JP5555865B2 - 研磨装置 - Google Patents
研磨装置 Download PDFInfo
- Publication number
- JP5555865B2 JP5555865B2 JP2010024532A JP2010024532A JP5555865B2 JP 5555865 B2 JP5555865 B2 JP 5555865B2 JP 2010024532 A JP2010024532 A JP 2010024532A JP 2010024532 A JP2010024532 A JP 2010024532A JP 5555865 B2 JP5555865 B2 JP 5555865B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- tape
- pressing
- polishing tape
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title claims description 314
- 238000012546 transfer Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 description 64
- 239000011347 resin Substances 0.000 description 26
- 229920005989 resin Polymers 0.000 description 26
- 230000003287 optical effect Effects 0.000 description 18
- 239000000463 material Substances 0.000 description 10
- 238000004804 winding Methods 0.000 description 8
- 230000002950 deficient Effects 0.000 description 7
- 230000008602 contraction Effects 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 230000006835 compression Effects 0.000 description 4
- 238000007906 compression Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000013013 elastic material Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/005—Portal grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
- B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
- B24B21/06—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving members with limited contact area pressing the belt against the work, e.g. shoes sweeping across the whole area to be ground
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Description
200…テーブル
300…X軸フレーム
400…X軸スライダ
500…研磨装置
510…研磨テープ
510d…研磨面
510e…平滑面
521…押圧シャフト
521a…ベース部材
521b…研磨ヘッド
521c…揺動軸
521f…半球状突起
521g…円筒状空間
521h…シャフト
521i…コイルばね
560…テープ移送手段
600…制御装置
α…微小突起
BS…基板
Claims (6)
- 研磨テープを研磨対象物に押圧する研磨ヘッドであって、ベース部材の下部に前記研磨テープの幅方向に直交する方向を軸として揺動可能に取り付けた研磨ヘッドと、
前記研磨ヘッドに巻き掛けた研磨テープを移送させるテープ移送手段と、
を備え、
前記研磨テープは、研磨面を挟んで幅方向両端に平滑面を備え、かつ、前記研磨面は、前記平滑面と同一面であるか、又は、前記平滑面よりも凹んでいる、研磨装置。 - 前記研磨ヘッドの研磨テープを押圧する押圧部を、前記研磨テープの幅方向を軸とする半円柱状に形成した、請求項1記載の研磨装置。
- 前記研磨ヘッドの研磨テープを押圧する押圧部を、前記研磨テープの幅方向に複数に分割して設けた、請求項1又は2記載の研磨装置。
- 前記研磨ヘッドの研磨テープを押圧する押圧部を、前記研磨テープの幅方向に並べた複数の半球状突起で構成した、請求項1記載の研磨装置。
- 前記複数の押圧部のうちの少なくとも1つを、前記研磨テープに対して離接する方向に移動可能に前記研磨ヘッドに支持し、かつ、前記移動可能に支持した押圧部を前記研磨テープに向けて付勢する弾性部材を備えた、請求項3又は4記載の研磨装置。
- 前記複数の押圧部は、前記研磨テープの平滑面を押圧する押圧部と前記研磨テープの研磨面を押圧する押圧部とで構成され、
前記研磨テープの平滑面を押圧する押圧部は、前記ベース部材の下部に揺動可能に支持される基体に固定され、
前記研磨テープの研磨面を押圧する押圧部は、前記研磨テープに対して離接する方向に移動可能に前記基体に支持され、かつ、弾性部材により前記研磨テープに向けて付勢される、請求項5記載の研磨装置。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010024532A JP5555865B2 (ja) | 2010-02-05 | 2010-02-05 | 研磨装置 |
| PCT/JP2011/051248 WO2011096292A1 (ja) | 2010-02-05 | 2011-01-24 | 研磨ヘッド及び研磨装置 |
| TW100103807A TWI499479B (zh) | 2010-02-05 | 2011-02-01 | 研磨裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010024532A JP5555865B2 (ja) | 2010-02-05 | 2010-02-05 | 研磨装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011161534A JP2011161534A (ja) | 2011-08-25 |
| JP5555865B2 true JP5555865B2 (ja) | 2014-07-23 |
Family
ID=44355293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010024532A Expired - Fee Related JP5555865B2 (ja) | 2010-02-05 | 2010-02-05 | 研磨装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5555865B2 (ja) |
| TW (1) | TWI499479B (ja) |
| WO (1) | WO2011096292A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102601711B (zh) * | 2012-03-20 | 2014-10-08 | 友达光电(苏州)有限公司 | 板体研磨装置 |
| JP6663313B2 (ja) * | 2016-06-29 | 2020-03-11 | 有限会社 武藤設計 | 連続式摩擦・磨耗試験装置 |
| JP7362207B2 (ja) * | 2019-10-03 | 2023-10-17 | 株式会社ディスコ | 基板の研削方法 |
| JP7355670B2 (ja) * | 2020-02-05 | 2023-10-03 | 株式会社荏原製作所 | 研磨ヘッドおよび研磨装置 |
| JP2023101164A (ja) * | 2022-01-07 | 2023-07-20 | 株式会社不二越 | フィルムラップ加工装置 |
| CN116572141A (zh) * | 2023-07-03 | 2023-08-11 | 乐金显示光电科技(中国)有限公司 | 一种显示面板异物研磨装置、方法和研磨设备 |
| CN118905811B (zh) * | 2024-09-20 | 2025-05-16 | 常州启元光学有限公司 | 球透镜精抛装置及精抛方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62130860U (ja) * | 1986-02-07 | 1987-08-18 | ||
| JP2674213B2 (ja) * | 1989-06-06 | 1997-11-12 | 日立電子エンジニアリング株式会社 | ディスク研摩装置 |
| JPH058163A (ja) * | 1991-07-02 | 1993-01-19 | Sanshin:Kk | 軸状部材研磨装置 |
| JPH05111870A (ja) * | 1991-10-21 | 1993-05-07 | Tokiwa Kogyo Kk | 倣いベルトサンダ |
| JP2857817B2 (ja) * | 1992-05-29 | 1999-02-17 | 株式会社サンシン | ガラス基板角縁面研磨装置 |
| JPH11285958A (ja) * | 1998-04-03 | 1999-10-19 | Toyota Motor Corp | 研摩装置 |
| JP2003011050A (ja) * | 2001-07-03 | 2003-01-15 | Nissan Motor Co Ltd | 表面加工装置及びこれを用いた凹凸形成方法 |
| JP2007105858A (ja) * | 2005-10-17 | 2007-04-26 | Amitec Corp | サンディングマシン |
| JP5007880B2 (ja) * | 2007-02-28 | 2012-08-22 | 株式会社ブイ・テクノロジー | 微小突起研磨装置 |
-
2010
- 2010-02-05 JP JP2010024532A patent/JP5555865B2/ja not_active Expired - Fee Related
-
2011
- 2011-01-24 WO PCT/JP2011/051248 patent/WO2011096292A1/ja not_active Ceased
- 2011-02-01 TW TW100103807A patent/TWI499479B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011096292A1 (ja) | 2011-08-11 |
| TW201206625A (en) | 2012-02-16 |
| JP2011161534A (ja) | 2011-08-25 |
| TWI499479B (zh) | 2015-09-11 |
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