JP2013242551A - Photosensitive resin composition - Google Patents

Abstract

PROBLEM TO BE SOLVED: In a conventional photosensitive resin composition, the hardness and tackiness of a pattern obtained from the composition may not always be satisfied.
A photosensitive resin composition comprising (A) a binder resin, (B) a polymerizable compound, (C) a polymerization initiator and an initiation assistant, and (D) a solvent, and (A) the weight of the binder resin. The average molecular weight is 8,000 or more and 100,000 or less, (C) the polymerization initiator and the initiation assistant include at least an oxime compound, an acyl phosphine oxide compound, and a thioxanthone compound, and (D) the solvent has a solubility parameter. The solvent which is 8.0 to 9.1 (cal / cm ³ ) ^1/2 includes 70% by mass or more and 99% by mass or less in the total solvent, and the solubility parameter is 9.2 to 11.0 (cal / cm ³ ). A photosensitive resin composition containing 1% by mass or more and 30% by mass or less of a solvent that is ^1/2 .
[Selection figure] None

Description

  The present invention relates to a photosensitive resin composition.

  Patent Document 1 discloses a resin, a photopolymerizable compound, a colorant, N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine [trade name: Irgacure (registered trademark) OXE- 01], and a photosensitive resin composition using propylene glycol monoethyl ether acetate as a solvent is described.

JP 2010-140042 A

  In the conventional photosensitive resin composition, the hardness and tackiness of the pattern obtained from the said composition may not necessarily be satisfied.

As a result of studies to solve the above problems, the present inventors have found that a composition containing a certain type of solvent gives a pattern having satisfactory hardness and tackiness.
That is, the present invention provides the following [1] to [11].
[1] A photosensitive resin composition comprising (A) a binder resin, (B) a polymerizable compound, (C) a polymerization initiator and an initiation assistant, and (D) a solvent, and (A) a weight average of the binder resin. The molecular weight is 8,000 or more and 100,000 or less, (C) the polymerization initiator and the initiation assistant contain at least an oxime compound, an acylphosphine oxide compound, and a thioxanthone compound, and (D) the solvent has a solubility. A solvent having a parameter of 8.0 to 9.1 (cal / cm ³ ) ^1/2 includes 70% by mass to 99% by mass of the total solvent, and a solubility parameter of 9.2 to 11.0 (cal / cm ³ ) The photosensitive resin composition which contains 1 to 30 mass% of the solvent which is ^1/2 in all the solvents.
[2] The photosensitive resin composition according to claim 1, wherein the solid content acid value of (A) the binder resin is 80 or more and 200 or less.
[3] The ratio of (A) binder resin to (B) polymerizable compound is 50/50 or more and 80/20 or less when expressed as (A) binder resin / (B) polymerizable compound on a mass basis. 3. The photosensitive resin composition according to 1 or 2.
[4] The photosensitive resin composition according to any one of claims 1 to 3, further comprising (E) a colorant.
[5] The photosensitive resin according to any one of [1] to [4], further comprising (F) a leveling agent, wherein the leveling agent amount is 0.001% by mass or more and 0.3% by mass or less. Composition.
[6] A pattern formed from the photosensitive resin composition according to any one of claims 1 to 5.
[7] A step of applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent, and forming a coating film;
A method for producing a pattern, comprising: exposing the coating film after masking, and removing a non-exposed portion of the coating film with a developer.
[8] The step of applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent to form a coating film, and exposing the coating film after masking And the manufacturing method of the pattern characterized by consisting only of the process of removing the unexposed part of the said coating film with a developing solution.
[9] A step of applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent, and forming a coating film,
The coating film is exposed after masking, the step of removing the unexposed portion of the coating film with a developer, and the coating film with the unexposed portion removed with the developer are maintained at a temperature of 23 ° C. or more and 200 ° C. or less. The manufacturing method of the pattern characterized by including a process.
[10] A color filter comprising the pattern according to [6].
[11] A color filter comprising a pattern obtained by the production method according to any one of [7] to [9].

  According to the present invention, it is possible to provide a photosensitive resin composition that gives a pattern having satisfactory hardness and tackiness.

  The photosensitive resin composition of the present invention contains (A) a binder resin, (B) a polymerizable compound, (C) a polymerization initiator and an initiation assistant, and (D) a solvent.

The photosensitive resin composition of the present invention contains (A) a binder resin. (A) The binder resin comprises an addition compound (a) having a structural unit derived from an unsaturated carboxylic acid (hereinafter sometimes referred to as “(a)”), an unsaturated compound (b) ( Hereinafter, the binder resin (A1) (hereinafter sometimes referred to as “resin (A1)”) reacted with “sometimes referred to as“ (b) ”” is included.
The (A) binder resin does not include the resin (binder resin) in the pigment dispersion of the colorant (E) described later.

  Examples of (a) include an unsaturated carboxylic acid (a1) (hereinafter sometimes referred to as “(a1)”) and a monomer having an unsaturated bond capable of addition polymerization with (a1) and (b). An addition polymer obtained by addition polymerization of (a2) (hereinafter sometimes referred to as “(a2)”) may be mentioned.

Specific examples of (a1) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-vinylbenzoic acid, m-vinylbenzoic acid, and p-vinylbenzoic acid;
Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl Unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexene dicarboxylic acid;
Methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene, 5-carboxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo Bicyclounsaturated compounds containing a carboxy group such as [2.2.1] hept-2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene;

Unsaturated mono [(meth) acryloyloxyalkyl] esters of polyvalent carboxylic acids such as succinic acid mono [2- (meth) acryloyloxyethyl] and phthalic acid mono [2- (meth) acryloyloxyethyl] Kind;
Examples thereof include unsaturated acrylates containing a hydroxy group and a carboxy group in the same molecule, such as α- (hydroxymethyl) acrylic acid.
Of these, acrylic acid, methacrylic acid and the like are preferably used from the viewpoint of copolymerization reactivity and alkali solubility.
Here, in this specification, “(meth) acrylic acid” represents at least one selected from the group consisting of acrylic acid and methacrylic acid. Notations such as “(meth) acryloyl” and “(meth) acrylate” have the same meaning.

Examples of (a2) include (meth) acrylic acid such as methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, and tert-butyl (meth) acrylate. Alkyl esters;
Cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, tricyclo [5.2.1.0 ^2,6 ] decan-8-yl (meth) acrylate (in this technical field, dicyclopenta It is said to be nyl (meth) acrylate.
), (Meth) acrylic acid cyclic alkyl esters such as dicyclopentanyloxyethyl (meth) acrylate and isobornyl (meth) acrylate;

Aryl (meth) acrylates or aralkyl esters such as phenyl (meth) acrylate and benzyl (meth) acrylate;
Dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, diethyl itaconate;
Hydroxyalkyl esters such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate;

  Bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept-2-ene, 5- Hydroxybicyclo [2.2.1] hept-2-ene, 5-hydroxymethylbicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2.1] Hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dihydroxybicyclo [2.2 .1] Hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (2′-hydroxyethyl) bicyclo [2.2. 1] hept-2-ene, 5,6-dimethoxybicyclo [2. .1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept-2-ene, 5-tert-butoxycarbonylbicyclo [2.2.1] hept-2-ene, 5-cyclohexyloxycarbonylbicyclo [2.2.1] hept-2-ene, 5-phenoxycarbonylbicyclo [2.2.1] hept-2-ene, 5,6-bis (tert-butoxycarbonyl) bicyclo [2.2.1] hept-2-ene, 5,6-bis (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2-ene Bicyclo unsaturated compounds;

  N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimidobenzoate, N-succinimidyl-4-maleimidobutyrate, N-succinimidyl-6-maleimidocaproate, N-succinimidyl-3 -Dicarbonylimide derivatives such as maleimide propionate, N- (9-acridinyl) maleimide;

  Styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyl toluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene , Isoprene, 2,3-dimethyl-1,3-butadiene and the like.

As (a2), in particular, a compound (a2-1) having at least one skeleton selected from the group consisting of a tricyclodecane skeleton and a tricyclodecene skeleton and an ethylenically unsaturated bond (hereinafter referred to as “(a2− 1) ”may be preferred). When (a2) is (a2-1), it is possible to suppress film loss due to development.
Here, “tricyclodecane skeleton” and “tricyclodecene skeleton” in the present specification refer to the following structures (each having a bond at an arbitrary position), respectively.

  Specific examples of (a2-1) include dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate, and dicyclopentenyloxyethyl (meth) acrylate. Can be mentioned. These may be used alone or in combination of two or more.

  Examples of (b) include a monomer (b-1) having a structure obtained by epoxidizing a chain olefin and an ethylenically unsaturated bond (hereinafter sometimes referred to as “(b-1)”), cycloalkene And a monomer (b-2) (hereinafter sometimes referred to as “(b-2)”) having an epoxidized structure and an ethylenically unsaturated bond. (B) is preferably (b-1) from the viewpoint of reactivity.

  Specific examples of (b-1) include glycidyl (meth) acrylate, β-methylglycidyl (meth) acrylate, β-ethylglycidyl (meth) acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinyl. Benzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis ( Glycidyloxymethyl) styrene, 2,4-bis (glycidyloxymethyl) styrene, 2,5-bis (glycidyloxymethyl) styrene, 2,6-bis (glycidyloxymethyl) styrene, 2,3,4-tris ( Glycidyloxymethi ) Styrene, 2,3,5-tris (glycidyloxymethyl) styrene, 2,3,6-tris (glycidyloxymethyl) styrene, 3,4,5-tris (glycidyloxymethyl) styrene, 2,4 Examples thereof include 6-tris (glycidyloxymethyl) styrene and compounds described in JP-A-7-248625.

  Examples of (b-2) include vinylcyclohexene monooxide, 1,2-epoxy-4-vinylcyclohexane (for example, Celoxide 2000; manufactured by Daicel Chemical Industries, Ltd.), 3,4-epoxycyclohexylmethyl acrylate (for example, cyclohexane). Mer A400; manufactured by Daicel Chemical Industries, Ltd.), 3,4-epoxycyclohexylmethyl methacrylate (for example, Cyclomer M100; manufactured by Daicel Chemical Industries, Ltd.), a compound represented by formula (I), formula (II) ) And the like.

[In Formula (I) and Formula (II), R ¹ and R ² each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group is a hydroxy group. May be substituted.
X ¹ and X ² each independently represent a single bond, —R ³ —, * —R ³ —O—, * —R ³ —S—, or * —R ³ —NH—.
R ³ represents an alkanediyl group having 1 to 6 carbon atoms.
* Represents a bond with O. ]

  Binder resin (A1) can be manufactured through a two-step process, for example. In this case, for example, the method described in the document “Experimental Method for Polymer Synthesis” (Takayuki Otsu, published by Kagaku Dojin Co., Ltd., 1st edition, 1st edition, published on March 1, 1972) It can be produced with reference to the method described in JP 89533.

In the production of the binder resin (A1), first, as a first step, an addition polymer (a) of (a1) and (a2) is obtained. Specifically, a predetermined amount of (a1) and (a2), a polymerization initiator, a solvent, and the like are charged into a reaction vessel, and oxygen is replaced with nitrogen, thereby stirring and heating in a deoxygenated atmosphere. A method for keeping warm is exemplified. The polymerization initiator and solvent used here are not particularly limited, and any of those usually used in the field can be used. Examples of the polymerization initiator include azo compounds (2,2′-azobisisobutyronitrile, 2,2′-azobis (2,4-dimethylvaleronitrile), etc.) and organic peroxides (benzoyl peroxide, etc.). Any solvent may be used as long as it dissolves each monomer, and a solvent described later can be used as a solvent for the colored photosensitive resin composition.
Further, the obtained addition polymer may be used as it is after the reaction, or may be used as a concentrated or diluted solution, or taken out as a solid (powder) by a method such as reprecipitation. May be used.

The ratio of the structural units derived from (a1) and (a2) is preferably in the following range with respect to the total number of moles of all structural units constituting the addition polymer.
Structural unit derived from (a1); 5 to 50 mol% (more preferably 10 to 45 mol%)
Structural unit derived from (a2); 50 to 95 mol% (more preferably 55 to 90 mol%)

Next, as a second step, a part of the carboxylic acid (a1) derived from the obtained addition polymer is reacted with (b). (B-1) is preferred as (b) because it is highly reactive and unreacted (b) hardly remains.
Specifically, following the above, the atmosphere in the flask was replaced from nitrogen to air, and 5 to 80 mol% (b) of the reaction catalyst (for example, tris (dimethylaminomethyl) relative to the number of moles of (a1). Phenol etc.) with respect to the total amount of (a1), (b) and (a2), and 0.001 to 5% by mass, and a polymerization inhibitor (eg hydroquinone etc.) with (a1), (b) and (a2) 0.001-5 mass% is put in a flask with respect to the total amount of, and it is normally made to react at 60-130 degreeC for 1 to 10 hours, and resin (A1) can be obtained. Similar to the polymerization conditions, the charging method and the reaction temperature can be appropriately adjusted in consideration of the production equipment, the amount of heat generated by the polymerization, and the like.
In this case, the number of moles of (b) is preferably 10 to 75 mole%, and more preferably 15 to 70 mole%, relative to the number of moles of (a1). By setting the number of moles of (b) within this range, the balance between storage stability, solvent resistance and heat resistance tends to be good.

  Specific examples of the binder resin (A1) include a resin obtained by reacting a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate with glycidyl (meth) acrylate, (meth) acrylic acid / benzyl (meth) ) Resin in which glycidyl (meth) acrylate is reacted with an acrylate copolymer, Resin in which glycidyl (meth) acrylate is reacted with (meth) acrylic acid / cyclohexyl (meth) acrylate copolymer, (meth) acrylic acid / Styrene copolymer reacted with glycidyl (meth) acrylate, (meth) acrylic acid / methyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, (meth) acrylic Glycidyl (meth) acrylate is added to the acid / N-cyclohexylmaleimide copolymer. Is a resin obtained, glycidyl on copolymers of crotonic acid / dicyclopentanyl (meth) acrylate (meth) resins obtained by reacting an acrylate;

  Crotonic acid / benzyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, crotonic acid / cyclohexyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, crotonic acid / Styrene copolymer reacted with glycidyl (meth) acrylate, Crotonic acid / Methyl crotonic acid copolymer reacted with glycidyl (meth) acrylate, Crotonic acid / N-cyclohexylmaleimide copolymer Resin obtained by reacting glycidyl (meth) acrylate with the coalescence;

  Resin obtained by reacting maleic acid / dicyclopentanyl (meth) acrylate copolymer with glycidyl (meth) acrylate, and resin obtained by reacting maleic acid / benzyl (meth) acrylate copolymer with glycidyl (meth) acrylate , A resin obtained by reacting maleic acid / cyclohexyl (meth) acrylate copolymer with glycidyl (meth) acrylate, a resin obtained by reacting maleic acid / styrene copolymer with glycidyl (meth) acrylate, maleic acid / maleic acid A resin obtained by reacting a copolymer of methyl with glycidyl (meth) acrylate, a resin obtained by reacting a copolymer of maleic acid / N-cyclohexylmaleimide with glycidyl (meth) acrylate;

  Resin obtained by reacting (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / benzyl (meth) Resin obtained by reacting glycidyl (meth) acrylate with a copolymer of acrylate, resin obtained by reacting glycidyl (meth) acrylate with a copolymer of (meth) acrylic acid / maleic anhydride / cyclohexyl (meth) acrylate, Resin obtained by reacting a meth) acrylic acid / maleic anhydride / styrene copolymer with glycidyl (meth) acrylate, and a glycidyl (meth) acrylic acid / maleic anhydride / methyl (meth) acrylate copolymer Resin reacted with (meth) acrylate, (meth) acrylic acid / maleic anhydride / N-cyclohexylmale Glycidyl the copolymer of bromide (meth) resins obtained by reacting an acrylate;

  Resin obtained by reacting (meth) acrylic acid / dicyclopentanyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate, and (meth) acrylic acid / benzyl (meth) acrylate copolymer 3 , 4-Epoxycyclohexylmethyl methacrylate resin, (Meth) acrylic acid / cyclohexyl (meth) acrylate copolymer and 3,4-epoxycyclohexylmethyl methacrylate reaction resin, (Meth) acrylic acid / styrene A resin prepared by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (4), a resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate with a copolymer of (meth) acrylic acid / methyl (meth) acrylate, (Meth) acrylic acid / N-cyclohexyl male Resins obtained by reacting a copolymer in 3,4-epoxycyclohexylmethyl methacrylate bromide;

  Crotonic acid / dicyclopentanyl (meth) acrylate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate; Crotonic acid / benzyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl Resin in which methacrylate is reacted, Resin in which crotonic acid / cyclohexyl (meth) acrylate copolymer is reacted with 3,4-epoxycyclohexylmethyl methacrylate, Crotonic acid / styrene copolymer in 3,4-epoxycyclohexylmethyl Resin reacted with methacrylate, Crotonic acid / methyl crotonate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, Crotonic acid / N-cyclohexylmaleimide copolymer, 3,4-epoxycyclohexyl Methylme Resins obtained by reacting an acrylate;

  A resin obtained by reacting a maleic acid / dicyclopentanyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate, and a maleic acid / benzyl (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl Resin reacted with methacrylate, Resin reacted with 3,4-epoxycyclohexylmethyl methacrylate on maleic acid / cyclohexyl (meth) acrylate copolymer, 3,4-epoxycyclohexylmethyl on maleic acid / styrene copolymer Resin reacted with methacrylate, Resin reacted with 3,4-epoxycyclohexylmethyl methacrylate on copolymer of maleic acid / methyl maleate, 3,4-epoxycyclohexyl on copolymer of maleic acid / N-cyclohexylmaleimide Methylme Resins obtained by reacting an acrylate;

  (Meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / maleic anhydride / benzyl Resin obtained by reacting (meth) acrylate copolymer with 3,4-epoxycyclohexylmethyl methacrylate; (meth) acrylic acid / maleic anhydride / cyclohexyl (meth) acrylate copolymer with 3,4-epoxycyclohexyl Resin in which methyl methacrylate is reacted, Resin in which 3,4-epoxycyclohexylmethyl methacrylate is reacted with a copolymer of (meth) acrylic acid / maleic anhydride / styrene, (meth) acrylic acid / maleic anhydride / Copolymer of methyl (meth) acrylate with 3,4-epoxycyclohexene Examples thereof include a resin obtained by reacting silmethyl methacrylate and a resin obtained by reacting a copolymer of (meth) acrylic acid / maleic anhydride / N-cyclohexylmaleimide with 3,4-epoxycyclohexylmethyl methacrylate.

Furthermore, as the binder resin (A1), (b1) is reacted with an addition polymer obtained by copolymerizing (a2) other than (a1), (a2-1), and (a2-1). More preferably, it is a resin obtained. When the binder resin (A1) has the above configuration, the resulting pattern tends to be excellent in adhesion to the substrate and solvent resistance.
When the addition polymer (a) is composed of (a2) other than (a1), (a2-1), and (a2-1), (a2) other than (a2-1) and (a2-1) The ratio of the derived structural unit is preferably 10:90 to 60:40, more preferably 10:90 to 40:60, and even more preferably 10:90 to 30:70.

  As a resin obtained by reacting (b) with an addition polymer obtained by copolymerizing (a2) other than (a1), (a2-1) and (a2-1), specifically, Resin obtained by reacting glycidyl (meth) acrylate with a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate, (meth) acrylic acid / dicyclopentanyl (meth) acrylate Resin obtained by reacting glycidyl (meth) acrylate with a copolymer of acrylate / cyclohexyl (meth) acrylate and glycidyl (meth) acrylate with a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / styrene The resin, a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / methyl (meth) acrylate Glycidyl (meth) resins obtained by reacting acrylate, (meth) acrylic acid / dicyclopentanyl (meth) acrylate / N- cyclohexyl glycidyl the copolymer of maleimide (meth) resins obtained by reacting an acrylate;

  Crotonic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer, resin obtained by reacting glycidyl (meth) acrylate, crotonic acid / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate A resin obtained by reacting glycidyl (meth) acrylate with a copolymer of the above, a resin obtained by reacting crotonic acid / dicyclopentanyl (meth) acrylate / styrene with a glycidyl (meth) acrylate, and crotonic acid / dicyclo A resin obtained by reacting a glycidyl (meth) acrylate with a copolymer of pentanyl (meth) acrylate / methyl crotonate, and a glycidyl (meth) acrylate with a copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide ) Resin reacted with acrylate;

  Resin obtained by reacting maleic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer with glycidyl (meth) acrylate, maleic acid / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate A resin obtained by reacting glycidyl (meth) acrylate with a copolymer of the above, a resin obtained by reacting maleic acid / dicyclopentanyl (meth) acrylate / styrene with a glycidyl (meth) acrylate, maleic acid / dicyclo A resin obtained by reacting a copolymer of pentanyl (meth) acrylate / methyl maleate with glycidyl (meth) acrylate, and a copolymer of maleic acid / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide, ) Resin reacted with acrylate;

  (Meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride Resin / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate copolymer reacted with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) Resin obtained by reacting acrylate / styrene copolymer with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / methyl (meth) acrylate copolymer Resin reacted with glycidyl (meth) acrylate, (meth) acrylic acid / maleic anhydride / Cyclopentanyl (meth) acrylate / N- cyclohexyl glycidyl the copolymer of maleimide (meth) resins obtained by reacting an acrylate;

  A resin obtained by reacting a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / dicyclopentanyl ( A resin obtained by reacting a copolymer of (meth) acrylate / cyclohexyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, and a copolymer of (meth) acrylic acid / dicyclopentanyl (meth) acrylate / styrene. , 4-Epoxycyclohexylmethyl methacrylate reacted with 3,4-epoxycyclohexylmethyl methacrylate to (meth) acrylic acid / dicyclopentanyl (meth) acrylate / methyl (meth) acrylate copolymer Resin, (meth) acrylic acid / disi Ropentaniru (meth) acrylate / N- cyclohexyl maleimide copolymer resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate;

  A resin obtained by reacting a copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, crotonic acid / dicyclopentanyl (meth) acrylate / cyclohexyl ( Resin of 3,4-epoxycyclohexylmethyl methacrylate reacted with meth) acrylate copolymer, 3,4-epoxycyclohexylmethyl methacrylate reacted with crotonic acid / dicyclopentanyl (meth) acrylate / styrene copolymer Resin, crotonic acid / dicyclopentanyl (meth) acrylate / methyl crotonic acid copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, crotonic acid / dicyclopentanyl (meth) acrylate / N-cyclohex A resin obtained by reacting a copolymer of silmaleimide with 3,4-epoxycyclohexylmethyl methacrylate;

  A resin obtained by reacting a copolymer of maleic acid / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, maleic acid / dicyclopentanyl (meth) acrylate / cyclohexyl ( Resin of 3,4-epoxycyclohexylmethyl methacrylate reacted with meth) acrylate copolymer, 3,4-epoxycyclohexylmethyl methacrylate reacted with maleic acid / dicyclopentanyl (meth) acrylate / styrene copolymer Resin, maleic acid / dicyclopentanyl (meth) acrylate / methyl maleate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, maleic acid / dicyclopentanyl (meth) acrylate / N-cyclohex A resin obtained by reacting a copolymer of silmaleimide with 3,4-epoxycyclohexylmethyl methacrylate;

(Meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / benzyl (meth) acrylate copolymer reacted with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / A resin obtained by reacting a copolymer of maleic anhydride / dicyclopentanyl (meth) acrylate / cyclohexyl (meth) acrylate with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / maleic anhydride / di Resin prepared by reacting cyclopentanyl (meth) acrylate / styrene copolymer with 3,4-epoxycyclohexylmethyl methacrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / (meta ) Copolymer of methyl acrylate with 3,4-epoxycyclohexane Resin reacted with silmethyl methacrylate, (meth) acrylic acid / maleic anhydride / dicyclopentanyl (meth) acrylate / N-cyclohexylmaleimide copolymer, reacted with 3,4-epoxycyclohexylmethyl methacrylate Examples thereof include resins.
These binder resins (A1) may be used alone or in combination of two or more.

  The weight average molecular weight (Mw) in terms of polystyrene of the binder resin (A1) is 8,000 to 100,000, preferably 10,000 to 50,000. If the weight average molecular weight of the resin (B1) is in the above range, the coatability and tackiness tend to be good, the film is less likely to be lost during development, and the non-pixel portion is easily removed during development. Tend to be.

  The acid value of binder resin (A1) becomes like this. Preferably it is 50-200 mg-KOH / g, More preferably, it is 60-190 mg-KOH / g, More preferably, it is 80-180 mg-KOH / g. The acid value is a value measured as the amount (mg) of potassium hydroxide necessary to neutralize 1 g of the binder resin (A1), and can be determined by titration using an aqueous potassium hydroxide solution.

The binder resin (A) contained in the photosensitive resin composition of the present invention is preferably composed only of the above-described binder resin (A1), but other resins as long as the effects of the present invention are not impaired. Can be included. Examples of such a resin include an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, a novolac resin, and a polyamine resin.
When binder resin (A) contains resin other than binder resin (A1), 1-80 mass% is preferable with respect to binder resin (A), and content of binder resin (A1) is 1-50 mass%. Is more preferable.

  The photosensitive resin composition of the present invention contains (B) a polymerizable compound. The (B) polymerizable compound is not particularly limited as long as it is a compound capable of initiating polymerization by an active radical, acid, or the like generated from the (C) polymerization initiator by the action of light or heat. (B) As a polymeric compound, the compound etc. which have a polymerizable carbon-carbon unsaturated bond are mentioned, Preferably a monofunctional monomer, a bifunctional monomer, a trifunctional or more polyfunctional monomer is used.

  Specific examples of the monofunctional monomer include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acrylate, N-vinyl pyrrolidone and the like.

  Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, and bisphenol A. Bis (acryloyloxyethyl) ether, 3-methylpentanediol di (meth) acrylate, and the like.

  Specific examples of the trifunctional or higher polyfunctional monomer include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, and dipentaerythritol. Hexa (meth) acrylate, reaction product of pentaerythritol tri (meth) acrylate and acid anhydride, reaction product of dipentaerythritol penta (meth) acrylate and acid anhydride, V # 1000 manufactured by Osaka Organic Chemical Co., V Examples include urethane acrylates such as # 802, STAR-501, UA-306H, UA-306T, UA-306I manufactured by Kyoeisha Chemical Co., Ltd., and New Frontier R-1150 manufactured by Daiichi Kogyo Seiyaku. Of these, bifunctional monomers, trifunctional or higher polyfunctional monomers are preferably used.

Moreover, the following polymerizable compound can also be added.

  (B) A polymeric compound can be used individually or in combination of 2 or more types.

  (B) 1-50 mass% is preferable with respect to solid content of the photosensitive resin composition, and, as for content of a polymeric compound, 5-30 mass% is more preferable. Further, the ratio of (A) binder resin and (B) polymerizable compound is preferably 50/50 or more and 80/20 or less when expressed as (A) binder resin / (B) polymerizable compound on a mass basis. .

  It is preferable that the ratio of the (A) binder resin and the (B) polymerizable compound be in the above range because tackiness is suppressed and a color filter having no color unevenness tends to be obtained.

The photosensitive resin composition of the present invention contains (C) a polymerization initiator and an initiation assistant.
Examples of (C) the polymerization initiator and the initiation assistant include active radical generators, acid generators, polymerization accelerators, and sensitizers. An active radical generator generates an active radical by the action of light or heat. (C) The polymerization initiator and the initiation assistant include at least an oxime compound, an acyl phosphine oxide compound, and a thioxanthone compound.

かかるオキシム系化合物としては、例えば、Ｎ−ベンゾイルオキシ−１−（４−フェニルスルファニルフェニル）ブタン−１−オン−２−イミン、Ｎ−ベンゾイルオキシ−１−（４−フェニルスルファニルフェニル）オクタン−１−オン−２−イミン、Ｎ−ベンゾイルオキシ−１−（４−フェニルスルファニルフェニル）−３−シクロペンチルプロパン−１−オン−２−イミン、Ｎ−アセトキシ−１−［９−エチル−６−（２−メチルベンゾイル）−９Ｈ−カルバゾール−３−イル］エタン−１−イミン、Ｎ−アセトキシ−１−［９−エチル−６−｛２−メチル−４−（３，３−ジメチル−２，４−ジオキサシクロペンタニルメチルオキシ）ベンゾイル｝−９Ｈ−カルバゾール−３−イル］エタン−１−イミン、Ｎ−アセトキシ−１−［９−エチル−６−（２−メチルベンゾイル）−９Ｈ−カルバゾール−３−イル］−３−シクロペンチルプロパン−１−イミン、Ｎ−ベンゾイルオキシ−１−［９−エチル−６−（２−メチルベンゾイル）−９Ｈ−カルバゾール−３−イル］−３−シクロペンチルプロパン−１−オン−２−イミン等の化合物や、イルガキュア（登録商標）ＯＸＥ０１、ＯＸＥ０２（以上、ＢＡＳＦ社製）、Ｎ−１９１９（ＡＤＥＫＡ社製）等の市販品等が挙げられる。中でもイルガキュア（登録商標）ＯＸＥ０１（ＢＡＳＦ社製）が好ましい。 Examples of the oxime compound include compounds having a partial structure represented by the formula (C-1). In the following formula, * represents a bond.

Examples of such oxime compounds include N-benzoyloxy-1- (4-phenylsulfanylphenyl) butan-1-one-2-imine, N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1 -On-2-imine, N-benzoyloxy-1- (4-phenylsulfanylphenyl) -3-cyclopentylpropan-1-one-2-imine, N-acetoxy-1- [9-ethyl-6- (2 -Methylbenzoyl) -9H-carbazol-3-yl] ethane-1-imine, N-acetoxy-1- [9-ethyl-6- {2-methyl-4- (3,3-dimethyl-2,4- Dioxacyclopentanylmethyloxy) benzoyl} -9H-carbazol-3-yl] ethane-1-imine, N-acetoxy-1- [9- Tyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] -3-cyclopentylpropane-1-imine, N-benzoyloxy-1- [9-ethyl-6- (2-methylbenzoyl)- 9H-carbazol-3-yl] -3-cyclopentylpropan-1-one-2-imine, etc., Irgacure (registered trademark) OXE01, OXE02 (above, manufactured by BASF), N-1919 (produced by ADEKA) And other commercial products. Among them, Irgacure (registered trademark) OXE01 (manufactured by BASF) is preferable.

  Examples of the acylphosphine oxide compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide. Commercial products such as Lucirin (registered trademark) TPO (manufactured by BASF) and Irgacure (registered trademark) 819 (manufactured by BASF) may be used.

  Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxythioxanthone, and the like. Of these, 2,4-diethylthioxanthone is preferable.

  Moreover, as long as the effect of the present invention is not impaired, a polymerization initiator or a polymerization initiation assistant usually used in this field can be further used in combination. As the polymerization initiator or the polymerization initiation assistant, Examples include acetophenone compounds, biimidazole compounds, triazine compounds, benzoin compounds, benzophenone compounds, anthracene compounds, amine compounds, thiazoline compounds, alkoxyanthracene compounds, carboxylic acid compounds, and the like.

  Examples of the acetophenone compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 2-hydroxy-1- [4- (2-hydroxyethoxy) phenyl]. 2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2- (2-methylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-methylbenzyl) -2-dimethylamino -1- (4-morpholinophenyl) -butanone, 2- (4-methylbenzyl) -2-dimethyl Amino-1- (4-morpholinophenyl) -butanone, 2- (2-ethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-propylbenzyl) -2-dimethyl Amino-1- (4-morpholinophenyl) -butanone, 2- (2-butylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2,3-dimethylbenzyl) -2 -Dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2,4-dimethylbenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-chlorobenzyl) 2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-bromobenzyl) -2-dimethylamino-1- (4-moly Holinophenyl) -butanone, 2- (3-chlorobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-chlorobenzyl) -2-dimethylamino-1- (4-morpholino Phenyl) -butanone, 2- (3-bromobenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (4-bromobenzyl) -2-dimethylamino-1- (4-morpholino) Phenyl) -butanone, 2- (2-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (3-methoxybenzyl) -2-dimethylamino-1- (4-morpholino) Phenyl) -butanone, 2- (4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2 -(2-Methyl-4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2- (2-methyl-4-bromobenzyl) -2-dimethylamino-1- (4 -Morpholinophenyl) -butanone, 2- (2-bromo-4-methoxybenzyl) -2-dimethylamino-1- (4-morpholinophenyl) -butanone, 2-hydroxy-2-methyl-1- [4- ( 1-methylvinyl) phenyl] propan-1-one oligomer and the like.

  Examples of the biimidazole compound include 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and 2,2′-bis (2,3-dichlorophenyl)-. 4,4 ′, 5,5′-tetraphenylbiimidazole (see, for example, JP-A-6-75372 and JP-A-6-75373), 2,2′-bis (2-chlorophenyl) -4 , 4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (alkoxyphenyl) biimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (dialkoxyphenyl) biimidazole, 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetra (trialkoxy) Phenyl) biimidazole (for example, see JP-B-48-38403, JP-A-62-174204, etc.), and the phenyl group at the 4,4′5,5′-position is substituted with a carboalkoxy group. Imidazole compounds (see, for example, JP-A-7-10913) and the like, preferably 2,2′-bis (2-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (2,3-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole may be mentioned.

  Examples of the triazine compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4- Methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxy Styryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4 -Bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino- 2-methylphenyl Ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

  Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether.

  Examples of the benzophenone compounds include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (tert-butyl). Peroxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.

  Examples of the anthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene and the like. It is done.

  Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylbenzoate. Aminoethyl, 2-ethylhexyl 4-dimethylaminobenzoate, N, N-dimethylparatoluidine, 4,4′-bis (dimethylamino) benzophenone (commonly known as Michler's ketone), 4,4′-bis (diethylamino) benzophenone, 4, Examples thereof include 4′-bis (ethylmethylamino) benzophenone, and among them, 4,4′-bis (diethylamino) benzophenone is preferable.

Examples of the thiazoline compounds include compounds represented by formula (III-1) to formula (III-3).

  Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, and the like. Can be mentioned.

  Carboxylic acid compounds include phenylsulfanyl acetic acid, methylphenylsulfanyl acetic acid, ethylphenylsulfanyl acetic acid, methylethylphenylsulfanyl acetic acid, dimethylphenylsulfanyl acetic acid, methoxyphenylsulfanyl acetic acid, dimethoxyphenylsulfanyl acetic acid, chlorophenylsulfanyl acetic acid, dichlorophenylsulfanyl acetic acid, N -Phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid and the like.

  In addition, a commercially available brand name “EAB-F” (manufactured by Hodogaya Chemical Co., Ltd.) and the like are exemplified as (C) the polymerization initiator.

  Moreover, the polymerization initiator described in Japanese translations of PCT publication No. 2002-544205 can be used as a polymerization initiator which has group which can raise | generate chain transfer among (C) polymerization initiators.

  The polymerization initiator having a group capable of causing chain transfer can also be used as the constituent component (A3) of the copolymer. And the obtained copolymer can be used also as (A) binder resin.

  Examples of the (C) initiation assistant include the above-described amine compounds, thiazoline compounds, alkoxyanthracene compounds, thioxanthone compounds, carboxylic acid compounds, and a commercially available product name “EAB-F”.

(C) Content of a polymerization initiator and a start adjuvant is an oxime type compound, an acyl phosphine type compound, a thioxanthone type compound with respect to solid content of the photosensitive resin composition, respectively, Preferably it is 1-20 mass%. is there.
The content of (C) the polymerization initiator and the initiation assistant is a mass fraction with respect to the total amount of (A) the binder resin and (B) the polymerizable compound, preferably 0.1 to 40% by mass, More preferably, it is 1-30 mass%.

  (C) When the total amount of the polymerization initiator and the start assistant is in the above range, the photosensitive resin composition becomes highly sensitive, and the strength of the pixel portion of the color filter formed using the photosensitive resin composition In addition, it is preferable because the smoothness on the surface of the pixel tends to be good.

  The photosensitive resin composition of the present invention preferably further contains (E) a colorant. Examples of the colorant (E) include pigments and dyes, but it is preferable to include a pigment from the viewpoint of heat resistance and light resistance.

Examples of the pigment include organic pigments and inorganic pigments, and compounds classified as pigments by Color Index (published by The Society of Dyers and Colorists).
Specific examples of the organic pigment include C.I. I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, Yellow pigments such as 147, 148, 150, 153, 154, 166, 173, 194, 214;
C. I. Orange pigments such as CI Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73;
C. I. Red pigments such as CI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265;
C. I. Blue pigments such as CI Pigment Blue 15, 15: 3, 15: 4, 15: 6, 60; I. Violet color pigments such as CI Pigment Violet 1, 19, 23, 29, 32, 36, 38;
C. I. Green pigments such as CI Pigment Green 7, 36, 58;
C. I. Brown pigments such as CI Pigment Brown 23 and 25;
C. I. And black pigments such as CI Pigment Black 1 and 7.

  Among them, C.I. I. Pigment yellow 138, 139, 150, C.I. I. Pigment red 177, 242, 254, C.I. I. Pigment red violet 23, C.I. I. Pigment blue 15: 3, 15: 6 and C.I. I. Pigment Green 7, 36, 58 is more preferable. These pigments may be used alone or in admixture of two or more.

  The pigment is optionally treated with rosin, surface treatment using a pigment derivative or pigment dispersant introduced with an acidic group or basic group, graft treatment on the pigment surface with a polymer compound, etc., sulfuric acid atomization Atomization treatment by a method or the like, cleaning treatment with an organic solvent or water for removing impurities, removal treatment by ion exchange method of ionic impurities, or the like may be performed. The pigment preferably has a uniform particle size. By carrying out a dispersion treatment by containing a pigment dispersant, a pigment dispersion in which the pigment is uniformly dispersed in the solution can be obtained.

  Commercially available surfactants can be used as the pigment dispersant, and examples thereof include silicone-based, fluorine-based, ester-based, cationic-based, anionic-based, non-ionic, amphoteric, polyester-based, polyamine-based, and acrylic-based. Surfactant etc. are mentioned. Examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid-modified polyesters, tertiary amine-modified polyurethanes, and polyethyleneimines. , KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Floren (manufactured by Kyoeisha Chemical Co., Ltd.), Solpers (manufactured by Zeneca Co., Ltd.), EFKA (manufactured by BASF), Ajisper (registered trademark) (Ajinomoto Fine Techno) (Manufactured by Co., Ltd.), Disperbyk (manufactured by Big Chemie) and the like. These can be used alone or in combination of two or more.

  When a pigment dispersant is used, the amount used is preferably 100% by mass or less, more preferably 5 to 50% by mass, based on the pigment. When the amount of the pigment dispersant used is in the above range, a pigment dispersion in a uniform dispersion state tends to be obtained.

  (E) Content of a coloring agent becomes like this. Preferably it is 5-60 mass% with respect to solid content of the photosensitive resin composition, More preferably, it is 5-45 mass%. (E) When the content of the colorant is within the above range, a desired spectrum and color density can be obtained.

The solvent (D) in the photosensitive resin composition of the present invention has a solubility parameter of 8.0 to 9.1 (cal / cm ³ ) ^1/2 and a solubility parameter of 9.2 to 11.0 (cal / Cm ³ ) ^1/2 .
Solvents having a solubility parameter of 8.0 to 9.1 (cal / cm ³ ) ^1/2 include ethylene glycol mono i-butyl ether, diethylene glycol mono 2-ethylhexyl ether, dipropylene glycol mono n-propyl ether, dipropylene Glycol mono n-butyl ether, tripropylene glycol mono n-propyl ether, tripropylene glycol mono n-butyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol di n-butyl ether, triethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, Diethylene glycol mono n-butyl ether acetate, propylene Glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate, ethyl-3-ethoxypropionate, npropyl acetate, npropyl propionate, nbutyl propionate, npentyl propionate, methyl isobutyl ketone, cyclohexane, toluene, Examples include ethyl acetate, butyl acetate, tetrahydrofuran, carbon tetrachloride, and 2-heptanone. Among these, propylene glycol monomethyl ether acetate is preferable from the viewpoint of solubility.

Solvents having a solubility parameter of 9.2 to 11.0 (cal / cm ³ ) ^1/2 include ethylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol mono n-butyl ether, ethylene glycol monohexyl ether. , Ethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, ethylene glycol monoallyl ether, diethylene glycol monomethyl ether, diethylene glycol mono n-butyl ether, diethylene glycol monohexyl ether, diethylene glycol mono 2-ethylhexyl ether, diethylene glycol monobenzyl ether, triethylene glycol monomethyl ether Ether, triethylene glycol monoethyl ether Ter, triethylene glycol mono n-butyl ether, polyethylene glycol monomethyl ether, propylene glycol monomethyl ether, propylene glycol mono n-propyl ether, propylene glycol mono n-butyl ether, propylene glycol mono t-butyl ether, propylene glycol monophenyl ether, dipropylene Glycol monomethyl ether, tripropylene glycol monomethyl ether, ethylene glycol mono n-butyl ether acetate, propylene glycol diacetate, methyl-3-methoxypropionate, methyl lactate, butyl lactate, cyclohexanone, diacetone alcohol, 1-propanol, 1-propanol Butanol, methyl ethyl ketone, dioxane, dichloromethane, Chloroform, dimethyl sulfoxide, acetone, dimethyl carbonate, 1,1,2,2-tetrachloroethane, and the like. Among these, propylene glycol monomethyl ether is preferable from the viewpoint of solubility.

(D) The content of the solvent is preferably 70% by mass or more of the solvent having a solubility parameter of 8.0 to 9.1 (cal / cm ³ ) ^1/2 with respect to the total solvent of the photosensitive resin composition. 99% by mass or less and a solubility parameter of 9.2 to 11.0 (cal / cm ³ ) ^1/2 is 1% by mass or more and 30% by mass or less, and more preferably, the solubility parameter is 8.0 to 8.0%. The solvent which is 9.1 (cal / cm ³ ) ^1/2 is 70% by mass to 97% by mass, and the solvent whose solubility parameter is 9.2 to 11.0 (cal / cm ³ ) ^1/2 is ³ %. % To 30% by mass. When the ratio by mass% of the solvent is within the above range, the solubility and flatness during application tend to be good.

The solubility parameter is determined by the following formula.
Solubility parameter = (ΔE / V) ^1/2
ΔE: cohesive energy (evaporation enthalpy), V: molar volume

(D) The solvent is used in the synthesis of the (A) binder resin, and the solubility parameter is 8.0 to 9.1 (cal / cm ³ ) ^1/2 when adjusting as a photosensitive resin composition. One solvent may be 70% by mass or more and 99% by mass or less, and a solvent whose solubility parameter is 9.2 to 11.0 (cal / cm ³ ) ^1/2 may be 1% by mass or more and 30% by mass or less.

  (D) Content of a solvent becomes like this. Preferably it is 60-95 mass% with respect to the photosensitive resin composition, More preferably, it is 70-90 mass%. In other words, the solid content of the photosensitive resin composition is preferably 5 to 40% by mass, and more preferably 10 to 30% by mass. (D) When content of a solvent exists in the said range, there exists a tendency for the flatness at the time of application | coating to become favorable.

  The photosensitive resin composition of the present invention may contain (F) a surfactant. Examples of the surfactant include a silicone surfactant, a fluorine surfactant, a silicone surfactant having a fluorine atom, and the like. By including the surfactant, the flatness during application tends to be good.

  Examples of the silicone surfactant include surfactants having a siloxane bond. Specifically, Torre Silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH29PA, SH30PA, polyether-modified silicone oil SH8400 (trade name: manufactured by Toray Dow Corning Co., Ltd.), KP321, KP322 , KP323, KP324, KP326, KP340, KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (Momentive Performance Materials Japan GK) Manufactured) and the like.

  Examples of the fluorosurfactant include surfactants having a fluorocarbon chain. Specifically, Florinart (registered trademark) FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.), MegaFac (registered trademark) F142D, F171, F172, F173, F177, F183, R183 (DIC) ), Ftop (registered trademark) EF301, EF303, EF351, EF351, EF352 (manufactured by Mitsubishi Materials Denkasei), Surflon (registered trademark) S381, S382, SC101, SC105 (Asahi Glass) And E5844 (Daikin Industries, Ltd.).

  Examples of the silicone-based surfactant having a fluorine atom include surfactants having a siloxane bond and a fluorocarbon chain. Specifically, Megafac (registered trademark) R08, BL20, F475, F477, F443 (manufactured by DIC Corporation) and the like can be mentioned. Preferably, MegaFac (registered trademark) F475 is used.

  The surfactant is preferably 0.001% by mass or more and 0.3% by mass or less, more preferably 0.002% by mass or more and 0.2% by mass or less, particularly preferably based on the photosensitive resin composition. It is 0.01 mass% or more and 0.1 mass% or less. By containing the surfactant in this range, the flatness of the coating film can be improved.

  The photosensitive resin composition of the present invention contains various additives such as fillers, other polymer compounds, adhesion promoters, antioxidants, ultraviolet absorbers, light stabilizers, chain transfer agents and the like as necessary. May be included.

  The photosensitive resin composition of the present invention comprises (A) a binder resin, (B) a polymerizable compound, and (C) a polymerization initiator in the presence of (E) a colorant, (D) a solvent, and other components as necessary. And an initiating aid.

Moreover, when mixing a pigment as (E) colorant, it is preferable to prepare in the following procedures, for example.
First, the pigment is mixed with a solvent (D) in advance and dispersed using a bead mill or the like until the average particle diameter of the pigment is about 0.2 μm or less. Under the present circumstances, you may mix | blend a pigment dispersant and a part or all of (A) binder resin as needed. In the obtained pigment dispersion, (A) the remainder of the binder resin, (B) a polymerizable compound, (C) a polymerization initiator, and other components used as necessary, and further an additional solvent if necessary. The photosensitive resin composition can be obtained by adding to a predetermined concentration.

  Examples of the method for applying the photosensitive resin composition of the present invention to a substrate include an extrusion coating method, a direct gravure coating method, a reverse gravure coating method, a CAP (cap) coating method, and a die coating method. Apply using a coating device such as a dip coater, roll coater, bar coater, spin coater, slit & spin coater, slit coater (sometimes called a die coater, curtain flow coater, or spinless coater) or inkjet. Also good. Especially, it is preferable to apply using a slit coater, a spin coater, a roll coater or the like.

Examples of the method for drying the film applied to the substrate include methods such as heat drying, natural drying, ventilation drying, and reduced pressure drying, but a plurality of methods may be combined.
As drying temperature, 10-120 degreeC is preferable and 25-100 degreeC is more preferable. In addition, the heating time is preferably 10 seconds to 60 minutes, and more preferably 30 seconds to 30 minutes.
The vacuum drying is preferably performed at a temperature of 20 to 25 ° C. under a pressure of 50 to 150 Pa.
The film thickness of the coating film after drying is not particularly limited and can be appropriately adjusted depending on the material used, application, etc., and is, for example, 0.1 to 20 μm, preferably 1 to 6 μm.

The coating film after drying is exposed through a photomask for forming a target pattern. The pattern shape on the photomask at this time is not particularly limited, and a pattern shape corresponding to the intended application is used.
The light source used for exposure is preferably a light source that generates light having a wavelength of 250 to 450 nm. For example, light less than 350 nm can be cut using a filter that cuts this wavelength range, or light near 436 nm, 408 nm, and 365 nm can be selectively extracted using a bandpass filter that extracts these wavelength ranges. Or you may. Specific examples of the light source include a mercury lamp, a light emitting diode, a metal halide lamp, and a halogen lamp.
It is preferable to use an apparatus such as a mask aligner or a stepper because the entire exposed surface can be irradiated with parallel light rays uniformly or the mask and the substrate can be accurately aligned.

After exposure, the coating film is brought into contact with a developer to dissolve a predetermined portion, for example, an unexposed portion, and developed, whereby a pattern can be obtained. As the developer, an organic solvent can be used, but it is preferable to use an aqueous solution of an alkaline compound because the exposed portion of the coating film is hardly dissolved or swollen by the developer and a pattern having a good shape can be obtained. .
The developing method may be any of paddle method, dipping method, spray method and the like. Further, the substrate may be tilted at an arbitrary angle during development.
After development, it is preferable to wash with water.

Examples of the alkaline compound include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium silicate, potassium silicate, sodium carbonate, Inorganic alkaline compounds such as potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium borate, potassium borate, ammonia; tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, mono Examples include organic alkaline compounds such as ethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, and ethanolamine. Of these, potassium hydroxide, sodium hydrogen carbonate and tetramethylammonium hydroxide are preferable.
The density | concentration in the aqueous solution of these inorganic and organic alkaline compounds becomes like this. Preferably it is 0.01-10 mass%, More preferably, it is 0.03-5 mass%.

The aqueous solution of the alkaline compound may contain a surfactant.
Surfactants include polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkyl aryl ether, other polyoxyethylene derivatives, oxyethylene / oxypropylene block copolymers, sorbitan fatty acid esters, polyoxyethylene sorbitan fatty acid esters , Nonionic surfactants such as polyoxyethylene sorbitol fatty acid ester, glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine;
Anionic surfactants such as sodium lauryl alcohol sulfate, sodium oleyl alcohol sulfate, sodium lauryl sulfate, ammonium lauryl sulfate, sodium dodecylbenzenesulfonate, sodium dodecylnaphthalenesulfonate;
And cationic surfactants such as stearylamine hydrochloride and lauryltrimethylammonium chloride.
The concentration of the surfactant in the aqueous solution of the alkaline compound is preferably 0.01 to 10% by mass, more preferably 0.05 to 8% by mass, and particularly preferably 0.1 to 5% by mass.

  In the present invention, the step of heating and holding after development can be omitted. If necessary, a step of heating and holding can be included.

  In the present invention, the temperature of the heating and holding step is usually 23 ° C. or higher and 200 ° C. or lower, preferably 25 ° C. or higher and 180 ° C. or lower, more preferably 25 ° C. or higher and 160 ° C. or lower, and further preferably 25 ° C. or higher and 120 ° C. or lower. It is below ℃. As time to heat and hold | maintain, it is 1 to 300 minutes normally, Preferably it is 1 to 180 minutes, More preferably, it is 1 to 60 minutes.

  If the step of heating and holding can be omitted, the number of steps can be reduced and the manufacturing cost can be reduced. Moreover, if the process of heating and holding can be omitted, a film substrate can be used and a flexible display can be manufactured.

  The photosensitive composition of the present invention makes it possible to obtain a good pattern such as color density, brightness, contrast, sensitivity, resolution, heat resistance, and a color filter including the pattern. In addition, these color filters or patterns are used in devices related to colored images, such as a known liquid crystal display device, organic EL device, solid-state imaging device, electronic paper, etc. Can be used in a known manner.

<Synthesis of binder resin solution A1>
67 parts by weight of propylene glycol monomethyl ether acetate and 33 parts by weight of propylene glycol monomethyl ether were placed in a flask equipped with a stirrer, a dropping funnel, a condenser, a thermometer, and a gas introduction tube. . Next, a monomer mixture composed of 11 parts by weight of tricyclodecanyl methacrylate, 31 parts by weight of benzyl methacrylate and 23 parts by weight of methacrylic acid is added with perbutyl O (t-butylperoxy 2-ethylhexanate, manufactured by NOF Corporation) as a monomer. One part by weight was added to 100 parts by weight of the mixture. This was dropped into the flask over 2 hours from the dropping funnel, and further stirred at 120 ° C. for 2 hours to obtain a copolymer. Next, the inside of the flask is replaced with air, and 10 parts by weight of glycidyl methacrylate, 0.46 parts by weight of triphenylphosphine, and 0.08 parts by weight of methylhydroquinone are put into the above copolymer solution and reacted at 120 ° C. When the solid content acid value reached 150 KOHmg / g, the reaction was terminated, and by adding 75 parts by weight of propylene glycol monomethyl ether acetate and 5 parts by weight of propylene glycol monomethyl ether, a binder resin capable of alkali development having a nonvolatile content of 30%. (Mw: 30000) Solution A1 was obtained.

<Synthesis of binder resin solution A2>
67 parts by weight of propylene glycol monomethyl ether acetate and 33 parts by weight of propylene glycol monomethyl ether were placed in a flask equipped with a stirrer, a dropping funnel, a condenser, a thermometer, and a gas introduction tube. . Next, a monomer mixture consisting of 10 parts by weight of tricyclodecanyl methacrylate, 34 parts by weight of benzyl methacrylate, and 20 parts by weight of methacrylic acid is added with perbutyl O (t-butylperoxy 2-ethylhexanate, manufactured by NOF Corporation) as a monomer. One part by weight was added to 100 parts by weight of the mixture. This was dropped into the flask over 2 hours from the dropping funnel, and further stirred at 120 ° C. for 2 hours to obtain a copolymer. Next, the atmosphere in the flask was replaced with air, and 10 parts by weight of glycidyl methacrylate, 0.44 parts by weight of triphenylphosphine, and 0.08 parts by weight of methylhydroquinone were charged into the copolymer solution and reacted at 120 ° C. When the solid content acid value reached 130 KOHmg / g, the reaction was terminated, and by adding 74 parts by weight of propylene glycol monomethyl ether acetate and 5 parts by weight of propylene glycol monomethyl ether, an alkali developable binder resin having a nonvolatile content of 30% (Mw: 30000) Solution A2 was obtained.

<Synthesis of Binder Resin Solution A3> Resin A described in JP2010-140042A
After introducing 182 g of propylene glycol monomethyl ether acetate into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel and a nitrogen introduction tube, and changing the atmosphere in the flask from air to nitrogen, the temperature was raised to 100 ° C., 70.5 g (0.40 mol) of benzyl methacrylate, 43.0 g (0.5 mol) of methacrylic acid, 22.0 g (0.10 mol) of monomethacrylate having a tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.) ) And propylene glycol monomethyl ether acetate (136 g) in a solution obtained by adding 3.6 g of azobisisobutyronitrile to the flask from the dropping funnel over 2 hours, and further stirring at 100 ° C. for 5 hours. Next, the atmosphere in the flask was changed from nitrogen to air, and 35.5 g of glycidyl methacrylate [0.25 mol, (50 mol% with respect to the carboxyl group of methacrylic acid used in this reaction)], trisdimethylaminomethylphenol, 0.5%. 9 g and 0.145 g of hydroquinone were charged into the flask, and the reaction was continued at 110 ° C. for 6 hours to obtain a binder resin solution A3 (Mw: 13000) having a solid content acid value of 79 mgKOH / g.

<Synthesis of binder resin solution A4>
After introducing 591 parts of propylene glycol monomethyl ether acetate into a flask equipped with a stirrer, thermometer, reflux condenser, dropping funnel and nitrogen inlet tube, the atmosphere in the flask was changed from air to nitrogen, and then heated to 110 ° C. , 17.6 parts of benzyl methacrylate, 113.7 parts of glycidyl methacrylate, and 22.0 parts of monomethacrylate having a tricyclodecane skeleton (FA-513M manufactured by Hitachi Chemical Co., Ltd.) were added to propylene glycol monomethyl ether acetate 153. A solution obtained by adding 3.6 parts of azobisisobutyronitrile to the part was dropped into the flask over 2 hours from the dropping funnel, and the stirring was further continued at 100 ° C. for 2 hours. Next, the atmosphere in the flask was changed from nitrogen to air, 68.9 parts of methacrylic acid, 0.9 g of trisdimethylaminomethylphenol and 0.145 parts of hydroquinone were put into the flask, and the reaction was continued at 110 ° C. for 6 hours to obtain a solid. The reaction was terminated when the acid value reached 1 mgKOH / g.
Next, 53.3 parts of tetrahydrophthalic anhydride and 0.8 part of triethylamine were added and reacted at 120 ° C. for 3.5 hours to obtain a binder having a solid content of 37.9% and an acid value of 68.6 mgKOH / g (in terms of solid content). Resin solution A4 (Mw: 7900) was obtained.

<Synthesis of binder resin solution A5>
An appropriate amount of nitrogen was flowed into a 1 L flask equipped with a reflux condenser, a dropping funnel and a stirrer to form a nitrogen atmosphere, and 100 parts by weight of propylene glycol monomethyl ether acetate was added and heated to 85 ° C. with stirring. Next, 19 parts by weight of methacrylic acid, 3,4-epoxytricyclo [5.2.1.0 ^2.6 ] decyl acrylate (the compound represented by the formula (I-1) and the formula (II) -1), a solution prepared by dissolving 171 parts by weight of the compound represented by 40 parts by weight of propylene glycol monomethyl ether acetate was added dropwise over about 5 hours using a dropping pump, while the polymerization initiator 2,2′-azobis ( A solution prepared by dissolving 26 parts by weight of 2,4-dimethylvaleronitrile) in 120 parts by weight of propylene glycol monomethyl ether acetate was dropped into the flask over about 5 hours using another dropping pump. After that, the mixture was kept at the same temperature for about 3 hours, and then cooled to room temperature, so that a solid content of 43.5% by weight and an acid value of 52 mgKOH / g (solid content conversion) A dander resin solution A5 (Mw: 8000) was obtained.

The weight average molecular weight (Mw) of the binder resin solution obtained in the synthesis example was measured using the GPC method under the following conditions.
Apparatus: K2479 (manufactured by Shimadzu Corporation)
Column: SHIMADZU Shim-pack GPC-80M
Column temperature: 40 ° C
Solvent: THF (tetrahydrofuran)
Flow rate: 1.0 mL / min
Detector: RI

Example 1
[Preparation of photosensitive resin composition 1]
Coloring agent (E): C.I. I. 15 pigment red 242,
Coloring agent (E): C.I. I. 20 parts of Pigment Red 177
14 parts acrylic pigment dispersant,
10 parts of binder resin solution (A1) (in terms of solid content) and 191 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
280 parts of binder resin solution (A1);
Polymerizable compound (B): glycerol 1,3-diglycerolate diacrylate (GDDA; manufactured by Aldrich) 40 parts;
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 4.0 parts;
Polymerization initiator (C): Bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 8.0 parts;
Polymerization initiation aid (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.0 parts;
Solvent (D): 409 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 1 was obtained.
The solvent of the obtained photosensitive resin composition was 92.7% by mass of propylene glycol monomethyl ether acetate and 7.3% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

Example 2
[Preparation of photosensitive resin composition 2]
Coloring agent (E): C.I. I. Pigment Green 58 43 parts,
Coloring agent (E): C.I. I. 24 parts of Pigment Yellow 138,
12 parts acrylic pigment dispersant,
26 parts of binder resin solution (A1) (solid content conversion) and 390 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
133 parts of binder resin solution (A1);
Polymerizable compound (B): 44 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 11 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 8.8 parts;
Polymerization initiation assistant (C): Diethylthioxanthone (KAYACURE (registered trademark) DETX-S manufactured by Nippon Kayaku Co., Ltd.) 11 parts;
Solvent (D): 322 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 2 was obtained.
The solvent of the obtained photosensitive resin composition was 96.4% by mass of propylene glycol monomethyl ether acetate and 3.6% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 60/40 in conversion of solid content.

Example 3
[Preparation of photosensitive resin composition 3]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A1) (solid content conversion) 8.3 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
248 parts of binder resin solution (A1);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate (KAYARAD (registered trademark) DPHA Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 507 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 3 was obtained.
The solvent of the obtained photosensitive resin composition was 93.7% by mass of propylene glycol monomethyl ether acetate and 6.3% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

Example 4
[Preparation of photosensitive resin composition 4]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A2) (solid content conversion) 7.4 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
209 parts of binder resin solution (A2);
Polymerizable compound (B): Dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.) 47 parts;
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 530 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 4 was obtained.
The solvent of the obtained photosensitive resin composition was 94.7% by mass of propylene glycol monomethyl ether acetate and 5.3% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A2) and polymeric compound (B) was 60/40 in conversion of solid content.

Example 5
[Preparation of photosensitive resin composition 5]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
7.4 parts of binder resin solution (A1) (solid content conversion) and 140 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
268 parts of binder resin solution (A1);
Polymerizable compound (B): dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.) 29 parts;
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 494 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 5 was obtained.
The solvent of the obtained photosensitive resin composition was 93.2% by mass of propylene glycol monomethyl ether acetate and 6.8% by mass of propylene glycol monomethyl ether in all the solvents. The ratio of the binder resin (A1) and the polymerizable compound (B) was 75/25 in terms of solid content.

Example 6
[Preparation of photosensitive resin composition 6]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A1) (solid content conversion) 8.3 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
248 parts of binder resin solution (A1);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 190 parts of propylene glycol monomethyl ether Solvent (D): 317 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) 0.5 part was mixed and the photosensitive resin composition 6 was obtained.
The solvent of the obtained photosensitive resin composition was 70.7% by mass of propylene glycol monomethyl ether acetate and 29.3% by mass of propylene glycol monomethyl ether in all the solvents. The ratio of the binder resin (A2) and the polymerizable compound (B) was 70/30 in terms of solid content.

Example 7
[Preparation of photosensitive resin composition 7]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A1) (solid content conversion) 8.3 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
248 parts of binder resin solution (A1);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide (Lucirin (registered trademark) TPO; manufactured by BASF Japan) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 190 parts of propylene glycol monomethyl ether Solvent (D): 317 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) 0.5 part was mixed and the photosensitive resin composition 7 was obtained.
The solvent of the obtained photosensitive resin composition was 70.7% by mass of propylene glycol monomethyl ether acetate and 29.3% by mass of propylene glycol monomethyl ether in all the solvents. The ratio of the binder resin (A2) and the polymerizable compound (B) was 70/30 in terms of solid content.

Comparative Example 8
[Preparation of photosensitive resin composition 8]
Coloring agent (E): C.I. I. Pigment Green 36 55 parts,
Coloring agent (E): C.I. I. 24 parts of Pigment Yellow 150,
10 parts acrylic pigment dispersant,
20 parts of binder resin solution (A3) (solid content conversion) and 260 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
Binder resin solution (A3) (solid content conversion) 46 parts;
Polymerizable compound (B): 57 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 15 parts;
Polymerization initiation aid (C):
5,4′-di (N, N-diethylamino) -benzphenone (EAB-F manufactured by Hodogaya Chemical Co., Ltd.) 5 parts;
Solvent (D): Propylene glycol monomethyl ether acetate 500 parts; and Surfactant (F): Polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) 0.5 part;
Epoxy resin: SUMI-EPOXY
ESCN-195XL (Sumitomo Chemical Co., Ltd.) 6.1 parts;
Were mixed to obtain a photosensitive resin composition 8.
The solvent of the obtained photosensitive resin composition was 100% by mass of propylene glycol monomethyl ether acetate in all the solvents. The ratio of the binder resin (A3) and the polymerizable compound (B) was 46/57 in terms of solid content.

Comparative Example 9
[Preparation of photosensitive resin composition 9]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
7.4 parts of binder resin solution (A1) (solid content conversion) and 140 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
274 parts of binder resin solution (A1);
Polymerizable compound (B): dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.) 38 parts;
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 6.4 parts;
Polymerization initiation aid (C): Diethylthioxanthone (KAYACURE (registered trademark) DETX-S manufactured by Nippon Kayaku Co., Ltd.) 2.6 parts;
Solvent (D): 489 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 9 was obtained.
The solvent of the obtained photosensitive resin composition was 93.0% by mass of propylene glycol monomethyl ether acetate and 7.0% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

Comparative Example 10
[Preparation of photosensitive resin composition 10]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A4) (solid content conversion) 7.4 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
197 parts of a binder resin solution (A4);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Photopolymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts ;
Photopolymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (F): 559 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 10 was obtained.
The solvent of the obtained photosensitive resin composition was 100% by mass of propylene glycol monomethyl ether acetate in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

Comparative Example 11
[Preparation of photosensitive resin composition 11]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
7.4 parts of binder resin solution (A5) (solid content conversion) and 140 parts of propylene glycol monomethyl ether acetate are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
171 parts of binder resin solution (A5);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Photopolymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts ;
Photopolymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (F): 584 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) Composition 11 was obtained.
The solvent of the obtained photosensitive resin composition was 100% by mass of propylene glycol monomethyl ether acetate in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

Comparative Example 12
[Preparation of photosensitive resin composition 12]
Coloring agent (E): C.I. I. Pigment Blue 15: 6 27 parts,
Coloring agent (E): C.I. I. 0.5 parts of Pigment Violet 23,
10 parts acrylic pigment dispersant,
Binder resin solution (A1) (solid content conversion) 8.3 parts and propylene glycol monomethyl ether acetate 140 parts are mixed, and a pigment dispersion in which the pigment is sufficiently dispersed using a bead mill;
248 parts of binder resin solution (A1);
Polymerizable compound (B): 35 parts of dipentaerythritol hexaacrylate KAYARAD (registered trademark) DPHA (manufactured by Nippon Kayaku Co., Ltd.);
Polymerization initiator (C): N-benzoyloxy-1- (4-phenylsulfanylphenyl) octane-1-one-2-imine (Irgacure (registered trademark) OXE-01; manufactured by BASF Japan Ltd.) 5.8 parts;
Polymerization initiator (C): bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (Irgacure (registered trademark) 819; manufactured by BASF Japan Ltd.) 9.4 parts;
Polymerization initiation assistant (C): diethylthioxanthone (KAYACURE (registered trademark) DETX-S, Nippon Kayaku Co., Ltd.) 4.7 parts;
Solvent (D): 231 parts of propylene glycol monomethyl ether Solvent (D): 275 parts of propylene glycol monomethyl ether acetate; and surfactant (F): polyether-modified silicone oil (Toray Silicone SH8400; manufactured by Toray Dow Corning Co., Ltd.) 0.5 part was mixed and the photosensitive resin composition 12 was obtained.
The solvent of the obtained photosensitive resin composition was 65.0% by mass of propylene glycol monomethyl ether acetate and 35.0% by mass of propylene glycol monomethyl ether in all the solvents. Moreover, the ratio of binder resin (A1) and polymeric compound (B) was 70/30 in conversion of solid content.

<Pattern preparation>
A PET film (Toray Lumirror 75-T60) was bonded onto a 2-inch square glass plate to prepare a substrate. The photosensitive resin composition obtained above was applied to the PET film side of the substrate by spin coating, and prebaked at 80 ° C. for 2 minutes on a hot plate. After allowing to cool, the substrate coated with the curable composition was exposed on the entire surface of the substrate with an exposure amount (365 nm standard) of 150 mJ / cm ^{2 in} an air atmosphere using an exposure machine (TME-150RSK; manufactured by Topcon Corporation). Irradiated with light. Note that a photomask having a line and space pattern of 10 to 100 μm was used. After light irradiation, the pattern was developed by immersing in an aqueous developer containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 23 ° C. for 50 seconds and washing with pure water. A coating film was obtained. It was 2 micrometers when the film thickness of the obtained pattern coating film was measured using the film thickness measuring apparatus (DEKTAK3; Nippon Vacuum Technology Co., Ltd. product).

<Resolution evaluation>
The obtained pattern was observed with a laser microscope (manufactured by Axio Imager MAT Carl Zeiss), and the minimum dimension resolved was taken as the resolution. The higher the resolution, the more fine color filter can be used for manufacturing.

<Development unevenness evaluation>
The obtained pattern was observed with a laser microscope (Axio Imager MAT, Carl Zeiss). A pattern having no water spots on the pattern was ○ (development unevenness was not seen), and a pattern having water spots was x (development unevenness). Can be seen). When development unevenness is observed, color unevenness occurs when used for manufacturing a color filter.

<Solvent resistance evaluation>
1 ml of propylene glycol monomethyl ether acetate was dropped on the pattern formed on the substrate, and after standing still for 30 seconds, the spin coater was used to rotate at 1000 rpm for 10 seconds, and the propylene glycol monomethyl ether acetate on the pattern was shaken off. .
The film thickness retention was calculated from the film thickness values measured before and after contact with propylene glycol monomethyl ether acetate according to the following formula. The higher the film thickness retention, the better the curability, and the color mixing can be prevented and the development unevenness can be improved when used for manufacturing a color filter.
(Thickness retention) (%) = (film thickness after contact) / (film thickness before contact)

<Preparation of solid coating film (full exposure coating film)>
A PET film (Toray Lumirror 75-T60) was bonded onto a 2-inch square glass plate to prepare a substrate. The photosensitive resin composition obtained above was applied to the PET film side of the substrate by spin coating, and prebaked at 80 ° C. for 2 minutes on a hot plate. After allowing to cool, the substrate coated with the curable composition was exposed on the entire surface of the substrate with an exposure amount (365 nm standard) of 150 mJ / cm ^{2 in} an air atmosphere using an exposure machine (TME-150RSK; manufactured by Topcon Corporation). Irradiated with light. Note that the entire surface was exposed without using a photomask. It was 2 micrometers when the film thickness of the obtained coating film was measured using the film thickness measuring apparatus (DEKTAK3; Nippon Vacuum Technology Co., Ltd. product).

<Cross cut test>
About the obtained coating film, the tape peeling test (cross-cut test) according to JISK5600-5-6 was performed, and adhesiveness with PET film was evaluated. The results are shown in Tables 1 and 2.

<Pencil hardness>
About the obtained coating film, the measurement of the pencil hardness according to JIS-K5400 was performed using the pencil scratch hardness tester (made by Yasuda Seiki Seisakusyo Co., Ltd.). The load was 1,000 g.

<Tack evaluation>
The photosensitive resin composition obtained above is applied to a 5 cm square PET film (Toray Lumirror 75-T60) using a film applicator (AP75, manufactured by Dazai Equipment Co., Ltd.), and heated on a hot plate at 80 ° C. for 2 minutes. Pre-baked. After allowing to cool, a 5 cm square PET film (Toray Lumirror 75-T60) not coated on the surface coated with this curable composition was bonded, and then an uncoated 5 cm square PET film (Toray Lumirror 75-) T60) was peeled off. The coated PET film has no unevenness, and the uncoated PET film has no transfer (no tackiness), and the coated PET film has unevenness and is further transferred to the uncoated PET film Those with a mark were evaluated as x (tackiness was observed). When tackiness is observed, color unevenness occurs when used for manufacturing a color filter.

According to the present invention, it is possible to provide a photosensitive resin composition that gives a pattern having satisfactory hardness and tackiness.
By using the photosensitive resin composition of the present invention, a high resolution pattern with improved development unevenness can be obtained. The pattern obtained by the present invention is useful as a color filter for display used in a liquid crystal display device, an organic EL display device, an electronic paper display device and the like.

Claims (11)

A photosensitive resin composition containing (A) a binder resin, (B) a polymerizable compound, (C) a polymerization initiator and an initiation assistant, and (D) a solvent, and (A) the weight average molecular weight of the binder resin is 8. (C) the polymerization initiator or initiator aid contains at least an oxime compound, an acyl phosphine oxide compound, and a thioxanthone compound, and (D) the solvent has a solubility parameter. Is 8.0 to 9.1 (cal / cm ³ ) ^1/2 , and the solvent has a solubility parameter of 9.2 to 11.0 (cal / cm ^3). ) A photosensitive resin composition containing 1% by mass or more and 30% by mass or less of a solvent that is ^1/2 .   (A) The photosensitive resin composition of Claim 1 whose solid content acid value of binder resin is 80-200. The ratio of (A) binder resin to (B) polymerizable compound is 50/50 or more and 80/20 or less when expressed as (A) binder resin / (B) polymerizable compound on a mass basis. The photosensitive resin composition as described.   Furthermore, (E) The photosensitive resin composition in any one of Claim 1 to 3 containing a coloring agent.   5. The photosensitive resin composition according to claim 1, further comprising (F) a leveling agent, wherein the leveling agent amount is 0.001% by mass or more and 0.3% by mass or less.   The pattern formed with the photosensitive resin composition in any one of Claims 1-5. Applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent, and forming a coating film;
A method for producing a pattern, comprising: exposing the coating film after masking, and removing a non-exposed portion of the coating film with a developer. Applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent to form a coating film, and exposing the coating film after masking, A method for producing a pattern, comprising only a step of removing an unexposed portion of a coating film with a developer. Applying the photosensitive resin composition according to any one of claims 1 to 5 on a support, removing the solvent, and forming a coating film;
The coating film is exposed after masking, the step of removing the unexposed portion of the coating film with a developer, and the coating film with the unexposed portion removed with the developer are maintained at a temperature of 23 ° C. or more and 200 ° C. or less. The manufacturing method of the pattern characterized by including a process.   A color filter comprising the pattern according to claim 6.   The color filter containing the pattern obtained by the manufacturing method in any one of Claims 7-9.