JP4097973B2 - アルカリ現像液の濃度測定方法 - Google Patents

アルカリ現像液の濃度測定方法 Download PDF

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Publication number
JP4097973B2
JP4097973B2 JP2002097479A JP2002097479A JP4097973B2 JP 4097973 B2 JP4097973 B2 JP 4097973B2 JP 2002097479 A JP2002097479 A JP 2002097479A JP 2002097479 A JP2002097479 A JP 2002097479A JP 4097973 B2 JP4097973 B2 JP 4097973B2
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Japan
Prior art keywords
concentration
developer
alkali
component
measuring
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Expired - Fee Related
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JP2002097479A
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English (en)
Japanese (ja)
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JP2003295470A (ja
Inventor
典生 山口
軌雄 五十嵐
恭 井上
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松下環境空調エンジニアリング株式会社
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Priority to JP2002097479A priority Critical patent/JP4097973B2/ja
Priority to KR20030018961A priority patent/KR100916986B1/ko
Priority to TW92106924A priority patent/TW200305794A/zh
Publication of JP2003295470A publication Critical patent/JP2003295470A/ja
Application granted granted Critical
Publication of JP4097973B2 publication Critical patent/JP4097973B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162—Determining the equivalent point by means of a discontinuity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162—Determining the equivalent point by means of a discontinuity
    • G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002097479A 2002-03-29 2002-03-29 アルカリ現像液の濃度測定方法 Expired - Fee Related JP4097973B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002097479A JP4097973B2 (ja) 2002-03-29 2002-03-29 アルカリ現像液の濃度測定方法
KR20030018961A KR100916986B1 (ko) 2002-03-29 2003-03-26 알카리 현상액의 농도측정방법 및 현상액 조제방법
TW92106924A TW200305794A (en) 2002-03-29 2003-03-27 Method for determining the concentration of alkaline developer and method for preparing developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002097479A JP4097973B2 (ja) 2002-03-29 2002-03-29 アルカリ現像液の濃度測定方法

Publications (2)

Publication Number Publication Date
JP2003295470A JP2003295470A (ja) 2003-10-15
JP4097973B2 true JP4097973B2 (ja) 2008-06-11

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JP2002097479A Expired - Fee Related JP4097973B2 (ja) 2002-03-29 2002-03-29 アルカリ現像液の濃度測定方法

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JP (1) JP4097973B2 (2)
KR (1) KR100916986B1 (2)
TW (1) TW200305794A (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100916986B1 (ko) * 2002-03-29 2009-09-14 파나소닉 칸쿄 엔지니어링 가부시키가이샤 알카리 현상액의 농도측정방법 및 현상액 조제방법

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
JP2006189646A (ja) * 2005-01-06 2006-07-20 Nagase & Co Ltd レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法
JP5000246B2 (ja) * 2005-09-28 2012-08-15 株式会社半導体エネルギー研究所 排液処理方法及び処理装置
JP6721157B2 (ja) * 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6551784B2 (ja) * 2015-08-31 2019-07-31 パナソニックＩｐマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
JP6551787B2 (ja) * 2015-09-28 2019-07-31 パナソニックＩｐマネジメント株式会社 レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
CN106596840B (zh) * 2016-12-15 2019-01-22 深圳市华星光电技术有限公司 显影液碱液浓度测量方法及调节方法
JP2018120893A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の成分濃度測定装置、及び現像液管理装置
JP2018120895A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120901A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120900A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液管理装置
JP6624762B2 (ja) * 2019-01-30 2019-12-25 株式会社平間理化研究所 現像液の管理方法及び装置
CN120594741B (zh) * 2025-08-06 2025-10-10 信联电子材料科技股份有限公司 一种tmah显影液碳酸检测方法、装置及系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142781A (ja) * 1991-11-19 1993-06-11 Konica Corp 感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機
JP2001154373A (ja) * 1999-11-26 2001-06-08 Fuji Photo Film Co Ltd 感光性平版印刷版の処理方法
JP4097973B2 (ja) * 2002-03-29 2008-06-11 松下環境空調エンジニアリング株式会社 アルカリ現像液の濃度測定方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100916986B1 (ko) * 2002-03-29 2009-09-14 파나소닉 칸쿄 엔지니어링 가부시키가이샤 알카리 현상액의 농도측정방법 및 현상액 조제방법

Also Published As

Publication number Publication date
JP2003295470A (ja) 2003-10-15
TW200305794A (en) 2003-11-01
KR100916986B1 (ko) 2009-09-14
KR20030078694A (ko) 2003-10-08
TWI313794B (2) 2009-08-21

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