JPH01166331A - Method for manufacturing magnetic recording media - Google Patents

Method for manufacturing magnetic recording media

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Publication number
JPH01166331A
JPH01166331A JP62324619A JP32461987A JPH01166331A JP H01166331 A JPH01166331 A JP H01166331A JP 62324619 A JP62324619 A JP 62324619A JP 32461987 A JP32461987 A JP 32461987A JP H01166331 A JPH01166331 A JP H01166331A
Authority
JP
Japan
Prior art keywords
magnetic recording
film
electron beam
recording media
manufacturing magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62324619A
Other languages
Japanese (ja)
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62324619A priority Critical patent/JPH01166331A/en
Publication of JPH01166331A publication Critical patent/JPH01166331A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は高密度磁気記録として好適な垂直磁気記録用の
磁気記録媒体の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a magnetic recording medium for perpendicular magnetic recording, which is suitable for high-density magnetic recording.

従来の技術 近年磁気記録の高密度化の進歩には著しいものかあり、
強磁性金属薄膜を磁気記録層とする磁気記録媒体の実用
化に期待がかけられている〔アイイーイーイー トラン
ザクシ璽ンズ オン マグネティクス(IEKICTR
ANSACTIOH8ON MAGNET)O3)vo
d  MA(r−21、No−3,1217〜1220
(1985))。
Conventional technology There has been remarkable progress in increasing the density of magnetic recording in recent years.
There are high hopes for the practical application of magnetic recording media that use ferromagnetic metal thin films as the magnetic recording layer.
ANSACTIOH8ON MAGNET)O3)vo
d MA (r-21, No-3, 1217-1220
(1985)).

中でも短波長になる程減磁損失が有利になる垂直磁気記
録は、膜面に垂直方向に磁化可能な特別な膜を必要とす
るものの、実用化に向は鋭意検討が続けられている。垂
直磁気記録用の磁気記録媒体は、Hl−Fe等の軟磁性
層の上にGo−Or、Co−Cr−Wb 、 Go−N
i−0等で垂直方向に磁化可能ないわゆる垂直磁化膜を
配したものか、Ti 、 Go等の下地層上に垂直磁化
膜を配したものが用いられている。
Perpendicular magnetic recording, in which demagnetization loss becomes more advantageous as the wavelength becomes shorter, requires a special film that can be magnetized perpendicular to the film surface, but efforts are still being made to put it into practical use. A magnetic recording medium for perpendicular magnetic recording has Go-Or, Co-Cr-Wb, Go-N on a soft magnetic layer such as Hl-Fe.
A so-called perpendicular magnetization film that can be magnetized in the perpendicular direction at i-0 or the like is used, or a perpendicular magnetization film is used on an underlying layer of Ti, Go, or the like.

かかる構成を得る方法としては、高周波スパッタリング
法、電子ビーム蒸着法、イオンブレーティング法等が挙
げられるが、周知の如く、高周波スパッタリング法で得
られる特性は良好であるが、製膜速度が遅く、量産技術
としては不適当で、電子ビーム蒸着法は高温に耐える高
分子フィルムを必要とし、実用上克服すべき課題も多く
、種々の提案がなされている〔特開昭62−21923
4号公報、同62−219236号公報〕。
Examples of methods for obtaining such a structure include high frequency sputtering, electron beam evaporation, and ion blating, but as is well known, high frequency sputtering provides good properties, but the film formation rate is slow; The electron beam evaporation method is unsuitable as a mass production technology; it requires a polymer film that can withstand high temperatures, and there are many practical problems to be overcome, and various proposals have been made [Japanese Patent Laid-Open No. 62-21923
No. 4, No. 62-219236].

発明が解決しようとする問題点 しかしながら上記した構成で、前処理による十分なガス
出し処理を行ったり、グロー放電処理したり、パックグ
ラウンドの真空度を改善する等により、均一性の改良を
行っても、スパッタリング法で得られる特性と同等の特
性が得られず、改善が望まれていた。
Problems to be Solved by the Invention However, with the above-mentioned configuration, uniformity has not been improved by performing sufficient degassing treatment through pretreatment, glow discharge treatment, and improving the degree of vacuum in the pack ground. However, properties equivalent to those obtained by the sputtering method could not be obtained, and improvements were desired.

本発明は上記した事情に鑑みなされたもので、垂直磁化
膜の性能向上と均一性の確保を共に達成できる製造方法
を提供するものである。
The present invention has been made in view of the above-mentioned circumstances, and provides a manufacturing method that can both improve the performance and ensure uniformity of a perpendicularly magnetized film.

問題点を解決するための手段 本発明の磁気記録媒体の製造方法は上記した問題点を解
決するため、同一回転支持体に沿った高分子フィルムに
、化学蒸着法で、軟磁性層形成直後、電子ビーム蒸着に
て磁気記録層を形成するようにしたものである。
Means for Solving the Problems In order to solve the above-mentioned problems, the method for producing a magnetic recording medium according to the present invention involves forming a soft magnetic layer on a polymer film along the same rotating support by chemical vapor deposition, immediately after forming the soft magnetic layer. The magnetic recording layer is formed by electron beam evaporation.

作用 本発明の磁気記録媒体の製造方法は上記した構成により
、軟磁性層形成が高速化しても、高分子フィルムから、
新たにガスが出て、特性を劣化させることがないのと、
電子ビーム蒸着で垂直磁化膜形成した時に、清浄な面の
上にたたちに蒸着されることから、特性向上がはかれる
ので、高速で均一、高性能垂直磁気記録媒体が製造でき
ることになる。
Effect The method for manufacturing a magnetic recording medium of the present invention has the above-described configuration, so that even if the soft magnetic layer formation speed is increased,
New gas will not be released and the characteristics will not deteriorate.
When a perpendicular magnetization film is formed by electron beam evaporation, the perpendicular magnetic recording medium is deposited directly on a clean surface, which improves its characteristics, making it possible to manufacture a high-speed, uniform, and high-performance perpendicular magnetic recording medium.

実施例 以下、図面を参照しながら本発明の一実施例について説
明する。図は、本発明の製造方法を実施するのに用いた
蒸着装置の要部構成図で、図で1はポリエチレンテレフ
タレートフィルム、ポリフェニレンサルファイドフィル
ム等の高分子フィルム、2は回転支持体、3は巻出し軸
、4は巻取り軸、6はCo−0r 、 Co −Ti 
、 Go−Mo 、Go−W 、 Go −0r−Nb
等の蒸着材’t’ 6 ハMgO、ZrO2等の蒸発源
容器で7はピアス型の電子銃で8は加速電子ビーム9は
反応管で石英管で構成したもので、10はガス導入孔で
11は外部誘導コイル、12は加速電極で、13は真空
容器14は真空排気系15は防着マスクである。図の装
置で、回転支持体は直径50cmの誘導加熱型の円筒キ
ャンを用い、キャン面下38csKMgO蒸発源を配し
、30に6V、最大60 KWの電子ビームで加熱でき
るよう構成し、反応管は、フィルムの移動方向に5.5
cm、幅方向に20cmの角型の石英管で、石英管の先
端開孔部はキャン表面からammの位置に固定し、開孔
部中心から、キャンの周側沿面距離が1δcmに蒸着中
心がくるような関係で配置した。
Embodiment Hereinafter, an embodiment of the present invention will be described with reference to the drawings. The figure is a configuration diagram of the main parts of the vapor deposition apparatus used to carry out the manufacturing method of the present invention. Take-out shaft, 4 is winding shaft, 6 is Co-0r, Co-Ti
, Go-Mo, Go-W, Go-0r-Nb
6 is an evaporation source container for MgO, ZrO2, etc., 7 is a pierced electron gun, 8 is an accelerated electron beam, 9 is a reaction tube made of a quartz tube, and 10 is a gas introduction hole. 11 is an external induction coil, 12 is an accelerating electrode, 13 is a vacuum container 14, and a vacuum exhaust system 15 is an anti-adhesion mask. In the apparatus shown in the figure, an induction heating type cylindrical can with a diameter of 50 cm is used as the rotating support, a 38 cs KMgO evaporation source is arranged below the can surface, and the reaction tube is configured to be heated with an electron beam of 6 V and a maximum of 60 KW. is 5.5 in the direction of film movement.
cm, and a rectangular quartz tube measuring 20 cm in the width direction.The aperture at the tip of the quartz tube is fixed at a position amm from the can surface, and the deposition center is at a creepage distance of 1 δ cm from the center of the aperture on the circumferential side of the can. It was placed in such a way that it would look like this.

この条件の装置で、厚み15μmのポリエチレンテレフ
タレートフィルム上にパーマロイ薄膜全形成し、その土
にGo−Or垂直磁化膜を形成したものと、よく知られ
る円筒キャンf:、2ヶ配し、それぞれに蒸発源を配し
、パーマロイ薄膜とCo −Or垂直磁化膜を電子ビー
ム蒸着法で形成した比較例とを対比検討した結果につい
て説明する。
In the equipment under these conditions, two permalloy thin films were formed on a polyethylene terephthalate film with a thickness of 15 μm and a Go-Or perpendicularly magnetized film was formed on the soil, and two well-known cylindrical cans were installed. The results of a comparative study in which an evaporation source is provided and a permalloy thin film and a Co-Or perpendicularly magnetized film are formed by electron beam evaporation will be described.

実施例は、キャン温度を5o’CVC保ち、フィルムi
 20 !Q/Din テ移動させながら、N1(Go
)4゜Fa(Co4)i夫々1.2 [/win 、 
0.2 g/win 、 Hem0,45/min導入
しながら、外部コイルに13.66(MHz)1.1(
KW)’jz印加し、プラズマを形成し、加速電圧に3
00Vを印加し、801Ni、パーマロイ薄膜を0.3
6μm形成し、引きつづき、入射角9.6度以内でGo
 −Or (Or : 20.6 wt%)を3oKV
、3sKWで加速し、蒸着し、0.14μmのCo−C
r  垂直磁化膜を形成した。
In the example, the can temperature was maintained at 5 o'CVC, and the film i
20! While moving Q/Dinte, press N1 (Go
)4゜Fa(Co4)i each 1.2[/win,
13.66 (MHz) 1.1 (
KW)'jz is applied to form a plasma, and the acceleration voltage is
00V is applied, 801Ni, permalloy thin film is 0.3
6 μm and continue to Go within an incident angle of 9.6 degrees.
-Or (Or: 20.6 wt%) at 3oKV
, accelerated at 3sKW, deposited 0.14μm Co-C
r A perpendicular magnetization film was formed.

一方比較例は、厚み12μmのポリアミドイミドフィル
ムを用い、ムr圧0,03 Torr 13.5 a(
M)lz ) 0.8 (KW)のグロー放電処理を1
 、3 (see )行った後、電子ビーム加熱条件3
0KV、40KWテNi −Fa (Ni 80.3 
wt%)膜0.35 μmを入射角20度以内で形成し
くキャン温度120’C)、次に、キャン温度180℃
で入射角8度以内でCo−0r (Cr : 2o、e
 wt%) 2aoxv 、 41(KW)で蒸着し、
0.14μmのCo −Or垂直磁化膜を形成した。両
者共、潤滑剤としてパーフロロポリエーテルとして、モ
ンテフルオス社製の“フオンブリンZ−25”を120
人塗布し、8ミリ幅の磁気テープとし、任意の20巻全
抽出し、改造した8ミリビデオによりC/N比較をした
。使用ヘッドはギャップ長0.16μmのリターンパス
を配したメタルインギャップ型のアモルファスヘッドで
、ビット長0.23μm、帯域1o(M庵)のC//N
ヲ実施例のテープの1本を標準とし、そのC/N i 
O(dB )として他のテープの勢1と相対比較した。
On the other hand, in the comparative example, a polyamide-imide film with a thickness of 12 μm was used, and the pressure was 0.03 Torr 13.5 a (
M)lz) 0.8 (KW) glow discharge treatment
, 3 (see), then electron beam heating conditions 3
0KV, 40KW TeNi-Fa (Ni 80.3
wt%) film with a thickness of 0.35 μm was formed at an incident angle of 20 degrees or less (at a can temperature of 120'C), then at a can temperature of 180 degrees Celsius.
Co-0r (Cr: 2o, e
wt%) 2 aoxv, 41 (KW),
A Co-Or perpendicular magnetization film of 0.14 μm was formed. In both cases, "Fuomblin Z-25" manufactured by Montefluos was used as a perfluoropolyether lubricant.
A magnetic tape of 8 mm width was coated by hand, all 20 rolls were extracted, and C/N was compared using a modified 8 mm video. The head used is a metal-in-gap type amorphous head with a return path with a gap length of 0.16 μm, a bit length of 0.23 μm, and a C//N of band 1o (M-an).
One of the tapes in the example is taken as standard, and its C/N i
A relative comparison was made as O (dB) with other tapes.

実施例は平均値がQ、3(dB)で20巻のテープは−
0,1(dB)から0.6(+IB)の範囲に分布して
いた。一方比較例は平均値が−0,9(dB)で、20
巻のテープは−1,9((IB)から−0,5((iB
)の範囲に分布していた。本発明は、従来得られている
高周波スパッタリング法での性能と同等で、かつ高速で
得られているのが特長で、パーマロイ薄膜形成が、グロ
ー放電処理効果をも含んでいることで、特別グロー処理
機構を設けなくても工いし、電子ビーム蒸着法でパーマ
ロイ薄膜を得るよりも、省エネルギーになる等の利点も
ある。
In the example, the average value is Q, 3 (dB), and 20 rolls of tape are -
It was distributed in the range of 0.1 (dB) to 0.6 (+IB). On the other hand, the comparative example has an average value of -0.9 (dB) and 20
The tape of the volume is -1,9((IB) to -0,5((iB
) were distributed in the range. The present invention is characterized by the same performance as the conventional high-frequency sputtering method and can be obtained at high speed, and the permalloy thin film formation also includes a glow discharge treatment effect, making it possible to achieve a special glow. It can be fabricated without the need for a processing mechanism, and has the advantage of being more energy efficient than obtaining permalloy thin films using electron beam evaporation.

同実施例では電子ビーム蒸着法でCo −Cr膜を形成
したが、これに限らず、電界蒸着、イオンブレーティン
グ法と組み合わせてもよいのは勿論である。
In this embodiment, the Co--Cr film was formed by electron beam evaporation, but the method is not limited to this, and it goes without saying that it may be combined with electric field evaporation or ion blating.

又パーマロイ薄膜で他にNi −Fe −Moの形成に
はMo(co)6ガxl用い、Fe −Cr膜はye(
co)4゜”C9”+2)2ガスで実施しいずれも上述
した実施例と同等の性能が得られている。
In addition, in the permalloy thin film, Mo(co)6 was used to form Ni-Fe-Mo, and ye( was used to form the Fe-Cr film).
co) 4°"C9"+2) 2 gases, and the same performance as the above-mentioned example was obtained in both cases.

発明の効果 以上のように本発明によれば、均一な垂直磁気記録用の
磁気記録媒体が高速でかつ低温でも得られるといったす
ぐれた効果がある。
Effects of the Invention As described above, the present invention has the excellent effect that a magnetic recording medium for uniform perpendicular magnetic recording can be obtained at high speed and at low temperatures.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の製造方法を実施するのに用いた蒸着装置の
要部構成断面図である。 1・・・・・・高分子フィルム、2・・・・・・回転支
持体、6・・・・・・蒸着材、9・・・・・・反応管。
The figure is a cross-sectional view of the main part of a vapor deposition apparatus used to carry out the manufacturing method of the present invention. DESCRIPTION OF SYMBOLS 1... Polymer film, 2... Rotating support, 6... Vapor deposition material, 9... Reaction tube.

Claims (1)

【特許請求の範囲】[Claims] 同一回転支持体に沿った高分子フィルムに、化学蒸着法
で、軟磁性層形成直後、電子ビーム蒸着にて磁気記録層
を形成することを特徴とする磁気記録媒体の製造方法。
A method for producing a magnetic recording medium, which comprises forming a magnetic recording layer on a polymer film along the same rotating support by electron beam evaporation immediately after forming a soft magnetic layer by chemical vapor deposition.
JP62324619A 1987-12-22 1987-12-22 Method for manufacturing magnetic recording media Pending JPH01166331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62324619A JPH01166331A (en) 1987-12-22 1987-12-22 Method for manufacturing magnetic recording media

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62324619A JPH01166331A (en) 1987-12-22 1987-12-22 Method for manufacturing magnetic recording media

Publications (1)

Publication Number Publication Date
JPH01166331A true JPH01166331A (en) 1989-06-30

Family

ID=18167841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62324619A Pending JPH01166331A (en) 1987-12-22 1987-12-22 Method for manufacturing magnetic recording media

Country Status (1)

Country Link
JP (1) JPH01166331A (en)

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