JP2010010221A - Device and method for processing substrate - Google Patents

Abstract

An object of the present invention is to provide a processing apparatus that prevents a substrate from being disengaged from an engagement pin of the rotary table when the substrate is processed by rotating the rotary table at a high speed.
A processing apparatus for processing a substrate while rotating the substrate, the rotary table 11, a motor 8 for rotating the rotary table, a support pin 19 for supporting the lower surface of the substrate provided on the upper surface of the rotary table, and An engagement pin 20 that engages with the outer surface of the substrate, and a lower surface of the turntable that can be positioned along the radial direction. As the rotation speed of the turntable increases, the engagement pin 20 is positioned outward in the radial direction. A balance weight 24 is provided that generates a force that counteracts a force that deflects the periphery of the rotary table generated by centrifugal force downward.
[Selection] Figure 1

Description

  The present invention relates to a processing apparatus and a processing method for performing a cleaning process and a drying process while rotating a substrate.

  For example, in the manufacturing process of a liquid crystal display panel, there are a film forming process and a photo process for forming a circuit pattern on a rectangular substrate made of glass. In these processes, the processing and cleaning of the substrate are repeated.

  When drying a substrate that has been cleaned, the substrate is held on a rotary table and rotated at a high speed, and the cleaning liquid adhering to the upper surface of the substrate is scattered and removed using the centrifugal force generated thereby. I am doing so.

  In order to hold the rectangular substrate on the turntable, support pins for supporting the lower surfaces of the four corners of the substrate are provided on the upper surface of the turntable and adjacent to the corners of the substrate supported by the support pins. An engagement pin as a pair of engagement members that engage with the pair of outer surfaces is provided. Thus, even when the rotary table is rotated at a high speed, the substrate can be rotated integrally with the rotary table by the engagement between the engagement pins and the outer surfaces of the four corners of the substrate.

  Recently, the size of the substrate tends to increase due to the increase in size of the liquid crystal display panel. If the substrate is enlarged, the diameter of the rotary table that holds the substrate is also increased. Therefore, when the substrate is rotated by holding the substrate on the rotary table, the centrifugal force generated in the engaging pin engaged with the outer surface of the rotary table also increases, and the centrifugal force is a force that bends the periphery of the rotary table downward. Acts.

  When the periphery of the rotary table bends downward, the engagement pin is displaced downward with respect to the substrate. As a result, the engagement pin is disengaged from the outer surface of the substrate, and the substrate may be scattered from the rotary table and damaged.

  Therefore, in order to prevent the peripheral portion of the rotary table from bending downward due to the centrifugal force generated in the engagement pin by the rotation of the rotary table, the portion corresponding to the engagement pin on the lower surface of the peripheral portion of the rotary table is provided. A balance weight is provided.

Thereby, when the rotary table is rotated, a centrifugal force equivalent to the centrifugal force generated on the engagement pin by the balance weight is generated, and a force that bends the peripheral portion of the rotary table upward by the centrifugal force is generated. As a result, the force that bends the periphery of the turntable generated by the centrifugal force of the engagement pin is canceled out, so that the periphery of the turntable can be prevented from being bent downward. Such prior art is shown in Patent Document 1.
Japanese Patent Laid-Open No. 11-45870

  If a balance weight is provided on the lower surface of the peripheral part of the rotary table, even if centrifugal force is generated on the engaging pin by rotating the rotary table as described above, the peripheral part of the rotary table is lowered by the centrifugal force. It is possible to prevent bending.

  By the way, when a drying process is performed by rotating the substrate at a high speed, the rotation speed of the substrate, that is, the rotation speed of the rotary table may be changed depending on various processing conditions such as the size of the substrate and the drying speed. When the rotation speed of the rotary table is changed, the magnitude of the centrifugal force acting on the engagement pin also differs.

In general, if the centrifugal force generated in the engagement pin is F, the mass is m, the rotation radius from the rotation center of the rotation table to the engagement pin is r, and the rotation speed of the rotation table is ω,
F = m · r · ω ²
Given by.

  The balance weight shown in Patent Document 1 is fixed at a predetermined radial position corresponding to the engagement pin on the lower surface of the rotary table. Therefore, if there is a weight difference between the engagement pin and the balance weight, or there is a shift in the mounting position, a difference occurs in the centrifugal force generated between the engagement pin and the balance weight.

  If the centrifugal force generated between the engaging pin and the balance weight is different, the difference may cause the turntable to bend. In particular, when the rotational speed of the turntable is increased by changing the processing conditions of the substrate, even if there is a slight difference in the centrifugal force generated between the engagement pin and the balance weight, the centrifugal force is apparent from the above formula. Is proportional to the square of the rotational speed.

  When the centrifugal force generated on the engagement pin is larger than the centrifugal force generated on the balance weight and the periphery of the rotary table bends downward, the substrate is released from the engagement pin and scattered from the rotary table, causing damage. There are times when it ends up.

  According to the present invention, when the rotation table is rotated, the centrifugal force generated in the balance weight among the centrifugal force generated in the engagement member and the balance weight as the rotation speed is increased is greater than the centrifugal force generated in the engagement member. It is also intended to provide a substrate processing apparatus and a processing method in which the peripheral portion of the rotary table is bent downward so that the substrate is not scattered.

  Further, by moving the balance weight in the radial direction, the inertial force generated during acceleration / deceleration of the rotary table is reduced, and the rotational torque and braking force of the drive source can be reduced. As a result, it is possible to reduce the size of the drive source, shorten the acceleration / deceleration time, or reduce the rigidity of the rotary table to reduce the weight.

The present invention is a processing apparatus for processing while rotating a substrate,
A rotating table,
A drive source for rotationally driving the rotary table;
A support member that supports the lower surface of the substrate provided on the upper surface of the turntable, and an engagement member that engages with the outer surface of the substrate;
A peripheral portion of the rotary table that is provided on the lower surface of the rotary table so as to be positioned along the radial direction and is positioned outward in the radial direction as the rotational speed of the rotary table increases and is generated by the centrifugal force of the engaging member. And a balance weight that generates a force that counteracts the force that bends the substrate downward.

A linear guide provided on the lower surface of the rotary table and supporting the balance weight movably along the radial direction;
The balance weight is held elastically movable along the radial direction of the rotary table, and when the rotary table rotates and a centrifugal force is generated in the balance weight, the balance weight is elastically deformed by the centrifugal force. It is preferable to comprise elastic holding means for moving the rotary table radially outward of the rotary table along the linear guide.

A linear guide provided along the radial direction on the lower surface of the rotary table and supported by the balance weight so as to be movable;
It is preferable that the balance weight is driven along the linear guide in accordance with the rotation speed of the rotary table to position the balance weight at a predetermined position along the radial direction of the rotary table.

The rotary table includes a base portion connected to the drive source, and a plurality of arm bodies extending radially by connecting a base end to the base portion,
The support member and the engagement member are provided on the upper surface of each arm body, and the balance weight is positioned on the lower surface of the arm body at a predetermined radial position according to the rotation speed of the rotary table. It is preferable to be provided.

The present invention is a processing method for processing while rotating a substrate,
Holding and rotating the substrate on a turntable provided with a support member that supports the lower surface of the substrate and an engagement member that engages with the outer surface; and
The balance weight provided on the lower surface of the turntable is moved radially outward in response to an increase in the rotation speed of the turntable, and the periphery of the turntable generated in the engaging member by the rotation of the turntable And a step of generating, by the balance weight, a centrifugal force that counteracts the centrifugal force that bends the substrate downward.

  According to this invention, the balance weight is positioned radially outward of the rotary table as the rotational speed of the rotary table increases. Therefore, when the rotational speed of the rotary table is increased, the rate at which the centrifugal force generated in the balance weight increases more than the centrifugal force generated in the engaging member, so the peripheral portion of the rotary table bends downward and the substrate Can be reliably prevented from coming off the engaging member and scattering.

Embodiments of the present invention will be described below with reference to the drawings.
1 to 4 show a first embodiment of the present invention, and the processing apparatus shown in FIG. The cup body 1 has a lower cup 1a and an upper cup 1b. The lower cup 1a is formed in a bowl shape with an open upper surface, a through hole 2 is formed at the center of the bottom, and a receiving flange 3 is provided at the upper edge.

  The upper cup 1 b is formed in a ring shape having an outer peripheral surface that is a convex curved surface, and a connecting flange 5 is provided on the outer peripheral surface via an attachment member 4. The upper cup 1 b superposes the connecting flange 5 on the receiving flange 3 via the packing 6, and these are connected and fixed by a plurality of screws 7.

  A drive shaft 9 of a motor 8 that is a drive source is inserted into the cup body 1 through a through hole 2 formed in the lower cup 1a. A rotary table 11 is attached to the upper end of the drive shaft 9. Thereby, the rotary table 11 is rotationally driven by the motor 8. The motor 8 is driven by a control device (not shown). Thereby, the rotation speed of the turntable 11 can be changed.

  For example, a rectangular substrate 13 used in a liquid crystal display device, which has been cleaned in a cleaning process, which is a previous process, is supplied to the rotary table 11 and held as described later. Therefore, when the substrate 13 is rotated together with the turntable 11, the cleaning liquid adhering to the substrate 13 is removed by centrifugal force. That is, the substrate 13 is dried.

  A plurality of drain port bodies 14 are provided on the bottom wall of the lower cup 1a, and the drain port bodies 14 are connected to a drain pump (not shown). Further, a plurality of exhaust port bodies 15 are connected to the peripheral wall of the lower cup 1a. These exhaust port bodies 15 are connected to an exhaust pump (not shown).

  The drain port 14 discharges the cleaning liquid scattered from the substrate 13 and accumulated in the lower cup 1a. The suction force generated in the exhaust port body 15 generates a smooth air flow from the upper surface of the substrate 13 held on the rotary table 11 toward the exhaust port body 15 in the cup body 1 as indicated by an arrow in FIG. Let

  As shown in FIGS. 2 and 3, the rotary table 11 has a disk-shaped base portion 17. A shaft portion 17 a is provided on the lower surface of the base portion 17, and the shaft portion 17 a is connected to a fitting hole (not shown) formed in the drive shaft 9 of the motor 8.

  From the base portion 17, four arm bodies 18 that are connected to the base end portion and have a distal end portion formed in a T shape extend radially. Support pins 19 as two support members are provided at predetermined intervals in the longitudinal direction in the middle part of the upper surface of each arm body 18, and engagement pins 20 as two engagement members are rotated at the tip part. The table 11 is provided at a predetermined interval in the rotation direction.

  The substrate 13 supplied to the turntable 11 is supported by the support pins 19 at the lower halfway along the diagonal direction, and a pair of engagement pins 20 are engaged with the outer surfaces of the four corners. As a result, when the rotary table 11 is driven to rotate by the motor 8, the rotary table 11 rotates integrally with the rotary table 11.

  A linear guide 22 is provided along the longitudinal direction of the arm body 18, that is, the radial direction of the rotary table 11, at the tip of the lower surface of each arm body 18 of the rotary table 11. As shown in FIG. 4, a guide groove 23 having a T-shaped cross section is formed in the linear guide 22 along the longitudinal direction, and the guide groove 23 provided on the upper surface of the balance weight 24 is formed in the guide groove 23. The engaging portion 24a having a shape corresponding to the portion 23 is movably engaged.

  As shown in FIG. 3, a connecting member 25 is provided on the lower surface of the arm body 18 closer to the radial center of the rotary table 11 than the linear guide 22. A spring 26 is stretched between the connecting member 25 and the balance weight 24 as elastic holding means. The spring 26 elastically holds the balance weight 24 in the radial direction of the rotary table 11.

  That is, when the rotary table 11 is rotationally driven and a centrifugal force is generated in the balance weight 24, the balance weight 24 elastically stretches the spring 26 by the centrifugal force, and the rotary table 11 moves along the linear guide 22. Move radially outward.

  The distance that the balance weight 24 moves outward in the radial direction of the turntable 11 increases as the rotation speed of the turntable 11 increases. If the movement distance of the balance weight 24 is increased, the centrifugal force generated in the balance weight 24 is also increased according to the movement distance. As a result, the force by which the balance weight 24 bends the tip of the arm body 18 of the turntable 11 upward increases.

  The balance weight 24 can move along the linear guide 22 to at least the tip of the arm body 18, that is, the position corresponding to the engagement pin 20. Further, the weight of the balance weight 24 is set to be equal to or greater than that of the pair of engagement pins 20.

  When the rotary table 11 is rotated at a predetermined rotation speed or more, the spring 26 moves the balance weight 24 from the rotation center of the rotary table 11 to a predetermined radial position by a centrifugal force generated by the rotation.

  Then, when the balance weight 24 moves to a predetermined position in the radial direction, the centrifugal force generated in the balance weight 24 is equal to or greater than the centrifugal force generated in the pair of engagement pins 20. The weight is set.

  That is, when the rotary table 11 is rotationally driven at a predetermined rotational speed or more and a force that causes the distal end portion of the arm body 18 to bend downward by the centrifugal force generated in the pair of engagement pins 20 is generated in the balance weight 24. Moves to a predetermined position outside in the radial direction according to the weight so that a centrifugal force larger than the centrifugal force generated in the pair of engagement pins 20 is generated.

  Accordingly, when the rotary table 11 is driven to rotate at a predetermined number of rotations or more, the distal end portion of the arm body 18 does not bend downward but bends upward. It can be reliably prevented from coming off.

  When the rotary table 11 is driven to rotate at a predetermined number of rotations or more, the distance traveled by extending the spring 26 of the balance weight 24 so that the tip of the arm body 18 does not bend downward and upward. That is, the strength of the spring 26 and the weight of the balance weight 24 may be set.

  According to the processing apparatus having such a configuration, for example, when the substrate 13 cleaned in the previous process is dried, the substrate 13 is held on the turntable 11 and the turntable 11 is rotated at a high speed. As a result, the cleaning liquid adhering and remaining on the substrate 13 is scattered and removed by the centrifugal force generated by the rotation of the substrate 13, so that the substrate 13 is dried.

  When the rotary table 11 is rotated at a high speed, a centrifugal force is generated at the pair of engaging pins 20 provided on the upper surface of the tip of each arm body 18 of the rotary table 11, and the centrifugal force deflects the arm body 18 downward. It becomes the power to be.

  On the other hand, a balance weight 24 is movably provided along the linear guide 22 on the lower surface of the distal end portion of each arm body 18. The balance weight 24 is elastically held by a spring 26, and the spring 26 is stretched by a centrifugal force generated according to the rotation of the rotary table 11, and moves outward in the radial direction of the rotary table 11.

  That is, when the rotary table 11 is rotated at a high speed, the balance weight 24 moves outward in the radial direction according to the rotation speed. When the balance weight 24 moves outward in the radial direction, the centrifugal force generated in the balance weight 24 increases in proportion to the square of the movement distance.

  Therefore, by rotating the rotary table 11 at a high speed, even if the centrifugal force generated in the engagement pin 20 increases according to the rotation speed, the centrifugal force generated in the balance weight 24 only increases according to the rotation speed. Not only that, but also the radial distance from the rotation center of the turntable 11 increases. That is, the centrifugal force generated in the balance weight 24 is greatly increased than the centrifugal force generated in the engagement pin 20.

  Thereby, the force deflected upward by the centrifugal force of the balance weight 24 is greatly increased than the force deflected downward by the centrifugal force of the engagement pin 20. Therefore, it is possible to reliably prevent the arm body 18 from bending downward and the engagement pin 20 from coming off the substrate 13.

5 to 8 show other embodiments of the present invention.
FIG. 5 shows a second embodiment of the present invention. In this embodiment, a connecting member 25 is provided at the tip of the arm body 18, and the rotary table 11 is rotated between the connecting member 25 and the balance weight 24. Thus, a spring 26a is provided which is compressed when the balance weight 24 is moved radially outward of the rotary table 11 by the centrifugal force generated in the balance weight 24.

  According to such a configuration, when centrifugal force is generated in the balance weight 24 by the rotation of the turntable 11, the balance weight 24 moves radially outward while compressing the spring 26a. Accordingly, as in the first embodiment, the increase in the centrifugal force generated in the balance weight 24 is greater than the increase in the centrifugal force generated in the engagement pin 20 due to the rotation of the rotary table 11. The eleven arm bodies 18 can be prevented from bending downward.

  FIG. 6 shows a third embodiment of the present invention. In this embodiment, the linear guide 22 is not provided on the lower surface of the arm body 18, and the engaging portion 24 a of the balance weight 24 is movable on the arm body 18. An engaging groove 27 is formed.

  In the third embodiment, in order to elastically hold the balance weight 24 in the engaging groove 27, the balance weight 24 is pulled when it moves radially outward as in the first embodiment. A spring 26 may be provided, or a spring 26a to be compressed may be provided as in the second embodiment.

  FIG. 7 shows a fourth embodiment of the present invention. In this embodiment, the balance weight 24 is provided with an engagement portion 24b having a substantially U-shaped cross section that is movably engaged with the arm body 18. In this case, the spring that elastically holds the balance weight 24 by the rotation of the turntable 11 is pulled as shown in the first embodiment when the balance weight 24 moves radially outward. Either the spring 26 or the spring 26a compressed as in the second embodiment may be used.

  FIGS. 8 and 9 show a fifth embodiment of the present invention. In this embodiment, a linear guide 22 is provided on the lower surface of the arm body 18, and an engaging portion of a balance weight 24 is provided in the guide groove 23 of the linear guide 22. 24a is the same as that of the first embodiment in that it is movably engaged, but either the guide groove 23 of the linear guide 22 or the engaging portion 24a of the balance weight 24, which is linear in this embodiment A coil 30 is provided in the guide groove 23 of the guide 22 and is formed of an electromagnet, and at least the engaging portion 24a of the balance weight 24 facing the coil 30 is formed of a permanent magnet. Thereby, the coil 30 and the permanent magnet constitute a linear motor as a driving means.

  Then, as shown in FIG. 8, a power supply 28 is connected to a coil 30 provided in the linear guide 22, and power supply to the coil 30 by the power supply 28 is controlled by a control device 29. That is, when rotating the rotary table 11 at a high speed, the coil 30 constituting the electromagnet is energized, the balance weight 24 is moved along the linear guide 22, and a predetermined position in the radial direction of the rotary table 11, that is, the rotary table 11. Positioning radially outward as the number of revolutions increases.

  According to such a configuration, the balance weight 24 can be accurately positioned in accordance with the number of rotations of the turntable 11. Therefore, the bending that occurs in the arm body 18 when the turntable 11 is rotated at a high speed. Can be accurately controlled.

  Although power supply from the power supply 28 to the linear guide 22 is not shown, a conductive ring may be provided on the drive shaft 9 of the motor 8 and the brush may be in contact with the conductive ring.

  The means for moving the balance weight outward in the radial direction in accordance with the increase in the number of rotations of the rotary table is not limited to the above-described embodiments, and, for example, a gas spring may be used. That is, the gas spring is configured such that when the rotary table rotates at a high speed and a centrifugal force is generated in the balance weight, the gas filled in the cylinder is compressed by the centrifugal force.

  Therefore, if the balance weight is connected to the rod of the gas spring, the balance weight can be moved outward in the radial direction of the rotary table as the rotational speed of the rotary table increases.

  Further, by moving the balance weight in the radial direction, the inertial force generated during acceleration / deceleration of the rotary table is reduced, and the rotational torque and braking force of the drive source can be reduced. As a result, it is possible to reduce the size of the drive source, shorten the acceleration / deceleration time, or reduce the rigidity of the rotary table to reduce the weight.

  In each of the above-described embodiments, the case where the rotary table has a shape in which a plurality of arm bodies are provided radially at the base has been described. However, the rotary table may be a disk shape, a rectangular shape, or the like. The present invention can be applied to any structure having a support pin that supports the engagement pin and an engagement pin that engages with the outer surface of the corner.

The block diagram of the processing apparatus which shows 1st Embodiment of this invention. The top view of the turntable used for the processing apparatus shown in FIG. The side view of the rotary table of FIG. The expanded sectional view of the arm body which comprises a turntable. The side view of the turntable which shows 2nd Embodiment of this invention. The expanded sectional view of the arm body which shows the 3rd Embodiment of this invention. The expanded sectional view of the arm body which shows 4th Embodiment of this invention. The side view of the arm body which carried out the cross section of the linear guide which shows 5th Embodiment of this invention. Sectional drawing of an arm body similarly.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 11 ... Rotary table, 8 ... Motor (drive source), 13 ... Board | substrate, 18 ... Arm body, 19 ... Support pin (support member), 20 ... Engagement pin (engagement member), 22 ... Linear guide, 23 ... Guide Groove, 24 ... balance weight, 26, 26a ... spring (elastic holding means).

Claims (5)

A processing apparatus for processing while rotating a substrate,
A rotating table,
A drive source for rotationally driving the rotary table;
A support member that supports the lower surface of the substrate provided on the upper surface of the turntable, and an engagement member that engages with the outer surface of the substrate;
A peripheral portion of the rotary table that is provided on the lower surface of the rotary table so as to be positioned along the radial direction and is positioned outward in the radial direction as the rotational speed of the rotary table increases and is generated by the centrifugal force of the engaging member. A substrate weight processing apparatus comprising: a balance weight that generates a force that counteracts a force that deflects the substrate downward. A linear guide provided on the lower surface of the rotary table and supporting the balance weight movably along the radial direction;
The balance weight is held elastically movable along the radial direction of the rotary table, and when the rotary table rotates and a centrifugal force is generated in the balance weight, the balance weight is elastically deformed by the centrifugal force. The substrate processing apparatus according to claim 1, further comprising: an elastic holding means that moves the rotary table outward in the radial direction of the rotary table along the linear guide. A linear guide provided along the radial direction on the lower surface of the rotary table and supported by the balance weight so as to be movable;
2. A driving means for driving the balance weight along the linear guide in accordance with the rotation speed of the rotary table and positioning the balance weight at a predetermined position along the radial direction of the rotary table. The substrate processing apparatus as described. The rotary table includes a base portion connected to the drive source, and a plurality of arm bodies extending radially by connecting a base end to the base portion,
The support member and the engagement member are provided on the upper surface of each arm body, and the balance weight is positioned on the lower surface of the arm body at a predetermined radial position according to the rotation speed of the rotary table. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is provided. A processing method for processing while rotating a substrate,
Holding and rotating the substrate on a turntable provided with a support member that supports the lower surface of the substrate and an engagement member that engages with the outer surface; and
The balance weight provided on the lower surface of the turntable is moved radially outward in response to an increase in the rotation speed of the turntable, and the periphery of the turntable generated in the engaging member by the rotation of the turntable And a step of generating, by the balance weight, a centrifugal force that cancels the centrifugal force that bends the substrate downward.

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