JP5209573B2 - 芳香族ジカルボン酸の製造のための2段階酸化方法 - Google Patents
芳香族ジカルボン酸の製造のための2段階酸化方法 Download PDFInfo
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- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
- C07C51/255—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting
- C07C51/265—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting having alkyl side chains which are oxidised to carboxyl groups
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Description
(1)(i)ジアルキルベンゼン化合物、(ii)酸化触媒成分を溶解した水性酢酸反応媒体及び(iii)酸素含有ガスを第一加圧酸化ゾーン(第一加圧酸化反応器の内部の温度及び圧力は150〜180℃及び3.5〜13バール(絶対)(約50〜189ポンド/平方インチ−psia)に保持する)に供給し、前記ゾーン内でジアルキルベンゼン化合物を液相発熱酸化せしめ;
(2)第一反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき9容量%未満の酸素を含む酸素枯渇ガスを除去し;
(3)第一反応器の下部から、(i)固体及び溶解ベンゼンジカルボン酸及び不完全酸化生成物並びに(ii)酸化触媒が溶解された水性酢酸反応媒体を含む酸化反応生成物を除去し;
(4)(i)工程(3)の酸化反応生成物及び(ii)酸素含有ガスを第二加圧酸化ゾーン(第二加圧酸化反応器の内部の温度及び圧力は185〜230℃及び4.5〜18.3バール(絶対)(約65〜265psia)に保持する)に供給し、前記ゾーン内で不完全酸化生成物を液相発熱酸化せしめ;
(5)第二反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき5容量%未満の酸素を含む酸素枯渇ガスを除去し;
(6)第二反応器の下部から、(i)固体及び溶解ベンゼンジカルボン酸並びに(ii)酸化触媒を溶解した水性酢酸反応媒体を含む第2酸化反応生成物を除去し;そして
(7)工程(6)の(ii)水性酢酸反応媒体からベンゼンジカルボン酸を分離して、150ppmw未満のカルボキシアルデヒド及びトルイル酸を含むベンゼンジカルボン酸を得る
工程を含むベンゼンジカルボン酸の製造方法を提供する。
1.合計150ppmw未満のカルボキシベンズアルデヒド及びトルイル酸を含むベンゼンジカルボン酸の製造方法であって、
(1)(i)ジアルキルベンゼン化合物、(ii)酸化触媒成分を溶解した水性酢酸反応媒体及び(iii)酸素含有ガスを第一加圧酸化ゾーン(第一加圧酸化反応器の内部の温度及び圧力は150〜180℃及び3.5〜13バール(絶対)(bara)に保持する)に供給して、前記ゾーン内でジアルキルベンゼン化合物を液相発熱酸化せしめ;
(2)第一反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき、9容量%未満の酸素を含む酸素枯渇ガスを除去し;
(3)第一反応器の下部から、(i)固体及び溶解ベンゼンジカルボン酸及び不完全酸化生成物並びに(ii)酸化触媒を溶解した水性酢酸反応媒体を含む酸化反応生成物を除去し;
(4)(i)工程(3)の酸化反応生成物及び(ii)酸素含有ガスを第二加圧酸化ゾーン(第二加圧酸化反応器の内部の温度及び圧力は185〜230℃及び4.5〜18.3バール(絶対)に保持されている)に供給して、前記ゾーン内で不完全酸化生成物を液相発熱酸化せしめ;
(5)第二反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき5容量%未満の酸素を含む酸素枯渇ガスを除去し;
(6)第二反応器の下部から、(i)固体及び溶解ベンゼンジカルボン酸並びに(ii)酸化触媒を溶解した水性酢酸反応媒体を含む第2酸化反応生成物を除去し;そして
(7)工程(6)の(ii)水性酢酸反応媒体からベンゼンジカルボン酸を分離して、150ppmw未満のカルボキシアルデヒド及びトルイル酸を含むベンゼンジカルボン酸を得る
工程を含んでなるベンゼンジカルボン酸の製造方法。
2.合計150ppmw未満のp−カルボキシベンズアルデヒド及びp−トルイル酸を含むテレフタル酸の製造方法であって、
(1)(i)p−キシレン、(ii)酸化触媒成分を溶解した水性酢酸反応媒体及び(iii)酸素含有ガスを第一加圧酸化ゾーン(第一加圧酸化反応器の内部の温度及び圧力は150〜180℃及び3.5〜13バール(絶対)(bara)に保持する)に供給し、前記ゾーン内でジアルキルベンゼン化合物を液相発熱酸化せしめ;
(2)第一反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき9容量%未満の酸素を含む酸素枯渇ガスを除去し;
(3)第一反応器の下部から、(i)固体及び溶解テレフタル酸及び不完全酸化生成物並びに(ii)酸化触媒を溶解した水性酢酸反応媒体を含む酸化反応生成物を除去し;
(4)(i)工程(3)の酸化反応生成物及び(ii)酸素含有ガスを第二加圧酸化ゾーン(第二加圧酸化反応器の内部の温度及び圧力は185〜230℃及び4.5〜18.3バール(絶対)(bara)に保持する)に供給し、前記ゾーン内で不完全酸化生成物の液相発熱酸化を起こらせ;
(5)第二反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに二酸化炭素、メタン、不活性成分及び前記蒸気の非凝縮性成分に基づき0〜1容量%の酸素を含む酸素枯渇ガスを除去し;
(6)第二反応器の下部から、(i)固体及び溶解テレフタル酸並びに(ii)酸化触媒を溶解した水性酢酸反応媒体を含む第2酸化反応生成物を除去し;そして
(7)工程(6)の(ii)水性酢酸反応媒体からテレフタル酸を分離して、150ppmw未満のp−カルボキシアルデヒド及びp−トルイル酸を含むテレフタル酸を得る
工程を含む態様1に記載の方法。
3.前記工程(1)を、コバルト、マンガン及び臭素を溶解した酸化触媒成分を含む4〜5重量%の水を含む水性酢酸反応媒体の存在下で155〜165℃及び5.2〜6.9バール(絶対)において実施し、且つ前記工程(4)の第二加圧酸化ゾーンを温度205〜215℃及び圧力13.4〜17.2バール(絶対)に保持する態様2に記載の方法。
4.原子比Co:Mn:Brが5〜40:1.0:4〜40である態様3に記載の方法。
5.工程(6)の第2酸化反応生成物をフラッシュ蒸発ゾーンに供給し、そこで第2酸化反応生成物の温度及び圧力をフラッシュ蒸発によって低下させる態様1に記載の方法。
6.工程(6)の第2酸化反応生成物を、(i)温度170〜190℃及び圧力2.4〜5.2baraで運転される第一フラッシュ容器及び(ii)温度60〜100℃及び圧力0.3〜0.8バール(絶対)で運転される第二フラッシュ容器を含むフラッシュ蒸発ゾーンに供給し、その中で第2酸化反応生成物の温度及び圧力をフラッシュ蒸発によって低下させる態様2に記載の方法。
Claims (5)
- テレフタル酸を含み、かつ、合計150ppmw未満の4−カルボキシベンズアルデヒド及びp−トルイル酸を含むベンゼンジカルボン酸の4−カルボキシベンズアルデヒド及びp−トルイル酸の含量を減少させる方法であって、
(1)(i)p−キシレン、(ii)コバルト、マンガン及び臭素を含む酸化触媒成分を溶解した水性酢酸反応媒体及び(iii)酸素含有ガスを、内部の温度及び圧力を150〜165℃及び3.5〜13バール(絶対)に保持した第一加圧酸化反応器を含む第一加圧酸化ゾーンに供給して、(i)副生物である4−カルボキシベンズアルデヒド及びp−トルイル酸を有する溶解したテレフタル酸及びテレフタル酸固形物並びに(ii)酸化触媒組成物を溶解させた水性酸性反応媒体を含む酸化反応組成物を生成せしめ、前記ゾーン内でジアルキルベンゼン化合物を液相発熱酸化せしめ;
(2)第一反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気並びに酸素枯渇ガスを除去し;
(3)第一反応器の下部から酸化反応組成物を除去し;
(4)(i)工程(3)の酸化反応組成物及び(ii)酸素含有ガスを第二加圧酸化ゾーンへ供給し、ここで、4−カルボキシベンズアルデヒド及びp−トルイル酸の液相発熱酸化が起り、第二加圧酸化反応器の内部の温度及び圧力は185〜230℃及び4.5〜18.3バール(絶対)に保持されており、前記第一加圧酸化反応器内の条件は、以下の工程(7)で150ppmw未満の4−カルボキシベンズアルデヒド及びp−トルイル酸含量を与える前記第二加圧酸化反応器内での更なる酸化を可能にする、前記副生物を含むテレフタル酸固形物を生成せしめ;
(5)第二反応器の上部から、蒸発した水性酢酸反応媒体を含む蒸気及び酸素枯渇ガスを除去し;
(6)第二反応器の下部から、(i)固体及び溶解テレフタル酸並びに(ii)酸化触媒組成物を溶解した水性酢酸反応媒体を含む第2酸化反応組成物を除去し;そして
(7)工程(6)の(ii)水性酢酸反応媒体からテレフタル酸を分離して、150ppmw未満の4−カルボキシアルデヒド及びp−トルイル酸を含むテレフタル酸組成物を得る
工程を含んでなるベンゼンジカルボン酸中の4−カルボキシベンズアルデヒド及びp−トルイル酸の含量を減少させる方法。 - 前記工程(1)を、コバルト、マンガン及び臭素を溶解した酸化触媒成分を含む4〜5重量%の水を含む水性酢酸反応媒体の存在下で155〜165℃及び5.2〜6.9バール(絶対)において実施し、且つ前記工程(4)の第二加圧酸化ゾーンを温度205〜215℃及び圧力13.4〜17.2バール(絶対)に保持する請求項1に記載の方法。
- 原子比Co:Mn:Brが5〜40:1.0:4〜40である請求項2に記載の方法。
- 工程(6)の第2酸化反応組成物をフラッシュ蒸発ゾーンに供給し、そこで第2酸化反応組成物の温度及び圧力をフラッシュ蒸発によって低下させる請求項1に記載の方法。
- 工程(6)の第2酸化反応生成物を、(i)温度170〜190℃及び圧力2.4〜5.2バール(絶対)で運転される第一フラッシュ容器及び(ii)温度60〜100℃及び圧力0.3〜0.8バール(絶対)で運転される第二フラッシュ容器を含むフラッシュ蒸発ゾーンに供給し、その中で第2酸化反応生成物の温度及び圧力をフラッシュ蒸発によって低下させる請求項1に記載の方法。
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| US29561801P | 2001-06-04 | 2001-06-04 | |
| US60/295,618 | 2001-06-04 | ||
| US10/156,312 US7485747B2 (en) | 2001-06-04 | 2002-05-28 | Two stage oxidation process for the production of aromatic dicarboxylic acids |
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2002
- 2002-05-28 US US10/156,312 patent/US7485747B2/en not_active Expired - Lifetime
- 2002-06-04 JP JP2003501825A patent/JP2004529197A/ja not_active Ceased
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- 2002-06-04 RU RU2003137819/04A patent/RU2337903C2/ru active
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- 2002-06-04 PT PT100042258T patent/PT2223908T/pt unknown
- 2002-06-04 BR BR0209833-4A patent/BR0209833A/pt not_active Application Discontinuation
- 2002-06-04 CN CNB028109295A patent/CN100445256C/zh not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CA2448071C (en) | 2009-09-15 |
| EP2223908B1 (en) | 2017-07-26 |
| EP1392634A1 (en) | 2004-03-03 |
| ES2645093T3 (es) | 2017-12-04 |
| JP2013010801A (ja) | 2013-01-17 |
| BR0209833A (pt) | 2004-06-15 |
| JP2004529197A (ja) | 2004-09-24 |
| RU2337903C2 (ru) | 2008-11-10 |
| PT2223908T (pt) | 2017-11-09 |
| JP2009263382A (ja) | 2009-11-12 |
| EP2223908A1 (en) | 2010-09-01 |
| CN1512976A (zh) | 2004-07-14 |
| RU2003137819A (ru) | 2005-04-20 |
| CA2448071A1 (en) | 2002-12-12 |
| MXPA03010971A (es) | 2004-02-27 |
| US20020183546A1 (en) | 2002-12-05 |
| CN100445256C (zh) | 2008-12-24 |
| JP5670981B2 (ja) | 2015-02-18 |
| WO2002098834A1 (en) | 2002-12-12 |
| US7485747B2 (en) | 2009-02-03 |
| KR20040004687A (ko) | 2004-01-13 |
| KR100896383B1 (ko) | 2009-05-08 |
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