JPH01210470A - Conductive material and its production - Google Patents
Conductive material and its productionInfo
- Publication number
- JPH01210470A JPH01210470A JP3398788A JP3398788A JPH01210470A JP H01210470 A JPH01210470 A JP H01210470A JP 3398788 A JP3398788 A JP 3398788A JP 3398788 A JP3398788 A JP 3398788A JP H01210470 A JPH01210470 A JP H01210470A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- complex
- insulating support
- conductive layer
- conductive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 13
- 230000001070 adhesive effect Effects 0.000 claims abstract description 7
- 229920001225 polyester resin Polymers 0.000 claims abstract description 6
- 239000004645 polyester resin Substances 0.000 claims abstract description 6
- 229920000178 Acrylic resin Polymers 0.000 claims abstract description 5
- 239000004925 Acrylic resin Substances 0.000 claims abstract description 5
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229920006026 co-polymeric resin Polymers 0.000 claims abstract description 5
- 238000001035 drying Methods 0.000 claims abstract description 3
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 claims abstract 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000005977 Ethylene Substances 0.000 claims abstract 2
- 229920005989 resin Polymers 0.000 claims description 19
- 239000011347 resin Substances 0.000 claims description 19
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 17
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 11
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 9
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000002861 polymer material Substances 0.000 claims description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000005038 ethylene vinyl acetate Substances 0.000 claims description 5
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 claims description 5
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 2
- 239000003973 paint Substances 0.000 abstract description 8
- 239000013078 crystal Substances 0.000 abstract description 5
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract description 3
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 26
- 239000010408 film Substances 0.000 description 23
- 238000002834 transmittance Methods 0.000 description 15
- -1 electroluminescence Substances 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical group N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000012046 mixed solvent Substances 0.000 description 7
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- AWJUIBRHMBBTKR-UHFFFAOYSA-N iso-quinoline Chemical group C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical group 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- FHCPAXDKURNIOZ-UHFFFAOYSA-N tetrathiafulvalene Chemical compound S1C=CSC1=C1SC=CS1 FHCPAXDKURNIOZ-UHFFFAOYSA-N 0.000 description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 2
- WURBVZBTWMNKQT-UHFFFAOYSA-N 1-(4-chlorophenoxy)-3,3-dimethyl-1-(1,2,4-triazol-1-yl)butan-2-one Chemical compound C1=NC=NN1C(C(=O)C(C)(C)C)OC1=CC=C(Cl)C=C1 WURBVZBTWMNKQT-UHFFFAOYSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000002998 adhesive polymer Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000011532 electronic conductor Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 150000002537 isoquinolines Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- OZIRORHUKSXTLG-UHFFFAOYSA-N naphtho[1,2-h]quinoline Chemical compound C1=CC2=CC=CN=C2C2=C1C1=CC=CC=C1C=C2 OZIRORHUKSXTLG-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電気絶縁性支持体の表面に透明な導電性被膜を
有する導電性材料及びその製造方法に関するものである
。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a conductive material having a transparent conductive coating on the surface of an electrically insulating support and a method for producing the same.
(従来の技術)
近年の電子産業の発展に伴ない、ICやLSIに代表さ
れる半導体素子の高集積化が進み、機能が向上する半面
、静電気の放電によって損傷を受けやすくなっている。(Prior Art) With the development of the electronic industry in recent years, semiconductor elements such as ICs and LSIs have become highly integrated, and although their functionality has improved, they have also become more susceptible to damage by electrostatic discharge.
そのため、これらの半導体を用いた電子部品や電子回路
を静電気から保護しながら保存や搬送をするために、透
明な導電性包装材料が用いられている。一方、これらの
半導体素子を組み込んだ電子機器製品においては、量産
に伴なって筐体の大部分がプラスチックに移行し、特に
小型電子機器の筐体の大部分はプラスチックに代わって
いる。筐体のプラスチックは長地縁体であるために静電
気が帯電しやすく、この静電気対策が大きなテーマとな
っている。またプラスチック製の筐体は電磁波に対して
透明であるために、電子回路の高密度化、高周波化に伴
なって、電磁波シールド対策が重要な課題となっており
、安価なプラスチック製導電材料の出現が期待されてい
る。Therefore, transparent conductive packaging materials are used to store and transport electronic components and circuits using these semiconductors while protecting them from static electricity. On the other hand, with mass production, most of the housings of electronic equipment products incorporating these semiconductor elements have shifted to plastic, and in particular, most of the housings of small electronic equipment have been replaced with plastic. Because the plastic housing has long edges, it is easily charged with static electricity, and countermeasures against static electricity have become a major theme. In addition, plastic casings are transparent to electromagnetic waves, so as electronic circuits become more densely packed and operate at higher frequencies, electromagnetic shielding measures have become an important issue. It is expected that it will appear.
また電気受光素子分野の目覚ましい発展に伴ない、エレ
クトロルミネッセンス、液晶、エレクトロクロミンクな
どの固体デイスプレー、OHP用フィルム、スライドフ
ィルム、マイクロフィルムなどの電子写真記録および静
電記録体といった表示材料の分野の導電層としての用途
の応用が期待されている。In addition, with the remarkable development in the field of electric photodetectors, the field of display materials such as electroluminescence, liquid crystals, solid displays such as electrochromic, electrophotographic recordings such as OHP films, slide films, and microfilms, and electrostatic recording media. It is expected that it will be used as a conductive layer.
従来、絶縁性材料の表面を導電化する方法としては導電
性塗料、界面活性剤の使用、金属や金属酸化物等の蒸着
を挙げることができる。このうちカーボン粉末や金属系
粉末などをフィラーとして用いた導電性塗料はカーボン
粉末や金属粉末を高分子中に混入せしめた複合体であり
、比較的耐久性は有するが透明性に欠け、被塗工材の外
観を損ねたりするという欠点を有している。また界面活
性剤はイオン導電性であるために、静電気防止対策が特
に要求される環境条件下、つまり相対湿度の低い条件で
は有効な帯電防止効果が得られず、逆に相対湿度の高い
条件では表面がべとつくなど、性能の安定性に欠ける。Conventionally, methods for making the surface of an insulating material conductive include the use of conductive paints, surfactants, and vapor deposition of metals, metal oxides, and the like. Among these, conductive paints that use carbon powder, metal powder, etc. as fillers are composites in which carbon powder or metal powder is mixed into polymers, and although they are relatively durable, they lack transparency and are difficult to coat. It has the disadvantage of damaging the appearance of the workpiece. Furthermore, since surfactants are ionic conductors, they cannot provide effective antistatic effects under environmental conditions that require antistatic measures, that is, conditions with low relative humidity, and conversely, under conditions with high relative humidity. The surface is sticky and the performance is unstable.
また金属、特にITO(インジウム−スズ酸化物)のよ
うな金属酸化物の蒸着は透明性、導電性ともに充分な藩
校を得ることができるが、その蒸着設備に莫大な費用が
掛かり、結果として処理管が高価となる。In addition, the vapor deposition of metals, especially metal oxides such as ITO (indium-tin oxide), can provide sufficient transparency and conductivity, but the vapor deposition equipment is extremely expensive, and as a result, processing Tubes become expensive.
(発明が解決しようとする問題点)
本発明は、前記従来の技術的課題を背景になされたもの
であり、導電性の付与により支持体の持つ本来の強度や
外観を損なうことなく、又、その導電性が湿度依存性の
ない透明導電層を持ち、かつ支持体に対する密着性が良
好な導電性材料を提供することにある。(Problems to be Solved by the Invention) The present invention has been made against the background of the above-mentioned conventional technical problems, and aims to provide electrical conductivity without impairing the original strength or appearance of the support, and The object of the present invention is to provide a conductive material having a transparent conductive layer whose conductivity is not dependent on humidity and having good adhesion to a support.
(問題点を解決するための手段)
本発明者らは上記問題点を解決するため種々検討した結
果、電気絶縁性支持体と密着性のあるポリエステル系樹
脂、アクリル系樹脂、塩化ビニル−酢酸ビニル共重合樹
脂、エチレン−酢酸ビニル共重合樹脂の中の1種または
2種以上からなる高分子材料および?、7.8.8−テ
トラシフ/キ/ジメタン錯体(以下TCNQ錯体と略す
)を良溶媒に溶解して、透明導電層塗料を調整し、該透
明導電層塗料を該電気絶縁性支持体上に、塗布、噴霧、
または浸漬りどの方法で均一に付着させた後、該良溶媒
を留去してTCNQ錯体の微細な針状結晶が該高分子材
料中に網目状に析出した構造を持つ透明導電層を形成さ
せることによって、該電気絶縁性支持体の強度や外観を
損なうことなく導電性材料を製造することが可能となっ
た。本出願人は、密着性を有する高分子材料として、シ
リコン系樹脂、ウレタン系樹脂、塩化ビニル系樹脂を使
用した導電性材料の製造方法を先に出願したが、本発明
は、TCNQ錯体の密着性を改良したものである。(Means for Solving the Problems) As a result of various studies to solve the above problems, the present inventors found that polyester resins, acrylic resins, vinyl chloride-vinyl acetate resins, and polyester resins, which have adhesive properties with electrically insulating supports, and vinyl chloride-vinyl acetate resins. A polymeric material consisting of one or more of copolymer resins, ethylene-vinyl acetate copolymer resins, and ? , 7.8.8-tetrasif/ki/dimethane complex (hereinafter abbreviated as TCNQ complex) is dissolved in a good solvent to prepare a transparent conductive layer coating, and the transparent conductive layer coating is applied onto the electrically insulating support. , coating, spraying,
Alternatively, after uniformly adhering by dipping or other method, the good solvent is distilled off to form a transparent conductive layer having a structure in which fine needle-like crystals of the TCNQ complex are precipitated in the polymer material in the form of a network. This has made it possible to produce a conductive material without impairing the strength or appearance of the electrically insulating support. The present applicant has previously applied for a method for manufacturing a conductive material using a silicone resin, a urethane resin, or a vinyl chloride resin as a polymeric material having adhesive properties. It has improved characteristics.
本発明を更に詳しく説明すると、本発明に用いる電気絶
縁性支持体は汎用高分子材料、ガラス、木、紙、セラミ
ックなどを素材とするフィルムシートを含む成型体であ
る。汎用高分子材料としては特に限定されないが、例え
ば、ポリエチレン、ポリ塩化ビニル、ポリプロピレン、
ポリエチレンテレフタレート、ポリカーボネート、ポリ
7ツ化ビニリデン、ポリ四7フ化エチレン、ポリウレタ
ン、ポリイミドなどがある。電気絶縁性支持体の表面は
、コロナ放電処理、火炎処理、オゾン処理またはブライ
マー処理などを施して、該電気絶縁性支持体と密着性の
ある高分子材料の密着性を更に高めるための表面処理を
行なったものも用いることができる。To explain the present invention in more detail, the electrically insulating support used in the present invention is a molded body containing a film sheet made of a general-purpose polymeric material, glass, wood, paper, ceramic, or the like. General-purpose polymer materials include, but are not particularly limited to, polyethylene, polyvinyl chloride, polypropylene,
Examples include polyethylene terephthalate, polycarbonate, polyvinylidene heptadide, polytetrafluoroethylene, polyurethane, and polyimide. The surface of the electrically insulating support is subjected to corona discharge treatment, flame treatment, ozone treatment, or brimer treatment to further enhance the adhesion between the electrically insulating support and the adhesive polymer material. Those that have been subjected to this can also be used.
本発明に用いる電気絶縁性支持体と密着性のある高分子
材料は、エポキシ系、フェノール系、アクリル系、ポリ
エステル系、アルキド系、ウレタン系、シリコン系、合
成ゴム系、塩化ビニル系、酢酸ビニル系、塩化ビニル−
酢酸ビニル共重合体系、エチレン−酢酸ビニル共重合体
系の樹脂があるが、該支持体との密着性および薄膜成型
性、透明性を考慮し、又、樹脂中のTCNQ錯体の安定
性を考慮すると、ポリエステル系、アクリル系、塩化ビ
ニル−酢酸ビニル共重合体系、エチレン−酢酸ビニル共
重合体系の樹脂が望ましい。また被膜特性を改善するた
めに、これらの樹脂中にシリコンや70ロアルキル基な
どの疎水基を導入したり、カルボキシル基やヒドロキシ
ル基などの官能基を導入するなどの改質を行なったもの
も使用することができる。又、必要に応じてこれらの樹
脂を2種類以上混合したり、インシアネートや/チロー
ルメラミンなどの架橋剤を混合することができる。The polymer materials that are adhesive to the electrically insulating support used in the present invention include epoxy, phenol, acrylic, polyester, alkyd, urethane, silicone, synthetic rubber, vinyl chloride, and vinyl acetate. system, vinyl chloride-
There are resins based on vinyl acetate copolymer and ethylene-vinyl acetate copolymer, but considering the adhesion with the support, thin film formability, and transparency, and the stability of the TCNQ complex in the resin, , polyester-based, acrylic-based, vinyl chloride-vinyl acetate copolymer-based, and ethylene-vinyl acetate copolymer-based resins are desirable. In addition, in order to improve film properties, these resins are modified by introducing hydrophobic groups such as silicone or 70-roalkyl groups, or functional groups such as carboxyl groups or hydroxyl groups. can do. Furthermore, if necessary, two or more of these resins may be mixed, or a crosslinking agent such as incyanate or tyrolmelamine may be mixed.
本発明に用いるTCNQ錯体は電荷移動錯体の一種であ
り、電子供与体(ドナー)と電子受容体(アクセプター
)とから構成され、電子受容体はTCNQである。電子
供与体としては、テトラチアフルバレン(TTF)に代
表されるカルコゲンをその骨格中に含むフルバレン類、
テトラメチルアンモニウムに代表される四級アンモニウ
ム、キノリンやイソキノリンに代表される複素環窒素化
合物のN位をアルキル基等で置換した化合物などがある
。The TCNQ complex used in the present invention is a type of charge transfer complex, and is composed of an electron donor and an electron acceptor, and the electron acceptor is TCNQ. Examples of electron donors include fulvalenes containing chalcogen in their skeleton, typified by tetrathiafulvalene (TTF);
Examples include quaternary ammonium typified by tetramethylammonium, and compounds in which the N-position of a heterocyclic nitrogen compound typified by quinoline and isoquinoline is substituted with an alkyl group.
熱安定性、導電性及び結晶の析出しやすさを考慮すると
、これらの電子供与体のうち、キノリン、イソキノリン
、ナフトキノリン、2.2’−ビビリノル、4.4’−
ビピリジルまたはそのN位を炭素数1〜8のアルキル基
で置換したものが好ましく、更に好ましくは、キノリン
、イソキノリンのN位を炭素数1〜8のアルキル基で置
換した化合物である。即ち、好ましいTCNQ錯体とは
例えば、N−メチルキノリニウム−TCNQ錯体、N−
メチルインキノリニウム−TCNQ錯体、N−一エチル
キノリニウムーTCNQ錯体、N−エチルインキノリニ
ウム−TCNQ錯体、N−n−プロビルキ/リニウム−
TCNQ錯体、N−n−プロビルイソキ/リニウム−T
CNQ錯体、N−1so−プロピルキノリニウム−TC
NQ錯体、N−1so−プロピルインキ/リニウム−T
CNQ錯体、N−「−ブチルキ/リニウム−TCNQI
i体、Nn−1so−ブチルイソキノリニウム−TCN
Q錯イ本、N−n−アミルキ/リニウム−TCNQ錯体
、N−n−7ミルインキ/リニウム−TCNQ錯体、N
1so−アミルキノリニウム−TCNQ錯体、N−
1so−アミルインキノリニウム−TCNQ錯体、N−
n−オクチルキノ゛リニウムーTCNQ錯1本、N−n
−オクチルイソ斗/リニウムーTCNQ錯体なとである
。以上例示したTCNQ錯体は特に本発明において好適
であるが、本発明におけるTCNQ錯体はこれらの例に
より何等限定されるものではない。Considering thermal stability, electrical conductivity, and ease of crystal precipitation, among these electron donors, quinoline, isoquinoline, naphthoquinoline, 2.2'-bibylinor, 4.4'-
Bipyridyl or a compound in which the N-position thereof is substituted with an alkyl group having 1 to 8 carbon atoms is preferred, and more preferably a compound in which the N-position of quinoline or isoquinoline is substituted with an alkyl group having 1 to 8 carbon atoms. That is, preferred TCNQ complexes include, for example, N-methylquinolinium-TCNQ complex, N-
Methylinquinolinium-TCNQ complex, N-ethylquinolinium-TCNQ complex, N-ethylquinolinium-TCNQ complex, Nn-probylquinolinium-TCNQ complex, N-n-probylquinolinium-TCNQ complex,
TCNQ complex, N-n-probylisoqui/linium-T
CNQ complex, N-1so-propylquinolinium-TC
NQ complex, N-1so-propyl ink/linium-T
CNQ complex, N-'-butylki/linium-TCNQI
i-form, Nn-1so-butylisoquinolinium-TCN
Q complex, N-n-amilky/linium-TCNQ complex, N-n-7milky/linium-TCNQ complex, N
1so-amylquinolinium-TCNQ complex, N-
1so-amyl quinolinium-TCNQ complex, N-
1 n-octylquinolinium-TCNQ complex, N-n
-Octyl isoto/linium-TCNQ complex. The TCNQ complexes exemplified above are particularly suitable in the present invention, but the TCNQ complexes in the present invention are not limited in any way by these examples.
キノリンやイソキノリン系化合物を電子供与体とするT
CNQ錯体はTCNQが混合原子価状態をとることによ
り高い導電性を示す。そのために、本発明におけるTC
NQ錯体は電子供与体1モルに対してTCNQを1モル
以上であることが好まQ中性分子の0.1〜10重量%
を該TCNQ錯体の他に添加するのが好ましい。T using quinoline or isoquinoline compounds as electron donors
The CNQ complex exhibits high conductivity due to the mixed valence state of TCNQ. For this purpose, TC in the present invention
The NQ complex preferably contains 1 mol or more of TCNQ per 1 mol of the electron donor, preferably 0.1 to 10% by weight of the Q neutral molecule.
is preferably added in addition to the TCNQ complex.
本発明における導電性材料の製造方法について説明する
。A method for manufacturing a conductive material in the present invention will be explained.
電気絶縁性支持体と密着性のある高分子材料およびTC
NQ錯体を、高分子材料 1重量部当たりTCNQ錯体
0.05〜4重量部、より好ましくは0.1〜4重量部
となるように良溶媒に溶解して導電層塗料を調整する。Polymer material and TC that are adhesive to electrically insulating support
A conductive layer coating material is prepared by dissolving the NQ complex in a good solvent in an amount of 0.05 to 4 parts by weight, more preferably 0.1 to 4 parts by weight, of the TCNQ complex per 1 part by weight of the polymer material.
この導電層塗料を塗布、噴霧または浸漬などの方法を用
いて該電気絶縁性支持体上に均一に付着させた後、20
〜300°C1より好ましくは50〜150℃で常圧ま
たは減圧で乾燥することにより、該電気絶縁性支持体の
表面に透明導電層を有する導電性材料が得られる。又、
このようにして得られた導電性材料の導電層の諸物性を
向上するために、加温放置などの手段によりエージング
を行なうことができる。After this conductive layer paint was uniformly deposited on the electrically insulating support using a method such as coating, spraying or dipping,
A conductive material having a transparent conductive layer on the surface of the electrically insulating support can be obtained by drying at a temperature of ~300° C., preferably 50° C. to 150° C., under normal pressure or reduced pressure. or,
In order to improve various physical properties of the conductive layer of the conductive material thus obtained, aging can be carried out by means such as heating and leaving.
また本発明における高分子材料とTCNQ錯体を良溶媒
に溶解した透明導電層塗料は、一般塗料を用いるときの
表面加工と同様に、ロールツータレ−による噴霧、浸漬
法などの加工法が可能である。Furthermore, the transparent conductive layer paint in which the polymeric material and TCNQ complex of the present invention are dissolved in a good solvent can be processed by methods such as spraying using a roll-to-talley method and dipping method, similar to the surface processing when using a general paint.
本発明に用いる良溶媒は、TCNQ錯体の良溶媒(、)
と高分子材料の良溶媒(b)の混合溶媒を用い、両者に
対して良溶媒であれば単一溶媒でもよく、また一般に高
分子系結着剤を含む塗料においては、良好な被膜を得る
ために、該高分子系結着剤が溶解しにくい溶媒を希釈剤
として添加することが可能である。The good solvent used in the present invention is a good solvent for TCNQ complex (,)
A mixed solvent of (b) and a good solvent for polymeric materials is used, and a single solvent may be used as long as it is a good solvent for both.In general, in paints containing polymeric binders, a good film can be obtained. Therefore, it is possible to add a solvent in which the polymeric binder is difficult to dissolve as a diluent.
TCNQ錯体は一般に強極性溶媒に対する溶解度が高い
。本発明における良溶媒(a)としては溶解後の安定性
、導電層を形成する際の針状結晶の析出し易さから、ア
セトニトリル、アセトン、ベンゾニトリル、ジメチルホ
ルムアミド、ジメチルアセトアミド、ジメチルスルホキ
シドが好ましい。TCNQ complexes generally have high solubility in strong polar solvents. As the good solvent (a) in the present invention, acetonitrile, acetone, benzonitrile, dimethylformamide, dimethylacetamide, and dimethylsulfoxide are preferred from the viewpoint of stability after dissolution and ease of precipitation of needle-like crystals when forming a conductive layer. .
良溶媒(b)お上り希釈剤は、一般に該高分子材レンな
どの芳香族炭化水素類、酢酸エチル、酢酸ブチルなどの
エステル類、アセトン、メチルエチルケトンなどのケト
ン類、エチルアルコール、イソプロピルアルコールなど
のアルコール類、イソプロピルエーテル、ジオキサンな
どのエーテル類、シクロヘキサン、ヘキサンなどの脂肪
族炭化水素類などの1種または2種以上を混合して用い
ることができる。The good solvent (b) diluent is generally aromatic hydrocarbons such as the polymeric material, esters such as ethyl acetate and butyl acetate, ketones such as acetone and methyl ethyl ketone, ethyl alcohol, isopropyl alcohol, etc. One type or a mixture of two or more types of alcohols, ethers such as isopropyl ether and dioxane, and aliphatic hydrocarbons such as cyclohexane and hexane can be used.
(実施例)
以下実施例により本発明を具体的に説明するが、本発明
はこれらの実施例に限定されるものではない。尚、以下
の実施例において記す導電性材料の評価方法は次のとお
りである。(Examples) The present invention will be specifically explained below with reference to Examples, but the present invention is not limited to these Examples. In addition, the evaluation method of the conductive material described in the following examples is as follows.
(1)表面抵抗率はJIS K−6911に準拠し、
(2)透過率は日立製Ll−3200型自記分光光度計
を用いて550nI11における透過率を測定した。(1) Surface resistivity is based on JIS K-6911,
(2) Transmittance was measured at 550 nI11 using a Hitachi model Ll-3200 self-recording spectrophotometer.
(3)密着性はクロスカットセロハンテープ剥離試験に
より測定した。即ち、透明導電層に支持体に達する切断
線をllll11間隔で縦WL11本人れて、1−m2
の正方形のます目を100個作り、その上になかったま
す目の数を百分率で表わして密着性とし′だ。(3) Adhesion was measured by a cross-cut cellophane tape peel test. That is, cutting lines reaching the support are placed on the transparent conductive layer at intervals of 11 mm, and the width is 1-m2.
Make 100 square squares, and express the number of squares that are not there as a percentage to determine the adhesion.
実施例l
N−n−ブチルイソキノリニウム−TCNQ錯体 1重
量部、TCNQO1O5重量部、およびポリエステル系
樹脂(束し製、ケミツ)K−1089、固形分100%
)2重量部をN、N−ジメチルアセトアミド 30重量
部、メチルエチルケトン 2.3重量部、トルエン 2
.3重量部及び酢酸ブチル 62,35重量部からなる
混合溶媒に完全に溶解し、ポリエチレンテレフタレート
フィルム(余人社製、75μm、 Sタイプ、透過率8
1.5%、以下PETフィルムと略す)に#8のバーコ
ーターを用いて塗布した後、100℃で乾燥して透明導
電性フィルムを得た。このフィルムの表面抵抗率は8.
8X10’Ω/口、光の透実施例2
N−11−プチルイソキノリニ1ンムーT CN Q
錯体 1重量部、及びポリエステル系O(脂(東し製、
乍ミツトに−1089、固形分100%)3重量BW
s N + N ’−ジメチルホルムアミド 25重量
部及びアセトン 71重量部からなる混合溶媒に溶解し
た。この溶液にスライドグラスを浸漬後、150℃で乾
燥し、導電性ガラスを得た。表面抵抗率は2.3X10
1Ω/口、光の透過率は93.6%であった。また密着
性°は85%であった。Example 1 1 part by weight of N-n-butylisoquinolinium-TCNQ complex, 5 parts by weight of TCNQO1O, and polyester resin (Tanushi Seisaku, Chemitsu) K-1089, solid content 100%
) 2 parts by weight, N,N-dimethylacetamide 30 parts by weight, methyl ethyl ketone 2.3 parts by weight, toluene 2 parts by weight
.. Polyethylene terephthalate film (manufactured by Yojin Co., Ltd., 75 μm, S type, transmittance 8) was completely dissolved in a mixed solvent consisting of 3 parts by weight and 62.35 parts by weight of butyl acetate.
1.5% (hereinafter abbreviated as PET film) using a #8 bar coater, and dried at 100° C. to obtain a transparent conductive film. The surface resistivity of this film is 8.
8X10'Ω/hole, light transmission Example 2 N-11-butylisoquinolinium T CN Q
1 part by weight of the complex, and polyester O (fat (manufactured by Toshi),
乍MITSUTO-1089, solid content 100%) 3 weight BW
It was dissolved in a mixed solvent consisting of 25 parts by weight of sN+N'-dimethylformamide and 71 parts by weight of acetone. A slide glass was immersed in this solution and then dried at 150°C to obtain a conductive glass. Surface resistivity is 2.3X10
1Ω/mouth, the light transmittance was 93.6%. Moreover, the adhesion degree was 85%.
実施例3
N−n−ブチルイソキノリニウム−TCNQCN上1重
量部、TCNQ O,05重量部、及び塩化ビニル−
酢酸ビニル共重合体系樹脂(セメダイン社製、セメダイ
ン181、固形分30%)1゜5重量部をジメチルスル
ホキシド 35重量部及びアセトニトリル 63.45
重量部の混合溶媒に溶解し、これを表面をコロナ放電処
理したポリプロピレンフィルム(チッソ社iJ、$$4
0FAK、40μ「0、未延伸、透過率87.6%)の
表面に#×105Ω/口、光の透過率は82.1%であ
った。Example 3 1 part by weight of N-n-butylisoquinolinium-TCNQCN, 5 parts by weight of TCNQ O, and vinyl chloride-
1.5 parts by weight of vinyl acetate copolymer resin (manufactured by Cemedine Co., Ltd., Cemedine 181, solid content 30%), 35 parts by weight of dimethyl sulfoxide and 63.45 parts by weight of acetonitrile.
A polypropylene film (Chisso iJ, $4
The surface of 0FAK, 40μ (0, unstretched, transmittance 87.6%) was #×105Ω/hole, and the light transmittance was 82.1%.
また密着性は100%であった。Moreover, the adhesion was 100%.
実施例4
N−n−ブチルイソキノリニウム−TCNQCN上1重
量部、TCNQ 0.05重量部、及び塩化ビニル−
酢酸ビニル共重合体系わ(脂(セメダイン社製、セメダ
イン181、固形分30%)3重量部をジメチルホルム
アミド 30重量部及びベンゾニトリル 22.95重
量部及び酢酸ブチル45重量部からなる混合溶媒に溶解
し、この溶液をPETフィルム(余人製、6 u m、
S type、透過率83.7%)の表面にリバース
コーターを用いて塗布した後、120℃で乾燥して透明
な導電性フィルムを得た。表面抵抗率は1.8X106
Ω/口であり、透過率は77.7%であった。また密着
性は100%であった。Example 4 1 part by weight of N-n-butylisoquinolinium-TCNQCN, 0.05 part by weight of TCNQ, and vinyl chloride-
3 parts by weight of vinyl acetate copolymer (fat (manufactured by Cemedine Co., Ltd., Cemedine 181, solid content 30%) was dissolved in a mixed solvent consisting of 30 parts by weight of dimethylformamide, 22.95 parts by weight of benzonitrile, and 45 parts by weight of butyl acetate. This solution was then transferred to a PET film (manufactured by others, 6 um,
The film was coated on the surface of the film (transmittance: 83.7%) using a reverse coater, and then dried at 120° C. to obtain a transparent conductive film. Surface resistivity is 1.8X106
Ω/mouth, and the transmittance was 77.7%. Moreover, the adhesion was 100%.
70%RH,及び30℃、25%R1−1のそれぞれの
環境に設定した恒温恒温室中に置き、表面抵抗率を測定
した。その結果、20℃、70%RHにおける表面抵抗
率は1.8X106Ω/口、30 ’C125%RHに
おける表面抵抗率も1.8X1+戸Ω/口であった。It was placed in a thermostatic chamber set at 70% RH, 30° C., and 25% R1-1, and the surface resistivity was measured. As a result, the surface resistivity at 20° C. and 70% RH was 1.8×10 6 Ω/hole, and the surface resistivity at 30′C and 125% RH was also 1.8×1+ohm/hole.
実施例6〜1O
N−n−アミルインキノリニウム−TCNQCN上TC
NQ、アクリル系樹脂(綜研化学製5tJ−100A、
固形分50%)及びイソシアネート系架橋剤(日本ポリ
ウレタン製、フロネートし、固形分75%)をN、N’
−ツメチルホルムアミドと酢酸ブチルの混合溶媒に第1
表の組成で溶解した。PETフィルム(余人製、50
μs、H8type。Examples 6-1O TC on N-n-amyl quinolinium-TCNQCN
NQ, acrylic resin (Soken Chemical 5tJ-100A,
N, N'
- A mixed solvent of methylformamide and butyl acetate
It was dissolved according to the composition shown in the table. PET film (manufactured by others, 50
μs, H8 type.
透過率87.3%)上に#8のバーツーターを用いて塗
布した後、150℃で乾燥して導電性フィルムを得た。The conductive film was coated on the film (transmittance: 87.3%) using a #8 bar tool and dried at 150°C to obtain a conductive film.
表面抵抗率及び透過率を第1表に示した。密着性はいず
れも100%であった。又、第1図にはTCNQCN上
対する樹脂成分の比と表面抵抗率の関係を示した。The surface resistivity and transmittance are shown in Table 1. Adhesion was 100% in all cases. Further, FIG. 1 shows the relationship between the ratio of resin components to TCNQCN and surface resistivity.
実施例11〜16
N−iso−7ミルイソキノリニウム−TCNQ錯体、
TCNQ及びエチレン−酢酸ビニル共重合体系樹脂(日
本合成化学工業製、ンアレックスBH)をN、N’−ジ
メチルホルムアミドとトルエン、酢酸ブチルの混合溶媒
に第2表の組成で溶解した。Examples 11-16 N-iso-7 milisoquinolinium-TCNQ complex,
TCNQ and an ethylene-vinyl acetate copolymer resin (manufactured by Nippon Gosei Kagaku Kogyo Co., Ltd., Nurex BH) were dissolved in a mixed solvent of N,N'-dimethylformamide, toluene, and butyl acetate in the composition shown in Table 2.
これを市販のポリエチレン袋(生産日本社製、ユニバッ
ク)の表面に#8のバーコーターで塗布し、60℃で乾
燥して導電性袋を得た。得られた導電錯体に対する樹脂
成分の比と表面抵抗率の関係を示した。This was applied to the surface of a commercially available polyethylene bag (manufactured by Seisaku Nippon Sha Co., Ltd., Univac) using a #8 bar coater, and dried at 60°C to obtain a conductive bag. The relationship between the ratio of the resin component to the obtained conductive complex and the surface resistivity is shown.
比較例l
Nn−ブチルイソキ7リニツムーTCNQ錯体 1重量
部、TCNQ 0105重量部及びシリコーンO(脂
(信越化学社製 KS−772)1重量部をメチルエチ
ルケトン 17.5重量部、トルエン 20重量部、n
−へブタン 10.5重量部、ア透過率(λ=550n
m)87.3%)上に#8のバーコーターを用いて塗布
し、風乾して導電性フィルムを得た。このフィルムの表
面抵抗率は3.8×106Ω/口であり、透過率は83
.0%であった。密着性は60%であった。Comparative Example 1 1 part by weight of Nn-butylisoqui7linium TCNQ complex, 1 part by weight of TCNQ 0105, and 1 part by weight of silicone O (fat (KS-772, manufactured by Shin-Etsu Chemical Co., Ltd.), 17.5 parts by weight of methyl ethyl ketone, 20 parts by weight of toluene, n
- Hebutane 10.5 parts by weight, a transmittance (λ=550n
m) 87.3%) using a #8 bar coater and air-dried to obtain a conductive film. The surface resistivity of this film is 3.8 x 106Ω/hole, and the transmittance is 83
.. It was 0%. Adhesion was 60%.
比較例2
Nn−ブチルイソキ/リニウム−TCNQ錯体 1.0
4重量部、TCNQ O,053重量部及びウレタン
樹脂(東洋モートン社製 AD335A)1.2重量部
を1,4−ジオキサン 2.6重量部、7セ)ニトリル
45重量部、及びジメチルホルムアミド 50重量部
からなる混合溶媒に完全に溶解した。これを表面をコロ
ナ放電処理した40μmのポリプロピレンフィルム(チ
ッソ製、#40FAK、未延伸、透過率(λ=550n
m)87.6%)の表面に#8のバーコーターで塗布し
た後、温風にて乾燥して導電性フィルムを得た。このフ
ィルムの表面抵抗率は4.6×105Ω/口であり、透
過率は83.9%であった。密着性は75%であった。Comparative Example 2 Nn-butylisoqui/linium-TCNQ complex 1.0
4 parts by weight, 53 parts by weight of TCNQ O, 053 parts by weight, and 1.2 parts by weight of urethane resin (AD335A manufactured by Toyo Morton Co., Ltd.), 2.6 parts by weight of 1,4-dioxane, 45 parts by weight of 7C nitrile, and 50 parts by weight of dimethylformamide. completely dissolved in a mixed solvent consisting of 1. This is a 40 μm polypropylene film (manufactured by Chisso, #40FAK, unstretched, transmittance (λ = 550n) whose surface has been subjected to corona discharge treatment.
m) 87.6%) using a #8 bar coater, and dried with warm air to obtain a conductive film. The surface resistivity of this film was 4.6×10 5 Ω/hole, and the transmittance was 83.9%. Adhesion was 75%.
1)E
・′1゛皆較例3
’s、;7N−iso−プロビルキハニウムーTCNQ
錯体 1重量部及びポリ塩化ビニル 2重量部をジメチ
ルホルムアミド 100重量部に溶解させた。1) E ・'1゛Comparative Example 3's; 7N-iso-probylkihanium-TCNQ
1 part by weight of the complex and 2 parts by weight of polyvinyl chloride were dissolved in 100 parts by weight of dimethylformamide.
この溶液を50μmの透明ポリエチレンテレフタレート
フィルム(音大製、HS type、透過率(λ=55
0nm)87.3%)上に#8のバーコーターを用いて
塗布し、温風にて乾燥して導電性フィルムを得た。この
フィルムの表面抵抗率は8,7×105Ω/口であり、
透過率は79.4%であった。This solution was transferred to a 50 μm transparent polyethylene terephthalate film (manufactured by Music University, HS type, transmittance (λ = 55).
(0 nm) 87.3%) using a #8 bar coater and dried with warm air to obtain a conductive film. The surface resistivity of this film is 8.7 x 105Ω/hole,
The transmittance was 79.4%.
また密着性は60%であった。Moreover, the adhesion was 60%.
(発明の効果)
本発明の導電性材料は、その導電性が該導電性材料の透
明導電層中において、TCNQ錯体の微細な針状結晶が
網目状に析出することにより発現するため、本質的に電
子伝導であり、その導電性には湿度依存性は無い。また
TCNQ錯体及び高分子材料を完全に良溶媒に溶解した
後に電気絶縁透明性に優れ、該電気絶縁性支持体の形状
、外観を損なうことなく導電性材料を得ることが可能と
なった。更に、TCNQ錯体と高分子材料の混合比を変
えることによって、104〜1012Ω/口の範囲で導
電性材料の表面抵抗率を任意に設定することが可能とな
った。(Effects of the Invention) The electrical conductivity of the electrically conductive material of the present invention is expressed by the precipitation of fine acicular crystals of the TCNQ complex in a network in the transparent conductive layer of the electrically conductive material. It is an electronic conductor, and its conductivity has no humidity dependence. Further, after completely dissolving the TCNQ complex and the polymeric material in a good solvent, it became possible to obtain an electrically conductive material with excellent electrically insulating transparency without impairing the shape or appearance of the electrically insulating support. Furthermore, by changing the mixing ratio of the TCNQ complex and the polymer material, it has become possible to arbitrarily set the surface resistivity of the conductive material in the range of 104 to 1012 Ω/hole.
第1図及び第2図は、本発明の導電性材料においてその
透明導電層を構成するTCNQ錯体に対する樹脂成分の
比と、該導電性材料の表面抵抗率の関係を示したもので
ある。
特許出願人 日本カーリット株式会社
′IP31 図
TCN(l錯イ本に対″fる樹脂成分の比12図FIGS. 1 and 2 show the relationship between the ratio of the resin component to the TCNQ complex constituting the transparent conductive layer of the conductive material of the present invention and the surface resistivity of the conductive material. Patent applicant Nippon Carlit Co., Ltd.'IP31 Figure TCN (Ratio of resin component of l complex to 'f' resin component 12)
Claims (3)
料において、該透明導電層が該電気絶縁性支持体と密着
性のあるポリエステル系樹脂、アクリル系樹脂、塩化ビ
ニル−酢酸ビニル共重合樹脂、エチレン−酢酸ビニル共
重合樹脂の中の1種または2種以上からなる高分子材料
と7,7,8,8−テトラシアノキノジメタン錯体との
複合体からなり、該7,7,8,8−テトラシアノキノ
ジメタン錯体が該高分子材料の1重量部に対して0.0
5〜4重量部であることを特徴とする導電性材料。1. In a conductive material in which a transparent conductive layer is provided on an electrically insulating support, the transparent conductive layer is a polyester resin, an acrylic resin, or a vinyl chloride-vinyl acetate copolymer resin that has adhesive properties with the electrically insulating support. , a composite of a polymeric material consisting of one or more of ethylene-vinyl acetate copolymer resins and a 7,7,8,8-tetracyanoquinodimethane complex, the 7,7,8 , 8-tetracyanoquinodimethane complex is 0.0 part by weight of the polymer material.
5 to 4 parts by weight of an electrically conductive material.
材料の製造方法において、該電気絶縁性支持体と密着性
のあるポリエステル系樹脂、アクリル系樹脂、塩化ビニ
ル−酢酸ビニル共重合樹脂、エチレン−酢酸ビニル共重
合樹脂の中の1種または2種以上からなる高分子材料の
1重量部を7,7,8,8−テトラシアノキノジメタン
錯体の0.05〜4重量部とともに7,7,8,8−テ
トラシアノキノジメタン錯体の良溶媒を含む溶剤中に溶
解して、透明導電層塗料を調整し、該透明導電層塗料を
該電気絶縁性支持体上に塗工した後、乾燥して透明導電
層を形成する工程からなる導電性材料の製造方法。2. In a method for producing a conductive material in which a transparent conductive layer is provided on an electrically insulating support, a polyester resin, an acrylic resin, a vinyl chloride-vinyl acetate copolymer resin, an ethylene resin, which has adhesive properties with the electrically insulating support, - 1 part by weight of a polymeric material consisting of one or more types of vinyl acetate copolymer resins together with 0.05 to 4 parts by weight of a 7,7,8,8-tetracyanoquinodimethane complex, After dissolving the 7,8,8-tetracyanoquinodimethane complex in a solvent containing a good solvent to prepare a transparent conductive layer coating, and coating the transparent conductive layer coating on the electrically insulating support. . A method for producing a conductive material comprising the steps of drying to form a transparent conductive layer.
ル、ジメチルホルムアミド、ジメチルアセトアミド、ジ
メチルスルホキシドの少なくとも1種または2種以上を
含む特許請求の範囲第2項記載の導電性材料の製造方法
。3. 3. The method for producing a conductive material according to claim 2, wherein the good solvent contains at least one or more of acetonitrile, acetone, benzonitrile, dimethylformamide, dimethylacetamide, and dimethyl sulfoxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3398788A JPH01210470A (en) | 1988-02-18 | 1988-02-18 | Conductive material and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3398788A JPH01210470A (en) | 1988-02-18 | 1988-02-18 | Conductive material and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01210470A true JPH01210470A (en) | 1989-08-24 |
Family
ID=12401829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3398788A Pending JPH01210470A (en) | 1988-02-18 | 1988-02-18 | Conductive material and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01210470A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05277957A (en) * | 1992-04-02 | 1993-10-26 | Nippon Micro Kooteingu Kk | Electrification preventing polishing sheet |
| US5700399A (en) * | 1993-12-29 | 1997-12-23 | Nitto Chemical Industry Co., Ltd. | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers |
-
1988
- 1988-02-18 JP JP3398788A patent/JPH01210470A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05277957A (en) * | 1992-04-02 | 1993-10-26 | Nippon Micro Kooteingu Kk | Electrification preventing polishing sheet |
| US5700399A (en) * | 1993-12-29 | 1997-12-23 | Nitto Chemical Industry Co., Ltd. | Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers |
| US5932144A (en) * | 1993-12-29 | 1999-08-03 | Mitsubishi Rayon Co., Ltd. | Soluble aniline conducting polymers |
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