JP3979694B2 - 静電チャック装置およびその製造方法 - Google Patents

静電チャック装置およびその製造方法 Download PDF

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Publication number: JP3979694B2
Authority: JP; Japan
Prior art keywords: electrostatic chuck; insulating plate; ceramic; electrode layer; adhesive layer
Prior art date: 1997-01-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

JP2319397A

Other languages

English (en)

Japanese (ja)

Other versions

JPH10209257A5 (2

JPH10209257A (ja

Inventor

忠生松永

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Tomoegawa Co Ltd

Original Assignee

Tomoegawa Paper Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-01-22

Filing date

1997-01-22

Publication date

2007-09-19

1997-01-22 Application filed by Tomoegawa Paper Co Ltd filed Critical Tomoegawa Paper Co Ltd

1997-01-22 Priority to JP2319397A priority Critical patent/JP3979694B2/ja

1998-01-22 Priority to US09/010,934 priority patent/US6166897A/en

1998-01-22 Priority to KR1019980001918A priority patent/KR100290264B1/ko

1998-08-07 Publication of JPH10209257A publication Critical patent/JPH10209257A/ja

2004-11-25 Publication of JPH10209257A5 publication Critical patent/JPH10209257A5/ja

2007-09-19 Application granted granted Critical

2007-09-19 Publication of JP3979694B2 publication Critical patent/JP3979694B2/ja

2017-01-22 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

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Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

JP2319397A 1997-01-22 1997-01-22 静電チャック装置およびその製造方法 Expired - Fee Related JP3979694B2 (ja)

Priority Applications (3)

Application Number	Priority Date	Filing Date	Title
JP2319397A JP3979694B2 (ja)	1997-01-22	1997-01-22	静電チャック装置およびその製造方法
US09/010,934 US6166897A (en)	1997-01-22	1998-01-22	Static chuck apparatus and its manufacture
KR1019980001918A KR100290264B1 (ko)	1997-01-22	1998-01-22	정전처크장치 및 그 제조방법

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2319397A JP3979694B2 (ja)	1997-01-22	1997-01-22	静電チャック装置およびその製造方法

Publications (3)

Publication Number	Publication Date
JPH10209257A JPH10209257A (ja)	1998-08-07
JPH10209257A5 JPH10209257A5 (2)	2004-11-25
JP3979694B2 true JP3979694B2 (ja)	2007-09-19

Family

ID=12103839

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2319397A Expired - Fee Related JP3979694B2 (ja)	1997-01-22	1997-01-22	静電チャック装置およびその製造方法

Country Status (1)

Country	Link
JP (1)	JP3979694B2 (2)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6716302B2 (en)	2000-11-01	2004-04-06	Applied Materials Inc.	Dielectric etch chamber with expanded process window
WO2002037541A2 (en) *	2000-11-01	2002-05-10	Applied Materials, Inc.	Etch chamber for etching dielectric layer with expanded process window
FR2875054B1 (fr) *	2004-09-08	2006-12-01	Cit Alcatel	Support de substrats minces
US7648914B2 (en)	2004-10-07	2010-01-19	Applied Materials, Inc.	Method for etching having a controlled distribution of process results
US7544251B2 (en) *	2004-10-07	2009-06-09	Applied Materials, Inc.	Method and apparatus for controlling temperature of a substrate
US7436645B2 (en)	2004-10-07	2008-10-14	Applied Materials, Inc.	Method and apparatus for controlling temperature of a substrate
US9275887B2 (en)	2006-07-20	2016-03-01	Applied Materials, Inc.	Substrate processing with rapid temperature gradient control
JP5557164B2 (ja) *	2010-03-24	2014-07-23	Ｔｏｔｏ株式会社	静電チャック

1997
- 1997-01-22 JP JP2319397A patent/JP3979694B2/ja not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JPH10209257A (ja)	1998-08-07

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2007-06-19	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070619
2007-07-05	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070626
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Publication	Publication Date	Title
US6813134B2 (en)	2004-11-02	Electrostatic chucking device and manufacturing method thereof
KR100225148B1 (ko)	1999-10-15	정전척 장치 및 그의 제작방법
US5691876A (en)	1997-11-25	High temperature polyimide electrostatic chuck
JP6017781B2 (ja)	2016-11-02	基板温調固定装置及びその製造方法
JPH0587177B2 (2)	1993-12-15
US6166897A (en)	2000-12-26	Static chuck apparatus and its manufacture
TW202105596A (zh)	2021-02-01	基板固定裝置及其製造方法
JP2020088304A (ja)	2020-06-04	基板固定装置
JPH06216224A (ja)	1994-08-05	静電チャック及びその作製方法並びに基板処理装置及び基板搬送装置
JP3979694B2 (ja)	2007-09-19	静電チャック装置およびその製造方法
JP2002324834A (ja)	2002-11-08	静電チャック装置、静電チャック用積層シート、および静電チャック用接着剤
TWI900715B (zh)	2025-10-11	靜電夾盤、其製造方法及基板固定裝置
JPH10209256A (ja)	1998-08-07	静電チャック装置およびその製造方法
JPH11297805A (ja)	1999-10-29	静電チャック装置、静電チャック用積層シート、および静電チャック用接着剤
JP7335371B2 (ja)	2023-08-29	静電チャック装置
TW202445743A (zh)	2024-11-16	基板固定裝置
JP4744015B2 (ja)	2011-08-10	ウエハ支持部材
JPH10209257A5 (2)	2004-11-25
KR102852232B1 (ko)	2025-08-29	정전 척 및 기판 고정 장치
WO2024202025A1 (ja)	2024-10-03	セラミックス構造体
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