JPH01207332A - Production of antistatic film - Google Patents

Abstract

PURPOSE:To obtain the title film having excellent antistatic properties and strength and useful as a packaging material for an electronic equipment related component, powder, etc., by subjecting a synthetic resin base material and antistatic agent to extrusion molding to form into a film and irradiating the resultant film with electron beams. CONSTITUTION:A synthetic resin base material (preferably PE based resin) and antistatic agent (preferably non-ionic surfactant) are extruded from an extruder to form into a film, which is then irradiated with electron beams, preferably in dose of 2-12Mrad to provide the aimed film. Furthermore, when irradiated, the above-mentioned film is preferably irradiated with electron beams in atmosphere of >=1000ppm oxyzen concentration.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing an antistatic film used as a packaging material for electronic equipment-related parts, powder, etc.

[Prior art and problems to be solved by the invention] - Synthetic resin films that do not contain antistatic agents in In are likely to be charged with static electricity, and the synthetic resin films cannot be used for packaging electronic equipment parts such as ICs, powders, etc. When used as a material, problems such as destruction of electronic equipment parts, adhesion of dust and powder, and poor workability may occur.

Conventionally, the most common countermeasures against this problem include coating the surface of the film with a surfactant as an antistatic agent and kneading the surfactant into the film. Kneading surfactants is mainly used. However, although this kneaded type antistatic film is relatively durable, it maintains its performance through migration of the antistatic agent, and due to its surface stickiness, it can only be used in an appropriate amount of antistatic performance. Moreover, most of the antistatic agents used are nonionic due to heat resistance, and the antistatic performance has not always been satisfactory. The object of the present invention is to provide a manufacturing method capable of obtaining an excellent antistatic film that eliminates the drawbacks of the prior art described above.

[Means to solve the problem]

The manufacturing method of the present invention has the following configuration in order to solve the above problems.

That is, (+) a synthetic resin base material and an antistatic agent are extruded from an extruder to form a synthetic resin film containing the antistatic agent,
A method for producing an antistatic film, which comprises subsequently irradiating the film with an electron beam.

(2) The method for producing an antistatic film according to claim 1, wherein the electron beam irradiation amount is 2 to 12 Mrad.

(3) The method for producing an antistatic film according to claim 1 or 2, wherein the electron beam is irradiated in an atmosphere with an oxygen concentration of 11,000 pp or more.

(4) The method for producing an antistatic film according to any one of claims 1 to 3, wherein the synthetic resin base material is a polyethylene resin.

The main points are as follows.

The synthetic resin base materials used in the present invention include polyethylene resins and polypropylene resins.

Examples include styrene resins, among which polyethylene resins are most preferred because they do not deteriorate even when irradiated with electron beams and can be crosslinked to increase strength.

In addition, as an antistatic agent, cationic surfactant is used.

Anionic surfactant, nonionic surfactant.

Examples include amphoteric surfactants, among which nonionic surfactants are most preferably used because the produced film has good heat resistance.

A mixture of a synthetic resin base material and an antistatic agent is inserted into an extruder and extruded by a known method to form a synthetic resin film containing an antistatic agent. The mixing ratio of the antistatic agent to 100 parts by weight of the resin is preferably 0.2 to 1.0 parts by weight.

In the present invention, the obtained film is irradiated with an electron beam to improve the antistatic performance of the film. If the amount of electron beam irradiation is too large, the film may be deformed and the antistatic performance may deteriorate, and if it is too small, there is no effect of improving the antistatic performance.
It is.

In addition, in the present invention, electron beam irradiation is performed at an oxygen concentration of 11,000p.
This is carried out in an atmosphere of p or higher. oxygen concentration is 100
The antistatic performance can be improved even if the electron beam is irradiated in an atmosphere with an oxygen concentration of less than 1000 pPlm.
The antistatic performance is dramatically improved when the electron beam is irradiated in one or more atmospheres.

〔Example〕

Hereinafter, the present invention will be explained in more detail with reference to Examples.

Examples 1-3. Comparative Examples 1 to 3 Low-density polyethylene pellets (NUC8505: manufactured by Nippon Unicar) and antistatic agent masterbatch (Nilecon PI)
! -2207 (manufactured by Dainichiseika Chemical Industry Co., Ltd.)) was mixed to an antistatic agent purity of 0.4% and inserted into an extruder, and a polyethylene film having a thickness of 50 μm was formed by a known method. This film was irradiated with an electron beam at the irradiation amount shown in Table 1 under the atmosphere shown in Table 1.

The surface resistance values of the film before and after electron beam irradiation were measured to determine the degree of improvement in antistatic performance (the lower the surface resistance value, the better the antistatic performance). A surface resistance value of 0 indicates high resistance. Total (STACKTR-3: Tokyo Electronics ■
Measurements were carried out using a 25°C, 150% RH condition using a

Table 1 [Effects of the Invention] As explained above, according to the production method of the present invention, it is possible to produce a film with excellent antistatic performance.

Further, by setting the electron beam irradiation amount to 2 to 12 Mrad, a film with excellent antistatic performance can be stably produced.

Further, by performing the electron beam irradiation in an atmosphere of 1000 ppm or more, a film with better antistatic performance can be produced.

Furthermore, by using a polyethylene resin as the synthetic resin base material, it becomes possible to produce a film with excellent strength.

Claims (4)

[Claims] (1) Extruding the synthetic resin base material and antistatic agent from an extruder,
A method for producing an antistatic film, which comprises forming a synthetic resin film containing an antistatic agent, and then irradiating the film with an electron beam. (2) The method for producing an antistatic film according to claim 1, wherein the electron beam irradiation amount is 2 to 12 Mrad. (3) The method for producing an antistatic film according to claim 1 or 2, wherein the electron beam is irradiated in an atmosphere with an oxygen concentration of 1000 ppm or more. (4) The method for producing an antistatic film according to any one of claims 1 to 3, wherein the synthetic resin base material is a polyethylene resin.