JPH0118023B2 - - Google Patents
Info
- Publication number
- JPH0118023B2 JPH0118023B2 JP2264183A JP2264183A JPH0118023B2 JP H0118023 B2 JPH0118023 B2 JP H0118023B2 JP 2264183 A JP2264183 A JP 2264183A JP 2264183 A JP2264183 A JP 2264183A JP H0118023 B2 JPH0118023 B2 JP H0118023B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- zone
- furnace
- bottle
- ejection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 61
- 239000012495 reaction gas Substances 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 19
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 7
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000003513 alkali Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- UYJXRRSPUVSSMN-UHFFFAOYSA-P ammonium sulfide Chemical compound [NH4+].[NH4+].[S-2] UYJXRRSPUVSSMN-UHFFFAOYSA-P 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004122 cyclic group Chemical class 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
この発明は、ガラス壜表面の耐薬品性および耐
水性等の化学的耐久性を向上させるための処理方
法に関し、特には亜硫酸ガス（SO2）または無水
硫酸ガス（SO3）の反応ガスをガラス壜表面と接
触させて行なう耐化学性処理方法に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a treatment method for improving chemical durability such as chemical resistance and water resistance on the surface of a glass bottle. ) or anhydrous sulfuric acid gas (SO 3 ) in contact with the surface of a glass bottle.
（従来の技術）
一般にガラス製品は、その表面のアルカリ成分
が種々の他の化学成分と反応してガラス製品なら
びにその内容物に対して好ましからざる影響を与
えることが知られている。例えば、ガラス壜が液
状医薬品等の容器として用いられるときには、弱
酸性から弱アルカリ性までのPH範囲の水溶液等が
充填されて滅菌のために加熱されたり、あるいは
長期に亘り貯蔵されたりするのであるが、この過
程において、ガラス表面から溶出してくるアルカ
リ成分が原因となつていわゆるフレークスとよば
れるガラスの薄片がガラス壜表面から剥離してく
ることがある。またこれらの液状医薬品としてガ
ラス壜を用いる場合には、ガラス中のアルカリ成
分が内容液中に溶出し反応して該内容物を変質さ
せるおそれがあることから、日本薬局方等でアル
カリ溶出量についての厳しい規定が置かれてい
る。(Prior Art) It is generally known that alkaline components on the surface of glass products react with various other chemical components and have undesirable effects on the glass products and their contents. For example, when glass bottles are used as containers for liquid pharmaceuticals, they are filled with aqueous solutions with a pH range from weakly acidic to weakly alkaline, heated for sterilization, or stored for long periods of time. During this process, thin glass pieces called flakes may come off from the glass bottle surface due to alkaline components eluted from the glass surface. In addition, when glass bottles are used for these liquid medicines, there is a risk that the alkaline components in the glass may elute into the liquid content and react with it, altering the quality of the contents. There are strict regulations in place.
現在このガラス表面のアルカリ溶出量を抑制し
その化学的耐久性を向上させるための手段とし
て、硫化アンモニウムや亜硫酸ガスを用いて行な
う、いわゆる脱アルカリ反応による処理が効果的
であり、一般的に多用されている。 Currently, as a means to suppress the amount of alkali leached from the glass surface and improve its chemical durability, treatment by so-called dealkalization reaction, which uses ammonium sulfide or sulfur dioxide gas, is effective and is commonly used. has been done.
（発明が解決しようとする課題）
この発明は、亜硫酸ガスまたは無水硫酸ガスの
反応ガスを用いて、この脱アルカリ処理を有効か
つ効率的、あわせて経済的に行なうことができる
新規な方法を提案しようとするものであつて、特
にガスの壜体内への確実な投入およびガスの循環
使用による効率性ならびに経済性の向上は、この
発明の主たる目的とするところである。(Problems to be Solved by the Invention) This invention proposes a new method that can perform this dealkalization treatment effectively, efficiently, and economically using a reaction gas of sulfur dioxide gas or sulfuric anhydride gas. In particular, the main purpose of the present invention is to improve efficiency and economy through reliable injection of gas into the bottle and circulation of gas.
（課題を解決するための手段）
上記の目的を実現するために、この発明は、処
理炉内の壜体移送コンベアの上方幅方向に亘つて
反応ガスの噴出部を設けるとともに、該噴出部と
処理炉内に設けた炉内ガスの循環吸入部ならびに
新規反応ガスの供給部とを連結して、前記循環吸
入部から吸入される炉内ガスを新規な反応ガスと
ともに前記噴出部から炉内を移送される壜体内に
循環投入するようにしたことを特徴とするもので
ある。(Means for Solving the Problems) In order to achieve the above object, the present invention provides a reaction gas ejection part across the upper width direction of the bottle transfer conveyor in the processing furnace, and also provides a reaction gas ejection part and a A furnace gas circulation suction section provided in the processing furnace and a new reaction gas supply section are connected, and the furnace gas sucked from the circulation suction section is passed through the furnace from the jetting section together with the new reaction gas. It is characterized in that it is circulated into the bottle being transported.
（実施例） 以下実施例に従つて詳細に説明する。(Example) A detailed explanation will be given below based on examples.
添付の図面第１図はこの発明方法の一例を示す
処理炉内の断面工程図で、第２図Ａ，Ｂは該工程
で使用される噴出部の噴出ノズルの形状を示す平
面図である。 The accompanying drawings, FIG. 1, are cross-sectional process diagrams of the inside of a processing furnace showing an example of the method of the present invention, and FIGS. 2A and 2B are plan views showing the shape of the ejection nozzle of the ejection section used in the process.
図示のように、符号１０でその全体が示される
脱アルカリ処理炉１０は、壜体Ｂの移送コンベア
１８の移送方向に、第１ゾーン１１、第２ゾーン
１２、第３ゾーン１３、第４ゾーン１４、第５ゾ
ーン１５、第６ゾーン１６、第７ゾーン１７と適
宜数の区画に区切られていて、実施例ではこのう
ち、第１ゾーン１１がヒータ１９を備えた加熱ゾ
ーン、第２ゾーン１２がガスを噴出する噴出ゾー
ン、第３ゾーン１３以下が反応処理ゾーンとして
構成されている。 As shown in the figure, the dealkalization treatment furnace 10, which is generally indicated by the reference numeral 10, has a first zone 11, a second zone 12, a third zone 13, and a fourth zone in the transport direction of the transport conveyor 18 for the bottles B. 14, a fifth zone 15, a sixth zone 16, and a seventh zone 17. In the embodiment, among these zones, the first zone 11 is a heating zone equipped with a heater 19, and the second zone 12 The zone is configured as an ejection zone where gas is ejected, and the third zone 13 and below are configured as a reaction treatment zone.
一般に脱アルカリ反応によるガラス壜の耐化学
性処理は、ガラスの徐冷温度450〜650℃で50〜
100分程度行なわれる（もちろん脱アルカリ処理
層の厚みおよびガス濃度によつて大きく変化す
る。）。通常は、脱アルカリの処理のガス濃度、処
理温度、処理時間があらかじめ設定される。実施
例では、処理温度600〜630℃、時間（処理炉10内
移動時間）60分として設定されている。 Generally, chemical resistance treatment of glass bottles by dealkalization reaction is carried out at an annealing temperature of 450 to 650℃.
It is carried out for about 100 minutes (of course, it varies greatly depending on the thickness of the dealkalization treatment layer and the gas concentration). Usually, the gas concentration, treatment temperature, and treatment time for dealkalization treatment are set in advance. In the example, the processing temperature is set at 600 to 630° C., and the time (travel time in the processing furnace 10) is set at 60 minutes.
被処理壜体Ｂは、処理炉１０の入口にて整列さ
れたうえスタツカ（図示せず）等により炉内の壜
体移送コンベア１８上に送り込まれる。処理炉１
０入口に位置する第１ゾーン１１にはヒータ１
９，１９が設けられていて、脱アルカリ処理に最
適な温度に壜体を加熱する。第１（加熱）ゾーン
１１にて加熱された壜体は、次いで第２（ガス噴
出）ゾーン１２に送り込まれる。 The bottles B to be processed are lined up at the entrance of the processing furnace 10 and fed onto a bottle transfer conveyor 18 in the furnace by a stacker (not shown) or the like. Processing furnace 1
Heater 1 is installed in the first zone 11 located at the 0 entrance.
9 and 19 are provided to heat the bottle to the optimum temperature for dealkalization treatment. The bottle heated in the first (heating) zone 11 is then sent to the second (gas ejection) zone 12.
第２（ガス噴出）ゾーン１２では、壜体移送コ
ンベア１８の上方幅方向に亘つて亜硫酸ガスまた
は無水硫酸ガスの反応ガスの噴出部２０が設けら
れている。この噴出部２０は第２図に図示したよ
うな噴出ノズル２１，２２を備え、該スリツト型
ノズル２１または孔型ノズル２２から壜体Ｂ口部
に向けてガスが噴出されるように構成されてい
る。この噴出部２０は、１箇所でもよいが、より
確実な投入を図るため実施例のように第２ゾーン
の前部と後部に２箇所設置してもよい。もちろ
ん、３箇所以上設置することを禁ずるものではな
い。 In the second (gas ejection) zone 12, an ejection part 20 for a reaction gas such as sulfur dioxide gas or sulfuric anhydride gas is provided over the upper width direction of the bottle transfer conveyor 18. This spout section 20 is equipped with spout nozzles 21 and 22 as shown in FIG. 2, and is configured so that gas is spouted from the slit-type nozzle 21 or hole-type nozzle 22 toward the mouth of the bottle B. There is. The spouting section 20 may be installed at one location, but in order to ensure more reliable injection, it may be installed at two locations at the front and rear of the second zone as in the embodiment. Of course, this does not prohibit installation in three or more locations.
この発明においては、特に、前記の噴出部２０
が、処理炉内に設けた炉内ガスの循環吸入部２４
および新規反応ガスの供給部３０と連結されてい
て、該循環吸入部２４から吸入される炉内ガスと
反応ガスの供給部３０から供給される新規ガスが
一体となつて循環噴出（投入）されることに特徴
を有する。実施例では、噴出部２０と吸入部２４
とはフアン２３を介して連結され、該フアン２３
の作動によつて炉内ガスの吸入と反応ガスの噴出
がなされる。新規反応ガスは、その供給部３０の
導管３１が前記の炉内ガスの循環吸入部２４の導
管部に連結されていて、前記のフアン２３の作動
によつて噴出部２０へ送入される。 In this invention, in particular, the above-mentioned jetting portion 20
However, the in-furnace gas circulation suction section 24 provided in the processing furnace
and a new reaction gas supply section 30, so that the in-furnace gas sucked from the circulation suction section 24 and the new gas supplied from the reaction gas supply section 30 are circulated and ejected (injected) together. It is characterized by In the embodiment, the ejection part 20 and the suction part 24
is connected via a fan 23, and the fan 23
By the operation of the reactor, the gas inside the furnace is sucked and the reaction gas is ejected. A conduit 31 of the supply section 30 is connected to the conduit section of the in-furnace gas circulation suction section 24, and the new reaction gas is sent to the ejection section 20 by the operation of the fan 23.
さらに実施例では、図のように第２ゾーン１２
内部にガス採取管２５をセツトして、ガス濃度測
定器２６と制御器２７とを連動して新規反応ガス
の導管３１に設けた電磁弁３２を開閉せしめて、
所定濃度の反応ガスが噴出部２０から噴出される
ように構成されている。なお、実施例における噴
出部２０におけるガス噴出速度は30ｍ／秒であ
る。次に制御例を記す。 Furthermore, in the embodiment, the second zone 12 as shown in the figure
A gas sampling pipe 25 is set inside, and a solenoid valve 32 provided in a new reaction gas conduit 31 is opened and closed by interlocking a gas concentration measuring device 26 and a controller 27.
It is configured such that a reaction gas of a predetermined concentration is ejected from the ejection part 20. In addition, the gas ejection speed at the ejection part 20 in the example is 30 m/sec. Next, a control example will be described.
例 １
500mlバイアルびんを対象としてガス濃度によ
つて新規ガスの補充量を制御する例
まず、第２ゾーン内の亜硫酸ガス濃度を
2500ppm±300ppmに設定する（設定ガス濃度）。
そして、供給部３０からの新規反応ガスとして一
定の流量0.5m3／ｈ（噴出時換算濃度4000ppm）を
設定するとともに、制御用として濃度計の指示に
より作動する電磁弁によつて追加補充されるガス
流量を0.2m3／ｈ（換算濃度1500ppm）とする。Example 1 An example of controlling the replenishment amount of new gas based on the gas concentration for a 500ml vial. First, the sulfur dioxide gas concentration in the second zone is
Set to 2500ppm±300ppm (set gas concentration).
Then, a constant flow rate of 0.5 m 3 /h (equivalent concentration at the time of ejection 4000 ppm) is set as the new reaction gas from the supply section 30, and additional replenishment is performed for control purposes by a solenoid valve operated according to instructions from the concentration meter. The gas flow rate is set to 0.2 m 3 /h (equivalent concentration 1500 ppm).
これにより、噴出部２０からのガス濃度は、循
環吸入部２４からのガス濃度（雰囲気ガス濃度）
2500±300ppmと新規ガスの供給部３０からのガ
ス濃度4000ppmまたは5500ppm（補充時）との合
計である6200〜8300ppmに保たれる。 As a result, the gas concentration from the ejection part 20 is changed from the gas concentration (atmospheric gas concentration) from the circulation suction part 24.
The gas concentration is maintained at 6200 to 8300 ppm, which is the sum of 2500±300 ppm and the gas concentration of 4000 ppm or 5500 ppm (at the time of replenishment) from the new gas supply section 30.
この処理によつて得られた500mlバイアルびん
の表面アルカリ溶出試験値（日本薬局方「注射剤
用容器試験法」アルカリ溶出試験第２法）は次の
通りであつた。（ml／内容液100ml）
最 大 平均値 最 小
0.008 0.007 0.006
（規格0.10ml／内容液100ml以下）
例 ２
100mlバイアルびんを対象として一定流量で新
規ガスの補充をする例
第２ゾーン内の供給部３０から常時一定量0.8
m3／ｈ（噴出時換算濃度6000ppm）の新規反応ガ
スを供給する。この場合における第２ゾーン内の
雰囲気ガス濃度は測定したところ3500±500ppm
であつた。この例では、例１のように電磁弁の開
閉による制御用ガスの補充を行なうことなく、常
に一定流量の新規ガスが供給される。 The surface alkali elution test values of the 500 ml vial obtained by this treatment (Japanese Pharmacopoeia "Injection Container Test Method" Alkali Elution Test Method 2) were as follows. (ml/content 100ml) Maximum Average value Minimum 0.008 0.007 0.006 (standard 0.10ml/content 100ml or less) Example 2 Example of refilling a 100ml vial with new gas at a constant flow rate Supply in the second zone Constant amount 0.8 from part 30
A new reaction gas will be supplied at m 3 /h (equivalent concentration at the time of ejection: 6000 ppm). In this case, the atmospheric gas concentration in the second zone was measured to be 3500±500ppm.
It was hot. In this example, a constant flow rate of new gas is always supplied without replenishing the control gas by opening and closing a solenoid valve as in Example 1.
この処理によつて得られた100mlバイアルびん
の表面アルカリ溶出試験値（同前）は次の通りで
あつた。 The surface alkali elution test values of the 100 ml vial obtained by this treatment (same as above) were as follows.
最 大 平均値 最 小
0.008 0.006 0.005
（規格0.10ml／内容液100ml以下）
上の例のように所定濃度の反応ガスが噴出部２
０から内部に投入された壜体Ｂは移送コンベア１
８によつて第３ゾーン、第４ゾーン…を移動して
いくうちにガラス表面のNa等のアルカリ反応抽
出を行なつていくのである。そして、最終ゾーン
辺りではガラス壜を室温付近まで徐冷して脱アル
カリ反応処理工程が完了する。なお、実施例の第
３ゾーン以下の処理工程において、各ゾーンにお
けるガス濃度を均一化するために、各ゾーンにフ
アン２９を設置して雰囲気ガスを対流状態にする
ことも好ましい。 Maximum Average value Minimum 0.008 0.006 0.005 (Standard 0.10ml/content liquid 100ml or less) As shown in the example above, the reaction gas at a predetermined concentration is emitted from the ejection part 2.
Bottle B introduced into the interior from 0 is transferred to transfer conveyor 1
As the glass moves through the third zone, the fourth zone, etc., Na and other substances on the glass surface are extracted by an alkali reaction. Then, around the final zone, the glass bottle is gradually cooled to around room temperature, and the dealkalization reaction process is completed. In addition, in the processing steps for the third zone and subsequent zones in the embodiment, in order to equalize the gas concentration in each zone, it is also preferable to install a fan 29 in each zone to bring the atmospheric gas into a convection state.
（効果）
以上の構成からなるこの発明によるガラス壜表
面の耐化学性処理方法にあつては、まず反応ガス
が、処理炉内の壜体移送コンベアの上方幅方向に
亘つて設けられた噴出部から壜口部内に向つて噴
出され投入されるとともに、これに引続く反応ガ
スの雰囲気中にて脱アルカリ反応処理がなされる
ものであるから、壜の形状、大きさを問わず確実
に壜内にガスが吹込まれ、効果的に壜内表面の脱
アルカリ反応処理を行うことができる。特に、小
さくて、かつ単位当りの表面積が大きく脱アルカ
リ処理が困難な容量100ml以下の小壜についても
この発明方法は極めて効果的である。(Effects) In the method for chemically resistant treatment of the surface of a glass bottle according to the present invention, which has the above-described structure, first, a reaction gas is ejected from the jetting section provided in the upper width direction of the bottle transfer conveyor in the processing furnace. It is ejected into the mouth of the bottle and is then subjected to a dealkalization reaction in the atmosphere of the reaction gas. A gas is blown into the container to effectively dealkalize the inner surface of the bottle. In particular, the method of the present invention is extremely effective for small bottles with a capacity of 100 ml or less, which are difficult to dealkalize because of their large surface area per unit.
また、本発明においては、反応ガスの噴出部と
処理炉内に設けた炉内ガスの循環吸入部および新
規反応ガスの供給部とを連結して、炉内ガスと新
規ガスとを混合して壜体内に循環投入するように
したものであるから、反応ガスの循環使用による
効率性ならびに経済性が確保されるばかりでな
く、ガス濃度の一体化を極めて容易かつ効果的に
実現することができる。この発明方法によれば、
反応ガスの循環使用により亜硫酸ガスの使用量を
従来の1/3ないし1/5（当社比）に減少することが
できた。また、この循環使用は生産量（被処理数
量）が多ければ多い程より効率的に亜硫酸ガスを
使用することができる。 In addition, in the present invention, the reactant gas ejection part is connected to the in-furnace gas circulation suction part and the new reactant gas supply part provided in the processing furnace, and the in-furnace gas and the new gas are mixed. Since it is designed to be circulated into the bottle, not only is efficiency and economy ensured by circulating the reaction gas, but it is also possible to unify the gas concentration extremely easily and effectively. . According to this invention method,
By recycling the reaction gas, we were able to reduce the amount of sulfur dioxide gas used to 1/3 to 1/5 of the conventional amount (compared to our company). In addition, in this cyclic use, the larger the production amount (the amount to be processed), the more efficiently the sulfur dioxide gas can be used.
さらに加えて、処理炉内に噴出部と循環吸入部
を設けたことにより、ガス噴出ゾーンにおける雰
囲気ガスの対流が実現され、この対流によつて壜
体に対する反応ガスの付着を効果的に促進するこ
とができる等々、この発明は工程および経済性の
両側面において多大な効果を有するものである。 Furthermore, by providing an ejection part and a circulation suction part in the processing furnace, convection of the atmospheric gas in the gas ejection zone is realized, and this convection effectively promotes the adhesion of the reaction gas to the bottle. This invention has great effects in terms of both process and economy.
第１図はこの発明方法の一例を示す処理炉内の
断面工程図、第２図Ａ，Ｂは噴出部における噴出
ノズルの形状を示す平面図である。
１０……処理炉、１１……第１（加熱）ゾーン、
１２……第２（ガス噴出）ゾーン、１３……第３
（反応処理）ゾーン、１８……コンベア、１９…
…ヒーター、２０……噴出部、２１，２２……噴
出ノズル、２３……フアン、２４……循環吸入
部、２５……ガス採取管、２９……フアン、３０
……新規ガス供給部、３２……電磁弁、Ｂ……壜
体。
FIG. 1 is a cross-sectional process diagram of the inside of a processing furnace showing an example of the method of the present invention, and FIGS. 2A and 2B are plan views showing the shape of the ejection nozzle in the ejection part. 10... Processing furnace, 11... First (heating) zone,
12...Second (gas ejection) zone, 13...Third
(Reaction treatment) Zone, 18... Conveyor, 19...
...Heater, 20...Ejection part, 21, 22...Ejection nozzle, 23...Fan, 24...Circulation suction part, 25...Gas sampling pipe, 29...Fan, 30
...New gas supply section, 32... Solenoid valve, B... Bottle.
Claims (1)
ガラス壜体表面に接触させて行なう耐化学性処理
方法において、処理炉内の壜体移送コンベアの上
方幅方向に亘つて反応ガスの噴出部を設けるとと
もに、該噴出部と処理炉内に設けた炉内ガスの循
環吸入部ならびに新規反応ガスの供給部とを連結
して、前記循環吸入部から吸入される炉内ガスを
新規な反応ガスとともに前記噴出部から炉内を移
送される壜体内に投入するようにしたことを特徴
とするガラス壜表面の耐化学性処理方法。1. In a chemical resistance treatment method in which a reactive gas such as sulfur dioxide gas or sulfuric anhydride gas is brought into contact with the surface of a glass bottle, a reactive gas jetting part is provided across the upper width direction of the bottle transfer conveyor in the processing furnace, and , the blowout part is connected to a furnace gas circulation suction part provided in the processing furnace and a new reaction gas supply part, and the furnace gas sucked from the circulation suction part is ejected together with the new reaction gas. A method for chemically resistant treatment of the surface of a glass bottle, characterized in that the glass bottle is introduced into a bottle that is transferred from a container to a furnace.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2264183A JPS59152245A (en) | 1983-02-14 | 1983-02-14 | Chemical-resistant treatment of surface of glass bottle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2264183A JPS59152245A (en) | 1983-02-14 | 1983-02-14 | Chemical-resistant treatment of surface of glass bottle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59152245A JPS59152245A (en) | 1984-08-30 |
| JPH0118023B2 true JPH0118023B2 (en) | 1989-04-03 |
Family
ID=12088467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2264183A Granted JPS59152245A (en) | 1983-02-14 | 1983-02-14 | Chemical-resistant treatment of surface of glass bottle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59152245A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0678181B2 (en) * | 1988-10-27 | 1994-10-05 | セントラル硝子株式会社 | Glass surface treatment method |
| JP2949846B2 (en) * | 1990-11-30 | 1999-09-20 | 吉富製薬株式会社 | How to store albumin preparations |
| WO2002051767A1 (en) * | 2000-12-26 | 2002-07-04 | Nippon Sheet Glass Co.,Ltd. | Plate glass with protective film and method of manufacturing the plate glass |
| AT412341B (en) * | 2003-06-17 | 2005-01-25 | Stoelzle Oberglas Ag & Co Kg | METHOD AND DEVICE FOR TREATING GOODS, FOR EXAMPLE HOLLOWS FROM GLASS |
| WO2008004480A1 (en) * | 2006-07-07 | 2008-01-10 | Asahi Glass Co., Ltd. | Process for producing alkali-free glass substrate |
| CN101489945B (en) * | 2006-07-07 | 2012-02-01 | 旭硝子株式会社 | Manufacturing method of glass substrate for flat glass |
-
1983
- 1983-02-14 JP JP2264183A patent/JPS59152245A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59152245A (en) | 1984-08-30 |
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