JPH01204484A - Superconductor electronic device - Google Patents
Superconductor electronic deviceInfo
- Publication number
- JPH01204484A JPH01204484A JP63029439A JP2943988A JPH01204484A JP H01204484 A JPH01204484 A JP H01204484A JP 63029439 A JP63029439 A JP 63029439A JP 2943988 A JP2943988 A JP 2943988A JP H01204484 A JPH01204484 A JP H01204484A
- Authority
- JP
- Japan
- Prior art keywords
- superconductor
- crystal layer
- crystal
- pressure
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002887 superconductor Substances 0.000 title claims description 28
- 239000013078 crystal Substances 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 10
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 230000005669 field effect Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 229910052594 sapphire Inorganic materials 0.000 description 4
- 239000010980 sapphire Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009396 hybridization Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
Landscapes
- Insulated Gate Type Field-Effect Transistor (AREA)
- Pressure Sensors (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
、〔産業上の利用分野〕
本発明は超電導体電子装置に関し、特に圧力ゲート形ト
ランジスタに関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to superconductor electronic devices, and more particularly to pressure-gated transistors.
従来のトランジスタのうちショットキー障壁形電界効果
トランジスタは、第7図に示すように、たとえばn型G
a A s導電層101表面にG a A sとショ
ットキー接触するゲート電極102を設け、このゲート
金属全快むように設は定ソース電極21゜ドレイ/電極
22間に流れるドレイン電流を、ゲート電極直下のn型
G a A s表面に形成する空乏層105の厚みによ
って制御する。ま念、♂界結合形ジョセフソン(Jos
ephson)3端子素子は配線に流πる電流が作る磁
界をジョセフソン素子に結合することによ少入力を与え
るものであシ、さらにジョセフソン形電界効果トランジ
スタは、第8図に示すように弱結合形のジョセフソン素
子の超電導体−半導体接合部間に形成される縮退領域の
弱結合部109に電圧を加えて空乏層を形成して超電導
体のソース電極106とドレイン電極108間を流れる
超電導電子の数を制御するものである。Among conventional transistors, a Schottky barrier field effect transistor is, for example, an n-type G field effect transistor, as shown in FIG.
A gate electrode 102 is provided on the surface of the a As conductive layer 101 and is in Schottky contact with the Ga As. It is controlled by the thickness of the depletion layer 105 formed on the n-type GaAs surface. Sincerely, male world-bound form Josephson (Jos)
The three-terminal element (ephson) provides a small input by coupling the magnetic field created by the current flowing through the wiring to the Josephson element.Furthermore, the Josephson type field effect transistor is as shown in Figure 8. A voltage is applied to the weak coupling part 109 of the degenerate region formed between the superconductor-semiconductor junction of the weakly coupled Josephson element to form a depletion layer, and a depletion layer flows between the source electrode 106 and the drain electrode 108 of the superconductor. It controls the number of superconducting electrons.
上述しfc袋米のトランジスタにおいて、ショツトキー
障壁形電界効果トランジスタはチャンネル抵抗が大きい
之めに相互コンダクタンスgmは100m5程度しか得
られない問題がある。また磁界結合形ジョセフソン3端
子素子は磁束量Φo(=′2..07XIO”5Wb)
2確保するために大面積を必要とするので、この様な素
子では高集積化が難しい問題がちシ、嘔らにジョセフソ
ン形電界効果トランジスタは半導体結合の接合のために
素子抵抗が高く、まfiI−V特性にヒステリシスを生
じる問題がある。Among the above-mentioned FC bag transistors, the Schottky barrier field effect transistor has a problem in that a mutual conductance gm of only about 100 m5 can be obtained because the channel resistance is large. In addition, the magnetic field coupling type Josephson 3-terminal element has a magnetic flux Φo (='2..07XIO"5Wb)
2, so it is difficult to achieve high integration with such devices.Moreover, Josephson field effect transistors have high device resistance due to semiconductor bonding junctions, and There is a problem that hysteresis occurs in the fiI-V characteristics.
本発明の目的は、相互コンダクタンスが大キく高集積化
可能な新しい超電導体電子装置を提供することにある。An object of the present invention is to provide a new superconductor electronic device that has a large mutual conductance and can be highly integrated.
本発明の超電導体電子装置は、絶縁性基板表面に被着さ
れ前記表面と平行方向に二次元的に超電導性を示す結晶
面をもつ所定形状の超電導体結晶層と、前記超電導体結
晶層上にこれを横断して設けられ友圧電素子を含む圧力
ゲートと、前記圧力ゲートを挾んで前記超電導体結晶層
に被着嘔れ之一対の導電膜よりなるソース電極及びドレ
イ/電極とを含むというものである。The superconductor electronic device of the present invention includes a superconductor crystal layer of a predetermined shape that is adhered to the surface of an insulating substrate and has a crystal plane exhibiting superconductivity two-dimensionally in a direction parallel to the surface; A pressure gate including a companion piezoelectric element is provided across the pressure gate, and a source electrode and a drain/electrode are formed of a pair of conductive films deposited on the superconducting crystal layer and sandwiching the pressure gate. It is something.
セラミック系超電導体として知られている擬ペロブスカ
イト構造やKINiF4型構造のセラミック結晶は、Y
sランタノイド元素の−i (La、 yb。Ceramic crystals with pseudoperovskite structure and KINiF4 type structure, which are known as ceramic superconductors, are Y
-i (La, yb.
Tm、Er、Ho、Dy、Tb、Gd、Eu、Sm)と
アルカリ土類金属(Ba、 Ca、 Srなど)及び2
価の(Cu、Ag)と0とから成るL n −A−Cu
(A’g )酸化物で、低温においてその電気抵抗が
零になる超電導性を示す。Tm, Er, Ho, Dy, Tb, Gd, Eu, Sm) and alkaline earth metals (Ba, Ca, Sr, etc.) and 2
L n -A-Cu consisting of (Cu, Ag) of valence and 0
(A'g) is an oxide that exhibits superconductivity such that its electrical resistance becomes zero at low temperatures.
Y51.’Ba52.Cu53,054から成る超電導
体、例えばYBa 2cu306.69は第4図に示す
ように斜方晶系に属し、格子定数(a =3.8845
^、b:3.8293A、C=xx、er93M)から
分かるようにC軸方向に長く、C軸に垂直なab面内で
Cu−0結合鎖55が無限に展開する構造を有している
。このCu−0結合鎖55の面はC軸方向に層状に積層
しておハ結晶の超電導性はこのCu−0結合鎖のCuノ
3d軌動と0の2p軌這の混成によシ生じる強く束縛さ
れt電子が高密度の伝導帯の7工ルミ面を形成するtめ
に生じるものと云われている。し友がって結晶の超電導
性がC軸に垂直なab面内だけに、すなわちCu−0結
合鎖面内だけに生じ、C軸方向にはわずかに漏洩するよ
うな電導の2次元性を示す特徴がある。このような2次
元的な超電導性を示す超電導体結晶ではC軸に垂直な方
向に圧力を与えるとab面内のCu−0結合距離が小さ
くなシ、その結果、超電導転位温度Tcは増大し、電気
抵抗が減少することが知られている。Y51. 'Ba52. A superconductor consisting of Cu53,054, for example YBa2cu306.69, belongs to the orthorhombic system as shown in Figure 4, and has a lattice constant (a = 3.8845
^, b: 3.8293A, C=xx, er93M), it is long in the C-axis direction and has a structure in which the Cu-0 bond chain 55 expands infinitely in the ab plane perpendicular to the C-axis. . The planes of this Cu-0 bond chain 55 are laminated in layers in the C-axis direction, and the superconductivity of the crystal is caused by the hybridization of the Cu 3d orbit and the 0 2p orbit of the Cu-0 bond chain. It is said that strongly bound t-electrons are generated at the t-th point where t-electrons form a high-density conduction band 7-luminium surface. Therefore, the superconductivity of the crystal occurs only in the a-b plane perpendicular to the C-axis, that is, only in the Cu-0 bond chain plane, and there is a two-dimensionality of conduction in which there is a slight leakage in the C-axis direction. There are characteristics to show. In a superconducting crystal that exhibits such two-dimensional superconductivity, when pressure is applied in the direction perpendicular to the C axis, the Cu-0 bond distance in the ab plane becomes small, and as a result, the superconducting dislocation temperature Tc increases. It is known that electrical resistance decreases.
本発明の原理はソース・ドレイン!極間の超電導体結晶
のチャンネルコンダクタンスの制御を、結晶に圧力を与
えてCu−0結合鎖の7工ルミ面の状態密度分布を変え
ることによシおこなうものである。C軸に垂直に圧力を
与えるとab面内のチャンネルコンダクタンスが増大す
るのに対して。The principle of this invention is source and drain! The channel conductance of the superconductor crystal between the poles is controlled by applying pressure to the crystal and changing the state density distribution of the heptagonal aluminum plane of the Cu-0 bond chain. Whereas applying pressure perpendicular to the C-axis increases the channel conductance in the a-b plane.
C軸方向に圧力を加えるとチャンネルコンダクタンスは
逆に減少してしまう。そこで本発明はチャンネルとなる
超電導体結晶層の表面を完全に横断するように圧電素子
などの圧力ゲートヲ配置し、圧電素子にバイアス入力を
与えて、圧力ゲートを駆動きせて電・正変換をして超電
導体結晶層のC軸方向に圧力を加え、この圧力を与える
ことにょシソース・ドレイン電極間のチャンネルコンダ
クタンスを制御しtノーマリオン型のトランジスタであ
る。尚、チャンネルとなる超電導体結晶層の表面を完全
に横断するように圧力ゲートを配置することによシ、チ
ャンネルを流れる超電導電流を圧力ゲートにょシ完全に
ピンチオフ (pinch off)できるのである。If pressure is applied in the C-axis direction, the channel conductance will conversely decrease. Therefore, in the present invention, a pressure gate such as a piezoelectric element is arranged so as to completely cross the surface of a superconducting crystal layer that becomes a channel, and a bias input is given to the piezoelectric element to drive the pressure gate to perform electric/positive conversion. Pressure is applied in the C-axis direction of the superconductor crystal layer, and by applying this pressure, the channel conductance between the source and drain electrodes is controlled, making it a normally-on transistor. By arranging the pressure gate so as to completely traverse the surface of the superconducting crystal layer serving as the channel, the superconducting current flowing through the channel can be completely pinched off by the pressure gate.
次に1本発明の実施例について図面を参照して説明する
。Next, an embodiment of the present invention will be described with reference to the drawings.
第1図は本発明の第1の実施例を示すチップの断面図で
ある。FIG. 1 is a sectional view of a chip showing a first embodiment of the present invention.
この実施例は、絶縁性基板(MgO基板10)の(10
0)面に被着され(100)面と平行方向に二次元的に
超電導性を示す結晶面(ab面)をもつ長方形(1cm
xO,1cm)の超電導体結晶層(YBazCu30s
、s9結晶層11)と、YBazcu 30ass結晶
層11上にこれを横断して設けられt圧電素子(PZT
膜31と1対のくし形電極41.42とを有している)
t−含む圧力ゲートと、前述の圧力ゲ−)7挾んテYB
a zcuaoa、s 9結晶漸11に被着された一対
の導電膜よりなるソース電極21及びドレイン電極22
とを含むというもので、いわば圧力ゲート形電界効果ト
ランジスタと称すべきものである。In this example, (10
A rectangle (1 cm
xO, 1 cm) superconductor crystal layer (YBazCu30s
, s9 crystal layer 11) and a piezoelectric element (PZT) provided on and across the YBazcu 30ass crystal layer 11.
(membrane 31 and a pair of comb-shaped electrodes 41, 42)
t-containing pressure gate and the aforementioned pressure gate) 7-inch te YB
A source electrode 21 and a drain electrode 22 made of a pair of conductive films deposited on the crystal layer 11
It should be called a pressure gate field effect transistor.
次に、この実施例の製造方法について説明する。Next, the manufacturing method of this example will be explained.
第2図(a)、 (b)は第1の実施例の製造方法を説
明する几めの工程順に配置し几チップの断面図であるO
まず、第2図(alに示すように、MgO基板1oの(
100)面にスパッタリング(sput ter in
g)法で被着し九ので、熱処理を行なって厚さ′1mm
1幅−1cm、長さ5mmのYBazCuaOa6s結
晶層11金設ける。このときYBazCusOe69I
!!i!r晶層11はMgO基板10に″垂直な方向に
C軸をとっている。FIGS. 2(a) and 2(b) are cross-sectional views of chips arranged in the order of steps to explain the manufacturing method of the first embodiment. First, as shown in FIG. of the board 1o (
sputtering on the surface (100)
g) Since it was deposited by the method, it was heat treated to a thickness of 1mm.
A YBazCuaOa6s crystal layer 11 gold having a width of -1 cm and a length of 5 mm is provided. At this time, YBazCusOe69I
! ! i! The r-crystalline layer 11 has its C-axis in a direction perpendicular to the MgO substrate 10 .
次に、第2図(b)に示すように、YBazCu30s
、s9結晶層工1のC軸に平行な面を含む該結晶膜11
の両端K Au f被着してソース電fi21とドレイ
ン電極22を設ける。次に%第1図に示すように、ソー
ス電極21とドレイン電極22に挾まれ−zYBa2C
u30as9結晶層11の表面を完全に横断するように
、電圧印加によシ該績晶膜に垂直な方向すなわちC軸方
向に変位するような圧力ゲートとして厚さ1μmのP
Z T (= Zr−Ti−Pbの固溶体)31及び該
pZT:n上に設けtゲート信号入力用のl対のくし形
電極41.42(Auからなっている)から外る圧電素
子を設ける。この実施例を約80Kに冷却してくし形電
ff141.42に最大1■のゲート信号入力を与える
と、入力電圧の大きさに依存してくし形電極41.42
厘下のPZT膜31f YBa zcu 306.s
9結晶層11表面に垂直な方向に膨張でせ、その結果P
ZT膜31直下の超電導体結晶層に圧力を与えてこの結
晶膜の格子間@を変えることができる。良く知られてい
るようにC軸方向に圧力を加えると、Cu−0結合鎖の
あるab面内の格子間隔は大きくな9、それだけ超電導
電流は減少する。本実施例の場合第3図に示すように、
圧力ゲートにVg==lV入力すると超電導電流工da
は0■入力のときの5OAがOAに制御された。圧力ゲ
ート幅すなわちチャンネル幅’t 1cmとすると、相
互コンダクタンスは5000mS/mmに相当する。Next, as shown in FIG. 2(b), YBazCu30s
, the crystal film 11 including a plane parallel to the C axis of the s9 crystal layer 1
A source electrode fi21 and a drain electrode 22 are provided by depositing K Au f on both ends of the electrode. Next, as shown in Figure 1, −zYBa2C is sandwiched between the source electrode 21 and the drain electrode 22.
A 1 μm thick P was used as a pressure gate to completely traverse the surface of the u30as9 crystal layer 11 and to be displaced in the direction perpendicular to the crystal film, that is, in the C-axis direction, by applying a voltage.
A piezoelectric element is provided on the ZT (= solid solution of Zr-Ti-Pb) 31 and the pZT:n and is detached from the l pair of comb-shaped electrodes 41 and 42 (made of Au) for inputting the t-gate signal. . When this embodiment is cooled to about 80K and a maximum of 1 cm of gate signal input is applied to the comb-shaped electrode ff141.42, the comb-shaped electrode 41.42 depends on the magnitude of the input voltage.
PZT film 31f YBa zcu 306. s
9 expands in the direction perpendicular to the crystal layer 11 surface, resulting in P
By applying pressure to the superconductor crystal layer immediately below the ZT film 31, the interstitial space of this crystal film can be changed. As is well known, when pressure is applied in the C-axis direction, the lattice spacing in the ab-plane where Cu-0 bond chains are present increases9, and the superconducting current decreases accordingly. In the case of this embodiment, as shown in Fig. 3,
When inputting Vg==lV to the pressure gate, the superconducting current generator da
5OA when inputting 0■ was controlled by OA. If the pressure gate width or channel width 't is 1 cm, the transconductance corresponds to 5000 mS/mm.
第5図は第2の実施例を示すチップの断面図である。FIG. 5 is a sectional view of a chip showing a second embodiment.
この実施例は、絶縁性基板としてサファイア基板60、
超電導体結晶層として(La−Ca)zAgo4結晶r
ftf用いt外は第1の実施例と同じである。In this embodiment, a sapphire substrate 60 is used as an insulating substrate,
As a superconductor crystal layer (La-Ca)zAgo4 crystal r
Except for the use of ftf and t, this is the same as in the first embodiment.
次に、第2の実施例の製造方法について説明するO
第6図(al、 (blは第2の実施例の製造方法を説
明する几めの工程順に配置し九チップの断面図であるO
第6図fa)に示すように、す7アイア基板60の(0
112)面に厚さ1mmの(La−Ca)2Ag04結
晶層61’に成膜し熱処理を行なう。このとき、(La
−Ca )、 Ago4は斜方晶系に属し、(La−
Ca)1Ag04結晶層61のC軸はサファイア基板6
0と垂直になる。Next, the manufacturing method of the second embodiment will be explained. As shown in FIG. 6 fa), the (0
112) A 1 mm thick (La-Ca)2Ag04 crystal layer 61' is formed on the surface and heat-treated. At this time, (La
-Ca), Ago4 belongs to the orthorhombic system, and (La-
The C axis of the Ca)1Ag04 crystal layer 61 is the sapphire substrate 6
It becomes perpendicular to 0.
次に、第6図(b)に示すように、(La −Ca )
*AgO4結晶層61のC軸に平行な面を含む両端にA
uを被着してソース電極21とドレイン電極22を設け
る。Next, as shown in FIG. 6(b), (La − Ca )
*A on both ends of the AgO4 crystal layer 61 including the plane parallel to the C axis.
A source electrode 21 and a drain electrode 22 are provided by depositing u.
次に、第5図に示すように、ソース・ドレイン両電極に
挾まれ* (La−Ca )I Ag04結晶層61の
表面に電圧印加により該超電導体膜のC軸方向に変位す
るような圧力ゲートとして厚さ1μmのPZT31及び
該PZT上にゲート信号大刀用のくし形電極c1,42
’を設ける。Next, as shown in FIG. 5, a voltage is applied to the surface of the *(La-Ca)I Ag04 crystal layer 61 sandwiched between the source and drain electrodes, thereby applying pressure such that the superconductor film is displaced in the C-axis direction. A PZT 31 with a thickness of 1 μm is used as a gate, and a comb-shaped electrode c1, 42 for a gate signal is provided on the PZT.
' is provided.
このようにして得た本発明の圧力ゲート形トランジスタ
を約30Kに冷却してくし形電極41゜42に最大1v
のゲート信号入力vgヲ与えると、ソース・ドレイン電
極間の超電導電流はOV大入力ときの3OAがQAに抑
制され次。チャンネル幅t−1cmとすると相互コンダ
クタンスは3000m5A面に相当する。The pressure gate type transistor of the present invention obtained in this way was cooled to about 30K and applied to the comb-shaped electrodes 41 and 42 at a maximum of 1V.
When the gate signal input vg is given, the superconducting current between the source and drain electrodes is suppressed from 3OA when OV is large input to QA. When the channel width is t-1 cm, the mutual conductance corresponds to 3000 m5A plane.
以上の実施例においては起電導体結晶としてYBa2C
L1301L69.と(La −Ca )2 Ag04
f例に、マ九圧力ゲート材としてPZTを例に説明して
き九が、Ln−A−Cu−0系あるいはLn−A−Ag
−Q系などの他の超電導体でも、まfcLiTaOsや
LiNb0aなど、他の圧電結晶を用いても本発明の思
想を損うことはない。ま之使用できる基板はMgOやサ
ファイアに限られるものではなく、イSr’f’i0a
結晶の如く超電導体膜を成長できるものならば本発明の
適用範囲であることは云うまでもない。In the above embodiments, YBa2C is used as the electromotive conductor crystal.
L1301L69. and (La-Ca)2Ag04
In the example below, PZT is used as an example of the pressure gate material.
Even if other superconductors such as -Q type or other piezoelectric crystals such as fcLiTaOs or LiNb0a are used, the idea of the present invention will not be impaired. The substrates that can be used are not limited to MgO and sapphire, but also
It goes without saying that the present invention is applicable to anything that can grow a superconductor film, such as a crystal.
以上説明しtように本発明は、超電導体結晶層の超電導
性を示す面と平行な面上に設けt圧力ゲートに1v程度
のゲート信号を加えることによυ。As explained above, the present invention applies a gate signal of about 1 V to a pressure gate provided on a plane parallel to the plane showing superconductivity of a superconductor crystal layer.
超電導体結晶の結合鎖の7工ルミ面の状態密度分布を変
化させて超電導体結晶のソース・ドレイン間の超電導電
流を制御するもので、3〜5×103m5/mmの極め
て大きな相互コ/ダクタンスh声有する超電導体電子装
置を得ることができる。さらに従来のトランジスタの多
くでは特性がゲート電極と結晶膜との境界の清浄度に依
存し、表面に極めて敏感であつtが、本発明は圧力ゲー
トを用いて機械的な変位を与えて変調するので、表子特
性が表面に鈍感で安定している効果も有している。It controls the superconducting current between the source and drain of the superconductor crystal by changing the state density distribution of the 7-luminium plane of the bonded chain of the superconductor crystal, and has an extremely large mutual co/ductance of 3 to 5 x 103 m5/mm. A superconductor electronic device having high noise can be obtained. Furthermore, in many conventional transistors, the characteristics depend on the cleanliness of the boundary between the gate electrode and the crystal film and are extremely sensitive to the surface, but the present invention modulates the characteristics by applying mechanical displacement using a pressure gate. Therefore, it also has the effect that the surface properties are insensitive to the surface and stable.
まt、圧力ゲートとして圧電素子を使用すると、トラン
ジスタの寸法も小さくてすみ、し九がって高集積化も容
易である。In addition, if a piezoelectric element is used as a pressure gate, the size of the transistor can be reduced, and high integration is also easy.
第1図は本発明の第1の実施例を示すチップの断面図、
第2図(al、 (b)は第1の実施例の製造方法を説
明する九めの工程順に配置し九チップの断面図、冨3図
は実施例の動作を説明する九めの信号波形図、第4図は
YBa2Cu30s、s9結晶の構造模型図、第5図は
第2の実施例を示すチップの断面図、第6図(al、
(blは第2の実施例の製造方法を説明する九めの工程
順に配置しtチップの断面図、第7図はショットキー障
壁形電界効果トランジスタ金示すチップの断面図、第8
図はジョセ7ン/形電界効果トランジスタを示すチップ
の断面図である。
10 ・−・・−pgo基板、11−−−−・−YBa
2CusO6,69結晶層、21・・・・・・ソース電
極、22・・・・・・ドレイ/電極、31・・・・・・
PZTl[,41,42・・・・・・ゲート信号入力用
のくし形電極、51・・・・・・Yl 52・・・・・
・Ba、53・・・・・・Cu、54・・・・・・0.
55・・・・・・Cu−0結合鎖、60・・・・・・サ
ファイア基板、61・・・・・・(La−Ca)IAg
O4結晶層、101 ・−・−n形溝電層、102・・
・・・・ゲート電極、106・・・・・・超電導体ソー
ス電極、107・・・・・・超電導体ゲート電極、10
8・・・超電導体ドレイン電極、105,109・・・
・・・弱結合部の空乏層、110・・・・・・半導体基
板。
代理人 弁理士 内 原 音
第 1 又
消2圏
第 3 霞
納 4 霞
第 5 図
第 6 霞
男 q 図
第 8 霞FIG. 1 is a sectional view of a chip showing a first embodiment of the present invention;
Figures 2 (al) and (b) are cross-sectional views of the ninth chip arranged in the order of steps to explain the manufacturing method of the first embodiment, and Figure 3 is the ninth signal waveform to explain the operation of the embodiment. 4 is a structural model diagram of YBa2Cu30s, s9 crystal, FIG. 5 is a cross-sectional view of a chip showing the second embodiment, and FIG. 6 (al,
(bl is a cross-sectional view of a T chip arranged in the order of the ninth process to explain the manufacturing method of the second embodiment, FIG. 7 is a cross-sectional view of a chip showing a Schottky barrier field effect transistor gold, and FIG.
The figure is a cross-sectional view of a chip showing a Jose7 type field effect transistor. 10 ・--・-pgo substrate, 11-----・-YBa
2CusO6,69 crystal layer, 21...source electrode, 22...dray/electrode, 31...
PZTl[,41,42...Comb-shaped electrode for gate signal input, 51...Yl 52...
・Ba, 53...Cu, 54...0.
55...Cu-0 bond chain, 60...Sapphire substrate, 61...(La-Ca)IAg
O4 crystal layer, 101 ---n-type trench conductor layer, 102...
...Gate electrode, 106... Superconductor source electrode, 107... Superconductor gate electrode, 10
8... Superconductor drain electrode, 105, 109...
... Depletion layer of weak coupling part, 110 ... Semiconductor substrate. Agent Patent Attorney Uchihara Oto No. 1 Mata-etsu 2nd Circle No. 3 Kasino 4 Kasumi No. 5 Figure 6 Kasao q Figure No. 8 Kasumi
Claims (1)
的に超電導性を示す結晶面をもつ所定形状の超電導体結
晶層と、前記超電導体結晶層上にこれを横断して設けら
れた圧電素子を含む圧力ゲートと、前記圧力ゲートを挾
んで前記超電導体結晶層に被着された一対の導電膜より
なるソース電極及びドレイン電極とを含むことを特徴と
する超電導体電子装置。a superconductor crystal layer of a predetermined shape that is deposited on the surface of an insulating substrate and has a crystal plane exhibiting superconductivity two-dimensionally in a direction parallel to the surface; and a superconductor crystal layer provided on the superconductor crystal layer across the layer. A superconductor electronic device comprising: a pressure gate including a piezoelectric element; and a source electrode and a drain electrode made of a pair of conductive films deposited on the superconductor crystal layer with the pressure gate in between.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63029439A JPH0812935B2 (en) | 1988-02-09 | 1988-02-09 | Superconductor electronic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63029439A JPH0812935B2 (en) | 1988-02-09 | 1988-02-09 | Superconductor electronic device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01204484A true JPH01204484A (en) | 1989-08-17 |
| JPH0812935B2 JPH0812935B2 (en) | 1996-02-07 |
Family
ID=12276166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63029439A Expired - Lifetime JPH0812935B2 (en) | 1988-02-09 | 1988-02-09 | Superconductor electronic device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0812935B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01276681A (en) * | 1988-04-27 | 1989-11-07 | Sony Corp | Superconducting transistor |
| EP0569781A1 (en) * | 1992-05-11 | 1993-11-18 | Siemens Aktiengesellschaft | Superconducting device comprising two wires of high Tc superconductive material and a transition gap between them |
| JPH07235700A (en) * | 1994-02-23 | 1995-09-05 | Utsunomiya Univ | Superconductive super-lattice crystal device |
| JPH0888418A (en) * | 1994-09-10 | 1996-04-02 | Korea Electron Telecommun | Piezoelectric element using ultra-thin metal film |
| JP2001028465A (en) * | 1999-07-15 | 2001-01-30 | Sharp Corp | Superconducting element |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5455393A (en) * | 1977-10-13 | 1979-05-02 | Toshiba Corp | Electro-mechanical transducer |
| JPS5461864A (en) * | 1977-10-26 | 1979-05-18 | Matsushita Electric Ind Co Ltd | Logical element |
| JPS6414980A (en) * | 1987-07-09 | 1989-01-19 | Seiko Epson Corp | Superconducting transistor |
-
1988
- 1988-02-09 JP JP63029439A patent/JPH0812935B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5455393A (en) * | 1977-10-13 | 1979-05-02 | Toshiba Corp | Electro-mechanical transducer |
| JPS5461864A (en) * | 1977-10-26 | 1979-05-18 | Matsushita Electric Ind Co Ltd | Logical element |
| JPS6414980A (en) * | 1987-07-09 | 1989-01-19 | Seiko Epson Corp | Superconducting transistor |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01276681A (en) * | 1988-04-27 | 1989-11-07 | Sony Corp | Superconducting transistor |
| EP0569781A1 (en) * | 1992-05-11 | 1993-11-18 | Siemens Aktiengesellschaft | Superconducting device comprising two wires of high Tc superconductive material and a transition gap between them |
| JPH07235700A (en) * | 1994-02-23 | 1995-09-05 | Utsunomiya Univ | Superconductive super-lattice crystal device |
| JPH0888418A (en) * | 1994-09-10 | 1996-04-02 | Korea Electron Telecommun | Piezoelectric element using ultra-thin metal film |
| JP2001028465A (en) * | 1999-07-15 | 2001-01-30 | Sharp Corp | Superconducting element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0812935B2 (en) | 1996-02-07 |
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