JP2013257599A - 広帯域顕微鏡用カタジオプトリック結像系 - Google Patents
広帯域顕微鏡用カタジオプトリック結像系 Download PDFInfo
- Publication number
- JP2013257599A JP2013257599A JP2013207679A JP2013207679A JP2013257599A JP 2013257599 A JP2013257599 A JP 2013257599A JP 2013207679 A JP2013207679 A JP 2013207679A JP 2013207679 A JP2013207679 A JP 2013207679A JP 2013257599 A JP2013257599 A JP 2013257599A
- Authority
- JP
- Japan
- Prior art keywords
- objective system
- mangin mirror
- lens element
- objective
- assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
- G02B21/04—Objectives involving mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/02—Objectives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Lenses (AREA)
- Microscoopes, Condenser (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
【解決手段】合焦レンズ素子及び各視野レンズ素子は、同じ単一のガラス素材から形成され、マンジャンミラー集合体、視野レンズ素子集合体及び合焦レンズ素子集合体の全ての構成要素は、受け取る光エネルギの軸線に沿って整列され、前記マンジャンミラー集合体において、前記1個または複数個のマンジャンミラー素子の2個の反射面は、前記受け取る光エネルギの軸線に沿って非ゼロ距離の離れた鏡面である対物系。
【選択図】なし
Description
Claims (12)
- 対物系であって、
1個または複数個の合焦レンズ素子を含み、入射光エネルギを受け取り合焦光エネルギを出射するように構成された合焦レンズ素子集合体であって、各合焦レンズ素子の直径が100mm未満である合焦レンズ素子集合体と、
1個または複数個の視野レンズ素子を含む視野レンズ素子集合体であって、各視野レンズ素子の直径が100mm未満であり、各視野レンズ素子が、前記合焦光エネルギを受け取り、中間光エネルギを出射するように構成された視野レンズ素子集合体と、
平坦面を有する1個または複数個のマンジャンミラー素子を含むマンジャンミラー集合体であって、各マンジャンミラー素子の直径が100mm未満であり、各マンジャンミラー素子が、前記中間光エネルギを受け取り、制御光エネルギを浸漬媒を介して標本に向け出射するように構成され、当該マンジャンミラー集合体が、前記視野レンズ素子集合体と前記標本との間に配置され、前記1個または複数個のマンジャンミラー素子の平坦面が前記浸漬媒に隣接し、当該マンジャンミラー集合体の前記1個または複数個のマンジャンミラー素子が2個の反射面を含むマンジャンミラー集合体と、を備え、
各合焦レンズ素子及び各視野レンズ素子は、同じ単一のガラス素材から形成され、前記マンジャンミラー集合体、視野レンズ素子集合体及び合焦レンズ素子集合体の全ての構成要素は、受け取る光エネルギの軸線に沿って整列され、前記マンジャンミラー集合体において、前記1個または複数個のマンジャンミラー素子の2個の反射面は、前記受け取る光エネルギの軸線に沿って非ゼロ距離の離れた鏡面である対物系。 - 請求項1記載の対物系であって、その視野サイズが0.15mmの対物系。
- 請求項1記載の対物系であって、そのNA値が1.2となるよう構成された対物系。
- 請求項1記載の対物系であって、使用している各レンズ素子の直径が25mm未満の対物系。
- 請求項1記載の対物系であって、通常動作時におけるフランジ対物距離が45mmの顕微鏡にて使用される対物系。
- 請求項5記載の対物系であって、通常動作時におけるフランジ対物距離が100mmの顕微鏡にて使用される対物系。
- 請求項1記載の対物系であって、ガラス素材を二種類だけ使用して構成された対物系。
- 請求項1記載の対物系であって、浸漬媒が水の対物系。
- 請求項1記載の対物系であって、浸漬媒が油の対物系。
- 請求項1記載の対物系であって、浸漬媒がシリコーンゲルの対物系。
- 請求項1記載の対物系であって、球面収差、軸方向色収差及び収差色変化が最小になるよう構成された対物系。
- 請求項1記載の対物系であって、上記1個又は複数個のマンジャンミラー素子が、合焦レンズ素子集合体にて発生する収差が補償されるよう球面収差、軸方向色収差及び収差色変化を発生させる対物系。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/646,073 | 2003-08-22 | ||
| US10/646,073 US8675276B2 (en) | 2003-02-21 | 2003-08-22 | Catadioptric imaging system for broad band microscopy |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012145016A Division JP2012212166A (ja) | 2003-08-22 | 2012-06-28 | 広帯域顕微鏡用カタジオプトリック結像系 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013257599A true JP2013257599A (ja) | 2013-12-26 |
| JP2013257599A5 JP2013257599A5 (ja) | 2014-07-17 |
| JP5905430B2 JP5905430B2 (ja) | 2016-04-20 |
Family
ID=38156745
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006524719A Pending JP2007514179A (ja) | 2003-08-22 | 2004-08-18 | 広帯域顕微鏡用カタジオプトリック結像系 |
| JP2012145016A Pending JP2012212166A (ja) | 2003-08-22 | 2012-06-28 | 広帯域顕微鏡用カタジオプトリック結像系 |
| JP2013207679A Expired - Lifetime JP5905430B2 (ja) | 2003-08-22 | 2013-10-02 | 広帯域顕微鏡用カタジオプトリック結像系 |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006524719A Pending JP2007514179A (ja) | 2003-08-22 | 2004-08-18 | 広帯域顕微鏡用カタジオプトリック結像系 |
| JP2012145016A Pending JP2012212166A (ja) | 2003-08-22 | 2012-06-28 | 広帯域顕微鏡用カタジオプトリック結像系 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8675276B2 (ja) |
| EP (1) | EP1664885B1 (ja) |
| JP (3) | JP2007514179A (ja) |
| WO (1) | WO2005022204A2 (ja) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| US7884998B2 (en) * | 2003-02-21 | 2011-02-08 | Kla - Tencor Corporation | Catadioptric microscope objective employing immersion liquid for use in broad band microscopy |
| US7307783B2 (en) * | 2003-02-21 | 2007-12-11 | Kla-Tencor Technologies Corporation | Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| US7672043B2 (en) * | 2003-02-21 | 2010-03-02 | Kla-Tencor Technologies Corporation | Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth |
| US7348575B2 (en) | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| SG10201405231YA (en) | 2003-05-06 | 2014-09-26 | Nippon Kogaku Kk | Projection optical system, exposure apparatus, and exposure method |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US6961186B2 (en) * | 2003-09-26 | 2005-11-01 | Takumi Technology Corp. | Contact printing using a magnified mask image |
| US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| WO2005059645A2 (en) | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
| KR101407204B1 (ko) | 2004-01-14 | 2014-06-13 | 칼 짜이스 에스엠티 게엠베하 | 투영 대물렌즈 |
| US7463422B2 (en) | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
| US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US7215431B2 (en) * | 2004-03-04 | 2007-05-08 | Therma-Wave, Inc. | Systems and methods for immersion metrology |
| WO2005098504A1 (en) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
| KR101376931B1 (ko) | 2004-05-17 | 2014-03-25 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| DE102005002710A1 (de) * | 2005-01-19 | 2006-07-27 | Linos Photonics Gmbh & Co. Kg | Optisches System |
| JP5495555B2 (ja) * | 2005-03-31 | 2014-05-21 | ケーエルエー−テンカー コーポレイション | 非球面を使用した小型で超高naの反射屈折対物レンズ |
| US20070141362A1 (en) * | 2005-12-19 | 2007-06-21 | Elkins Casey L | Composition for coating substrate to prevent sticking |
| US7633689B2 (en) | 2007-07-18 | 2009-12-15 | Asml Holding N.V. | Catadioptric optical system for scatterometry |
| WO2009154731A2 (en) * | 2008-06-17 | 2009-12-23 | Kla-Tencor Corporation | External beam delivery system using catadioptric objective with aspheric surfaces |
| US20110143287A1 (en) * | 2009-09-14 | 2011-06-16 | Nikon Corporation | Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method |
| JP5479206B2 (ja) | 2010-04-28 | 2014-04-23 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
| JP5627476B2 (ja) | 2011-01-19 | 2014-11-19 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
| JP5656682B2 (ja) * | 2011-02-22 | 2015-01-21 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
| WO2012170916A2 (en) | 2011-06-10 | 2012-12-13 | Canon Kabushiki Kaisha | Optical system with catadioptric optical subsystem |
| JP5836686B2 (ja) * | 2011-07-28 | 2015-12-24 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
| JP5868063B2 (ja) * | 2011-08-05 | 2016-02-24 | キヤノン株式会社 | 撮像装置 |
| US8908294B2 (en) * | 2012-05-18 | 2014-12-09 | Canon Kabushiki Kaisha | Catadioptric optical system with high numerical aperture |
| US9329373B2 (en) * | 2013-02-13 | 2016-05-03 | Canon Kabushiki Kaisha | Catadioptric optical system with multi-reflection element for high numerical aperture imaging |
| DE102013105586B4 (de) | 2013-05-30 | 2023-10-12 | Carl Zeiss Ag | Vorrichtung zur Abbildung einer Probe |
| DE102014113827A1 (de) | 2014-09-24 | 2016-03-24 | Carl Zeiss Microscopy Gmbh | Vorrichtung zur Abbildung einer Probe |
| CN107505692B (zh) * | 2017-09-26 | 2020-04-10 | 张家港中贺自动化科技有限公司 | 一种折反射式物镜 |
| CN108873289B (zh) * | 2018-09-04 | 2024-02-09 | 中国科学院长春光学精密机械与物理研究所 | 显微物镜光学系统及光学设备 |
| DE102019115931A1 (de) * | 2019-06-12 | 2020-12-17 | Carl Zeiss Microscopy Gmbh | Optische Anordnung für ein Mikroskop |
| WO2024207246A1 (zh) * | 2023-04-04 | 2024-10-10 | 瑞声光学解决方案私人有限公司 | 成像系统 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5370837A (en) * | 1976-12-04 | 1978-06-23 | Zeiss Stiftung | Immersion objective lens for microscope |
| US5031976A (en) * | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
| JP2003021786A (ja) * | 2001-07-10 | 2003-01-24 | Olympus Optical Co Ltd | 蛍光用顕微鏡対物レンズ |
| JP2003161886A (ja) * | 2001-11-26 | 2003-06-06 | Nikon Corp | 対物レンズ及びそれを用いた光学装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5510172B2 (ja) * | 1975-02-14 | 1980-03-14 | ||
| JPS56147038A (en) | 1980-04-18 | 1981-11-14 | Hitachi Ltd | Pretreatment for supravital stained specimen and automatic classifying apparatus using said pretreating method |
| GB9008261D0 (en) * | 1990-04-11 | 1990-06-13 | Ares Serono Res & Dev Ltd | Method of improving assay sensitivity |
| US6512631B2 (en) * | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
| US5717518A (en) | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
| US5999310A (en) | 1996-07-22 | 1999-12-07 | Shafer; David Ross | Ultra-broadband UV microscope imaging system with wide range zoom capability |
| US6064517A (en) | 1996-07-22 | 2000-05-16 | Kla-Tencor Corporation | High NA system for multiple mode imaging |
| US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
| JP4345232B2 (ja) | 1998-12-25 | 2009-10-14 | 株式会社ニコン | 反射屈折結像光学系および該光学系を備えた投影露光装置 |
| DE10004396B4 (de) * | 2000-02-02 | 2004-05-06 | Corning Incorporated | Immersionsmittel, Kopplungsanordnung und Kopplungsverfahren für Lichtwellenleiter |
| US6362923B1 (en) | 2000-03-10 | 2002-03-26 | Kla-Tencor | Lens for microscopic inspection |
| JP2002083766A (ja) | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
| US6842298B1 (en) * | 2000-09-12 | 2005-01-11 | Kla-Tencor Technologies Corporation | Broad band DUV, VUV long-working distance catadioptric imaging system |
| US6785051B2 (en) * | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| JP5370837B2 (ja) | 2008-07-14 | 2013-12-18 | 戸仁子 柴野 | 斜形仕切り部付きバッグ |
-
2003
- 2003-08-22 US US10/646,073 patent/US8675276B2/en not_active Expired - Fee Related
-
2004
- 2004-08-18 WO PCT/US2004/026782 patent/WO2005022204A2/en not_active Ceased
- 2004-08-18 JP JP2006524719A patent/JP2007514179A/ja active Pending
- 2004-08-18 EP EP04786521.7A patent/EP1664885B1/en not_active Expired - Lifetime
-
2012
- 2012-06-28 JP JP2012145016A patent/JP2012212166A/ja active Pending
-
2013
- 2013-10-02 JP JP2013207679A patent/JP5905430B2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5370837A (en) * | 1976-12-04 | 1978-06-23 | Zeiss Stiftung | Immersion objective lens for microscope |
| US5031976A (en) * | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
| JP2003021786A (ja) * | 2001-07-10 | 2003-01-24 | Olympus Optical Co Ltd | 蛍光用顕微鏡対物レンズ |
| JP2003161886A (ja) * | 2001-11-26 | 2003-06-06 | Nikon Corp | 対物レンズ及びそれを用いた光学装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012212166A (ja) | 2012-11-01 |
| EP1664885A4 (en) | 2007-12-19 |
| US20040240047A1 (en) | 2004-12-02 |
| WO2005022204A3 (en) | 2005-12-08 |
| US8675276B2 (en) | 2014-03-18 |
| WO2005022204A2 (en) | 2005-03-10 |
| JP2007514179A (ja) | 2007-05-31 |
| EP1664885B1 (en) | 2016-11-16 |
| JP5905430B2 (ja) | 2016-04-20 |
| EP1664885A2 (en) | 2006-06-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5905430B2 (ja) | 広帯域顕微鏡用カタジオプトリック結像系 | |
| JP5172328B2 (ja) | 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 | |
| JP5367126B2 (ja) | 小型超高開口率カタジオプトリック対物系 | |
| JP5634989B2 (ja) | 対物光学系および試料検査装置 | |
| US7884998B2 (en) | Catadioptric microscope objective employing immersion liquid for use in broad band microscopy | |
| US7679842B2 (en) | High performance catadioptric imaging system | |
| US7869121B2 (en) | Small ultra-high NA catadioptric objective using aspheric surfaces | |
| JP5495555B2 (ja) | 非球面を使用した小型で超高naの反射屈折対物レンズ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131031 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20131031 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140604 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20141010 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20141028 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150126 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150225 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20150325 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150428 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150929 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20151228 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160125 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160216 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160316 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5905430 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |
