JP2012504104A - 熱特性を有する積層体が設けられた基板を作製するための、特に加熱グレージングを作製するための方法 - Google Patents
熱特性を有する積層体が設けられた基板を作製するための、特に加熱グレージングを作製するための方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- C—CHEMISTRY; METALLURGY
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
- H05B3/86—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields the heating conductors being embedded in the transparent or reflecting material
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- H—ELECTRICITY
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- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Joining Of Glass To Other Materials (AREA)
Abstract
Description
Claims (12)
- 特に透明ガラス基板である基板(10)を製造するためのプロセスであって、基板の各々には、特に銀または銀を含む金属合金ベースの機能層である「n個」の金属機能層(40、80、120、160)と、各々が少なくとも1つの反射防止層(24、64、104、144、184)を備える「(n+1)個」(nは、3以上の整数である)の反射防止コーティング(20、60、100、140、180)とが、各機能層(40、80、120、160)が2つの反射防止コーティング(20、60、100、140、180)の間に配置されるように交互になったものを備える薄膜多層体が設けられており、前記薄膜多層体は、任意選択でマグネトロンスパッタリングタイプであるスパッタリングの真空技術によって堆積されており、前記多層体は、少なくとも2つの機能層(40、80、120、160)の厚さが異なり、機能層(40、80、120、160)の厚さが、多層体内で、多層体の中心に対する対称性を有するようなものであるプロセスにおいて、基板の組の少なくとも2つの薄膜多層体の少なくとも1つの反射防止コーティング(20、60、100、140、180)の少なくとも1つの反射防止層の厚さは異なり、±2.5%と±20%の間、特に±2.5%と±15%の間の変動を有し、かつ0°(ΔE0 *)における2つの基板間の基板側の反射における色の相違は、ゼロに近く、60°(ΔE60 *)における2つの基板間の基板側の反射における色は、ゼロに近いことを特徴とする、プロセス。
- 多層体が、4つの反射防止コーティング(20、60、100、140)と交互にされた3つの機能層(40、80、120)を備え、かつ多層体の2つの端側に位置する機能層(40、120)の厚さ(e40、e120)が、いずれも同一であるが中央機能層(80)の厚さ(e80)とは異なることを特徴とする、請求項1に記載のプロセス。
- 対称の中心にある機能層の厚さ(e80)が、対称の中心から最も遠い2つの他の機能層(40、120)の厚さを上回ることを特徴とする、請求項2に記載のプロセス。
- 多層体が、5つの反射防止コーティング(20、60、100、140、180)と交互にされた4つの機能層(40、80、120、160)を備え、かつ対称の中心から最も遠い2つの機能層(40、160)の厚さ(e40、e160)が、いずれも同一であり、対称の中心に最も近傍の2つの機能層(80、120)の厚さ(e80、e120)が、いずれも同一であることを特徴とする、請求項1に記載のプロセス。
- 対称の中心に最も近い2つの機能層(80、120)の厚さ(e80、e120)が、対称の中心から最も遠い2つの他の機能層(40、160)の厚さ(e40、e160)を上回ることを特徴とする、請求項4に記載のプロセス。
- 対称の中心に最も近い2つの機能層(80、120)の厚さ(e80、e120)が、対称の中心から最も遠い2つの他の機能層(40、160)の厚さ(e40、e160)より小さいことを特徴とする、請求項4に記載のプロセス。
- 前記反射コーティング(20、60、100、140、180)はそれぞれ、任意選択でアルミニウムなどの少なくとも1つの他の要素の助けを得てドープされた、シリコン窒化物ベースの少なくとも1つの層(24、64、104、144、184)を備えることを特徴とする、請求項1から6のいずれか一項に記載のプロセス。
- 機能層(40、80、120、160)の下方にある各々の反射防止コーティングの最後の層が、酸化物ベース、特に任意選択でアルミニウムなどの少なくとも1つの他の要素の助けを得てドープされた亜鉛酸化物ベースの湿潤層(28、68、108、148)であることを特徴とする、請求項1から7のいずれか一項に記載のプロセス。
- 機能層(40、80、120、160)の下方にある少なくとも1つの反射防止コーティングが、混合酸化物から作製された少なくとも1つの非晶質の平滑層(26、66、106、146)であって、結晶質の上方にある湿潤層(28、68、108、148)と接触している、平滑層(26、66、106、146)を備えることを特徴とする、請求項8に記載のプロセス。
- 請求項1から9のいずれか一項に記載のプロセスによって製造された基板(10)の組であって、基板の組の少なくとも2つの薄膜多層体の少なくとも1つの反射防止コーティング(20、60、100、140、180)の少なくとも1つの反射防止層の厚さが異なり、±2.5%と±20%の間、特に±2.5%と±15%の間の変動を有し、かつ0°(ΔE0 *)における2つの基板間の基板側の反射における色の相違は、ゼロに近く、60°(ΔE60 *)における2つの基板間の基板側の反射における色は、ゼロに近いことを特徴とする、基板(10)の組。
- 請求項1から9のいずれか一項に記載のプロセスによって製造された少なくとも1つの基板(10)を各々が組み込むグレージングユニットの組であって、基板の組の少なくとも2つの薄膜多層体の少なくとも1つの反射防止コーティング(20、60、100、140、180)の少なくとも1つの反射防止層の厚さが異なり、±2.5%と±20%の間、特に±2.5%と±15%の間の変動を有し、かつ0°(ΔE0 *)における2つのグレージングユニット間の基板側の反射における色の相違は、ゼロに近く、60°(ΔE60 *)における2つのグレージングユニット間の基板側の反射における色は、ゼロに近いことを特徴とする、グレージングユニットの組。
- 任意選択で少なくとも1つの他の基板が組み合わせられた少なくとも1つの基板(10)を各々が組み込み、特に2重グレージングまたは3重グレージングまたは積層化グレージングタイプ、特に加熱型積層化グレージングを製造することを可能にするために薄膜多層体を電気接続するための手段を含む積層化グレージングの多重グレージングユニットであり、多層体を有する前記基板は、場合によっては湾曲および/または強化される、請求項11に記載のグレージングユニットの組。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0856575A FR2936510B1 (fr) | 2008-09-30 | 2008-09-30 | Substrat muni d'un empilement a proprietes thermiques, en particulier pour realiser un vitrage chauffant. |
| FR0856575 | 2008-09-30 | ||
| PCT/FR2009/051854 WO2010037968A1 (fr) | 2008-09-30 | 2009-09-30 | Procede de fabrication de substrats munis d'un empilement a proprietes thermiques, en particulier pour realiser des vitrages chauffants |
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| JP2012504104A true JP2012504104A (ja) | 2012-02-16 |
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| US (1) | US20110268941A1 (ja) |
| EP (1) | EP2334495A1 (ja) |
| JP (1) | JP5832896B2 (ja) |
| KR (1) | KR101654259B1 (ja) |
| CN (1) | CN102171034B (ja) |
| BR (1) | BRPI0919445A2 (ja) |
| CA (1) | CA2738225A1 (ja) |
| EA (1) | EA201170518A1 (ja) |
| FR (1) | FR2936510B1 (ja) |
| MX (1) | MX2011003220A (ja) |
| WO (1) | WO2010037968A1 (ja) |
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| JP2015506331A (ja) * | 2012-01-16 | 2015-03-02 | サン−ゴバン グラス フランス | 4つの金属機能層を含む、熱特性を有するマルチレイヤーを備えた基体 |
| JP2016504253A (ja) * | 2012-11-19 | 2016-02-12 | ガーディアン インダストリーズ コーポレイションGuardian Industries Corp. | 追加金属を有するスズ酸化物含有層を含む低放射率コーティングを有する被覆製品 |
| JP2016524585A (ja) * | 2013-05-30 | 2016-08-18 | エージーシー グラス ユーロップ | 低放射率および抗日射グレイジング |
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Also Published As
| Publication number | Publication date |
|---|---|
| EA201170518A1 (ru) | 2011-10-31 |
| JP5832896B2 (ja) | 2015-12-16 |
| FR2936510B1 (fr) | 2019-08-30 |
| CN102171034B (zh) | 2015-01-14 |
| US20110268941A1 (en) | 2011-11-03 |
| KR20110066921A (ko) | 2011-06-17 |
| CA2738225A1 (fr) | 2010-04-08 |
| BRPI0919445A2 (pt) | 2015-12-15 |
| FR2936510A1 (fr) | 2010-04-02 |
| WO2010037968A1 (fr) | 2010-04-08 |
| MX2011003220A (es) | 2011-04-21 |
| ZA201102305B (en) | 2011-12-28 |
| KR101654259B1 (ko) | 2016-09-05 |
| CN102171034A (zh) | 2011-08-31 |
| EP2334495A1 (fr) | 2011-06-22 |
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