JP2010272902A - Pulse power supply - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pulse power supply which applies a stable bipolar pulse to a load discharge tube by using semiconductor elements and magnetic switches as switch means, dispenses with an interference prevention circuit and a current blocking circuit and regenerates kickback energy. <P>SOLUTION: The pulse power supply includes two units each of which is obtained by combining pulse generation circuits 11a, 11b each generating a pulse current from a precharged first-stage capacitor by discharge through a semiconductor switch and magnetic pulse compression circuits 13a, 13b each obtaining a pulse current obtained by magnetic-pulse compressing the capacitor charged with the pulse current by magnetic switch operation of a saturable reactor. In the pulse power supply, wherein polarities of output voltages are reversed to each other, pulse currents are respectively generated by the time-divided operation of respective pulse generation circuits 11a, 11b and bipolar pulse currents are output to a load 14. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention is a pulse that combines a pulse generation circuit that uses a semiconductor element as a pulse generation switch and a magnetic pulse compression circuit that obtains a pulse current obtained by compressing a capacitor charged with a pulse current by a magnetic switch operation of a saturable reactor. More particularly, the present invention relates to a pulse power source that applies a bipolar high voltage pulse to a load discharge tube having a low impedance such as a plasma application apparatus.

As a pulse power source using a semiconductor element as a pulse generating switch, there is an excimer laser pulse power source as shown in FIG. 5 (see Patent Document 1). In the figure, a pulse generation circuit 1 initially charges a power first-stage capacitor C ₀ with a charger 2, and pulses to a pulse transformer PT from a first-stage capacitor C ₀ through a saturable reactor SI ₀ when the semiconductor switch IGBT ₁ is turned on. Supply current. The saturable reactor SI0 is a magnetic assist for reducing the switching loss of the semiconductor switch IGBT ₁ by performing a magnetic switch operation after the semiconductor switch IGBT ₁ is turned on.

Magnetic pulse compression circuit 3, the pulse capacitor C ₁ and the high pressure charged with pulse current boosted by a transformer PT, a capacitor C ₂ from the capacitor C ₁ by saturable reactor SI1 at the charging voltage of the capacitor C ₁ is operated magnetic switch narrow to generate a pulse current by the high-pressure charge the capacitor C ₂ to the further load device comprising a capacitor C ₂ to the excimer laser head at the charging voltage saturable reactor SI2 by operating magnetic switch of the capacitor C ₂ 4 Narrow and high voltage pulse current is supplied to

  Saturable reactors SI0-SI2 are subjected to magnetization reset for initializing the magnetic saturation direction in preparation for the magnetic switch operation. For this magnetization reset, a reset winding is provided in each of the saturable reactors SI0 to SI2, and a direct current is supplied.

Here, when the load 4 is used for an excimer laser, as shown in FIG. 6A, the equivalent circuit is such that a wiring inductance Lp and a discharge resistance RL of a load discharge tube are connected in series to a peaking capacitor Cp. The circuit is a low impedance load (several Ω) having a vibration waveform as shown in FIG. Therefore, the energy that has not been absorbed by the load 4 is reversed and returns to the pulse generation circuit 1 through the magnetic pulse compression circuit 3 (referred to as kickback energy). Kickback energy has returned to the power supply takes over the pulse transformer PT winding N1 ', charged with the same polarity as the initial charge in the capacitor C ₀ through the diode D _1, as electric energy for the next pulse generation Regenerate. At this time, the IGBT ₁ is off, and no current flows through the winding N1 of the PT.

  FIG. 7 shows a configuration example of a pulse power supply described in Patent Document 2. In the figure, in order to reduce the duty of circuit components while increasing the pulse energy and further increase the repetition frequency of pulse generation, two parallel pulse generation circuits 1a and 1b are provided, and these pulse generation circuits are operated in a time-sharing manner. The magnetic pulse compression circuits 3a and 3b receive the respective pulse current outputs and compress the respective pulse currents with magnetic pulses. The magnetic pulse compression circuits 3a and 3b are connected to the saturable reactors SI2a and SI2b in series with diodes D1a and D1b for preventing current wrapping and connected in parallel to each other. Supply.

  The pulse power supply as shown in FIGS. 5 and 7 has a unipolar output. On the other hand, a DLC (Diamond Like Carbon) film forming apparatus or a semiconductor film forming apparatus as a plasma application apparatus may require a bipolar pulse power source as will be described in detail below.

The DLC film is an amorphous carbon film in which both the SP ³ bond of diamond and the SP ² bond of graphite have a skeleton structure of carbon atoms, and has features such as high hardness, high wear resistance, low friction coefficient, and high insulation. It is widely applied to electrical and electronic equipment, cutting tools, molds, and automotive parts.

  For film formation of DLC, for example, a carbon-containing gas such as methane or a solid material such as graphite is given energy by discharge or the like to generate positive ions containing carbon, and the ions are accelerated by an electric field to be formed on the cathode substrate. By supplying, a DLC film is formed on the substrate. As the generation method, there are an ion beam evaporation method, an arc ion plating method, and a sputtering method. Similarly, a semiconductor film forming apparatus obtains a semiconductor film by sputtering, CVD, or ion implantation.

  FIG. 8 shows a schematic diagram of a bipolar magnetron sputtering apparatus (see, for example, Non-Patent Document 1). In this bipolar type, as a method of applying AC or pulse voltage to two targets from a pulse power supply, the cathode and the anode are switched for each half cycle of the voltage. In the figure, positive and negative pulse voltages are applied to the two targets M1 and M2 by alternately switching the polarity of the high-voltage DC output of the magnetron power source MPS by the pulse unit PU. According to such a pulse voltage application method, the potentials of the targets M1 and M2 are alternately reversed, and the occurrence of arcing in sputtering can be prevented. This arcing is caused by the accumulation of electric charges in the cathode surface insulating layer by direct current sputtering, and in order to prevent this, the potentials of the targets M1 and M2 are alternately reversed and formed on the surfaces of both targets M1 and M2. The positive charge on the insulating layer is neutralized, and the insulating layer is removed in the next negative voltage application period.

  FIG. 9 shows a circuit configuration of the DLC film forming apparatus described in Patent Document 3. The pulse power source used in this apparatus is composed of a negative high voltage pulse generation power source PS (N), a positive high voltage pulse generation power source PS (P), and an interference prevention circuit IPC.

  The negative high voltage pulse power supply PS (N) outputs a negative high voltage pulse by the switching operation of the vacuum tube switch SW1. The positive high voltage pulse power supply PS (P) outputs a positive high voltage pulse by the switching operation of the vacuum tube switch SW2. These positive and negative pulse outputs are alternately applied to the film-formed processed product TG in the chamber CH through the interference prevention circuit IPC. The interference prevention circuit IPC limits the surge current by the core CORE and the resistor R1, and further limits the excessive current at the time of pulse switching by the inductance L, and regenerates it through the diode D and the resistor R2, thereby preventing interference. .

JP 2001-36173 A JP2007-288466 JP 2001-207259 A

2008 Annual Conference of the Institute of Electrical Engineers of Japan, Volume 1, S4 (27)-S4 (30), "Spatter Plasma Issues and Future Prospects", Naoto Kikuchi, Eiji Kusano

  As described above, the pulse power source used in the plasma application apparatus (DLC film forming apparatus or semiconductor film forming apparatus) uses a gap switch such as a thyratron or a vacuum tube as a pulse generating switch means. As a means, a semiconductor switch or a magnetic switch is also used, and these features are as shown in the following table.

  From these characteristics, a pulse power source that uses a semiconductor switch and a magnetic switch that are excellent in lifetime, stability, controllability, and the like is suitable as a pulse power source for plasma application apparatuses.

  However, the pulse power source using the semiconductor switch shown in FIGS. 5 and 7 is required to have a unipolar pulse output and generate a bipolar pulse. That is, in the plasma application apparatus, there is a problem of local breakdown (occurrence of arcing) due to the positive charges accumulated on the surface of the insulating layer in the reactive sputtering, and the film quality is deteriorated by the particles generated by the arcing. Cause problems such as damage to the power supply. In order to prevent this arcing, a pulse power source capable of generating bipolar pulses is required.

  As shown in FIG. 9, two high-voltage pulse generation power supplies PS (P) and PS (N) each serving as a unipolar pulse generation power supply are provided as pulse power supplies capable of generating bipolar pulses. It is conceivable to generate pulses alternately from the pulse power supply. This includes an interference prevention circuit IPC (see FIG. 9) and a current blocking circuit (diode D1a in FIG. 7) for preventing the positive and negative pulse outputs from interfering with each other. And D1b) are required. The diodes, resistors, and reactors used in these interference prevention circuits and current blocking circuits have a large withstand voltage and current capacity, and are therefore large and expensive. In addition, the use of a vacuum tube switch has a problem of low stability and short life.

  It is an object of the present invention to apply a stable bipolar pulse to a load discharge tube using a semiconductor element and a magnetic switch as a switching means, and eliminates the need for an interference prevention circuit and a current blocking circuit and at the same time regenerates kickback energy. To provide power.

  In order to solve the above-mentioned problems, the present invention uses two pulse power sources composed of a pulse generation circuit and a magnetic pulse compression circuit, and has a configuration in which the polarities of the output voltages of both pulse power sources are reversed to generate both pulses. Each circuit generates pulse currents in a time-sharing operation and outputs bipolar pulse currents to the load. The circuit has the following configuration.

(1) A pulse generation circuit that generates a pulse current by discharging with a semiconductor switch from a first-stage capacitor that is precharged, and a pulse current obtained by compressing a magnetic pulse of the capacitor charged by the pulse current by a magnetic switch operation of a saturable reactor is obtained. In a pulse power supply combined with a magnetic pulse compression circuit,
The pulse generation circuit and the magnetic pulse compression circuit are composed of two units, each having a configuration in which the polarity of the output voltage is reversed, each pulse generation circuit generates a pulse current in a time-sharing operation, and a bipolar pulse is applied to the load. A pulse power supply characterized by outputting current.

(2) A pulse generation circuit that generates a pulse current by discharging with a semiconductor switch from a first-stage capacitor that is precharged, and a pulse current obtained by compressing the capacitor charged by the pulse current by a magnetic switch operation of a saturable reactor are obtained. In a pulse power supply combined with a magnetic pulse compression circuit,
The pulse generation circuit and the magnetic pulse compression circuit are configured in two units, with a configuration in which a pulse transformer is connected to one output circuit and the polarity of each output voltage is reversed, and each pulse generation circuit performs a pulse-sharing operation in a time-sharing operation. A pulse power supply that generates current and outputs bipolar pulse current to the load.

As described above, according to the present invention, two pulse power supplies configured by a pulse generation circuit and a magnetic pulse compression circuit are used, and the polarity of the output voltage of both pulse power supplies is reversed. Since each pulse current is generated by time-sharing operation and bipolar pulse current is output to the load, a stable bipolar pulse can be applied to the load discharge tube using the semiconductor element and magnetic switch as a switching means, and interference Specifically, the prevention circuit and current blocking circuit are not required and kickback energy can be regenerated.
-Bipolar pulses can be applied to the load discharge electrode of plasma application equipment.

  ・ Eliminates arcing in the load discharge electrode of plasma application equipment, solving problems such as film quality degradation and power supply damage.

  ・ No need for interference prevention circuit or current blocking circuit between pulse power supplies.

  • Surplus energy that is not absorbed by the load can be regenerated in the first stage capacitor C0.

  ・ Since the pulse power supply is composed of a semiconductor switch and a magnetic compression circuit, a steep pulse of high voltage and large current can be stably supplied with high repetition.

  -Since it can be composed of two pulse power supplies, one pulse power supply and a pulse power supply with the polarity after the pulse transformer of the pulse power supply reversed, it is easy to manufacture the pulse power supply (it can be handled only by remodeling inside the pulse power supply).

  -Since one type of pulse power supply can be used, it is easy to manufacture the pulse power supply.

  -The output voltage can be easily changed by inserting a pulse transformer in the output section of one pulse power supply.

FIG. 3 is a configuration diagram of a pulse power supply showing the first embodiment. FIG. 3 is an operation explanatory diagram of the first embodiment. FIG. 5 is a configuration diagram of a pulse power supply showing a second embodiment. FIG. 9 is an operation explanatory diagram of the second embodiment. The circuit diagram of the conventional pulse power supply for excimer lasers. FIG. 6 is an equivalent circuit diagram of FIG. 5. The structural example of the conventional pulse power supply. Schematic of a conventional bipolar magnetron sputtering apparatus. The circuit block diagram of the conventional DLC film-forming apparatus.

(Embodiment 1)
FIG. 1 is a configuration diagram of a pulse power source according to the present embodiment, which is a pulse power source capable of applying a bipolar high voltage pulse to a load discharge tube having a low impedance such as a plasma application apparatus.

  In the figure, the pulse generators 11a and 11b, the chargers 12a and 12b, and the magnetic pulse compression circuits 13a and 13b have two units, each having a circuit configuration in which the polarity of the output pulse voltage is reversed, and each of the pulse generators 11a, 11b, A pulse current is generated by the alternating operation of 11b, and a bipolar pulse current is output to the load 14.

  Specific circuit configurations of the pulse generation circuits 11a and 11b and the magnetic pulse compression circuits 13a and 13b are the same as those shown in FIG. 5, for example, and also have a kickback energy regeneration function. However, the output polarities of the pulse transformers PT1a and PT1b of the pulse generation circuits 11a and 11b are opposite to each other, and the initial magnetization directions (indicated by →) of the saturable reactors SI1a, SI2a, SI1b, and SI2b of the magnetic pulse compression circuits 13a and 13b are also set. Reverse. The peaking capacitor Cp may be unnecessary depending on the configuration of the load 14, and in this case, a load discharge tube is directly connected.

  The operation for applying a bipolar high voltage pulse to the load (load discharge electrode) 14 with the pulse power supply having the configuration of FIG. 1 will be described with reference to FIG.

  In the basic operation, two pulse power sources are alternately operated, and positive and negative bipolar pulse voltages are applied to the load discharge electrodes to cause discharge. Although not shown, the alternate operation timing is output at an arbitrary timing by a charge command from the control circuit and a gate trigger of the semiconductor switch of the pulse generation circuit. Note that the timing of the alternating operation may be equal intervals, or positive and negative pulses may be close to each other. However, there is a problem if a negative pulse is too close during the magnetization reset operation after the positive pulse is generated. Also, the output voltage of each pulse power supply can be set arbitrarily. That is, the peak values of the positive and negative pulses may be slightly different.

(A) Operation of upper pulse power supply in FIG. 2 (Initial condition) Charger 12a charges first stage capacitor C0 (see FIG. 5) in pulse generation circuit 11a to a constant voltage. Each saturable reactor SI1a, SI2a is magnetized in the initial magnetization state (in the direction of the arrow in the figure). Similarly, the saturable reactor SI0 (see FIG. 5) in the pulse generation circuit 11a is magnetized to the initial magnetization state.

(Current i ₁₁ and current i ₁₁ ′) A pulse is generated by the pulse generation circuit 11a, and the pulse transformer PT1a operates in the direction shown in the figure to charge the capacitor C1a negatively.

(Current i ₁₂ ) Saturable reactor SI1a is saturated and energy is transferred from capacitor C1a to C2a.

(Current i ₁₃ ) Saturable reactor SI2a is saturated and energy is transferred from capacitor C2a to Cp. At this time, almost no current flows to the lower pulse power supply in FIG. In other words, the saturable reactor SI2b tries to be magnetized by the voltage of the capacitor Cp, but before the time when the saturable reactor SI2b is saturated, a discharge occurs from the capacitor Cp to the load discharge electrode 14, and the saturable reactor SI2b is in an unsaturated state. And the current to the saturable reactor SI2b side is blocked. As a result, the saturable reactor SI2b is slightly magnetized in the direction opposite to the initial magnetization direction.

(Current i ₁₄ ) Discharge occurs at the load discharge electrode 14, and the negative voltage of the capacitor Cp is inverted in polarity and charged positively.

(Current i ₁₅ ) Energy is transferred from the capacitor Cp to C2a. At this time, no current flows to the lower pulse power supply in FIG. That is, the saturable reactor SI2b is magnetized in the non-saturated region by a small current that is a part of the current i ₁₃ and blocks the current.

(Current i ₁₆ ) Energy is transferred from the capacitor C2a to C1a.

(Currents i ₁₇ and i ₁₇ ′) The regenerative circuit (see FIG. 5) in the pulse generation circuit 11a regenerates the capacitor C0 with the initial charge polarity.

(B) Operation of pulse power source in lower side of FIG. 2 (Initial condition) Charger 12b charges first stage capacitor C0 (see FIG. 5) of pulse generation circuit 11b to a constant voltage. Each saturable reactor SI1b, SI2b is magnetized in the initial magnetization state (in the direction of the arrow in the figure). Similarly, the saturable reactor SI0 (see FIG. 5) in the pulse generation circuit 11b is magnetized to the initial magnetization state.

(Currents i ₂₁ and i ₂₁ ′) A pulse is generated by the pulse generation circuit 11b, and the pulse transformer PT1b operates in the direction shown in the figure to charge the capacitor C1b positively.

(Current i ₂₂ ) Saturable reactor SI1b is saturated and energy is transferred from capacitor C1b to C2b.

(Current i ₂₃ ) Saturable reactor SI2b is saturated and energy is transferred from capacitor C2b to Cp. At this time, almost no current flows to the upper pulse power supply in FIG. In other words, the saturable reactor SI2a tries to be magnetized by the voltage of the capacitor Cp, but before the saturation time of the saturable reactor SI2a is reached, a discharge occurs from the capacitor Cp to the load discharge electrode 14, and the saturable reactor SI2a is in an unsaturated state. And the current to the saturable reactor SI2a side is blocked. As a result, the saturable reactor SI2a is slightly magnetized in the direction opposite to the initial magnetization direction.

(Current i ₂₄ ) Discharge occurs at the load discharge electrode 14, and the positive voltage of the capacitor Cp is inverted in polarity and charged negatively.

(Current i ₂₅ ) Energy is transferred from the capacitor Cp to C2b. At this time, no current flows to the upper pulse power supply in FIG. In other words, the saturable reactor SI2a in some small current of the current i ₂₃ are magnetized in the non-saturation region, blocks the current.

(Current i ₂₆ ) Energy is transferred from the capacitor C2b to C1b.

(Currents i ₂₇ and i ₂₇ ′) The regenerative circuit (see FIG. 5) in the pulse generation circuit 11b regenerates the capacitor C0 with the initial charge polarity.

Therefore, according to this embodiment,
-Bipolar pulses can be applied to the load discharge electrode of plasma application equipment.

  ・ Eliminates arcing in the load discharge electrode of plasma application equipment, solving problems such as film quality degradation and power supply damage.

  ・ No need for interference prevention circuit or current blocking circuit between pulse power supplies.

  • Surplus energy that is not absorbed by the load can be regenerated in the first stage capacitor C0.

  ・ Since the pulse power supply is composed of a semiconductor switch and a magnetic compression circuit, a steep pulse of high voltage and large current can be stably supplied with high repetition.

  -Since it can be composed of two pulse power supplies, one pulse power supply and a pulse power supply with the polarity after the pulse transformer of the pulse power supply reversed, it is easy to manufacture the pulse power supply (it can be handled only by remodeling inside the pulse power supply).

(Embodiment 2)
FIG. 3 is a block diagram of the pulse power supply according to the present embodiment. The difference from FIG. 1 is that one of the two pulse power supplies has the output connected to the capacitor Cp as it is, and the other pulse power supply. Is configured such that the output is connected to the capacitor Cp via the pulse transformer circuit 16.

  The polarity of the two pulse power supplies may be either. Here, both units have negative output (same power supply circuit configuration). The PT2 of the pulse transformer circuit 16 has a winding configuration that outputs in the opposite polarity to the polarity of the power source without the pulse transformer. The capacitor Cp may be unnecessary depending on the configuration of the load 14, and in this case, a load discharge tube is directly connected.

  The operation for applying a bipolar high voltage pulse to the load (load discharge electrode) 14 with the pulse power supply having the configuration of FIG. 3 will be described with reference to FIG.

  In the basic operation, two pulse power sources are alternately operated, and positive and negative bipolar pulse voltages are applied to the load discharge electrodes to cause discharge. Although not shown, the alternate operation timing is output at an arbitrary timing by a charge command from the control circuit and a gate trigger of the semiconductor switch of the pulse generation circuit. Note that the timing of the alternating operation may be equal, or the positive and negative pulses may be close. However, there is a problem if a negative pulse is too close during the magnetization reset operation after the positive pulse is generated. Also, the output voltage of each pulse power supply can be set arbitrarily. That is, the peak values of the positive and negative pulses may be slightly different.

(A) Operation of upper pulse power supply in FIG. 4 (Initial condition) Charger 12a charges first stage capacitor C0 (see FIG. 5) in pulse generation circuit 11a to a constant voltage. Each saturable reactor SI1a, SI2a is magnetized in the initial magnetization state (in the direction of the arrow in the figure). Similarly, the saturable reactor SI0 (see FIG. 5) in the pulse generation circuit 11a is magnetized to the initial magnetization state.

(Currents i ₁₁ and i ₁₁ ′) A pulse is generated by the pulse generation circuit 11a, and the pulse transformer PT1a performs a transformer operation in the direction shown in the figure to charge the capacitor C1a negatively.

(Current i ₁₂ ) Saturable reactor SI1a is saturated and energy is transferred from capacitor C1a to C2a.

(Current i ₁₃ ) Saturable reactor SI2a is saturated and energy is transferred from capacitor C2a to Cp. At this time, almost no current flows to the lower pulse power supply in FIG. That is, the saturable reactor SI2b is not saturated and blocks current. At this time, the saturable reactor SI2b is slightly magnetized in the direction opposite to the initial magnetization direction.

(Current i ₁₄ ) Discharge occurs at the load discharge electrode 14, and the negative voltage of the capacitor Cp is inverted in polarity and charged positively.

(Current i ₁₅ ) Energy is transferred from the capacitor Cp to C2a. At this time, no current flows to the lower pulse power supply in FIG. That is, the saturable reactor SI2b is magnetized in the non-saturated region by a small current that is a part of the current i ₁₃ and blocks the current.

(Current i ₁₆ ) Energy is transferred from the capacitor C2a to C1a.

(Currents i ₁₇ and i ₁₇ ′) The regenerative circuit (see FIG. 5) in the pulse generation circuit 11a regenerates the capacitor C0 with the initial charge polarity.

(B) Operation of lower pulse power supply in FIG. 4 (Initial condition) Charger 12b charges first stage capacitor C0 (see FIG. 5) of pulse generation circuit 11b to a constant voltage. Each saturable reactor SI1b, SI2b is magnetized in the initial magnetization state (in the direction of the arrow in the figure). Similarly, the saturable reactor SI0 (see FIG. 5) in the pulse generation circuit 11b is magnetized to the initial magnetization state.

(Currents i ₂₁ and i ₂₁ ′) The pulse is generated by the pulse generation circuit 11b, and the pulse transformer PT1b operates in the direction shown in the figure to charge the capacitor C1b negatively.

(Current i ₂₂ ) Saturable reactor SI1b is saturated and energy is transferred from capacitor C1b to C2b.

(Current i ₂₃ ) Saturable reactor SI2b is saturated and energy is transferred from capacitor C2b to Cp. At this time, the pulse transformer PT2 performs a transformer operation. At this time, almost no current flows to the upper pulse power supply in FIG. That is, the saturable reactor SI2a is not saturated and blocks current. At this time, the saturable reactor SI2a is slightly magnetized in the direction opposite to the initial magnetization direction.

(Current i ₂₄ ) Discharge occurs at the load discharge electrode 14, and the positive voltage of the capacitor Cp is inverted in polarity and charged negatively.

(Current i ₂₅ ) Energy is transferred from the capacitor Cp to C2b. At this time, the pulse transformer PT2 performs a transformer operation. At this time, no current flows to the upper pulse power supply in FIG. In other words, the saturable reactor SI2a in some small current of the current i ₂₃ are magnetized in the non-saturation region, blocks the current.

(Current i ₂₆ ) Energy is transferred from the capacitor C2b to C1b.

(Currents i ₂₇ and i ₂₇ ′) The regenerative circuit (see FIG. 5) in the pulse generation circuit 11b regenerates the capacitor C0 with the initial charge polarity.

Therefore, according to the present embodiment, in addition to the effects of the first embodiment,
-Since one type of pulse power supply can be used, it is easy to manufacture the pulse power supply.

  -The output voltage can be easily changed by inserting a pulse transformer in the output section of one pulse power supply.

DESCRIPTION OF SYMBOLS 1, 11a, 11b Pulse generation circuit 2, 12a, 12b Charger 3, 13a, 13b Magnetic pulse compression circuit 4, 14 Load 5 Magnetization reset circuit 16 Pulse transformer circuit PT, PT1a, PT1b, PT2 Pulse transformer C0, C1, C2 , C1a, C1b, C2a, C2b Capacitor Cp Peaking Capacitor SI0, SI1, SI2, SI1a, SI1b, SI2a, SI2b Saturable reactor

Claims (2)

A pulse generation circuit that generates a pulse current by discharging a semiconductor switch from a first stage capacitor that is precharged, and a magnetic pulse compression that obtains a pulse current by compressing the capacitor charged by the pulse current by a magnetic switch operation of a saturable reactor In the pulse power supply combined with the circuit,
The pulse generation circuit and the magnetic pulse compression circuit are composed of two units, each having a configuration in which the polarity of the output voltage is reversed, each pulse generation circuit generates a pulse current in a time-sharing operation, and a bipolar pulse is applied to the load. A pulse power supply characterized by outputting current. A pulse generation circuit that generates a pulse current by discharging a semiconductor switch from a first stage capacitor that is precharged, and a magnetic pulse compression that obtains a pulse current by compressing the capacitor charged by the pulse current by a magnetic switch operation of a saturable reactor In the pulse power supply combined with the circuit,
The pulse generation circuit and the magnetic pulse compression circuit are configured in two units, with a configuration in which a pulse transformer is connected to one output circuit and the polarity of each output voltage is reversed, and each pulse generation circuit performs a pulse-sharing operation in a time-sharing operation. A pulse power supply that generates current and outputs bipolar pulse current to the load.

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