JP2019504810A5 - - Google Patents

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Publication number: JP2019504810A5
Authority: JP; Japan
Prior art keywords: chamber; melting; furnace; treatment; octamethylcyclotetrasiloxane
Prior art date: 2016-12-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP2018531170A

Other languages

English (en)

Japanese (ja)

Other versions

JP2019504810A (ja

Filing date

2016-12-16

Publication date

2020-01-16

2016-12-16 Application filed filed Critical

2016-12-16 Priority claimed from PCT/EP2016/081464 external-priority patent/WO2017103133A1/de

2019-02-21 Publication of JP2019504810A publication Critical patent/JP2019504810A/ja

2020-01-16 Publication of JP2019504810A5 publication Critical patent/JP2019504810A5/ja

Status Pending legal-status Critical Current

Links

230000008018 melting Effects 0.000 description 10
238000002844 melting Methods 0.000 description 10
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
239000007788 liquid Substances 0.000 description 2
239000005049 silicon tetrachloride Substances 0.000 description 2
XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
241000282326 Felis catus Species 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
239000000156 glass melt Substances 0.000 description 1
239000008187 granular material Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
238000007654 immersion Methods 0.000 description 1
BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
239000005052 trichlorosilane Substances 0.000 description 1
238000011144 upstream manufacturing Methods 0.000 description 1

Images

JP2018531170A 2015-12-18 2016-12-16 石英ガラス体の調製および後処理 Pending JP2019504810A (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
EP15201139		2015-12-18
EP15201139.1		2015-12-18
PCT/EP2016/081464 WO2017103133A1 (de)	2015-12-18	2016-12-16	Herstellen und nachbehandeln eines quarzglaskörpers

Publications (2)

Publication Number	Publication Date
JP2019504810A JP2019504810A (ja)	2019-02-21
JP2019504810A5 true JP2019504810A5 (2)	2020-01-16

Family

ID=54850398

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2018531170A Pending JP2019504810A (ja)	2015-12-18	2016-12-16	石英ガラス体の調製および後処理

Country Status (7)

Country	Link
US (1)	US20190071342A1 (2)
EP (1)	EP3390298A1 (2)
JP (1)	JP2019504810A (2)
KR (1)	KR20180095623A (2)
CN (1)	CN108698896A (2)
TW (1)	TW201736290A (2)
WO (1)	WO2017103133A1 (2)

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JP6940235B2 (ja)	2015-12-18	2021-09-22	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	高融点金属の溶融坩堝内での石英ガラス体の調製
EP3390304B1 (de)	2015-12-18	2023-09-13	Heraeus Quarzglas GmbH & Co. KG	Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
KR20180095618A (ko)	2015-12-18	2018-08-27	헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지	다중-챔버 가열로에서 실리카 유리체의 제조
US11339076B2 (en)	2015-12-18	2022-05-24	Heraeus Quarzglas Gmbh & Co. Kg	Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
CN109153593A (zh)	2015-12-18	2019-01-04	贺利氏石英玻璃有限两合公司	合成石英玻璃粉粒的制备
CN108698880B (zh)	2015-12-18	2023-05-02	贺利氏石英玻璃有限两合公司	不透明石英玻璃体的制备
EP3390303B1 (de)	2015-12-18	2024-02-07	Heraeus Quarzglas GmbH & Co. KG	Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
WO2017103153A1 (de)	2015-12-18	2017-06-22	Heraeus Quarzglas Gmbh & Co. Kg	Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
TWI840318B (zh)	2015-12-18	2024-05-01	德商何瑞斯廓格拉斯公司	石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
JP6981710B2 (ja)	2015-12-18	2021-12-17	ヘレウスクワルツグラスゲーエムベーハーウントコンパニーカーゲー	二酸化ケイ素造粒体からの石英ガラス体の調製
US20210403374A1 (en) *	2018-12-14	2021-12-30	Tosoh Quartz Corporation	Method of manufacturing opaque quartz glass
EP4281418B1 (de) *	2021-01-21	2024-08-07	Heraeus Quarzglas GmbH & Co. KG	Verfahren zur herstellung eines quarzglaskörpers
CN113200669B (zh) *	2021-06-04	2022-09-16	齐鲁工业大学	一种将难熔或不熔材料制成玻璃的方法
US12366831B2 (en)	2022-05-20	2025-07-22	Mb-Microtec Ag	Fabrication of glass cells for hermetic gas enclosures

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WO2013149882A1 (de) *	2012-04-05	2013-10-10	Heraeus Quarzglas Gmbh & Co. Kg	Verfahren zur herstellung eines formkörpers aus elektrogeschmolzenem synthetischem quarzglas

2016
- 2016-12-16 EP EP16810409.9A patent/EP3390298A1/de not_active Withdrawn
- 2016-12-16 KR KR1020187020273A patent/KR20180095623A/ko not_active Withdrawn
- 2016-12-16 CN CN201680082183.3A patent/CN108698896A/zh active Pending
- 2016-12-16 JP JP2018531170A patent/JP2019504810A/ja active Pending
- 2016-12-16 US US16/062,685 patent/US20190071342A1/en not_active Abandoned
- 2016-12-16 TW TW105141752A patent/TW201736290A/zh unknown
- 2016-12-16 WO PCT/EP2016/081464 patent/WO2017103133A1/de not_active Ceased

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