JP6906859B2 - 加工装置 - Google Patents
加工装置 Download PDFInfo
- Publication number
- JP6906859B2 JP6906859B2 JP2017175971A JP2017175971A JP6906859B2 JP 6906859 B2 JP6906859 B2 JP 6906859B2 JP 2017175971 A JP2017175971 A JP 2017175971A JP 2017175971 A JP2017175971 A JP 2017175971A JP 6906859 B2 JP6906859 B2 JP 6906859B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- unit
- determined
- surface side
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/20—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from infrared radiation only
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N7/00—Television systems
- H04N7/18—Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
- H04N7/183—Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast for receiving images from a single remote source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
- H10P74/238—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Description
1a 表面
1b 裏面
3 保護テープ
5 デバイス
7,7a,7b 画像
9,9a,9b 構造物
2 研削装置
4 基台
6 ターンテーブル
8 チャックテーブル
8a 保持面
10a,10b 研削ユニット
12a,12b スピンドルモータ
14a,14b スピンドル
16a,16b ホイールマウント
18a,18b 研削ホイール
20a,20b 研削砥石
22a,22b コラム
24a,24b 加工送りユニット
26a,26b カセット載置台
28a,28b カセット
30 ウェーハ搬送ロボット
32 位置決めテーブル
34 ウェーハ搬入機構(ローディングアーム)
36 ウェーハ搬出機構(アンローディングアーム)
38 スピンナ洗浄装置
40 赤外線カメラユニット
42 制御ユニット
42a 判定部
42b 情報登録部
44 報知ユニット
Claims (2)
- 表面側に構造物が形成されたウェーハの裏面側を研削又は研磨する加工装置であって、
該表面側が下方に向けられた状態の該ウェーハを保持するチャックテーブルと、
該チャックテーブルに保持された該ウェーハの上方に露出した該裏面側を研削又は研磨する加工ユニットと、
該ウェーハを収容するカセットが載置されるカセット載置領域と、
該カセット載置領域に載置された該カセットから該ウェーハを搬出し、該チャックテーブルへ搬送する搬送ユニットと、
該ウェーハを該裏面側から撮影し、該表面側が写る画像を取得する赤外線カメラユニットと、
各種情報を報知する報知ユニットと、
各構成要素を制御する制御ユニットと、を備え、
該制御ユニットは、
該カセット載置領域に載置された該カセットから搬出される判定対象のウェーハが加工対象のウェーハであるか否かを判定する判定部と、
該加工対象のウェーハが該表面側に備えるべき該構造物のパターンに関する情報が登録され、該判定部で該判定が実施される際に該情報を該判定部に送る情報登録部と、を備え、
該判定部では、該加工ユニットによる加工前の該判定対象のウェーハを該裏面側から該赤外線カメラユニットで撮影し、該判定対象のウェーハの表面側が写る画像を取得して、該画像に該加工対象のウェーハが該表面側に備えるべき構造物のパターンを発見する場合、該判定対象のウェーハは該加工対象のウェーハであると判定し、該画像に該加工対象のウェーハが該表面側に備えるべき構造物のパターンを発見しない場合、該判定対象のウェーハは該加工対象のウェーハではないと判定し、
該報知ユニットは、該判定部における判定の結果を報知することを特徴とする加工装置。 - 該赤外線カメラユニットは、該判定対象のウェーハが該カセット載置領域に載置されたカセットから搬出されてから該チャックテーブルに保持されるまでの経路上で該判定対象のウェーハを撮影することを特徴とする請求項1記載の加工装置。
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017175971A JP6906859B2 (ja) | 2017-09-13 | 2017-09-13 | 加工装置 |
| TW107131738A TW201914746A (zh) | 2017-09-13 | 2018-09-10 | 加工裝置 |
| US16/126,520 US11135700B2 (en) | 2017-09-13 | 2018-09-10 | Processing apparatus for processing wafer |
| DE102018215510.0A DE102018215510B4 (de) | 2017-09-13 | 2018-09-12 | Bearbeitungsvorrichtung zum Bearbeiten eines Wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017175971A JP6906859B2 (ja) | 2017-09-13 | 2017-09-13 | 加工装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019054056A JP2019054056A (ja) | 2019-04-04 |
| JP6906859B2 true JP6906859B2 (ja) | 2021-07-21 |
Family
ID=65441948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017175971A Active JP6906859B2 (ja) | 2017-09-13 | 2017-09-13 | 加工装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11135700B2 (ja) |
| JP (1) | JP6906859B2 (ja) |
| DE (1) | DE102018215510B4 (ja) |
| TW (1) | TW201914746A (ja) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7221785B2 (ja) * | 2019-05-08 | 2023-02-14 | 株式会社ディスコ | 加工装置 |
| US12230521B2 (en) | 2019-06-03 | 2025-02-18 | Applied Materials, Inc. | Method for non-contact low substrate temperature measurement |
| JP7345970B2 (ja) * | 2019-07-11 | 2023-09-19 | 株式会社ディスコ | 被加工物の検査方法及びレーザー加工装置 |
| TWI860380B (zh) * | 2019-07-17 | 2024-11-01 | 日商東京威力科創股份有限公司 | 基板加工裝置、基板處理系統及基板處理方法 |
| JP7286464B2 (ja) * | 2019-08-02 | 2023-06-05 | 株式会社ディスコ | レーザー加工装置 |
| US11826101B2 (en) * | 2019-08-06 | 2023-11-28 | Alcon Inc. | Scene camera systems and methods for vitreoretinal surgery |
| JP7286250B2 (ja) * | 2019-08-07 | 2023-06-05 | 株式会社ディスコ | 保護部材形成装置 |
| JP7366637B2 (ja) * | 2019-08-16 | 2023-10-23 | 株式会社ディスコ | ワークの確認方法、及び、加工方法 |
| JP7423157B2 (ja) * | 2020-04-30 | 2024-01-29 | 株式会社ディスコ | 加工装置の管理方法 |
| CN112548845B (zh) * | 2021-02-19 | 2021-09-14 | 清华大学 | 一种基板加工方法 |
| US11699595B2 (en) | 2021-02-25 | 2023-07-11 | Applied Materials, Inc. | Imaging for monitoring thickness in a substrate cleaning system |
| US12094740B2 (en) * | 2021-03-25 | 2024-09-17 | Applied Materials, Inc. | Automated dry-in dry-out dual side polishing of silicon substrates with integrated spin rinse dry and metrology |
| JP7794618B2 (ja) * | 2021-11-30 | 2026-01-06 | 株式会社ディスコ | 加工装置及び被加工物の判定方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5911618A (ja) * | 1982-07-12 | 1984-01-21 | Hitachi Ltd | 半導体製品の処理装置 |
| JPH10284449A (ja) * | 1997-04-11 | 1998-10-23 | Disco Abrasive Syst Ltd | ウェーハの裏面研磨・ダイシング方法及びシステム |
| JP4302491B2 (ja) * | 2003-11-14 | 2009-07-29 | 株式会社アルバック | 枚葉式真空処理装置 |
| JP2007180200A (ja) * | 2005-12-27 | 2007-07-12 | Yamaha Corp | 識別マークの読取方法及び識別マークの読取装置 |
| US8247773B2 (en) * | 2007-06-26 | 2012-08-21 | Yamaha Corporation | Method and apparatus for reading identification mark on surface of wafer |
| US8233696B2 (en) * | 2007-09-22 | 2012-07-31 | Dynamic Micro System Semiconductor Equipment GmbH | Simultaneous wafer ID reading |
| JP5619559B2 (ja) * | 2010-10-12 | 2014-11-05 | 株式会社ディスコ | 加工装置 |
| JP5894384B2 (ja) * | 2011-07-08 | 2016-03-30 | 株式会社ディスコ | 加工装置 |
| JP5743817B2 (ja) * | 2011-09-08 | 2015-07-01 | 株式会社ディスコ | 加工装置 |
| JP5886680B2 (ja) | 2012-04-26 | 2016-03-16 | 株式会社ディスコ | 研削方法及び研削装置 |
| JP6143336B2 (ja) * | 2013-04-01 | 2017-06-07 | 株式会社ディスコ | キーパターン検出方法 |
| JP6377459B2 (ja) * | 2014-08-29 | 2018-08-22 | 株式会社ディスコ | ウエーハ検査方法、研削研磨装置 |
-
2017
- 2017-09-13 JP JP2017175971A patent/JP6906859B2/ja active Active
-
2018
- 2018-09-10 TW TW107131738A patent/TW201914746A/zh unknown
- 2018-09-10 US US16/126,520 patent/US11135700B2/en active Active
- 2018-09-12 DE DE102018215510.0A patent/DE102018215510B4/de active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW201914746A (zh) | 2019-04-16 |
| DE102018215510A1 (de) | 2019-03-14 |
| US20190076986A1 (en) | 2019-03-14 |
| DE102018215510B4 (de) | 2022-10-20 |
| JP2019054056A (ja) | 2019-04-04 |
| US11135700B2 (en) | 2021-10-05 |
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