JPH0117274B2 - - Google Patents

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Publication number
JPH0117274B2
JPH0117274B2 JP56158191A JP15819181A JPH0117274B2 JP H0117274 B2 JPH0117274 B2 JP H0117274B2 JP 56158191 A JP56158191 A JP 56158191A JP 15819181 A JP15819181 A JP 15819181A JP H0117274 B2 JPH0117274 B2 JP H0117274B2
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JP
Japan
Prior art keywords
film
vdf
poling
heat treatment
mol
Prior art date
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Expired
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JP56158191A
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Japanese (ja)
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JPS5860585A (en
Inventor
Koji Daito
Keiko Koga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Kogyo Co Ltd
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Priority to JP56158191A priority Critical patent/JPS5860585A/en
Publication of JPS5860585A publication Critical patent/JPS5860585A/en
Publication of JPH0117274B2 publication Critical patent/JPH0117274B2/ja
Granted legal-status Critical Current

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/09Forming piezoelectric or electrostrictive materials
    • H10N30/098Forming organic materials

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は高性能の厚み圧電性を有する高分子圧
電体の製造方法に関する。 高分子圧電体として従来平面ジグザグ構造(I
型あるいはβ型と呼ばれる)を持つ膜を高電場下
ポーリングしたポリフツ化ビニリデン(PVDF)
が最もよく研究されている。PVDFの常圧溶融成
型物あるいは溶液からキヤストして得られる成形
物は型またはα型と呼ばれるTGTG′のコンフ
オーメーシヨンを持つ結晶から構成されるが、こ
れは非圧電的であるので、通常、型結晶からな
る成型物を一軸延伸あるいはロル圧延して型に
変換し、これをポーリングして圧電膜を得てい
る。 しかしながら、このような延伸を伴う圧電膜の
製造は多くの制約が伴う。すなわち、例えば、き
わめて薄い膜を得ることは困難である。また他の
素子、例えば半導体素子と組合せる場合には、素
子上に塗布形成することができないので、延伸後
接着が必要である。さらに、PVDFの圧電化は通
常数100KV/cm以上の高電場が必要であり、絶
縁破壊等の問題が生ずるなど、種々の困難が伴つ
た。 本発明者らは、すでに、高分子圧電膜が超音波
の発振・受信が可能であり、音響インピーダンス
の低い超音波トランスジユーサ材料として有効に
利用きることを示した。このような目的の用途に
は厚み圧電性が用いられ、これに関する圧電定数
e33,d33あるいは電気機械結合係数Ktが重要であ
る。PVDFのKtは、最大でも0.2であり、この点
でも、より大きいKtを持つ材料が望まれていた。 最近、フツ化ビニリデン(VDF)と3フツ化
エチレン(TrFE)の共重合体P(VDF―TrFE)、
特にVDFを55mol%含む共重合体が比較的大き
い横圧電効果d31を持つことが知られている〔特
開昭55―127086号公報、特開昭55―127087号公
報、特開昭55―127085号公報あるいは東畑他、
Ferroelectics Vo1.32,P/85―92(1981)〕。d31
とd33,e33,Ktは独立なパラメーターである。
我々は、d31とKtのVDF組成依存性が全く異なる
こと、厚み圧電効果がVDF65mol%以上で大き
く、また結晶相転移点Tm′付近以上の温度での熱
処理によつて大きいKtが得られることを開示し
た(特開昭56―111281号公報)。 しかしながら、P(VDF―TrFE)は次の問題
点を有する。すなわち特開昭56―111281号公報に
もその傾向が示されているように、VDFの組成
が75mol%を超えると到達可能なKtは急激に低下
するという難点があつた。また、経験によれば、
P(VDF―TrEE)の圧電性は、同じ組成比を有
するものであつても、ポーリングした膜のKtの
値にはばらつきが大きく、均一な性能の圧電膜を
安定して製造することに問題があつた。本発明の
目的はこれらの難点を解決することである。 さらに本発明の他の目的は、Ktの大きい非延
伸膜を出来るだけ小さいポーリング電場Epで得
ることである(従来から高分子圧電膜の製造には
出来るだけ高いポーリング電場を加えることが望
ましいことが知られているが、高い電場は絶縁破
壊を生じ易く、出来るだけ小さいEpでポーリン
グできることが望ましい)。 上記目的を達成するための本発明は次の構成か
らなる。すなわち、フツ化ビニリデン65〜95モル
%およびトリフルオロエチレン35〜5モル%を主
体とする共重合体の溶液から溶媒を除去すること
によつて得られた成型物を融点(Tm)以下、ほ
ぼ結晶相転移点(Tm′)以上の温度で熱処理後ポ
ーリングするか、あるいは、前記熱処理と同時に
ポーリングすることを特徴とする高分子圧電体の
製造方法。 本発明はP(VDF―TrFE)の厚み圧電性は
VDFとTrFEの組成比のみならず、ポーリング以
前に受ける製作過程、熱履歴ひいてはP(VDF―
TrFE)固体の微細構造(morphology)に著じ
るしく影響されることの発見に基づいており、そ
の骨子は溶液から塗布法やキヤスト法により成形
したP(VDF―TrFE)を略々結晶相転移点
Tm′以上、融点(Tm)以下の温度で熱処理した
後ポーリングするか、あるいは前記成形物を略々
Tm′以上Tm以下の温度でポーリングすることを
特徴とする高分子圧電体の製造方法である。ここ
でTm′は前記成形物の昇温DSC曲線において吸
熱を与えるピークとしてあらわれ、通常Tmより
数度〜数10度低温側にある。このTm′がどのよう
な相転移に対応するかは十分には明らかでない
が、分子鎖に平行な分子軸の回りの回転に伴う強
誘電−常誘電相転移であると考えられる。 次に本発明を実施例および図面に基づいてより
詳しく説明する。 実施例 1 VDF:TrFE=79:21モル%のP(VDF/
TrFE)をジメチルホルムアミド(DMF)100重
量部に対して、15重量部溶解した溶液をガラス板
上にキヤストして、常温で24時間減圧乾固した。
さらにこれを100℃において3時間DMFを蒸発さ
せた後、140℃で定長下で1時間の熱処理を行な
い厚み75μmの膜を得た。両面にAl電極を蒸着し
た後100℃で300KV/cmの電場下で1時間のポー
リングを行なつた。 厚み圧電性に関する電気音響結合定数およびそ
の他の定数を次の文献記載の方法に準じて測定し
て、次の結果を得た。 文献:H.Ohigashi,J.Appl.Phys.47,979
(1976) Kt=0.252 ε′3=6.3(10MHzにおいて) ν3=2.35m/s ε″3=1.0 CD 33=10.5×109N/m2 tan δ=0.16 QM=20 *(註)ν3:厚み方向の音速、CD 33:厚み方向の
弾性率、QM:力学的Q値、ε′3,ε″3:複素
誘電率のそれぞれ実数、虚数部 一方、準静的方法(110Hz)で測定したこの膜
の横圧電定数d31は8.2×10-12C/Nである。 上に示したKtの値は従来PVDFで得られてい
る最大値Kt=0.2よりも大きく、例えば超音波の
発振受信素子としてきわめて優れたものである。
なおd31は8.18×10-12C/Nであり、PVDFのd31
よりも小さい。すなわちd31とKtは比例しない。
現在の知見から、Ktをd31の値から推察はできな
い。なお、熱処理前の本試料を250KV/cmの電
場下で130℃、1時間のポーリングを行つた場合
Kt=0.215であつた。しかし、120℃,1時間のポ
ーリングではKt=0.02以下であつた。 〔比較実施例〕 実施例1で用いたのと同じ組成のP(VDF―
TrFE)(79/21)をホツトプレス法により260℃
で溶融し、これを40℃の水中に急冷して75μmの
未延伸膜を得た。実施例1と同一条件にて熱処理
を行つた後、100℃において1時間467KV/cmの
電場を印加してポーリングを行つた。得られた圧
電膜の性能は次の通りであつた。 Kt=0.160 ν3=2242m/sec CD 33=9.4×109N/m2 QM=18.5 実施例1に示されているように、溶液からキヤ
ストして製膜したものは、低電場のポーリングに
もかかわらずKtが大きく、かつ音速、弾性率、
力学的Q値(QM)も大きくなつている。これは
本発明に従つて溶液から得た膜は結晶化が進行し
ているとともに、低電場で極性軸の電場方向への
配向がより高度であることを示す。 実施例 2,3 比較実施例 2,3 実施例1と同様に作成したP(VDF/TrFE)
(79/21モル%比)のDMF溶液キヤストフイルム
(厚さ約75μm)を140℃(実施例2)、130℃(実
施例3)、120℃(比較例2)および110℃(比較
例3)において1時間、自由端状態で熱処理を行
なつた後、100℃で1時間のポーリングを行つた。
得られた圧電膜の性質を第1表に示す。ここで
Epはポーリング電圧、ν3,CD 33はそれぞれ圧電自
由共振法で測定した厚み方向の音速および弾性率
(周波数は約15MHz)であり、|E|、d31は110M
Hzで求めた膜に平行な方向のヤング率および横圧
電定数である。
The present invention relates to a method for manufacturing a polymer piezoelectric material having high performance thickness piezoelectricity. Conventional planar zigzag structure (I
polyvinylidene fluoride (PVDF), which has a film with a type (called a type or β type) that is poled under a high electric field.
is the most well-studied. PVDF molded products obtained by melting at normal pressure or casting from a solution are composed of crystals with a TGTG′ conformation called the mold or α type, but since this is non-piezoelectric, it is usually A piezoelectric film is obtained by converting a molded product consisting of a mold crystal into a mold by uniaxial stretching or roll rolling, and then poling the molded product. However, manufacturing a piezoelectric film that involves such stretching is accompanied by many restrictions. That is, for example, it is difficult to obtain extremely thin films. Furthermore, when combining it with other elements, such as semiconductor elements, it is necessary to bond it after stretching because it cannot be coated on the element. Furthermore, converting PVDF to piezoelectricity usually requires a high electric field of several 100 KV/cm or more, which poses various difficulties, including problems such as dielectric breakdown. The present inventors have already shown that a polymer piezoelectric film is capable of emitting and receiving ultrasonic waves and can be effectively used as an ultrasonic transducer material with low acoustic impedance. Thickness piezoelectricity is used for this purpose, and the related piezoelectric constant is
e 33 , d 33 or the electromechanical coupling coefficient Kt are important. The maximum Kt of PVDF is 0.2, and in this respect, a material with a larger Kt has been desired. Recently, a copolymer P (VDF-TrFE) of vinylidene fluoride (VDF) and trifluoroethylene (TrFE),
In particular, it is known that a copolymer containing 55 mol% of VDF has a relatively large transverse piezoelectric effect d 31 [JP-A-55-127086, JP-A-55-127087, JP-A-Sho 55- Publication No. 127085 or Higashihata et al.
Ferroelectics Vo1.32, P/85-92 (1981)]. d31
and d 33 , e 33 , and Kt are independent parameters.
We found that the dependence of d 31 and Kt on VDF composition is completely different, that the thickness piezoelectric effect is large when VDF is 65 mol% or more, and that a large Kt can be obtained by heat treatment at a temperature near or above the crystal phase transition point Tm'. (Japanese Unexamined Patent Publication No. 111281/1981). However, P(VDF-TrFE) has the following problems. In other words, as shown in JP-A-56-111281, there was a problem in that when the composition of VDF exceeded 75 mol %, the achievable Kt decreased rapidly. Also, according to experience,
Regarding the piezoelectricity of P(VDF-TrEE), even if they have the same composition ratio, the Kt values of the poled films vary widely, making it difficult to stably manufacture piezoelectric films with uniform performance. It was hot. The aim of the invention is to overcome these difficulties. Furthermore, another object of the present invention is to obtain a non-stretched film with a large Kt using a poling electric field Ep as small as possible (it has traditionally been desirable to apply a poling electric field as high as possible in the production of polymer piezoelectric films). As is known, high electric fields tend to cause dielectric breakdown, so it is desirable to be able to pole with as small an Ep as possible). The present invention for achieving the above object consists of the following configuration. That is, a molded product obtained by removing the solvent from a solution of a copolymer mainly composed of 65 to 95 mol% of vinylidene fluoride and 35 to 5 mol% of trifluoroethylene is heated to a temperature below the melting point (Tm), approximately 1. A method for producing a polymer piezoelectric material, characterized in that poling is performed after heat treatment at a temperature higher than the crystal phase transition point (Tm'), or poling is performed simultaneously with the heat treatment. In the present invention, the thickness and piezoelectricity of P(VDF-TrFE) are
Not only the composition ratio of VDF and TrFE, but also the manufacturing process, thermal history, and P(VDF-
It is based on the discovery that P(VDF-TrFE) is significantly influenced by the microstructure (morphology) of solids. point
After heat treatment at a temperature of Tm′ or higher and lower than the melting point (Tm), poling is performed, or the molded product is roughly
This is a method for producing a polymer piezoelectric material, characterized by poling at a temperature of Tm' or higher and Tm or lower. Here, Tm' appears as an endothermic peak in the temperature-rising DSC curve of the molded product, and is usually several degrees to several tens of degrees lower than Tm. Although it is not fully clear what kind of phase transition this Tm' corresponds to, it is thought to be a ferroelectric-paraelectric phase transition associated with rotation around the molecular axis parallel to the molecular chain. Next, the present invention will be explained in more detail based on examples and drawings. Example 1 VDF:TrFE=79:21 mol% P (VDF/
A solution of 15 parts by weight of TrFE) dissolved in 100 parts by weight of dimethylformamide (DMF) was cast on a glass plate and dried under reduced pressure at room temperature for 24 hours.
Further, after evaporating DMF at 100°C for 3 hours, heat treatment was performed at 140°C for 1 hour under constant length to obtain a film with a thickness of 75 μm. After depositing Al electrodes on both sides, poling was performed at 100° C. under an electric field of 300 KV/cm for 1 hour. The electroacoustic coupling constant and other constants related to thickness piezoelectricity were measured according to the method described in the following literature, and the following results were obtained. Literature: H.Ohigashi, J.Appl.Phys. 47 , 979
(1976) Kt=0.252 ε′ 3 =6.3 (at 10MHz) ν 3 =2.35m/s ε″ 3 =1.0 C D 33 =10.5×10 9 N/m 2 tan δ=0.16 Q M =20 *(Note ) ν 3 : Sound velocity in the thickness direction, C D 33 : Elastic modulus in the thickness direction, Q M : Mechanical Q value, ε′ 3 , ε″ 3 : Real and imaginary parts of the complex permittivity, respectively On the other hand, the quasi-static method The transverse piezoelectric constant d 31 of this membrane measured at (110 Hz) is 8.2×10 −12 C/N. The value of Kt shown above is larger than the maximum value Kt=0.2 obtained with conventional PVDF, and is extremely excellent as an oscillation/reception element for ultrasonic waves, for example.
Note that d 31 is 8.18×10 -12 C/N, and d 31 of PVDF
smaller than In other words, d 31 and Kt are not proportional.
Based on current knowledge, it is not possible to infer Kt from the value of d31 . In addition, when this sample before heat treatment was polled at 130℃ for 1 hour under an electric field of 250KV/cm
Kt=0.215. However, when polling was performed at 120°C for 1 hour, Kt was less than 0.02. [Comparative Example] P (VDF-
TrFE) (79/21) at 260℃ by hot pressing method.
This was quenched in water at 40°C to obtain an unstretched film of 75 μm. After heat treatment was performed under the same conditions as in Example 1, poling was performed by applying an electric field of 467 KV/cm at 100° C. for 1 hour. The performance of the obtained piezoelectric film was as follows. Kt=0.160 ν 3 =2242m/sec C D 33 =9.4×10 9 N/m 2 Q M =18.5 As shown in Example 1, the film formed by casting from a solution is Despite the polling, Kt is large, and the speed of sound, modulus of elasticity,
The mechanical Q value (Q M ) is also increasing. This indicates that the film obtained from solution according to the present invention has advanced crystallization and a higher degree of orientation of the polar axis in the direction of the electric field at low electric fields. Example 2, 3 Comparative Example 2, 3 P (VDF/TrFE) prepared in the same manner as Example 1
(79/21 mol % ratio) DMF solution cast film (thickness approximately 75 μm) at 140°C (Example 2), 130°C (Example 3), 120°C (Comparative Example 2) and 110°C (Comparative Example 3). ) for 1 hour in a free end state, and then poling was performed at 100° C. for 1 hour.
Table 1 shows the properties of the piezoelectric film obtained. here
Ep is the poling voltage, ν 3 and C D 33 are the sound velocity and elastic modulus in the thickness direction (frequency is approximately 15 MHz) measured by the piezoelectric free resonance method, respectively, and |E|, d 31 are 110 M
These are the Young's modulus in the direction parallel to the membrane and the transverse piezoelectric constant determined in Hz.

【表】 第1表から明らかなように、いずれの試料もポ
ーリングにより同程度の大きさのd31を与えるが、
Ktは熱処理温度Thに強く依存する。120℃以下
での熱処理ではKtは小さいが、より高温の熱処
理で急激に増大し、Th=140℃では、小さいEp
にもかかわらず、大きいKtが得られることがわ
かる。なお、本試料を溶融後再結晶したものの相
転移点の吸熱曲線のピークは136℃であつた。 実施例 4 VDFとTrFEの比が75:25モル%のP(VDF―
TrFE)をDMF100重量部に対して10重量溶解し
た溶液をガラス板上にキヤストして常温で6時
間、60℃において6時間、80℃において6時間、
減圧下で溶媒を除去し、厚さ約30μmの膜を得た。
両面にAl電極を蒸着後、140℃で1時間の熱処理
を行ない、100℃で275KV/cmの電場下で1時間
のポーリングを行なつた。室温における結合係数
はKt=0.196であつた。またν3=2433m/sであ
り、d31=d32=7.5×10-12C/Nであつた。 また、この熱処理した膜を室温でEp=
450KV/cm、1時間のポーリングを行つたとこ
ろKt=0.225を得た。 なお本組成P(VDF―TrFE)の溶融再結晶後
のTm′は123℃であつた。 比較実施例 4 実施例1に用いたのと同じP(VDF―TrFE)
(79/21モル%)をホツトプレスを用いて270℃で
アルミ板間に溶融し、これを室温で自然冷却させ
厚さ61μmの膜を得た。これを140℃で熱処理(1
時間)し、100℃で741KV/cmの電場を加えてポ
ーリングした膜のKtはたかだか0.241であつた。
音速ν3は2318m/sであつた。 このように、自然冷却で溶融製膜で得たP
(VDF―TrFE)(79/21)は、高いKtを得るに
はきわめて高いポーリング電場を必要とする。 本製造方法の効果は次の如くである。 (1) 未延伸圧電膜を製造する他の方法には、溶融
製膜法がある。しかし本発明の方法は組成比、
ポーリング温度、ポーリング時間が同じ場合、
より低いポーリング電場で大きいKtが実現で
きる。 (2) 75mol%以上のVDF成分を含むものでも大
きいKtが得られる。 (3) 溶液の塗布、スプレー等によつて膜を必要な
厚み、形状に形成でき得るので薄膜化が可能で
あり、またあらかじめ必要な形状に作成した電
極上やIC基板上に膜を形成し得るので、きわ
めて複雑な形状の圧電素子を作成できる。さら
に延伸膜に比較して膜面内ではほぼ等方向であ
るので膜の割れなどが生じにくく、機械的に安
定である。 (4) Ktの値にばらつきのない膜の製造ができる。
本発明の効果は以上述べた通りであるが、その
中で、(1),(2)項の効果の発現の理由は次の通り
であると考えられる。 すなわち、(i)溶液から製膜することによつて、
非晶部の多い、結晶構造の乱れた、あるいは粒径
の小さい結晶からなる膜が形成される。(ii)これを
ほぼTm′付近以上の温度で熱処理を行うことによ
り、結晶径が増大した、欠陥のより少ない結晶に
成長し、かつ結晶化度が向上する。 このようにして得られた膜は、結晶極性軸の電
場方向への配向(強誘電的分極配向)に必要な電
場(抗電場)が小さくなるとともに、電場による
結晶化度の増大(ドメインの成長)が生じ、大き
い圧電性が得られるものと推定される。これらは
次の事実によつて裏付けされよう。 図は、実施例2の熱処理前の膜のDSC曲線で
ある。127℃の発熱ピークは結晶化によるもので
あり、この試料は非晶部を多く含んでいたことを
示す(この結晶化は相転移の原因となる分子回転
によつて誘起されると考えられる。122℃の吸熱
ピークはこの相転移の低温側に分布する部分の寄
与によると考えられる)。本試料のX線回折図形
は結晶の110および200の回折線が回折角2θ
約20゜にあらわれるが、その半値幅2Δθと回折強
度Iは未熱処理膜A、140℃熱処理膜およびポー
リング膜Cでそれぞれ第2表に示す結果となる。
[Table] As is clear from Table 1, all samples give similar magnitudes of d 31 by poling, but
Kt strongly depends on the heat treatment temperature Th. Kt is small when heat treated at temperatures below 120℃, but increases rapidly with heat treatment at higher temperatures, and when Th = 140℃, Ep is small.
Nevertheless, it can be seen that a large Kt can be obtained. Note that when this sample was melted and then recrystallized, the peak of the endothermic curve at the phase transition point was 136°C. Example 4 P (VDF-
A solution of 10 parts by weight of TrFE) dissolved in 100 parts by weight of DMF was cast on a glass plate and heated at room temperature for 6 hours, at 60°C for 6 hours, and at 80°C for 6 hours.
The solvent was removed under reduced pressure to obtain a membrane with a thickness of approximately 30 μm.
After depositing Al electrodes on both sides, heat treatment was performed at 140°C for 1 hour, and poling was performed at 100°C for 1 hour under an electric field of 275 KV/cm. The binding coefficient at room temperature was Kt=0.196. Further, ν 3 =2433 m/s, and d 31 =d 32 =7.5×10 −12 C/N. In addition, this heat-treated film was prepared at room temperature with Ep=
When polling was performed at 450KV/cm for 1 hour, Kt=0.225 was obtained. The Tm' of this composition P (VDF-TrFE) after melt recrystallization was 123°C. Comparative Example 4 Same P(VDF-TrFE) as used in Example 1
(79/21 mol%) was melted between aluminum plates at 270°C using a hot press, and allowed to cool naturally at room temperature to obtain a film with a thickness of 61 μm. This is heat treated at 140℃ (1
time), and the Kt of the membrane poled by applying an electric field of 741 KV/cm at 100°C was at most 0.241.
The speed of sound ν 3 was 2318 m/s. In this way, P obtained by melt film formation with natural cooling
(VDF-TrFE) (79/21) requires extremely high poling electric fields to obtain high Kt. The effects of this manufacturing method are as follows. (1) Another method for producing an unstretched piezoelectric film is a melt film forming method. However, in the method of the present invention, the composition ratio,
If the polling temperature and polling time are the same,
Larger Kt can be achieved with lower poling electric field. (2) A large Kt can be obtained even with a VDF component of 75 mol% or more. (3) The film can be formed into the required thickness and shape by applying a solution, spraying, etc., so it is possible to make the film thinner, and it is also possible to form the film on an electrode or IC substrate that has been created in the required shape in advance. Therefore, it is possible to create piezoelectric elements with extremely complex shapes. Furthermore, compared to a stretched film, the film is oriented in substantially the same direction within the film plane, so the film is less prone to cracking and is mechanically stable. (4) Films with consistent Kt values can be manufactured.
The effects of the present invention are as described above, and the reasons for the effects of sections (1) and (2) are considered to be as follows. That is, (i) by forming a film from a solution,
A film is formed that has many amorphous parts, has a disordered crystal structure, or is made of crystals with small grain size. (ii) By heat-treating this at a temperature of approximately Tm' or higher, crystals with increased crystal diameter and fewer defects are grown, and the degree of crystallinity is improved. The film obtained in this way has a smaller electric field (coercive electric field) required to orient the crystal polar axis in the direction of the electric field (ferroelectric polarization orientation), and an increase in crystallinity due to the electric field (domain growth). ) is generated, and it is estimated that large piezoelectricity can be obtained. These can be supported by the following facts. The figure is a DSC curve of the film of Example 2 before heat treatment. The exothermic peak at 127°C was due to crystallization, indicating that this sample contained a large amount of amorphous parts (this crystallization is thought to be induced by molecular rotation, which causes phase transition). The endothermic peak at 122°C is thought to be due to the contribution of the part distributed on the low temperature side of this phase transition). The X-ray diffraction pattern of this sample shows that the 110 and 200 diffraction lines of the crystal are at a diffraction angle of 2θ.
The half width 2Δθ and the diffraction intensity I are shown in Table 2 for the unheated film A, the 140° C. heat-treated film, and the poled film C, respectively.

【表】 第2表から、熱処理による結晶化度、結晶粒径
の増大あるいは結晶の乱れの減少が生じ、さらに
ポーリングによりおそらく強誘電相ドメインの成
長を通して、これがさらに進行するものと考えら
れる。実施例で示す如く、大きいKtを持つもの
は音速、弾性率の大きいこともこれらを支持して
いる。 本発明は、VDFを65mol%以上95mol%以下を
含むP(VDF―TrFE)に有効であるが、70mol
%以上82mol%以下のもので特に有効である。 本発明に用いられる溶媒はDMF、ジメチルス
ルホオキシド、アセトン、メチル・エチルケトン
等P(VDF―TrFE)を溶解するものであれば、
一般的に用いることができる。 なお本発明では圧電性について記述したが、本
発明で得られる膜は焦電効果をも持つている。
我々の経験によれば、同一材料であればKtの大
なるものは焦電効果も大きい。したがつて本発明
で得られた膜は焦電性を利用する分野にも用いる
ことができることは当然である。 なお本発明で得た好ましい未延伸膜は、前記し
たとおり、すでにB型の結晶配向をとつているが
薄膜化および加工性がさほど要求されない場合に
は、この未延伸膜を延伸し、その後熱処理、ポー
リングしてももちろんかまわない。この場合、延
伸によりさらに分子配向が進み、その後の熱処理
によつて極めてよく選択配向した結晶性のよい膜
が得られるので、より低いポーリング電圧で、し
かも、Ktの大きな圧電体が得られる。
[Table] From Table 2, it is considered that the heat treatment causes an increase in crystallinity, grain size, or decrease in crystal disorder, and that this further progresses due to poling, possibly through the growth of ferroelectric phase domains. As shown in the examples, the fact that those with a large Kt have a large sound velocity and elastic modulus also supports this. The present invention is effective for P(VDF-TrFE) containing 65 mol% or more and 95 mol% or less of VDF, but 70 mol%
% or more and 82 mol% or less is particularly effective. Solvents used in the present invention include DMF, dimethyl sulfoxide, acetone, methyl ethyl ketone, etc. as long as they can dissolve P(VDF-TrFE).
Can be used generally. Although piezoelectricity has been described in the present invention, the film obtained by the present invention also has a pyroelectric effect.
According to our experience, if the materials are the same, the higher the Kt, the greater the pyroelectric effect. Therefore, it is natural that the film obtained by the present invention can also be used in fields that utilize pyroelectricity. As mentioned above, the preferred unstretched film obtained in the present invention already has a B-type crystal orientation, but if thinning and processability are not so required, the unstretched film is stretched and then subjected to heat treatment. , of course, you can poll. In this case, the stretching further advances the molecular orientation, and the subsequent heat treatment yields a highly selectively oriented film with good crystallinity, making it possible to obtain a piezoelectric material with a lower poling voltage and a larger K t .

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明に係る実施例2の方法によつて得た
熱処理前の膜のDSC曲線である。
The figure shows a DSC curve of a film before heat treatment obtained by the method of Example 2 according to the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1 フツ化ビニリデン65〜95モル%およびトリフ
ルオロエチレン35〜5モル%を主体とする共重合
体の溶液から溶媒を除去することによつて得られ
た成型物を融点(Tm)以下、ほぼ結晶相転移点
(Tm′)以上の温度で熱処理後ポーリングするか、
あるいは、前記熱処理と同時にポーリングするこ
とを特徴とする高分子圧電体の製造方法。
1. A molded product obtained by removing the solvent from a solution of a copolymer mainly composed of 65 to 95 mol% of vinylidene fluoride and 35 to 5 mol% of trifluoroethylene is heated to a temperature below the melting point (Tm) and almost crystalline. Either polling is performed after heat treatment at a temperature above the phase transition point (Tm′), or
Alternatively, a method for manufacturing a polymer piezoelectric material, characterized in that poling is performed simultaneously with the heat treatment.
JP56158191A 1981-10-06 1981-10-06 Production of high molecular piezo-electric conductor Granted JPS5860585A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56158191A JPS5860585A (en) 1981-10-06 1981-10-06 Production of high molecular piezo-electric conductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56158191A JPS5860585A (en) 1981-10-06 1981-10-06 Production of high molecular piezo-electric conductor

Publications (2)

Publication Number Publication Date
JPS5860585A JPS5860585A (en) 1983-04-11
JPH0117274B2 true JPH0117274B2 (en) 1989-03-29

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Country Link
JP (1) JPS5860585A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04311711A (en) * 1991-04-11 1992-11-04 Central Glass Co Ltd Ferromagnetic copolymer and production of thin film therefrom
JP5714235B2 (en) * 2010-03-11 2015-05-07 株式会社クレハ Additive-free and non-stretched piezoelectric body and PV sensor containing PVDF
EP2657588B1 (en) * 2012-04-27 2015-01-28 Belenos Clean Power Holding AG Method for obtaining a piezoelectric liner for a high pressure storage vessel

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5029159A (en) * 1973-07-17 1975-03-25
JPS5326995A (en) * 1976-08-25 1978-03-13 Daikin Ind Ltd Highhmolecular piezooelectric material
JPS5841791B2 (en) * 1979-03-26 1983-09-14 パイオニア株式会社 Polymer piezoelectric material

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