JP3390053B2 - 無電解法でブラックマトリックスを製造する方法 - Google Patents
無電解法でブラックマトリックスを製造する方法Info
- Publication number
- JP3390053B2 JP3390053B2 JP19725493A JP19725493A JP3390053B2 JP 3390053 B2 JP3390053 B2 JP 3390053B2 JP 19725493 A JP19725493 A JP 19725493A JP 19725493 A JP19725493 A JP 19725493A JP 3390053 B2 JP3390053 B2 JP 3390053B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electroless
- silane
- nickel
- black matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Chemically Coating (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL92202486:4 | 1992-08-12 | ||
| EP92202486 | 1992-08-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06186417A JPH06186417A (ja) | 1994-07-08 |
| JP3390053B2 true JP3390053B2 (ja) | 2003-03-24 |
Family
ID=8210847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19725493A Expired - Fee Related JP3390053B2 (ja) | 1992-08-12 | 1993-08-09 | 無電解法でブラックマトリックスを製造する方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3390053B2 (mo) |
| DE (1) | DE69315765T2 (mo) |
| TW (1) | TW238360B (mo) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8046506B2 (en) | 2006-03-21 | 2011-10-25 | Mediatek Inc. | FIFO system and operating method thereof |
| US9144794B2 (en) * | 2011-08-17 | 2015-09-29 | Rohm And Haas Electronic Materials Llc | Stable catalyst for electroless metallization |
| TWI526573B (zh) * | 2011-08-17 | 2016-03-21 | 羅門哈斯電子材料有限公司 | 用於無電金屬化之安定催化劑 |
| KR101904095B1 (ko) * | 2011-08-17 | 2018-10-04 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 무전해 금속화를 위한 안정한 무주석 촉매 |
| KR102115561B1 (ko) * | 2013-09-16 | 2020-05-27 | 삼성디스플레이 주식회사 | 폴리이미드 기판의 제조 방법 및 이를 이용하는 표시장치의 제조 방법 |
| JP6177670B2 (ja) | 2013-11-21 | 2017-08-09 | 東京エレクトロン株式会社 | めっきの前処理方法、無電解めっき方法および記憶媒体 |
| JP6466182B2 (ja) * | 2015-01-19 | 2019-02-06 | 国立研究開発法人産業技術総合研究所 | 無電解めっき用パラジウムヒドロゾル触媒液とその調製方法 |
| JP6660116B2 (ja) * | 2015-08-03 | 2020-03-04 | 東京応化工業株式会社 | シランカップリング剤水溶液、単分子膜製造方法及びめっき造形方法 |
-
1993
- 1993-08-09 JP JP19725493A patent/JP3390053B2/ja not_active Expired - Fee Related
- 1993-08-09 DE DE1993615765 patent/DE69315765T2/de not_active Expired - Fee Related
- 1993-09-01 TW TW82107145A patent/TW238360B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06186417A (ja) | 1994-07-08 |
| DE69315765T2 (de) | 1998-06-10 |
| DE69315765D1 (de) | 1998-01-29 |
| TW238360B (mo) | 1995-01-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |