JPH01100021A - Superconducting thin film - Google Patents

Superconducting thin film

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Publication number
JPH01100021A
JPH01100021A JP63132946A JP13294688A JPH01100021A JP H01100021 A JPH01100021 A JP H01100021A JP 63132946 A JP63132946 A JP 63132946A JP 13294688 A JP13294688 A JP 13294688A JP H01100021 A JPH01100021 A JP H01100021A
Authority
JP
Japan
Prior art keywords
thin film
superconducting
axis
single crystal
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63132946A
Other languages
Japanese (ja)
Other versions
JP2501035B2 (en
Inventor
Naoharu Fujimori
直治 藤森
Keizo Harada
敬三 原田
Shuji Yatsu
矢津 修示
Tetsuji Jodai
哲司 上代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
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Sumitomo Electric Industries Ltd
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Priority to JP63132946A priority Critical patent/JP2501035B2/en
Publication of JPH01100021A publication Critical patent/JPH01100021A/en
Application granted granted Critical
Publication of JP2501035B2 publication Critical patent/JP2501035B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

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  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

PURPOSE:To obtain a superconducting thin film having the high superconductivity critical temperature and critical current density and homogeneous composition, by constituting a thin film of a compound oxide based superconductor containing specific elements, Ba and Cu from a single crystal or polycrystal having c-axis orientation properties. CONSTITUTION:A superconducting thin film constituted of a single crystal or polycrystal having c-axis orienting properties in a compound oxide based superconductor thin film containing at least one of element Ln of Y, La, Gd, Dy, Ho, Er, Tm, Yb, Lu, Nd, Sm and Eu, Ba and Cu. This thin film is preferably constituted of the single crystal or polycrystal having c-axis orienting properties formed on a substrate having (100) face of a single crystal having a lattice constant close to that of the a- or b-axis of Ln1Ba2Cu3O7 crystals as a film-forming surface. This compound oxide based superconductor thin film can be normally formed by using a physical vapor deposition method, such as magnetron sputtering.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は超電導薄膜に関する。より詳細には、高い超電
導臨界温度を有するだけでなく、高い臨界電流密度を有
し、且つ組成の均一な超電導薄膜に関する。
DETAILED DESCRIPTION OF THE INVENTION FIELD OF INDUSTRIAL APPLICATION This invention relates to superconducting thin films. More specifically, the present invention relates to a superconducting thin film that not only has a high superconducting critical temperature but also has a high critical current density and has a uniform composition.

従来の技術 電子の相転移であるといわれる超電導現象は、特定の条
件下で導体の電気抵抗が零の状態となり完全な反磁性を
示す現象である。
BACKGROUND OF THE INVENTION Superconductivity, which is said to be a phase transition of electrons, is a phenomenon in which the electrical resistance of a conductor becomes zero under certain conditions and exhibits complete diamagnetic properties.

超電導現象の代表的な応用分野であるエレクトロニクス
の分野では、各種の超電導素子が提案され、また開発さ
れている。代表的なものとしては、超電導材料どうしを
弱く接合した場合に、印加電流によって量子効果が巨視
的に現れるジョセフソン効果を利用した素子が挙げられ
る。また、トンネル接合型ジョセフソン素子は、超電導
材料のエネルギーギャップが小さいことから、極めて高
速な低電力消費のスイッチング素子として期待されてい
る。さらに、電磁波や磁場に対するジョセフソン効果が
正確な量子現象として現れることから、ジョセフソン素
子を磁場、マイクロ波、放射線等の超高感度センサとし
て利用することも期待されている。超高速電子計算機で
は、単位面積当たりの消費電力が冷却能力の限界に達し
てきているため、超電導素子の開発が要望されており、
さらに、電子回路の集積度が高くなるにつれて、電流ロ
スの無い超電導材料を配線材料として用いることが要望
されている。
In the field of electronics, which is a typical application field of superconductivity, various superconducting elements have been proposed and developed. A typical example is an element that utilizes the Josephson effect, in which a quantum effect appears macroscopically due to an applied current when superconducting materials are weakly bonded together. Further, tunnel junction type Josephson devices are expected to be extremely high-speed switching devices with low power consumption because the energy gap of the superconducting material is small. Furthermore, since the Josephson effect on electromagnetic waves and magnetic fields appears as a precise quantum phenomenon, it is expected that Josephson elements will be used as ultrasensitive sensors for magnetic fields, microwaves, radiation, etc. In ultra-high-speed electronic computers, the power consumption per unit area is reaching the limit of cooling capacity, so there is a demand for the development of superconducting elements.
Furthermore, as the degree of integration of electronic circuits increases, it is desired to use superconducting materials with no current loss as wiring materials.

しかし、様々な努力にもかかわらず、超電導材料の超電
導臨界温度Tcは長期間に亘ってNb3Geの23Kを
越えることができなかった。
However, despite various efforts, the superconducting critical temperature Tc of superconducting materials could not exceed 23K of Nb3Ge for a long period of time.

ところが、1986年に、ベドノーツおよびミニーラー
達によって高いT。をもつ複合酸化物系の超電導材料が
発見されるにいたって、高温超電導の可能性が大きく開
けてきた(Bednorz、 Muller、”Z。
However, in 1986, a high T. With the discovery of complex oxide-based superconducting materials with 20% oxide, the possibility of high-temperature superconductivity has greatly opened up (Bednorz, Muller, "Z.

Phys、 864 (1986) 189”)。Phys, 864 (1986) 189”).

これまでにも、複合酸化物系のセラミック材料が超電導
特性を示すということ自体は既に公知であり、例えば、
米国特許第3.932.315号には、Ba−Pb−B
1系の複合酸化物が超電導特性を示すということが記載
されており、また、特開昭60−173.885号公報
にはBa−B1系の複合酸化物か超電導特性を示すとい
うことが記載されている。しかし、これまでに知られて
いた複合酸化物のT。はIOK以下であり、超電導現象
を起こさせるには液体へりラム(沸点4.2’K)を用
いる以外なかった。
It has already been known that composite oxide-based ceramic materials exhibit superconducting properties; for example,
U.S. Pat. No. 3,932,315 describes Ba-Pb-B
It is stated that a Ba-B1 type composite oxide exhibits superconducting properties, and JP-A-60-173.885 states that a Ba-B1 type composite oxide exhibits superconducting properties. has been done. However, until now known complex oxide T. was below IOK, and the only way to cause superconductivity was to use liquid helium (boiling point 4.2'K).

ベドノーツおよびミ二−ラー達によって発見された酸化
物超電導体は(La、 Ba) 2[:u O4で、こ
の酸化物超電導体は、KJiFs型酸化物と呼ばれるも
ので、従来から知られていたペロブスカイト型超電導酸
化物と結晶構造が似ているが、そのTcは従来の超電導
材料に比べて飛躍的に高い約30にという値である。
The oxide superconductor discovered by Bednotes and Mineler et al. is (La, Ba) 2[:u O4, and this oxide superconductor is called the KJiFs type oxide, which was previously known as Although its crystal structure is similar to that of perovskite-type superconducting oxides, its Tc is about 30, which is significantly higher than that of conventional superconducting materials.

更に、1987年2月になって、チュー達によって90
にクラスの臨界温度を示すBa−Y系の複合酸化物が発
見された。このYBCOと称されるBa−Y系の複合酸
化物はY+BaaCuzOt−ウで表される複合酸化物
である。
Furthermore, in February 1987, 90
A Ba-Y-based composite oxide has been discovered that exhibits a critical temperature of the same class. This Ba-Y based complex oxide called YBCO is a complex oxide represented by Y+BaaCuzOt-U.

続いて発見されたBi −3r −Ca−Cu系および
Tl−Ba−Ca−Cu系複合酸化物は、Tcが100
に以上であるばかりでなく、化学的にも安定しており、
YBCO等のような超電導特性の経時的劣化が少ない。
Subsequently discovered Bi-3r-Ca-Cu and Tl-Ba-Ca-Cu composite oxides have a Tc of 100
Not only is it better than above, but it is also chemically stable.
There is little deterioration of superconducting properties over time, such as with YBCO.

これらの新しい複合酸化物系超電導材料の発見によって
高温超電導体実現の可能性が俄かに高まっている。
The discovery of these new composite oxide-based superconducting materials has suddenly increased the possibility of realizing high-temperature superconductors.

これら複合酸化物超電導体の超電導特性には、結晶中の
酸素欠陥が大きな役割を果たしている。
Oxygen defects in the crystal play a major role in the superconducting properties of these composite oxide superconductors.

すなわち、結晶中の酸素欠陥が適正でないと、Tcは低
く、また、オンセット温度と抵抗が完全に0となる温度
との差も大きくなる。
That is, if the oxygen defects in the crystal are not appropriate, Tc will be low and the difference between the onset temperature and the temperature at which the resistance becomes completely zero will also become large.

従来、上記複合酸化物超電導体薄膜を作製する際には、
焼結等で生成した酸化物を蒸着源としたスパッタリング
法のような物理蒸着により成膜した後、酸素雰囲気中で
熱処理を行うか、酸素プラズマに曝す等の処理を行って
いた。
Conventionally, when producing the above composite oxide superconductor thin film,
After forming a film by physical vapor deposition such as a sputtering method using an oxide produced by sintering or the like as a deposition source, a treatment such as heat treatment in an oxygen atmosphere or exposure to oxygen plasma has been performed.

発明が解決しようとする課題 上記の複合酸化物超電導体材料は、特に、薄膜化すると
、その超電導特性が悪化し易いという欠点がある。特に
、これまで発表された超電導薄膜では臨界電流密度(J
c )が数百A / cafと低いため実際にデバイス
等として使うことができなかった。
Problems to be Solved by the Invention The above-mentioned composite oxide superconductor material has a drawback in that its superconducting properties tend to deteriorate particularly when it is made into a thin film. In particular, in the superconducting thin films published so far, the critical current density (J
c) was so low as several hundred A/caf that it could not actually be used as a device.

そこで、本発明の目的は、上記従来技術の問題点を解決
し、高い臨界温度Tcを有し、且つ実用的な臨界電流密
度Jcを有し、且つ均一な組成および組織の超電導材料
の薄膜を提供することにある。
Therefore, an object of the present invention is to solve the problems of the prior art described above, and to provide a thin film of a superconducting material having a high critical temperature Tc, a practical critical current density Jc, and a uniform composition and structure. It is about providing.

課題を解決するための手段 上記した問題点を解決するため種々の実験、検討を繰り
返した結果、本発明は完成されたものであり、本発明に
従うと、Y、 La5Gd、 Dy5flo、Br。
Means for Solving the Problems The present invention has been completed as a result of repeated various experiments and studies to solve the above-mentioned problems.According to the present invention, Y, La5Gd, Dy5flo, Br.

Tm5YbSLuSNd、 SmjgよびEuで構成さ
れる群から選択された少なくとも一つの元素Lnと、B
aと、Cuとを含む複合酸化物系超電導体の薄膜におい
て、この薄膜がC軸配向性の単結晶または多結晶によら
で構成されていることを特徴とする超電導薄膜が提供さ
れる。
At least one element Ln selected from the group consisting of Tm5YbSLuSNd, Smjg and Eu, and B
There is provided a superconducting thin film of a composite oxide superconductor containing a and Cu, characterized in that the thin film is composed of a C-axis oriented single crystal or polycrystal.

本発明の薄膜は、LnlBa2Cu30q  (ただし
、しnは、上記の定義の元素である)結晶のa軸または
b軸の格子定数に近い格子定数を持つ単結晶の(100
)面を成膜面とした基板上に形成されたC軸配向性の単
結晶または多結晶によって構成されていることが好まし
い。
The thin film of the present invention is a single crystal (100
) It is preferable that the film be formed of a C-axis oriented single crystal or polycrystal formed on a substrate with a film formation surface.

さらに、本発明の超電導薄膜は、LnBazCusOt
なる酸化物超電導体のパウダーパターンの最強反射面の
反射強度INAXと(00n)面〔但し、nは整数〕の
反射強度I OOnの比I Oon / I NAXと
、該パウダーパターンの最強反射面と同じ指数を持つ結
晶面の上記超電導薄膜のX線回折パターンにおける反射
強度JlIAXと該超電導薄膜の(00n)面〔但し、
nは整数〕の反射強度J0゜。との比J’OOh / 
JMAX と・ が以下の関係: J 0OTh/ J )IAX≧’2 (I oo−/
 IMAX )を満たすことを特徴とする。
Furthermore, the superconducting thin film of the present invention is LnBazCusOt
The ratio of the reflection intensity INAX of the strongest reflection surface of the powder pattern of the oxide superconductor to the reflection intensity I OOn of the (00n) plane [where n is an integer] is I Oon / I NAX, and the strongest reflection surface of the powder pattern Reflection intensity JlIAX in the X-ray diffraction pattern of the superconducting thin film of crystal planes having the same index and the (00n) plane of the superconducting thin film [However,
n is an integer] reflection intensity J0°. The ratio of J'OOh /
JMAX and · have the following relationship: J 0OTh/ J ) IAX≧'2 (I oo-/
IMAX).

具体的には、X線回折パターンにおいて、(002)面
、(003)面、(005)面および(006)面の反
射強度が(111)面および(112)面の反射強度の
2倍以上である。
Specifically, in the X-ray diffraction pattern, the reflection intensity of the (002) plane, (003) plane, (005) plane, and (006) plane is twice or more that of the (111) plane and (112) plane. It is.

尚、上記したC軸配向性とは、膜面に対してC軸が垂直
に配向したものに限定されず、所定の角度を以て配向し
たものも含んでいる。
Note that the above-mentioned C-axis orientation is not limited to one in which the C-axis is oriented perpendicular to the film surface, but also includes one in which the C-axis is oriented at a predetermined angle.

作用 本発明による超電導薄膜は、y、 t、a、 Gd5D
y。
Function The superconducting thin film according to the present invention has the following characteristics: y, t, a, Gd5D
y.

HaSEr、 Tm5Yb、 LuSNd55mおよび
Euで構成される群から選択された元素Lnと、Baと
、Cuとを含む複合酸化物系超電導体によって構成され
る薄膜において、この薄膜がC軸配向性の単結晶または
多結晶によって構成されていることを特徴としている。
A thin film composed of a complex oxide superconductor containing an element Ln selected from the group consisting of HaSEr, Tm5Yb, LuSNd55m and Eu, Ba, and Cu, in which the thin film is a single crystal with C-axis orientation. Or, it is characterized by being composed of polycrystals.

上記の複合酸化物系超電導体よりなる薄膜は、一般に、 LnlBa2Cu3C)y−x (ただし、LnはYSLaSGdSDy、 Ho5Er
、 Tm、 Yb。
The thin film made of the above composite oxide superconductor is generally LnlBa2Cu3C)y-x (where Ln is YSLaSGdSDy, Ho5Er
, Tm, Yb.

LuSNd55mおよびεUで構成される群から選択さ
れた元素を表し、Q<X<lである)で表される複合酸
化物の薄膜である。
It represents an element selected from the group consisting of LuSNd55m and εU, and is a thin film of a composite oxide represented by Q<X<l.

具体的には、下記の複合酸化物の薄膜が挙げられる。Specifically, the following composite oxide thin films may be mentioned.

Y1Ba2Cu3o?−XSLa+Ba2Cua 0t
−x、Gd 1 Ba2Cu* Ov−x 、 Dy+
 Ba2Cua O?−X、Ho1Ba2Cus 0t
−1%  Or +Ba2Cua O?−x、TmtB
a2CusOt−1% Ytl+Ba*Cu5Ot−X
sLu!Ba2Cu30フ−xs  NdIBazCu
30t−xSSm+Ba2Cua Ch−xsεulB
a2cu3C)v−xs(ただしXはQ<x<lを満た
す数である)これらの複合酸化物の薄膜は、酸素欠損を
有するペロブスカイト型結晶構造を有する薄膜である。
Y1Ba2Cu3o? -XSLa+Ba2Cua 0t
-x, Gd1Ba2Cu*Ov-x, Dy+
Ba2Cua O? -X, Ho1Ba2Cus 0t
-1% Or +Ba2Cua O? -x, TmtB
a2CusOt-1% Ytl+Ba*Cu5Ot-X
sLu! Ba2Cu30fu-xs NdIBazCu
30t-xSSm+Ba2Cua Ch-xsεulB
a2cu3C)v-xs (where X is a number satisfying Q<x<l) These composite oxide thin films are thin films having a perovskite crystal structure with oxygen vacancies.

本発明の超電導薄膜は、以下の特徴を有することで、従
来のものと容易に区別できる。先ず、下記の用語を定義
する。
The superconducting thin film of the present invention can be easily distinguished from conventional ones by having the following characteristics. First, the following terms will be defined.

I 、lAX  : LnBa2Cu= O?で表され
る複合酸化物結晶のパウダーパターンの最強反射面の反
射強度、 l00n  :上記結晶の(00n)面〔但し、nは整
数〕の反射強度、 JXAX  :本発明による複合酸化物系薄膜のX線回
折パターンにおける上記パウダーパターンの最強反射面
と同じ指数を持つ結晶面の反射強度、 JOOn  :上記薄膜の(OOn)面〔但し、nは整
数〕の反射強度。
I, lAX: LnBa2Cu=O? The reflection intensity of the strongest reflection surface of the powder pattern of the composite oxide crystal expressed by 100n: The reflection intensity of the (00n) plane of the above crystal [where n is an integer], JXAX: The reflection intensity of the composite oxide thin film according to the present invention Reflection intensity of a crystal plane having the same index as the strongest reflection plane of the powder pattern in the X-ray diffraction pattern, JOOn: Reflection intensity of the (OOn) plane of the thin film [where n is an integer].

本発明による複合酸化物系超電導体によって構成される
薄膜は、以下の特徴を有するX線回折パターンを有して
いる。
A thin film composed of a composite oxide superconductor according to the present invention has an X-ray diffraction pattern having the following characteristics.

(1)  上記各反射強度の間の比■。。1% / I
 NAXおよび比J。。、、/J、lAxが以下の関係
:JOOr+ / JIIAX≧2(Ioo、/ I 
+ux )を満たす(00n)面が少なくとも1つある
(1) Ratio ■ between the above respective reflection intensities. . 1%/I
NAX and ratio J. . , , /J, lAx have the following relationship: JOOr+ / JIIAX≧2(Ioo, /I
There is at least one (00n) plane that satisfies +ux ).

上記の(00n)面は、具体的には、(002)面、(
003)面、(005)面および(006)面である。
Specifically, the above (00n) plane is the (002) plane, (
003) plane, (005) plane, and (006) plane.

(2)本発明による複合酸化物系薄膜のX線回折パター
ンにおける(002)面、(003)面、(005)面
および(006)面の反射強度は(111)面および(
112)面の反射強度の2倍以上である。
(2) In the X-ray diffraction pattern of the composite oxide thin film according to the present invention, the reflection intensity of the (002) plane, (003) plane, (005) plane, and (006) plane is the same as that of the (111) plane and (
112) It is more than twice the reflection intensity of the surface.

この複合酸化物系超電導体の薄膜は、一般に、マグネト
ロンスパッタリング等のスパッタリング法のような物理
蒸着法を用いて成膜することができる。特に、マグネト
ロンスパッタで作製した薄膜は結晶構造、酸素欠損状態
等の面で優れた超電導特性を有している。なお、上記の
複合酸化物の薄膜の場合には、結晶中の酸素欠損状態が
その超電導特性に大きく影響するので、結晶中の酸素欠
損量を適正に制御するために、薄膜の形成を適切な酸素
含有雰囲気下で行うのが好ましい。
The thin film of this composite oxide superconductor can generally be formed using a physical vapor deposition method such as a sputtering method such as magnetron sputtering. In particular, thin films produced by magnetron sputtering have excellent superconducting properties in terms of crystal structure, oxygen deficiency state, etc. In the case of the above composite oxide thin film, the oxygen vacancy state in the crystal greatly affects its superconducting properties, so in order to properly control the amount of oxygen vacancies in the crystal, the formation of the thin film must be appropriately controlled. Preferably, this is carried out in an oxygen-containing atmosphere.

物理蒸着法を用いて作られた上記LnlBa2Cu30
7−xで表される酸化物超電導体の薄膜は90に程度の
高いTcを示すが、従来法で作成された薄膜は、超電導
臨界電流密度Jcが小さく、実用上、大きな問題であっ
た。その一つの理由は、上記の複合酸化物系超電導体の
薄膜の超電導臨界電流密度の値が結晶異方性を有してい
るためである。すなわち、上記酸化物の結晶は、結晶の
a軸およびb軸で決定される面に平行な方向の超電導臨
界電流密度は極めて大きいが、その他の方向の超電導臨
界電流密度は小さい。従来の超電導薄膜は、この超電導
臨界電流密度の結晶異方性を考慮していなかったため、
結晶の方向が揃っておらず、従って、超電導臨界電流密
度が小さかった。
The above LnlBa2Cu30 made using physical vapor deposition method
The thin film of the oxide superconductor represented by 7-x exhibits a high Tc of about 90, but the thin film produced by the conventional method has a small superconducting critical current density Jc, which is a big problem in practice. One reason for this is that the value of the superconducting critical current density of the thin film of the above composite oxide superconductor has crystal anisotropy. That is, the oxide crystal has an extremely high superconducting critical current density in a direction parallel to the plane determined by the a-axis and b-axis of the crystal, but has a small superconducting critical current density in other directions. Conventional superconducting thin films did not take into account the crystal anisotropy of superconducting critical current density;
The crystals were not oriented in the same direction, and therefore the superconducting critical current density was small.

本発明は薄膜を構成する上記複合酸化物系超電導体の結
晶のC軸配向性を揃えることによってこの問題を解決し
たものである。すなわち、本発明の超電導薄膜では、上
記のようにC軸配向性を一定に揃えることによって、そ
の結晶のa軸およびb軸で決定される面に平行な方向の
超電導臨界電流密度を極めて大きくすることができる。
The present invention solves this problem by aligning the C-axis orientation of the crystals of the composite oxide superconductor forming the thin film. That is, in the superconducting thin film of the present invention, by uniformly aligning the C-axis orientation as described above, the superconducting critical current density in the direction parallel to the plane determined by the a-axis and b-axis of the crystal is extremely increased. be able to.

従って、この超電導臨界電流密度が大きくなる方向を電
流の流れる方向と一致させれば、その方向に極めて大き
な超電導臨界電流を流すことができる。
Therefore, if the direction in which the superconducting critical current density increases matches the direction in which the current flows, an extremely large superconducting critical current can be caused to flow in that direction.

なお、薄膜を構成する上記複合酸化物は単結晶であるの
が好ましいが、多結晶であってもよい。
The composite oxide constituting the thin film is preferably single crystal, but may be polycrystalline.

また、上記C軸は一般に膜面、従って、基板の面に対し
て垂直な方向に配向させるが、本発明はC軸が垂直に配
向したもののみに限定されるものではなく、所定の角度
を以て配向している場合も含まれる。特に、上記C軸を
膜面、従って、基板の面に対して平行に配向させて、膜
の深さ方向の電流密度を大きくすることもできる。いず
れの方向にC軸を配向させるかは、基板、より正確には
、基板の成膜面の特性によって決定される。
Furthermore, although the above C-axis is generally oriented in a direction perpendicular to the film surface, that is, the surface of the substrate, the present invention is not limited to those in which the C-axis is oriented perpendicularly; This also includes cases where it is oriented. In particular, the current density in the depth direction of the film can be increased by orienting the C-axis parallel to the film surface, that is, the surface of the substrate. The direction in which the C-axis is oriented is determined by the characteristics of the substrate, more precisely, the film-forming surface of the substrate.

上記C軸を膜面に対して垂直な方向に配向させる場合に
は、基板としては、形成される複合酸化物結晶のa軸お
よび/またはb軸の格子定数に近いa軸および/または
b軸の格子定数を持つ単結晶を用いられる。
When the C-axis is oriented in a direction perpendicular to the film surface, the substrate has an a-axis and/or b-axis close to the lattice constant of the a-axis and/or b-axis of the composite oxide crystal to be formed. A single crystal with a lattice constant of is used.

本発明の特に好ましい実施例では、上記のLn、Ba、
Cu、 Chで表される結晶のa軸またはb軸の格子定
数に近いa軸またはb軸の格子定数を持つ任意の単結晶
基板上に、その゛(100)面を成膜面として用いて、
上記のC軸配向性の単結晶または多結晶によって構成さ
れた薄膜を形成することによって、基板の成膜面に平行
な方向の電流密度が大きくなるようにしている。
In a particularly preferred embodiment of the present invention, the above-mentioned Ln, Ba,
On any single crystal substrate having an a-axis or b-axis lattice constant close to the a-axis or b-axis lattice constant of the crystal represented by Cu or Ch, the (100) plane is used as the film formation surface. ,
By forming a thin film made of the above C-axis oriented single crystal or polycrystal, the current density in the direction parallel to the film formation surface of the substrate is increased.

逆に、上記C軸を膜面に対して平行な方向に配向させる
場合には、上記単結晶基板の(110)面を成膜面とし
て用いればよい。
Conversely, when the C axis is oriented in a direction parallel to the film surface, the (110) plane of the single crystal substrate may be used as the film forming surface.

この条件を満たす基板としては、MgO,5rTi O
s、AbO3、サファイア、Sin、、石英、YSZ(
イツトリウムスタビライズドジルコニア)およびZnO
等を選択することができる。特に、スパッタリング時お
よび熱処理時において薄膜を破壊する恐れのある不要な
応力を薄膜に与えないためには、熱膨脹率が薄膜の熱膨
脹率に近いMgOおよび5rTi03を選択するのが好
ましい。
Substrates that meet this condition include MgO, 5rTiO
s, AbO3, sapphire, Sin, quartz, YSZ (
Yztrium stabilized zirconia) and ZnO
etc. can be selected. In particular, in order to avoid applying unnecessary stress to the thin film that may destroy the thin film during sputtering and heat treatment, it is preferable to select MgO and 5rTi03 whose coefficient of thermal expansion is close to that of the thin film.

以下に本発明を実施例により、さらに詳しく説明するが
、以下は単なる実施例であり、本発明の技術的範囲は以
下の開示によって一切制限を受けないことはもちろんで
ある。
EXAMPLES The present invention will be explained in more detail with reference to examples below, but the following are merely examples, and it goes without saying that the technical scope of the present invention is not limited in any way by the following disclosure.

実施”例l Y2O3、BaOおよびCuOをY:Ba:Cuの原子
比が1:2.15:3.2となるよう秤量し、大気中に
おいて900℃で焼成した。得られた焼成体を粉砕した
粉末をターゲットとして高周波マグネトロンスパッタリ
ングを用いて、酸化マグネシウムの単結晶基板上に薄膜
を成膜した。成膜条件は以下の通りである。
Implementation Example 1 Y2O3, BaO and CuO were weighed so that the atomic ratio of Y:Ba:Cu was 1:2.15:3.2 and fired at 900°C in the atmosphere.The obtained fired body was pulverized. A thin film was formed on a magnesium oxide single crystal substrate using high frequency magnetron sputtering using the obtained powder as a target.The film forming conditions were as follows.

全圧力 : 2 Xl0−2Torr 02 /Ar : 0.16  (圧力比)基板  :
MgOの(100)面 基板温度ニア20℃ このようにして、1000人の厚さの薄膜を得た。
Total pressure: 2 Xl0-2Torr 02 /Ar: 0.16 (pressure ratio) Substrate:
The (100) plane substrate temperature of MgO was 20° C. In this way, a thin film with a thickness of 1000 μm was obtained.

この薄膜を酸素気流中において、700℃に加熱し、そ
の温度を24時間保ち、その後3℃/分の冷却速度で常
温まで冷却した。
This thin film was heated to 700° C. in an oxygen stream, maintained at that temperature for 24 hours, and then cooled to room temperature at a cooling rate of 3° C./min.

得られた薄膜は、下記の測定結果からMgO基板に対し
てC軸が垂直な配向性を持つY、Ba2CuaOv−x
(但し、XはQ<x<lを満たす数である)と考えられ
る多結晶の膜であった。
The obtained thin film is Y, Ba2CuaOv-x, with an orientation in which the C axis is perpendicular to the MgO substrate, based on the following measurement results.
(However, X is a number satisfying Q<x<l.) It was a polycrystalline film.

第1図は、上述のようにして作製した薄膜のX線回折パ
ターンである。なお、本X線回折パターンは理学電機製
薄膜X線回折装置を用い、Cuのにα線で得られたもの
である。一方、第2図は、Yl Ba2Cu30tなる
酸化物超電導体粉末のX線回折パターンである。
FIG. 1 is an X-ray diffraction pattern of the thin film produced as described above. Note that this X-ray diffraction pattern was obtained using a thin-film X-ray diffraction apparatus manufactured by Rigaku Corporation using α-rays for Cu. On the other hand, FIG. 2 shows an X-ray diffraction pattern of an oxide superconductor powder of Yl Ba2Cu30t.

第2図で、最強の反射強度を示す結晶面の指数は(10
3)、(110)面であった。
In Figure 2, the index of the crystal plane showing the strongest reflection intensity is (10
3), it was a (110) plane.

上記酸化物超電導体のパウダーパターンの最強反射面の
反射強度をIMAX%  (OOn)面〔但し、nは整
数〕の反射強度を■。。、とし、該パウダーパターンの
最強反射面と同じ指数を持つ結晶面の本実施例の超電導
薄膜のX線回折パターンにおける反射強度をJMAxs
該超電導薄膜の(00n)面〔但し、nは整数〕の反射
強度をJ。ooとする。
The reflection intensity of the strongest reflection surface of the powder pattern of the above oxide superconductor is IMAX%.The reflection intensity of the (OOn) surface [where n is an integer] is ■. . , and the reflection intensity in the X-ray diffraction pattern of the superconducting thin film of this example of the crystal plane having the same index as the strongest reflection surface of the powder pattern is JMAxs
The reflection intensity of the (00n) plane (where n is an integer) of the superconducting thin film is J. Let it be oo.

これらの反射強度間には第1表に示す関係が成立してい
る。
The relationship shown in Table 1 holds between these reflection intensities.

第1表 なお、第1表において−は、下記の比を表している。Table 1 In addition, in Table 1, - represents the following ratio.

I  I oo−/ I NAX 第1図および第1表の結果は、上記の複合酸化物の薄膜
が、(002)面、(003)面、(005)面および
(006)面における反射強度が上述の関係: J OOn / J WAX≧2 (I oo、、/ 
Ixax )を満たすことを示している。
I Ioo-/I NAX The results shown in Figure 1 and Table 1 show that the thin film of the above composite oxide has a reflection intensity of (002), (003), (005), and (006) planes. The above relationship: J OOn / J WAX≧2 (I oo,, /
Ixax).

さらに、電子線回折により上記の複合酸化物の薄膜の結
晶構造が、成膜面に垂直にC軸配向をしていることがわ
かった。
Furthermore, electron beam diffraction revealed that the crystal structure of the thin film of the above composite oxide had a C-axis orientation perpendicular to the film-forming surface.

次に上記の厚さ1000人の薄膜から幅l mmのサン
プルを切り出し、臨界温度Tcと臨界電流密度Jcとを
測定した。臨界温度の測定には4端子法を用いた。得ら
れた結果を以下に示す。
Next, a sample with a width of 1 mm was cut out from the above 1000-thickness thin film, and the critical temperature Tc and critical current density Jc were measured. A four-terminal method was used to measure the critical temperature. The results obtained are shown below.

Tc  :85K Jc  :150,0OOA/cfll(液体窒素温度
)これらの測定結果は、複合酸化物系超電導体の薄膜の
結晶構造を成膜面に垂直にC軸配向させることによって
、面内臨界電流密度Jcが大きく向上することを示して
いる。
Tc: 85K Jc: 150,0OOA/cfll (liquid nitrogen temperature) These measurement results show that by aligning the crystal structure of the composite oxide superconductor thin film with the C-axis perpendicular to the film formation surface, the in-plane critical current can be increased. This shows that the density Jc is greatly improved.

実施例2 Y2O2、BaOおよびCuOをY:Ba:Cuの原子
比が1 :2.0  :3.1となるよう秤量し、大気
中において900℃で焼成した。得られた焼成体を粉砕
した粉末をターゲットとして高周波マグネトロンスパッ
タリングを用いて、チタン酸ストロンチウムの単結晶基
板上に薄膜を成膜した。成膜条件は以下の通りである。
Example 2 Y2O2, BaO and CuO were weighed so that the atomic ratio of Y:Ba:Cu was 1:2.0:3.1, and fired at 900°C in the atmosphere. A thin film was formed on a single crystal substrate of strontium titanate using high frequency magnetron sputtering using a powder obtained by pulverizing the obtained fired body as a target. The film forming conditions are as follows.

全圧力 : 2 Xl0−’Torr 02 /Ar : 0.15  (圧力比)基板  :
5rTiOaの(100)原基板温度=720℃ このようにして、1000人の厚さの薄膜を得た。
Total pressure: 2 Xl0-'Torr 02 /Ar: 0.15 (pressure ratio) Substrate:
Temperature of the (100) original substrate of 5rTiOa=720° C. In this way, a thin film with a thickness of 1000 μm was obtained.

この薄膜を大気中において、710℃に加熱し、その温
度を24時間保ち、その後3℃/分の冷却速度で常温ま
で冷却した。
This thin film was heated to 710° C. in the atmosphere, maintained at that temperature for 24 hours, and then cooled to room temperature at a cooling rate of 3° C./min.

得られた薄膜は、基板に対してC軸が垂直な配向性を持
ったY1Ba2Cu3O7−X  (但し、Xは0くx
<lを満たす数である)と考えられる単結晶であった。
The obtained thin film is Y1Ba2Cu3O7-X (where X is 0 and x
It was a single crystal that is considered to be a number that satisfies <l).

実施例1と同様に反射強度の関係を第2表に示す。Similar to Example 1, the relationship between reflection intensities is shown in Table 2.

第2表 この厚さ1000人の薄膜から幅1 mm、サンプルを
切り出し、臨界温度Tcと臨界電流密度Jcとを測定し
た。臨界温度Tcの測定には4端子法を用いた。得られ
た結果を以下に示す。
Table 2 A sample with a width of 1 mm was cut from this 1,000-thickness thin film, and the critical temperature Tc and critical current density Jc were measured. A four-terminal method was used to measure the critical temperature Tc. The results obtained are shown below.

Tc  :  86K Jc  : 160,0OOA/cd m皇】 以上説明したように、本発明により、従来の超電導体よ
りも遥かに高いJcをもつ超電導酸化物薄膜を得ること
が可能となる。従って、本発明を、超電導体を薄膜素子
として応用する分野、例えばジョセフソン素子と呼ばれ
るマチイソ−(Matisoo)のスイッチング素子や
アナツカ−(Anacker)のメモリー素子、さらに
は超電導量子干渉計(SQUID)などに利用すると効
果的である。
Tc: 86K Jc: 160,0OOA/cd m] As explained above, the present invention makes it possible to obtain a superconducting oxide thin film having a much higher Jc than conventional superconductors. Therefore, the present invention is applicable to fields where superconductors are applied as thin film elements, such as Matisoo's switching elements called Josephson elements, Anacker's memory elements, and superconducting quantum interferometers (SQUIDs). It is effective when used for.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明による薄膜のX線回折パターンを示し
、 第2図は、Y、 Ba2Cu30.なる酸化物超電導体
の粉末のX線回折パターンである。 特許出願人  住友電気工業株式会社
FIG. 1 shows the X-ray diffraction patterns of thin films according to the invention, and FIG. 2 shows Y, Ba2Cu30. This is an X-ray diffraction pattern of oxide superconductor powder. Patent applicant: Sumitomo Electric Industries, Ltd.

Claims (1)

【特許請求の範囲】[Claims]  Y、La、Gd、Dy、HO、Er、Tm、Tb、L
u、Nd、SmおよびEuで構成される群から選択され
た少なくとも一つの元素Lnと、Baと、Cuとを含む
複合酸化物系超電導体の薄膜において、この薄膜がc軸
配向性の単結晶または多結晶によって構成されているこ
とを特徴とする超電導薄膜。
Y, La, Gd, Dy, HO, Er, Tm, Tb, L
In a thin film of a composite oxide superconductor containing at least one element Ln selected from the group consisting of u, Nd, Sm and Eu, Ba, and Cu, the thin film is a c-axis oriented single crystal. Or a superconducting thin film characterized by being composed of polycrystals.
JP63132946A 1987-05-31 1988-05-31 Superconducting thin film Expired - Fee Related JP2501035B2 (en)

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JP13694087 1987-05-31
JP62-136940 1987-05-31
JP62-136939 1987-05-31
JP13693987 1987-05-31
JP62-140613 1987-06-04
JP14061187 1987-06-04
JP14061387 1987-06-04
JP62-140611 1987-06-04
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01275426A (en) * 1988-04-27 1989-11-06 Kyocera Corp Oxide superconductor and production thereof
JPH04170393A (en) * 1990-11-05 1992-06-18 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center Oxide superconducting thin film
JPH04317408A (en) * 1991-04-01 1992-11-09 Semiconductor Energy Lab Co Ltd Oxide superconducting material
JPH05279025A (en) * 1987-08-31 1993-10-26 Semiconductor Energy Lab Co Ltd Oxide superconducting thin film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63277555A (en) * 1987-05-08 1988-11-15 Kanegafuchi Chem Ind Co Ltd Oxide superconductive ceramic sintered material and production thereof
JPS63282152A (en) * 1987-05-11 1988-11-18 Toshiba Corp Orientation of superconductor crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63277555A (en) * 1987-05-08 1988-11-15 Kanegafuchi Chem Ind Co Ltd Oxide superconductive ceramic sintered material and production thereof
JPS63282152A (en) * 1987-05-11 1988-11-18 Toshiba Corp Orientation of superconductor crystal

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05279025A (en) * 1987-08-31 1993-10-26 Semiconductor Energy Lab Co Ltd Oxide superconducting thin film
JPH01275426A (en) * 1988-04-27 1989-11-06 Kyocera Corp Oxide superconductor and production thereof
JPH04170393A (en) * 1990-11-05 1992-06-18 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center Oxide superconducting thin film
JPH04317408A (en) * 1991-04-01 1992-11-09 Semiconductor Energy Lab Co Ltd Oxide superconducting material

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