JPH01232796A - Manufacture of metal core insulated board - Google Patents
Manufacture of metal core insulated boardInfo
- Publication number
- JPH01232796A JPH01232796A JP5963888A JP5963888A JPH01232796A JP H01232796 A JPH01232796 A JP H01232796A JP 5963888 A JP5963888 A JP 5963888A JP 5963888 A JP5963888 A JP 5963888A JP H01232796 A JPH01232796 A JP H01232796A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- layer
- board
- ceramic
- core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 57
- 239000002184 metal Substances 0.000 title claims abstract description 57
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000000919 ceramic Substances 0.000 claims abstract description 32
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000011888 foil Substances 0.000 claims abstract description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims abstract description 10
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- 239000011889 copper foil Substances 0.000 claims abstract description 9
- 239000003822 epoxy resin Substances 0.000 claims abstract description 5
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 21
- 239000000853 adhesive Substances 0.000 claims description 11
- 230000001070 adhesive effect Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 230000010354 integration Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 38
- 230000017525 heat dissipation Effects 0.000 abstract description 11
- 238000005530 etching Methods 0.000 abstract description 3
- 230000035939 shock Effects 0.000 abstract description 3
- 238000005507 spraying Methods 0.000 abstract description 3
- 238000007796 conventional method Methods 0.000 abstract description 2
- 239000011229 interlayer Substances 0.000 abstract description 2
- 239000007767 bonding agent Substances 0.000 abstract 3
- 239000011162 core material Substances 0.000 description 24
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000011148 porous material Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000012790 adhesive layer Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000007750 plasma spraying Methods 0.000 description 4
- 238000007751 thermal spraying Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- -1 etc. Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は熱伝導性にすぐれ、耐熱性のあるメタルコア絶
縁基板の製造方法に関する1゜(従来の技術)
従来プリント配線板としては、フェノール樹脂積層板、
エポキシ極脂積層板が多く用いられできた。しかし、最
近電子機器の高性能化、小型化に伴い部品の高密度発生
をいかに処理するかということが問題になってきた。Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a method for manufacturing a metal core insulating board with excellent thermal conductivity and heat resistance. laminate,
Epoxy super fat laminates were often used. However, as electronic equipment has recently become more sophisticated and more compact, it has become a problem how to deal with the high density of components.
これに対して1、従来の有機質系基板は熱伝導性が悪い
ため熱放散性に欠け、また耐熱性4ζ乏しいなどのため
に高密度実装化は困難であった。。On the other hand, 1. Conventional organic substrates lack heat dissipation properties due to poor thermal conductivity, and also have poor heat resistance, making it difficult to implement high-density packaging. .
そのため、熱伝導性にすぐれた基板としてアルミナ、窒
化アルミ、炭化ケイ素などのセラミック基板、あるいは
金属板を芯としてその表面に絶縁層を設けたメタルコア
基板などが注目さtlている。特にメタルコア基板はセ
ラミック基板に比べて安価であり、加工性にもすぐれ、
さらに熱伝導率の大きなアルミなどの金属を芯としてい
るので熱放散性が大きいことなどから注目されており、
盛んに用いられるようになってきた。そのための性能向
上の研究開発も活発に行われている。Therefore, as substrates with excellent thermal conductivity, ceramic substrates such as alumina, aluminum nitride, silicon carbide, etc., or metal core substrates having a metal plate as a core and an insulating layer provided on the surface are attracting attention. In particular, metal core substrates are cheaper and easier to process than ceramic substrates,
Furthermore, since the core is made of a metal such as aluminum with high thermal conductivity, it is attracting attention because of its high heat dissipation properties.
It has become widely used. Research and development to improve performance for this purpose is actively being conducted.
(発明が解決しようとする課題)
一般的なメタルコア基板は、アルミなどの金属板の表面
に50〜100μmの厚さのカラスエポキシ樹脂層の絶
縁層を設け、さらにその上に回路を形成する銅はくを張
りつけたものである。すなわち、回路と直接に接してい
るのは熱伝性の悪い樹脂層である。したかって回路に発
生した熱は、熱伝導性の悪い極脂層を介して芯である金
属板に伝わることになる。そのために金払芯の熱伝導性
を十分に活かすことかできず十分な熱放散性は得られな
い。(Problems to be Solved by the Invention) A general metal core board has an insulating layer of a glass epoxy resin layer with a thickness of 50 to 100 μm provided on the surface of a metal plate such as aluminum, and a copper plate on which a circuit is formed. It has a foil pasted on it. That is, what is in direct contact with the circuit is a resin layer with poor thermal conductivity. Therefore, the heat generated in the circuit is transmitted to the core metal plate through the extremely fat layer, which has poor thermal conductivity. For this reason, the thermal conductivity of the metal core cannot be fully utilized, and sufficient heat dissipation cannot be obtained.
このようなことから、これを改良するために樹脂層を用
いずに、芯となる金属板の表面にアルミナなどのセラミ
ックを溶射してセラミックの絶縁層を設けようとする劣
え方がある。このようにすると熱の伝導は樹脂に比べて
十分に熱伝導率の高いセラミック層を通して金属芯に伝
わるため、大きな熱放散効果が得られる。しかし、この
ような基板においては次のような欠点かある。For this reason, in order to improve this problem, an attempt has been made to spray ceramic such as alumina onto the surface of the core metal plate to provide a ceramic insulating layer instead of using a resin layer. In this way, heat is conducted to the metal core through the ceramic layer, which has a sufficiently higher thermal conductivity than resin, so that a large heat dissipation effect can be obtained. However, such a substrate has the following drawbacks.
第1は、溶射により得られたセラミック層には気孔が存
在し、絶縁層の耐電圧特性が不十分である点である。す
なわち、セラミック絶縁石の耐電圧が劣り、しかもその
下は導電性の金属であるためである。第2は、セラミッ
ク層と金属芯の密着性の問題である。金属にセラミック
を溶射した場合その密着、結合はセラミックの溶融粉が
高速で金属粗面に突きささるいわゆるアンカー効果によ
るものである。したがって化学的な結合力は得られず、
さらに金属とセラミックは熱膨張率も異なるために熱衝
撃に耐え得るような密着力は得られにくい。これらの欠
点については、セラミック溶射後、セラミック層に樹脂
を浸透させて気孔を封孔するなどの方法が考えられてい
るか、十分な効果は得られず、また工程も煩雑なものと
なってしまう。The first problem is that the ceramic layer obtained by thermal spraying has pores, and the dielectric strength of the insulating layer is insufficient. That is, the withstand voltage of the ceramic insulating stone is poor, and moreover, there is a conductive metal underneath. The second problem is the adhesion between the ceramic layer and the metal core. When ceramic is thermally sprayed onto metal, its adhesion and bonding is due to the so-called anchor effect, in which the molten ceramic powder hits the rough metal surface at high speed. Therefore, chemical bonding strength cannot be obtained,
Furthermore, since metals and ceramics have different coefficients of thermal expansion, it is difficult to obtain adhesion that can withstand thermal shock. To address these drawbacks, methods such as infiltrating the ceramic layer with resin to seal the pores after ceramic thermal spraying have been considered, but the method is not sufficiently effective and the process is complicated. .
本発明は、これらの欠点を改良し、熱放散性にすぐれた
メタルコア基板の製造方法を提供するものである。The present invention improves these drawbacks and provides a method for manufacturing a metal core substrate with excellent heat dissipation properties.
(課題を解決するための手段)
すなわち、本発明は金属箔の片m1にセラミックを溶射
してセラミックの絶縁層を形成し、該セラミック層と基
板の芯となる金属板とを金属粉末を混入した接着剤層を
介して熱圧成形により一体化することを特徴とするもの
である。(Means for Solving the Problems) That is, the present invention sprays ceramic onto a piece m1 of metal foil to form a ceramic insulating layer, and mixes the ceramic layer and the metal plate serving as the core of the substrate with metal powder. It is characterized by being integrated by hot pressure molding via an adhesive layer.
本発明に用いる金属箔は、通常プリント基板に用いられ
ている銅箔がコスト、性能面から最適であるが、その他
にアルミニウム箔、亜鉛箔、ステンレス箔、ニッケル箔
、銀箔、金箔、あるいはこれらのラミネート箔、合金箔
を用いることができる。As for the metal foil used in the present invention, copper foil, which is normally used for printed circuit boards, is most suitable in terms of cost and performance, but aluminum foil, zinc foil, stainless steel foil, nickel foil, silver foil, gold foil, or any of these may also be used. Laminated foil or alloy foil can be used.
また、セラミックは、その電気絶縁性、熱伝導率、溶射
の容易さなどからアルミナが最適であるが、この他に電
気絶縁性を有するスピネル、ムライト、ベリリア、ジル
コニア等を用いることができる。このセラミック層の厚
みは、30μm以上500μm以下にすることが好まし
い。Further, as the ceramic, alumina is most suitable due to its electrical insulation properties, thermal conductivity, ease of thermal spraying, etc., but spinel, mullite, beryllia, zirconia, etc., which have electrical insulation properties, can also be used. The thickness of this ceramic layer is preferably 30 μm or more and 500 μm or less.
30μm未満では溶射層が不均一になりやすく、電気絶
縁性、耐電圧性が十分でなく、500以上にするとコス
トアップになるとともに、溶射層にクラック等の欠陥が
発生しやすくなるためである。This is because if the thickness is less than 30 μm, the sprayed layer tends to be non-uniform and the electrical insulation and withstand voltage properties are insufficient, while if it is greater than 500 μm, the cost increases and defects such as cracks are likely to occur in the sprayed layer.
溶射法としては、ガス溶射、プラズマ溶射、水プラズマ
溶射、減圧プラズマ溶射法などが適用できる。As the thermal spraying method, gas spraying, plasma spraying, water plasma spraying, reduced pressure plasma spraying, etc. can be applied.
セラミック溶射層と芯となる金属板を一体化するための
接着剤は、エポキシ樹脂、ポリイミド樹脂、不飽和ポリ
エステル樹脂、ウレタンnt脂などが使用できる。As the adhesive for integrating the ceramic sprayed layer and the core metal plate, epoxy resin, polyimide resin, unsaturated polyester resin, urethane NT resin, etc. can be used.
接着剤中に混入する金属粉としては、熱伝導性が良好で
コスト面で有利なアルミニウムが適しているが、その他
、銅、鉄、ニッケル、4270イ等が使用できる。As the metal powder mixed into the adhesive, aluminum is suitable because it has good thermal conductivity and is advantageous in terms of cost, but other materials such as copper, iron, nickel, and 4270I can also be used.
さらに芯材となる金属板は、アルミニウム、4270イ
、銅、鉄、ステンレス、ニッケルなどを用いることがで
きる。Further, the metal plate serving as the core material may be made of aluminum, 4270I, copper, iron, stainless steel, nickel, or the like.
(作用)
本発明では、従来の溶射基板のように芯となる金属板に
直接セラミックを溶射するのではなく、セラミック溶射
層を形成した金属箔と芯となる金属板とを金属粉末を混
入した接着剤を用いて接着するために、強固な密着性と
高い熱伝導性が得られる。強固な密着性は、セラミック
溶射層の表面が粗面であり、しかも気孔が存在するため
に接着面私が大きいためである。また、接着剤中の樹脂
は、セラミック層中の気孔に浸透し、その気孔を充填す
るために吸湿時の絶縁性、耐電圧性の劣化も防げる。さ
らに、従来のメタルコア基板では接着剤層又は絶縁層は
、熱伝導性の極めて悪い樹脂単体から成るもの、あるい
は樹脂にガラス繊維、ケブラー繊維、又はシリカ、アル
ミナ等を入れたものからなっており、いずれの場合にも
その接着剤層又は絶縁層の熱放散性の悪さが問題となっ
ていた。しかし本発明では、熱伝導性のすぐれている金
属粉末を接着剤中に混入することにより、従来から問題
とされていた接着剤層の熱放散性を大幅に改善すること
ができた。それによって基板表面の電子部品から発生す
る高密度の熱をすみやかに基板の芯となる金属板に伝え
ることが可能な、非常に熱放散性がすぐれた基板を得る
ことができた。また、金属粉末の粒径はセラミック層の
気孔に対して十分大きいので、セラミック層の気孔に金
属粉末が浸入することによる絶縁性、副電圧性の劣化は
生じない。さらに、基板の表面には金属箔層が形成され
ているため、エツチング処理等により簡単に回路を形成
することができる。(Function) In the present invention, instead of spraying ceramic directly onto the core metal plate as in conventional thermal sprayed substrates, the metal foil on which the ceramic sprayed layer is formed and the core metal plate are mixed with metal powder. Since it is bonded using adhesive, strong adhesion and high thermal conductivity can be obtained. The strong adhesion is due to the fact that the surface of the ceramic sprayed layer is rough and the adhesion surface is large due to the presence of pores. Further, the resin in the adhesive penetrates into the pores in the ceramic layer and fills the pores, thereby preventing deterioration of insulation properties and voltage resistance when moisture is absorbed. Furthermore, in conventional metal core substrates, the adhesive layer or insulating layer is made of a single resin with extremely poor thermal conductivity, or a resin containing glass fiber, Kevlar fiber, silica, alumina, etc. In either case, the problem was that the adhesive layer or the insulating layer had poor heat dissipation properties. However, in the present invention, by mixing metal powder with excellent thermal conductivity into the adhesive, it was possible to significantly improve the heat dissipation properties of the adhesive layer, which had been a problem in the past. As a result, we were able to obtain a board with extremely good heat dissipation properties that can quickly transfer the high-density heat generated from the electronic components on the board's surface to the metal plate that forms the core of the board. Further, since the particle size of the metal powder is sufficiently larger than the pores of the ceramic layer, there is no deterioration of the insulation properties and sub-voltage properties due to the metal powder penetrating into the pores of the ceramic layer. Furthermore, since a metal foil layer is formed on the surface of the substrate, a circuit can be easily formed by etching or the like.
(実施例) 本発明の実施例を第1図に基づき以下説明する。(Example) An embodiment of the present invention will be described below with reference to FIG.
厚さ35μmの銅箔1の片面にプラズマ溶射装置を用い
てアルミナを溶射し、厚さ約100μmのアルミナ溶射
層2を形成した。そしてこのアルミナ層2に、エポキシ
樹脂に対しアルミニウム粉を200重量部添加して成る
接着剤3を塗布し、基板の芯となるアルミニウム板4上
に載置し、さらにこれをプレスにて熱圧成形し接着剤を
硬化させ第1図に示す構成のメタルコア銅箔積層板を得
た。さらに表面の銅箔層にエツチング処理等の従来の方
法でパターンを成形した。Alumina was thermally sprayed onto one side of a copper foil 1 having a thickness of 35 μm using a plasma spraying device to form a sprayed alumina layer 2 having a thickness of approximately 100 μm. Then, an adhesive 3 made by adding 200 parts by weight of aluminum powder to an epoxy resin is applied to this alumina layer 2, and the adhesive 3 is placed on an aluminum plate 4 that will serve as the core of the substrate, and then hot-pressed using a press. By molding and curing the adhesive, a metal core copper foil laminate having the structure shown in FIG. 1 was obtained. Furthermore, a pattern was formed on the surface copper foil layer by a conventional method such as etching.
このようにして得られたメタルコア絶縁基板は、層間の
密着性がすぐれているため耐熱衝撃性も良好であり、さ
らに熱放散効果も非常にすぐれたものであった。The metal core insulating substrate thus obtained had excellent interlayer adhesion and therefore good thermal shock resistance, and also had an extremely excellent heat dissipation effect.
(発明の効果)
以上のように本発明の方法によれば、金属箔層とセラミ
ック層と金属板層との各層間の密着性かすぐれ、かつ熱
放散性の優れたメタルコア絶縁基板を簡単な工程でしか
も安価に得ることかできる。これによって、さらに部品
の基板への高密度実装化が可能となり、電子部品の小型
化への効果は極めて大きなもので゛ある。(Effects of the Invention) As described above, according to the method of the present invention, a metal core insulating substrate with excellent adhesion between the metal foil layer, ceramic layer, and metal plate layer and excellent heat dissipation can be easily manufactured. It can be obtained through a process and at a low cost. This allows components to be mounted on the board at a higher density, and has an extremely large effect on the miniaturization of electronic components.
第1図は、メタルコア銅張積層板の断面模式符号の説明
1・・・銅箔 2・・・アルミナ溶射層
3・・・アルミニウム粉を混入した接着剤層4・・・ア
ルミニウム板
代理人 弁理士 廣瀬 章、″゛Figure 1 is an explanation of the cross-sectional schematic symbols of a metal core copper-clad laminate 1...Copper foil 2...Alumina sprayed layer 3...Adhesive layer mixed with aluminum powder 4...Aluminum plate agent Patent attorney Professor Akira Hirose, “゛
Claims (1)
射層を形成し、該セラミック溶射層と基板の芯となる金
属板との間に、金属粉末を混入した接着剤を介在させこ
れらを熱圧成形により一体化することを特徴とするメタ
ルコア絶縁基板の製造方法 2.金属箔が、銅箔である請求項1記載のメタルコア絶
縁基板の製造方法。 3.セラミックが、アルミナを主成分とするものである
請求項1記載のメタルコア絶縁基板の製造方法。 4 接着剤が、エポキシ樹脂を主成分とするものである
請求項1記載のメタルコア絶縁基板の製造方法。 5.接着剤に混入する金属粉が、アルミニウムである請
求項1記載のメタルコア絶縁基板の製造方法。[Claims] 1. Ceramic is sprayed on one side of metal foil to form a ceramic sprayed layer, and an adhesive mixed with metal powder is interposed between the ceramic sprayed layer and the metal plate that serves as the core of the substrate, and these are formed by hot pressure forming. Method for manufacturing a metal core insulating substrate characterized by integration 2. The method for manufacturing a metal core insulating substrate according to claim 1, wherein the metal foil is a copper foil. 3. 2. The method of manufacturing a metal core insulating substrate according to claim 1, wherein the ceramic contains alumina as a main component. 4. The method of manufacturing a metal core insulating substrate according to claim 1, wherein the adhesive contains an epoxy resin as a main component. 5. 2. The method of manufacturing a metal core insulating substrate according to claim 1, wherein the metal powder mixed in the adhesive is aluminum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5963888A JPH01232796A (en) | 1988-03-14 | 1988-03-14 | Manufacture of metal core insulated board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5963888A JPH01232796A (en) | 1988-03-14 | 1988-03-14 | Manufacture of metal core insulated board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01232796A true JPH01232796A (en) | 1989-09-18 |
Family
ID=13118964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5963888A Pending JPH01232796A (en) | 1988-03-14 | 1988-03-14 | Manufacture of metal core insulated board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01232796A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1035164A (en) * | 1996-04-25 | 1998-02-10 | Samsung Aerospace Ind Ltd | IC card and manufacturing method thereof |
| JP2009246391A (en) * | 2009-07-27 | 2009-10-22 | Kyocera Corp | Method of manufacturing ceramic wiring board |
| KR101017934B1 (en) * | 2009-05-18 | 2011-03-04 | (주)티에이치엔 | Junction box bus plate and its manufacturing method |
-
1988
- 1988-03-14 JP JP5963888A patent/JPH01232796A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1035164A (en) * | 1996-04-25 | 1998-02-10 | Samsung Aerospace Ind Ltd | IC card and manufacturing method thereof |
| KR101017934B1 (en) * | 2009-05-18 | 2011-03-04 | (주)티에이치엔 | Junction box bus plate and its manufacturing method |
| JP2009246391A (en) * | 2009-07-27 | 2009-10-22 | Kyocera Corp | Method of manufacturing ceramic wiring board |
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