JPH0124148Y2 - - Google Patents

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Publication number
JPH0124148Y2
JPH0124148Y2 JP15667384U JP15667384U JPH0124148Y2 JP H0124148 Y2 JPH0124148 Y2 JP H0124148Y2 JP 15667384 U JP15667384 U JP 15667384U JP 15667384 U JP15667384 U JP 15667384U JP H0124148 Y2 JPH0124148 Y2 JP H0124148Y2
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JP
Japan
Prior art keywords
barrel
plating
gas supply
supply pipe
plating liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15667384U
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Japanese (ja)
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JPS6173656U (en
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Filing date
Publication date
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Priority to JP15667384U priority Critical patent/JPH0124148Y2/ja
Publication of JPS6173656U publication Critical patent/JPS6173656U/ja
Application granted granted Critical
Publication of JPH0124148Y2 publication Critical patent/JPH0124148Y2/ja
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は、バレルの最深部付近に至るガス供給
パイプを設けた回転バレルメツキ装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a rotating barrel plating device that is provided with a gas supply pipe that reaches near the deepest part of the barrel.

[従来の技術] 多数の小物部品をメツキする場合に、回転バレ
ルメツキ装置が用いられる。このメツキ装置で使
用されるバレルは、上面を開口した多角筒形、多
くは六角筒形をした篭状のもので、この中心軸上
に固定された回転軸が水平または斜めに軸支さ
れ、これを中心として回転せしめられる。このバ
レルには、多数の通孔が開けられていて、ここか
らメツキ液が自由に通過できるようになつてい
る。
[Prior Art] A rotating barrel plating device is used when plating a large number of small parts. The barrel used in this plating device is a polygonal cylinder with an open top, often a hexagonal cylinder, and a rotating shaft fixed on the central axis is supported horizontally or diagonally. It can be rotated around this. This barrel has a number of holes through which the plating solution can freely pass.

例えば無電解メツキ法では、被処理物の表面を
活性化処理してからバレルの中に入れ、さらにこ
のバレルをメツキ槽の中のメツキ液に浸漬する。
すると、メツキ液中の金属イオンが還元されて、
被処理物の表面に金属が析出し、メツキが施され
る。このとき被処理物は、回転するバレルの中で
その周面が転がりながら最も低い部分に移動しよ
うとして絶えず動き、表面が万遍なくメツキ液に
接触する。
For example, in the electroless plating method, the surface of the object to be treated is activated and placed in a barrel, and then the barrel is immersed in a plating solution in a plating tank.
Then, the metal ions in the plating solution are reduced,
Metal is deposited on the surface of the workpiece and plating is applied. At this time, the object to be processed constantly moves in an attempt to move to the lowest point while its circumferential surface rolls inside the rotating barrel, and its surface comes into contact with the plating liquid evenly.

しかし、この従来の回転バレルメツキ装置で
は、バレルの最深部での被処理物の動きが鈍くな
り、堆積された被処理物の面が互いに接触し合
う。このため、その間の僅かな間隙にメツキ液が
閉じ込められるようになり、被処理物の表面での
メツキ液の循還が充分でなくなる。このため、そ
の部分では金属の析出速度が遅くなる。
However, in this conventional rotary barrel plating device, the movement of the workpiece at the deepest part of the barrel becomes slow, and the surfaces of the deposited workpiece come into contact with each other. For this reason, the plating liquid becomes trapped in the small gap between them, and the circulation of the plating liquid on the surface of the object to be treated becomes insufficient. Therefore, the rate of metal precipitation slows down in that area.

メツキ液の中の金属イオンが還元され、被処理
物の表面に析出する際には、水素ガスが発生する
が、上記のような状態では、被処理物の間に閉じ
込められたメツキ液の水素ガス濃度が極端に高く
なる。そうするとメツキ液自体の還元作用が強く
なり、金属イオンが被処理物の表面だけでなく、
メツキ液中でも還元されるようになつて、その中
に金属粒を生じるようになる。この金属粒は、こ
れが核となつて、メツキ液の自己分解をさらに進
行させるため、メツキ処理が困難になる。
When the metal ions in the plating solution are reduced and deposited on the surface of the workpiece, hydrogen gas is generated. Gas concentration becomes extremely high. This will strengthen the reducing action of the plating solution itself, and the metal ions will not only reach the surface of the object to be treated, but also
It also begins to be reduced in the plating solution, producing metal particles therein. These metal particles become nuclei and further promote self-decomposition of the plating solution, making the plating process difficult.

こうした問題を解消する目的で、メツキ槽の底
部付近に、給気用のノズルを配置し、絶えず空気
を送り、気泡の撹拌と水素ガスの放出作用によ
り、上記の問題を解消することが既に提案されて
いる。しかしこれでは、バレル内に空気が殆ど入
り込まないため、バレル内のメツキ液には殆ど影
響を与えない。
In order to solve these problems, it has already been proposed to place an air supply nozzle near the bottom of the plating tank to constantly feed air, agitate the bubbles, and release hydrogen gas. has been done. However, in this case, almost no air enters the barrel, so it has little effect on the plating liquid inside the barrel.

そこで、回転するバレルの内周面の回転軸と平
行な方向に給気管を一定の角度毎に複数本固定
し、ここからバレルの内部に気泡を送る装置が提
案されている(実公昭50−10414号公報)。
Therefore, a device has been proposed in which a plurality of air supply pipes are fixed at fixed angles in a direction parallel to the axis of rotation on the inner circumferential surface of a rotating barrel, and air bubbles are sent from there into the inside of the barrel (1973- Publication No. 10414).

[考案が解決しようとする課題] しかしながら、バレルの内周に給気管を固定し
た場合、バレルの回転に伴つて、給気管も回転
し、絶えずバレルの中を回転することになる。気
泡は、メツキ液の中を速やかに浮揚してしまうた
め、バレルの上部で放出された気泡は、バレル内
のメツキ液に殆ど影響を与えない。このため、実
際に被処理物に気泡を供給して、その効果をあげ
得るのは数本の給気管の内、その時最も低い位置
にある1本から発せられる気泡のみであり、その
他の給気管からは気泡が無駄に放出されてしま
う。また、給気管へ気泡を供給するポンプの負担
も大きい。さらに、バレルの底を給気管が通過す
るのが間欠的であるため、絶えずバレルの底から
気泡を供給することもできず、この点でもその効
果が十分ではなかつた。
[Problems to be Solved by the Invention] However, when the air supply pipe is fixed to the inner periphery of the barrel, the air supply pipe also rotates as the barrel rotates, and constantly rotates inside the barrel. Since the air bubbles quickly float in the plating liquid, the air bubbles released at the top of the barrel have little effect on the plating liquid inside the barrel. For this reason, only the air bubbles emitted from the lowest one of the several air supply pipes can actually supply air bubbles to the workpiece, and the air bubbles emitted from the other air supply pipes can be effective. Air bubbles are released needlessly. Moreover, the burden on the pump that supplies air bubbles to the air supply pipe is heavy. Furthermore, since the air supply pipe passes through the bottom of the barrel intermittently, it is not possible to constantly supply air bubbles from the bottom of the barrel, and the effect is not sufficient in this respect as well.

本考案は、従来の回転バレルメツキ装置におけ
る上記のような問題点を解決すべくなされたもの
であつて、絶えずバレルの底から気泡を放出する
ことにより、被処理物につねに新鮮なメツキ液を
供給すると共に、いわゆるメツキ液の疲労を解消
し、その自己分解を防止することを目的としたも
のである。
The present invention was developed to solve the above-mentioned problems with conventional rotary barrel plating equipment, and by constantly releasing air bubbles from the bottom of the barrel, fresh plating liquid is always supplied to the workpiece. At the same time, the purpose is to eliminate so-called fatigue of the plating liquid and prevent its self-decomposition.

[課題を解決するための手段] すなわち、上記目的を達成するため、本発明に
おいて採用した手段の要旨は、被処理物を通過さ
せない多数の通孔を有する篭状のバレルの回転軸
を斜めにして、同バレルをメツキ液の中に浸漬
し、同バレルの回転軸に駆動源を連結してなる回
転バレルメツキ装置において、バレルの内周面の
最も深い部分に沿つて、同バレルの底付近に達す
るガス供給パイプを設け、このガス供給パイプの
バレルの最深部付近の部分に噴出口を開設すると
共に、その基端側にガス供給器を連結してなるこ
とを特徴とする回転バレルメツキ装置である。
[Means for Solving the Problems] In other words, in order to achieve the above object, the gist of the means adopted in the present invention is to obliquely rotate the rotation axis of a cage-shaped barrel having a large number of through holes that do not allow the object to pass through. Then, in a rotating barrel plating device in which the barrel is immersed in a plating liquid and a drive source is connected to the rotating shaft of the barrel, the barrel is immersed in the plating liquid, and the barrel is immersed near the bottom of the barrel along the deepest part of the inner peripheral surface of the barrel. This rotating barrel plating device is characterized in that it is provided with a gas supply pipe that reaches the bottom of the barrel, a spout is opened in the vicinity of the deepest part of the barrel of the gas supply pipe, and a gas supply device is connected to the base end of the gas supply pipe. .

[作用] 上記回転バレルメツキ装置では、篭状のバレル
の回転軸を斜めにして、同バレルをメツキ液の中
に浸漬し、このバレルの内周面の最も深い部分に
沿つて、その底付近に達するガス供給パイプを設
け、このガス供給パイプのバレルの最深部付近の
部分に噴出口を開設しているので、バレルが回転
しても、ガス供給パイプは回転せず、その先端の
ガス噴出口は常にバレルの底付近に位置する。こ
のため、その噴出口からバレル内に連続して定常
的に気泡を放出することができる。従つて、気泡
によるバレル内の被処理物の撹拌、水素ガスの放
出作用等がきわめて効果的に行える。
[Operation] In the above-described rotary barrel plating device, the rotation axis of the basket-shaped barrel is tilted, the barrel is immersed in the plating liquid, and the barrel is immersed in the plating solution along the deepest part of the inner peripheral surface of the barrel near the bottom. The gas supply pipe has a gas supply pipe reaching the bottom of the barrel, and the gas supply pipe has a spout near the deepest part of the barrel, so even if the barrel rotates, the gas supply pipe does not rotate and the gas spout at the tip of the gas supply pipe does not rotate. is always located near the bottom of the barrel. Therefore, bubbles can be continuously and steadily ejected from the ejection port into the barrel. Therefore, stirring of the object to be processed in the barrel by the bubbles, release of hydrogen gas, etc. can be performed very effectively.

[実施例] 以下、本考案の具体例を図示の実施例を参照し
ながら説明すると、メツキ槽1の中に満たされた
メツキ液13にバレル2が浸漬されている。既に
述べた通り、このバレル2は、被処理物a,a…
が通過しない程度の大きさの多数の通孔14,1
4…を有する六角筒形等の篭状のもので、内側と
外側の間をメツキ液13が通過できるようになつ
ている。
[Example] Hereinafter, a specific example of the present invention will be described with reference to the illustrated embodiment. A barrel 2 is immersed in a plating liquid 13 filled in a plating tank 1. As already mentioned, this barrel 2 is used for processing objects a, a...
A large number of through holes 14, 1 are large enough not to pass through.
The plating liquid 13 is allowed to pass between the inside and outside of the cage, such as a hexagonal cylindrical shape.

本考案による装置では、バレル2が斜めに支持
されている。即ち、バレル2に中心軸上には、回
転軸3が取り付けられ、これが約45゜の角度で回
転自在に支持されている。そしてこの回転軸3
は、継手4,5を介して伝達軸6に連結され、さ
らにこの伝達軸6は、歯車減速機構7を介してモ
ータ等の駆動源8に連結されている。
In the device according to the invention, the barrel 2 is supported obliquely. That is, a rotating shaft 3 is attached to the central axis of the barrel 2, and is rotatably supported at an angle of about 45 degrees. And this rotating shaft 3
is connected to a transmission shaft 6 through joints 4 and 5, and further, this transmission shaft 6 is connected through a gear reduction mechanism 7 to a drive source 8 such as a motor.

さらに、このような回転バレルメツキ装置にお
いて、バレル2にその最深部付近に至るガス供給
パイプ9を設け、このガス供給パイプ9のバレル
2の最深部付近の部分に噴出口10,10…を設
ける。
Further, in such a rotary barrel plating device, the barrel 2 is provided with a gas supply pipe 9 that reaches the vicinity of the deepest part of the barrel 2, and the gas supply pipe 9 is provided with jet ports 10, 10, .

図示の実施例では、ガス供給パイプ9がメツキ
槽1の蓋体11を通り、その先端側がバレル2の
周面に沿つて同バレル2の最深部に達しており、
このバレル2の周面に沿う先端寄りの部分に複数
の噴出口10,10…が開設されている。
In the illustrated embodiment, the gas supply pipe 9 passes through the lid 11 of the plating tank 1, and its tip reaches the deepest part of the barrel 2 along the circumferential surface of the barrel 2.
A plurality of jet ports 10, 10, . . . are provided along the circumferential surface of the barrel 2 near the tip.

一方、このガス供給パイプ9の基端側には、上
記噴出口10,10…側へと空気を送るポンプ等
のガス供給器12が設けられている。
On the other hand, on the base end side of the gas supply pipe 9, a gas supply device 12 such as a pump for sending air to the jet ports 10, 10, . . . side is provided.

なお、この点はバレル2を水平に支持した場合
も全く同様である。即ち、ガス供給パイプ9の先
端がバレル2の周面に沿つて水平に同バレル2の
中に挿入され、この周面に沿つた部分に噴射口1
0,10…が開設される。
Note that this point is exactly the same even when the barrel 2 is supported horizontally. That is, the tip of the gas supply pipe 9 is inserted horizontally into the barrel 2 along the circumferential surface of the barrel 2, and the injection port 1 is inserted along the circumferential surface of the barrel 2.
0, 10... are opened.

この装置では、バレル2に活性化処理をした被
処理物a,a…を入れて同バレル2を回転させ、
被処理物a,a…をメツキするに当たり、ガス供
給器12側からガス供給パイプ9を通してバレル
2の最深部付近に酸素を含むガス、例えば空気等
を送り込む。
In this device, activated objects a, a... are placed in a barrel 2, the barrel 2 is rotated,
When plating the objects a, a, . . . , an oxygen-containing gas such as air is fed into the vicinity of the deepest part of the barrel 2 from the gas supply device 12 side through the gas supply pipe 9.

噴出口10,10…から噴出されたガスは、バ
レル2の最深部からメツキ液13中を上昇する
が、このとき被処理物a,a…が堆積したバレル
2の底の部分のメツキ液13が撹拌されるため、
メツキ液13の循還が促進され、新鮮なメツキ液
13が被処理物a,a…の間に供給される。
The gas ejected from the ejection ports 10, 10... rises in the plating liquid 13 from the deepest part of the barrel 2, but at this time, the plating liquid 13 at the bottom part of the barrel 2 where the objects a, a... have accumulated is stirred, so
Circulation of the plating liquid 13 is promoted, and fresh plating liquid 13 is supplied between the objects a, a, . . . .

これと同時に、被処理物a,a…の間に溜つた
水素ガスが追い出されると共に、メツキ液13中
の溶存酸素が増えるため、メツキ液13が還元さ
れ易い状態、いわゆるメツキ液13の疲労が解消
される。これによつてメツキ液13の自己分解を
防止することができる。
At the same time, the hydrogen gas accumulated between the objects a, a... is expelled, and dissolved oxygen in the plating liquid 13 increases, so that the plating liquid 13 is easily reduced, so-called fatigue of the plating liquid 13. It will be resolved. Thereby, self-decomposition of the plating liquid 13 can be prevented.

[考案の効果] 以上説明した通り、本考案によれば、バレルの
底部から気泡を1本のガス供給パイプ9から連続
的かつ定常的に供給することができ、小さな出力
のポンプで気泡を無駄に放出させず、高い効果が
期待できる。すなわち、被処理物a,a…の表面
に新鮮なメツキ液13を供給することができると
共に、いわゆるメツキ液13の自己分解を防止す
ることができるので、被処理物a,a…を良好
に、かつ能率良くメツキすることができるように
なる。
[Effects of the invention] As explained above, according to the invention, air bubbles can be continuously and steadily supplied from the bottom of the barrel through one gas supply pipe 9, and the air bubbles can be wasted with a small output pump. It can be expected to be highly effective without being released into the body. That is, it is possible to supply fresh plating liquid 13 to the surfaces of the objects a, a... to be processed, and also to prevent the so-called self-decomposition of the plating liquid 13, so that the objects a, a... can be properly cleaned. , and can be plated efficiently.

【図面の簡単な説明】[Brief explanation of the drawing]

図面の本考案の実施例を示す回転バレルメツキ
装置の概略説明図である。 2……バレル、8……駆動源、9……ガス供給
パイプ、10……噴出口、12……ガス供給器、
13……メツキ液、14……通孔、a……被処理
物。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic explanatory diagram of a rotary barrel plating device showing an embodiment of the present invention in the drawings. 2... Barrel, 8... Drive source, 9... Gas supply pipe, 10... Spout, 12... Gas supply device,
13...Plating liquid, 14...Through hole, a...Object to be treated.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被処理物を通過させない多数の通孔を有する篭
状のバレルの回転軸を斜めにして、同バレルをメ
ツキ液の中に浸漬し、同バレルの回転軸に駆動源
を連結してなる回転バレルメツキ装置において、
バレルの内周面の最も深い部分に沿つて、同バレ
ルの底付近に達するガス供給パイプを設け、この
ガス供給パイプのバレルの最深部付近の部分に噴
出口を開設すると共に、その基端側にガス供給器
を連結してなることを特徴とする回転バレルメツ
キ装置。
A rotary barrel plating system in which a basket-shaped barrel having a large number of through holes that do not allow objects to pass through is immersed in a plating liquid with its rotating shaft tilted, and a driving source is connected to the rotating shaft of the barrel. In the device,
A gas supply pipe that reaches near the bottom of the barrel is provided along the deepest part of the inner circumferential surface of the barrel, and a spout is opened in the part of this gas supply pipe near the deepest part of the barrel. A rotating barrel plating device characterized by connecting a gas supply device to a rotary barrel plating device.
JP15667384U 1984-10-17 1984-10-17 Expired JPH0124148Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15667384U JPH0124148Y2 (en) 1984-10-17 1984-10-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15667384U JPH0124148Y2 (en) 1984-10-17 1984-10-17

Publications (2)

Publication Number Publication Date
JPS6173656U JPS6173656U (en) 1986-05-19
JPH0124148Y2 true JPH0124148Y2 (en) 1989-07-21

Family

ID=30714678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15667384U Expired JPH0124148Y2 (en) 1984-10-17 1984-10-17

Country Status (1)

Country Link
JP (1) JPH0124148Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4640695B2 (en) * 2005-02-09 2011-03-02 株式会社村田製作所 Stirring vessel, plating method, and polishing method

Also Published As

Publication number Publication date
JPS6173656U (en) 1986-05-19

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