JP2014507367A - 有機クロロシランおよび四塩化ケイ素の水素化 - Google Patents
有機クロロシランおよび四塩化ケイ素の水素化 Download PDFInfo
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- 150000001367 organochlorosilanes Chemical class 0.000 title claims abstract description 32
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 title claims description 30
- 239000005049 silicon tetrachloride Substances 0.000 title claims description 30
- 238000005984 hydrogenation reaction Methods 0.000 title description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 82
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000005052 trichlorosilane Substances 0.000 claims abstract description 32
- 239000001257 hydrogen Substances 0.000 claims abstract description 30
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 30
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims description 59
- 239000007789 gas Substances 0.000 claims description 41
- 230000008569 process Effects 0.000 claims description 33
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 30
- 239000005046 Chlorosilane Substances 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 21
- 239000000725 suspension Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 18
- 239000002994 raw material Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 238000012856 packing Methods 0.000 claims description 12
- 239000005055 methyl trichlorosilane Substances 0.000 claims description 9
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims description 9
- 229910052697 platinum Inorganic materials 0.000 claims description 9
- -1 compound compounds Chemical class 0.000 claims description 8
- 239000004480 active ingredient Substances 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052703 rhodium Inorganic materials 0.000 claims description 6
- 229910052712 strontium Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 229910052741 iridium Inorganic materials 0.000 claims description 5
- 229910052749 magnesium Inorganic materials 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 239000002737 fuel gas Substances 0.000 claims description 4
- 239000000375 suspending agent Substances 0.000 claims description 4
- 238000002485 combustion reaction Methods 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 238000011049 filling Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical class [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 2
- 238000003860 storage Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 230000002028 premature Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000000047 product Substances 0.000 description 20
- 239000003054 catalyst Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 11
- 229910010271 silicon carbide Inorganic materials 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000010439 graphite Substances 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 239000003345 natural gas Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 238000006555 catalytic reaction Methods 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
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- 238000005859 coupling reaction Methods 0.000 description 4
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- 239000006254 rheological additive Substances 0.000 description 4
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000005053 propyltrichlorosilane Substances 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000013590 bulk material Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000004359 castor oil Substances 0.000 description 2
- 235000019438 castor oil Nutrition 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000004921 DEGALAN® Substances 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- 229910008045 Si-Si Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910006411 Si—Si Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 229910052789 astatine Inorganic materials 0.000 description 1
- 229960000892 attapulgite Drugs 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
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- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
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- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000007327 hydrogenolysis reaction Methods 0.000 description 1
- 238000005647 hydrohalogenation reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052625 palygorskite Inorganic materials 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000001698 pyrogenic effect Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000013127 simulated treatment comparison Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 description 1
- 229910021342 tungsten silicide Inorganic materials 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/08—Silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/20—Carbon compounds
- B01J27/22—Carbides
- B01J27/224—Silicon carbide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/24—Nitrogen compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
- C04B41/90—Coating or impregnation for obtaining at least two superposed coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/0081—Uses not provided for elsewhere in C04B2111/00 as catalysts or catalyst carriers
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Abstract
Description
1.殊に、懸濁液の安定化のため、懸濁液の貯蔵安定性の改善のため、被覆すべき表面上での懸濁液の付着力の改善のため、および/または被覆すべき表面上への懸濁液の塗布の改善のための、a)金属のTi、Zr、Hf、Ni、Pd、Pt、Mo、W、Nb、Ta、Ba、Sr、Ca、Mg、Ru、Rh、Irもしくはこれらからの組合せまたはこれらのケイ化物化合物から選択された、少なくとも1つの活性成分、b)少なくとも1つの懸濁剤、および任意にc)少なくとも1つの補助成分を含有する懸濁液の準備、
2.1つ以上の反応管の内壁上および/または充填体の表面上への懸濁液の塗布、
3.塗布された懸濁液の乾燥、
4.不活性ガスまたは水素の下で500℃〜1500℃の範囲内の温度で塗布されかつ乾燥された懸濁液の熱処理
を含むことができる。
触媒ペーストの製造、本発明による例
混合容器中で、トルエン54質量%、エロジルR974 0.3質量%、フェニルエチルポリシロキサン6.0質量%、アルミニウム顔料Reflaxal 16.8質量%、Degalan溶液LP 62/03 10.7質量%および珪化タングステン12.2質量%からなる混合物を強力に混合した。
触媒ペーストの塗布、本発明による例
前記触媒混合物を前記反応管中に充填することにより、炭化ケイ素(SSiC)からなるセラミック管を例1に記載された処方物で被覆した。栓で閉めた前記管を振盪することによって、前記混合物を均一に分布させ、次に一晩中、空気乾燥させた。前記管は、15mmの内径および全体で120cmの長さを有していた。等温加熱された帯域は、40cmであった。
触媒の形成および水素化、本発明による例
前記反応管を電気加熱可能な管状炉中に取り付けた。最初に、各管を備えた管状炉を900℃にもたらし、その際に窒素を3バール(絶対圧力)で前記反応管に導通させた。2時間後、窒素を水素に代えた。同様に3.6バール(絶対圧力)で水素流中でさらに数時間後、メチルトリクロロシランまたはメチルトリクロロシランとAldrich社の四塩化ケイ素との混合物を前記反応管中にポンプ輸送した。前記管状炉中の温度は、窒素から原料に切り換えられた際に、既に900℃に調節されていた。水素流を4対1のモル過剰量に調節した。反応器排出物をオンラインでガスクロマトグラフィー分析し、その中から形成された量のトリクロロシラン、四塩化ケイ素、ジクロロシランおよびメチルジクロロシランを算出した。ガスクロマトグラフの較正は、純粋物質で行なわれた。
Claims (15)
- トリクロロシランを製造する方法であって、水素と少なくとも1つの有機クロロシランとを、気密のセラミック材料からなる1つ以上の反応管を含む耐圧設計された反応器中で反応させることを特徴とする、前記方法。
- 少なくとも1つの有機クロロシランを有する混合物中でさらに四塩化ケイ素と水素とを反応させ、トリクロロシランにすることを特徴とする、請求項1記載の方法。
- メチルトリクロロシランを唯一つの有機クロロシランとして使用することを特徴とする、請求項1または2記載の方法。
- 前記反応の際に、水素含有原料ガスおよび少なくとも1つの有機クロロシラン含有原料ガスならびに任意に四塩化ケイ素含有原料ガスを、1つの反応器中で熱の供給によって、トリクロロシラン含有生成物ガスの形成下に反応させ、その際に前記の有機クロロシラン含有原料ガスおよび/または水素含有原料ガスおよび/または四塩化ケイ素含有原料ガスは、加圧下にある流れとして耐圧設計された反応器中に導かれ、この生成物ガスは、加圧下にある流れとして反応器から導出されることを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 有機クロロシラン含有原料ガスおよび水素含有原料ガス、および存在する限り四塩化ケイ素含有原料ガスを、1つの共通の流れで耐圧設計された反応器中に導入することを特徴とする、請求項4記載の方法。
- 水素対単数または複数の有機クロロシランと四塩化ケイ素との総和のモル比は、1:1〜8:1、有利に2:1〜6:1、特に有利に3:1〜5:1の範囲内、殊に4:1にあることを特徴とする、請求項1から5までのいずれか1項に記載の方法。
- 前記反応を、1〜10バールの圧力および/または700℃〜1000℃の範囲内の温度および/またはガス流で実施することを特徴とする、請求項1から6までのいずれか1項に記載の方法。
- 反応器中での反応のための熱供給を、電気抵抗加熱または燃料ガスの燃焼によって行なうことを特徴とする、請求項1から7までのいずれか1項に記載の方法。
- 複数の反応管を構成する気密のセラミック材料は、SiCもしくはSi3N4、またはこれらからなる混合系(SiCN)から選択されていることを特徴とする、請求項1から8までのいずれか1項に記載の方法。
- 気密のセラミック材料は、Si溶浸されたSiC(SiSiC)または無圧燒結されたSiC(SSiC)から選択されていることを特徴とする、請求項9記載の方法。
- 少なくとも1つの反応管は、片側で閉鎖されており、かつガスを供給する内部管を含むことを特徴とする、請求項1から10までのいずれか1項に記載の方法。
- 少なくとも1つの反応管は、当該管と同じ気密のセラミック材料からなる充填体で充填されていることを特徴とする、請求項1から11までのいずれか1項に記載の方法。
- 少なくとも1つの反応管の内壁および/または充填体の少なくとも一部分は、トリクロロシランへの水素と単数または複数の有機クロロシランおよび任意に四塩化ケイ素との反応を触媒する、少なくとも1つの材料で被覆されていることを特徴とする、請求項1から12までのいずれか1項に記載の方法。
- 触媒活性の被覆は、金属のTi、Zr、Hf、Ni、Pd、Pt、Mo、W、Nb、Ta、Ba、Sr、Ca、Mg、Ru、Rh、Irもしくはこれらからの組合せまたはこれらのケイ化物化合物から選択された、少なくとも1つの活性成分を含む組成物からなることを特徴とする、請求項13記載の方法。
- 触媒活性の被覆の施与は、次の工程:
− 懸濁液の安定化のため、および/または懸濁液の貯蔵安定性の改善のため、および/または被覆すべき表面上での懸濁液の付着力の改善のため、および/または被覆すべき表面上への懸濁液の塗布の改善のための、a)金属のTi、Zr、Hf、Ni、Pd、Pt、Mo、W、Nb、Ta、Ba、Sr、Ca、Mg、Ru、Rh、Irもしくはこれらからの組合せまたはこれらのケイ化物化合物から選択された、少なくとも1つの活性成分、b)少なくとも1つの懸濁剤、および任意にc)少なくとも1つの補助成分を含有する懸濁液の準備、
− 1つ以上の反応管の内壁上への、および/または充填体の表面上への懸濁液の塗布、
− 塗布された懸濁液の乾燥、
− 不活性ガスまたは水素の下で500℃〜1500℃の範囲内の温度で塗布されかつ乾燥された懸濁液の熱処理;
− 任意に1つ以上の反応管中への熱処理された充填体の充填を含み、その際にこの熱処理および任意に早期の乾燥は、既に詰めた充填体の場合にも行なうことができることを特徴とする、請求項13記載の方法。
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| DE102011002436A DE102011002436A1 (de) | 2011-01-04 | 2011-01-04 | Hydrierung von Organochlorsilanen und Siliciumtetrachlorid |
| DE102011002436.0 | 2011-01-04 | ||
| PCT/EP2011/073346 WO2012093029A1 (de) | 2011-01-04 | 2011-12-20 | Hydrierung von organochlorsilanen und siliciumtetrachlorid |
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| JP (1) | JP5933592B2 (ja) |
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| CN (1) | CN103269976B (ja) |
| CA (1) | CA2823662A1 (ja) |
| DE (1) | DE102011002436A1 (ja) |
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| USRE46657E1 (en) * | 2010-12-17 | 2018-01-02 | Dow Corning Corporation | Method of making a trihalosilane |
| JP2015524824A (ja) | 2012-08-13 | 2015-08-27 | ダウ コーニング コーポレーションDow Corning Corporation | 銅触媒上での2工程プロセスで水素、ハロシラン、及び有機ハロゲン化物を反応させることによって、オルガノハロシランを調製する方法 |
| JP5879283B2 (ja) * | 2013-02-13 | 2016-03-08 | 信越化学工業株式会社 | トリクロロシランの製造方法 |
| CN105705507B (zh) | 2013-11-12 | 2018-08-31 | 美国陶氏有机硅公司 | 制备卤代硅烷的方法 |
| DE102014205001A1 (de) | 2014-03-18 | 2015-09-24 | Wacker Chemie Ag | Verfahren zur Herstellung von Trichlorsilan |
| JP2018503589A (ja) * | 2014-12-18 | 2018-02-08 | ヘムロック・セミコンダクター・オペレーションズ・エルエルシー | ハロシランを水素化する方法 |
| DE102015210762A1 (de) | 2015-06-12 | 2016-12-15 | Wacker Chemie Ag | Verfahren zur Aufarbeitung von mit Kohlenstoffverbindungen verunreinigten Chlorsilanen oder Chlorsilangemischen |
| EP3121149A1 (de) * | 2015-07-21 | 2017-01-25 | Evonik Degussa GmbH | Intensivierung des wärmetausches durch geeignete formgebung im umkehrrohr aus xsic-werkstoffsystem |
| WO2019068335A1 (de) * | 2017-10-05 | 2019-04-11 | Wacker Chemie Ag | Verfahren zur herstellung von chlorsilanen |
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- 2011-12-20 US US13/977,984 patent/US20140178283A1/en not_active Abandoned
- 2011-12-20 EP EP11805007.9A patent/EP2661415A1/de not_active Withdrawn
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- 2011-12-20 KR KR1020137017392A patent/KR20130133805A/ko not_active Withdrawn
- 2011-12-20 CN CN201180063997.XA patent/CN103269976B/zh not_active Expired - Fee Related
- 2011-12-20 WO PCT/EP2011/073346 patent/WO2012093029A1/de not_active Ceased
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| CN103269976A (zh) | 2013-08-28 |
| KR20130133805A (ko) | 2013-12-09 |
| CA2823662A1 (en) | 2012-07-12 |
| EP2661415A1 (de) | 2013-11-13 |
| TW201245044A (en) | 2012-11-16 |
| DE102011002436A1 (de) | 2012-07-05 |
| JP5933592B2 (ja) | 2016-06-15 |
| WO2012093029A1 (de) | 2012-07-12 |
| US20140178283A1 (en) | 2014-06-26 |
| CN103269976B (zh) | 2016-01-20 |
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