JPH01105255A - Glass mask - Google Patents

Abstract

PURPOSE:To eliminate force application to adhering surfaces caused by pressure difference and to eliminate generating foreign matter on the adhering surfaces by forming a path on a flame body for air to go in and out though a pellicle. CONSTITUTION:A through hole 7 which penetrates the pellicle 6 from the inside to outside is formed on a frame body 3 to let air move freely, and a filter 8 which removes foreign matter is installed on the hole 7. Thus the inside and outside pressure of the pellicle 6 becomes the same, and foreign matter generated by the projection and recession of the pellicle film by the expansion and contraction of the air inside of the pellicle 6, and the invasion of foreign matter into the pellicle are prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a glass mask to which Beritaru is applied.

[Conventional technology]

For information on glass masks, please see Press Journal Publication Monthly S
It is described in em1conductor World, December 1986 issue, p. 174.

The outline will be explained using FIG. 3.

1 is a glass plate polished smooth, and soda lime glass, silicate glass, quartz glass, or the like is used. 2 is a pattern in which a chromium film is formed on the main surface la of the glass plate 1 and patterned into a desired shape by etching using a resist process. Reference numeral 3 denotes a frame attached around the pattern 2, and a transparent pellicle film is pasted through the frame 3 in parallel to the main surface 1a.

In the glass mask 5 with a pellicle having such a configuration, minute dust does not adhere directly to the main surface la, but instead adheres to the pellicle film, so that it is possible to separate the surface by several distances from the surface on which the pattern 2 is formed during exposure. can. Therefore, the pattern of foreign particles is out of focus and is not projected onto the resist on the wafer surface even when exposed to light, so that it does not become a defect, and is therefore known as an effective means for improving the yield of wafers.

[Problem that the invention seeks to solve]

However, such a glass mask 5 with a pellicle (
When a reticle (reticle) is transported by air, there are considerable changes in air pressure or temperature, causing the air inside the pellicle 6 to expand and contract, causing the pellicle membrane 4 to become convex or concave, causing the glass plate to Foreign matter is generated from the adhesive surface between 1 and the frame 3 or the adhesive surface between the frame 3 and the pellicle membrane 4,
The inventor of the present invention has revealed that adhesion to the main surface of a glass plate poses a problem.

An object of the present invention is to provide a technique for improving wafer yield.

The above and other objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.

[Means for Solving the Problems] A brief overview of typical inventions disclosed in this application is as follows.

In other words, if the pellicle internal pressure and external pressure are constant,
A passage for air inside and outside the pellicle is formed in the frame.

[Effect]

According to the above-mentioned means, it is possible to solve the problem that the inside and outside of the pellicle have the same pressure, and the expansion and contraction of the air inside the pellicle causes the pellicle membrane to become convex or concave, causing foreign matter to occur.

[Example 1] FIG. 1 is a schematic cross-sectional view of a glass mask that is an example of the present invention. Components similar to those of the pellicle-equipped glass mask shown in FIG. 3 are designated by the same reference numerals, and their explanations will be omitted.

As shown in the figure, a communication hole 7 is formed in the frame 3, penetrating from the inside of the pellicle 6 to the outside, so that air can freely enter and exit. Note that if there is a risk that foreign matter may enter the inside of the pellicle 6 through the communication hole 7, a filter 8 for removing foreign matter may be attached as in this embodiment.

[Example 2] FIG. 2 is a schematic cross-sectional view of a glass mask 7 that is another example of the present invention.

As shown in the figure, in this embodiment, the frame body 9 itself is made of a filter material, and air can freely flow in and out between the inside and outside of the pellicle 6a.

Next, the effects of this embodiment will be explained.

(11 By providing a communication hole in the frame that communicates the inside and outside of the pellicle, the pellicle internal pressure and external pressure are always equal, so changes in atmospheric pressure, temperature, etc. can cause the pellicle membrane to become convex, This has the effect of preventing the problem of foreign matter being generated due to pressure being applied to the pellicle membrane and the frame or the frame and the glass plate due to the concave shape.

(21 By providing a communication hole in the frame body that communicates the inside of the pellicle with the outside, and arranging a filter in the communication hole, the above effect can be obtained, and the risk of foreign matter entering the inside of the pellicle from the outside can be achieved. This has the effect of completely preventing this.

(31 By constructing the frame with filter material, the internal pressure of the pellicle and the external pressure can always be equalized, so even if external conditions such as atmospheric pressure and temperature change, no pressure is applied to the pellicle membrane.) This provides the effect that foreign matter can be prevented from forming from the bonding surface between the pellicle membrane and the frame or the frame and the glass plate.

(41(1), +21, [31) can prevent foreign matter from adhering to the main surface of the glass plate on which a pattern is formed, so that foreign matter can be projected onto the wafer surface as a pattern during exposure. Since there are no defects, the wafer yield can be improved.

Although the invention made by the present inventor has been specifically explained above based on Examples, it goes without saying that the present invention is not limited to the above Examples and can be modified in various ways without departing from the gist thereof. Nor. For example, the communication hole is 1
It may be located not only in one location but also in multiple locations. Alternatively, the pellicle may be filled with an inert gas (for example, argon, etc.) whose volume changes little with respect to temperature and pressure without providing a communication hole.

〔Effect of the invention〕

A brief explanation of the effects obtained by typical inventions disclosed in this application is as follows.

In other words, even if there are changes in external pressure, temperature, etc., the inside of the pellicle communicates with the outside through the communication hole, so there is no pressure difference, and each bonding surface (pellicle membrane and frame, frame and glass plate) ), and no foreign matter is generated from the adhesive surface. Therefore, exposure defects due to foreign matter can be prevented.

[Brief explanation of the drawing]

Fig. 1 is a schematic diagram of a glass mask which is a simple embodiment of the present invention, Fig. 2 is a schematic diagram of a glass mask which is another embodiment of the invention, and Fig. 3 is a schematic diagram of a conventional glass mask. It is. 1... Glass plate, 2... Pattern, 3... Frame,
4... Pellicle membrane, 5... Glass mask, 6...
Pellicle, 7... communicating hole, 8, 9... filter.

Claims (1)

[Claims] 1. A glass plate with a light-shielding pattern formed on its main surface, a frame attached to surround the pattern, and a transparent glass plate attached to the frame so as to face the main surface. 1. A glass mask having a pellicle film, characterized in that the frame has at least one communication hole formed therein. 2. The glass mask according to claim 1, wherein a filter is attached to the communication hole to prevent foreign matter from entering from the outside. 3. The glass mask according to claim 1, wherein the frame itself is constituted by a filter.