JPH01253902A - Titanium acid barium semiconductor porcelain - Google Patents
Titanium acid barium semiconductor porcelainInfo
- Publication number
- JPH01253902A JPH01253902A JP8161488A JP8161488A JPH01253902A JP H01253902 A JPH01253902 A JP H01253902A JP 8161488 A JP8161488 A JP 8161488A JP 8161488 A JP8161488 A JP 8161488A JP H01253902 A JPH01253902 A JP H01253902A
- Authority
- JP
- Japan
- Prior art keywords
- added
- resistance
- withstand voltage
- porcelain
- barium titanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
- H01C7/022—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient mainly consisting of non-metallic substances
- H01C7/023—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient mainly consisting of non-metallic substances containing oxides or oxidic compounds, e.g. ferrites
- H01C7/025—Perovskites, e.g. titanates
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Thermistors And Varistors (AREA)
Abstract
Description
【発明の詳細な説明】 (産業上の利用分野) この発明は、顕著な正の抵抗温度係数をもち。[Detailed description of the invention] (Industrial application field) This invention has a significant positive temperature coefficient of resistance.
耐電圧の大きなしかも信頼性の高いチタン酸バリウム系
半導体磁器に関するものである。This invention relates to barium titanate-based semiconductor porcelain that has a high withstand voltage and is highly reliable.
(従来の技術)
従来より、チタン酸バリウムのBaの一部を3価の元素
で!換するか、T1の一部を5価の元素で置換したもの
を、空気中で1300℃前後で焼成することによって、
比抵抗が10&Ωcm以下の半導体磁器が得られること
が知られている。この半導体化剤を添加して得られるチ
タン酸バリウム系半導体磁器は、正の抵抗温度特性をも
ち、Mnの添加によってさらに大きな抵抗変化率を示す
とされている。この特性を利用し、チタン酸バリウム系
半導体磁器が温度制御や電流制限用など各種スイッチン
グ素子や定温度発熱体に応用されるに従い、著しい正の
抵抗温度係数をもち、耐電圧の大きなしかも信頼性の高
い半導体磁器の需要が高まってきている。(Conventional technology) Conventionally, a part of Ba in barium titanate has been replaced with a trivalent element! By replacing a part of T1 with a pentavalent element and firing it in air at around 1300°C,
It is known that semiconductor porcelain having a specific resistance of 10Ωcm or less can be obtained. Barium titanate-based semiconductor ceramics obtained by adding this semiconducting agent have positive resistance-temperature characteristics, and are said to show an even greater rate of change in resistance by adding Mn. Taking advantage of this characteristic, barium titanate semiconductor ceramics are being applied to various switching elements and constant temperature heating elements for temperature control and current limiting, and have a significantly positive temperature coefficient of resistance, high withstand voltage, and high reliability. Demand for semiconductor porcelain, which has a high level of oxidation, is increasing.
(発明が解決しようとする課題)
しかしながら、従来のチタン酸バリウム系半導体磁器の
組成では半導体化剤の許容添加蓋の範囲が侠いため微量
添加に起因する比抵抗のバラツキが見られ、安定した比
抵抗と有する半導体磁器と工業的に生産することが困難
で!)つた、すなわち、チタン酸バリウムを半導体化さ
せるためには、イツトリウム等の半導体化剤の添加が必
要であるが、比抵抗を低く抑えるためその添加量をある
範囲内に調整する必要があり、実用上使用可能な比抵抗
を得るには、その添加蓋がかなり快い範囲に限定される
0例えばイツトリウムの場合、添加量が0゜3モル%ま
では、その増加と共に比抵抗は減少するが、0.3モル
%を越えると比抵抗は再び高くなり、0.6モル%以上
では急激に絶縁体に近づく、従って、実用上可能な比抵
抗を得るためには、イツトリウムの添加量を0.1〜0
.6モル%とする必要があった。このため半導体化剤の
添加蓋が多い程正の抵抗温度係数及び耐電圧は向上する
とされていながらも、インドリウムの場合第3図に示す
ように0.6モル%以上の添加では比抵抗が高くなり実
用化は困難であった。(Problem to be Solved by the Invention) However, in the composition of conventional barium titanate-based semiconductor ceramics, the allowable addition range of the semiconductor agent is narrow, so variations in resistivity due to trace amounts of addition are observed, and stable ratios are not achieved. Semiconductor porcelain with resistance and difficult to produce industrially! ) In other words, in order to convert barium titanate into a semiconductor, it is necessary to add a semiconductor agent such as yttrium, but in order to keep the resistivity low, the amount added must be adjusted within a certain range. In order to obtain a practically usable specific resistance, the addition limit is limited to a fairly comfortable range.For example, in the case of yttrium, the specific resistance decreases as the amount increases up to 0.3 mol%. If it exceeds 0.3 mol%, the resistivity becomes high again, and if it exceeds 0.6 mol%, it rapidly approaches an insulator. Therefore, in order to obtain a practically possible resistivity, the amount of yttrium added should be reduced to 0.6 mol%. 1~0
.. It was necessary to set it to 6 mol%. For this reason, although it is said that the positive temperature coefficient of resistance and withstand voltage improve as the amount of semiconducting agent added increases, in the case of indium, as shown in Figure 3, specific resistance increases when 0.6 mol% or more is added. It was expensive and difficult to put into practical use.
本発明は上述した欠点を除去したもので、従来絶縁体に
なるといわれていた半導体化剤の添7111量のm域で
、実用上使用可能な低抵抗を得るとともに、顕著な正の
抵抗温度係数をもち、耐電圧が大きくしかも信頼性の高
いチタン酸バリウム系半導体磁器を提供するものである
。The present invention eliminates the above-mentioned drawbacks, and achieves a practically usable low resistance in the m range of 7111 added with a semiconducting agent, which was conventionally said to become an insulator, and has a remarkable positive temperature coefficient of resistance. The present invention provides a barium titanate-based semiconductor porcelain having a high withstand voltage and high reliability.
(課題を解決するための手段)
本発明は、チタン酸バリウム系半導体磁器組成物又はB
aの一部をCa″C置換したチタン酸バリウム系磁器組
成物に対し1.0〜1.5モル%のY。(Means for Solving the Problems) The present invention provides a barium titanate-based semiconductor ceramic composition or B
1.0 to 1.5 mol % of Y based on the barium titanate ceramic composition in which a part of a is replaced with Ca''C.
Sb、Bi、Ta、Nb、希土類元素の少くとも一種を
添加し、この基材100モルに対しMn化合物を0.1
〜0.2モル,SiO2を0.5〜5モル添加すること
により、顕著な正の抵抗温度特性をもち、耐電圧の大き
いしかも信頼性の高いチタン酸バリウム系半導体磁器を
得ることができる。At least one of Sb, Bi, Ta, Nb, and rare earth elements is added, and 0.1 Mn compound is added to 100 mol of this base material.
By adding ~0.2 mol and 0.5 to 5 mol of SiO2, it is possible to obtain a barium titanate-based semiconductor porcelain that has remarkable positive resistance-temperature characteristics, high withstand voltage, and high reliability.
(作用及び実施例) 以下本発明を実施例によって説明する。(Actions and Examples) The present invention will be explained below with reference to Examples.
炭酸バリウム(BaCO,)、酸化チタン(Ti02)
、酸化イツトリウム(Y 20 s )炭酸カルシウム
(Ca COs >を第1表の組成になるように配合し
、ポリエチレン製のポットにメノー製のボールと共に入
れ、20時間混合をする。その混合粉体を950〜11
00℃で約15時間仮焼成をした。得られた仮焼原料に
酸化硅素(SiO3)、−酸化マンガン(MnO)、ア
ルミナ(Alx’s)を第1表のごとく添加し、ポリエ
チレン製のポットでメノー製のボールを用いて20時間
粉砕混合をしな0次いでバインダーとしてポリビニルア
ルコール水溶液を添加し、30メツシユのふるいで整粒
し、この整粒粉体をオイルプレスにより約1000 k
g / c m ’の圧力で20φ×31mmの円板
に成形した。この成形した円板を電気炉を用いて、自然
雰囲気中で1250〜1300℃の温度にて約1.5時
tWI焼成した。このようにして得られた試料の両面に
Agペーストを焼付け、オーム性接触のtiを設け、こ
れを試料とした。Barium carbonate (BaCO,), titanium oxide (Ti02)
, yttrium oxide (Y 20 s ) and calcium carbonate (Ca COs ) were blended to have the composition shown in Table 1, placed in a polyethylene pot together with an agate ball, and mixed for 20 hours.The mixed powder was 950-11
Temporary firing was performed at 00°C for about 15 hours. Silicon oxide (SiO3), -manganese oxide (MnO), and alumina (Alx's) were added to the obtained calcined raw material as shown in Table 1, and the mixture was ground for 20 hours using an agate ball in a polyethylene pot. After mixing, a polyvinyl alcohol aqueous solution was added as a binder, and the particles were sized using a 30-mesh sieve.
It was molded into a 20φ×31 mm disc under a pressure of g/cm′. This shaped disk was fired in an electric furnace at a temperature of 1250 to 1300° C. for about 1.5 hours tWI in a natural atmosphere. Ag paste was baked on both sides of the sample thus obtained, ti of ohmic contact was provided, and this was used as a sample.
これらの試料について常温(25℃)における比抵抗、
抵抗温度係数、耐電圧特性を測定し、その値を第2表及
び第3表に示した。For these samples, the specific resistance at room temperature (25°C),
The temperature coefficient of resistance and withstand voltage characteristics were measured and the values are shown in Tables 2 and 3.
上述の各種特性のうち抵抗温度係数は、抵抗温度特性に
おいて、抵抗急変点を越えたのちの立ち上がりの勾配を
示すもので以下のように定義する。Among the above-mentioned various characteristics, the temperature coefficient of resistance indicates the slope of the rise after a sudden resistance change point in the resistance temperature characteristics, and is defined as follows.
T t T +
ここでR2及びR1は、抵抗温度特性において、抵抗急
変点を越え急激に立ち上がった直線上の任意の二点の抵
抗値である。またT、及びT2は、1【1及びR2にお
けるそれぞれの温度である。また耐電圧特性は、試料に
電圧を徐々に印加してゆき、試料の破壊が生じる手前の
最高印加電圧値を示したものである。なお第1表、第2
表及び第3表において試料番号にO印を付したものはこ
の発明の範囲内のものであり、それ以外はすべて発明の
範囲外のものである。T t T + Here, R2 and R1 are resistance values at two arbitrary points on a straight line that suddenly rises beyond a sudden resistance change point in the resistance temperature characteristic. Further, T and T2 are the respective temperatures at 1[1 and R2. Further, the withstand voltage characteristic is a value that indicates the maximum applied voltage value before the sample breaks down when a voltage is gradually applied to the sample. In addition, Table 1, Table 2
In Tables and Table 3, the sample numbers marked with an O are within the scope of this invention, and all others are outside the scope of the invention.
(発明の効果)
以上の実施例よりこの発明の範囲内にあたる試料番号1
2〜24.30〜33.35〜44は、正の抵抗温度係
数が大きくかつ耐電圧特性が優れていることがわかる。(Effect of the invention) According to the above examples, sample number 1 falls within the scope of this invention.
It can be seen that samples 2 to 24.30 to 33.35 to 44 have large positive temperature coefficients of resistance and excellent withstand voltage characteristics.
この様子を本発明の範囲内である試料番号22と発明の
範囲外の試料番号5を抜き出し、第1図及び第2図にし
めした。This situation is shown in FIGS. 1 and 2 by extracting sample number 22, which is within the scope of the present invention, and sample number 5, which is outside the scope of the invention.
第1図は抵抗温度特性を示すものであるが、試料番号5
における抵抗温度係数が20.4%/℃と低いのに対し
、本発明の範囲内の試料番号22においては、52.8
%/℃と図中での立ち上がりが急峻になっている様子が
わかる。第2図は電圧−電流特性を示すものであるが、
試料番号5では300Vを過ぎると電流値がL j4
L始め、さらに電圧を上げると素子は破壊するが、本発
明の範囲内の試料番号22では電圧を500 Vまで上
げてら電流値は直線的に下降しており、耐電圧が高いこ
とを示している。Figure 1 shows the resistance temperature characteristics, and sample number 5
The temperature coefficient of resistance is as low as 20.4%/°C, while that of sample number 22 within the scope of the present invention is 52.8%/°C.
%/°C, and it can be seen that the rise in the figure is steep. Figure 2 shows the voltage-current characteristics.
In sample number 5, the current value becomes L j4 when it exceeds 300V.
At first, if the voltage is increased further, the element will be destroyed, but in sample number 22, which falls within the scope of the present invention, the current value decreases linearly when the voltage is increased to 500 V, indicating that the withstand voltage is high. There is.
本発明において、半導体化剤の添加範囲を10〜15モ
ル%としたのは、10モル%未満の添加では従来より添
加されていた菫であるため1.1
M n及びSiO□の添加量を変えても、試料番号1〜
10にみられるように正の抵抗温度係数及び耐電圧特性
が小さく、何ら本発明の目的に合うだけの効果が得られ
ず、15モル%を越えると試料番号26〜27のように
比抵抗が高くなってしまうからである。In the present invention, the addition range of the semiconducting agent is set to 10 to 15 mol % because violet has traditionally been added when less than 10 mol % is added. Even if you change sample number 1~
As seen in Sample No. 10, the positive temperature coefficient of resistance and withstand voltage characteristics are small, and no effect sufficient to meet the purpose of the present invention can be obtained. This is because it becomes expensive.
またMn化合物の添加範囲を半導体化剤を添加した基材
100モルに対して01〜0.2モルとしたのは、0,
1モル未満の添加では試料番号11のごとく比抵抗が高
く、また0 2モルを越えて添加しても、試料番号25
にみられるように比抵抗が高くなってしまうからである
。Furthermore, the addition range of the Mn compound was set to 0.01 to 0.2 moles per 100 moles of the base material to which the semiconducting agent was added.
When less than 1 mole is added, the resistivity is high as in sample number 11, and even when more than 0.2 mole is added, sample number 25
This is because the specific resistance becomes high as seen in .
そしてSin、の添加範囲を半導体化剤を添加した基材
100モルに対して05〜5モルとしたのは、0.5モ
ル未満の添加では試料番号28及び29にみられるよう
に、比抵抗が低くならず、また5モルを越えて添加する
と試料番号34のように比抵抗が高くなり、さらに正の
抵抗温度係数及び耐電圧特性が小さくなってしまうから
である。The reason why the addition range of Sin was set to 05 to 5 mol per 100 mol of the base material to which the semiconducting agent was added was because if less than 0.5 mol was added, as seen in sample numbers 28 and 29, the specific resistance If more than 5 mol is added, the specific resistance will become high as in sample number 34, and the positive temperature coefficient of resistance and withstand voltage characteristics will become smaller.
また実施例で試料番号38〜44に示すごとくチタン酸
バリウム系磁器組成物に対して、半導体化剤、Mn化合
物、SiO□を本発明の範囲内で添加したもので、Ba
の一部をCaで置換したものに対しても抵抗温度係数が
大きくかつ耐電圧特性の優れているものが得られた。In addition, as shown in sample numbers 38 to 44 in the examples, barium titanate ceramic compositions were added with a semiconducting agent, a Mn compound, and SiO□ within the scope of the present invention.
Even for those in which part of was replaced with Ca, a material with a large resistance temperature coefficient and excellent withstand voltage characteristics was obtained.
さらに一般に信頼性試験を高めるといわれているAl2
O>を本発明の範囲内である組成に対し添加しても、試
料番号35〜37.43.44のように正の抵抗温度係
数が大きくかつ耐電圧特性の優れているものが得られた
。Furthermore, Al2, which is generally said to improve reliability tests,
Even when O> was added to a composition within the scope of the present invention, samples with a large positive temperature coefficient of resistance and excellent withstand voltage characteristics were obtained, such as sample numbers 35 to 37.43.44. .
また実施例における素子を85℃の高温中にて125V
の電圧を1000±12時間印加したのち、常温中に取
り出し、1時間放置1奄、常温における抵抗値を測定し
たところ、本発明の範囲内にあたる試料番号12〜24
.30〜33.35〜44はすべて抵抗変化率が10%
以内で信頼性の高いものが得られた。In addition, the device in the example was tested at 125V at a high temperature of 85°C.
After applying a voltage of 1000 ± 12 hours, it was taken out at room temperature, left for 1 hour, and the resistance value at room temperature was measured.
.. 30-33. All 35-44 have a resistance change rate of 10%.
A highly reliable result was obtained within
以上のように従来より半導体化剤の添加量が多すぎて比
抵抗が急激に絶縁体に近rく領域において、Mn(ヒ合
物、5t02を本発明で規定した量を添加し、1250
〜1300°Cの温度で焼成することにより、実用上、
使用可能な比抵抗を得ることが出来、その結果、半導体
1ヒ剤の機筺添加に起因する比抵抗のバラツキが小さく
なり、さらに顕著な正の抵抗温度特性をもった耐電圧の
大きなしかも信頼性の高いチタン酸バリウム系m器が得
られるようになった。As described above, in the region where the amount of semiconductor forming agent added is too large and the specific resistance suddenly approaches that of an insulator, Mn (arsenic compound, 5t02) is added in the amount specified in the present invention, and 1250
By firing at a temperature of ~1300°C, for practical purposes,
As a result, the variation in resistivity caused by the addition of the semiconductor 1st agent is reduced, and it also has a high withstand voltage with a remarkable positive resistance temperature characteristic and is reliable. It is now possible to obtain a barium titanate-based device with high properties.
またこの発明の実施例で半導体化剤としてインドリウム
を使用したが、他の半導体化用元素についても同様な効
果が得られる。さらにこの発明のチタン酸バリウム系磁
器組成物には、抵抗急変点を移動させるP b 、 S
r 、 S Ll、 Z rなどを含有したものも含
まれる。Furthermore, although indolium was used as the semiconductor agent in the embodiments of the present invention, similar effects can be obtained with other semiconductor elements. Furthermore, the barium titanate-based porcelain composition of the present invention contains P b , S
Also included are those containing r, S Ll, Z r, etc.
(以下余白) 第 271(Margin below) No. 271
第1図はこの発明の実施例におけるチタン酸バリウム系
半導体磁器の抵抗温度特性図、第2図は同じく電圧電流
特性図である。それぞれの特性図において試料番号22
はこの発明の範囲内のものであり、試料番号5は範囲外
のむのである。第3図はチタン酸バリウム系半導体磁器
のイツトリウム添加量と比抵抗の関係を示す特性図であ
る。FIG. 1 is a resistance-temperature characteristic diagram of a barium titanate semiconductor ceramic according to an embodiment of the present invention, and FIG. 2 is a voltage-current characteristic diagram thereof. Sample number 22 in each characteristic diagram
is within the scope of this invention, and sample number 5 is outside the scope. FIG. 3 is a characteristic diagram showing the relationship between the amount of yttrium added and the specific resistance of barium titanate-based semiconductor ceramics.
Claims (1)
置換したチタン酸バリウム系磁器組成物に対し1.0〜
1.5モル%のY,Sb,Bi,Ta,Nb,希土類元
素の少くとも一種を添加し、この基材100モルに対し
Mn化合物を0.1〜0.2モル,SiO_2を0.5
〜5モル添加して構成するチタン酸バリウム系半導体磁
器。1.0 to barium titanate ceramic composition or barium titanate ceramic composition in which a part of Ba is replaced with Ca.
Add 1.5 mol% of Y, Sb, Bi, Ta, Nb, and at least one of rare earth elements, and add 0.1 to 0.2 mol of Mn compound and 0.5 mol of SiO_2 to 100 mol of this base material.
Barium titanate-based semiconductor porcelain constituted by adding ~5 mol of barium titanate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8161488A JPH01253902A (en) | 1988-04-01 | 1988-04-01 | Titanium acid barium semiconductor porcelain |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8161488A JPH01253902A (en) | 1988-04-01 | 1988-04-01 | Titanium acid barium semiconductor porcelain |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01253902A true JPH01253902A (en) | 1989-10-11 |
Family
ID=13751198
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8161488A Pending JPH01253902A (en) | 1988-04-01 | 1988-04-01 | Titanium acid barium semiconductor porcelain |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01253902A (en) |
-
1988
- 1988-04-01 JP JP8161488A patent/JPH01253902A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3319314B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPH0226866A (en) | Semiconductor ceramic composition | |
| JPH0345559A (en) | Ceramic composition having resistive element non-linear to electric voltage | |
| JP4058140B2 (en) | Barium titanate semiconductor porcelain | |
| JPH01253902A (en) | Titanium acid barium semiconductor porcelain | |
| JP2014072374A (en) | Barium titanate-based semiconductor porcelain composition and ptc thermistor using the same | |
| JP2944697B2 (en) | Voltage non-linear resistor ceramic composition | |
| JPS6243522B2 (en) | ||
| JP3598177B2 (en) | Voltage non-linear resistor porcelain | |
| JP2572796B2 (en) | Barium titanate-based semiconductor porcelain | |
| JPH03215354A (en) | Barium titanate-based semiconductor ceramic composition | |
| JPH11139870A (en) | Barium titanate-base semiconductor porcelain | |
| JPH0248121B2 (en) | ||
| JPH0248465A (en) | Barium titanate-based semiconductor porcelain | |
| JPH04144201A (en) | Positive temperature coefficient thermistor and manufacture thereof | |
| JP3840917B2 (en) | Voltage-dependent nonlinear resistor | |
| JPH0248464A (en) | Barium titanate-based semiconductor porcelain | |
| JPH0818865B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPH04299803A (en) | Positive temperature coefficient thermistor and its manufacturing method | |
| JPH03109257A (en) | Grain boundary oxidized voltage-nonlinear resistance composition | |
| JPH05315106A (en) | Barium titanate ceramic semiconductor and its manufacture | |
| JPS62115705A (en) | Compound for semiconductor porcelain capacitor | |
| JPH08151261A (en) | Semiconductor porcelain having positive resistance temperature characteristic | |
| JPH03109259A (en) | Grain boundary oxidized voltage-nonlinear resistance composition | |
| JPH08162301A (en) | Semiconductor porcelain having positive resistance temperature characteristic |