JPH01183180A - Semiconductor light emitting device - Google Patents

Semiconductor light emitting device

Info

Publication number
JPH01183180A
JPH01183180A JP679988A JP679988A JPH01183180A JP H01183180 A JPH01183180 A JP H01183180A JP 679988 A JP679988 A JP 679988A JP 679988 A JP679988 A JP 679988A JP H01183180 A JPH01183180 A JP H01183180A
Authority
JP
Japan
Prior art keywords
wavelength
region
electrode
phase adjustment
bias current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP679988A
Other languages
Japanese (ja)
Inventor
Kentaro Kondo
賢太郎 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP679988A priority Critical patent/JPH01183180A/en
Publication of JPH01183180A publication Critical patent/JPH01183180A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0607Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
    • H01S5/0608Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Semiconductor Lasers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔概要〕 光多重通信に於ける光源に用いて好適な半導体発光装置
に関し、 光信号の波長を別の波長に変換することが可能であると
共にその波長が可変であるように制御することを目的と
し、 バイアス電流を加える電極が二分割され且つ或る波長の
入力光信号が入射されると固有の波長で発振開始する活
性領域と、該活性領域に連なって設けられバイアス電流
を変えることで発振波長の制御を行う位相調整領域と、
該位相調整領域に連なって設けられバイアス電流を変え
ることで発振波長をシフトさせるブラッグ反射領域との
三領域を有してなるよう構成する。
[Detailed Description of the Invention] [Summary] Regarding a semiconductor light emitting device suitable for use as a light source in optical multiplex communication, it is possible to convert the wavelength of an optical signal to another wavelength, and the wavelength is variable. The electrode to which the bias current is applied is divided into two, and an active region that starts oscillating at a specific wavelength when an input optical signal of a certain wavelength is incident, and an active region that is connected to the active region. A phase adjustment region that controls the oscillation wavelength by changing the bias current,
It is configured to have three regions, including a Bragg reflection region which is provided in series with the phase adjustment region and shifts the oscillation wavelength by changing the bias current.

〔産業上の利用分野〕[Industrial application field]

本発明は、光多重通信に於ける光源に用いて好適な半導
体発光装置に関する。
The present invention relates to a semiconductor light emitting device suitable for use as a light source in optical multiplex communication.

〔従来の技術7〕 一般に、光多重通信を実施する為には、或る波長の光信
号を別の波長に変換したり、また、その波長が可変であ
って、且つ、それを制御できなければならない。
[Prior Art 7] Generally, in order to implement optical multiplex communication, it is necessary to convert an optical signal of a certain wavelength to another wavelength, and that the wavelength must be variable and controllable. Must be.

従来、このようなことを実現する為には、入力光信号を
、先ず、電気信号に変換し、その電気信号を用いて波長
が可変で且つその制御を行うことができる半導体レーザ
を駆動し、再び光信号に変換して出力する旨の手段を採
っている。
Conventionally, in order to achieve this, an input optical signal is first converted into an electrical signal, and the electrical signal is used to drive a semiconductor laser whose wavelength is variable and can be controlled. A method is used to convert the signal back into an optical signal and output it.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

現在、前記のような手段を具体化するには、個別の部品
を用いざるを得ず、従って、その構成は゛著しく複雑化
し、一般の用に供することは困難である。
Currently, in order to embody the above-mentioned means, it is necessary to use individual parts, and therefore, the structure thereof becomes extremely complicated, and it is difficult to put it to general use.

若し、光信号のままで波長変換したり、その変換波長を
変化させるように制御し得る半導体発光装置を得ること
ができれば、光多重通信は、その実用化に向かって大き
く進展する。
If it were possible to obtain a semiconductor light-emitting device that can perform wavelength conversion on an optical signal or control the conversion wavelength to change, optical multiplex communication would make great progress toward its practical application.

本発明は、光信号の波長を別の波長に変換することが可
能であると共にその波長が可変であるように制御するこ
とができる半導体発光装置を提供しようとする。
The present invention aims to provide a semiconductor light emitting device that can convert the wavelength of an optical signal to another wavelength and can control the wavelength to be variable.

〔課題を解決するための手段〕[Means to solve the problem]

前記希求されている半導体発光装置を実現するには、先
ず、光信号の波長を別の波長に変換する機能を持たせる
ことが必要である。
In order to realize the desired semiconductor light emitting device, it is first necessary to provide the device with a function of converting the wavelength of an optical signal to another wavelength.

第2図はバイアス電流を供給される電極が分割されてい
る形式の半導体レーザの従来例を説明する為の要部切断
側面図を表している。
FIG. 2 is a cross-sectional side view of a main part for explaining a conventional example of a semiconductor laser in which the electrode to which a bias current is supplied is divided.

図に於いて、1はn型InPクラッド兼基板、2はI 
nGaAs P活性層、3はp型InPクラッド兼コン
タクト層、4Aはp側第1電極、4Bはp側第2電極、
5はn側電極、Llは第1電極部分の長さ、L2は第1
電極部分と第2電極部分とを分離する為の溝、L3は第
2電極部分の長さ、LINは入力光信号、I−outは
出力光信号、11及びI2はバイアス電流をそれぞれ示
している。
In the figure, 1 is an n-type InP cladding/substrate, 2 is an I
nGaAs P active layer, 3 is p-type InP cladding/contact layer, 4A is p-side first electrode, 4B is p-side second electrode,
5 is the n-side electrode, Ll is the length of the first electrode portion, and L2 is the first
A groove for separating the electrode part and the second electrode part, L3 is the length of the second electrode part, LIN is the input optical signal, I-out is the output optical signal, 11 and I2 are the bias currents, respectively. .

この半導体レーザは、双安定レーザ・ダイオードとして
知られているものである(要すれば、昭和60年度電子
通信学会総合全国大会 原稿番号886を参照)。
This semiconductor laser is known as a bistable laser diode (see 1985 IEICE General National Conference, Manuscript No. 886).

この半導体レーザに対し、バイアス電流1+及びI2と
して発振開始直前の値を設定しておき、その状態に於い
て或る波長の入力光信号LINを与えると、固有の波長
で発振開始し、波長変換された出力光信号し。UTが得
られることを実験に依って確認できた。
For this semiconductor laser, the bias currents 1+ and I2 are set to the values immediately before oscillation starts, and when an input optical signal LIN of a certain wavelength is applied in that state, oscillation starts at a specific wavelength and wavelength conversion is performed. output optical signal. It was confirmed through experiments that UT could be obtained.

本発明では、第2図に見られる構造を有する半導体発光
装置を前記の条件で動作させることで波長変換を行うよ
うにしている。
In the present invention, wavelength conversion is performed by operating a semiconductor light emitting device having the structure shown in FIG. 2 under the above conditions.

さて、次に、半導体レーザ固有の発振波長を可変に、且
つ、それを制御することが必要である。
Next, it is necessary to make the oscillation wavelength specific to the semiconductor laser variable and to control it.

第3図は本出願人に於いて開発され波長が可変で且つそ
の制御が可能な三領域半導体レーザの要部切断斜面図を
表している。
FIG. 3 shows a cut-away, oblique view of the essential parts of a three-region semiconductor laser developed by the applicant and capable of variable and controllable wavelength.

図に於いて、11はn型1nP基板、12はグレーティ
ング、13はn型■nGaASPガイド層、14はn型
1nPクラッド層、15はI nGaAsP活性層、1
6はInGaAsP耐メルト・バック層、17はp型I
nP埋め込み層、18はn型InP埋め込み層、19は
p型InPクラッド層、20はp型1nPコンタクト層
、21は活性領域電極、22は位相調整領域電極、23
はDBR(distributed  Bragg  
reflector)iJl域電極電極は活性領域、P
は位相調整領域、DはDBR領域をそれぞれ示している
In the figure, 11 is an n-type 1nP substrate, 12 is a grating, 13 is an n-type nGaASP guide layer, 14 is an n-type 1nP cladding layer, 15 is an InGaAsP active layer, 1
6 is an InGaAsP melt-back resistant layer, 17 is a p-type I
nP buried layer, 18 is an n-type InP buried layer, 19 is a p-type InP cladding layer, 20 is a p-type 1nP contact layer, 21 is an active region electrode, 22 is a phase adjustment region electrode, 23
is DBR (distributed Bragg).
reflector) iJl area electrode The electrode is active area, P
indicates a phase adjustment area, and D indicates a DBR area, respectively.

この半導体レーザは、図から判るように、通常の活性領
域A、位相調整領域P、DBR領域りの三領域からなっ
ていて、発光領域Aに於いては通常の半導体レーザと同
様に発光出力を得る為に発振を行い、位相調整領域Pで
は安定した単一波長の発振を得る為に位相制御を行い、
D B RfJ域りではブラッグ波長の制御を行うもの
である。
As can be seen from the figure, this semiconductor laser consists of three regions: a normal active region A, a phase adjustment region P, and a DBR region, and the light emitting region A has a light emission output similar to a normal semiconductor laser. In the phase adjustment region P, phase control is performed to obtain stable single wavelength oscillation.
In the D B RfJ region, the Bragg wavelength is controlled.

さて、活性領域電極21に一定の電流を流して発光領域
Aで発振させると、それに依って得られた出力光は位相
調整領域Pを介しD B Rfii域りの端面から外部
に送出されるのであるが、この状態で、位相調整領域電
極22に流す電流を一定とし、DBR領域電極23に流
す電流を変化させると発振波長はとびとびに短波長側に
シフトする。これは、キャリヤの注入で屈折率が減少し
てブラッグ波長が動いた為である。また、活性領域電極
21及びDBR領域電極23に流す電流を所定値に維持
し、位相調整領域電極22に流す電流を変化させると、
位相条件が変化する為、連続的に波長を制御することが
できる。
Now, when a constant current is applied to the active region electrode 21 to cause the light emitting region A to oscillate, the resulting output light is sent out from the end face in the D B Rfii region via the phase adjustment region P. However, in this state, if the current flowing through the phase adjustment region electrode 22 is kept constant and the current flowing through the DBR region electrode 23 is changed, the oscillation wavelength shifts to the shorter wavelength side. This is because the refractive index decreases due to carrier injection and the Bragg wavelength shifts. Furthermore, when the current flowing through the active region electrode 21 and the DBR region electrode 23 is maintained at a predetermined value, and the current flowing through the phase adjustment region electrode 22 is changed,
Since the phase conditions change, the wavelength can be continuously controlled.

本発明では、第3図に見られる構造を有する半導体発光
装置の構造を採り入れて発振波長を可変に、そして、そ
の制御を行うようにしている。
In the present invention, the structure of a semiconductor light emitting device having the structure shown in FIG. 3 is adopted to make the oscillation wavelength variable and to control it.

そこで、本発明に依る半導体発光装置に於いては、バイ
アス電流(例えばバイアス電流■□及びI A2)を加
える電極(例えば第1電極36A及び36C)が二分割
され且つ或る波長の入力光信号(例えばL IN)が入
射されると固有の波長で発振開始する活性領域(例えば
活性領域A)と、該活性領域に連なって設けられバイア
ス電流(例えばバイアス電流IF)を変えることで発振
波長の制御を行う位相調整領域(例えば位相調整領域P
)と、該位相調整領域に連なって設けられバイアス電流
(例えばバイアス電流ID)を変えることで発振波長を
シフトさせるブラッグ反射領域(例えばDBR領域領域
色の三領域を有している。
Therefore, in the semiconductor light emitting device according to the present invention, the electrodes (for example, first electrodes 36A and 36C) to which bias currents (for example, bias currents □ and IA2) are applied are divided into two, and There is an active region (e.g. active region A) that starts oscillating at a specific wavelength when a ray (e.g. LIN) is incident, and a bias current (e.g. bias current IF) connected to the active region that can be changed to change the oscillation wavelength. A phase adjustment area that performs control (for example, a phase adjustment area P
), a Bragg reflection region (for example, a DBR region, a color region), and a Bragg reflection region (for example, a DBR region, a color region) that is provided in series with the phase adjustment region and shifts the oscillation wavelength by changing a bias current (for example, a bias current ID).

〔作用〕[Effect]

前記手段を採ることに依り、入力光信号の波長を変換す
ること、また、その波長を可変とし且つその制御を行う
ことが可能であることから、光多重通信を実現する為の
光源として有効であり、しかも、全体をモノリシックに
構成することができるから、従来のものとは比較になら
ないほど小型化される。
By adopting the above method, it is possible to convert the wavelength of the input optical signal, and also to make the wavelength variable and controllable, so it is effective as a light source for realizing optical multiplex communication. Moreover, since the entire device can be constructed monolithically, it is much smaller than conventional devices.

〔実施例〕〔Example〕

第1図は本発明一実施例の要部切断側面図を表し、第2
図及び第3図に於いて用いた記号と同記号は同部分を示
すか或いは同じ意味を持つものとする。
FIG. 1 shows a cutaway side view of essential parts of one embodiment of the present invention, and FIG.
The same symbols as those used in the figures and FIG. 3 indicate the same parts or have the same meanings.

図に於いて、31はn型1nPクラツド兼基板、32は
グレーティング、33はn型I nGaAsP導波層、
34はI nGaAs P活性層、35はp型InPク
ラッド兼コンタクト層、36Aは活性領域第1電極、3
6Bは分離溝、36Cは活性領域第2電極、37は位相
調整領域電極、38はDBR領域電極、LAは活性領域
Aの長さ、LPは位相調整領域Pの長さ、LDはDBR
領域りの長さ、IAIは第1電極36Aに供給するバイ
アス電流、■1は第2電極36Cに供給するバイアス電
流、■2は電極37に供給するバイアス電流、Inは電
極38に供給するバイアス電流をそれぞれ示している。
In the figure, 31 is an n-type 1nP cladding/substrate, 32 is a grating, 33 is an n-type InGaAsP waveguide layer,
34 is an InGaAsP active layer, 35 is a p-type InP cladding/contact layer, 36A is an active region first electrode, 3
6B is a separation groove, 36C is an active region second electrode, 37 is a phase adjustment region electrode, 38 is a DBR region electrode, LA is the length of active region A, LP is the length of phase adjustment region P, LD is DBR
The length of the area, IAI is the bias current supplied to the first electrode 36A, ■1 is the bias current supplied to the second electrode 36C, ■2 is the bias current supplied to the electrode 37, and In is the bias supplied to the electrode 38. Each shows the current.

本実施例に於ける主要部分に関する諸データを例示する
と次の通りである。
Examples of various data related to the main parts in this embodiment are as follows.

tal  活性領域Aについて 長さLA : 300  (,17m)厚さ:0.21
(μm) 組成λPL (波長換算): 1.54 Cμm)(b
l  位相調整領域Pについて 長さLP =172 Cμm〕 厚さ:0.23Cμm〕 組成λPL : 1.、 29 C’ll m)(CI
DBR領域りについて 長さり、、:290Cμm〕 厚さ:0.23(μm〕 組成λPL: 1.29 Cμm) このような半導体発光装置に於いて、 バイアス電流1 a+ : 51 、 5 (mA)バ
イアス電流I A2 : 2 、 05 (mA)バイ
アス電流IF  : 0.1  (mA)バイアス電流
In  : 0.1  (mA)とした状態で、入力光
信号LINを、 波長:1.531  (μm〕 波形:パルス ピーク値: 0.66 (mW) として入射させたところ、出力光信号し。LITとして
、 波長:1.534Cμm〕 波形:パルス ピーク値: 2.7  (mW) 立ち上がり及び立ち下がり: 1.5 (ns)を得る
ことができた。また、出力波長を、1.530 (μm
〕〜1.534 Cμm〕の範囲で可変にすることがで
きた。
tal Length LA for active area A: 300 (,17m) Thickness: 0.21
(μm) Composition λPL (wavelength conversion): 1.54 Cμm) (b
l Length LP of phase adjustment region P = 172 Cμm] Thickness: 0.23Cμm] Composition λPL: 1. , 29 C'll m) (CI
Length of DBR region: 290 Cμm] Thickness: 0.23 (μm) Composition λPL: 1.29 Cμm) In such a semiconductor light emitting device, bias current 1a+: 51, 5 (mA) bias Current I A2: 2,05 (mA) Bias current IF: 0.1 (mA) Bias current In: 0.1 (mA), input optical signal LIN, Wavelength: 1.531 (μm) Waveform :Pulse peak value: 0.66 (mW) When input, the output optical signal is obtained. As LIT, wavelength: 1.534Cμm] Waveform: Pulse peak value: 2.7 (mW) Rise and fall: 1. 5 (ns).In addition, the output wavelength was 1.530 (μm
] to 1.534 Cμm].

〔発明の効果〕〔Effect of the invention〕

本発明に依る半導体発光装置に於いては、或る波長の入
力光信号が入射されると固有の波長で発振開始する活性
領域と、発振波長の制御を行う位相調整領域と、発振波
長をシフトさせるブラッグ反射領域とを有している。
The semiconductor light emitting device according to the present invention includes an active region that starts oscillating at a specific wavelength when an input optical signal of a certain wavelength is incident, a phase adjustment region that controls the oscillation wavelength, and a phase adjustment region that shifts the oscillation wavelength. It has a Bragg reflection region.

前記構成を採ることに依り、入力光信号の波長を変換す
ること、また、その波長を可変とし且つその制御を行う
ことが可能であることから、光多重通信を実現する為の
光源として有効であり、しかも、全体をモノリシックに
構成することができるから、従来のものとは比較になら
ないほど小型化される。
By adopting the above configuration, it is possible to convert the wavelength of an input optical signal, and also to make the wavelength variable and controllable, so it is effective as a light source for realizing optical multiplex communication. Moreover, since the entire device can be constructed monolithically, it is much smaller than conventional devices.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明一実施例の要部切断側面図、第2図は二
分割電極をもつ半導体レーザの要部切断側面図、第3図
は三領域をもつ半導体レーザの要部切断斜面図をそれぞ
れ表している。 図に於いて、31はn型InPクラッド兼基板、32は
グレーティング、33はn型1nGaAsP導波層、3
4はI nGaAs P活性層、35はp型1nPクラ
ッド兼コンタクト層、36Aは活性領域第1電極、36
Bは分離溝、36Cは活性領域第2電極、37は位相調
整領域電極、38はDBR領域電極、LAは活性領域A
の長さ、L。 は位相調整領域Pの長さ、LoはDBR領域りの長さ、
IAIは第1電極36Aに供給するバイアス電流、IA
IIは第2電極36Cは供給するバイアス電流、■、は
電極37に供給するバイアス電流、1、は電極38に供
給するバイアス電流をそれぞれ示している。 特許出願人   富士通株式会社 代理人弁理士  相 谷 昭 司 代理人弁理士  渡 邊 弘 −
FIG. 1 is a cutaway side view of the main part of an embodiment of the present invention, FIG. 2 is a cutaway side view of the main part of a semiconductor laser with two divided electrodes, and FIG. 3 is a cutaway side view of the main part of a semiconductor laser with three regions. each represents. In the figure, 31 is an n-type InP cladding/substrate, 32 is a grating, 33 is an n-type 1nGaAsP waveguide layer, 3
4 is an InGaAsP active layer, 35 is a p-type 1nP cladding/contact layer, 36A is an active region first electrode, 36
B is a separation groove, 36C is an active region second electrode, 37 is a phase adjustment region electrode, 38 is a DBR region electrode, LA is an active region A
Length, L. is the length of the phase adjustment area P, Lo is the length of the DBR area,
IAI is the bias current supplied to the first electrode 36A, IA
II indicates the bias current supplied to the second electrode 36C, ■ indicates the bias current supplied to the electrode 37, and 1 indicates the bias current supplied to the electrode 38. Patent applicant: Fujitsu Ltd. Representative Patent Attorney Shoji Aitani Representative Patent Attorney Hiroshi Watanabe −

Claims (1)

【特許請求の範囲】 バイアス電流を加える電極が二分割され且つ或る波長の
入力光信号が入射されると固有の波長で発振開始する活
性領域と、 該活性領域に連なって設けられバイアス電流を変えるこ
とで発振波長の制御を行う位相調整領域と、 該位相調整領域に連なって設けられバイアス電流を変え
ることで発振波長をシフトさせるブラッグ反射領域と の三領域を有してなる半導体発光装置。
[Claims] An electrode for applying a bias current is divided into two parts, and includes an active region that starts oscillating at a specific wavelength when an input optical signal of a certain wavelength is input, and an active region that is connected to the active region and that applies a bias current. A semiconductor light emitting device comprising three regions: a phase adjustment region that controls the oscillation wavelength by changing the phase adjustment region, and a Bragg reflection region that is provided in series with the phase adjustment region and shifts the oscillation wavelength by changing the bias current.
JP679988A 1988-01-18 1988-01-18 Semiconductor light emitting device Pending JPH01183180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP679988A JPH01183180A (en) 1988-01-18 1988-01-18 Semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP679988A JPH01183180A (en) 1988-01-18 1988-01-18 Semiconductor light emitting device

Publications (1)

Publication Number Publication Date
JPH01183180A true JPH01183180A (en) 1989-07-20

Family

ID=11648227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP679988A Pending JPH01183180A (en) 1988-01-18 1988-01-18 Semiconductor light emitting device

Country Status (1)

Country Link
JP (1) JPH01183180A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05326921A (en) * 1991-06-24 1993-12-10 Nippon Telegr & Teleph Corp <Ntt> Wavelength conversion optical register memory
WO2005091450A1 (en) * 2004-03-23 2005-09-29 Canon Kabushiki Kaisha Modulation light source, image display apparatus including the same, and method of driving modulation light source
WO2026047933A1 (en) * 2024-08-29 2026-03-05 Ntt株式会社 Semiconductor laser

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05326921A (en) * 1991-06-24 1993-12-10 Nippon Telegr & Teleph Corp <Ntt> Wavelength conversion optical register memory
WO2005091450A1 (en) * 2004-03-23 2005-09-29 Canon Kabushiki Kaisha Modulation light source, image display apparatus including the same, and method of driving modulation light source
US7376161B2 (en) 2004-03-23 2008-05-20 Canon Kabushiki Kaisha Modulation light source, image display apparatus including the same, and method of driving modulation light source
WO2026047933A1 (en) * 2024-08-29 2026-03-05 Ntt株式会社 Semiconductor laser

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