JP6777821B2 - 収差補正装置及び荷電粒子線装置 - Google Patents

収差補正装置及び荷電粒子線装置 Download PDF

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Publication number
JP6777821B2
JP6777821B2 JP2019532318A JP2019532318A JP6777821B2 JP 6777821 B2 JP6777821 B2 JP 6777821B2 JP 2019532318 A JP2019532318 A JP 2019532318A JP 2019532318 A JP2019532318 A JP 2019532318A JP 6777821 B2 JP6777821 B2 JP 6777821B2
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aberration
aberration correction
charged particle
correction device
particle beam
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Expired - Fee Related
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JP2019532318A
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Japanese (ja)
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JPWO2019021455A1 (ja
Inventor
黒田　浩一
浩一 黒田
アーサー マルコム ブラックバーン
アーサー マルコム ブラックバーン
智世 佐々木
智世 佐々木
英登 土肥
英登 土肥
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2019532318A 2017-07-28 2017-07-28 収差補正装置及び荷電粒子線装置 Expired - Fee Related JP6777821B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2017/027414 WO2019021455A1 (fr) 2017-07-28 2017-07-28 Dispositif de correction d'aberration et dispositif à faisceau de particules chargées

Publications (2)

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JPWO2019021455A1 JPWO2019021455A1 (ja) 2020-07-02
JP6777821B2 true JP6777821B2 (ja) 2020-10-28

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JP2019532318A Expired - Fee Related JP6777821B2 (ja) 2017-07-28 2017-07-28 収差補正装置及び荷電粒子線装置

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JP (1) JP6777821B2 (fr)
WO (1) WO2019021455A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7465295B2 (ja) 2022-02-22 2024-04-10 日本電子株式会社 収差補正装置および電子顕微鏡

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10237141A1 (de) * 2002-08-13 2004-02-26 Leo Elektronenmikroskopie Gmbh Strahlführungssystem, Abbildungsverfahren und Elektronenmikroskopiesystem
JP2006147520A (ja) * 2004-10-19 2006-06-08 Jeol Ltd 収差補正装置及び電子顕微鏡
JP5277250B2 (ja) * 2008-09-25 2013-08-28 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置およびその幾何収差測定方法
JP6276101B2 (ja) * 2014-04-17 2018-02-07 日本電子株式会社 多極子レンズ、収差補正装置、および電子顕微鏡

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WO2019021455A1 (fr) 2019-01-31
JPWO2019021455A1 (ja) 2020-07-02

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