JPH01115151U - - Google Patents
Info
- Publication number
- JPH01115151U JPH01115151U JP965388U JP965388U JPH01115151U JP H01115151 U JPH01115151 U JP H01115151U JP 965388 U JP965388 U JP 965388U JP 965388 U JP965388 U JP 965388U JP H01115151 U JPH01115151 U JP H01115151U
- Authority
- JP
- Japan
- Prior art keywords
- sample
- objective lens
- vacuum
- diaphragm
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims 2
- 238000004458 analytical method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
Description
第1図及び第2図は電子線描画装置等に於ける
鏡筒、試料室及びその周辺の概略構成を示す側面
図、第3図は本案を付加した場合の側面図、第4
図は絞り保持台の例を示す図、第5図は絞りの形
状の例を示す図、第6図は試料固定アダプタに試
料おさえを用いて試料をセツトした場合の側面図
、第7図は大気中にある試料を真空度を下げるこ
となく真空度の高い試料室にセツトする場合の試
料室及びその周辺の概略構成を示す側面図である
。
1……鏡筒、2……対物レンズ、3……対物レ
ンズ絞り、4……試料、5……試料固定アダプタ
、6……試料室、7……XYステージ、8……絞
り保持台、9……エアシリンダ、10……引きバ
ネ、11……エアシリンダ用バルブ、12……試
料おさえ、13……予備排気室、14……ロード
棒、15……予備排気室用バルブ、16……隔壁
。
Figures 1 and 2 are side views showing the schematic configuration of the lens barrel, sample chamber, and their surroundings in an electron beam lithography system, etc. Figure 3 is a side view when the present invention is added;
The figure shows an example of an aperture holding stand, Figure 5 shows an example of the shape of the aperture, Figure 6 is a side view when a sample is set on the sample fixing adapter using a sample holder, and Figure 7 is a side view. FIG. 2 is a side view showing a schematic configuration of a sample chamber and its surroundings when a sample in the atmosphere is set in a sample chamber with a high degree of vacuum without lowering the degree of vacuum. 1... Lens barrel, 2... Objective lens, 3... Objective lens aperture, 4... Sample, 5... Sample fixing adapter, 6... Sample chamber, 7... XY stage, 8... Aperture holder, 9...Air cylinder, 10...Tension spring, 11...Valve for air cylinder, 12...Sample holding, 13...Preliminary exhaust chamber, 14...Load rod, 15...Valve for preliminary exhaust chamber, 16... ...bulkhead.
Claims (1)
を照射することにより、試料の加工、又は、試料
から発生する試料信号により、試料像の監察又は
分析、計測等を行う装置に於て、移動ステージ上
に荷電粒子ビームの光軸上の絞りを着脱するため
の機構を有することを特徴とする対物レンズ絞り
交換装置。 2 請求の範囲第1項において、真空中にある試
料と大気中にある試料を交換するとき試料を試料
ホルダに装着し、当該試料ホルダを試料室の真空
度を下げることなく交換出来るように構成された
装置に於て試料ホルダに相当する機構部に対物レ
ンズ絞りの着脱機能を付加することにより、試料
室及び鏡筒の真空度を下げることなく対物レンズ
絞りの交換が出来るようにしたことを特徴とする
対物レンズ絞り交換装置。[Claims for Utility Model Registration] 1. Processing of a sample by irradiating a sample mounted on a moving stage with charged particles, or monitoring, analysis, measurement, etc. of a sample image using a sample signal generated from the sample. 1. An objective lens diaphragm exchange device characterized in that the apparatus has a mechanism for attaching and detaching a diaphragm on the optical axis of a charged particle beam on a moving stage. 2. According to claim 1, when exchanging a sample in a vacuum with a sample in the atmosphere, the sample is attached to a sample holder, and the sample holder is configured so that the sample holder can be exchanged without lowering the degree of vacuum in the sample chamber. By adding a function for attaching and detaching the objective lens diaphragm to the mechanical part corresponding to the sample holder in the developed device, we have made it possible to replace the objective lens diaphragm without lowering the degree of vacuum in the sample chamber and lens barrel. Characteristic objective lens aperture exchange device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP965388U JPH01115151U (en) | 1988-01-29 | 1988-01-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP965388U JPH01115151U (en) | 1988-01-29 | 1988-01-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01115151U true JPH01115151U (en) | 1989-08-02 |
Family
ID=31216583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP965388U Pending JPH01115151U (en) | 1988-01-29 | 1988-01-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01115151U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05325859A (en) * | 1992-05-22 | 1993-12-10 | Hitachi Ltd | Electron beam irradiation device |
| JP2011138649A (en) * | 2009-12-28 | 2011-07-14 | Hitachi High-Technologies Corp | Electron microscope |
-
1988
- 1988-01-29 JP JP965388U patent/JPH01115151U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05325859A (en) * | 1992-05-22 | 1993-12-10 | Hitachi Ltd | Electron beam irradiation device |
| JP2011138649A (en) * | 2009-12-28 | 2011-07-14 | Hitachi High-Technologies Corp | Electron microscope |
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