JP2017200683A - 超純水製造装置の立ち上げ方法 - Google Patents

超純水製造装置の立ち上げ方法 Download PDF

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Publication number
JP2017200683A
JP2017200683A JP2016093121A JP2016093121A JP2017200683A JP 2017200683 A JP2017200683 A JP 2017200683A JP 2016093121 A JP2016093121 A JP 2016093121A JP 2016093121 A JP2016093121 A JP 2016093121A JP 2017200683 A JP2017200683 A JP 2017200683A
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JP
Japan
Prior art keywords
ultrapure water
production apparatus
water production
flow path
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016093121A
Other languages
English (en)
Japanese (ja)
Inventor
晋一郎 雨宮
Shinichiro AMAMIYA
晋一郎 雨宮
直弥 坂井
Naoya Sakai
直弥 坂井
規彦 鈴木
Norihiko Suzuki
規彦 鈴木
俊和 阿部
Toshikazu Abe
俊和 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nomura Micro Science Co Ltd
Original Assignee
Nomura Micro Science Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nomura Micro Science Co Ltd filed Critical Nomura Micro Science Co Ltd
Priority to JP2016093121A priority Critical patent/JP2017200683A/ja
Priority to KR1020187031072A priority patent/KR20190005843A/ko
Priority to PCT/JP2017/017139 priority patent/WO2017191829A1/fr
Priority to CN201780027457.3A priority patent/CN109153047A/zh
Publication of JP2017200683A publication Critical patent/JP2017200683A/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/02—Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027—Cleaning the internal surfaces; Removal of blockages
    • B08B9/032—Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration

Landscapes

  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Physical Water Treatments (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2016093121A 2016-05-06 2016-05-06 超純水製造装置の立ち上げ方法 Pending JP2017200683A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2016093121A JP2017200683A (ja) 2016-05-06 2016-05-06 超純水製造装置の立ち上げ方法
KR1020187031072A KR20190005843A (ko) 2016-05-06 2017-05-01 초순수 제조 장치의 기동 방법
PCT/JP2017/017139 WO2017191829A1 (fr) 2016-05-06 2017-05-01 Procédé de mise en route d'un appareil de production d'eau ultrapure
CN201780027457.3A CN109153047A (zh) 2016-05-06 2017-05-01 超纯水制造装置的启动方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016093121A JP2017200683A (ja) 2016-05-06 2016-05-06 超純水製造装置の立ち上げ方法

Publications (1)

Publication Number Publication Date
JP2017200683A true JP2017200683A (ja) 2017-11-09

Family

ID=60203670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016093121A Pending JP2017200683A (ja) 2016-05-06 2016-05-06 超純水製造装置の立ち上げ方法

Country Status (4)

Country Link
JP (1) JP2017200683A (fr)
KR (1) KR20190005843A (fr)
CN (1) CN109153047A (fr)
WO (1) WO2017191829A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022509482A (ja) * 2018-10-24 2022-01-20 ナノサイズド、スウェーデン、アクチボラグ 半導体製造のための方法および構成
JP7033691B1 (ja) 2021-10-29 2022-03-10 野村マイクロ・サイエンス株式会社 温超純水製造システムの立ち上げ方法、立ち上げプログラム、及び温超純水製造システム

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7143595B2 (ja) * 2018-02-07 2022-09-29 栗田工業株式会社 超純水製造システムの微粒子管理方法
JP7387320B2 (ja) * 2019-07-29 2023-11-28 オルガノ株式会社 超純水又はガス溶解水供給システムの製造方法並びに洗浄方法
CN112796143B (zh) * 2021-02-03 2022-10-04 远通纸业(山东)有限公司 一种使用双氧水对细小纤维进行调色的系统及方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62244483A (ja) * 1986-04-16 1987-10-24 川崎重工業株式会社 配管の洗浄方法
JPH03288583A (ja) * 1990-04-03 1991-12-18 Nomura Micro Sci Kk 純水製造システムにおける配管類の洗浄方法
JP2002151459A (ja) * 2000-11-10 2002-05-24 Kurita Water Ind Ltd 洗浄方法
JP2004122020A (ja) * 2002-10-03 2004-04-22 Japan Organo Co Ltd 超純水製造装置及び該装置における超純水製造供給システムの洗浄方法
JP2008253373A (ja) * 2007-04-02 2008-10-23 Matsushita Electric Ind Co Ltd 超音波洗浄装置および同装置を用いた食器洗い機および超音波洗浄方法
JP2011088979A (ja) * 2009-10-21 2011-05-06 Panasonic Electric Works Co Ltd 洗浄液、洗浄方法、洗浄液製造装置
JP2014000548A (ja) * 2012-06-20 2014-01-09 Nomura Micro Sci Co Ltd 超純水製造システムの立ち上げ時の洗浄方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002052322A (ja) 2000-08-10 2002-02-19 Kurita Water Ind Ltd 洗浄方法
JP4449080B2 (ja) 2005-04-15 2010-04-14 オルガノ株式会社 超純水製造供給装置の洗浄方法
CN105381482B (zh) * 2007-03-30 2021-02-02 栗田工业株式会社 超纯水制备系统的清洗灭菌方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62244483A (ja) * 1986-04-16 1987-10-24 川崎重工業株式会社 配管の洗浄方法
JPH03288583A (ja) * 1990-04-03 1991-12-18 Nomura Micro Sci Kk 純水製造システムにおける配管類の洗浄方法
JP2002151459A (ja) * 2000-11-10 2002-05-24 Kurita Water Ind Ltd 洗浄方法
JP2004122020A (ja) * 2002-10-03 2004-04-22 Japan Organo Co Ltd 超純水製造装置及び該装置における超純水製造供給システムの洗浄方法
JP2008253373A (ja) * 2007-04-02 2008-10-23 Matsushita Electric Ind Co Ltd 超音波洗浄装置および同装置を用いた食器洗い機および超音波洗浄方法
JP2011088979A (ja) * 2009-10-21 2011-05-06 Panasonic Electric Works Co Ltd 洗浄液、洗浄方法、洗浄液製造装置
JP2014000548A (ja) * 2012-06-20 2014-01-09 Nomura Micro Sci Co Ltd 超純水製造システムの立ち上げ時の洗浄方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022509482A (ja) * 2018-10-24 2022-01-20 ナノサイズド、スウェーデン、アクチボラグ 半導体製造のための方法および構成
JP7033691B1 (ja) 2021-10-29 2022-03-10 野村マイクロ・サイエンス株式会社 温超純水製造システムの立ち上げ方法、立ち上げプログラム、及び温超純水製造システム
TWI793049B (zh) * 2021-10-29 2023-02-11 日商野村微科學工程股份有限公司 溫超純水製造系統之初始方法、初始程式及溫超純水製造系統
JP2023066522A (ja) * 2021-10-29 2023-05-16 野村マイクロ・サイエンス株式会社 温超純水製造システムの立ち上げ方法、立ち上げプログラム、及び温超純水製造システム
US11926536B2 (en) 2021-10-29 2024-03-12 Nomura Micro Science Co., Ltd. Method for starting up hot ultrapure water production system, and hot ultrapure water production system

Also Published As

Publication number Publication date
WO2017191829A1 (fr) 2017-11-09
KR20190005843A (ko) 2019-01-16
CN109153047A (zh) 2019-01-04

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