JPH01204030A - Production of organic nonlinear optical base body - Google Patents
Production of organic nonlinear optical base bodyInfo
- Publication number
- JPH01204030A JPH01204030A JP2743488A JP2743488A JPH01204030A JP H01204030 A JPH01204030 A JP H01204030A JP 2743488 A JP2743488 A JP 2743488A JP 2743488 A JP2743488 A JP 2743488A JP H01204030 A JPH01204030 A JP H01204030A
- Authority
- JP
- Japan
- Prior art keywords
- nonlinear optical
- electron
- molecule
- mixture
- base body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000463 material Substances 0.000 claims abstract description 18
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims abstract description 18
- 230000005684 electric field Effects 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 239000008240 homogeneous mixture Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 11
- 239000011521 glass Substances 0.000 abstract description 8
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 abstract description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 abstract description 3
- 239000004202 carbamide Substances 0.000 abstract description 3
- 230000006378 damage Effects 0.000 abstract description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052753 mercury Inorganic materials 0.000 abstract description 2
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 2
- CMSGUKVDXXTJDQ-UHFFFAOYSA-N 4-(2-naphthalen-1-ylethylamino)-4-oxobutanoic acid Chemical compound C1=CC=C2C(CCNC(=O)CCC(=O)O)=CC=CC2=C1 CMSGUKVDXXTJDQ-UHFFFAOYSA-N 0.000 abstract 1
- 230000021615 conjugation Effects 0.000 abstract 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 230000008832 photodamage Effects 0.000 description 4
- -1 pyridylbenzene Chemical compound 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- NVLSIZITFJRWPY-ONEGZZNKSA-N n,n-dimethyl-4-[(e)-2-(4-nitrophenyl)ethenyl]aniline Chemical compound C1=CC(N(C)C)=CC=C1\C=C\C1=CC=C([N+]([O-])=O)C=C1 NVLSIZITFJRWPY-ONEGZZNKSA-N 0.000 description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical compound C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 2
- 235000021286 stilbenes Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JZLWSRCQCPAUDP-UHFFFAOYSA-N 1,3,5-triazine-2,4,6-triamine;urea Chemical compound NC(N)=O.NC1=NC(N)=NC(N)=N1 JZLWSRCQCPAUDP-UHFFFAOYSA-N 0.000 description 1
- HMQFJYLWNWIYKQ-UHFFFAOYSA-N 1,4-diphenylbutadiyne Chemical group C1=CC=CC=C1C#CC#CC1=CC=CC=C1 HMQFJYLWNWIYKQ-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- XTTIQGSLJBWVIV-UHFFFAOYSA-N 2-methyl-4-nitroaniline Chemical compound CC1=CC([N+]([O-])=O)=CC=C1N XTTIQGSLJBWVIV-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- BNUHAJGCKIQFGE-UHFFFAOYSA-N Nitroanisol Chemical compound COC1=CC=C([N+]([O-])=O)C=C1 BNUHAJGCKIQFGE-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- YBARIBJRNJYVTK-UHFFFAOYSA-N [1-(5-nitropyridin-2-yl)pyrrolidin-2-yl]methanol Chemical compound OCC1CCCN1C1=CC=C([N+]([O-])=O)C=N1 YBARIBJRNJYVTK-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- JRXXLCKWQFKACW-UHFFFAOYSA-N biphenylacetylene Chemical group C1=CC=CC=C1C#CC1=CC=CC=C1 JRXXLCKWQFKACW-UHFFFAOYSA-N 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000003090 exacerbative effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- LSFRFLVWCKLQTO-UHFFFAOYSA-N n,n-dimethyl-4-[(4-nitrophenyl)diazenyl]aniline Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=C([N+]([O-])=O)C=C1 LSFRFLVWCKLQTO-UHFFFAOYSA-N 0.000 description 1
- GMZZEDGQXDPDGH-UHFFFAOYSA-N n-(5-nitro-2-pyrrolidin-1-ylphenyl)acetamide Chemical compound CC(=O)NC1=CC([N+]([O-])=O)=CC=C1N1CCCC1 GMZZEDGQXDPDGH-UHFFFAOYSA-N 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、分子内にπ電子共役鎖を有し、かつ分子両端
に電子供与基および電子受容基をそれぞれ有する有機非
線形光学材料を用いて有機非線形光学基体を製造する方
法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is an organic nonlinear optical material that has a π-electron conjugated chain in its molecule and an electron-donating group and an electron-accepting group at both ends of the molecule. The present invention relates to a method of manufacturing an optical substrate.
従来の技術
非線形光学効果としては、光混合、光パラメトリツク効
果、高周波発生等があげられるが、応用上重要な第2高
周波発生(以下、SHGという)については、近年、2
−メチル−4−ニトロアニリン(MNA)がKH2PO
4の50倍以上の非線形定数を有することが見出だされ
、それにともない有機物質が注目されるようになってき
た。Conventional nonlinear optical effects include optical mixing, optical parametric effects, high frequency generation, etc., but in recent years, second high frequency generation (hereinafter referred to as SHG), which is important for applications, has been
-Methyl-4-nitroaniline (MNA) is KH2PO
It has been discovered that organic materials have a nonlinear constant of 50 times or more than 4, and as a result, organic materials have started to attract attention.
SHGの大きな有機物質は、ベンゼン、ピリジン、スチ
ルベン、アゾベンゼンのようなπ電子共役分子の両端に
ジメチルアミノ基のような電子供与基と、ニトロ基のよ
うな電子受容基を有し、分子全体が長軸方向に強く電子
分極した形になっている。しかしながら、これらの有機
物質は、結晶状態ではSHGを生じなくなることが多い
、これは、結晶化の際に、電荷を中和するように分子が
配列する結果、結晶に反転中心対称が生じるためである
。Large organic substances such as SHG have an electron-donating group such as a dimethylamino group and an electron-accepting group such as a nitro group at both ends of a π-electron conjugated molecule such as benzene, pyridine, stilbene, and azobenzene, and the entire molecule is It has a shape with strong electronic polarization in the long axis direction. However, these organic substances often do not produce SHG in the crystalline state. This is because during crystallization, the molecules align in a way that neutralizes the charge, resulting in an inverted central symmetry in the crystal. be.
この様な反転対称性を抑え込む方法として、水素結合性
置換基や、キラルな置換基の導入などにより結晶系を制
御することが試みられており、また、上記有機物を極性
溶媒中で結晶化させることによって反転対称中心を消滅
させることも提案されている。〈特開昭61−1472
38号公報)また、高分子フィルムにπ電子共役分子を
添加した系を、加熱しながら電界を印加して非線形性を
発現させることも知られているが、加熱により系を構成
する分子が熱運動をするため、分子の分極の方向を揃え
る上で問題がある。As a method to suppress such inversion symmetry, attempts have been made to control the crystal system by introducing hydrogen-bonding substituents or chiral substituents. It has also been proposed to eliminate the center of inversion symmetry by 〈Japanese Patent Publication No. 61-1472
It is also known to develop nonlinearity by applying an electric field while heating a system in which π-electron conjugated molecules are added to a polymer film. Because they move, there is a problem in aligning the polarization directions of the molecules.
一方、バターニング可能な非線形光学素子用材料を用い
て非線形光学素子を製造することも種々提案されている
。(特開昭61−197630号、同61−13713
6号公報)
発明が解決しようとする課題
いずれにしても、有機非線形光学材料について、実用に
供するものとするためには、分子レベルの大きな非線形
性を損なうことなく、高い380強度を得るようにする
ことが必要であるが、従来の技術では、高い380強度
を得る簡便で、かつ適用範囲の広い十分な方法は知られ
ていない。On the other hand, various proposals have been made to manufacture nonlinear optical elements using materials for nonlinear optical elements that can be patterned. (Unexamined Japanese Patent Publication No. 61-197630, No. 61-13713
Issues to be Solved by the Invention In any case, in order to put organic nonlinear optical materials into practical use, it is necessary to obtain a high 380 intensity without impairing large nonlinearity at the molecular level. However, in the prior art, there is no known simple, flexible and sufficient method for obtaining high 380 strength.
また、パターン化により非線形光学素子を作る場合にお
いても、バターニング可能な非線形光学素子用材料とし
て、特殊な構造の高分子樹脂を製造しなければならない
という問題があった。Furthermore, even in the case of making a nonlinear optical element by patterning, there is a problem in that a polymer resin with a special structure must be manufactured as a material for the nonlinear optical element that can be patterned.
本発明は、この様な背景の下になされたものである。The present invention was made against this background.
したがって、本発明は、分子内にπ電子共役鎖を有し、
かつ分子両端に電子供与基および電子受容基をそれぞれ
有する有機非線形光学材料を用いて、高いS H0強度
を持ち、光損傷閾値が高い有機非線形光学基体を、簡便
に製造する方法を提供することにある。Therefore, the present invention has a π-electron conjugated chain in the molecule,
The present invention also provides a method for easily producing an organic nonlinear optical substrate having high S H0 intensity and a high optical damage threshold using an organic nonlinear optical material having an electron donating group and an electron accepting group at both ends of the molecule. be.
課題を解決するための手段
本発明者等は、分子内にπ電子共役鎖を有し、かつ分子
両端に電子供与基および電子受容基をそれぞれ有する有
機非線形光学材料と光硬化性樹脂とを均質に混合し、電
界の印加の下に光硬化させると、反転対称性の生成を抑
え込むことが可能になり、高い380強度をもち光損傷
閾値が高い有機非線形光学基体を簡単に得ることができ
ることを見出だし、本発明を完成するに至った。Means for Solving the Problem The present inventors homogenized a photocurable resin and an organic nonlinear optical material that has a π-electron conjugated chain in its molecule and has an electron donating group and an electron accepting group at both ends of the molecule. It has been shown that by mixing the materials and photocuring them under the application of an electric field, it is possible to suppress the generation of inversion symmetry, and it is possible to easily obtain an organic nonlinear optical substrate with high 380 intensity and a high photodamage threshold. This heading led to the completion of the present invention.
本発明の有機非線形光学基体の製造方法は、分子内にπ
電子共役鎖を有し、かつ分子両端に電子供与基および電
子受容基をそれぞれ有する有機非線形光学材料と光硬化
性樹脂との均質混合物に、電界を印加しながら高エネル
ギー線を照射して硬化させることを特徴とする。In the method for producing an organic nonlinear optical substrate of the present invention, π is present in the molecule.
A homogeneous mixture of an organic nonlinear optical material having an electron conjugated chain and an electron donating group and an electron accepting group at both ends of the molecule and a photocurable resin is cured by irradiating it with high energy rays while applying an electric field. It is characterized by
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明において、分子内にπ電子共役鎖を有し、かつ分
子両端に電子供与基および電子受容基をそれぞれ有する
有機非線形光学材料は、下記一般式(I)で示される化
合物である。In the present invention, the organic nonlinear optical material having a π-electron conjugated chain in the molecule and having an electron donating group and an electron accepting group at both ends of the molecule is a compound represented by the following general formula (I).
D−π−A (I)
(式中、πは、ベンゼン、ナフタレン、アントラセン、
ピリジン、ビフェニル、ピリジルベンゼン、スチルベン
、ジフェニルアセチレン、ジフェニルジアセチレン、ア
ゾベンゼンおよびこれらの誘導体残基を表わし、Dは、
電子供与性のアミノ基、ジメチルアミノ基、ピロリジノ
基、メトキシ基、メチル基、およびそれらの置換基を表
わし、Aは、電子受容性のニトロ基、シアノ基、ハロゲ
ン原子、カルボニル基およびその置換基を表わす)本発
明において使用される有機非線形光学材料の代表例とし
ては、p−ニトロアニリン、2−メチル−4−ニトロア
ニリン、p−メトキシニトロベンゼン、ρ−アミノベン
ゾニトリル、p−ニトロフェノール、4−ジメチルアミ
ノベンズアルデヒド、4−ニトロ−4′−ジメチルアミ
ノスチルベン、4−ジメチルアミノ−4′−ニトロアゾ
ベンゼン、4−ニトロ−4′−ジメチルアミノジフェニ
ルジアセチレン、4−ニトロ−4′−ジメトキシジフェ
ニルジアセチレン、1−(4’−アミノフェニル)−4
−(4”ニトロフェニル)ジアセチレン、2−(2−ヒ
ドロキシメチルピロリジノ)−5−二トロピリジン、1
−ピロリジノ−2−アセトアミド−4−二トロベンゼン
等をあげることができる。D-π-A (I) (where π is benzene, naphthalene, anthracene,
Represents pyridine, biphenyl, pyridylbenzene, stilbene, diphenylacetylene, diphenyl diacetylene, azobenzene and derivative residues thereof, and D is
Represents an electron-donating amino group, dimethylamino group, pyrrolidino group, methoxy group, methyl group, and their substituents, and A represents an electron-accepting nitro group, cyano group, halogen atom, carbonyl group, and their substituents. Representative examples of organic nonlinear optical materials used in the present invention include p-nitroaniline, 2-methyl-4-nitroaniline, p-methoxynitrobenzene, ρ-aminobenzonitrile, p-nitrophenol, -dimethylaminobenzaldehyde, 4-nitro-4'-dimethylaminostilbene, 4-dimethylamino-4'-nitroazobenzene, 4-nitro-4'-dimethylaminodiphenyldiacetylene, 4-nitro-4'-dimethoxydiphenyldiacetylene Acetylene, 1-(4'-aminophenyl)-4
-(4”nitrophenyl)diacetylene, 2-(2-hydroxymethylpyrrolidino)-5-nitropyridine, 1
-pyrrolidino-2-acetamido-4-nitrobenzene and the like.
一方、光硬化性樹脂としては、不飽和ポリエステル樹脂
、ベンゾインアルキルエーテル類を面始剤としてアクリ
ル系モノマーより得られたビニル重合型樹脂、アリル系
不飽和樹脂とメルカプト基含有樹脂とよりなる付加重合
型樹脂、エポキシ樹脂を用い、ルイス酸触媒によるエポ
キシ開環カチオン重合型樹脂、尿素メラミン樹脂とアル
キッド樹脂よりなる酸硬化アミノアルキッド型樹脂等の
紫外線硬化性樹脂をあげることができる。On the other hand, photocurable resins include unsaturated polyester resins, vinyl polymerized resins obtained from acrylic monomers using benzoin alkyl ethers as a surface starter, and addition polymerized resins made of allyl unsaturated resins and mercapto group-containing resins. Examples include ultraviolet curable resins such as epoxy ring-opening cationic polymerization type resins using Lewis acid catalysts and acid-curing amino alkyd type resins made of urea melamine resins and alkyd resins using mold resins and epoxy resins.
本発明においては、上記有機非線形光学材料と光硬化性
樹脂とを、例えば1:20〜1:10〜1:5の範囲の
混合比で混合して固溶体の状態にし、その混合物に、電
界の印加の下に紫外線その他の高エネルギー線を照射す
る。この場合、混合物は、ネサガラスのような透明導電
膜ガラス板の闇に挾まれた状態で処理されてもよいし、
また、基板の上に塗布された状態で処理されてもよい。In the present invention, the organic nonlinear optical material and the photocurable resin are mixed at a mixing ratio of, for example, 1:20 to 1:10 to 1:5 to form a solid solution, and the mixture is applied with an electric field. The application is accompanied by ultraviolet light or other high-energy radiation. In this case, the mixture may be processed while being surrounded by a transparent conductive glass plate such as Nesa Glass, or
Alternatively, the treatment may be performed while being coated on a substrate.
電界の印加方法としては、上記均質混合物に接触状態で
直接印加しても、また非接触状態で印加してもよい0例
えば、透明導電膜ガラス板の間に挾まれた状態で処理す
る場合には、透明導電膜ガラス板を介して直接電圧を印
加すればよく、また、基板上に塗布された状態で処理す
る場合には、コロトロンワイヤーにより、基板上に形成
された薄膜に非接触状態で帯電させてることができる。The electric field can be applied either directly in contact with the homogeneous mixture or in a non-contact manner.For example, when processing is performed while the electric field is sandwiched between transparent conductive glass plates, A voltage can be applied directly through the transparent conductive glass plate, or if the coating is applied on the substrate, a corotron wire can be used to charge the thin film formed on the substrate in a non-contact manner. I can let you do it.
印加する電圧は1にV/am〜30KV/amの範囲が
好ましい。The voltage to be applied is preferably in the range of 1 V/am to 30 KV/am.
また、高エネルギー線としては、紫外線のほか、レーザ
ー、電子線等も使用することができる。これら高エネル
ギー線の照射により光硬化させる温度は一30〜+30
℃の範囲が好ましい、何故ならば、加熱によって分子の
熱運動が生じることがないので、高いSHG強度を有す
るものが得られるからである。In addition to ultraviolet rays, lasers, electron beams, etc. can also be used as high-energy rays. The temperature for photocuring by irradiation with these high energy rays is -30 to +30
The temperature range of 0.degree. C. is preferred because no thermal motion of the molecules occurs upon heating, resulting in a product with high SHG strength.
本発明は、光導波路系の非線形光学素子を製造するのに
適用することができる。即ち、上記した混合物を基板上
に塗布し、形成された皮膜に電界を印加しながら高エネ
ルギー線のパターンを照射して硬化させ、その後、未硬
化部分を現像によって除去すればよい。The present invention can be applied to manufacturing a nonlinear optical element of an optical waveguide system. That is, the above-described mixture may be applied onto a substrate, the formed film may be cured by irradiating a pattern of high-energy rays while applying an electric field, and then the uncured portions may be removed by development.
作用
本発明において使用される上記の有機非線形光学材料は
、分子レベルでは大きな分子分極率を示ずにもかかわら
ず、結晶状態ではSHG強度が低下する。しかしながら
、本発明によれば、この様な有機非線形光学材料を光硬
化性樹脂と均質に混合し、そしてこの混合物に高エネル
ギー線を照射する際に電界を印加するから、有機非線形
光学材料の分子間双極子−双極子の相互作用が、電界の
印加によりキャンセルされ、分子の双極子が揃った状態
で光硬化され、固定されることになり、したがって従来
になく高いSHG強度を持ち、光損傷閾値が高いものと
なる。Effect: Although the organic nonlinear optical material used in the present invention does not exhibit large molecular polarizability at the molecular level, the SHG intensity decreases in the crystalline state. However, according to the present invention, such an organic nonlinear optical material is homogeneously mixed with a photocurable resin, and an electric field is applied when this mixture is irradiated with high-energy rays. The inter-dipole-dipole interaction is canceled by the application of an electric field, and the dipoles of the molecule are photocured and fixed in alignment, resulting in an unprecedentedly high SHG intensity and no photodamage. The threshold value becomes high.
実施例
以下、本発明を実施例によって説明するが、本発明は、
これら実施例によって同等限定されるものではない。Examples Hereinafter, the present invention will be explained by examples.
These examples are not intended to be equally limiting.
実施例1
p−ニトロアニリン5gに、ポリオールポリエン型の紫
外線硬化性樹脂(アデカオプトマ−BY9006、旭電
化@J製)20fおよび増悪剤(イルガキュアー651
、チバガイギー社製)1gを加えて混合攪拌し、混合物
をテフロンフィルターによって一過した。得られた混合
物を、第1図に示されるセルを用いて処理した。即ち、
図面に示されるように2枚のネサガラス板2.2′に挟
まれた試料ホルダー1に注入し、ネサガラス板に取り付
けられた電極3.3′に高圧電源より5ooovの電圧
を印加しながら、高圧水銀灯(ミニキュア、ウシオ電機
■製)によりネサガラス板を通して2分間照射を行った
。その後電圧の印加を中止した。Example 1 5 g of p-nitroaniline was added with 20 f of a polyol polyene type ultraviolet curable resin (ADEKA OPTOMER-BY9006, manufactured by Asahi Denka@J) and an exacerbating agent (Irgacure 651).
1 g (manufactured by Ciba Geigy) was added thereto, mixed and stirred, and the mixture was passed through a Teflon filter. The resulting mixture was processed using the cell shown in FIG. That is,
As shown in the drawing, the sample was injected into the sample holder 1 sandwiched between two Nesa glass plates 2.2', and the high voltage was Irradiation was performed for 2 minutes through the Nesa glass plate using a mercury lamp (Minicure, manufactured by Ushio Inc.). After that, the voltage application was stopped.
得られた試料に、1.064鎖のNd : YAGレー
ザーを透過させたところ、第2高調波である波長0、5
32−の緑色光が観測された。その強度を光電子倍増管
により測定したところ、尿素の示す値の約5倍であるこ
とが確認された。When a 1.064-chain Nd:YAG laser was transmitted through the obtained sample, the wavelengths of 0 and 5, which are the second harmonics, were transmitted.
32- green light was observed. When the intensity was measured using a photomultiplier tube, it was confirmed that the intensity was about five times that of urea.
実施例2
4−ニトロ−4′−ジメチルアミノスチルベン5gに、
アクリル変性エポキシ樹脂(Beckpox VEM3
7/1、ヘキストジャパン製)20gおよび増感剤とし
てベンゾフェノン1gを加えて混合撹拌し、混合物をテ
フロンフィルターによって一過した。得られた混合物を
、実施例1におけると同様にして電界を印加しながら紫
外線照射を行った。得られ−た試料について第2高調波
を測定したところ、波長波長0.532Imの緑色光が
観測された。その強度を光電子倍増管により測定したと
ころ、尿素の示す値の約3倍であることが確認された。Example 2 5 g of 4-nitro-4'-dimethylaminostilbene,
Acrylic modified epoxy resin (Beckpox VEM3
7/1, manufactured by Hoechst Japan) and 1 g of benzophenone as a sensitizer were added, mixed and stirred, and the mixture was passed through a Teflon filter. The obtained mixture was irradiated with ultraviolet rays in the same manner as in Example 1 while applying an electric field. When the second harmonic was measured for the obtained sample, green light with a wavelength of 0.532 Im was observed. When the intensity was measured using a photomultiplier tube, it was confirmed that the intensity was about three times that of urea.
比軸例
ρ−ニトロアニリンおよび4−ニトロ−4′−ジメチル
アミノスチルベンをそれぞれ1g、熱硬化性アクリル−
ポリオール樹脂(レタン4000、関西ペイント■製)
23.5. 、およびトリイソシアネート系硬化剤(
N3200 、関西ペイント■製)3.5gを、塩化メ
チレン 73gに溶解させ、2枚のネサガラス板に挾ま
れた試料ホルダーに入れた。これを115〜130℃の
温度まで加熱し、5000Vの電圧を印加しながら徐々
に冷却して硬化させた。得られた試料について実施例1
におけると同様に測定したところ、第2高調波は観察さ
れなかった。Ratio example: 1 g each of ρ-nitroaniline and 4-nitro-4'-dimethylaminostilbene, thermosetting acrylic
Polyol resin (Rethane 4000, manufactured by Kansai Paint ■)
23.5. , and triisocyanate curing agent (
3.5 g of N3200 (manufactured by Kansai Paint ■) was dissolved in 73 g of methylene chloride and placed in a sample holder sandwiched between two Nesa glass plates. This was heated to a temperature of 115 to 130°C, and gradually cooled and cured while applying a voltage of 5000V. Example 1 for the obtained sample
When measurements were made in the same manner as in , no second harmonic was observed.
発明の効果
本発明によれば、有機非線形光学材料の分子間双極子−
双極子の相互作用が、電界の印加によりキャンセルされ
、分子の双極子が揃った状態で光硬化され、固定される
ことになるので、従来に無く高いSHG強度を持ち、光
損傷閾値が高い非線形光学基体を製造することができる
。Effects of the Invention According to the present invention, the intermolecular dipole of an organic nonlinear optical material
The interaction of dipoles is canceled by the application of an electric field, and the dipoles of the molecules are photocured and fixed in alignment, resulting in a nonlinear SHG with unprecedentedly high strength and a high photodamage threshold. Optical substrates can be manufactured.
そして本発明により製造される非線形光学基体は、高エ
ネルギー線に対し、高い感度と優れた解像性を有し、架
橋により固化された有機高分子よりなるため、有機非線
形光学材料の高い非線形性を保持したまま、光損傷を受
けにくい機械的強度の優れたものとなっている。The nonlinear optical substrate produced according to the present invention has high sensitivity and excellent resolution to high-energy rays, and is made of an organic polymer solidified by crosslinking, so the nonlinear optical substrate has high nonlinearity as an organic nonlinear optical material. It has excellent mechanical strength and is less susceptible to photodamage while maintaining its properties.
また、本発明は、パターニング化する場合にも適用する
ことができ、光導波路系の非線形光学素子を簡単に製造
することができる。Furthermore, the present invention can be applied to patterning, and an optical waveguide-based nonlinear optical element can be easily manufactured.
第1図は、本発明の実施例で用いるセルの斜視図である
。
1・・・試料ホルダー、2.2′・・・ネサガラス板、
3.3′・・・電極。FIG. 1 is a perspective view of a cell used in an embodiment of the present invention. 1... Sample holder, 2.2'... Nesa glass plate,
3.3'...electrode.
Claims (1)
子供与基および電子受容基をそれぞれ有する有機非線形
光学材料と光硬化性樹脂との均質混合物に、電界を印加
しながら高エネルギー線を照射して硬化させることを特
徴とする有機非線形光学基体の製造方法。(1) High energy while applying an electric field to a homogeneous mixture of a photocurable resin and an organic nonlinear optical material that has a π-electron conjugated chain in its molecule and has an electron donating group and an electron accepting group at both ends of the molecule. A method for producing an organic nonlinear optical substrate, characterized by curing it by irradiating it with radiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2743488A JPH01204030A (en) | 1988-02-10 | 1988-02-10 | Production of organic nonlinear optical base body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2743488A JPH01204030A (en) | 1988-02-10 | 1988-02-10 | Production of organic nonlinear optical base body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01204030A true JPH01204030A (en) | 1989-08-16 |
Family
ID=12221006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2743488A Pending JPH01204030A (en) | 1988-02-10 | 1988-02-10 | Production of organic nonlinear optical base body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01204030A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04303827A (en) * | 1990-12-21 | 1992-10-27 | F Hoffmann La Roche Ag | Nonlinear polymerized optical layer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01163726A (en) * | 1987-12-19 | 1989-06-28 | Fujitsu Ltd | Production of electrooptic element |
-
1988
- 1988-02-10 JP JP2743488A patent/JPH01204030A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01163726A (en) * | 1987-12-19 | 1989-06-28 | Fujitsu Ltd | Production of electrooptic element |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04303827A (en) * | 1990-12-21 | 1992-10-27 | F Hoffmann La Roche Ag | Nonlinear polymerized optical layer |
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