JPH03215354A - Barium titanate-based semiconductor ceramic composition - Google Patents
Barium titanate-based semiconductor ceramic compositionInfo
- Publication number
- JPH03215354A JPH03215354A JP2007931A JP793190A JPH03215354A JP H03215354 A JPH03215354 A JP H03215354A JP 2007931 A JP2007931 A JP 2007931A JP 793190 A JP793190 A JP 793190A JP H03215354 A JPH03215354 A JP H03215354A
- Authority
- JP
- Japan
- Prior art keywords
- barium titanate
- mol
- based semiconductor
- ceramic composition
- semiconductor ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910002113 barium titanate Inorganic materials 0.000 title claims abstract description 23
- 239000000203 mixture Substances 0.000 title claims abstract description 13
- 239000004065 semiconductor Substances 0.000 title claims description 24
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 title claims description 22
- 239000000919 ceramic Substances 0.000 title claims description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 13
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 8
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 4
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 4
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 4
- 229910052776 Thorium Inorganic materials 0.000 claims abstract description 3
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 3
- 229910052684 Cerium Inorganic materials 0.000 claims abstract 2
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract 2
- 229910052727 yttrium Inorganic materials 0.000 claims abstract 2
- 239000011572 manganese Substances 0.000 claims description 10
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 6
- 239000006104 solid solution Substances 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
- 229910052681 coesite Inorganic materials 0.000 abstract description 4
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 4
- 229910052745 lead Inorganic materials 0.000 abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 4
- 229910052682 stishovite Inorganic materials 0.000 abstract description 4
- 229910052905 tridymite Inorganic materials 0.000 abstract description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 abstract 2
- 229910003781 PbTiO3 Inorganic materials 0.000 abstract 1
- 229910002370 SrTiO3 Inorganic materials 0.000 abstract 1
- 238000007792 addition Methods 0.000 description 8
- 229910052573 porcelain Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 2
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- 229910016978 MnOx Inorganic materials 0.000 description 1
- 241000985694 Polypodiopsida Species 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Thermistors And Varistors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、一定温度を越えると急激に電気抵抗値が変化
する正の抵抗温度特性を有するチタン酸バリウム系半導
体磁器に関し、特に必要な耐電圧を確保しながら、常温
における比抵抗を小さくでき、ひいては低抵抗回路素子
として有用なチタン酸バリウム系半導体磁器組成物に関
する.〔従来の技術〕
一般にチタン酸バリウム系半導体磁器は、主成分として
のチタン酸バリウムに、半導体化剤としてY.La.C
e等の希土類元素.あるいはNb.Bi,Sb.W.T
h等のうち少なくとも一種以上を微量添加し、これを高
温で焼成して得られる.この半導体磁器は、常温におけ
る比抵抗が小さく、かつキエリー点を超えると著しい正
の抵抗温度変化を示す特性を有しており、例えば定温度
発熱用素子.電流制限用素子,温度制御用素子等として
使用されている.
また上記チタン酸バリウム系半導体磁器のキエリー点は
、その主成分であるチタン酸バリウムの影響により通常
120℃付近である.そして、このキュリー点を高温側
に移行させるためにBaの一部をpbで置換する方法が
知られている.逆に上記キエリー点を低温側に移行させ
るためにBaの一部をSrで置換したり、Tiの一部を
Zr.Sn等で置換したりする方法も知られている.ま
た、マンガンを微量(Mnに換算して0.03〜0.
15一〇a%)添加することにより、キエリー点を超え
た後の抵抗温度変化率を著しく増大させることも知られ
ている.さらにまた、SiO2を微量(0.5〜5mo
l%)添加することで、常温における比抵抗を低く安定
したものにできることも知られている.
ここで、上記チタン酸バリウム系半導体磁器においては
、耐電圧が高く、かつ常温における比抵抗の小さい低抵
抗回路素子として有用なものが要求されている.従来、
このような比抵抗特性の向上を図るために、Baの一部
をCa,又はSrで置換し、添加物としてMn,SiO
2を添加したものが提案されている.これによれば常温
における比抵抗が10Ω・1以下の特性が得られる.ま
た、特公昭63−28324号公報には、Baの一部を
pb,Sr,Caで同時に置換し、これらPb.Sr,
Caを共存状態で主成分のチタン酸バリウムに含脊させ
ることにより、IOOV/■以上の耐電圧が得られるこ
とが記載されている.
〔発明が解決しようとする問題点〕
しかしながら上記従来のチタン酸バリウム系半導体磁器
において、上述したBaの一部をCa,又はSrで置換
したものは、比抵抗では満足できる値が得られるものの
、耐電圧が最高のもので48V/■しか得られず実用上
十分な値ではない.また、上記公報のようにBaの一部
をPb, Sr, Caで同時に置換したものは、高い
耐電圧を得ることができるものの、比抵抗は35Ω・備
までしか下げることができない.従って、比延抗10Ω
・1以下.耐電圧100V/■以上の両方を満足できる
チタン酸バリウム系半導体磁器の出現が要請されている
.本発明の目的は、高い耐電圧を有し、かつ比抵抗の小
さいチタン酸バリウム系半導体磁器組成物を提供するこ
とにある.
〔問題点を解決するための手段〕
本件発明者らは、上記目的を達成するために鋭意研究を
重ねたところ、BaTiOs.CaTi0 3 ,
S r T i O s , P b T i O
sを主成分とし、これに添加する副成分を選定するとと
もに、これの添加量を限定すれば比抵抗.耐電圧の両方
の特性を満足できることを見出し、本発明を成したもの
である.
そこで本発明は、チタン酸バリウム又はその固溶体から
なる主成分に、半導体化剤.マンガン,及びシリカが添
加含有されているチタン酸バリウム系半導体磁器組成物
において、上記主成分が、B a T i O
* 30〜95so J %、 CaTiOs3
〜25s+o,j %、 S r T i O
s 1 〜25mol %、 pb”rtos1〜
30mo j%からなり、該主成分に半導体化剤として
、Y + L a * C a等の希土類元素ある
いはNb,Bi,Sb,W,Thの酸化物のうち少なく
とも一種が0.2〜l.Omol%添加され、かつマン
ガンがMnO.に換算して0.03〜0.1 mol%
、シリカがSin,に換算して0.01s+oj%以上
0.5 sol%未満それぞれ添加含有されていること
を特徴としている.
ここで、本発明における各種の条件を限定した理由につ
いて説明する.
■ 上記BaTiOs .CaTiOs ,SrTi
O s * P b T s O 3を主成分とした
のは、このBaの一部をCa,Sr,Pbで同時に置換
することにより、耐電圧値を向上させるためである.上
記Pb,Srは単独ではキエリー点をそれぞれ高温側,
低温側へ移行させるものであるが、これらCa.Sr,
pbを共存状態で主成分に含有させることにより、耐電
圧100V/ vm以上を実現できる.
■ 上記各主成分の範囲の限定理由は以下のとおりであ
る.
上記13 a T i O sを30〜95+mol%
とじたのは、30mo j%未満では半導体化が困難と
なり比抵抗も増大するからであり、95so j%を超
えると電気的特性が著しく低下するからである.
また、上記CaTiO.を3 〜25mo J%とした
のは、3 @O j%未満ではその含有効果が得られず
、かつ25mo 1%を超えると耐電圧特性,耐突入電
流特性の低下をもたらすからである.
さらに、上記SrTiO.を1〜25soJ%としたの
は、1moJ!%未満ではその改善特性の効果が少なく
、また25■ol%を超えると電気的特性が劣化するか
らである.
さらにまた、上記PbTiOsを1〜30so j%と
したのは、1■oIl%未満では特性改善の効果が少な
く実用に適さないからであり、また3抛oJ%を超える
と半導体化が困難となるからである.■ また上記半導
体化荊は、チタン酸バリウム系半導体磁器を得るために
添加することは公知であり、これらの添加量としては、
0.2〜1.Omol%の範囲が比抵抗を低《する上で
適当である.■ さらに、上記マンガンを添加すること
によリキュリー点を越えた正の抵抗温度特性の変化率を
著しく増大させることができる.またこのマンガンの添
加量をMnOxに換算して0.03〜0.1mol%と
したのは、この添加量が0.03moJ%未満では添加
効果が現れず、かえって耐電圧特性が劣化するからであ
り、0.1mol%を越えると常温での比抵抗が高くな
るからである.
■ また、上記シリカをSlotに換算して0.Olm
o l%以上0.5*oj%未満としたのは、半導体化
剤の微量添加のわずかな変動によって生じる比抵抗の変
化を抑制し、常温における比抵抗値を小さくしながら必
要耐電圧を確保するためである.このシリカの添加量が
0.5moJ%以XになるとMn量との関係で低比抵抗
化が実現できず、また0.01mo j%未満では焼結
体の粒子が異常粒になる場合が生じるからである.
〔作用〕
本発明に係るチタン酸バリウム系半導体磁器組成物によ
れば、上述のようにBaTiOs,CaTies .S
rTiOs .PbTiOsを主成分としたので、つま
りこのBaの一部を”+Sr,pbで同時に置換したの
で耐電圧を向上でき、さらに上記主成分に添加するシリ
カをSiO2に換算して0.01■ol%以上0.5m
oJ%未満としたので、必要耐電圧を確保しながら比抵
抗を小さ《でき、その結果耐電圧100V/ m以上、
比抵抗10Ω・1以下の低抵抗回路素子を実現でき、上
述した要請に応えられる.
〔実施例〕
以下、本発明の実施例を説明する.
本実施例は、本発明における各主成分,各副成分の添加
量を見出した実験について説明する.まず、実験に使用
した試料の製造方法について説明する.
主成分としてB a T i Os(69〜90mol
%).Ca T i Os (0〜15soJ
%) , S r T i Os (0
〜12mol%) + P b T 1 0 s (0
〜10mo J%)、半導体化剤としてYm Os (
0.2〜0.3 s+oj%),La.Os (0.
2moJ %) . C e Ot(0.3
mob %),Nd. Ox(0 .4mol%》、
及び添加物としてM n C O s(MnO,に換算
して0.03〜0.12soJ%),St08(O〜6
.0一07%)を準備する.この各原材料を第1表に示
す比率のチタン酸バリウム系半導体磁器組成物が得られ
るように配合し、湿式混合する.
次に、上記スラリー状の原料を脱水乾燥し、1150℃
×2時間で仮焼成する.次いでこの仮焼結体を粉砕混合
し、これにバインダーを加えて造粒し、成形圧力100
0kg/一で円板状にプレス成形する.次にこの円板状
の成形体を10℃/sinで1360℃まで昇温して所
定時間保持した後、10℃/sinで冷却する焼成プロ
ファイルで焼成した.これにより直径l7.5■×厚さ
0.6簡の円板状の半導体磁器を得る.そして、この半
導体磁器の両主面にIn−Ga合金からなる電極を付与
し、これを本実験用試料とした.
そして本実験では、上記各試料の常温中(25℃)にお
ける比抵抗.耐電圧,キエリー点をそれぞれ測定した.
なお、上記耐電圧は試料に破壊が生じる寸前の最高印加
電圧値を測定した.第1表及び第2表はその結果を示し
、第1表は上記主成分.半導体化剤.及び添加物のそれ
ぞれの配合比率を示し、第2表は各測定結果を示す.表
中、試料嵐7〜10、嵐14,15、及び−7〜20は
本発明の範囲内であり、これ以外の印は本発明の範囲外
である.
同表からも明らかなように、各主成分の添加1が所定範
囲を外れた場合(−1〜5)は、いす1も耐電圧が63
V/m以下と低い.またMnO.の裡加量,Sin.の
添加量が所定範囲を越えた場4(−16、嵐11〜13
)は、耐電圧特性は満工できる値が得られるものの、比
抵抗が12.9〜43.Ω・ロと高い.さらにSiO2
の添加量を0にした場合(嵐6)は、比抵抗が11.7
Ω・1.耐電Bが70V/mでいずれの試料においても
比抵抗.耐1圧の両方とも満足できる特性が得られてい
ない.これに対して各添加量が本発明範囲内の場合(N
7〜10、Nal4.15、IlkL17〜20》は、
Gずれもキエリー点は103〜115℃、比抵抗は5.
0〜9.7Ω・備と低く、かつ耐電圧は118〜180
V/鶴と高くなっており、満足できる値が得られて(る
ことがわかる.
〔発明の効果〕
以上のように本発明に係るチタン酸バリウム系半導体磁
器組成物によれば、BaTiO*30〜95mOJ %
, C a T I Os 3 〜25m
ol %, S r T I Os1 〜2
5mo j%, P b T i Os 1 〜30
mol% を生成分とし、これに半導体化剤0.2〜1
.0mol%を添加するとともに、MnをMnO,に換
算して0.03〜0.1 mol %、 S i
Os 0.01mol %以上0.5 閣ol%
未満をそれぞれ添加含有したので、耐電圧1oGV/
m以上、比抵抗10Ω・1以下の侵れた特性が得られる
とともに、低抵抗回路素子として有用な半導体磁器が得
られる効果がある.Detailed Description of the Invention [Field of Industrial Application] The present invention relates to barium titanate-based semiconductor porcelain, which has a positive resistance-temperature characteristic in which the electrical resistance value changes rapidly when a certain temperature is exceeded. This invention relates to a barium titanate-based semiconductor ceramic composition that can reduce specific resistance at room temperature while ensuring voltage, and is useful as a low-resistance circuit element. [Prior Art] Generally, barium titanate-based semiconductor porcelain contains barium titanate as a main component and Y.I. as a semiconductor agent. La. C
Rare earth elements such as e. Or Nb. Bi, Sb. W. T
It is obtained by adding a trace amount of at least one of h, etc. and firing it at a high temperature. This semiconductor porcelain has a characteristic that it has a low specific resistance at room temperature and exhibits a significant positive temperature change in resistance when it exceeds the Chierly point.For example, it can be used as a constant temperature heating element. It is used as a current limiting element, temperature control element, etc. Furthermore, the Chierie point of the barium titanate-based semiconductor porcelain is usually around 120°C due to the influence of its main component, barium titanate. In order to shift this Curie point to the high temperature side, a method is known in which a part of Ba is replaced with Pb. On the contrary, in order to shift the Chierly point to the low temperature side, a part of Ba is replaced with Sr, a part of Ti is replaced with Zr. A method of substituting with Sn or the like is also known. It also contains a trace amount of manganese (0.03 to 0.00 in terms of Mn).
It is also known that adding 1510a%) significantly increases the rate of change in resistance with temperature after exceeding the Chierie point. Furthermore, a trace amount of SiO2 (0.5 to 5 mo
It is also known that the specific resistance at room temperature can be made low and stable by adding 1%). Here, the barium titanate-based semiconductor porcelain is required to have a high withstand voltage and a low specific resistance at room temperature, making it useful as a low-resistance circuit element. Conventionally,
In order to improve such resistivity characteristics, a part of Ba is replaced with Ca or Sr, and Mn and SiO are added as additives.
2 has been proposed. According to this, a characteristic with a specific resistance of 10Ω·1 or less at room temperature can be obtained. Furthermore, Japanese Patent Publication No. 63-28324 discloses that a part of Ba is simultaneously replaced with pb, Sr, and Ca, and these Pb. Sr,
It is stated that by impregnating barium titanate, the main component, with Ca in the coexistence state, a withstand voltage of IOOV/■ or more can be obtained. [Problems to be Solved by the Invention] However, in the above-mentioned conventional barium titanate-based semiconductor porcelain, in which a part of the Ba mentioned above is replaced with Ca or Sr, although a satisfactory value of resistivity can be obtained, The highest voltage withstand voltage is only 48V/■, which is not a sufficient value for practical use. Furthermore, as in the above publication, a part of Ba is replaced with Pb, Sr, and Ca at the same time, and although a high withstand voltage can be obtained, the specific resistance can only be lowered to 35Ω. Therefore, the specific resistance is 10Ω
・Less than 1. There is a demand for the emergence of barium titanate-based semiconductor ceramics that can satisfy both of the requirements of a withstand voltage of 100 V/■ or more. An object of the present invention is to provide a barium titanate-based semiconductor ceramic composition that has high withstand voltage and low specific resistance. [Means for Solving the Problems] In order to achieve the above object, the inventors of the present invention conducted intensive research and found that BaTiOs. CaTi0 3 ,
S r T i O s , P b T i O
By setting s as the main component, selecting the subcomponents added to it, and limiting the amount added, the specific resistance can be achieved. We have discovered that both characteristics of withstand voltage can be satisfied, and have completed the present invention. Therefore, the present invention provides a main component consisting of barium titanate or a solid solution thereof, and a semiconducting agent. In a barium titanate-based semiconductor ceramic composition containing manganese and silica, the main component is B a T i O
*30-95so J%, CaTiOs3
~25s+o,j %, S r T i O
s1~25mol%, pb"rtos1~
30 mo j%, and the main component contains at least one of rare earth elements such as Y + L a * C a or oxides of Nb, Bi, Sb, W, and Th as a semiconductor agent in an amount of 0.2 to 1. Omol% is added, and manganese is MnO. Converting to 0.03-0.1 mol%
, silica is added and contained in an amount of 0.01s+oj% or more and less than 0.5 sol%, respectively, in terms of Sin. Here, the reasons for limiting various conditions in the present invention will be explained. ■ The above BaTiOs. CaTiOs, SrTi
The reason why O s * P b T s O 3 is used as the main component is to improve the withstand voltage value by replacing a part of this Ba with Ca, Sr, and Pb at the same time. The above Pb and Sr individually have their Chierie points on the high temperature side and
These Ca. Sr,
By including pb as the main component in a coexisting state, a withstand voltage of 100 V/vm or more can be achieved. ■ The reason for limiting the range of each principal component above is as follows. 30-95+mol% of the above 13 a TiOs
The reason for this is that if it is less than 30 mo j %, it will be difficult to make it into a semiconductor and the specific resistance will increase, and if it exceeds 95 so j %, the electrical characteristics will deteriorate significantly. In addition, the above CaTiO. The reason why O is set at 3 to 25 mo J% is that if the content is less than 3 @O j %, the effect of its inclusion cannot be obtained, and if it exceeds 25 mo 1%, the withstand voltage characteristics and inrush current characteristics will deteriorate. Furthermore, the above SrTiO. 1 to 25 soJ% is 1moJ! This is because if the amount is less than 25 ol%, the effect of improving the characteristics will be small, and if it exceeds 25 ol%, the electrical characteristics will deteriorate. Furthermore, the reason why the above-mentioned PbTiOs is set to 1 to 30 soj% is that if it is less than 1 oIl%, the effect of improving characteristics is small and it is not suitable for practical use, and if it exceeds 3 oJ%, it becomes difficult to make it into a semiconductor. It is from. ■ Also, it is known that the above-mentioned semiconducting ferns are added in order to obtain barium titanate-based semiconducting porcelain, and the amount of these additions is as follows:
0.2-1. The Omol% range is appropriate for lowering the specific resistance. ■Furthermore, by adding the manganese mentioned above, the rate of change of the positive resistance temperature characteristic beyond the Licurie point can be significantly increased. The reason why the amount of manganese added is 0.03 to 0.1 mol% in terms of MnOx is because if the amount added is less than 0.03 moJ%, the addition effect will not appear and the withstand voltage characteristics will deteriorate. This is because if it exceeds 0.1 mol%, the resistivity at room temperature will increase. ■ Also, convert the above silica into Slot and get 0. Olm
The reason why the content is set to 1% or more and less than 0.5*oj% is to suppress changes in resistivity caused by slight fluctuations in the addition of a small amount of semiconducting agent, and to ensure the necessary withstand voltage while reducing the resistivity value at room temperature. This is to do so. If the amount of silica added is 0.5 moJ% or more, low resistivity cannot be achieved due to the relationship with the Mn amount, and if it is less than 0.01 moJ%, the particles of the sintered body may become abnormal grains. It is from. [Function] According to the barium titanate-based semiconductor ceramic composition according to the present invention, as described above, BaTiOs, CaTies. S
rTiOs. Since PbTiOs was used as the main component, that is, part of this Ba was replaced with +Sr and pb at the same time, so the withstand voltage could be improved, and the silica added to the main component was 0.01 ol% in terms of SiO2. 0.5m or more
Since it is less than oJ%, it is possible to reduce the specific resistance while ensuring the necessary withstand voltage, resulting in a withstand voltage of 100 V/m or more,
It is possible to realize a low-resistance circuit element with a specific resistance of 10Ω·1 or less, meeting the above requirements. [Examples] Examples of the present invention will be described below. This example describes an experiment in which the amounts of each main component and each subcomponent added in the present invention were determined. First, we will explain the method for manufacturing the samples used in the experiment. B a Ti Os (69-90 mol
%). Ca Ti Os (0~15soJ
%) , S r T i Os (0
~12 mol%) + P b T 10 s (0
~10moJ%), YmOs (
0.2-0.3 s+oj%), La. Os (0.
2moJ%). C e Ot(0.3
mob%), Nd. Ox (0.4 mol%),
and M n CO s (0.03 to 0.12 soJ% in terms of MnO), St08 (O to 6
.. 0-07%). These raw materials are blended and wet-mixed so as to obtain a barium titanate-based semiconductor ceramic composition having the ratio shown in Table 1. Next, the slurry-like raw material was dehydrated and dried at 1150°C.
× Temporary firing for 2 hours. Next, this pre-sintered body is pulverized and mixed, a binder is added thereto, granulated, and a molding pressure of 100
Press into a disc shape at 0 kg/1. Next, this disc-shaped compact was heated to 1360°C at a rate of 10°C/sin, held for a predetermined time, and then fired using a firing profile in which it was cooled at a rate of 10°C/sin. As a result, a disk-shaped semiconductor porcelain with a diameter of 17.5 cm and a thickness of 0.6 cm is obtained. Then, electrodes made of In-Ga alloy were provided on both main surfaces of this semiconductor ceramic, and this was used as a sample for this experiment. In this experiment, we determined the specific resistance of each sample at room temperature (25°C). The withstand voltage and Chierly point were measured.
The above withstand voltage was measured at the maximum applied voltage value just before the sample was destroyed. Tables 1 and 2 show the results, and Table 1 shows the above main components. Semiconducting agent. Table 2 shows the respective measurement results. In the table, samples Arashi 7 to 10, Arashi 14, 15, and -7 to 20 are within the scope of the present invention, and the other marks are outside the scope of the present invention. As is clear from the table, when the addition 1 of each main component is outside the specified range (-1 to 5), the withstand voltage of chair 1 is 63
Low, less than V/m. Also, MnO. The amount of addition, Sin. If the amount of addition exceeds the specified range 4 (-16, Arashi 11-13
), the withstand voltage characteristics can be achieved at full capacity, but the specific resistance is 12.9 to 43. Ω・Ro is high. Furthermore, SiO2
When the amount of addition is 0 (Arashi 6), the specific resistance is 11.7
Ω・1. Withstand voltage B is 70V/m, and the specific resistance of each sample is 70V/m. Satisfactory characteristics have not been obtained for both 1-voltage resistance. On the other hand, when each addition amount is within the range of the present invention (N
7-10, Nal4.15, IlkL17-20》
The Chierly point of the G deviation is 103 to 115°C, and the specific resistance is 5.
Low resistance of 0 to 9.7Ω, and withstand voltage of 118 to 180
It can be seen that a satisfactory value was obtained (V/Tsuru). [Effects of the Invention] As described above, according to the barium titanate-based semiconductor ceramic composition of the present invention, BaTiO*30 ~95mOJ%
, C a T I Os 3 ~25m
ol %, S r T I Os1 ~2
5moj%, PbTiOs1~30
mol% is the product, and 0.2 to 1 mol% of the semiconducting agent is added to this.
.. While adding 0 mol%, converting Mn to MnO, 0.03 to 0.1 mol%, Si
Os 0.01mol% or more 0.5 Cabinet ol%
Since the added content of less than
It is possible to obtain a semiconductor ceramic useful as a low-resistance circuit element, as well as to obtain a resistivity of 10Ω.m or more and a resistivity of 10Ω·1 or less.
Claims (1)
に、半導体化剤,マンガン,及びシリカが添加含有され
ているチタン酸バリウム系半導体磁器組成物において、
上記主成分は、BaTiO_3が30〜95mol%、
CaTiO_3が3〜25mol%、SrTiO_3が
1〜25mol%、PbTiO_3が1〜30mol%
からなり、上記主成分に対して半導体化剤として、Y,
La,Ce等の希土類元素あるいはNb,Bi,Sb,
W,Thの酸化物のうち少なくとも一種が0.2〜1.
0mol%添加含有され、かつマンガンがMnO_2に
換算して0.03〜0.1mol%、シリカがSiO_
2に換算して0.01mol%以上0.5mol%未満
それぞれ添加含有されていることを特徴とするチタン酸
バリウム系半導体磁器組成物。(1) A barium titanate-based semiconductor ceramic composition in which a semiconducting agent, manganese, and silica are added to the main component consisting of barium titanate or a solid solution thereof,
The above main components include 30 to 95 mol% of BaTiO_3;
CaTiO_3 is 3-25 mol%, SrTiO_3 is 1-25 mol%, PbTiO_3 is 1-30 mol%
Y, as a semiconducting agent for the above main component.
Rare earth elements such as La, Ce or Nb, Bi, Sb,
At least one of the oxides of W and Th has a content of 0.2 to 1.
0 mol% added and contained, manganese is 0.03 to 0.1 mol% converted to MnO_2, and silica is SiO_2.
A barium titanate-based semiconductor ceramic composition, characterized in that the barium titanate-based semiconductor ceramic composition contains 0.01 mol% or more and less than 0.5 mol%, respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007931A JPH03215354A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007931A JPH03215354A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03215354A true JPH03215354A (en) | 1991-09-20 |
Family
ID=11679267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007931A Pending JPH03215354A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03215354A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06296472A (en) * | 1991-09-04 | 1994-10-25 | Nobuhisa Kawano | Composition for dietary fiber food and preparation of dietary fiber food |
| US5777541A (en) * | 1995-08-07 | 1998-07-07 | U.S. Philips Corporation | Multiple element PTC resistor |
| CN102471164A (en) * | 2009-07-01 | 2012-05-23 | 株式会社村田制作所 | Semiconductor ceramics and positive characteristic thermistors |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0354165A (en) * | 1989-07-20 | 1991-03-08 | Nkk Corp | PTC porcelain composition and its manufacturing method |
-
1990
- 1990-01-16 JP JP2007931A patent/JPH03215354A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0354165A (en) * | 1989-07-20 | 1991-03-08 | Nkk Corp | PTC porcelain composition and its manufacturing method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06296472A (en) * | 1991-09-04 | 1994-10-25 | Nobuhisa Kawano | Composition for dietary fiber food and preparation of dietary fiber food |
| US5777541A (en) * | 1995-08-07 | 1998-07-07 | U.S. Philips Corporation | Multiple element PTC resistor |
| CN102471164A (en) * | 2009-07-01 | 2012-05-23 | 株式会社村田制作所 | Semiconductor ceramics and positive characteristic thermistors |
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