JPH01154155A - Processing method for silver halide photosensitive material - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for developing a silver halide photosensitive material, and particularly to a processing method that reduces oxidation and evaporation of a processing solution.

(Prior art) Conventional automatic developing devices include hanging type automatic developing machines, cine automatic developing machines, roller conveyance automatic developing machines, rotary automatic developing machines for disk films, rotating drum automatic developing machines, and reel-wound automatic developing machines. machines etc. have been put into practical use. These automatic developing machines are equipped with tanks that contain a developer, a bleach solution, a fixer or a bleach-fix solution, a stabilizing solution, and selectively a stop solution, an adjustment solution, a reversal solution, etc. It is desirable that processing liquids other than bleaching liquids are less susceptible to oxidation and deterioration due to air. However, in the development process, since the photosensitive materials are automatically supplied sequentially to the processing tank, the surface area of each processing solution in contact with the air is large, resulting in problems such as deterioration of the processing solution due to air oxidation and large evaporation. . Note that it is desirable that the above-mentioned bleach solution or bleach-fix solution has a large air contact surface.

In order to solve these problems, it is necessary to install a floating lid over the entire surface of the processing solution, remove the floating lid during development, and leave the floating lid on when development is not being performed. It has been proposed to provide a floating lid in the gap to avoid the transport device. However, for the former, it is extremely troublesome to place or remove a floating lid in an automatic processing machine, and for the latter, rollers, etc. are placed in the tank, so the floating lid covers the surface of the processing liquid. Since the surface area of the floating lid is small, the effect of preventing oxidation by the floating lid is substantially small, and the problem has not yet been solved. Also, when placing floats,
Since the float rotates on the liquid surface during operation, the disadvantage of substantially increasing the liquid surface area is unavoidable.

On the other hand, various methods are known in which a developer is placed between narrow slits and the photosensitive material is volatized and developed. For example, according to the developing machine described in Japanese Patent Publication No. 43-3549, it is explained that the amount of developer can be reduced and the temperature can be easily controlled, but it is necessary to avoid damaging the photosensitive material being processed. It is stated that.

Furthermore, JP-A No. 62-67543 discloses that when a photosensitive material is passed through such a slit, a particularly weak photosensitive material cannot be conveyed well, and a processing liquid is poured from the direction in which the photosensitive material passes. . Furthermore, JP-A-62-890
No. 52 discloses that the distance between narrow slits is narrowed and a photosensitive material is passed between the narrow slits. Various methods are known for passing a photosensitive material through a processing liquid between narrow slits, but this method has all the following features: ease of passage, processing without damaging the photosensitive material, and prevention of uneven processing. Currently, it is difficult to achieve this and has not been put into practical use.

Furthermore, JP-A-61-77851 discloses a method in which one side of the slit is a cylinder, a photosensitive material is brought into close contact with this cylinder, and the photosensitive material is conveyed once by the rotation of the cylinder to pass the photosensitive material through the slit. is listed. According to this method, the permeability of the photosensitive material is improved and processing scratches do not occur, but there is a problem that processing unevenness is likely to occur. Also, according to this processing method, normal (sealed paper)
Example RC pH; \IVP pH) Support material
A film support containing 1 can be passed between the narrow slits without any problem, but when passing resin-coated paper with increased smoothness or a smooth film support without a matting agent. However, there is a drawback that the photosensitive material gets stuck in the processing tank, especially when the material is passed through the processing tank at a slow conveyance speed.

In addition to the above problems, when a slit-shaped processing path is used, it is necessary to use a long and narrow processing machine to prevent air oxidation, and in order to move the photosensitive material smoothly, it is necessary to use a drive part. There was a drawback that short photosensitive materials could not be processed unless the amount was increased.

[Problem that the invention seeks to solve]

″-Therefore, the present invention effectively prevents oxidative deterioration of the processing liquid by reducing the contact area between the processing liquid and air as much as possible,
It is an object of the present invention to provide a method for processing a silver halide photosensitive material that enables smooth transfer of the photosensitive material.

[Means for solving problems]

The present invention provides a method for attaching a water-resistant guide having a magnet to the photosensitive material to be processed, and moving the magnetic material having the magnet provided outside the processing path. This was done based on the knowledge that the above-mentioned problems could be solved by interlocking the photosensitive material with smooth movement through the processing path.

That is, in the present invention, a silver halide photosensitive material having a water-resistant guide having a magnet at least in part is moved through the slit-like processing path as a magnetic material consisting of a magnet and a sheet is provided outside the slit-like processing path. Provided is a method for processing a silver halide photosensitive material, characterized in that the photosensitive material is moved within a processing path and the photosensitive material is processed with a processing liquid filled in the processing path.

As for the slit-shaped processing path used in the development processing of the present invention, the cross section (width) of the passage in the processing tank through which the photosensitive material passes is preferably 0.3 to 50 mm, particularly preferably 1 to 50 mm.
30, and at least a portion of the portion other than the roller for conveying the photosensitive material is in the form of a slit. Further, the length of the slit-shaped processing path between the conveyance roller and the roller is preferably 50 m or more, preferably 10 cm or more.

Note that a flexible member (such as nylon or polyester) can be provided on the inner wall of the slit-shaped processing path so as to protrude inward.

In the present invention, it is further preferable to use a processing tank in which the ratio of the liquid surface area to the liquid volume is small, and in this processing tank, it is preferable that the cross-sectional area of the processing liquid path is almost the same as the surface area of the liquid surface part, so-called Thin layer development is preferred.

Furthermore, the liquid flow path in the main part of the developing layer and the conveyance path of the photosensitive material are almost parallel, and in the main part, the liquid flow path in the main part is perpendicular to the emulsion layer and the support layer of the photosensitive material (thickness direction).
1. The length of the photosensitive material is within 200 times the thickness of the photosensitive material. Furthermore, 2
It is preferable that the treatment liquid path be 11Ω0 times, especially 5) 50 times. In this case, the gap between the processing tank and the photosensitive material in the thickness direction is preferably 0.5 to 10 mm, more preferably 1 to 5 mm.

Further, in the present invention, it is preferable that the thickness of the developer layer in the main portion of the developer tank is 40 mm or less.

The water-resistant guide with magnets used in the present invention is one in which ordinary thin magnets with S-N poles are alternately oriented in opposite directions and pasted on a support at regular intervals and completely sealed with a water-resistant laminate. . The thickness is preferably 0.05 to 20 mm, and the size is 1゛35 size, the width is 35 to 45 mm.
Width 60-80m for mll1 size and 120 size
Width 102-150mm for m size, 4x5 size
size is used. In addition, for large paper size, one with a width of 500 to 800 mm is used. It is easy to use lengths of 50 to 400 +++ m size. It is not necessary that the entire water-resistant guide is magnetic, but it is sufficient that 1720 to 'A of the guide area is magnetic.

Although the water-resistant guide can be attached to any position on the photosensitive material, it is preferable to attach it to the tip of the photosensitive material. Although the mounting method is arbitrary, it is preferable to use adhesive tape or plastic alligator scissors.

As the magnetic material used in the present invention, it is preferable to use a rotating sheet having a magnet, and specifically, an ordinary S-
Thin magnets with N poles are alternately oriented in opposite directions and pasted on a support at regular intervals and completely sealed with a water-resistant laminate, such as a nylon or Tetron sheet with a thickness of 0.05 to 20 mm and a width of 35 fflI11 to 800 mm. It is best to use a magnet of any size, and the length can be any length as long as it can be rotated in a loop, but a magnet of 500 mm to 50 m is used, on which thin magnets with S-N poles are alternately placed. It is best to use sheets that are pasted at regular intervals in the opposite direction.

Note that the water-resistant laminate is preferably laminated with a durable water-resistant laminate.

The developing processing method of the present invention is based on the above configuration, but the apparatus used in the present invention can be equipped with a temperature regulator, roller, replenishment port, overflow roller, etc., which are included in a normal automatic developing machine. In the present invention, the above-mentioned slit-shaped processing channel (tank) is used so that the opening degree K of the processing tank satisfies the following formula! It is better to design it yourself.

log K≦-1,8X 10-5V-1,5 (in the formula,
S is the surface where the photographic processing solution in the processing tank comes into contact with the air!
(cffl), ■ is the volume (cd) of the photographic processing solution filled, and K is the aperture degree (cm-').

Note that K is S/V. ) This is because the treatment liquid can be stabilized in this way.

More preferably log K≦-1,8X 10-'V-2,5.

On the other hand, from a practical standpoint as a developing device for photosensitive materials, it is preferable that log K≦-1,8X 10-5V-4.

In addition, the processing volume V is ■≦10[f] is preferable, but on the other hand, from the processing capacity of photographic materials, etc. It is preferable that ■=≦O, O1 [:].

In the present invention, the slit-shaped processing tank of the developing device is filled with a photographic processing solution. Here, the photographic processing solution includes a processing solution used in the development process of silver halide photosensitive materials, such as a developer, a bleach solution, a bleach-fix solution, a fixer,
Examples include rinsing liquid, stabilizing liquid, and washing water. Further, examples of the developer include a black and white developer and a color developer (including a reversal color developer). The ones available on the market include the magazine rRESEARCHDISCLO3URE
J 1 temNo, 17643 XIX-XXI
(December 1978, Sections 28 to 30), and the book "Latest Photographic Prescription Handbook (Photography Industry Separate Volume)" by Akira Sasai (Shashin Kogyo Publishing Co., Ltd., published in 1988).

In the present invention, it is particularly preferable that the processing path filled with the developer is formed into a slit shape, but any other processing path may be formed into a slit shape.

In the present invention, the above-mentioned photographic processing solution can be replenished into the above-mentioned developing device by any method, but it is preferable to introduce the photographic processing solution from the vicinity of the entrance of the photosensitive material because it can further speed up the process. The methods of processing the material include: (1) performing replenishment intermittently; (2) providing a mixing means in the replenishment area; A fine slit is provided on the downstream side of the refilling position to ensure the mixing of replenisher and tank liquid.
■The flow speed of the replenisher should be set to 2 times the processing speed of the photosensitive material.
The liquid flow speed is increased to 1/100 to 1/100, more preferably 115 to 1/100, or 2 to 100 times, preferably 5 to 100 times. It is preferable to use at least one of the above items (1) to (2) or a combination thereof.

Examples of photosensitive materials that can be developed by the development method of the present invention include color paper, negative film for color photography, color reversal film, and color reversal (direct positive) paper; black and white negative films; Examples include black and white photosensitive materials such as medical photosensitive materials, printing photosensitive materials, and microfilms.

(Example) Hereinafter, examples of the present invention will be described based on the drawings.The developer used in the processing method of the present invention, If2, has a comb-shaped upper lid 6 of the developer tank, as shown in a cross-sectional view in FIG. A hanging lid 8 is arranged at the upper opening of the developing housing 4. A handle 10 is provided at the center of the top surface of the lid 8. The upper lid 6 includes a plurality of stainless steel upper lid members 12 each having a rectangular cross section and arranged substantially vertically.

Inside the developing housing 4, a tank wall material 14 that is combined with the upper lid material 12 to form a processing path 15 is arranged. Therefore, the upper lid material 12 and the tank wall material 14 form a processing path 15 that is continuous in a wave shape, and turns with a smooth curvature so that the photosensitive material can smoothly pass through the upper and lower bends. There is.

The processing path 15 forms a slit-shaped processing path (with a cross-sectional opening of 3 m), and an overflow hole 20 and a replenishment port 22 are provided at the entrance and exit portions of the processing path, and the developer solution level in the processing path 15 is is never higher than the overflow hole 20.22. Further, above the inlet and outlet portions of the processing path 150, a photosensitive material supply reel 24 and a photosensitive material take-out reel 26 are provided.
is located.

In the above configuration, there is a developer (portion D) in the processing path 15.
The developer housing 4 is filled with warm water to keep the developer at a constant temperature. Further, W, SF, and W2 are filled with washing water, fixing solution, and washing water, respectively. The photosensitive material S is then supplied to the processing path 15 via the photosensitive material supply reel 24.

The light-sensitive material is taken out by a light-sensitive material take-out channel 26.

A water-resistant guide 40 shown in FIG. 2 attached to the tip of the photosensitive material is inserted into the tube 24 in FIG. 1.

In FIG. 1, reference numeral 30 denotes a rotary sheet 30 having a magnetic material, that is, a magnet, and is rotated by a rotary drive section 32. Therefore, the waterproof guide 4'0 moves in conjunction with the movement of the rotary seat 30, and moves within the processing path 15.

In addition, in the water-resistant guide 40 shown in FIG.
A compound (sodium bicarbonate) that generates bubbles when heated is applied to the top and bottom of the magnet portion 44 placed above, sealed with a water-resistant laminate 46, and heated at 120° C. for 30 seconds to form protrusions 48.

Further, the rotary seat 30 has a similar structure to the water-resistant guide 40, as schematically shown in FIG.

[Brief explanation of the drawing]

Figure 1 is a cross-sectional view of the development processing apparatus used in the present invention, Figure 2A is a schematic diagram of a water-resistant guide, Figure 2B is a cross-sectional view taken along line AA, and Figure 3A is a magnetic material. A schematic diagram of the rotary seat, FIG. 3B is a sectional view taken along line B-B. In the figure, 15: slit-shaped processing path, -30: rotating sheet made of magnetic material, 40: water-resistant guide, D.
...developer, W+...rinsing water, F...fixer, W2...indicates the filling location of washing water.

Claims (4)

[Claims] (1) A silver halide photosensitive material having a water-resistant guide having a magnet on at least a part thereof is placed on the outside of the slit-shaped processing path as the magnetic material consisting of a magnet and a sheet moves. 1. A method for processing a silver halide photosensitive material, comprising moving the photosensitive material within the processing path and processing the photosensitive material with a processing liquid filled in the processing path. (2) The processing method according to claim (1), wherein the magnetic material provided outside the slit-shaped processing path is a rotating sheet having a magnet. (3) Claim (1) wherein the water-resistant guide and rotating seat are sheets in which thin plates having S-N poles are arranged alternately with S-N and N-S at regular intervals. Processing method described. (4) The cross section of the slit-shaped processing path has a gap of 0.3 to 50 mm.
The processing method according to claim (1), wherein the treatment method is in the form of a slit.