JPH01100231A - Copper alloy for high tensile electric and electronic equipment - Google Patents
Copper alloy for high tensile electric and electronic equipmentInfo
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- JPH01100231A JPH01100231A JP25700987A JP25700987A JPH01100231A JP H01100231 A JPH01100231 A JP H01100231A JP 25700987 A JP25700987 A JP 25700987A JP 25700987 A JP25700987 A JP 25700987A JP H01100231 A JPH01100231 A JP H01100231A
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Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
本発明は強度、耐食性、半田性、耐熱性、曲げ加工性に
優れ、小型化された電気電子機器用精密部品の製造に適
した高力電気電子機器用銅合金に関するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention has excellent strength, corrosion resistance, solderability, heat resistance, and bending workability, and is suitable for manufacturing precision parts for miniaturized electrical and electronic equipment. This invention relates to copper alloys for electrical and electronic equipment.
〔従来の技術〕
電気電子機器、特にコネクタ、スイッチ、ソケット、接
点バネ、半導体(ICやトランジスタ等)のリード材等
には、強度、曲げ加工性、疲労特性、応力緩和特性、耐
応力腐食割れ性、耐熱性等が優れた材料が要求されてい
る。このような材料として42合金(F e −42w
t%Ni)、52合金(F e−52wt%Ni)等の
Fe−Ni合金や、Qu−3e系合金や、Cu−Ti系
合金が知られているが、これ等の合金は高価であり、ま
た特性上Fe−Ni系合金は強度不足等の問題点を持っ
ている。更にCu−Ni−3n系スピノ一ダル合金が知
られているが、その製造が難しく製品の信頼性に劣る所
がある。このような事情から一般にCu−8n系合金、
即ちリン青銅、特にSnを6〜8wt%(以下wt%を
%と略記)含むばね用リン青銅が多用されている。[Conventional technology] Lead materials for electrical and electronic equipment, especially connectors, switches, sockets, contact springs, and semiconductors (ICs, transistors, etc.) have various characteristics such as strength, bending workability, fatigue properties, stress relaxation properties, and stress corrosion cracking resistance. Materials with excellent properties such as durability and heat resistance are required. 42 alloy (F e -42w
Fe-Ni alloys such as 52wt%Ni), 52wt%Ni (Fe-52wt%Ni), Qu-3e alloys, and Cu-Ti alloys are known, but these alloys are expensive. Furthermore, due to its characteristics, Fe--Ni alloys have problems such as insufficient strength. Further, Cu-Ni-3n spinodal alloys are known, but they are difficult to manufacture and have poor product reliability. Due to these circumstances, Cu-8n alloy,
That is, phosphor bronze, especially phosphor bronze for springs containing 6 to 8 wt% Sn (hereinafter wt% is abbreviated as %) is often used.
上記ばね用リン青銅は60〜aoKy、’=程度の強度
しかなく、電気電子機器用の精密部品の小型化をはかる
ためには強度が不足し、更に半田接合強度の経時劣化や
腐食割れ感受性の面から実用上大きな欠陥となっている
。このため上記Cu−Be系合金等が一部で使われてい
るが、コスト而で低コスト化への妨げとなっている。The above-mentioned phosphor bronze for springs has a strength of only about 60 to aoKy,'= which is insufficient for miniaturizing precision parts for electrical and electronic equipment, and also causes deterioration of solder joint strength over time and susceptibility to corrosion cracking. This is a major flaw in practical terms. For this reason, the above-mentioned Cu-Be alloys and the like are used in some parts, but the cost is an obstacle to lowering costs.
近年電気電子機器は小型化、高集積化の傾向にあり、こ
れらの使用するCu合金として強度や実装時の面実装化
の動向に応えるためには、半田接合強度やSn、5n−
Pb合金メツキの密着信頼性の向上や多量に使用するた
めには安価であること等も要求されている。In recent years, electrical and electronic equipment has been trending toward smaller size and higher integration, and in order to respond to the strength of the Cu alloy used in these devices and the trend toward surface mounting during mounting, it is necessary to improve solder joint strength, Sn, 5n-
Pb alloy plating is required to have improved adhesion reliability and to be inexpensive for use in large quantities.
このような要求に応えて従来合金に替わるにはより高性
能で、低コストなパフォーマンスの合金が必要である。In order to meet these demands and replace conventional alloys, alloys with higher performance and lower cost performance are required.
即ち、
(1) 80Ky/−以上の高い強度を保持しつつある
程度の導電性を有すること。That is, (1) It must have a certain degree of conductivity while maintaining high strength of 80 Ky/- or more.
(2)コスト的に安いこと。(2) Low cost.
(3)電気電子機器部品への成形時の曲げ加工性におけ
る信頼性が高いこと。即ち曲げ加工表面にクラック等が
生じることなく、寸法精度があること。(3) High reliability in bending workability during molding into electrical and electronic equipment parts. In other words, the bending surface should have dimensional accuracy without any cracks or the like.
(4)加工性、耐食性、耐応力腐食割れ性、疲労特性、
応力緩和性に優れていること。(4) Workability, corrosion resistance, stress corrosion cracking resistance, fatigue properties,
Excellent stress relaxation properties.
(5)半田接合強度ヤ3n、3n−pb合金メツキの密
着性が長期にわたり安定していること。(5) Solder joint strength: The adhesion of 3N and 3N-PB alloy plating is stable over a long period of time.
(6)電子機器用途では3nや3n合金の他にAu、A
y、N r等のメツキが多用されており、これ等のメツ
キ性にも優れていること。(6) In addition to 3n and 3n alloys, Au and A
Plating such as y, Nr, etc. is often used, and the plating properties of these are also excellent.
(問題点を解決するための手段)
本発明はこれに鑑み種々検討の結果、特に強度、曲げ加
工性、疲労特性、応力緩和特性、耐応力腐食割れ性、耐
熱性等が優れ、小型化された電気電子機器用精密部品、
例えばコネクター、スイチ、ソケット、接点バネ、半導
体(ICやトランジスタ)のリード等に適した高力電気
電子機器用銅合金を開発したものである。(Means for Solving the Problems) In view of this, as a result of various studies, the present invention has particularly excellent strength, bending workability, fatigue properties, stress relaxation properties, stress corrosion cracking resistance, heat resistance, etc., and is miniaturized. Precision parts for electrical and electronic equipment,
For example, we have developed a copper alloy for high-strength electrical and electronic equipment that is suitable for connectors, switches, sockets, contact springs, leads for semiconductors (ICs and transistors), etc.
即ら本発明合金の一つは、l’4i3.5〜10.0%
とAl0.2〜4.0%を含み、Z n0.05〜5.
0%。That is, one of the alloys of the present invention has l'4i of 3.5 to 10.0%.
and Al0.2-4.0%, and Z n0.05-5.
0%.
M n 0.01〜5.0%、 Mg0.001〜0.
8%、 Ca0.001〜0.8%、Cd0105〜1
.0%、Ag0.001〜0.5%の範囲内で何れか1
種又は2種以上を合計0.005〜5.0%含み、更に
Cr01OO5〜0.4%、 V0.001〜0.4%
、 T i 0.005〜0.4%、 Y0.001〜
0.2%、 Z r0.005〜0.2%。Mn 0.01-5.0%, Mg0.001-0.
8%, Ca0.001~0.8%, Cd0105~1
.. 0%, any one within the range of Ag0.001 to 0.5%
Contains a total of 0.005 to 5.0% of one or more species, further Cr01OO5 to 0.4%, V0.001 to 0.4%
, T i 0.005~0.4%, Y0.001~
0.2%, Zr0.005-0.2%.
Co0.4%、Fe−P化合物(FexPy ) 0.
005〜0.4%、0r−P化合物(Cr x Py
) 0.005〜0.4%、Go−P化合物(cox
Py ) 0.005〜0.4%の範囲内で何れか1種
又は2種以上を合計0.005〜1.0%含み、残部C
uと不可避的不純物からなり、更にO2含有量を110
0pp以下、S含有量を10ppm以下、結晶粒度を2
0μm以下とすることを特徴とするものである。Co0.4%, Fe-P compound (FexPy) 0.
005-0.4%, Or-P compound (Cr x Py
) 0.005-0.4%, Go-P compound (cox
Py) Contains any one or two or more types within the range of 0.005 to 0.4% in a total of 0.005 to 1.0%, the balance being C
It consists of u and inevitable impurities, and further has an O2 content of 110
0pp or less, S content 10ppm or less, grain size 2
It is characterized by having a thickness of 0 μm or less.
また本発明合金の他の一つは、Ni3.5〜10、o%
とA 10.2〜4.0%を含み、Zn0.05〜5.
0%、 Mn0.01〜5.0%、 Mg0.001〜
0.8%、 Ca0.001〜0.8%、 cd0.0
5〜1.0%。Another alloy of the present invention is Ni3.5-10, o%
and A 10.2-4.0%, Zn 0.05-5.
0%, Mn0.01~5.0%, Mg0.001~
0.8%, Ca0.001-0.8%, cd0.0
5-1.0%.
A y 0.001〜0.5%の範囲内で何れか1種又
は2種以上を合計0.005〜5.0%含み、更にCr
0.005〜0.4 %、 V0.001〜0.4%、
Ti0.005〜0.4%、 YOlool 〜0.2
%、Zr0.005〜0.2%、 Co0.4%、Fe
−P化合物(F ex Py ) 0.005〜0.4
%、Cr−P化合物(Cr x Py ) 0.005
〜0.4%。Contains one or more of A y in the range of 0.001 to 0.5% in a total of 0.005 to 5.0%, and further contains Cr
0.005~0.4%, V0.001~0.4%,
Ti0.005-0.4%, YOlool ~0.2
%, Zr0.005-0.2%, Co0.4%, Fe
-P compound (F ex Py ) 0.005 to 0.4
%, Cr-P compound (Cr x Py ) 0.005
~0.4%.
Co−P化合物(Cox Py ) 0.005〜0.
4%の範囲内で何れか1種又は2種以上を合計0、00
5〜1.0%含み、更にPb0.03%以下。Co-P compound (Cox Py) 0.005-0.
Any one or two or more types within the range of 4% total 0,00
Contains 5 to 1.0%, and 0.03% or less of Pb.
In0.03%以下、Ga0.05%以下、 Ge0.
05%以下、As0.01%以下、Sb0.05%以下
、Bi0.02%以下、Te0.05%以下、[3e0
.5%以下。In 0.03% or less, Ga 0.05% or less, Ge0.
05% or less, As 0.01% or less, Sb 0.05% or less, Bi 0.02% or less, Te 0.05% or less, [3e0
.. Less than 5%.
30.05%以下、希土類元素0.05%以下、Si0
.5%以下の範囲内で何れか1種又は2種以上を合計0
.5%以下含み、残部Cuと不可避的不純物からなり、
更にO2含有量を1100pp以下、S含有量をtOp
pm以下、結晶粒度を20μ雇以下とすることを特徴と
するものでおる。30.05% or less, rare earth elements 0.05% or less, Si0
.. A total of 0 of any one or two or more types within a range of 5% or less
.. Contains 5% or less, the balance consists of Cu and unavoidable impurities,
Furthermore, the O2 content is 1100pp or less, and the S content is tOp.
pm or less, and the crystal grain size is 20 μm or less.
本発明合金は上記組成に配合して溶解鋳造した鋳塊に、
熱間及び冷間加工と熱処理を施して造られる。例えば7
00〜1000℃に加熱保持して熱間加工を行ない、終
了後水冷等の冷却を行ない、これをミーリング、シエビ
ング又は酸洗により表面を清浄化してから冷間圧延や引
扱き等の冷間加工を施し、しかる後時効熱処理と冷間加
工又は溶体化処理と時効熱処理と冷間加工を組合せて造
られる。また最終の冷間加工後に200〜850℃で5
秒〜24時間の調質焼鈍、テンションレベラー、テンシ
ョアニーリング等と組合せることで、形状の矯正や残留
歪みの除去等を行なうことにより、より高い特性を得る
ことが可能である。また本発明合金を連続鋳造法により
鋳造し、直接冷間加工や組織の均一化熱処理を行なった
後、冷間加工や時効、容体化等の熱処理を施して製造す
ることも可能である。The alloy of the present invention is mixed into an ingot that is melted and cast with the above composition.
Manufactured by hot and cold working and heat treatment. For example 7
Hot working is carried out by heating and holding at 00 to 1000°C, and after finishing, cooling is performed by water cooling, etc., and the surface is cleaned by milling, sieving, or pickling, and then cold processing such as cold rolling and handling is carried out. After that, it is manufactured by combining aging heat treatment and cold working or solution treatment, aging heat treatment, and cold working. In addition, after the final cold working, it is
In combination with temper annealing for 24 hours to 24 hours, a tension leveler, tension annealing, etc., it is possible to correct the shape and remove residual distortion, thereby obtaining higher properties. It is also possible to manufacture the alloy of the present invention by casting it by a continuous casting method, directly performing cold working or heat treatment to homogenize the structure, and then subjecting it to heat treatments such as cold working, aging, and compacting.
本発明合金は上記製造方法により造られ、合金組成にも
よるが、強度80〜150 Klf/mix、伸び2〜
20.導電率10〜40%lAC3の特性を示すもので
、N1xAiy化合物或いはN1xAj2yCuzの化
合物を有効に分散せしめ、強度やバネ性の向上と導電率
及び耐熱性の向上を可能にする。しかしてNiを3,5
〜10.0%、Alを0.2〜4.0%と限定したのは
、Ni含有量とへ1含有量の何れかが下限未満では十分
な強度やバネ性が得られず、上限を越えると半田付は性
を悪化させると共に加工性、特に熱間加工性を悪くし製
造性を害するためである。The alloy of the present invention is produced by the above manufacturing method, and has a strength of 80 to 150 Klf/mix and an elongation of 2 to 150 Klf/mix, depending on the alloy composition.
20. It exhibits a characteristic of electrical conductivity of 10 to 40% lAC3, effectively dispersing the N1xAiy compound or the N1xAj2yCuz compound, and making it possible to improve strength and springiness, as well as conductivity and heat resistance. However, Ni was added to 3,5
~10.0% and Al at 0.2~4.0% because if either the Ni content or the He1 content is less than the lower limit, sufficient strength and springiness cannot be obtained. This is because if it exceeds this, soldering properties will deteriorate and workability, especially hot workability, will deteriorate, impairing manufacturability.
Zn、Mn、l’tl、Ca、Cd、Ag(以下A元素
群)からなる群は半田付は後の信頼性の劣化を抑制する
と共に、脱酸、脱硫効果を示し、合金の鋳造性や熱間加
工時の欠陥発生を抑制する。またマイグレーションによ
る電気短絡を予防する動きを示す。しかしてZn0.0
5〜5.0%。Soldering of the group consisting of Zn, Mn, l'tl, Ca, Cd, and Ag (hereinafter referred to as element group A) not only suppresses deterioration of reliability later on, but also exhibits deoxidizing and desulfurizing effects, and improves the castability of the alloy. Suppresses the occurrence of defects during hot working. It also shows moves to prevent electrical short circuits caused by migration. However, Zn0.0
5-5.0%.
Mn0.01〜5.0%、 Mg0.001〜0.8%
、Ca0.001〜0,8%、Cd0.05〜1.0%
、A90、001〜0.5゛%の範囲内で何れか1種又
は2種以上を合計0.005〜5.0%と限定したのは
、何れも下限未満では十分な効果が得られず、上限を越
えると鋳塊の叶仝性を損ね、生産性を著しく悪くするた
めである。Mn0.01~5.0%, Mg0.001~0.8%
, Ca0.001-0.8%, Cd0.05-1.0%
, A90, 001 to 0.5%, the reason why any one or two or more species were limited to a total of 0.005 to 5.0% is that sufficient effects cannot be obtained below the lower limit. This is because if the upper limit is exceeded, the integrity of the ingot will be impaired and productivity will be significantly reduced.
次にCr、■、 T*、Y、zr、co。Next, Cr, ■, T*, Y, zr, co.
Fex Py 、Crx Py 、Cox Py (
以下B元素群)からなる群は、溶体化処理等の熱処理時
の結晶粒の成長を抑制し、微細組織として良好な延性を
獲得し、曲げ成形性を良好にするのに大きく作用し、更
に熱間加工性の向上効果も示し、′lJ造性の容易さに
大きく寄与する。しかしてCr0.005〜0.4%、
V0.001〜0.4%。Fex Py, Crx Py, Cox Py (
The group consisting of elements B (hereinafter referred to as element group B) has a large effect on suppressing the growth of crystal grains during heat treatment such as solution treatment, obtaining good ductility as a microstructure, and improving bending formability. It also shows the effect of improving hot workability and greatly contributes to the ease of 'lJ manufacturing. However, Cr0.005-0.4%,
V0.001-0.4%.
T i 0.005〜0.4%、 Y0.001〜0
.2%、Zr0.005〜0.2 %、 Co0.4
%、FexPy 0.005〜0.4%、 Cr x
Py 0.005〜0.4%、 Cox Py 0
.005〜0.4%の範囲内で何れ7′)11種又は2
種以上を合計0.005〜1.0%と限定したのは、何
れも下限未満では十分な効果が得られず、上限を越える
と鋳造性を低下させたり、半田濡れ性やメツキ性等を悪
くし、更に加工性も悪化させるためである。T i 0.005~0.4%, Y0.001~0
.. 2%, Zr0.005-0.2%, Co0.4
%, FexPy 0.005-0.4%, Cr x
Py 0.005-0.4%, Cox Py 0
.. Any 7') 11 or 2 within the range of 0.005 to 0.4%
The reason for limiting the amount of 0.005% to 1.0% in total is that if the lower limit is less than the lower limit, a sufficient effect will not be obtained, and if the upper limit is exceeded, the castability will be reduced, and the solder wettability, plating property, etc. This is because it worsens the processability and further deteriorates the workability.
更にPb、I n、Ga、Ge、As、Sb。Furthermore, Pb, In, Ga, Ge, As, and Sb.
B i 、Te; Be、B、希土類元素、si<a下
C元素P¥)からなる群は快削性を良くすると共に、プ
レス金型の摩耗を著しく抑制する。しかしてPb0.0
3%以下、In0.03%以下、 Ga0.05%以下
、Ge0.05%以下、As0.01%以下、Sb0.
05%以下、Bi0.02%以下、Tea。The group consisting of B i , Te; Be, B, rare earth elements, si<a, C element P ¥) improves free machinability and significantly suppresses press die wear. However, Pb0.0
3% or less, In 0.03% or less, Ga 0.05% or less, Ge 0.05% or less, As 0.01% or less, Sb 0.
0.05% or less, Bi 0.02% or less, Tea.
05%以下、[3e0.5%以下、 30.05%以下
、希土類元素(RE)0.05%以下、Bi0.5%以
下の範囲内で何れか1種又は2種以上を合計0.5%以
下と限定したのは、これを越えて含有せしめると鋳造性
や熱間加工性等を大きく低下せしめると共に、導電性や
繰り返し曲げ性も低下させてしまうためである。 本発
明合金は上記組成と更にO2含有量を100 ppm以
下とすることにより、Nix、Aiy化合物或いはN1
xAiyCuz化合物を微細かつ均一に分散させるのに
効果を示し、半田付は性やメツキ性の向上に寄与する。0.05% or less, [3e 0.5% or less, 30.05% or less, rare earth elements (RE) 0.05% or less, Bi 0.5% or less, and a total of 0.5 of any one or two or more of them The reason why the content is limited to % or less is that if the content exceeds this range, the castability, hot workability, etc. will be greatly reduced, and the electrical conductivity and repeated bendability will also be reduced. The alloy of the present invention has the above composition and further has an O2 content of 100 ppm or less, thereby containing Nix, Aiy compounds or N1
It is effective in finely and uniformly dispersing the xAiyCuz compound, and contributes to improved soldering properties and plating properties.
しかしてこれを越えて含有すると上記効果が見られなく
なるばかりか、上記化合物を粗大化せしめて強度やメツ
キ性等の特性を劣化せしめるためO2含有量をtoop
pm以下に限定した。However, if the O2 content exceeds this, not only will the above effects not be seen, but the O2 content will not only become coarse, but also cause the properties such as strength and plating properties to deteriorate.
It was limited to pm or less.
またS含有量を10ppm以下とすることにより、αと
同様にN!xAiy化合物或いはNix、AlyCuz
化合物を微細かつ均一に分散させるのに効果を示し、熱
間加工性を向上せしめ、更にメツキ物の異常成長を抑え
る働きを持つ。Also, by setting the S content to 10 ppm or less, N! xAiy compound or Nix, AlyCuz
It is effective in finely and uniformly dispersing compounds, improves hot workability, and also works to suppress abnormal growth of plating materials.
しかしてこれを越えて含有すると熱間加工性を大きく低
下させ製造性を悪くする。更には本発明合金の構成元素
と硫化物を形成し、強度やバネ性等の機械的特性を低下
させ、メツキ性を大きく阻害するためS含有量を10p
pm以下に限定した。結晶粒度は曲げ成形性、特に曲げ
部表面の平滑性に大きく影響するもので、20μ雇を越
えると曲げ部表面が著しく平滑性を欠き、大ぎなシワや
割れを生じ、部品寿命を劣化させるため・結晶粒度を2
0μ?W以下と限定した。However, if the content exceeds this range, hot workability will be greatly reduced and manufacturability will be impaired. Furthermore, the S content is reduced to 10p because it forms sulfides with the constituent elements of the alloy of the present invention, reducing mechanical properties such as strength and springiness, and greatly inhibiting plating properties.
It was limited to pm or less. The grain size greatly affects bending formability, especially the smoothness of the surface of the bent part, and if it exceeds 20 μm, the surface of the bent part will noticeably lack smoothness, causing large wrinkles and cracks, which will shorten the life of the part.・Crystal grain size is 2
0 μ? Limited to W or less.
尚化合物を形成しないPとしては、その含有量を0.0
3%以下とすることが望ましい。また本発明合金中の分
散粒子はメツキ性、曲げ加工性及び強度の劣化を抑制す
る意味で10μTrt以下とすることが望ましい。In addition, as for P that does not form a compound, its content is 0.0
It is desirable that it be 3% or less. Further, the dispersed particles in the alloy of the present invention are desirably 10 μTrt or less in order to suppress deterioration of plating properties, bending properties, and strength.
以下本発明を実施例について説明する。 The present invention will be described below with reference to Examples.
実施例(1)
第1表に示す組成の銅合金を溶解、鋳造し、厚さ5OI
nIr11幅120 #、長さ200 mの鋳塊を得た
。Example (1) A copper alloy having the composition shown in Table 1 was melted and cast to a thickness of 5OI.
An nIr11 ingot with a width of 120 # and a length of 200 m was obtained.
これを面削し、880℃で6時間均質化処理した後、8
30°Cで熱間圧延し、これを水冷して厚さ10mの板
とした。これ等の板について冷間圧延と中間焼鈍(63
0℃で1時間)を繰返し、0.4mの板厚で溶体化処理
(920℃に2分間保1水冷)を施し、最終加工率40
%で厚さ0.25mの板に仕上げ、420℃で1時間の
調質焼鈍を施した後、各種試験片を切り出して、強度、
導電率、曲げ成形性(R/l)、メツキ密着性、半田接
合強度、応力腐食割れ性を調べた。これ等の結果を第2
表に示す。After face-cutting this and homogenizing it at 880℃ for 6 hours,
It was hot rolled at 30°C and cooled with water to form a plate with a thickness of 10 m. For these plates, cold rolling and intermediate annealing (63
0°C for 1 hour) was repeated, and a plate thickness of 0.4 m was subjected to solution treatment (held at 920°C for 2 minutes and water cooled), and the final processing rate was 40.
After finishing the plate with a thickness of 0.25 m and subjecting it to temper annealing at 420°C for 1 hour, various test pieces were cut out to determine the strength,
The conductivity, bending formability (R/l), plating adhesion, solder joint strength, and stress corrosion cracking resistance were investigated. These results are shown in the second
Shown in the table.
強度はJIS Z2241に基づき、導電率はJISt
l 0505に基づき測定した。曲げ成形性(R/l)
はJIS Z2248のブロック法に基づいて試験を行
ない、試験片の表面に割れを生じさせる最少曲げ半径(
R)を試験片の厚さ(1)で割った値で示した。メツキ
密着性は30X30.の試験片について表面清浄後Ag
メツキを行ない、これを大気中で加熱してその後のメツ
キ表面の膨れを観察し、550’Cで5分の加熱により
膨れの見られないものをrOJ印、1〜3個見られるも
のを「Δ」印、それ以上のものを「×」印で示した。半
田接合強度については20X 25mの試験片に半田面
積が直径9#になるように無酸素銅のリード線を60/
40共品半田により接合し、150℃で500時間の
加熱加速試験を行った1多に、引張試験を行い、その強
度が加熱加速試験前の70%以上のものをrOJ印、5
0〜70%のものを「△」印、それ以下のものを「×」
印で表した。Strength is based on JIS Z2241, conductivity is based on JIS
Measured based on l 0505. Bending formability (R/l)
is tested based on the block method of JIS Z2248, and the minimum bending radius that causes cracks on the surface of the test piece (
R) divided by the thickness (1) of the test piece. Plating adhesion is 30X30. After cleaning the surface of the test piece, Ag
After plating, heat it in the air and observe the blisters on the plating surface. Those with no blisters after heating at 550'C for 5 minutes are marked as rOJ, and those with 1 to 3 blisters are marked as "rOJ". ∆” marks, and those larger than that are shown as “x” marks. Regarding the solder joint strength, connect oxygen-free copper lead wires to a 20 x 25 m test piece so that the solder area is 9# in diameter.
A tensile test was performed on the 40 pieces that were joined by solder and subjected to an accelerated heating test at 150°C for 500 hours, and those whose strength was 70% or more of the strength before the accelerated heating test were marked rOJ, 5
Mark "△" for 0 to 70%, mark "x" for less than that.
Represented by a mark.
応力腐食割れ性はJIS C8306に基づきN H3
3vo1%の雰囲気中30KFJf/rrvnの引張荷
重をかけた定荷重試験を行い、割れが発生するまでの時
間を測定した。Stress corrosion cracking resistance is NH3 based on JIS C8306.
A constant load test was conducted in a 3vo1% atmosphere with a tensile load of 30KFJf/rrvn, and the time until cracking occurred was measured.
実施例2
0一ドミード型連続鋳造機を用いて第3表に示す組成の
合金を鋳造し、厚ざ10.、幅85mのコイル鋳塊を得
た。これを750℃で10時間焼鈍した後面剤し、冷間
圧延と中間焼鈍(610℃で1時間)を繰返し、0.4
#の板厚で溶体化処理(920℃に2分間保持後水冷)
を施し、最終加工率40%で厚さ0.25mの板に仕上
げ、400℃で1時間の調質焼鈍を施した後、実施例(
1)と同様にして各特性を測定した。尚、プレス金型摩
耗性については、上記材料より新たに幅45#11にス
リッティングしたコイルを用いて100万パンチの打扱
きを行った後、金型の表面を走査電子顕微鏡で12察し
、摩耗の程度を調査した。その結果を第4表に示す。Example 2 An alloy having the composition shown in Table 3 was cast using a 01 dome continuous casting machine, and the thickness was 10. A coil ingot with a width of 85 m was obtained. This was annealed at 750°C for 10 hours, then subjected to repeated cold rolling and intermediate annealing (1 hour at 610°C).
Solution treatment with plate thickness of # (held at 920℃ for 2 minutes and then water cooled)
was finished to a plate with a thickness of 0.25 m at a final processing rate of 40%, and temper annealed at 400°C for 1 hour.
Each characteristic was measured in the same manner as in 1). In addition, regarding press mold abrasion resistance, after performing 1 million punches using a coil newly slit to a width of 45 #11 from the above material, the surface of the mold was observed with a scanning electron microscope for 12 days. The degree of wear was investigated. The results are shown in Table 4.
第1表及び第2表、第3表及び第4表から明らかなよう
に、本発明合金Nα1〜10及び18〜23は何れも従
来合金Nα17と比較して強度、導電性、半田接合強度
、応力腐食割れ性に優れていることが判る。As is clear from Tables 1, 2, 3, and 4, the alloys Nα1-10 and 18-23 of the present invention are superior in strength, conductivity, and solder joint strength to the conventional alloy Nα17. It can be seen that it has excellent stress corrosion cracking resistance.
これに対し、Nr、Al含有量の多い比較合金Nα12
では熱間加工において著しい割れを生じ、供試材が製造
できず、A、B元素群の多過ぎるる比較合金Nα13も
同様に健全な鋳塊が得られず、かつ熱間加工時に割れを
生じてしまい、供試材h(17られなかった。またA、
B、C元素群を含有していない比較合金N0. 11で
は結晶が粗大化し、曲げ成形性を損ない、メツキ密着性
や半田接合強度を大きく劣化している。On the other hand, comparative alloy Nα12 with high Nr and Al contents
In this case, significant cracks occurred during hot working, making it impossible to manufacture the test material. Comparative alloy Nα13, which contains too many A and B element groups, similarly failed to produce a sound ingot and also cracked during hot working. Therefore, sample material h (17) could not be obtained. Also, A,
Comparative alloy No. 0.0 that does not contain B and C element groups. In No. 11, the crystals became coarse, impairing bending formability, and significantly deteriorating plating adhesion and solder joint strength.
更に■含有量の多い比較合金Nα11では曲げ成形性や
メツキ密着性が大きく劣り、半田接合強度も劣化してい
る。S含有量の多い比較合金Nα15は熱間加工で甚だ
しい割れを生じてしまい、比較合金N0.12. N0
.13と同様に供試材が得られなかった。また本発明合
金Nα13と同成分組成であっても、容体化処理を98
0’CX1時間で行った比較合金N0. 16では結晶
粒が粗大化し、曲げ成形性を大きく損なっている。Furthermore, the comparative alloy Nα11, which has a large content of ■, has greatly inferior bending formability and plating adhesion, and also has deteriorated solder joint strength. Comparative alloy Nα15, which has a high S content, caused severe cracking during hot working, while comparative alloy N0.12. N0
.. Similarly to No. 13, no sample material was obtained. Furthermore, even if the composition is the same as that of the alloy Nα13 of the present invention, the 98%
Comparative alloy No. 0'CX1 hour. In No. 16, the crystal grains became coarse and the bending formability was greatly impaired.
C元素群を含有した本発明合金Nα18〜23はプレス
金型の摩耗性が優れていることが判る。これに対しC元
素群を含まず結晶粒が大ぎい比較合金Nα24ではプレ
ス金型の摩耗性が著しく悪く、結晶粒が大きく或いは0
zffiの多過ぎる比較合金N0.25. N026で
はC元素の含有を以ってしても、プレス金型の摩耗性は
若干の改善しか示さなかった。It can be seen that the alloys Nα18 to Nα23 of the present invention containing the C element group have excellent abrasion resistance of press dies. On the other hand, the comparative alloy Nα24, which does not contain the C element group and has large crystal grains, has extremely poor wear resistance of the press die, and the crystal grains are large or zero.
Comparative alloy No. 25 with too much zffi. In N026, even with the inclusion of C element, the wear resistance of the press mold showed only a slight improvement.
このように本発明によれば、強度、導電性(熱伝導性)
、曲げ加工性、応力腐食削れ性が優れ、半田信頼性(接
合強度、耐熱剥離性)及びメツキの信頼性が大幅に改善
されると共に、プレス金型の摩耗性が良好で電気電子機
器として例えばコネクター、スイッチ、ソケット、接点
バネや半導体(IC,トランジスター)のリード、端子
、熱交換器等として有用であり、電気電子機器の小型化
、精密化を可能にする等工業上顕著な効果を秦するもの
である。Thus, according to the present invention, strength, electrical conductivity (thermal conductivity)
, has excellent bending workability and stress corrosion abrasion resistance, greatly improves solder reliability (joint strength, heat peeling resistance) and plating reliability, and has good abrasion resistance of press dies, making it suitable for electrical and electronic equipment, such as It is useful as connectors, switches, sockets, contact springs, semiconductor (IC, transistor) leads, terminals, heat exchangers, etc., and has a remarkable industrial effect such as making electrical and electronic equipment smaller and more precise. It is something to do.
Claims (2)
0wt%を含み、Zn0.05〜5.0wt%、Mn0
.01〜5.0wt%、Mg0.001〜0.8wt%
、Ca0.001〜0.8wt%、Cd0.05〜1.
0wt%、Ag0.001〜0.5wt%の範囲内で何
れか1種又は2種以上を合計0.005〜5.0wt%
含み、更にCr0.005〜0.4wt%、V0.00
1〜0.4wt%、Ti0.005〜0.4wt%、Y
0.001〜0.2wt%、Zr0.005〜0.2w
t%、Co0.005〜0.4wt%、Fe−P化合物
(Fe_xP_y)0.005〜0.4wt%、Cr−
P化合物(Cr_xP_y)0.005〜0.4wt%
、Co−P化合物(Co_xP_y)0.005〜0.
4wt%の範囲内で何れか1種又は2種以上を合計0.
005〜1.0wt%含み、残部Cuと不可避的不純物
からなり、更にO_2含有量を100ppm以下、S含
有量を10ppm以下、結晶粒度を20μmとする高力
電気電子機器用銅合金。(1) Ni3.5-10.0wt% and Al0.2-4.
Contains 0wt%, Zn0.05-5.0wt%, Mn0
.. 01-5.0wt%, Mg0.001-0.8wt%
, Ca0.001-0.8wt%, Cd0.05-1.
0 wt%, Ag 0.001 to 0.5 wt%, a total of 0.005 to 5.0 wt% of any one or two or more types.
Contains Cr0.005-0.4wt%, V0.00
1-0.4wt%, Ti0.005-0.4wt%, Y
0.001~0.2wt%, Zr0.005~0.2w
t%, Co0.005-0.4wt%, Fe-P compound (Fe_xP_y) 0.005-0.4wt%, Cr-
P compound (Cr_xP_y) 0.005 to 0.4 wt%
, Co-P compound (Co_xP_y) 0.005-0.
A total of 0.4 wt% of any one or two or more types.
A copper alloy for high-strength electrical and electronic equipment, containing 0.005 to 1.0 wt%, the balance being Cu and unavoidable impurities, and further having an O_2 content of 100 ppm or less, a S content of 10 ppm or less, and a crystal grain size of 20 μm.
0wt%を含み、Zn0.05〜5.0wt%、Mn0
.01〜5.0wt%、Mg0.001〜0.8wt%
、Ca0.001〜0.8wt%、Cd0.05〜1.
0wt%、Ag0.001〜0.5wt%の範囲内で何
れか1種又は2種以上を合計0.005〜5.0wt%
含み、更にCr0.005〜0.4wt%、V0.00
1〜0.4wt%、Ti0.005〜0.4wt%、Y
0.001〜0.2wt%、Zr0.005〜0.2w
t%、Co0.005〜0.4wt%、Fe−P化合物
(Fe_xP_y)0.005〜0.4wt%、Cr−
P化合物(Cr_xP_y)0.005〜0.4wt%
、Co−P化合物(Co_xP_y)0.005〜0.
4wt%の範囲内で何れか1種又は2種以上を合計0.
005〜1.0wt%含み、更にPb0.03wt%以
下、In0.03wt%以下、Ga0.05wt%以下
、Ge0.05wt%以下、As0.01wt%以下、
Sb0.05wt%以下、Bi0.02wt%以下、T
e0.05wt%以下、Be0.5wt%以下、B0.
05wt%以下、希土類元素0.05wt%以下、Si
0.5wt%以下の範囲内で何れか1種又は2種以上を
合計0.5wt%以下含み、残部Cuと不可避的不純物
からなり、更にO_2含有量を100ppm以下、S含
有量を10ppm以下、結晶粒度を20μmとする高力
電気電子機器用銅合金。(2) Ni3.5-10.0wt% and Al0.2-4.
Contains 0wt%, Zn0.05-5.0wt%, Mn0
.. 01-5.0wt%, Mg0.001-0.8wt%
, Ca0.001-0.8wt%, Cd0.05-1.
0 wt%, Ag 0.001 to 0.5 wt%, a total of 0.005 to 5.0 wt% of any one or two or more types.
Contains Cr0.005-0.4wt%, V0.00
1-0.4wt%, Ti0.005-0.4wt%, Y
0.001~0.2wt%, Zr0.005~0.2w
t%, Co0.005-0.4wt%, Fe-P compound (Fe_xP_y) 0.005-0.4wt%, Cr-
P compound (Cr_xP_y) 0.005 to 0.4 wt%
, Co-P compound (Co_xP_y) 0.005-0.
A total of 0.4 wt% of any one or two or more types.
Contains 005 to 1.0 wt%, and further includes Pb 0.03 wt% or less, In 0.03 wt% or less, Ga 0.05 wt% or less, Ge 0.05 wt% or less, As 0.01 wt% or less,
Sb 0.05wt% or less, Bi 0.02wt% or less, T
e0.05wt% or less, Be0.5wt% or less, B0.
05wt% or less, rare earth elements 0.05wt% or less, Si
Contains any one or two or more types within a range of 0.5 wt% or less, a total of 0.5 wt% or less, the remainder consisting of Cu and unavoidable impurities, furthermore, the O_2 content is 100 ppm or less, the S content is 10 ppm or less, A copper alloy for high-strength electrical and electronic equipment with a grain size of 20 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25700987A JPH01100231A (en) | 1987-10-12 | 1987-10-12 | Copper alloy for high tensile electric and electronic equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25700987A JPH01100231A (en) | 1987-10-12 | 1987-10-12 | Copper alloy for high tensile electric and electronic equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01100231A true JPH01100231A (en) | 1989-04-18 |
| JPH0425340B2 JPH0425340B2 (en) | 1992-04-30 |
Family
ID=17300456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25700987A Granted JPH01100231A (en) | 1987-10-12 | 1987-10-12 | Copper alloy for high tensile electric and electronic equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01100231A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107475562A (en) * | 2017-08-29 | 2017-12-15 | 河南科技大学 | A kind of sea water resistance erosion processing copper alloy and preparation method thereof |
| JP2019151867A (en) * | 2018-02-28 | 2019-09-12 | 株式会社神戸製鋼所 | Copper alloy material having excellent aluminum contact corrosion resistance, and terminal |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6386838A (en) * | 1986-09-30 | 1988-04-18 | Furukawa Electric Co Ltd:The | Copper alloy for semiconductor lead |
| JPS63130739A (en) * | 1986-11-20 | 1988-06-02 | Nippon Mining Co Ltd | High strength and high conductivity copper alloy for semiconductor device lead material or conductive spring material |
| JPS63216938A (en) * | 1987-03-05 | 1988-09-09 | Furukawa Electric Co Ltd:The | High-strength conductive alloy for electronic equipment |
-
1987
- 1987-10-12 JP JP25700987A patent/JPH01100231A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6386838A (en) * | 1986-09-30 | 1988-04-18 | Furukawa Electric Co Ltd:The | Copper alloy for semiconductor lead |
| JPS63130739A (en) * | 1986-11-20 | 1988-06-02 | Nippon Mining Co Ltd | High strength and high conductivity copper alloy for semiconductor device lead material or conductive spring material |
| JPS63216938A (en) * | 1987-03-05 | 1988-09-09 | Furukawa Electric Co Ltd:The | High-strength conductive alloy for electronic equipment |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107475562A (en) * | 2017-08-29 | 2017-12-15 | 河南科技大学 | A kind of sea water resistance erosion processing copper alloy and preparation method thereof |
| JP2019151867A (en) * | 2018-02-28 | 2019-09-12 | 株式会社神戸製鋼所 | Copper alloy material having excellent aluminum contact corrosion resistance, and terminal |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0425340B2 (en) | 1992-04-30 |
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