JPH01115151U - - Google Patents

Info

Publication number
JPH01115151U
JPH01115151U JP965388U JP965388U JPH01115151U JP H01115151 U JPH01115151 U JP H01115151U JP 965388 U JP965388 U JP 965388U JP 965388 U JP965388 U JP 965388U JP H01115151 U JPH01115151 U JP H01115151U
Authority
JP
Japan
Prior art keywords
sample
objective lens
vacuum
diaphragm
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP965388U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP965388U priority Critical patent/JPH01115151U/ja
Publication of JPH01115151U publication Critical patent/JPH01115151U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は電子線描画装置等に於ける
鏡筒、試料室及びその周辺の概略構成を示す側面
図、第3図は本案を付加した場合の側面図、第4
図は絞り保持台の例を示す図、第5図は絞りの形
状の例を示す図、第6図は試料固定アダプタに試
料おさえを用いて試料をセツトした場合の側面図
、第7図は大気中にある試料を真空度を下げるこ
となく真空度の高い試料室にセツトする場合の試
料室及びその周辺の概略構成を示す側面図である
。 1……鏡筒、2……対物レンズ、3……対物レ
ンズ絞り、4……試料、5……試料固定アダプタ
、6……試料室、7……XYステージ、8……絞
り保持台、9……エアシリンダ、10……引きバ
ネ、11……エアシリンダ用バルブ、12……試
料おさえ、13……予備排気室、14……ロード
棒、15……予備排気室用バルブ、16……隔壁
Figures 1 and 2 are side views showing the schematic configuration of the lens barrel, sample chamber, and their surroundings in an electron beam lithography system, etc. Figure 3 is a side view when the present invention is added;
The figure shows an example of an aperture holding stand, Figure 5 shows an example of the shape of the aperture, Figure 6 is a side view when a sample is set on the sample fixing adapter using a sample holder, and Figure 7 is a side view. FIG. 2 is a side view showing a schematic configuration of a sample chamber and its surroundings when a sample in the atmosphere is set in a sample chamber with a high degree of vacuum without lowering the degree of vacuum. 1... Lens barrel, 2... Objective lens, 3... Objective lens aperture, 4... Sample, 5... Sample fixing adapter, 6... Sample chamber, 7... XY stage, 8... Aperture holder, 9...Air cylinder, 10...Tension spring, 11...Valve for air cylinder, 12...Sample holding, 13...Preliminary exhaust chamber, 14...Load rod, 15...Valve for preliminary exhaust chamber, 16... ...bulkhead.

Claims (1)

【実用新案登録請求の範囲】 1 移動ステージ上に装着された試料に荷電粒子
を照射することにより、試料の加工、又は、試料
から発生する試料信号により、試料像の監察又は
分析、計測等を行う装置に於て、移動ステージ上
に荷電粒子ビームの光軸上の絞りを着脱するため
の機構を有することを特徴とする対物レンズ絞り
交換装置。 2 請求の範囲第1項において、真空中にある試
料と大気中にある試料を交換するとき試料を試料
ホルダに装着し、当該試料ホルダを試料室の真空
度を下げることなく交換出来るように構成された
装置に於て試料ホルダに相当する機構部に対物レ
ンズ絞りの着脱機能を付加することにより、試料
室及び鏡筒の真空度を下げることなく対物レンズ
絞りの交換が出来るようにしたことを特徴とする
対物レンズ絞り交換装置。
[Claims for Utility Model Registration] 1. Processing of a sample by irradiating a sample mounted on a moving stage with charged particles, or monitoring, analysis, measurement, etc. of a sample image using a sample signal generated from the sample. 1. An objective lens diaphragm exchange device characterized in that the apparatus has a mechanism for attaching and detaching a diaphragm on the optical axis of a charged particle beam on a moving stage. 2. According to claim 1, when exchanging a sample in a vacuum with a sample in the atmosphere, the sample is attached to a sample holder, and the sample holder is configured so that the sample holder can be exchanged without lowering the degree of vacuum in the sample chamber. By adding a function for attaching and detaching the objective lens diaphragm to the mechanical part corresponding to the sample holder in the developed device, we have made it possible to replace the objective lens diaphragm without lowering the degree of vacuum in the sample chamber and lens barrel. Characteristic objective lens aperture exchange device.
JP965388U 1988-01-29 1988-01-29 Pending JPH01115151U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP965388U JPH01115151U (en) 1988-01-29 1988-01-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP965388U JPH01115151U (en) 1988-01-29 1988-01-29

Publications (1)

Publication Number Publication Date
JPH01115151U true JPH01115151U (en) 1989-08-02

Family

ID=31216583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP965388U Pending JPH01115151U (en) 1988-01-29 1988-01-29

Country Status (1)

Country Link
JP (1) JPH01115151U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05325859A (en) * 1992-05-22 1993-12-10 Hitachi Ltd Electron beam irradiation device
JP2011138649A (en) * 2009-12-28 2011-07-14 Hitachi High-Technologies Corp Electron microscope

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05325859A (en) * 1992-05-22 1993-12-10 Hitachi Ltd Electron beam irradiation device
JP2011138649A (en) * 2009-12-28 2011-07-14 Hitachi High-Technologies Corp Electron microscope

Similar Documents

Publication Publication Date Title
JPH01115151U (en)
JPH11513494A (en) A device for measuring the drop of particles onto a surface using a telltale plate
CN222825236U (en) Imaging detection device and system
JPS59187069U (en) Charged particle beam analyzer
SE8100647L (en) BRAKE CYLINDER MOUNTING MACHINE FOR A VEHICLE
JP3064335B2 (en) Transmission electron microscope
JPH02110838U (en)
JPH0424252U (en)
Delgado III et al. Imaging of submicron objects with the light microscope
JPS58118743U (en) Crystal evaluation device
JPS5881727U (en) Magnetic head mounting angle inspection device
JPH0178023U (en)
JPH0353741U (en)
LAWLEY Characterization of microstructure in metallic and composite materials(Final Report, 15 Dec. 1984- 14 Dec. 1985)
JPH0347246Y2 (en)
JPS63120146U (en)
JPH0177257U (en)
JPS58113255U (en) Axis alignment device for electron microscopes, etc.
JPS5917556U (en) Electron beam equipment equipped with an optical microscope
JPH01129754U (en)
JPS59103360U (en) compound microscope
JPH0369853U (en)
JPS5957849U (en) Sample exchange equipment for electron microscopes, etc.
JPS63131058U (en)
JPS5893809U (en) optical measuring device