JPH01256A - Manufacturing method of aluminum foil for electrolytic capacitors - Google Patents
Manufacturing method of aluminum foil for electrolytic capacitorsInfo
- Publication number
- JPH01256A JPH01256A JP62-145151A JP14515187A JPH01256A JP H01256 A JPH01256 A JP H01256A JP 14515187 A JP14515187 A JP 14515187A JP H01256 A JPH01256 A JP H01256A
- Authority
- JP
- Japan
- Prior art keywords
- foil
- etching
- capacitance
- examples
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は交流エツチング後に高い静電容量が得られる電
解コンデンサ用アルミニウム箔の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing aluminum foil for electrolytic capacitors that provides high capacitance after AC etching.
[従来の技術] 電解コンデンサの静電容量は電極の表面積に比例する。[Conventional technology] The capacitance of an electrolytic capacitor is proportional to the surface area of the electrodes.
したがって、電極用のアルミニウム箔は化学的又は電気
化学的にエツチングされ、粗面化されて、表面積が拡大
されている。エツチング条件は箔の最終用途により決定
される。Therefore, aluminum foil for electrodes is chemically or electrochemically etched and roughened to increase its surface area. Etching conditions are determined by the final use of the foil.
電解コンデンサの電極のうち、使用に当り低い電圧に化
成されるか全く化成されない用途には、0.5μmくら
いの均一で微細なエッチビットの得られる交流エツチン
グ法がわが国では広く用いられている。For electrodes of electrolytic capacitors that are chemically converted to a low voltage or not chemically formed at all during use, AC etching is widely used in Japan because it produces uniform and fine etch bits of about 0.5 μm.
交流エツチング用のアルミニウム箔には、硬質又は軟質
の両方が用いられているが、強度の点で硬質の方が優れ
ている。したがって、硬質のものはエツチングラインで
高い張力をかけることができ、エツチング中の蛇行、箔
切れ、シワなどのトラブルが少なく有利に用いられてい
る。Both hard and soft aluminum foils are used for AC etching, but hard foils are superior in terms of strength. Therefore, hard materials are advantageously used because they allow high tension to be applied to the etching line and cause fewer problems such as meandering, foil breakage, and wrinkles during etching.
そして、箔地及び箔の圧延過程において中間焼鈍は行わ
れていない。これは通常中間焼鈍は圧延材が加工硬化し
、圧延しにくくなったときの軟化を目的として行われる
のに対し、電解コンデンサ用の箔材にあってはアルミニ
ウム純度が高いことから、圧延しにくくなるまで硬化し
ないからである。Further, intermediate annealing is not performed during the rolling process of the foil base and foil. Usually, intermediate annealing is carried out to soften the rolled material when it becomes work hardened and becomes difficult to roll. However, foil material for electrolytic capacitors has a high aluminum purity, making it difficult to roll. This is because it does not harden until it becomes solid.
[発明が解決しようとする問題点]
硬質のアルミニウム箔を交流の電解エツチングをすると
、0.5μm程度のエッチピットが集合した海綿状の組
織が形成される。[Problems to be Solved by the Invention] When a hard aluminum foil is subjected to AC electrolytic etching, a spongy structure in which etch pits of about 0.5 μm are gathered is formed.
ところで交流エツチングによりアルミニウム箔の重量は
下記の3要因で減少する。By the way, the weight of aluminum foil is reduced by AC etching due to the following three factors.
■ 電解エツチング減量:交流電解による反応域間。■ Electrolytic etching weight loss: between reaction zones by AC electrolysis.
■ 化学溶解減量:電解液との化学反応による減量。■Chemical dissolution weight loss: Weight loss due to chemical reaction with electrolyte.
■ 機械的脱落による減量:海綿状組織の欠損による減
量。■ Weight loss due to mechanical shedding: Weight loss due to loss of spongy tissue.
この中、■は通電電気量に比例し、理論値どおりの値を
示す。又■はアルミニウム箔の成分との関係が強い。Among these, ■ is proportional to the amount of electricity flowing and shows a value that is the same as the theoretical value. Also, ■ has a strong relationship with the components of the aluminum foil.
今般本発明者らは■がアルミニウム箔の製造条件と密接
な関係があることを見出した。The present inventors have recently discovered that ■ is closely related to the manufacturing conditions of aluminum foil.
そこで、本発明では交流エツチング時の重量減少量と静
電容量との関係を究明して、高い静電容量を得んとする
ものである。Therefore, the present invention attempts to obtain a high capacitance by investigating the relationship between the amount of weight loss during AC etching and the capacitance.
[問題点を解決するための手段]
本発明は、純度99.4%以上のアルミニウムを熱間圧
延直後又は冷間圧延途中において焼鈍温度に加熱し、最
終冷間圧延率を50〜99%とすることを特徴とする電
解コンデンサ用アルミニウム箔の製造方法である。[Means for Solving the Problems] The present invention heats aluminum with a purity of 99.4% or more to an annealing temperature immediately after hot rolling or during cold rolling to achieve a final cold rolling rate of 50 to 99%. This is a method for manufacturing aluminum foil for electrolytic capacitors, characterized by:
すなわち、本発明は高純度アルミニウムの圧延に当り、
熱間圧延直後又は冷間圧延途中において、通常の中間焼
鈍温度である250℃〜620℃で加熱することにより
、最終圧延箔の歪量をコントロールして、交流エツチン
グ時のピット発生密度を制御し、ピットが相互に合体し
、機械的に脱落するのを防ぐものである。That is, the present invention relates to rolling high-purity aluminum,
Immediately after hot rolling or during cold rolling, heating is performed at a normal intermediate annealing temperature of 250°C to 620°C to control the amount of strain in the final rolled foil and control the density of pits generated during AC etching. , which prevents the pits from coalescing into each other and mechanically falling out.
アルミニウム純度を99.4%以上としたのは、これよ
りも低い純度では不純物が多すぎて、コンデンサの電極
に適さなくなるからである。又、冷間圧延率の最小値は
硬質のアルミニウムが得られる範囲とする。The reason why the aluminum purity is set to 99.4% or more is because if the purity is lower than this, there are too many impurities and it is not suitable for the electrode of a capacitor. Further, the minimum value of the cold rolling rate is set within a range in which hard aluminum can be obtained.
そして、アルミニウム箔(99,98%AI>の冷間圧
延率と交流エツチング後の静電容量および交流エツチン
グ時の重量減少量に関する試験をして、第1図並びに第
2図に示す結果を得た。Then, tests were conducted on the cold rolling rate of aluminum foil (99,98% AI), the capacitance after AC etching, and the amount of weight loss during AC etching, and the results shown in Figures 1 and 2 were obtained. Ta.
すなわち、第1図の場合は40V化成処理したものの冷
間圧延率と静電容量および重量減少率との関係を示すも
ので、40Vのように比較的高い電圧で化成処理したも
のは、冷間圧延率が高くなるにしたがい、交流エツチン
グ時のピット密度が増加し、限度以上になるとピットの
合体が始まり、前記■の機械的脱落による重量減少量が
増加して、静電容」が低下することを示すものと考えら
れる。第3図は第1図の場合における重量減少量と静電
容量との関係を示すグラフである。第2図は20V化成
処理したときの冷間圧延率と静電容量および重量減少率
との関係を示すグラフである。この低電圧化成の場合は
微細なエッチピットが有効であり、特に高電圧化成では
静電容量の低下する冷間圧延率95%以上の範囲におい
て、静電容量の向上が認められる。In other words, Figure 1 shows the relationship between the cold rolling rate, capacitance, and weight reduction rate of a product that has been chemically treated at 40V. As the rolling rate increases, the pit density during AC etching increases, and when it exceeds the limit, the pits begin to coalesce, increasing the amount of weight loss due to mechanical dropout mentioned above, and reducing the capacitance. This is considered to indicate that FIG. 3 is a graph showing the relationship between weight loss and capacitance in the case of FIG. 1. FIG. 2 is a graph showing the relationship between cold rolling rate, capacitance, and weight reduction rate when subjected to 20V chemical conversion treatment. In the case of this low-voltage forming, fine etch pits are effective, and in particular, in the case of high-voltage forming, an improvement in capacitance is observed in the range of a cold rolling rate of 95% or more where the capacitance decreases.
したがって本発明では箔の使用目的に応じて、化成処理
電圧を適宜変更し、冷間圧延率も前記範囲で変化させて
、所望の特性をもった製品を得る。Therefore, in the present invention, the chemical conversion voltage is changed as appropriate depending on the intended use of the foil, and the cold rolling rate is also changed within the above range to obtain a product with desired characteristics.
[実施例]
次に実施例を示すが、実施例1〜4並びに比較例1.2
は冷間圧延率が95%までの例で、実施例5〜8並びに
比較例3〜6は冷間圧延率95%以上のものについての
例である。[Example] Next, Examples will be shown. Examples 1 to 4 and Comparative Example 1.2
Examples 5 to 8 and Comparative Examples 3 to 6 are examples in which the cold rolling rate is up to 95%, and Examples 5 to 8 and Comparative Examples 3 to 6 are examples in which the cold rolling rate is 95% or more.
実施例1
S i : 50ppm SFe :50ppm 、
Cu :35ppmとその他の不可避不純物を含む99
.98%アルミニウムを用い、通常の方法でスラブの均
質化処理と熱間圧延を行い、25mm厚の板を作成した
。Example 1 Si: 50ppm SFe: 50ppm,
Cu: 99 containing 35 ppm and other unavoidable impurities
.. Using 98% aluminum, the slab was homogenized and hot rolled in a conventional manner to produce a plate with a thickness of 25 mm.
この25mIII板を冷間圧延してo、 smmの厚さ
にしたのち、350℃で1時間の中間焼鈍を行った。そ
の後o、immに圧延し、エツチング用の箔とした。This 25mIII plate was cold-rolled to a thickness of 0.5 mm, and then intermediately annealed at 350° C. for 1 hour. Thereafter, it was rolled to a thickness of 0.1 mm to obtain a foil for etching.
実施例2
実施例1と同じ25mmの板を冷間圧延で1.5mm厚
さの板とした後、中間焼鈍を行った以外は実施例1と同
じ操作でo、1mm厚の箔を作成した。Example 2 After cold rolling the same 25 mm plate as in Example 1 to a 1.5 mm thick plate, a 1 mm thick foil was created using the same operations as in Example 1 except that intermediate annealing was performed. .
比較例1
実施例1と同じくしてつくった25mm厚の板を、中間
焼鈍を行わずに0.1mm厚の箔を作成した。Comparative Example 1 A 25 mm thick plate made in the same manner as in Example 1 was made into a 0.1 mm thick foil without intermediate annealing.
実施例3
3i:0.05%、Fe:0.07%とその他の不可避
不純物を含む99.85%アルミニウムを用いた以外は
実施例2と同様にして、0.1叩厚の箔を作成した。Example 3 A foil with a beating thickness of 0.1 was made in the same manner as in Example 2 except that 99.85% aluminum containing 3i: 0.05%, Fe: 0.07% and other unavoidable impurities was used. did.
実施例4
1.5mmの厚さの中間焼鈍を520°Cで10秒間行
った以外は、実施例3と同様にして0.1mm厚の箔を
作成した。Example 4 A foil with a thickness of 0.1 mm was produced in the same manner as in Example 3, except that intermediate annealing of a thickness of 1.5 mm was performed at 520° C. for 10 seconds.
比較例2
厚さ6mmで中間焼鈍をした以外は、実施例3と同様に
して0.1mm厚の箔を作成した。Comparative Example 2 A foil with a thickness of 0.1 mm was produced in the same manner as in Example 3, except that intermediate annealing was performed at a thickness of 6 mm.
以上のようにして得られた0、1mmの厚さの硬質箔を
55℃の12.5%塩酸に0.6%燐酸を加えた電解液
中で、0.6A/cm 2で実施例1と2および比較例
1については3分間、実施例3と4および比較例2につ
いては1分間の60Hzの交流エツチングを行った。Example 1 The hard foil with a thickness of 0.1 mm obtained as described above was heated at 0.6 A/cm 2 in an electrolytic solution of 12.5% hydrochloric acid and 0.6% phosphoric acid at 55°C. AC etching was performed at 60 Hz for 3 minutes for Examples 3 and 2 and Comparative Example 1, and for 1 minute for Examples 3 and 4 and Comparative Example 2.
その後、アジピン酸アンモン水溶液中にて、実施例1と
2および比較例1については40Vに、実施例3と4お
よび比較例2については3Vに化成し、ホウ酸アンモン
水溶液中で静電容量を測定した。Thereafter, Examples 1 and 2 and Comparative Example 1 were converted to 40 V in an ammonium adipate aqueous solution, and Examples 3 and 4 and Comparative Example 2 were converted to 3 V, and the capacitance was increased in an ammonium borate aqueous solution. It was measured.
又、交流エツチングによる重量減少量は、交流エツチン
グ前俊の重量差から算出した。Further, the amount of weight loss due to AC etching was calculated from the weight difference before AC etching.
このようにして得られた静電容量と交流エツチング時の
重量減少量を表1に示す。Table 1 shows the capacitance thus obtained and the amount of weight loss during AC etching.
表1
実施例5
実施例1と同様にして作成した25mm厚の板を冷間圧
延して2.5mmの厚さにした後、350℃で1時間の
中間焼鈍を行った。その後0.1111mに圧延し、エ
ツチング用の箔とした。Table 1 Example 5 A 25 mm thick plate produced in the same manner as in Example 1 was cold rolled to a thickness of 2.5 mm, and then intermediate annealed at 350° C. for 1 hour. Thereafter, it was rolled to 0.1111 m to obtain a foil for etching.
実施例6
実施例5と同じ25mm厚の板を冷間圧延で5mn+厚
さにした後、中間焼鈍を行った以外は実施例5と同様に
して0.1mm厚の箔とした。Example 6 A foil with a thickness of 0.1 mm was prepared in the same manner as in Example 5, except that the same 25 mm thick plate as in Example 5 was cold-rolled to a thickness of 5 mm+, and then subjected to intermediate annealing.
比較例3
実施例5と同様にしてつくった25mm厚の板を中間焼
鈍を行わず0.1mm厚の箔を作成した。Comparative Example 3 A 0.1 mm thick foil was produced from a 25 mm thick plate produced in the same manner as in Example 5 without performing intermediate annealing.
比較例4
実施例5と同様にしてつくった25mm厚の板を冷間圧
延でimm厚ざの板とした後、中間焼鈍を行った以外は
実施例5と同様に0.1mm厚の箔を作成した。Comparative Example 4 A 25 mm thick plate produced in the same manner as in Example 5 was cold-rolled into an im-thick plate, and then a 0.1 mm thick foil was produced in the same manner as in Example 5, except that intermediate annealing was performed. Created.
実施例7
3i:0.05%、Fe:0.07%とその他の不可避
不純物を含む99.85%のアルミニウムを用いた以外
は実施例5と同様にして0.1mm厚の箔を作成した。Example 7 A 0.1 mm thick foil was created in the same manner as in Example 5 except that 99.85% aluminum containing 3i: 0.05%, Fe: 0.07% and other unavoidable impurities was used. .
実施例8
5mm厚さで中間焼鈍を行った以外は、実施例7と同様
にして0.1mm厚の箔を作成、した。Example 8 A foil with a thickness of 0.1 mm was produced in the same manner as in Example 7, except that intermediate annealing was performed at a thickness of 5 mm.
比較例5
実施例7と同じくしてつくった25mm厚の板を、中間
焼鈍を行わずにo、imm厚の箔を作成した。Comparative Example 5 A 25 mm thick plate made in the same manner as in Example 7 was made into an o.imm thick foil without intermediate annealing.
比較例6
厚さ1mmで中間焼鈍をした以外は実施例7と同様にし
て0.1mm厚の箔を作成した。Comparative Example 6 A foil with a thickness of 0.1 mm was produced in the same manner as in Example 7, except that intermediate annealing was performed at a thickness of 1 mm.
以上の実施例5〜8並びに比較例3〜5で得られた0、
1mmの厚さの硬質箔を55℃の12.5%塩酸に1%
硝酸と0.5%燐酸と0.7%蓚酸を加えた電解液中で
0.8A/Cm 2で実施例5と6および比較例3と4
については3分間、実施例7と8および比較例5と6に
ついては1分間の60Hzの交流エツチングを行った。0 obtained in Examples 5 to 8 and Comparative Examples 3 to 5 above,
A 1 mm thick hard foil was diluted with 1% in 12.5% hydrochloric acid at 55°C.
Examples 5 and 6 and Comparative Examples 3 and 4 at 0.8 A/Cm 2 in an electrolyte containing nitric acid, 0.5% phosphoric acid, and 0.7% oxalic acid.
AC etching was performed at 60 Hz for 3 minutes for Examples 7 and 8 and Comparative Examples 5 and 6 for 1 minute.
その後アジピン酸アンモン水溶液中にて実施例5と6お
よび比較例3と4については20Vに、実施例7と8お
よび比較例5と6については3■に化成し、ホウ酸アン
モン水溶液中で静電容量を測定した。Thereafter, Examples 5 and 6 and Comparative Examples 3 and 4 were converted to 20V in an ammonium adipate aqueous solution, and Examples 7 and 8 and Comparative Examples 5 and 6 were converted to 3V, and then left to stand in an ammonium borate aqueous solution. The capacitance was measured.
又、交流エツチングによる重量減少量は交流エツチング
前後の重量差から算出した。The amount of weight loss due to AC etching was calculated from the difference in weight before and after AC etching.
このようにして得られた静電容量と交流エッチジグ時の
重量減少量を表2に示す。Table 2 shows the capacitance thus obtained and the amount of weight loss during AC etching.
表2
[発明の効果]
本発明は交流エツチング時のエッチピット生成状態を調
節することによって、電解コンデンサ用に用いた場合に
、高い静電容量を(qることができるアルミニウム箔を
得ることができる。Table 2 [Effects of the Invention] The present invention makes it possible to obtain an aluminum foil that can have a high capacitance (q) when used for electrolytic capacitors by adjusting the state of etch pit formation during AC etching. can.
このことは、電解コンデンサの電解液中の溶存アルミニ
ウム濃度を減少させ、液の劣化を遅くする効果を有する
。This has the effect of reducing the dissolved aluminum concentration in the electrolytic solution of the electrolytic capacitor and slowing down the deterioration of the solution.
第1図は40V化成処理時における冷間圧延率と交流エ
ツチング時の重量減少量と静電容量との関係についての
試験結果を示すグラフ、第2図は20V化成処理時にお
ける冷間圧延率と交流エツチング時の重量減少量と静電
容量との関係についての試験結果を示すグラフ、第3図
は第1図における交流エツチング時の重量減少量と静電
容量との関係についての試験結果を示すグラフである。
特許出願人 住友軽金属工業株式会社
代理人 弁理士 小 松 秀 岳
代理人 弁理士 旭 宏Figure 1 is a graph showing the test results regarding the relationship between cold rolling rate during 40V chemical conversion treatment, weight loss during AC etching, and capacitance, and Figure 2 is a graph showing the relationship between cold rolling rate and capacitance during 20V chemical conversion treatment. A graph showing the test results on the relationship between the amount of weight loss during AC etching and capacitance, and Figure 3 shows the test results on the relationship between the amount of weight loss and capacitance during AC etching in Figure 1. It is a graph. Patent Applicant Sumitomo Light Metal Industries Co., Ltd. Agent Patent Attorney Hide Komatsu Agent Patent Attorney Hiroshi Asahi
Claims (1)
冷間圧延途中において焼鈍温度に加熱し、最終冷間圧延
率を50〜99%とすることを特徴とする電解コンデン
サ用アルミニウム箔の製造方法。A method for producing aluminum foil for electrolytic capacitors, which comprises heating aluminum with a purity of 99.4% or more to an annealing temperature immediately after hot rolling or during cold rolling to achieve a final cold rolling rate of 50 to 99%. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14515187A JPS64256A (en) | 1987-03-05 | 1987-06-12 | Manufacture of aluminum foil for electrolytic capacitor |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-48865 | 1987-03-05 | ||
| JP4886587 | 1987-03-05 | ||
| JP14515187A JPS64256A (en) | 1987-03-05 | 1987-06-12 | Manufacture of aluminum foil for electrolytic capacitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01256A true JPH01256A (en) | 1989-01-05 |
| JPS64256A JPS64256A (en) | 1989-01-05 |
Family
ID=26389200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14515187A Pending JPS64256A (en) | 1987-03-05 | 1987-06-12 | Manufacture of aluminum foil for electrolytic capacitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64256A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0192347A (en) * | 1987-10-01 | 1989-04-11 | Kobe Steel Ltd | Manufacture of aluminum foil for electrolytic capacitor anode |
| JPH02200749A (en) * | 1989-01-31 | 1990-08-09 | Sumitomo Light Metal Ind Ltd | Aluminum foil for electrolytic capacitor cathode and its production |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6037185B2 (en) * | 1977-03-26 | 1985-08-24 | 三菱アルミニウム株式会社 | Aluminum electrolytic capacitor - manufacturing method of aluminum foil for cathode |
| JPS6263656A (en) * | 1985-09-17 | 1987-03-20 | Sumitomo Light Metal Ind Ltd | Production of aluminum foil for electrolytic capacitor |
-
1987
- 1987-06-12 JP JP14515187A patent/JPS64256A/en active Pending
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