JP3147594B2 - Rinse cleaning method for electrophotographic photoreceptor - Google Patents

Rinse cleaning method for electrophotographic photoreceptor

Info

Publication number
JP3147594B2
JP3147594B2 JP16552193A JP16552193A JP3147594B2 JP 3147594 B2 JP3147594 B2 JP 3147594B2 JP 16552193 A JP16552193 A JP 16552193A JP 16552193 A JP16552193 A JP 16552193A JP 3147594 B2 JP3147594 B2 JP 3147594B2
Authority
JP
Japan
Prior art keywords
tower
substrate
rinse
hold
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16552193A
Other languages
Japanese (ja)
Other versions
JPH0720643A (en
Inventor
泰秀 高下
勝頼 松原
立志 馬屋原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP16552193A priority Critical patent/JP3147594B2/en
Publication of JPH0720643A publication Critical patent/JPH0720643A/en
Application granted granted Critical
Publication of JP3147594B2 publication Critical patent/JP3147594B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Photoreceptors In Electrophotography (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電子写真複写機やレー
ザープリンタの感光ドラムなどに用いられる電子写真用
感光体の導電性基体を、水系下で洗浄した後にすすぎ洗
浄する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of rinsing a conductive substrate of an electrophotographic photosensitive member used for a photosensitive drum of an electrophotographic copying machine or a laser printer after washing it in an aqueous system.

【0002】[0002]

【従来の技術】一般に、電子写真用感光体は、アルミニ
ウムまたはその合金からなる導電性基体上に、セレン系
材料、アモルフアスシリコン、有機物系材料等からなる
光導電層が塗布や蒸着されて形成されている。導電性基
体として最も一般的に用いられているのは、円筒型金属
ドラムである。円筒型金属ドラムはアルミニウム等の素
管が用いられるが、素管の表面には、切削加工工程にお
いて発生する金属粉、周囲環境からの塵埃、切削加工時
に使用する油及び切削加工後の素管表面を保護するため
に用いた油が付着している。このような素管に感光層を
塗布して電子写真感光体を形成すると、素管表面の上記
付着物が、感光体の画像特性に悪影響を及ぼす。このた
め、該導電性基体は塗布液を均一な厚さに塗布するため
や蒸着を均一にするために、塗布や蒸着の前に洗浄さ
れ、その表面に付着している金属粉や油脂などの異物が
除去される。アルミニウムまたはその合金からなる導電
性基体を洗浄する方法としては、例えば、特開昭58−
108568号に開示されているように、アルミニウム
素管が浸せきされた洗浄液を超音波振動させる方法や、
特開平3−154679号に開示されているように、ア
ルミニウム素管に高圧で洗浄液をシャワーノズルで吐出
する方法が知られている。しかしながら、このような洗
浄工程の後にはアルミニウム素管に洗浄液が付着したま
ま残留するため、純水ですすぎ洗浄をする必要があっ
た。
2. Description of the Related Art In general, an electrophotographic photoreceptor is formed by applying or depositing a photoconductive layer made of a selenium-based material, amorphous silicon, an organic material, or the like on a conductive substrate made of aluminum or an alloy thereof. Have been. The most commonly used conductive substrate is a cylindrical metal drum. A cylindrical metal drum is made of a tube made of aluminum or the like. On the surface of the tube, metal powder generated in the cutting process, dust from the surrounding environment, oil used in the cutting process, and the tube after the cutting process are used. Oil used to protect the surface is attached. When an electrophotographic photoreceptor is formed by applying a photosensitive layer to such a tube, the deposits on the surface of the tube adversely affect the image characteristics of the photoreceptor. For this reason, the conductive substrate is washed before coating or vapor deposition in order to apply the coating liquid to a uniform thickness or to make the vapor deposition uniform, so that metal powder or oils and fats adhered to the surface are removed. Foreign matter is removed. As a method for cleaning a conductive substrate made of aluminum or an alloy thereof, for example, Japanese Patent Application Laid-Open No.
As disclosed in Japanese Patent No. 108568, a method of ultrasonically vibrating a cleaning liquid in which an aluminum pipe is immersed,
As disclosed in Japanese Patent Application Laid-Open No. 3-154679, a method is known in which a cleaning liquid is discharged to an aluminum pipe at a high pressure by a shower nozzle. However, after such a cleaning step, the cleaning liquid remains attached to the aluminum tube, so that it has been necessary to rinse with pure water.

【0003】上記すすぎ工程の従来技術の一例の概略図
を図2に示す。導電性基体内径よりわずかに小さい外形
を有する円筒形タワー4に、基体1を被せて保持する。
すすぎ流体を基体外面用ノズル2及び内面用ノズル3よ
り棒状又は霧状で、それぞれ基体外面1a及び内面1b
に対し垂直に噴射5aする。この時、すすぎ流体は基体
全体に噴射される。これらの従来技術では、流体を棒状
に噴射する場合は、すすぎ面積が小さく、基体に作用し
た流体が回りに飛び散るためすすぎ効率が悪く、流体を
霧状に噴射する場合は、すすぎ面積は大きいが、基体に
作用する圧力が十分得られず、すすぎ効率が悪い。流体
を基体に対して垂直に噴射する場合は、基体に作用した
流体が回りに飛び散るためすすぎ効率が悪い、又、流体
を基体全体に均一に噴射する場合は、噴射された流体が
下方向に流れ落ちるため、基体下部が上部より先にすす
ぎが終り、その結果すすぎ時間が長くなる。更に、基体
内径よりわずかに小さい外径を有する円筒形タワーに、
基体をかぶせて保持する場合、タワーで覆われている基
体内面部のすすぎが行われにくく、基体内面用ノズルよ
り噴射された流体が基体内面にそって流れ落ち、基体と
タワーの間に流体が堪り、すすぎが行われにくいので、
すすぎ効率が悪い、という欠点を有していた。
FIG. 2 is a schematic diagram showing an example of the prior art of the above-mentioned rinsing step. The base 1 is placed on and held by a cylindrical tower 4 having an outer shape slightly smaller than the inner diameter of the conductive base.
The rinsing fluid is supplied from the nozzle 2 for the outer surface of the substrate and the nozzle 3 for the inner surface in the form of a rod or a mist, respectively, and
Is injected 5a perpendicularly. At this time, the rinsing fluid is sprayed on the entire substrate. In these prior arts, when the fluid is jetted in a rod shape, the rinsing area is small, the rinsing efficiency is poor because the fluid acting on the base scatters around, and when the fluid is jetted in the form of a mist, the rinsing area is large. In addition, sufficient pressure acting on the substrate cannot be obtained, resulting in poor rinsing efficiency. When the fluid is ejected perpendicularly to the substrate, the rinsing efficiency is poor because the fluid acting on the substrate scatters around, and when the fluid is ejected uniformly over the entire substrate, the ejected fluid is directed downward. Because of the run-off, the lower part of the substrate is rinsed before the upper part, resulting in a longer rinsing time. Further, to a cylindrical tower having an outer diameter slightly smaller than the inner diameter of the substrate,
When the substrate is covered and held, it is difficult to rinse the inner surface of the substrate covered by the tower, and the fluid ejected from the nozzle for the inner surface of the substrate flows down along the inner surface of the substrate, and the fluid between the substrate and the tower becomes unbearable. , Because it is difficult to rinse
There was a drawback that the rinsing efficiency was poor.

【0004】[0004]

【発明が解決しようとする課題】本発明は、スプレイ式
によるすすぎ洗浄方式において、上記従来技術に比較し
て、基体内面、外面を短時間で効率良くすすぐ洗浄方法
を提供するものである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for rinsing the inner and outer surfaces of a substrate in a short time and efficiently in a spray-type rinsing cleaning system as compared with the prior art.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
には、アルミニウム又はその合金からなる電子写真感光
体の導電性基体を、水系下で洗浄した後にすすぎ洗浄す
る方法において、スリットノズルより純水をフイルム状
にかつ連続的に噴射スプレイし、該噴射スプレイを基体
内及び外面上に打ち当てることが有効であることを見出
し、さらに、基体上部のすすぎ洗浄時間を全体の洗浄時
間の半分以上にするとき、また、基体を保持するタワー
が基体内面とタワー外面との接触面積が少ない構造であ
るときさらに一層大きな効果があることを見出だした。
本発明で使用する純水は、逆浸透膜、イオン交換樹脂、
フィルターなどにより、電解質成分、異物、バクテリア
が除去された物である。
In order to solve the above-mentioned problems, a method of washing a conductive substrate of an electrophotographic photoreceptor made of aluminum or an alloy thereof in an aqueous system and then rinsing the same is performed by cleaning the conductive substrate with a slit nozzle. It has been found that spraying water in a film form and continuously and spraying the spray on the inside and the outer surface of the substrate is effective, and furthermore, the rinsing time of the upper part of the substrate is reduced to more than half of the total cleaning time. It has also been found that when the tower holding the substrate has a structure in which the contact area between the inner surface of the substrate and the outer surface of the tower is small, the effect is even greater.
Pure water used in the present invention is a reverse osmosis membrane, an ion exchange resin,
The electrolyte component, foreign matter, and bacteria are removed by a filter or the like.

【0006】[0006]

【実施例】以下、本発明の実施例を図に基いて説明す
る。図1は、本発明の実例を示す断面図である。基体
保持タワー4に導電性基体1が載せられ、該導電性基体
の外面1a及び内面1bに対して基体外面用ノズル2及
び基体内面用ノズル3から噴射流体5aが噴射される。
噴射流体5aはフイルム状であり、水平方向に対する角
度を調節することが好ましい。基体保持タワー4は周方
向100に回転し、基体外面用ノズル2及び基体内面用
ノズル3は上下方向101に移動する。図3は導電性基
体1であり、図4は基体保持タワー4である。図5は、
本発明の他の実施例を示す断面図である。図6から図9
は、本発明に用いられる各種のタワーである。図6及び
図7は、基体を保持するタワーが基体内面とタワー外面
との接触面積が少ない構造であり、基体とタワーとの接
触面積を少なくすることにより、基体とタワーが接触し
ていない部分に流体が流れ込み、すすぎ洗浄が速やかに
行われる。図6はタワーとして、タワー外面とタワー内
面を貫通する穴を有する構造体を用いた例であり、基体
内面1bに接するタワー側面4cの中部に、タワー外面
4a、タワー内面4bを貫通する穴を有している。ま
た、図7はタワーとして、外面に基体を保持する部分と
すすぎ水が溜まる空間部分とを有する構造体を用いた例
であり、基体内面1bに接するタワー外面4aに鉛直方
向の溝を少なくとも3列以上有している。図8及び図9
は、基体内面1bとタワー外面4aとの隙間にはいった
流体の排出口を有する構造のタワーで、基体内面とタワ
ー外面との隙間にはいった流体が速やかに排水されるこ
とにより、新たに基体内面に沿って流れ落ちてきた流体
が隙間に流れやすくなるため、すすぎ洗浄が速やかに行
われる。具体的には、図8は、基体下面1cと接触する
タワー上面4dとの間に、隙間が出来る構造のタワーで
ある。図9は、基体下面1cと接触するタワー上面4d
が複数個の穴を有する構造のタワーである。
EXAMPLES Hereinafter, an embodiment of the present invention have groups Dzu in FIG. Figure 1 is a sectional view showing an implementation example of the present invention. The conductive substrate 1 is placed on the substrate holding tower 4, and a jet fluid 5a is jetted from the nozzle 2 for the substrate outer surface and the nozzle 3 for the substrate inner surface to the outer surface 1a and the inner surface 1b of the conductive substrate.
The ejection fluid 5a is in the form of a film, and preferably adjusts the angle with respect to the horizontal direction. The substrate holding tower 4 rotates in the circumferential direction 100, and the nozzle 2 for the outer surface of the substrate and the nozzle 3 for the inner surface of the substrate move in the vertical direction 101. FIG. 3 shows the conductive substrate 1 and FIG. 4 shows the substrate holding tower 4. FIG.
FIG. 7 is a cross-sectional view illustrating another embodiment of the present invention. 6 to 9
Are various towers used in the present invention. 6 and 7 show a structure in which the tower holding the base has a small contact area between the inner surface of the base and the outer surface of the tower. By reducing the contact area between the base and the tower, a portion where the base and the tower are not in contact with each other is shown. Fluid flows into the device, and rinsing is quickly performed. Fig. 6 shows the tower exterior and inside the tower
This is an example in which a structure having a hole penetrating the surface is used, and a hole penetrating the tower outer surface 4a and the tower inner surface 4b is provided in the center of the tower side surface 4c in contact with the base inner surface 1b . Ma
And, Figure 7 is a tower, a portion for holding the substrate to the outer surface
Example using a structure having a space where rinsing water accumulates
, And the are closed at least three or more rows in the vertical direction of the groove in the tower outer surface 4a in contact with the substrate inner surface 1b. 8 and 9
Is a tower having a structure having a discharge port for fluid entering the gap between the inner surface 1b of the base and the outer surface 4a of the tower. Since the fluid that has flowed down along the inner surface is more likely to flow into the gap, rinsing and washing are performed quickly. Specifically, FIG. 8 shows a tower having a structure in which a gap is formed between the lower surface 1c of the base and the upper surface 4d of the tower in contact with the lower surface 1c. FIG. 9 shows the tower upper surface 4d in contact with the base lower surface 1c.
Is a tower having a structure having a plurality of holes.

【0007】以下の実施例、比較例での評価方法は、そ
れぞれの条件ですすぎ洗浄後の基体に付着した純水に含
まれる洗剤濃度で評価する。評価は5段階評価とし、
“5”は洗剤濃度が低く、“1”は洗剤濃度が高いもの
とする。なお、評価は各要素別にランク付けした。実施
例1〜4は図5に示す概略図によって行った。 実施例:1 アルミニウム合金で構成された導電性基体
1を、タワー4にのせ、水系下で洗浄した。その後、基
体1を周方向100に回転させつつ、外面ノズル2及び
内面ノズル3より噴射される形状がフイルム状の純水を
打ち当て、5分間すすぎ洗浄を行った。評価は5であっ
た。 比較例:1 実施例1において、ノズルより噴射される
形状が棒状の純水ですすぎ洗浄を行った。評価は3であ
った。 比較例:2 実施例1において、ノズルより噴射される
形状が霧状の純水ですすぎ洗浄を行った。評価は2であ
った。 実施例:2 アルミニウム合金で構成された導電性基体
1を、タワー4にのせ、水系下で洗浄した。その後、基
体1を周方向100に回転させつつ、外面ノズル2及び
内面ノズル3より噴射される形状がフイルム状の純水を
打ち当て、5分間すすぎ洗浄を行った。この際のすすぎ
洗浄時間の割り付けを次のようにした。基体上部=1/
2,基体中部=1/4,基体下部=1/4。評価は5で
あった。 実施例:3 アルミニウム合金で構成された導電性基体
1を、図6に示すタワーにのせ、水系下で洗浄した。そ
の後、基体1を周方向100に回転させつつ、外面ノズ
ル2及び内面ノズル3より噴射される形状がフイルム状
の純水を打ち当て、5分間すすぎ洗浄を行った。評価は
5であった。又、図7に示すタワーを用いても同様の結
果が得られた。 実施例:4 アルミニウム合金で構成された導電性基体
1を、図8に示すタワーにのせ、水系下で洗浄した。そ
の後、基体1を周方向100に回転させつつ、外面ノズ
ル2及び内面ノズル3より噴射される形状がフイルム状
の純水を打ち当て、5分間すすぎ洗浄を行った。評価は
5であった。又、図9に示すタワーを用いても同様の結
果が得られた。
The evaluation method in the following Examples and Comparative Examples is evaluated under each condition by the concentration of the detergent contained in pure water adhered to the substrate after rinsing. Evaluation is a five-point scale,
"5" indicates that the detergent concentration is low, and "1" indicates that the detergent concentration is high. The evaluation was ranked for each element. Examples 1 to 4 were performed according to the schematic diagram shown in FIG. Example 1 A conductive substrate 1 made of an aluminum alloy was placed on a tower 4 and washed under an aqueous system. After that, while rotating the base 1 in the circumferential direction 100, a film-like pure water jetted from the outer nozzle 2 and the inner nozzle 3 was struck and rinsed for 5 minutes. The evaluation was 5. Comparative Example 1 In Example 1, the cleaning was performed by rinsing with pure water having a rod-like shape sprayed from the nozzle. The evaluation was 3. Comparative Example: 2 In Example 1, rinsing was performed with pure water in which the shape sprayed from the nozzle was mist. The evaluation was 2. Example: 2 A conductive substrate 1 made of an aluminum alloy was placed on a tower 4 and washed under an aqueous system. After that, while rotating the base 1 in the circumferential direction 100, a film-like pure water jetted from the outer nozzle 2 and the inner nozzle 3 was struck and rinsed for 5 minutes. At this time, the rinsing time was assigned as follows. Substrate upper part = 1 /
2, middle part of substrate = 1/4, lower part of substrate = 1/4. The evaluation was 5. Example 3 A conductive substrate 1 made of an aluminum alloy was placed on a tower shown in FIG. 6 and washed under an aqueous system. After that, while rotating the base 1 in the circumferential direction 100, a film-like pure water jetted from the outer nozzle 2 and the inner nozzle 3 was struck and rinsed for 5 minutes. The evaluation was 5. Similar results were obtained using the tower shown in FIG. Example 4 A conductive substrate 1 made of an aluminum alloy was placed on a tower shown in FIG. 8 and washed under an aqueous system. After that, while rotating the base 1 in the circumferential direction 100, a film-like pure water jetted from the outer nozzle 2 and the inner nozzle 3 was struck and rinsed for 5 minutes. The evaluation was 5. Similar results were obtained using the tower shown in FIG.

【0008】[0008]

【発明の効果】以上説明したように、純水をフイルム状
に噴射スプレイする本発明の方法によれば、すすぎ面積
が大きく、同一純水量で、他の流体形状のスプレイに比
べ強いすすぎ力が得られ、基体に作用した純水が回りに
飛び散らずに基体に添って流れ落ちるので、作用点以下
のすすぎも同時に行われる。さらに、基体上部のすすぎ
洗浄時間を全体の半分以上にすることにより、上部に作
用した純水が基体表面に添って流れ落ちるため、噴射さ
れた純水の作用点以下も同時にすすぎ洗浄される。ま
た、基体とタワーとの接触面積を少なくすることによ
り、基体とタワーが接触していない部分に流体が流れ込
み、すすぎ洗浄が速やかに行われること、及び、基体内
面とタワー外面との隙間に流れ込んだ流体が排水口によ
り速やかに排水され、すすぎ洗浄が速やかに行われるこ
とは、本発明の大きな利点である。
As described above, according to the method of the present invention for spraying pure water in the form of a film, the rinse area is large, the same pure water amount is used, and a stronger rinsing force is obtained as compared with sprays of other fluid shapes. The obtained pure water that has acted on the substrate flows down along the substrate without being scattered around, so that rinsing below the point of application is simultaneously performed. Further, by making the rinse time of the upper part of the base more than half of the whole, the pure water acting on the upper part flows down along the surface of the base, so that the pure water acting below the working point of the jetted pure water is also rinsed at the same time. Further, by reducing the contact area between the base and the tower, the fluid flows into a portion where the base and the tower are not in contact with each other, so that the rinsing is quickly performed, and the flow into the gap between the inner surface of the base and the outer surface of the tower. It is a great advantage of the present invention that the fluid is quickly drained by the drain and the rinsing is performed quickly.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】従来例を示す断面図である。FIG. 2 is a sectional view showing a conventional example.

【図3】導電性基体を示す平面図と正面図である。FIG. 3 is a plan view and a front view showing a conductive substrate.

【図4】基体保持タワーを示す平面図と正面図である。FIG. 4 is a plan view and a front view showing the base holding tower.

【図5】本発明の他の実施例を示す断面図である。FIG. 5 is a sectional view showing another embodiment of the present invention.

【図6】本発明に用いられる他のタワーを示す平面図と
正面図である。
FIG. 6 is a plan view and a front view showing another tower used in the present invention.

【図7】本発明に用いられる他のタワーを示す平面図と
正面図である。
FIG. 7 is a plan view and a front view showing another tower used in the present invention.

【図8】本発明に用いられる他のタワーを示す平面図と
正面図である。
FIG. 8 is a plan view and a front view showing another tower used in the present invention.

【図9】本発明に用いられる他のタワーを示す平面図と
正面図である。
FIG. 9 is a plan view and a front view showing another tower used in the present invention.

【符号の説明】[Explanation of symbols]

1 導電性基体 1a 導電性基体外面 1b 導電性基体内面 1c 導電性基体下端面 2 基体外面用ノズル 3 基体内面用ノズル 4 基体保持タワー 4a 基体保持タワー外面 4b 基体保持タワー内面 4c 基体保持タワー側面 4d 基体保持タワー上面 5a 噴射流体 5b 反射流体 100 周方向 101 上下方向 Reference Signs List 1 conductive substrate 1a conductive substrate outer surface 1b conductive substrate inner surface 1c conductive substrate lower end surface 2 substrate outer surface nozzle 3 substrate inner surface nozzle 4 substrate holding tower 4a substrate holding tower outer surface 4b substrate holding tower inner surface 4c substrate holding tower side surface 4d Upper surface of substrate holding tower 5a Injected fluid 5b Reflected fluid 100 Circumferential direction 101 Vertical direction

フロントページの続き (56)参考文献 特開 平1−130159(JP,A) 特開 平3−237462(JP,A) (58)調査した分野(Int.Cl.7,DB名) G03G 5/00 - 5/16 Continuation of the front page (56) References JP-A-1-130159 (JP, A) JP-A-3-237462 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G03G 5 / 00-5/16

Claims (8)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フイルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法であって、該タワーが、その外面に、基体を保持す
る部分とすすぎ水が溜まる空間部分とを有する構造体で
あることを特徴とするすすぎ洗浄方法。
The method according to claim 1 aluminum or conductive substrate of the electrophotographic photosensitive member comprising an alloy thereof, washed with an aqueous system, base
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in the form of a film.
Rinse and rinse on the inner and outer surfaces of the substrate
The method, wherein the tower holds a substrate on an outer surface thereof.
And a space where rinsing water accumulates
Rinse method is characterized in that.
【請求項2】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フィルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法であって、該タワーが、タワー外面とタワー内面を
貫通する穴を有する構造体であることを特徴とするすす
ぎ洗浄方法。
2. An electron made of aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in a film form.
Rinse and rinse on the inner and outer surfaces of the substrate
The method, wherein the tower has an outer surface and an inner surface of the tower.
Soot characterized by a structure having a hole therethrough
Cleaning method.
【請求項3】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フイルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法であって、該タワーが、基体下面とタワー上面との
間に隙間が出来る構造であることを特徴とするすすぎ洗
浄方法。
3. An electron made of aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in the form of a film.
Rinse and rinse on the inner and outer surfaces of the substrate
The method, wherein the tower comprises a base lower surface and a tower upper surface.
Rinsing characterized by a structure with a gap between them
Purification method.
【請求項4】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フイルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法であって、該タワーが、タワー上面に複数個の穴を
有する構造であることを特徴とするすすぎ洗浄方法。
4. An electron made of aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in the form of a film.
Rinse and rinse on the inner and outer surfaces of the substrate
The method, wherein the tower comprises a plurality of holes in a top surface of the tower.
A rinsing cleaning method characterized by having a structure having:
【請求項5】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フィルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法に用いるタワーであって、その外面に、基体を保持
する部分とすすぎ水が溜まる空間部分とを有する構造体
である ことを特徴とする基体保持タワー。
5. An electron comprising aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in a film form.
Rinse and rinse on the inner and outer surfaces of the substrate
Tower used in the method, holding the substrate on its outer surface
Having a part to be rinsed and a space part to store rinsing water
Substrate holding tower, characterized in that it.
【請求項6】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フィルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法に用いるタワーであって、タワー外面とタワー内面
を貫通する穴を有する構造体であることを特徴とする基
体保持タワー
6. An electron comprising aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in a film form.
Rinse and rinse on the inner and outer surfaces of the substrate
The tower used for the method, the outer surface of the tower and the inner surface of the tower
A structure having a hole penetrating through the base
Body holding tower .
【請求項7】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フイルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法に用いるタワーであって、基体下面とタワー上面と
の間に隙間が出来る構造であることを特徴とする基体保
持タワー。
7. An electron comprising aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in the form of a film.
Rinse and rinse on the inner and outer surfaces of the substrate
A tower used in the method, comprising: a base lower surface and a tower upper surface.
A structure that has a gap between
Holding tower.
【請求項8】 アルミニウム又はその合金からなる電子
写真感光体の導電性基体を、水系下で洗浄した後、該基
体をタワーに被せて保持し、スリットノズルより純水を
フイルム状にかつ連続的に噴射スプレイし、該噴射スプ
レイを基体内面及び外面上に打ち当ててすすぎ洗浄する
方法に用いるタワーであって、タワー上面に複数個の穴
を有する構造であることを特徴とする基体保持タワー。
8. An electron made of aluminum or an alloy thereof.
After washing the conductive substrate of the photographic photoreceptor in an aqueous system,
Hold the body over the tower and hold it with pure water from the slit nozzle.
The spray is sprayed continuously in the form of a film.
Rinse and rinse on the inner and outer surfaces of the substrate
A tower used in the method, wherein a plurality of holes are
A base holding tower having a structure having:
JP16552193A 1993-07-05 1993-07-05 Rinse cleaning method for electrophotographic photoreceptor Expired - Lifetime JP3147594B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16552193A JP3147594B2 (en) 1993-07-05 1993-07-05 Rinse cleaning method for electrophotographic photoreceptor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16552193A JP3147594B2 (en) 1993-07-05 1993-07-05 Rinse cleaning method for electrophotographic photoreceptor

Publications (2)

Publication Number Publication Date
JPH0720643A JPH0720643A (en) 1995-01-24
JP3147594B2 true JP3147594B2 (en) 2001-03-19

Family

ID=15813975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16552193A Expired - Lifetime JP3147594B2 (en) 1993-07-05 1993-07-05 Rinse cleaning method for electrophotographic photoreceptor

Country Status (1)

Country Link
JP (1) JP3147594B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5643556B2 (en) * 2009-07-10 2014-12-17 キヤノン株式会社 A method for rinsing and cleaning a cylindrical substrate for an electrophotographic photoreceptor and a method for producing an electrophotographic photoreceptor.

Also Published As

Publication number Publication date
JPH0720643A (en) 1995-01-24

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