JP2010143798A - Sintered magnesium oxide and method for producing the same - Google Patents
Sintered magnesium oxide and method for producing the same Download PDFInfo
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Abstract
【課題】酸化マグネシウム焼結体を蒸着材として用いて成膜する際に成膜速度が高く、かつ成膜時のスプラッシュ発生の抑止が可能であるとともに、得られた蒸着膜をPDP用の保護膜として使用した時に放電開始電圧を低くすることができる酸化マグネシウム焼結体を提供する。
【解決手段】酸化マグネシウム、マグネシウム以外の周期表第2A族元素の酸化物9〜50質量%、及び、周期表第3B族、第3A族又は第4A族元素の酸化物1〜10000ppmを含むことを特徴とする酸化マグネシウム焼結体。
【選択図】なし[PROBLEMS] To form a film using a magnesium oxide sintered body as a vapor deposition material at a high film formation rate and to suppress the occurrence of splash during the film formation, and to protect the obtained vapor deposition film for PDP. Provided is a magnesium oxide sintered body capable of lowering a discharge start voltage when used as a film.
SOLUTION: Magnesium oxide, 9-50 mass% of oxide of Group 2A element of periodic table other than magnesium, and 1-10000 ppm of oxide of Group 3B, Group 3A or Group 4A element of periodic table A magnesium oxide sintered body characterized by the above.
[Selection figure] None
Description
本発明は、プラズマディスプレイパネル(以下、PDPと称する)における保護膜を形成可能な蒸着材として好適な酸化マグネシウム焼結体、及び、その製造方法に関する。 The present invention relates to a magnesium oxide sintered body suitable as a vapor deposition material capable of forming a protective film in a plasma display panel (hereinafter referred to as PDP), and a method for producing the same.
PDPは2枚のガラス基板の間隙に密閉された微小な放電空間を多数設けた表示デバイスである。たとえば、マトリックス表示方式のPDPでは、多数の電極が格子状に配列され、各電極の交差部の放電セルを選択的に発光させて画像を表示する。代表的な面放電型のAC型PDPでは、前面板の表示電極は誘電体層で被覆され、さらに誘電体層上に保護膜が形成されている。保護膜は、誘電体層が直接放電にさらされることで誘電体層表面が変化して放電開始電圧が上昇するのを防止する役割を有しており、イオン衝撃のスパッタリングによって変化しないという特性を示す層である。 The PDP is a display device in which a large number of minute discharge spaces are provided in the gap between two glass substrates. For example, in a matrix display type PDP, a large number of electrodes are arranged in a grid pattern, and an image is displayed by selectively causing discharge cells at intersections of the electrodes to emit light. In a typical surface discharge AC type PDP, the display electrode of the front plate is covered with a dielectric layer, and a protective film is formed on the dielectric layer. The protective film has a function to prevent the dielectric layer surface from changing due to direct exposure of the dielectric layer to the discharge and increasing the discharge start voltage, and has a characteristic that it does not change due to ion bombardment sputtering. It is a layer to show.
現在、PDP用の保護膜は、酸化マグネシウム等の焼結体をターゲット材とする電子ビーム蒸着法により誘電体層上に形成されることが一般的である。しかし、PDPを更に省電力化するために放電開始電圧を更に下げることが要求され、PDP用の保護膜としても、低い放電開始電圧を有し、二次電子放出係数が高く、スパッタリングに強い材料が求められている。 Currently, a protective film for PDP is generally formed on a dielectric layer by an electron beam evaporation method using a sintered body such as magnesium oxide as a target material. However, it is required to further lower the discharge start voltage in order to further reduce the power consumption of the PDP, and as a protective film for the PDP, a material having a low discharge start voltage, a high secondary electron emission coefficient, and strong against sputtering. Is required.
このような観点から、保護膜を構成する材料として、酸化マグネシウムの他、酸化マグネシウムと、酸化カルシウムや酸化バリウム等との混合酸化物からなる焼結体が提案されている(特許文献1及び2を参照)。これら保護膜材料は、放電開始電圧が比較的低く、耐スパッタ性が良好であるため好ましい。 From such a viewpoint, as a material constituting the protective film, a sintered body made of a mixed oxide of magnesium oxide and calcium oxide, barium oxide or the like is proposed in addition to magnesium oxide (Patent Documents 1 and 2). See). These protective film materials are preferable because the discharge start voltage is relatively low and the sputtering resistance is good.
しかし、前記混合酸化物に基づいた保護膜材料は強度が低いという問題があり、蒸着時の熱衝撃により焼結体の突起部分が破壊され、スプラッシュ(突沸)が発生しやすい問題があった。強度を向上させるには酸化物の相対密度を95%以上に調整する等の方法があるが、相対密度が高い蒸着材は、成膜速度が減少する等の問題があった。 However, the protective film material based on the mixed oxide has a problem that the strength is low, and there is a problem that a projection portion of the sintered body is destroyed by a thermal shock at the time of vapor deposition, and splash (bumping) is likely to occur. In order to improve the strength, there is a method of adjusting the relative density of the oxide to 95% or more. However, the vapor deposition material having a high relative density has a problem that the film formation rate is reduced.
特許文献1では、相対密度95%以上の酸化マグネシウム焼結体であって、結晶粒径が0.3〜100μmの結晶粒子を有する酸化マグネシウムマトリックス中に、カルシウムやバリウムといったアルカリ土類金属の酸化物粒子が0.5〜50体積%分散された蒸着材が報告されているが、この蒸着材は相対密度が高いため、成膜速度が遅く、成膜時のエネルギー効率が満足できるものではない。 In Patent Document 1, a magnesium oxide sintered body having a relative density of 95% or more and having crystal grains having a crystal grain size of 0.3 to 100 μm is oxidized in an alkaline earth metal such as calcium or barium. A vapor deposition material in which 0.5 to 50% by volume of particles are dispersed has been reported, but since this vapor deposition material has a high relative density, the film formation rate is slow and the energy efficiency during film formation is not satisfactory. .
特許文献2では、酸化マグネシウムと、カルシウムやバリウムといったアルカリ土類金属の酸化物と、アルミニウムやジルコニウム等の金属の酸化物との焼結体からなる蒸着材が記載され、それぞれの金属酸化物の含有量が金属元素量換算で0.005モル%以上、合計量が6モル%以下であると記載されている。この蒸着材は酸化マグネシウム以外の金属酸化物の含量が少ないため、放電開始電圧を低下させるには十分でない。また、相対密度が高いため、成膜速度が遅いという欠点もある。
そこで、本発明は、酸化マグネシウム焼結体を蒸着材として用いて成膜する際に成膜速度が高く、かつ成膜時のスプラッシュ発生の抑止が可能であるとともに、得られた蒸着膜をPDP用の保護膜として使用した時に放電開始電圧を低くすることができる酸化マグネシウム焼結体、及び、これを用いたPDPの保護膜用蒸着材、並びに、前記焼結体の製造方法を提供することを目的とする。 Therefore, the present invention has a high film forming speed when forming a film using a magnesium oxide sintered body as a vapor deposition material, and can suppress the occurrence of splash during the film formation. To provide a magnesium oxide sintered body capable of lowering a discharge start voltage when used as a protective film, a vapor deposition material for a protective film of a PDP using the same, and a method for producing the sintered body With the goal.
本発明者が検討したところ、酸化マグネシウム焼結体の組成を、酸化マグネシウムと、マグネシウム以外の周期表第2A族元素の酸化物と、周期表第3B族、第3A族又は第4A族元素の酸化物とをそれぞれ特定量含むように調整することで、当該酸化マグネシウム焼結体を蒸着材として用いて成膜する際に成膜速度が高く、かつ成膜時のスプラッシュ発生の抑止が可能であり、さらに、得られた蒸着膜をPDP用の保護膜として使用した時に放電開始電圧を低くできることを見出し、本発明を完成するに至った。 When this inventor examined, the composition of a magnesium oxide sintered compact was set to magnesium oxide, the oxide of 2A group element of the periodic table other than magnesium, and the periodic table 3B group 3A group 4A element element. By adjusting each oxide to contain a specific amount, the film formation rate is high when the magnesium oxide sintered body is used as a vapor deposition material, and the occurrence of splash during film formation can be suppressed. Furthermore, the inventors have found that the discharge starting voltage can be lowered when the obtained deposited film is used as a protective film for PDP, and the present invention has been completed.
すなわち本発明の酸化マグネシウム焼結体は、酸化マグネシウム、マグネシウム以外の周期表第2A族元素の酸化物9〜50質量%、及び、周期表第3B族、第3A族又は第4A族元素の酸化物1〜10000ppmを含むことを特徴とする。 That is, the magnesium oxide sintered body of the present invention is composed of magnesium oxide, 9-50% by mass of Group 2A element oxide other than magnesium, and oxidation of Group 3B, Group 3A or Group 4A elements of the Periodic Table. It is characterized by containing 1 to 10,000 ppm of the product.
当該酸化マグネシウム焼結体は、酸化マグネシウム粉末、マグネシウム以外の周期表第2A族元素の炭酸化物粉末又は水酸化物粉末、周期表第3B族、第3A族又は第4A族元素の酸化物粉末、及び、バインダーを混合して混合物を調製する工程、前記混合物を造粒し、乾燥して造粒粉末を得る工程、前記造粒粉末を型内で成形して成形体を形成する工程、並びに、前記成形体を焼結する工程を含む方法によって製造することができる。 The magnesium oxide sintered body includes magnesium oxide powder, carbonate powder or hydroxide powder of Group 2A elements of the periodic table other than magnesium, oxide powder of Group 3B, Group 3A or Group 4A of the periodic table, And a step of preparing a mixture by mixing a binder, a step of granulating the mixture and drying to obtain a granulated powder, a step of forming the granulated powder in a mold to form a molded body, and It can be manufactured by a method including a step of sintering the molded body.
本発明の酸化マグネシウム焼結体によれば、これを蒸着材として用いて成膜する際に成膜速度が高く、かつ成膜時のスプラッシュ発生の抑止が可能であるとともに、得られた蒸着膜をPDP用の保護膜として使用した時に放電開始電圧を低くすることができる。 According to the magnesium oxide sintered body of the present invention, when forming a film using this as a vapor deposition material, the film formation speed is high, and it is possible to suppress the occurrence of splash during film formation, and the obtained vapor deposition film Is used as a protective film for PDP, the discharge start voltage can be lowered.
本発明の酸化マグネシウム焼結体は、構成成分として酸化マグネシウムを主体とし、さらに、マグネシウム以外の周期表第2A族元素の酸化物、及び、周期表第3B族、第3A族又は第4A族元素の酸化物を含有する。焼結体とは、粉末の集合体を、融点よりも低い温度で加熱することで、粉体の固相拡散、ネック部の成長、結晶粒界の移動などによって粉末同士が連結して製造された緻密な成形体のことをいう。 The magnesium oxide sintered body of the present invention is mainly composed of magnesium oxide as a constituent component, and further includes an oxide of Group 2A element of the periodic table other than magnesium, and Group 3B, Group 3A or Group 4A element of the periodic table. Containing oxides. A sintered body is manufactured by heating a powder aggregate at a temperature lower than the melting point and connecting the powders by solid phase diffusion of the powder, growth of the neck portion, movement of crystal grain boundaries, etc. It refers to a dense compact.
マグネシウム以外の周期表第2A族元素としては、カルシウム、ベリリウム、ストロンチウム、バリウム、及び、ラジウムが挙げられる。これらを1種類のみ使用してもよいし、2種類以上を組み合わせて使用してもよい。なかでも、バンドギャップが小さく、放電開始電圧を低下させる効果が高いため、カルシウムが好ましい。 Examples of Group 2A elements of the periodic table other than magnesium include calcium, beryllium, strontium, barium, and radium. Only one of these may be used, or two or more may be used in combination. Among these, calcium is preferable because it has a small band gap and a high effect of reducing the discharge start voltage.
本発明の酸化マグネシウム焼結体におけるマグネシウム以外の周期表第2A族元素の酸化物の含量は9〜50質量%である。9質量%未満であると、低電圧効果が不十分であり、50質量%を超えると、焼結体強度が急激に低くなりスプラッシュが発生する。好ましくは12〜35質量%である。 In the magnesium oxide sintered body of the present invention, the content of oxides of Group 2A elements of the periodic table other than magnesium is 9 to 50% by mass. If it is less than 9% by mass, the low voltage effect is insufficient, and if it exceeds 50% by mass, the strength of the sintered body rapidly decreases and splash occurs. Preferably it is 12-35 mass%.
周期表第3B族、第3A族又は第4A族元素としては、ホウ素、アルミニウム、ガリウム、インジウム、タリウム、スカンジウム、イットリウム、ランタン、セリウム、プラセオジム、ネオジム、プロメチウム、サマリウム、ユウロピウム、ガドリニウム、テルビウム、ジスプロシウム、ホルミウム、エルビウム、ツリウム、イッテルビウム、ルテチウム、チタン、ジルコニウム、及び、ハフニウムが挙げられる。これらを1種類のみ使用してもよいし、2種類以上を組み合わせて使用してもよい。なかでも、スプラッシュ抑制効果が高いため、アルミニウム、スカンジウム、ジルコニウム、セシウム又は、イットリウムが好ましく、特にアルミニウムが好ましい。 Periodic Table Group 3B, Group 3A or Group 4A elements include boron, aluminum, gallium, indium, thallium, scandium, yttrium, lanthanum, cerium, praseodymium, neodymium, promethium, samarium, europium, gadolinium, terbium, dysprosium Holmium, erbium, thulium, ytterbium, lutetium, titanium, zirconium, and hafnium. Only one of these may be used, or two or more may be used in combination. Of these, aluminum, scandium, zirconium, cesium, or yttrium is preferable because of its high splash suppression effect, and aluminum is particularly preferable.
本発明の酸化マグネシウム焼結体における周期表第3B族、第3A族又は第4A族元素の酸化物の含量は質量基準で1〜10000ppmである。1ppm未満であると、強度が十分ではなくスプラッシュが発生し、10000ppmを超えると、マグネシウム以外の周期表第2A族元素の酸化物添加により放電開始電圧を低減する効果が阻害される。好ましくは50〜5000ppmである。 In the magnesium oxide sintered body of the present invention, the content of oxides of Group 3B, 3A or 4A elements of the periodic table is 1 to 10000 ppm by mass. If it is less than 1 ppm, the strength is not sufficient and splash is generated. If it exceeds 10000 ppm, the effect of reducing the discharge start voltage is inhibited by the addition of an oxide of a Group 2A element of the periodic table other than magnesium. Preferably it is 50-5000 ppm.
本発明の酸化マグネシウム焼結体は特定の成分比を示す3成分系であり、そのために焼結体の強度が従来の焼結体よりも向上しているため、成膜時の熱衝撃による破壊が抑制され、スプラッシュの発生や破片の飛散を防止することが可能となる。 The magnesium oxide sintered body according to the present invention is a three-component system having a specific component ratio. Therefore, the strength of the sintered body is improved as compared with the conventional sintered body. Is suppressed, and it becomes possible to prevent occurrence of splash and scattering of fragments.
本発明の酸化マグネシウム焼結体は相対密度が95%未満である。相対密度が95%以上であると、電子ビーム蒸着法、イオンプレーティング法又はスパッタリング法等の真空蒸着法を利用した成膜時の蒸着材温度を高く保持することができず、十分な成膜速度を得ることができない。従来は蒸着時にスプラッシュが発生しにくくなるよう、酸化マグネシウム焼結体の相対密度を95%以上に調整することで焼結体の強度を高めることが行われていたが、本発明の酸化マグネシウム焼結体では相対密度が95%未満であっても、蒸着時にスプラッシュが発生しにくい。相対密度の下限は、80%以上であることが好ましい。 The magnesium oxide sintered body of the present invention has a relative density of less than 95%. If the relative density is 95% or more, the deposition material temperature cannot be kept high at the time of deposition using a vacuum deposition method such as an electron beam deposition method, an ion plating method, or a sputtering method, and sufficient film formation is performed. I can't get the speed. Conventionally, the strength of the sintered body has been increased by adjusting the relative density of the magnesium oxide sintered body to 95% or more so that splash is less likely to occur during vapor deposition. Even if the relative density is less than 95% in the aggregate, splash is unlikely to occur during vapor deposition. The lower limit of the relative density is preferably 80% or more.
次に本発明の酸化マグネシウム焼結体を製造する方法を説明する。 Next, a method for producing the magnesium oxide sintered body of the present invention will be described.
本発明の酸化マグネシウム焼結体は、酸化マグネシウム粉末、マグネシウム以外の周期表第2A族元素の炭酸化物粉末又は水酸化物粉末、周期表第3B族、第3A族又は第4A族元素の酸化物粉末、及び、バインダーを混合して混合物を調製する工程、前記混合物を造粒し、乾燥して造粒粉末を得る工程、前記造粒粉末を型内で成形して成形体を形成する工程、並びに、前記成形体を焼結する工程を経ることにより製造することができる。 The magnesium oxide sintered body of the present invention includes magnesium oxide powder, carbonate powder or hydroxide powder of Group 2A elements of the periodic table other than magnesium, oxide of Group 3B, Group 3A or Group 4A of the periodic table A step of mixing a powder and a binder to prepare a mixture, a step of granulating the mixture and drying to obtain a granulated powder, a step of forming the granulated powder in a mold to form a molded body, And it can manufacture by passing through the process of sintering the said molded object.
具体的には、高純度(例えば99.9%以上の純度)の酸化マグネシウム原料粉末の平均粒子径を0.1〜10μm程度、好ましくは0.2〜2μm程度に調節する。 Specifically, the average particle size of the magnesium oxide raw material powder having high purity (for example, purity of 99.9% or more) is adjusted to about 0.1 to 10 μm, preferably about 0.2 to 2 μm.
別途、高純度(例えば99%以上の純度、好ましくは99.9%以上の純度)の、マグネシウム以外の周期表第2A族元素の炭酸化物粉末又は水酸化物粉末の平均粒子径を1.5〜30μm程度、好ましくは3〜20μmに調節する。従来は焼結体の相対密度を向上させるためにマグネシウム以外の周期表第2A族元素である酸化カルシウム原料粉末として平均粒子径が1.5μm未満のものを使用し成形密度を上げることが行われていたが、本発明の焼結体では相対密度が比較的低くてもスプラッシュの発生を抑制できるので、マグネシウム以外の周期表第2A族元素の原料粉末として、平均粒子径が1.5μm以上のものを好適に使用することができる。 Separately, the average particle diameter of carbonate powder or hydroxide powder of Group 2A element of the periodic table other than magnesium having high purity (for example, purity of 99% or more, preferably purity of 99.9% or more) is 1.5. It is adjusted to about ˜30 μm, preferably 3 to 20 μm. Conventionally, in order to improve the relative density of the sintered body, a calcium oxide raw material powder that is a Group 2A element of the periodic table other than magnesium is used with an average particle diameter of less than 1.5 μm to increase the molding density. However, in the sintered body of the present invention, since the occurrence of splash can be suppressed even if the relative density is relatively low, the average particle size is 1.5 μm or more as the raw material powder of Group 2A elements of the periodic table other than magnesium. A thing can be used conveniently.
さらに別途、高純度(例えば99%以上の純度、好ましくは99.9%以上の純度)の周期表第3B族、第3A族又は第4A元素の酸化物粉末を準備する。 Separately, oxide powders of Group 3B, Group 3A or Group 4A of the periodic table having high purity (for example, purity of 99% or more, preferably purity of 99.9% or more) are prepared.
これら酸化物粉末を所定の重量比で混合し、さらに樹脂バインダー溶液を適当量添加して、十分に混合後、造粒する。造粒には、転動造粒法やスプレー造粒法等が利用できる。得られた造粒体を乾燥後、所定の金型に投入して成形する。成形には例えば1軸プレス装置などを使用することができる。金型圧力は、得られる成形体の相対密度を調整するために、例えば、50〜600MPaに設定することが好ましい。 These oxide powders are mixed in a predetermined weight ratio, and an appropriate amount of a resin binder solution is added, and after sufficient mixing, granulation is performed. For granulation, a rolling granulation method, a spray granulation method, or the like can be used. The obtained granulated body is dried and then put into a predetermined mold and molded. For example, a uniaxial press machine or the like can be used. The mold pressure is preferably set to, for example, 50 to 600 MPa in order to adjust the relative density of the obtained molded body.
次に、得られた成形体を焼成することによって、本発明の酸化マグネシウム焼結体を得る。この焼成は、焼成温度:1300〜1800℃、焼成時間:0.5〜20時間にそれぞれ設定することが好ましい。焼成には、電気炉、ガス炉等が利用できる。 Next, the obtained molded body is fired to obtain the magnesium oxide sintered body of the present invention. This firing is preferably set to firing temperature: 1300 to 1800 ° C. and firing time: 0.5 to 20 hours. For firing, an electric furnace, a gas furnace, or the like can be used.
前記樹脂バインダーとしては、特に限定されず、例えばCMC(カルボキシメチルセルロース)、PVA(ポリビニルアルコール)、アクリル系樹脂、酢酸ビニル系樹脂等からなるバインダーを使用することができる。その使用量としては、酸化物換算した粉末量の合計100重量部に対して、固形分で1〜10重量部程度である。バインダー濃度は5%〜50%程度にすることが好ましい。 It does not specifically limit as said resin binder, For example, the binder which consists of CMC (carboxymethylcellulose), PVA (polyvinyl alcohol), an acrylic resin, a vinyl acetate resin etc. can be used. The amount used is about 1 to 10 parts by weight in solid content with respect to 100 parts by weight of the total amount of powder converted to oxide. The binder concentration is preferably about 5% to 50%.
本発明の酸化マグネシウム焼結体は、プラズマディスプレイパネルの保護膜を電子ビーム蒸着法やイオンプレーティング法、スパッタリング法等の真空蒸着法で成膜する際に成膜原料として使用する蒸着材として好適に利用することができる。本発明の酸化マグネシウム焼結体を利用すると、蒸着時のエネルギー効率が良好でありながら、スプラッシュも発生しにくく、膜性能に優れた保護膜を形成することができる。 The magnesium oxide sintered body of the present invention is suitable as a vapor deposition material used as a film forming material when a protective film of a plasma display panel is formed by a vacuum vapor deposition method such as an electron beam vapor deposition method, an ion plating method, or a sputtering method. Can be used. When the magnesium oxide sintered body of the present invention is used, it is possible to form a protective film that is excellent in film performance, while being excellent in energy efficiency during vapor deposition and hardly generating splash.
以下に実施例を掲げて本発明をさらに詳細に説明するが、本発明はこれら実施例に限定されるものではない。 The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.
(実施例1)
純度99.9%以上、平均粒子径(D50)0.5μmの酸化マグネシウム粉末89.99gに、純度99.99%以上、平均粒子径(D50)18.95μmの炭酸カルシウム粉末(関東化学試薬社製:炭酸カルシウム4N)を17.85g(酸化カルシウム換算で10wt%)添加し、さらに純度99.99%以上、平均粒子径(D50)0.692μmの酸化アルミニウム粉末(住友化学社製α−アルミナ:AKP−3000)を0.01g(100ppm)添加したものに、濃度30%のアクリル系樹脂バインダー液を20g添加し、混合した。その後、造粒、乾燥後、プレス成形(成形圧力:200MPa)により直径8mm、厚み5mmの円柱状に成形し、電気炉で1450℃×8時間焼成した。
Example 1
89.9 g of magnesium oxide powder having a purity of 99.9% or more and an average particle diameter (D 50 ) of 0.5 μm, and calcium carbonate powder having a purity of 99.99% or more and an average particle diameter (D 50 ) of 18.95 μm (Kanto Chemical Reagents: calcium carbonate 4N) (17.85 g, 10 wt% in terms of calcium oxide) was added, and aluminum oxide powder with a purity of 99.99% or more and an average particle size (D 50 ) of 0.692 μm (manufactured by Sumitomo Chemical Co., Ltd.) 20 g of an acrylic resin binder solution having a concentration of 30% was added to and mixed with 0.01 g (100 ppm) of [alpha-alumina: AKP-3000]. Then, after granulation and drying, it was formed into a cylindrical shape having a diameter of 8 mm and a thickness of 5 mm by press molding (molding pressure: 200 MPa), and fired at 1450 ° C. for 8 hours in an electric furnace.
原料として用いた酸化物、水酸化物及び炭酸化物の純度及び平均粒子径は下記方法により測定した。 The purity and average particle size of oxides, hydroxides and carbonates used as raw materials were measured by the following methods.
(酸化物、水酸化物及び炭酸化物の純度の測定法)
酸化マグネシウム、炭酸カルシウム、酸化アルミニウムの純度は、100質量%から、測定した不純物量の合計を差し引いた値として算出した。
(Measurement of purity of oxide, hydroxide and carbonate)
The purity of magnesium oxide, calcium carbonate, and aluminum oxide was calculated as a value obtained by subtracting the total amount of impurities measured from 100% by mass.
各不純物量(Si,Al,Ca,Mg,Fe,V,Cr,Mn,Ni,Zn,B,Zr,Cu,Na,K,Cl)はICP発光分析装置(Agilent社製:4500)を使用して試料を酸に溶解したのち測定した。 For each impurity amount (Si, Al, Ca, Mg, Fe, V, Cr, Mn, Ni, Zn, B, Zr, Cu, Na, K, Cl), an ICP emission analyzer (manufactured by Agilent: 4500) is used. The sample was dissolved in acid and then measured.
(酸化物、水酸化物及び炭酸化物の平均粒子径の測定方法)
レーザ回折散乱式粒度分布測定装置(商品名:HIRA、日機装 製)を使用して、測定した。
(Measurement method of average particle diameter of oxide, hydroxide and carbonate)
Measurement was performed using a laser diffraction / scattering particle size distribution analyzer (trade name: HIRA, Nikkiso Co., Ltd.).
以上により得られた酸化カルシウムと酸化アルミニウムを含む酸化マグネシウム焼結体について、下記方法によりかさ密度及び相対密度を算出した。 About the magnesium oxide sintered compact containing the calcium oxide and aluminum oxide obtained by the above, the bulk density and the relative density were computed with the following method.
(焼結体のかさ密度の算出方法)
焼結体のかさ密度は、アルキメデス法により求めた。
(Calculation method for bulk density of sintered body)
The bulk density of the sintered body was determined by the Archimedes method.
(焼結体の相対密度の算出方法)
焼結体の相対密度は、アルキメデス法により求めた。ただし、酸化マグネシウムの理論密度を3.58g/cc、酸化カルシウムの理論密度を3.37g/cc、酸化アルミニウムの理論密度を3.99g/ccとして算出した。
(Calculation method of relative density of sintered body)
The relative density of the sintered body was determined by the Archimedes method. However, the theoretical density of magnesium oxide was calculated as 3.58 g / cc, the theoretical density of calcium oxide as 3.37 g / cc, and the theoretical density of aluminum oxide as 3.99 g / cc.
得られた酸化マグネシウム焼結体を蒸着材としてハース内に10g充填した後、電子ビーム蒸着装置を使用して出力4kV、15mAで15分間、金属基板上に蒸着を行った。この成膜時にビューポートより目視でスプラッシュの発生状態を観察し、さらに、成膜後に薄膜表面を観察し、下記評価基準に基づいて4段階評価した。
◎:スプラッシュ、膜表面への蒸着材破片の付着ともに観測されず。
○:スプラッシュは観測されないが、膜表面への蒸着材破片の付着を確認。
△:スプラッシュを観測。
×:スプラッシュを多数観測。
After 10 g of the obtained magnesium oxide sintered body was filled in a hearth as a vapor deposition material, vapor deposition was performed on a metal substrate at an output of 4 kV and 15 mA for 15 minutes using an electron beam vapor deposition apparatus. At the time of film formation, the state of occurrence of splash was visually observed from the viewport, and further, the surface of the thin film was observed after film formation, and was evaluated according to the following four criteria.
A: Neither splash nor deposit of vapor deposition material on the film surface was observed.
○: Splash is not observed, but it is confirmed that vapor deposition material fragments adhere to the film surface.
Δ: Splash observed.
X: Many splashes observed.
さらに、成膜終了後、ハース内に残留した蒸着材を回収し、その重量を計測し、前記蒸着工程における蒸発量を算出した。 Furthermore, after the film formation was completed, the vapor deposition material remaining in the hearth was collected, the weight was measured, and the evaporation amount in the vapor deposition step was calculated.
結果を表1に示す。 The results are shown in Table 1.
(実施例2)
酸化アルミニウムが500ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 2)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that the aluminum oxide was changed to 500 ppm.
(実施例3)
酸化アルミニウムが1000ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 3)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that the aluminum oxide was changed to 1000 ppm.
(実施例4)
酸化カルシウム、酸化アルミニウムがそれぞれ、20wt%、1000ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
Example 4
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that calcium oxide and aluminum oxide were changed to 20 wt% and 1000 ppm, respectively.
(実施例5)
酸化カルシウム、酸化アルミニウムがそれぞれ、30wt%、1000ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 5)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that calcium oxide and aluminum oxide were changed to 30 wt% and 1000 ppm, respectively.
(実施例6)
酸化カルシウム、酸化アルミニウムがそれぞれ、40wt%、1000ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 6)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that calcium oxide and aluminum oxide were changed to 40 wt% and 1000 ppm, respectively.
(実施例7)
原料に純度99.99%以上、平均粒子径(D50)4.63μmの炭酸カルシウム粉末を使用し、酸化カルシウムが10wt%になるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 7)
Magnesium oxide baked in the same manner as in Example 1 except that calcium carbonate powder having a purity of 99.99% or more and an average particle diameter (D 50 ) of 4.63 μm was used as the raw material and the calcium oxide was changed to 10 wt%. A knot was produced and evaluated.
(実施例8)
原料に純度99.99%以上、平均粒子径(D50)28.72μmの炭酸カルシウム粉末を使用し、酸化カルシウムが10wt%になるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 8)
Magnesium oxide baked in the same manner as in Example 1 except that calcium carbonate powder having a purity of 99.99% or more and an average particle diameter (D 50 ) of 28.72 μm was used as a raw material and calcium oxide was changed to 10 wt%. A knot was produced and evaluated.
(実施例9)
原料に炭酸カルシウム粉末を使用せずに、純度99.9%以上、平均粒子径(D50)6.34μmの水酸化カルシウム粉末を使用し、酸化カルシウムが10wt%になるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
Example 9
Other than using calcium hydroxide powder as raw material, using calcium hydroxide powder with a purity of 99.9% or more and an average particle diameter (D 50 ) of 6.34 μm, so that the calcium oxide is 10 wt%. Manufactured the magnesium oxide sintered compact similarly to Example 1, and evaluated.
(実施例10)
原料に酸化アルミニウム粉末を使用せずに、純度99.9%以上、平均粒子径(D50)30.51μmの酸化イットリウム粉末を使用し、500ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 10)
Example 1 with the exception of using yttrium oxide powder having a purity of 99.9% or more and an average particle diameter (D 50 ) of 30.51 μm without using aluminum oxide powder as a raw material, and changing to 500 ppm. Similarly, a magnesium oxide sintered body was produced and evaluated.
(実施例11)
原料に酸化アルミニウム粉末を使用せずに、純度99.9%以上、平均粒子径(D50)0.581μmの酸化ジルコニウム粉末を使用し、500ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 11)
Example 1 is the same as Example 1 except that zirconium oxide powder having a purity of 99.9% or more and an average particle diameter (D 50 ) of 0.581 μm was used without using aluminum oxide powder as a raw material, and was changed to 500 ppm. Similarly, a magnesium oxide sintered body was produced and evaluated.
(実施例12)
原料に酸化アルミニウム粉末を使用せずに、純度99.9%以上、平均粒子径(D50)6.676μmの酸化セリウム粉末を使用し、500ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
Example 12
Example 1 is the same as Example 1 except that cerium oxide powder having a purity of 99.9% or more and an average particle diameter (D 50 ) of 6.676 μm was used without using aluminum oxide powder as a raw material, and was changed to 500 ppm. Similarly, a magnesium oxide sintered body was produced and evaluated.
(実施例13)
原料に酸化アルミニウム粉末を使用せずに、純度99.9%以上、平均粒子径(D50)15.59μmの酸化スカンジウム粉末を使用し、500ppmになるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Example 13)
Example 1 with the exception of using scandium oxide powder having a purity of 99.9% or more and an average particle diameter (D 50 ) of 15.59 μm without using aluminum oxide powder as a raw material, and changing the concentration to 500 ppm. Similarly, a magnesium oxide sintered body was produced and evaluated.
(比較例1)
原料に酸化アルミニウム粉末を使用しなかった点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 1)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that aluminum oxide powder was not used as a raw material.
(比較例2)
原料に純度99.99%以上、平均粒子径(D50)0.28μmの炭酸カルシウム粉末を使用し、酸化アルミニウム粉末を使用しなかった点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 2)
A magnesium oxide sintered body was used in the same manner as in Example 1 except that calcium carbonate powder having a purity of 99.99% or more and an average particle diameter (D 50 ) of 0.28 μm was used as a raw material, and aluminum oxide powder was not used. Manufactured and evaluated.
(比較例3)
原料に酸化アルミニウム粉末を使用せず、酸化カルシウムが20wt%になるように変更した点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 3)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that aluminum oxide powder was not used as a raw material and calcium oxide was changed to 20 wt%.
(比較例4)
原料に純度99.99%以上、平均粒子径(D50)0.28μmの炭酸カルシウム粉末を使用し、酸化カルシウムが20wt%になるように変更し、さらに酸化アルミニウム粉末を使用しなかった点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 4)
Other than the fact that calcium carbonate powder with a purity of 99.99% or more and an average particle size (D 50 ) of 0.28 μm was used as the raw material, calcium oxide was changed to 20 wt%, and aluminum oxide powder was not used. Manufactured the magnesium oxide sintered compact similarly to Example 1, and evaluated.
(比較例5)
酸化カルシウムが30wt%になるように変更し、原料に酸化アルミニウム粉末を使用しなかった点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 5)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that the calcium oxide was changed to 30 wt% and aluminum oxide powder was not used as a raw material.
(比較例6)
酸化カルシウムが40wt%になるように変更し、原料に酸化アルミニウム粉末を使用しなかった点以外は実施例1と同様に酸化マグネシウム焼結体を製造し、評価を行った。
(Comparative Example 6)
A magnesium oxide sintered body was produced and evaluated in the same manner as in Example 1 except that the calcium oxide was changed to 40 wt% and aluminum oxide powder was not used as a raw material.
Claims (9)
酸化マグネシウム粉末、マグネシウム以外の周期表第2A族元素の炭酸化物粉末又は水酸化物粉末、周期表第3B族、第3A族又は第4A族元素の酸化物粉末、及び、バインダーを混合して混合物を調製する工程、
前記混合物を造粒し、乾燥して造粒粉末を得る工程、
前記造粒粉末を型内で成形して成形体を形成する工程、並びに、
前記成形体を焼結する工程を含む、酸化マグネシウム焼結体の製造方法。 A method for producing a magnesium oxide sintered body according to any one of claims 1 to 5,
Mixture of magnesium oxide powder, carbonate powder or hydroxide powder of Group 2A element of periodic table other than magnesium, oxide powder of Group 3B, Group 3A or Group 4A element of periodic table, and binder The step of preparing,
Granulating the mixture and drying to obtain a granulated powder;
Forming the granulated powder in a mold to form a molded body, and
The manufacturing method of a magnesium oxide sintered compact including the process of sintering the said molded object.
The manufacturing method according to claim 7, wherein the carbonate powder or hydroxide powder of Group 2A elements of the periodic table other than magnesium has an average particle diameter of 3 to 20 µm.
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| JPN6013013900; CHO,Jinhui et al.: 'Effect of CaO addition on the firing voltage of MgO films in AC plasma display panels' Thin Solid Films Vol.350, pp.173-177, 1999, Elsevier;Amsterdam * |
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| WO2012127771A1 (en) * | 2011-03-24 | 2012-09-27 | タテホ化学工業株式会社 | Process for producing sintered magnesium oxide material |
| JP2012201528A (en) * | 2011-03-24 | 2012-10-22 | Tateho Chemical Industries Co Ltd | Method for producing magnesium oxide sintered body |
| WO2024248318A1 (en) * | 2023-06-02 | 2024-12-05 | 주식회사 소울머티리얼 | Magnesium oxide-based composite and method for preparing same |
| KR20240173017A (en) * | 2023-06-02 | 2024-12-10 | 주식회사 소울머티리얼 | Magnesium oxide based composite and Preparation method of the same |
| KR102904080B1 (en) | 2023-06-02 | 2025-12-24 | 주식회사 소울머티리얼 | Magnesium oxide based composite and Preparation method of the same |
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