JPH01228575A - Spin coater - Google Patents

Abstract

PURPOSE:To improve the uniformity of the thickness of the film and to prevent a coating solution from turning toward the back of the sample having any shape by simultaneously rotating a sample stand, the cup covering the peripheral space of the sample stand and a lid around the same rotary shaft. CONSTITUTION:At least a sample stand 2 for fixing a sample 5 to which a film must be formed, the cup 1 covering the peripheral space of the sample stand 2 and a lid 4 are set as constitutional elements. The sample stand 2, the cup 1 and the lid 4 are simultaneously rotated around the same rotary shaft. As a result, since an air stream is not disturbed, a film having a uniform thickness can be formed to the surface of the sample and, since the air stream flowing to the rear of the sample with the rotation of the sample is not generated, the film is also prevented from curling toward the rear of the sample.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to the structure of a spin coater used for applying resist to Si wafers, glass substrates for liquid crystal devices, and the like.

[Prior art 1] The structure of a conventional spin coater is that, as shown in FIG. The cup 1 that covered the area around the sample stage had a fixed and independent structure.

[Problems to be Solved by the Invention] However, in the above-mentioned conventional technology, when the sample shape is not round, the coating thickness on the sample is not uniform, and the coating liquid may go around to the back surface of the sample. There is a problem. The present invention is intended to solve these problems, and its purpose is to:

The purpose of the present invention is to provide a spin coater that has good uniformity in coating thickness on a sample (and does not cause the coating liquid to run around to the back surface of the sample, regardless of the shape of the sample).

[Means for Solving the Problems J] The spin coater of the present invention includes at least a sample stage for fixing a sample on which a coating film is to be formed, a cup and a lid for covering a space around the sample stage, and the spin coater comprises:
Feature 1: According to the above-described structure of the present invention, the sample and the surrounding gas rotate together. Because the airflow around the sample is not disturbed, uneven air drying does not occur, and no airflow flows into the back surface of the sample as the sample rotates. Therefore, the uniformity of the coating film thickness on the sample is good, and the coating liquid does not run around to the back surface of the sample.

[Example 1] An example of the spin coater of the present invention will be described with reference to FIG. FIG. 1 is a sectional view of the spin coater of this embodiment. The cup 1 is a part that covers the area around the sample 5, and is a part that catches and stores the coating liquid that has been scattered from the edge of the sample due to rotation to prevent it from re-attaching to the sample. It is integrated with the connecting portion 3 that transmits rotation. When the lid 4 is closed, it is integrated with the cup 1 to make the space around the sample stage a closed space. Using the spin coater shown in Figure 1, the thickness of the sample is 0.1 = 1.
00auw, glass substrates with openings of 5 to 1000++n+, Si wafers of φ3 to 8 inches, triangular, square, pentagonal, hexagonal, heptagonal, and hexagonal glass substrates are used.
Commercially available positive and negative photoresists with a viscosity of 3 to 20
0 cp, dropping amount 0.1-1000 cc, spin coater rotation conditions 10-8000 rpIl, o, t-
When the spin code was run for too many seconds, a uniform film thickness was obtained for all samples up to the vicinity of the end surface of the sample, and there was no leakage of the coating liquid to the back surface of the sample.

[Comparative Example] FIG. 2 is a sectional view of a conventional spin coater. The cup l covers the area around the sample 5 and is stopped to prevent the coating liquid that has been scattered from the edge of the sample due to rotation from re-adhering to the sample.
It is a storage part and is fixed and independent of the rotation of the sample 5, so it does not rotate. The sample stage 2 for fixing the sample 5 and the connecting portion 3 for transmitting the rotation of the motor are integrated. Therefore, the gas inside the cup 1 is independent of the rotation of the motor, and as the sample rotates in the stationary gas layer, turbulence and airflow flowing to the back surface of the sample occur. Therefore, when performing spin coding using a conventional spin coater, the coating thickness on the sample surface becomes uneven due to the turbulent airflow that occurs as the sample rotates, and the coating film thickness on the sample surface becomes uneven due to the airflow flowing into the backside of the sample. This causes the coating liquid to circulate. The problem with the coating liquid going around the back side of the sample is that there is usually contact with the back side of the sample when handling the sample after the spin cord, and at this time, the coating liquid that has gone around to the part that came into contact with the back side of the sample is Otherwise, the coating liquid may adhere to the contact area with the sample, the coating film that has gone around the back of the sample may be scraped, causing dust, or there may be a step in which the sample is vacuum-adsorbed during the flow process after the spin cord. Poor adsorption may occur due to unevenness of the coating liquid that has gotten around to the back side of the sample.

〔Effect of the invention〕

As described above, according to the present invention, since the sample and the surrounding gas rotate together, the airflow is not disturbed, so a uniform coating film can be obtained on the sample surface. Since no air current flows into the back surface of the sample, a spin cord is created in which the coating liquid does not rub onto the back surface of the sample.

[Brief explanation of the drawing]

FIG. 1 is a main sectional view showing an embodiment of the spin coater of the present invention. FIG. 2 is a main sectional view showing a conventional spin coater. l...Cup 2...Sample stand 3...Connection part 4...Lid 5...Sample 6...Motor and above Applicant: Seiko Epson Co., Ltd. μ child calculation t ura 1 ni)
1st generation of Takudan.

Claims (1)

[Claims] In a spin coater that includes at least a sample stand for fixing a sample on which a coating film is to be formed, and a cup and a lid that cover a space around the sample stand, the sample stand, the cup, and the lid rotate in the same manner around the same rotation axis. A spin coater that is characterized by: