JPH01165603A - Method for manufacturing conductive polymer compound - Google Patents
Method for manufacturing conductive polymer compoundInfo
- Publication number
- JPH01165603A JPH01165603A JP62322775A JP32277587A JPH01165603A JP H01165603 A JPH01165603 A JP H01165603A JP 62322775 A JP62322775 A JP 62322775A JP 32277587 A JP32277587 A JP 32277587A JP H01165603 A JPH01165603 A JP H01165603A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plasma
- polymer compound
- substrate
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0404—Methods of deposition of the material by coating on electrode collectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
- H01M4/0421—Methods of deposition of the material involving vapour deposition
- H01M4/0428—Chemical vapour deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(発明の属する技術分野)
本発明は、二次電池の電極活物質や電子材料等に用いら
れる導電性高分子化合物の製造方法に関するものである
。DETAILED DESCRIPTION OF THE INVENTION (Technical field to which the invention pertains) The present invention relates to a method for producing a conductive polymer compound used for electrode active materials of secondary batteries, electronic materials, etc.
従来、導電性高分子化合物であるパイ電子共役系高分子
化合物は可撓性、加工性、軽量性にすぐれ、無機電子材
料とは異なった用途への応用が活発に研究されている。Conventionally, conductive polymer compounds such as pi-electron conjugated polymer compounds have excellent flexibility, processability, and light weight, and their application to uses different from inorganic electronic materials has been actively researched.
こうしたパイ電子共役系高分子化合物の代表的な一例と
してポリアセチレンが最もよく知られており、該ポリア
セチレンはヨウ素、五フ、フ化ヒ素等のような電子受容
体や、カリウム、ナトリウム等のような電子供与体をド
ーピングすること ゛により、電気伝導度をl Q−
’5−cs−’から10″3・all ” ’まで容易
に制御できる。また、該ポリアセチレンは電気化学的酸
化還元反応を利用してドーピングすることにより電気伝
導度を制御することも可能である。Polyacetylene is the most well-known representative example of such pi-electron conjugated polymer compounds, and polyacetylene has electron acceptors such as iodine, pentafluoride, arsenic fluoride, etc., and potassium, sodium, etc. By doping with an electron donor, the electrical conductivity is increased by
It can be easily controlled from '5-cs-' to 10''3・all''. Further, the electrical conductivity of the polyacetylene can be controlled by doping it using an electrochemical redox reaction.
一方、こうしたポリアセチレンやその他のパイ電子共役
系高分子化合物の応用分野の一例として、二次電池への
応用について活発に研究されてきているが、いまだに実
用化されるにいたってはいない。On the other hand, as an example of the application field of polyacetylene and other pi-electron conjugated polymer compounds, the application to secondary batteries has been actively researched, but it has not yet been put into practical use.
従来のポリアセチレンの製造方法は、チーグラー・ナツ
タ法により、テトラブトキシチタン−トリエチルアルミ
ニウムの触媒を用いてアセチレンガスを重合する方法が
知られている。しかしながらこの方法により得られるポ
リアセチレンには以下のような問題点がある。すなわち
、(イ)触媒が完全に除去されることなくして残存する
、(ロ)不対電子密度が1011〜10”/Jと高く、
空気中で不安定で酸化劣化する、(ハ)ドーピングした
ものであっても不安定であり、徐々に電気伝導度が低下
する、(ニ)特段の触媒除去工程が必要なため生産コス
トを高くしてしまう等である。As a conventional method for producing polyacetylene, a method is known in which acetylene gas is polymerized using a tetrabutoxytitanium-triethylaluminum catalyst according to the Ziegler-Natsuta method. However, the polyacetylene obtained by this method has the following problems. That is, (a) the catalyst remains without being completely removed; (b) the unpaired electron density is as high as 1011 to 10"/J;
It is unstable in air and deteriorates by oxidation; (c) it is unstable even when doped, and its electrical conductivity gradually decreases; (d) it requires a special catalyst removal process, which increases production costs. etc.
そして、特に前記(ロ)及び(ハ)の点が故に、該ポリ
アセチレンを半導体薄膜や二次電池の正極活物質に用い
ても安定した特性を長期間得ることは極めて困難である
という問題点がある。In particular, because of the points (b) and (c) above, there is a problem that it is extremely difficult to obtain stable characteristics for a long period of time even when the polyacetylene is used as a semiconductor thin film or a positive electrode active material of a secondary battery. be.
一方、上述した触媒による重合法と異なった製造工程の
簡単なプラズマ重合法によって導電性高分子化合物を製
造する試みもなされている。即ち、アセチレン、エチレ
ン、テトラフルオロエチレン、ベンゼン、トルエン、キ
シレン等の有機化合物の高周波やマイクロ波の放電によ
るプラズマ重合が試みられているが、該方法は、多種の
反応を伴い、架橋反応が起きるため、パイ電子共役二重
結合鎖の十分に長い所望の電気特性を有する高分子化合
物は得られていないのが実状である。即ち、例えば、ア
セチレンを七ツマ−とし、プラズマ重合を行なわせて得
られる高分子化合物は絶縁体となってしまう、これは、
アセチレンをプラズマ状態とした場合にモノマーとして
のアセチレンが重合することなく分解し、炭化してしま
うため、また、均一な分解が起きないため、得られる高
分子化合物が枝分れや高密度の橋かけ構造を有するため
である。On the other hand, attempts have also been made to produce conductive polymer compounds by a simple plasma polymerization method, which is a different production process from the above-mentioned catalyst-based polymerization method. Specifically, plasma polymerization of organic compounds such as acetylene, ethylene, tetrafluoroethylene, benzene, toluene, and xylene by high frequency or microwave discharge has been attempted, but this method involves various reactions and crosslinking reactions occur. Therefore, the actual situation is that a polymer compound having a sufficiently long pi-electron conjugated double bond chain and desired electrical properties has not been obtained. That is, for example, a polymer compound obtained by plasma polymerization using acetylene as a hexamer becomes an insulator.
When acetylene is brought into a plasma state, acetylene as a monomer decomposes and carbonizes without polymerizing, and also because uniform decomposition does not occur, the resulting polymer compound has branches and high-density bridges. This is because it has a hanging structure.
本発明は、上述のごとき従来の導電性高分子化合物の製
造方法における諸問題を解決し、電気伝導度が長時間安
定で、耐酸化劣化に優れた導電性高分子化合物が得られ
、かつ、製造工程も容易な、パイ電子共役系導電性高分
子化合物の製造方法を提供することを目的とするもので
ある。The present invention solves the problems in the conventional methods for producing conductive polymer compounds as described above, and provides a conductive polymer compound with stable electrical conductivity over a long period of time and excellent resistance to oxidative deterioration. It is an object of the present invention to provide a method for manufacturing a pi-electron conjugated conductive polymer compound, which has an easy manufacturing process.
本発明者は、上述のごとき従来の導電性高分子化合物の
製造方法における諸問題を解決し、前述の本発明の目的
を達成すべく鋭意研究を重ねたところ、モノマーを直接
に放電反応させることなく、水素を含むガスの放電によ
り反応性の強い水素原子等のプラズマを発生させ、該プ
ラズマを反応室へ輸送して、該水素原子とハロゲン元素
を含むモノマーとの脱ハロゲン化水素等の反応を生じせ
しめることより、プラズマ重合反応におけるモノマーの
炭化反応および枝分れや橋かけ反応をおさえることがで
き、所望の電気特性を有する、パイ電子共役二重結合鎖
の長い導電性高分子化合物を得ることができることとい
う知見を得た。The inventor of the present invention solved various problems in the conventional manufacturing method of conductive polymer compounds as described above and conducted extensive research in order to achieve the above-mentioned object of the present invention. Instead, a plasma of highly reactive hydrogen atoms is generated by discharging a hydrogen-containing gas, and the plasma is transported to a reaction chamber, where the hydrogen atoms react with a monomer containing a halogen element, such as dehydrohalogenation. By causing this, it is possible to suppress the carbonization reaction, branching and cross-linking reactions of monomers in plasma polymerization reactions, and to create conductive polymer compounds with long pi-electron conjugated double bond chains that have desired electrical properties. I gained knowledge of what I can achieve.
本発明は該知見に基づいて完成せしめたものであり、そ
の骨子とするところは、反応室とは別に設けられたプラ
ズマ生成室に水素ガスを含むガスを導入して放電により
プラズマ状のガスを発生せしめ、該プラズマ状のガスを
堆積膜形成用基体の設置されている反応室内に導入する
とともに、該プラズマ状のガスの導入径路とは異なる径
路より一般式〇*HJXsYn、(但し、Xはハロゲン
元素、Yは窒素、イオウから選ばれる元素を示し、★+
1+ ”+ ”は正の整数で、★≧2゜0≦l≦2
★、1≦篤≦2LO≦nなる関係を満足するものである
。)で表わされる少なくとも炭素−炭素の二重結合もし
くは三重結合を1つ以上有する有機化合物を前記反応室
に導入せしめ、該有機化合物と前記プラズマ状のガスと
を反応せしめることにより前記基体上に高分子化合物膜
を堆積せしめることを特徴とする導電性高分子化合物の
製造方法。The present invention was completed based on this knowledge, and the gist of the invention is to introduce a gas containing hydrogen gas into a plasma generation chamber provided separately from a reaction chamber and generate a plasma-like gas by electric discharge. The plasma-like gas is introduced into the reaction chamber in which the deposited film forming substrate is installed, and the general formula 〇*HJXsYn, (where X is Halogen element, Y represents an element selected from nitrogen and sulfur, ★+
1+ “+” is a positive integer, ★≧2゜0≦l≦2
★, which satisfies the relationship 1≦Atsushi≦2LO≦n. ) is introduced into the reaction chamber, and the organic compound and the plasma-like gas are reacted to form a high-density compound on the substrate. 1. A method for producing a conductive polymer compound, which comprises depositing a molecular compound film.
本発明において用いられる水素ガスを含むガスの具体例
としては、水素ガスあるいは、ヘリウム、ネオン、アル
ゴン、クリプトン、キセノンから選ばれた少なくとも1
種類以上の不活性ガスによって希釈された水素ガスが挙
げられる。Specific examples of the gas containing hydrogen gas used in the present invention include hydrogen gas or at least one gas selected from helium, neon, argon, krypton, and xenon.
Examples include hydrogen gas diluted with more than one type of inert gas.
また、本発明における炭素−炭素の二重結合あるいは、
三重結合を含む有機化合物としては具体的には例えば、
HC−CF、FC−CF。Further, a carbon-carbon double bond in the present invention or
Specifically, examples of organic compounds containing triple bonds include:
HC-CF, FC-CF.
HC−CCj、CjC−CCj、HC=CBr。HC-CCj, CjC-CCj, HC=CBr.
BrC−CBr、HCmCl、IC−Cl。BrC-CBr, HCmCl, IC-Cl.
BrC−CCl、C1(、−C1,BrC−Cl。BrC-CCl, C1 (, -C1, BrC-Cl.
CHx ” CHF 、 CH* −CF諺、FCH−
CHF。CHx ” CHF, CH* -CF proverb, FCH-
CHF.
F CH” CF * 、 CF t −CF z 、
CH寞” CHC1。FCH” CF*, CFt-CFz,
CH寞” CHC1.
CHオーCCJ、、CjCH鴫CHCj、(IcH=
CCj z、 CCt! t −CCj * 、CHt
−CHB r 。CH oh CCJ,,CjCH鴫CHCj,(IcH=
CCj z, CCt! t −CCj *, CHt
-CHBr.
などが挙げられる。これらの化合物のうち、室温でガス
状態でない、すなわち液体状態又は固体状態を呈する化
合物は、Ar、He等の不活性ガスをキャリアーガスと
してバブリングするか、もしくは沸点以上の温度に加熱
して気化させて用いる。Examples include. Among these compounds, compounds that are not in a gas state at room temperature, that is, in a liquid or solid state, can be vaporized by bubbling an inert gas such as Ar or He as a carrier gas, or by heating to a temperature above the boiling point. used.
該有機化合物の導入方法としては、ガス状態の又は気化
させた有機化合物を単独で、あるいはヘリウム、ネオン
、アルゴン、クリプトン、キセノンから選択されるガス
をキャリアーガスとして混合して導入することができる
。As a method for introducing the organic compound, a gaseous or vaporized organic compound can be introduced alone, or a mixture of a gas selected from helium, neon, argon, krypton, and xenon as a carrier gas can be introduced.
プラズマ発生の好適な方法としては、直流グロー放電、
高周波放電、マイクロ波放電などが挙げられるが、プラ
ズマ中の電子密度の高いマイクロ波放電を用いるのが望
ましい。Preferred methods of plasma generation include direct current glow discharge,
Examples include high frequency discharge and microwave discharge, but it is preferable to use microwave discharge, which has a high electron density in plasma.
本発明に於いて、形成される高分子化合物に高い電気伝
導度を生ぜしめるには、ポリアセチレンと同様な方法で
不純物をドーピングすれば良い0本発明によって得られ
る高分子化合物に11+AS Fs 、50s * H
NOs等のハロゲン、ルイス酸、プロトン酸のガスや蒸
気を減圧下で接触して不純物をドーピングする方法、ア
ルカリ金属のナフタレン錯体のテトラヒドロフラン溶液
に浸漬して不純物をドーピングする方法、LiCjOa
やLiBF4の電解液中で電圧を印加して不純物をドー
ピングする方法が挙げられる。また、高分子化合物の重
合時に不純物をドーピングして電気伝導度を高めること
もできる。In the present invention, in order to produce high electrical conductivity in the polymer compound formed, it is sufficient to dope impurities in the same manner as polyacetylene. H
A method of doping impurities by contacting gas or vapor of halogen such as NOs, Lewis acid, protonic acid under reduced pressure, a method of doping impurities by immersing an alkali metal naphthalene complex in a tetrahydrofuran solution, LiCjOa
For example, a method of doping impurities by applying a voltage in an electrolytic solution of LiBF4 or LiBF4 can be mentioned. Furthermore, the electrical conductivity can be increased by doping impurities during polymerization of the polymer compound.
具体的には、活性化室(A)に導入する水素ガスを含む
ガスに、不純物元素を成分として含む化合物を添加して
もよく、反応室に導入する有機化合物に該不純物元素を
成分として含む化合物を添加してもよ(、あるいは水素
ガスを含むガスと有機化合物の両方に該不純物元素を成
分として含む化合物を添加してもよい。Specifically, a compound containing an impurity element as a component may be added to the gas containing hydrogen gas introduced into the activation chamber (A), and a compound containing the impurity element as a component may be added to the organic compound introduced into the reaction chamber. A compound may be added (or a compound containing the impurity element as a component may be added to both the gas containing hydrogen gas and the organic compound).
不純物元素を成分として含む化合物としては、常温、常
圧でガス状態であるか、あるいは少なくとも堆積膜形成
条件下で気体であり、適宜の気化装置で容易に気化し得
る化合物を選択して用いるのが好ましい、具体的にはこ
のような化合物として、PHs、PF%、PF3 、P
Cjs 、pczs 。As a compound containing an impurity element as a component, a compound that is in a gaseous state at room temperature and normal pressure, or at least a gaseous state under the conditions for forming a deposited film, and that can be easily vaporized using an appropriate vaporizing device should be selected and used. is preferable. Specifically, as such compounds, PHs, PF%, PF3, P
Cjs, pczs.
BzHh 、B Fs 、B Clx * BB rs
* A a Fs 。BzHh, B Fs, B Clx * B B rs
*AaFs.
ksC12、AsHs + It r 5bHs
+ 5bFs等が挙げられる。ksC12, AsHs + It r 5bHs
+5bFs and the like.
プラズマ発生のための、放電ガス圧力としては好ましく
は0.001Torr 〜10Torr 、より好まし
くはo、 o o s〜0.5 Torrとされるのが
望ましい。The discharge gas pressure for plasma generation is preferably 0.001 Torr to 10 Torr, more preferably 0.001 Torr to 0.5 Torr.
プラズマ生成室に導入される水素ガスの流量の有機化合
物の流量に対する(流量)比は反応が十分に行なわれる
ために、好ましくは2〜3001より好ましくは10〜
100とされるのが望ましい。The (flow rate) ratio of the flow rate of hydrogen gas introduced into the plasma generation chamber to the flow rate of the organic compound is preferably 2-3001, more preferably 10-3001, in order to ensure sufficient reaction.
It is desirable that it be set to 100.
基板温度としては、基板表面での架橋反応が基板温度に
より促進されないように、好ましくは400℃以下、よ
り好ましくは200℃以下に設定されることが望ましい
。The substrate temperature is desirably set to preferably 400° C. or lower, more preferably 200° C. or lower so that the crosslinking reaction on the substrate surface is not accelerated by the substrate temperature.
水素ガスを含むガスの放電から得られるプラズマ状ガス
と、ハロゲン化物との反応性をさらに向上させるために
、基板表面に光エネルギーを付与することも望ましい。It is also desirable to apply optical energy to the substrate surface in order to further improve the reactivity between the halide and the plasma gas obtained from the discharge of gas containing hydrogen gas.
次に、本発明について図面を用いて詳しく説明するが、
本発明はこれにより何等限定されるものではない。Next, the present invention will be explained in detail using drawings.
The present invention is not limited to this in any way.
第1図は、本発明の方法を実施するのに適した導電性高
分子化合物の製造装置の典型的−例を模式的に示す概略
構成図である。FIG. 1 is a schematic diagram schematically showing a typical example of an apparatus for producing a conductive polymer compound suitable for carrying out the method of the present invention.
第1図において、100はプラズマ生成室、101は反
応室、102はマイクロ波導波管、103はマイクロ波
導入窓、104はプラズマ安定用磁気コイル、105は
水素を含むガスの導入管、106は有機化合物の導入管
、107は基板、108は基板ホルダー、109は排気
管、110はプラズマ引き出し口、111は基板加熱用
ヒーター、112は光エネルギー入射用の窓である。In FIG. 1, 100 is a plasma generation chamber, 101 is a reaction chamber, 102 is a microwave waveguide, 103 is a microwave introduction window, 104 is a magnetic coil for plasma stabilization, 105 is an introduction pipe for gas containing hydrogen, and 106 is a microwave introduction window. 107 is a substrate, 108 is a substrate holder, 109 is an exhaust pipe, 110 is a plasma extraction port, 111 is a heater for heating the substrate, and 112 is a window for light energy incidence.
磁気コイル104は、マイクロ波によって発生したプラ
ズマに磁場を印加し、放電を安定化させると同時に電子
と荷電粒子のそれぞれの運動の方向をそろえ、実効的電
子密度を向上させることができる。The magnetic coil 104 applies a magnetic field to the plasma generated by microwaves, thereby stabilizing the discharge and aligning the directions of movement of electrons and charged particles, thereby improving the effective electron density.
第1図の装置を用いた導電性高分子化合物の製造は、以
下のようにして行なわれる。The production of a conductive polymer compound using the apparatus shown in FIG. 1 is carried out as follows.
すなわち、まず、ガス導入管103から連索ガスをプラ
ズマ生成室10Gに導入し、反応室101の圧力を所定
圧力に維持する0次にマイクロ波を導波管102により
マイクロ波導入窓より導入し、プラズマを発生させる。That is, first, a continuous gas is introduced into the plasma generation chamber 10G from the gas introduction pipe 103, and zero-order microwaves are introduced from the microwave introduction window through the waveguide 102 to maintain the pressure in the reaction chamber 101 at a predetermined pressure. , generate plasma.
マイクロ波導入窓の材料としては一般に石英やアルミナ
が用いられる。磁気コイル104によりプラズマ生成室
100に必要に応じて磁界を印加でき、プラズマを安定
に発生させるとともに、プラズマを反応室101に引き
出すことができる。ついで、ガス導入口106から原料
ガスである有機化合物を反応室101に導入し、所定の
時間反応させ、基板上に堆積膜を形成する。Quartz or alumina is generally used as the material for the microwave introduction window. A magnetic field can be applied to the plasma generation chamber 100 as needed by the magnetic coil 104, and plasma can be stably generated and the plasma can be extracted into the reaction chamber 101. Next, an organic compound as a raw material gas is introduced into the reaction chamber 101 through the gas inlet 106 and reacted for a predetermined time to form a deposited film on the substrate.
以下、上述した製造装置を用い導電性高分子化合物を製
造する方法を具体的に説明する。Hereinafter, a method for producing a conductive polymer compound using the above-mentioned production apparatus will be specifically explained.
大施桝土
まず、洗浄した石英ガラス基板107を第1図に示した
製造装置の基板ホルダー108に装着した後、不図示の
排気装置により反応室101内を1 ×10−’Tor
rまで排気する。ついで、基板加熱用ヒーター111に
より基板107の温度を170℃に制御し、安定したと
ころでプラズマ生成室100内にガス導入管105から
水素ガスを100sec+g、ヘリウムガスを200s
ccgtで導入し、マイクロ波を導波管102、マイク
ロ波導入窓103を介して、実効パワーとして200W
投入して水素を含むガスのプラズマを発生させた。First, after mounting the cleaned quartz glass substrate 107 on the substrate holder 108 of the manufacturing equipment shown in FIG.
Exhaust to r. Next, the temperature of the substrate 107 is controlled to 170° C. by the substrate heating heater 111, and when it becomes stable, hydrogen gas is introduced into the plasma generation chamber 100 from the gas introduction pipe 105 for 100 seconds + g, and helium gas is introduced for 200 seconds.
ccgt, and the microwave is introduced through the waveguide 102 and the microwave introduction window 103, with an effective power of 200W.
It generated a plasma of gas containing hydrogen.
次に、ガス導入管106から、ジフルオロエチレン(F
CH−CHF)を1Qscc−で反応室に導入し、不図
示の排気装置の排気能力を制御して内圧を0.05 T
orrとし水素を含むガスのプラズマ状のガスと10分
間反応させたところ、膜厚2.1μmの高分子化合物が
、石英ガラス基板上に堆積した。Next, difluoroethylene (F
CH-CHF) was introduced into the reaction chamber at 1 Qscc-, and the internal pressure was adjusted to 0.05 T by controlling the exhaust capacity of an exhaust device (not shown).
When the sample was reacted with a plasma-like gas containing hydrogen for 10 minutes, a polymer compound having a thickness of 2.1 μm was deposited on the quartz glass substrate.
なお、堆積時に高圧水銀ランプを用い入射窓112より
基板に紫外光を照射した場合には堆積速度は2倍になっ
た0石英ガラス基板上に堆積した高分子化合物の可視吸
収スペクトルを測定したところ、第2図(alに示すよ
うな520nm付近に吸収ピークが認められた0次いで
、ESR(電子スピン共鳴)法により不対電子密度を測
定したところ10”1/−程度であった。また、四端子
法によって電気伝導度を測定したところ1O−11s’
cn−’であった。この高分子化合物の試料真空チャン
バーに入れ五フッ化ヒ素AsF5を500mTorrの
圧力で接触させると電気伝導度は20s’cm−’まで
上昇した。In addition, when the substrate was irradiated with ultraviolet light from the entrance window 112 using a high-pressure mercury lamp during deposition, the deposition rate was doubled.0 When the visible absorption spectrum of the polymer compound deposited on the quartz glass substrate was measured. , An absorption peak was observed near 520 nm as shown in Figure 2 (al).Next, the unpaired electron density was measured by the ESR (electron spin resonance) method, and it was about 10''1/-. When the electrical conductivity was measured by the four-terminal method, it was 1O-11s'
It was cn-'. When a sample of this polymer compound was placed in a vacuum chamber and brought into contact with arsenic pentafluoride AsF5 at a pressure of 500 mTorr, the electrical conductivity increased to 20 s'cm-'.
また、上記方法において、石英ガラス基板をアルミニウ
ム基板上に変えた以外は同様の方法で堆積した高分子化
合物を用いて、空気中25℃で30日間放置試験を行い
、ATR法による高分子化合物の赤外吸収スペクトル測
定による評価を行ったところ、チーグラー・ナツタ触媒
で重合されたポリアセチレンに見られる、酸化劣化を示
す1790cm−’付近のカルボニル(C−0)結合の
吸収の増加は30日放置試験後においても認められなか
った。In addition, using a polymer compound deposited in the same manner as described above except that the quartz glass substrate was replaced with an aluminum substrate, a standing test was conducted at 25°C in air for 30 days. An evaluation using infrared absorption spectroscopy revealed that the increase in absorption of carbonyl (C-0) bonds around 1790 cm-', which indicates oxidative deterioration, is observed in polyacetylene polymerized with Ziegler-Natsuta catalysts after a 30-day storage test. It was not recognized later.
次に、基板にアルミニウム基板のかわりにチタニウム金
属板を用い、上述と同様の方法で高分子化合物を堆積し
たものを正極活物質に、リチウム・アルミニウム合金を
負極活物質に用い、電解液には0.6Mの過塩素酸リチ
ウムのプロピレンカーボネート溶液を用いて第3図に示
す二次電池を作製した。第3図は、本発明によって得ら
れた高分子化合物の堆積膜を正極活物質に用いた二次電
池の概略断面構成図である。第3図において、300は
正極ケース、301は正極集電体、302は本発明によ
って得られた高分子化合物堆積膜より構成される正極活
物質、303はガスケット、304はセパレーター、3
05は負極活物質、306は負極ケースである。Next, a titanium metal plate was used instead of the aluminum substrate, a polymer compound deposited in the same manner as above was used as the positive electrode active material, a lithium-aluminum alloy was used as the negative electrode active material, and the electrolyte was A secondary battery shown in FIG. 3 was prepared using a 0.6 M lithium perchlorate solution in propylene carbonate. FIG. 3 is a schematic cross-sectional configuration diagram of a secondary battery using a deposited film of a polymer compound obtained according to the present invention as a positive electrode active material. In FIG. 3, 300 is a positive electrode case, 301 is a positive electrode current collector, 302 is a positive electrode active material composed of a polymer compound deposited film obtained by the present invention, 303 is a gasket, 304 is a separator, 3
05 is a negative electrode active material, and 306 is a negative electrode case.
このようにして作製した二次電池について、500μA
の定電流で充放電を行ったところ、第4図に示す充放電
特性が得られた。この二次電池の開路電圧は3.5vで
あった。さらに該二次電池を用い充放電サイクル試験を
行ったところ、tVカフトオフでチーグラー・ナツタ触
媒によるアセチレンの重合によって得られたポリアセチ
レンを用いた場合のサイクル寿命270サイクルに対し
、該二次電池のサイクル寿命は1000サイクル以上で
あった。For the secondary battery produced in this way, 500μA
When charging and discharging was performed at a constant current of , the charging and discharging characteristics shown in FIG. 4 were obtained. The open circuit voltage of this secondary battery was 3.5V. Furthermore, when a charge/discharge cycle test was conducted using the secondary battery, it was found that the cycle life of the secondary battery was 270 cycles, compared to 270 cycles when using polyacetylene obtained by polymerizing acetylene using a Ziegler-Natsuta catalyst with tV cuft-off. The lifespan was over 1000 cycles.
大立医l
実施例1において、基板温度を150℃に制御し、水素
ガスのかわりに、水素希釈100pp−のアルシンAs
)(、を10Oscc−でプラズマ室に導入し、ジフル
オロエチレンのかわりにジクロロエチレン(CICH−
CHCI)を10105eで導入して、実施例1と同様
に10分間反応を行なったところ、膜厚1.7μmの高
分子化合物が得られた。In Example 1, the substrate temperature was controlled at 150°C, and instead of hydrogen gas, arsine As diluted with hydrogen at 100 pp- was used.
)(, was introduced into the plasma chamber at 10Oscc-, and dichloroethylene (CICH-
When 10105e (CHCI) was introduced and the reaction was carried out for 10 minutes in the same manner as in Example 1, a polymer compound having a film thickness of 1.7 μm was obtained.
該高分子化合物の電気伝導度を四端子法で測定したとこ
ろ、3s−cs+−’であった・実施例1と同様に、該
高分子化合物を30日間空気中に放置したところ、電気
伝導度はほとんど低下せず、また、C=O結合に帰属さ
れる1790cm −’の赤外吸収スペクトルの増加も
認められなかった。When the electrical conductivity of the polymer compound was measured by the four-probe method, it was 3s-cs+-'.Similar to Example 1, when the polymer compound was left in the air for 30 days, the electrical conductivity was hardly decreased, and no increase in the infrared absorption spectrum at 1790 cm −' attributed to the C═O bond was also observed.
χ隻糎主
実施例1において、基板温度を180℃に制御し、マイ
クロ波の実効パワーを200Wから150Wに変え、ジ
フルオロエチレンのかわりに、ムガスをキャリアーガス
として100sccggで反応室に導入して、内圧Q、
l Torrで実施例1同様に20分間反応を行った
ところ、膜厚2.3μmの高分子化合物が堆積された。In Example 1, the substrate temperature was controlled at 180° C., the effective power of the microwave was changed from 200 W to 150 W, and Mugas was introduced into the reaction chamber at 100 scgg as a carrier gas instead of difluoroethylene. Internal pressure Q,
When the reaction was carried out at 1 Torr for 20 minutes in the same manner as in Example 1, a polymer compound having a thickness of 2.3 μm was deposited.
得られた高分子化合物の可視吸収スペクトルにおいては
、第2図山)に示す様に500nmに吸収ピークが認め
られた。長波長側に吸収ピークがあることは、パイ共役
結合鎖が長いことを示している。また、四端子法による
電気伝導度の測定結果は1O−I@5−cm−1であっ
た。ESR法による不対電子密度の測定結果は10”l
/Jであった。In the visible absorption spectrum of the obtained polymer compound, an absorption peak was observed at 500 nm, as shown in Figure 2 (Figure 2). The presence of an absorption peak on the long wavelength side indicates that the pi-conjugated bond chain is long. Furthermore, the electrical conductivity was measured to be 10-I@5-cm-1 by the four-terminal method. The measurement result of unpaired electron density by ESR method is 10"l
/J.
次に、実施例1と同様にASFsガスによる電気伝導度
の向上を試みたところ、14s−cs−’まで上昇した
。Next, when an attempt was made to improve the electrical conductivity using ASFs gas in the same manner as in Example 1, the electrical conductivity increased to 14s-cs-'.
次に、実施例1と同様の方法でチタニウム金属基板上に
高分子化合物を堆積し、これを負極活物質に、リチウム
−アルミニウム合金を正極活物質に用いた第3図に示す
ような二次電池を作製したところ、開路電圧は3.6v
であった。また、500μAの定電流充放電サイクル試
験においては870サイクルの寿命が得られた。Next, a polymer compound was deposited on a titanium metal substrate in the same manner as in Example 1, and a secondary material as shown in FIG. When the battery was made, the open circuit voltage was 3.6v.
Met. Further, in a constant current charge/discharge cycle test of 500 μA, a life of 870 cycles was obtained.
裏施■土
実施例3において、ジフルオロベンゼンのキャリアーガ
スとして用いたヘリウムのかわりに、アルゴン希釈11
00ppの三フッ化リンPF、を100sccmで反応
室に導入した以外は実施例3と同様にして、重合反応を
行った結果膜厚2.4μmの高分子化合物が堆積した。In Example 3, instead of helium used as a carrier gas for difluorobenzene, argon dilution 11 was used as the carrier gas for difluorobenzene.
A polymerization reaction was carried out in the same manner as in Example 3, except that 100 pp of phosphorus trifluoride PF was introduced into the reaction chamber at 100 sccm, and as a result, a polymer compound having a thickness of 2.4 μm was deposited.
得られた高分子化合物の四端子法で測定した電気伝導度
は1S−es−’であった。実施例1と同様に、該高分
子化合物を空気中で30日間放置後、ATR法により赤
外吸収スペクトルを測定したが、C−O結合に帰属され
る1790as−’の吸収ピークの増加はほとんど認め
られなかった。The electrical conductivity of the obtained polymer compound measured by the four-terminal method was 1S-es-'. As in Example 1, after the polymer compound was left in the air for 30 days, the infrared absorption spectrum was measured by the ATR method. However, there was almost no increase in the absorption peak at 1790as-', which is attributed to the C-O bond. I was not able to admit.
ル較桝土
従来の平行平板容量結合型のグロー放電プラズマ重合装
置を用い、石英ガラス基板を基板ホルダーに装着した後
、I X 10−’Torrまで排気し基板温度を10
0℃に制御して、ジフルオロエチレン(FCH=CHF
)を100seca+で導入し、内圧を0.5Torr
とし、13.56MHzの高周波電力を100W投入し
、10分間プラズマ重合反応させたところ、膜厚1.5
μmの高分子化合物の堆積膜が得られた。得られた高分
子化合物の可視吸収スペクトルを第2図1dlに示す、
吸収ピークは400nm以下の短波長側にあると思われ
、炭素−炭素のパイ共役二重結合鎖が短いことを示して
いる。Using a conventional parallel plate capacitively coupled glow discharge plasma polymerization apparatus, a quartz glass substrate was mounted on a substrate holder, and then the temperature of the substrate was lowered to 10 Torr by exhausting the substrate to 10 Torr.
Difluoroethylene (FCH=CHF
) was introduced at 100seca+, and the internal pressure was 0.5Torr.
When 100 W of 13.56 MHz high frequency power was applied and a plasma polymerization reaction was performed for 10 minutes, the film thickness was 1.5
A deposited film of a polymer compound of μm size was obtained. The visible absorption spectrum of the obtained polymer compound is shown in Figure 2 1dl.
The absorption peak appears to be on the short wavelength side of 400 nm or less, indicating that the carbon-carbon pi-conjugated double bond chain is short.
四端子法で測定した電気伝導度は、10−I3s・cI
I−1であった。また、実施例1と同様にAsF。The electrical conductivity measured by the four-terminal method is 10-I3s・cI
It was I-1. Further, as in Example 1, AsF.
ガスと接触させたところl Q−”s −cs−’まで
しか電気伝導度は上昇しなかった。When brought into contact with gas, the electrical conductivity increased only up to lQ-"s-cs-'.
該高分子化合物を空気中で30日間放置しても、C−0
結合に帰属される1790011−’の赤外吸収スペク
トルの増加は認められなかった。Even if the polymer compound is left in the air for 30 days, C-0
No increase in the infrared absorption spectrum of 1790011-', which was attributed to the bond, was observed.
ル較桝主
比較例1において、ジフルオロエチレンのかわりにアセ
チレン(CH−CH)を100scc鶴で導入した以外
は同様の方法で反応させたところ、膜厚2.3μmの高
分子化合物の堆積膜が得られた。When the reaction was carried out in the same manner as in Comparative Example 1, except that acetylene (CH-CH) was introduced at 100 scc instead of difluoroethylene, a deposited film of a polymer compound with a film thickness of 2.3 μm was obtained. Obtained.
得られた高分子化合物の可視吸収スペクトルは第2図1
dlに示した通りで、比較例1と同様に共役二重結合鎖
が短いことを示している。The visible absorption spectrum of the obtained polymer compound is shown in Figure 2.
dl, indicating that the conjugated double bond chain is short as in Comparative Example 1.
四端子法で測定した電気伝導度は、1O−12S・am
−’であった。また、実施例1と同様にAsF5ガスと
接触させたところl Q−’s −cs−’までしか電
気伝導度は上昇しなかった。The electrical conductivity measured by the four-terminal method is 1O-12S・am
-' was. Further, when it was brought into contact with AsF5 gas in the same manner as in Example 1, the electrical conductivity increased only to lQ-'s-cs-'.
該高分子化合物を空気中で30日間放置した後、赤外吸
収スペクトルを測定した結果C−0結合に帰属される1
790cs−’の吸収スペクトルの増加がわずかに確認
された。After the polymer compound was left in the air for 30 days, the infrared absorption spectrum was measured, and as a result, 1 was assigned to the C-0 bond.
A slight increase in the absorption spectrum at 790 cs-' was confirmed.
此lピ1走
トルエン20m!、テトラブトキシチタンTi(On
CaHq>a 1. Om A! (3mmol
)、トリエチルアルミニウムARE ts 1.6mj
(12mmol)をアルゴン置換したシュレンク型フ
ラスコにこの順で加え、30分間熟成した後、ドライア
イス−メタノール浴(−78℃)で冷却し、十分に脱気
する。ついで、フラスコの内壁に触媒を付着させ、室温
でアセチレンガス(500〜700Torr)を導入し
て、所定時間重合を行い、未反応のアセチレンガスを排
気した後、トルエンで十分に洗浄し、減圧乾燥してポリ
アセチレンフィルムを調製した。得られたポリアセチレ
ンの不対電子密度はESR測定からIQ”cs−’であ
った四端子法で測定した電気伝導度は、l Q−’s
−cs−’であった。This one run 20m with toluene! , tetrabutoxytitanium Ti(On
CaHq>a 1. Om A! (3 mmol
), triethylaluminum ARE ts 1.6mj
(12 mmol) were added in this order to a Schlenk flask purged with argon and aged for 30 minutes, then cooled in a dry ice-methanol bath (-78°C) and thoroughly degassed. Next, a catalyst is attached to the inner wall of the flask, acetylene gas (500 to 700 Torr) is introduced at room temperature, polymerization is carried out for a predetermined period of time, unreacted acetylene gas is exhausted, and the flask is thoroughly washed with toluene and dried under reduced pressure. A polyacetylene film was prepared. The unpaired electron density of the obtained polyacetylene was IQ"cs-' from ESR measurement. The electrical conductivity measured by the four-probe method was lQ-'s
-cs-'.
実施例1同様にAsF、ガスと接触させたところ電伝導
度は3X10’s−am−’まで上昇した。When brought into contact with AsF and gas in the same manner as in Example 1, the electrical conductivity increased to 3×10's-am-'.
調製した直後のポリアセチレンを空気中で30日間放置
した後、赤外吸収スペクトルを測定した結果、1790
cm−’のC=O結合に帰属される吸収スペクトルの増
大が著しかった。ESCAによる測定から30日間空気
中に放置後では、炭素原子に対する酸素原子の比率はO
/C−0,5であった。As a result of measuring the infrared absorption spectrum after leaving the polyacetylene in the air for 30 days, it was found that the polyacetylene was 1790
There was a significant increase in the absorption spectrum attributed to the C=O bond in cm-'. After being left in the air for 30 days after measurement by ESCA, the ratio of oxygen atoms to carbon atoms is O
/C-0.5.
実施例1で作成した二次電池において正極活物質をここ
で得られたポリアセチレンに替えて、電池試験を行った
ところ、開路電圧は3.6v、500μAの定電流充放
電サイクル寿命は270サイクルであった。When a battery test was performed on the secondary battery prepared in Example 1 by replacing the positive electrode active material with the polyacetylene obtained here, the open circuit voltage was 3.6 V, and the constant current charge/discharge cycle life of 500 μA was 270 cycles. there were.
本発明の方法によれば、水素ガスを含むガスの放電によ
り、プラズマ生成室でプラズマ状のガスを発生させ、こ
のプラズマ状のガスと、有機化合物と反応させることに
よって、従来方法の原料ガスの直接放電によるプラズマ
重合と比較して、架橋反応を抑えられ、パイ共役系の炭
素鎖が十分に長く、電気伝導度の高い高分子化合物が容
易に安定して再現性が得られる。According to the method of the present invention, a plasma-like gas is generated in a plasma generation chamber by discharging a gas containing hydrogen gas, and this plasma-like gas is reacted with an organic compound, thereby replacing the raw material gas of the conventional method. Compared to plasma polymerization by direct discharge, crosslinking reactions can be suppressed, the pi-conjugated carbon chain is sufficiently long, and polymer compounds with high electrical conductivity can be easily produced stably and reproducibly.
また、チーグラー・ナツタ触媒を用いて製造されたポリ
アセチレンに比べて耐酸化安定性も格段に向上される。Furthermore, the oxidation stability is significantly improved compared to polyacetylene produced using a Ziegler-Natsuta catalyst.
さらに、触媒反応を用いていないため触媒除去の工程が
不要で工程の簡略化、生産性向上にも優れている。Furthermore, since no catalytic reaction is used, there is no need for a catalyst removal process, which is excellent in simplifying the process and improving productivity.
第1図は本発明の方法の実施に適した製造装置の典型的
−例を模式的に示す、概略装置構成図、第2図は、実施
例1で得られた高分子化合物の吸収スペクトルを示す図
、第3図は実施例1で作成した二次電池の断面構成図、
第4図は、実施例1で作成した二次電池の充放電特性曲
線図である。
100・・・プラズマ生成室、101・・・反応室、1
02・・・マイクロ波導波管、103・・・マイクロ波
導入窓、104・・・プラズマ安定用磁気コイル、10
5・・・水素ガス導入口、106・・・ハロゲン化炭化
水素導入口、107・・・試料基板、108・・・基板
ホルダー、109・・・排気系、110・・・プラズマ
引き出し口、111・・・基板加熱ヒーター、112・
・・励起光入射窓、300・・・正極ケース、301・
・・正極集電体、302・・・正極活物質、303・・
・ガスケット、304・・・セパレーター、305・・
・負極活物質、306・・・負極ケース。Figure 1 is a schematic configuration diagram of a typical manufacturing apparatus suitable for carrying out the method of the present invention, and Figure 2 shows the absorption spectrum of the polymer compound obtained in Example 1. The figure shown in FIG. 3 is a cross-sectional configuration diagram of the secondary battery created in Example 1,
FIG. 4 is a diagram of the charging/discharging characteristic curve of the secondary battery prepared in Example 1. 100... Plasma generation chamber, 101... Reaction chamber, 1
02...Microwave waveguide, 103...Microwave introduction window, 104...Magnetic coil for plasma stabilization, 10
5... Hydrogen gas inlet, 106... Halogenated hydrocarbon inlet, 107... Sample substrate, 108... Substrate holder, 109... Exhaust system, 110... Plasma extraction port, 111・・・Substrate heating heater, 112・
・・Excitation light incidence window, 300 ・Positive electrode case, 301・
...Positive electrode current collector, 302...Positive electrode active material, 303...
・Gasket, 304...Separator, 305...
-Negative electrode active material, 306...Negative electrode case.
Claims (1)
を含むガスを導入して放電によりプラズマ状のガスを発
生せしめ、該プラズマ状のガスを堆積膜形成用基体の設
置されている反応室内に導入するとともに、該プラズマ
状のガスの導入径路とは異なる径路より下記の一般式(
I )で表わされる少なくとも炭素−炭素の二重結合も
しくは三重結合を1つ以上有する有機化合物を前記反応
室に導入せしめ、該有機化合物と前記プラズマ状のガス
とを反応せしめることにより前記基体上に高分子化合物
膜を堆積せしめることを特徴とする導電性高分子化合物
の製造方法。 式CkHlXmYn・・・・・(1) (但し、Xはハロゲン元素、Yは窒素、イオウから選択
される元素を示し、k、l、m、nは正の整数で、k≧
2、0≦l≦2k、1≦m≦2k、0≦nなる関係を満
足するものである。)[Scope of Claims] A gas containing hydrogen gas is introduced into a plasma generation chamber provided separately from a reaction chamber, a plasma-like gas is generated by electric discharge, and the plasma-like gas is deposited and a film-forming substrate is installed. The following general formula (
An organic compound having at least one carbon-carbon double bond or triple bond represented by I) is introduced into the reaction chamber, and the organic compound and the plasma-like gas are reacted to form a compound on the substrate. 1. A method for producing a conductive polymer compound, which comprises depositing a polymer compound film. Formula CkHlXmYn...(1) (However, X is a halogen element, Y is an element selected from nitrogen and sulfur, k, l, m, and n are positive integers, and k≧
2, 0≦l≦2k, 1≦m≦2k, and 0≦n. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62322775A JPH01165603A (en) | 1987-12-22 | 1987-12-22 | Method for manufacturing conductive polymer compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62322775A JPH01165603A (en) | 1987-12-22 | 1987-12-22 | Method for manufacturing conductive polymer compound |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01165603A true JPH01165603A (en) | 1989-06-29 |
Family
ID=18147504
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62322775A Pending JPH01165603A (en) | 1987-12-22 | 1987-12-22 | Method for manufacturing conductive polymer compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01165603A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1003178A1 (en) * | 1998-11-05 | 2000-05-24 | Eastman Kodak Company | Conductive fluorocarbon polymer and method of making same |
| US7238395B2 (en) * | 2000-05-10 | 2007-07-03 | Nkt Research A/S | Method of coating the surface of an inorganic substrates with an organic material and the product obtained |
| CN108923017A (en) * | 2016-07-18 | 2018-11-30 | 山东科朗特微波设备有限公司 | Tunnel type battery material microwave preparation equipment |
-
1987
- 1987-12-22 JP JP62322775A patent/JPH01165603A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1003178A1 (en) * | 1998-11-05 | 2000-05-24 | Eastman Kodak Company | Conductive fluorocarbon polymer and method of making same |
| US6208075B1 (en) | 1998-11-05 | 2001-03-27 | Eastman Kodak Company | Conductive fluorocarbon polymer and method of making same |
| US7238395B2 (en) * | 2000-05-10 | 2007-07-03 | Nkt Research A/S | Method of coating the surface of an inorganic substrates with an organic material and the product obtained |
| CN108923017A (en) * | 2016-07-18 | 2018-11-30 | 山东科朗特微波设备有限公司 | Tunnel type battery material microwave preparation equipment |
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