15 to 50 dyne / cm. It was found that the coating film thickness variation was small when the three conditions that the tension was higher than the surface tension of the coating solution were met.

<Example 2>
Remove the metal roll from the corona treatment device of FIG. 2 to the coating machine, and instead eject air from the perforated plate to support the support without contacting it. . The variation of the coating film thickness was evaluated under 105 conditions. For comparison, an example in which three more transport rolls were added between the corona treatment apparatus and the coating machine in the apparatus of FIG. 2 was experimentally evaluated as a comparison.

If there is no roll contact on the surface of the support from the position where the corona discharge treatment is performed to the discharge mechanism from the table, there is no coating film thickness variation.

<Example 3>
As shown in FIG. 4, in place of the non-contact conveying means of FIG. 3, a charge removal bar for controlling the charge amount on the surface of the support 2 and a dust removal treatment means for carrying out dust removal treatment are provided. The relationship between the amount of charge on the support and the variation in coating film thickness was evaluated under the conditions of 105.

[Adjustment of charge amount]
The amount of charge on the surface of the support was changed by changing the gap between the charge removal bar and the support.

[Measurement of charge amount]
The charge amount of static electricity on the surface of the support immediately before coating was measured with a Statiron DX manufactured by SHICIDO static electricity Co., Ltd.

According to Table 3, when the electrostatic charge amount is in the range of −1 kV to +1 kV, the coating film thickness variation is small.
Furthermore, sample no. As a result of installing a dust removing device (UVU web cleaner manufactured by Shindaka Co., Ltd.) under the same conditions as in No. 301, sample No. As shown by 401, the coating film thickness varied and the effect could be confirmed.

<Example 4>
As shown in FIG. 5, instead of the static elimination bar and the dust removal treatment means shown in FIG. 4, a heating means for performing a treatment for heating the surface temperature of the support 2 within a range of 20 to 80 ° C. is provided. The relationship of variation was evaluated.

[Adjustment of support temperature]
After the corona discharge treatment machine, a jacket roll capable of passing warm water was installed, and the temperature of the support during coating was measured by changing the temperature of the warm water.

[Temperature measurement]
The temperature of the support was measured with a non-contact handy thermometer IT2-80 manufactured by Keyence Corporation.

From Table 4, the surface temperature of the support during coating is less than 20 ° C. to 80 ° C., and there is little variation in coating film thickness.

<Example 5>
How the surface roughness of the support affects the coating thickness was measured and evaluated by the relationship between the surface roughness of the support and the ratio of the coating thickness.

[Adjustment of coating thickness]
The coating film thickness was adjusted by changing the conveyance speed of the support.

[Adjustment of support surface roughness Ra of support]
By polishing the surface of the support with a fine grindstone, the surface irregularities were adjusted by changing the grindstone count and polishing time, and Ra was changed.

[Measurement of support surface roughness Ra of support]
The amount of deformation of the surface irregularities of the support was calculated from the results of measurement using a CCD laser displacement meter LK-G manufactured by Keyence Corporation.

According to the table, the surface roughness Ra of the support is 0.01 to 10 μm (see sample No. 608), the coating film thickness is 0.5 to 50 μm (see sample Nos. 601, 607, and 615), and the support. The surface roughness Ra is 0.1% to 10% of the coating film thickness (see sample No. 621). In Table 5, sample No. As indicated by 614, when the above three conditions were the upper limit value and the lower limit value, the coating film thickness varied greatly and it was determined as NG.

It is the schematic which shows the prior art example of the thin film formation apparatus which uses a discharge mechanism (it calls an inkjet head). It is the schematic which provided the corona discharge processing means 15 of the thin film forming apparatus which concerns on this invention. It is the figure which provided the non-contact conveyance means which floated the support body with air so that there may be no roll contact on the surface of a support body of the thin film forming apparatus which concerns on this invention. It is the figure which provided the static elimination bar which controls the charge amount of the surface of a support body, and the dust removal process means which performs a dust removal process of the thin film formation apparatus which concerns on this invention. It is the figure which provided the heating means which heats the surface of a support body of the thin film forming apparatus which concerns on this invention. It is the figure which showed the solvent discharge mechanism which has the drive control part which drives and controls the inkjet head of the thin film forming apparatus which concerns on this invention, a coating liquid supply part, and an inkjet head. It is a schematic perspective view which has the partially broken surface of the shear mode type inkjet head of the thin film formation apparatus which concerns on this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Application | coating apparatus 2 Support body 3 Unwinder 4 Dancer roll 5 Suction roll 6 Accumulator 7 Meander control roll 8 Backup roller 9 Inkjet head 10 Coating liquid supply part 15 Corona discharge treatment means 16 Non-contact conveyance means 17 Static elimination bar 18 Dust removal treatment means DESCRIPTION OF SYMBOLS 19 Heating means 91 Piezoelectric vibration element 101 Coating liquid storage tank 102 Coating liquid 903 Control part 910 Solution storage tank

Claims (12)

In a thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head that discharges a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support.
The wetting tension of the surface of the support that is continuously supplied is 30 to 70 dyne / cm, the surface tension of the coating solution is 15 to 50 dyne / cm, and the wetting tension of the surface of the support is the coating solution. A thin film forming apparatus characterized by being higher than the surface tension of the film. 2. The thin film forming apparatus according to claim 1, further comprising corona discharge treatment means for controlling surface wetting tension of the support. The thin film forming apparatus according to claim 1, wherein there is no roll contact on the surface of the support from the position where the corona discharge treatment is performed to the discharge mechanism. A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
A thin film forming apparatus comprising control means for controlling the amount of charge on the surface of the support immediately before applying the coating liquid to be within a range of -1 kV to +1 kV. 5. The thin film forming apparatus according to claim 4, wherein there is no roll contact on the surface of the support from the position of the control means for controlling the charge amount on the surface of the support to the discharge mechanism. A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
6. The thin film forming apparatus according to claim 4, further comprising dust removal processing means for performing dust removal processing after performing uniform charge removal treatment on the surface of the support that is continuously supplied. A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
A thin film forming apparatus comprising a heating means for performing a process of heating the surface temperature of the support that is continuously supplied within a range of 20 to 80 ° C. The thin film forming apparatus according to claim 7, wherein there is no roll contact on the surface of the support body from a position of the heating means for performing a heating process to the discharge mechanism. A thin film forming apparatus that forms a thin film by applying droplets from a discharge mechanism having a droplet discharge head for discharging a coating liquid in which a film material is dissolved or dispersed in a solvent onto a support. And
The surface roughness Ra of the support continuously supplied is 0.01 to 10 μm, the coating film thickness is 0.5 to 50 μm, and the surface roughness Ra of the support is 0.1 of the coating film thickness. The thin film forming apparatus is characterized by being 10% to 10%. The thin film forming apparatus according to claim 1, wherein the coating liquid is a coating liquid for an antireflection film. The thin film forming apparatus according to claim 1, wherein the coating liquid is a liquid crystal display film coating liquid. The thin film forming apparatus according to claim 1, wherein the coating liquid is a coating liquid for an organic EL display film.

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