JP2013140844A5 - - Google Patents

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Publication number
JP2013140844A5
JP2013140844A5 JP2011289885A JP2011289885A JP2013140844A5 JP 2013140844 A5 JP2013140844 A5 JP 2013140844A5 JP 2011289885 A JP2011289885 A JP 2011289885A JP 2011289885 A JP2011289885 A JP 2011289885A JP 2013140844 A5 JP2013140844 A5 JP 2013140844A5
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JP
Japan
Prior art keywords
charged particle
particle beam
mark element
mark
stage
Prior art date
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Application number
JP2011289885A
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English (en)
Japanese (ja)
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JP2013140844A (ja
JP5843610B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2011289885A priority Critical patent/JP5843610B2/ja
Priority claimed from JP2011289885A external-priority patent/JP5843610B2/ja
Priority to US13/719,702 priority patent/US8878141B2/en
Publication of JP2013140844A publication Critical patent/JP2013140844A/ja
Publication of JP2013140844A5 publication Critical patent/JP2013140844A5/ja
Application granted granted Critical
Publication of JP5843610B2 publication Critical patent/JP5843610B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011289885A 2011-12-28 2011-12-28 描画装置及び物品の製造方法 Expired - Fee Related JP5843610B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011289885A JP5843610B2 (ja) 2011-12-28 2011-12-28 描画装置及び物品の製造方法
US13/719,702 US8878141B2 (en) 2011-12-28 2012-12-19 Drawing apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011289885A JP5843610B2 (ja) 2011-12-28 2011-12-28 描画装置及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2013140844A JP2013140844A (ja) 2013-07-18
JP2013140844A5 true JP2013140844A5 (2) 2015-02-19
JP5843610B2 JP5843610B2 (ja) 2016-01-13

Family

ID=48694094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011289885A Expired - Fee Related JP5843610B2 (ja) 2011-12-28 2011-12-28 描画装置及び物品の製造方法

Country Status (2)

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US (1) US8878141B2 (2)
JP (1) JP5843610B2 (2)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102333285B1 (ko) * 2015-08-20 2021-11-30 삼성전자주식회사 노광 장치
US9892885B2 (en) * 2016-03-24 2018-02-13 Kla-Tencor Corporation System and method for drift compensation on an electron beam based characterization tool
WO2021104991A1 (en) 2019-11-28 2021-06-03 Asml Netherlands B.V. Multi-source charged particle illumination apparatus
JP7388237B2 (ja) 2020-02-20 2023-11-29 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画方法及びマルチ荷電粒子ビーム描画装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208829A (ja) * 1984-04-02 1985-10-21 Canon Inc 位置検出装置
JPH0752706B2 (ja) * 1987-04-28 1995-06-05 キヤノン株式会社 電子ビ−ム装置
DE3801668A1 (de) 1988-01-21 1989-07-27 Fischer Artur Werke Gmbh Behaelter zum ausspritzen eines verbundmoertels
JPH04327434A (ja) 1991-04-26 1992-11-17 Ricoh Co Ltd 給紙コロ清掃装置
JP3569273B2 (ja) * 2002-06-13 2004-09-22 株式会社東芝 荷電ビーム描画装置及び描画方法
JP4167904B2 (ja) * 2003-01-06 2008-10-22 株式会社日立ハイテクノロジーズ 電子ビーム描画装置及び電子ビーム描画方法
JP4855875B2 (ja) * 2006-09-06 2012-01-18 富士フイルム株式会社 電子ビーム描画装置及び電子ビームのずれ補償方法
JP2009182269A (ja) * 2008-01-31 2009-08-13 Toshiba Corp 荷電ビーム露光装置及び露光方法

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