JPH01270033A - Laser beam scanner - Google Patents
Laser beam scannerInfo
- Publication number
- JPH01270033A JPH01270033A JP9968888A JP9968888A JPH01270033A JP H01270033 A JPH01270033 A JP H01270033A JP 9968888 A JP9968888 A JP 9968888A JP 9968888 A JP9968888 A JP 9968888A JP H01270033 A JPH01270033 A JP H01270033A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- quantum well
- laser beam
- semiconductor thin
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/295—Analog deflection from or in an optical waveguide structure]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06233—Controlling other output parameters than intensity or frequency
- H01S5/06243—Controlling other output parameters than intensity or frequency controlling the position or direction of the emitted beam
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野J
本発明はレーザビームの集光位置を電気的に変化させる
ことのできるレーザビームスキャナに関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a laser beam scanner that can electrically change the focusing position of a laser beam.
r従来の技術」
一般に、周期がわずかずつ変化する凹凸形状のグレーテ
ィング(チャープトゲレーティング)をもつ導波型光デ
バイスの場合、これに集光機能のあることが知られてい
る。4. Prior Art In general, it is known that a waveguide optical device having an uneven grating (chirp gelating) whose period changes slightly gradually has a light focusing function.
その技術文献としては、米国電気通信学会:量子エレク
トロニクスQE−13,298頁(1977年4月)が
公知である。As a technical document, American Institute of Telecommunications: Quantum Electronics QE-13, page 298 (April 1977) is known.
上述した導波型光デバイスは、第2図に例示するごとく
、半導体または誘電体からなる基板1上に、空気を媒質
3とする薄膜先導波路2が形成されており、その薄膜光
導波路2上には、周期がZ軸方向に徐々に変化するグレ
ーティング4が形成されている。As illustrated in FIG. 2, the above-mentioned waveguide type optical device has a thin film guiding waveguide 2 with air as a medium 3 formed on a substrate 1 made of a semiconductor or dielectric, and a thin film guiding waveguide 2 having air as a medium 3 is formed on the substrate 1 made of a semiconductor or dielectric. A grating 4 whose period gradually changes in the Z-axis direction is formed.
第2図の導波型光デバイスにおいて、左方向から薄膜光
導波路2に入射されたレーザビーム(入射光L+)は、
その薄膜光導波路2を伝搬して右方向へ出射されるが(
出射光L2)、この際、グレーティング4の周期を適当
に選ぶと、上記出射光L2がグレーティング4から適当
な距離をおいて集光される。In the waveguide type optical device shown in FIG. 2, the laser beam (incident light L+) incident on the thin film optical waveguide 2 from the left direction is
It propagates through the thin film optical waveguide 2 and is emitted to the right (
Outgoing light L2) At this time, if the period of the grating 4 is appropriately selected, the outgoing light L2 is focused at an appropriate distance from the grating 4.
かかるグレーティング(チャープトグレーテイング)4
は、通常の一定周期をもつグレーティングと同じく、二
光束干渉法により作製され、この際、一方の光束は1周
期を変化させるため、ロッドレンズを通して干渉パター
ンをつくることが必要とされている。Such a grating (chirp grating) 4
Like a normal grating with a constant period, it is fabricated by two-beam interferometry, and in this case, one beam changes one period, so it is necessary to create an interference pattern through a rod lens.
「発明が解決しようとする課題」
上述した公知技術の場合、レーザビームの集光位置は、
グレーティングの周期の変化により決定されるが、周期
がわずかずつ変化するグレーティングの製作が困難であ
るため、当該製作時の再現生が得られず、機能的にも、
レーザビームの集光位置を連続的に変化させることがで
きない。"Problem to be Solved by the Invention" In the case of the above-mentioned known technology, the focusing position of the laser beam is
It is determined by the change in the period of the grating, but because it is difficult to manufacture a grating whose period changes slightly, it is not possible to reproduce the production time, and from a functional point of view,
It is not possible to continuously change the focusing position of the laser beam.
本発明は上述した課題に鑑み、レーザビームの集光位置
を電気的に変化させることができ、しかも、容易に製作
することのできるレーザビームスキャナを提供しようと
するものである。In view of the above-mentioned problems, the present invention aims to provide a laser beam scanner that can electrically change the focusing position of a laser beam and that can be easily manufactured.
「課題を解決するための手段J
本発明に係るレーザビームスキャナは、所期の目的を達
成するため、半導体基板の表面に、多重量子井戸構造と
半導体薄膜積層構造とが相互に隣接して設けられており
、上記半導体薄膜積層構造は、交互に積層された高屈折
率半導体薄膜と低屈折率半導体薄膜とで構成されている
とともに、その周期がこれらPj膜の積層方向に徐々に
変化しており、上記多重量子井戸構造の屈折率を変化さ
せるための電極が、当該多重量子井戸構造の表面および
上記半導体基板の裏面にそれぞれ設けられて ゛いるこ
とを特徴とする。``Means for Solving the Problems J'' In order to achieve the intended purpose, the laser beam scanner according to the present invention has a multi-quantum well structure and a semiconductor thin film laminated structure adjacent to each other on the surface of a semiconductor substrate. The semiconductor thin film stacked structure is composed of high refractive index semiconductor thin films and low refractive index semiconductor thin films stacked alternately, and the period thereof gradually changes in the stacking direction of these Pj films. The present invention is characterized in that electrodes for changing the refractive index of the multiple quantum well structure are provided on the front surface of the multiple quantum well structure and the back surface of the semiconductor substrate, respectively.
r実 施 例j
以下、本発明レーザビームスキャナの実施例につき、図
面を参便して説明する。rEmbodiment j Hereinafter, embodiments of the laser beam scanner of the present invention will be described with reference to the drawings.
第1図において、半導体基板11の表面には、多重量子
井戸構造(MQW) 12と半導体薄膜積層構造13と
が相互に隣接して設けられており、かつ、多重量子井戸
構造12の表面には電極14が設けられているとともに
、半導体基板11の裏面には電極15が設けられている
。In FIG. 1, on the surface of a semiconductor substrate 11, a multiple quantum well structure (MQW) 12 and a semiconductor thin film laminated structure 13 are provided adjacent to each other, and on the surface of the multiple quantum well structure 12, An electrode 14 is provided, and an electrode 15 is also provided on the back surface of the semiconductor substrate 11.
多重量子井戸構造12は、公知ないし周知のエピタキシ
ャル法を介して形成される。The multi-quantum well structure 12 is formed through a well-known epitaxial method.
半導体薄膜積層構造13は、交互に積層された高屈折率
半導体薄膜と低屈折率半導体薄膜とで構成されていると
ともに、その周期がこれら薄膜の積層方向に徐々に変化
している。The semiconductor thin film stacked structure 13 is composed of high refractive index semiconductor thin films and low refractive index semiconductor thin films stacked alternately, and the period thereof gradually changes in the stacking direction of these thin films.
かかる半導体薄膜積層構造13も、上述したエピタキシ
ャル法を介して形成される。This semiconductor thin film stacked structure 13 is also formed through the epitaxial method described above.
電極14.15は、多重量子井戸構造12の表面および
半導体基板11の裏面において1例えば、金を真空蒸着
することにより形成される。The electrodes 14 and 15 are formed by vacuum-depositing, for example, gold on the front surface of the multi-quantum well structure 12 and the back surface of the semiconductor substrate 11.
本発明における半導体薄膜積層構造13は、その積層構
造によりレーザビームのチャープトゲレーティングとし
て機能し、その半導体薄膜積層構造13の周期の変化が
、上記エピタキシャル成長時の半導体膜厚に依存して定
まる。The semiconductor thin film stacked structure 13 in the present invention functions as chirp gelating for a laser beam due to its stacked structure, and the change in the period of the semiconductor thin film stacked structure 13 is determined depending on the semiconductor film thickness during the epitaxial growth.
本発明における多重量子井戸構造12も、既知の通り、
これに電界を印加することにより、大きな屈折率変化が
得られる。As is known, the multi-quantum well structure 12 in the present invention also includes:
By applying an electric field to this, a large change in refractive index can be obtained.
したがって、第1図において半導体薄膜積層構造13の
表面と直交する方向からその半導体薄膜積層構造13に
レーザビームの入射光Llを入射させ、この際、円電極
14.15間に電圧を印加すると、上記光入射方向と直
交して半導体薄Il!積層構造】3の側面より出射され
るレーザビームの出射光L2が、上記印加電圧による多
重量子井戸構造12の屈折率変化に対応した位21pで
集光される。Therefore, in FIG. 1, when the incident light Ll of the laser beam is incident on the semiconductor thin film stacked structure 13 from a direction perpendicular to the surface of the semiconductor thin film stacked structure 13, and at this time, a voltage is applied between the circular electrodes 14 and 15, Semiconductor thin film Il perpendicular to the above light incident direction! Laminated structure] Output light L2 of the laser beam emitted from the side surface of the multi-quantum well structure 3 is focused at 21p corresponding to the change in refractive index of the multi-quantum well structure 12 due to the applied voltage.
ゆえに、円電極14.15間への印加電圧の変化、すな
わち、電界の変化により、出射光L2の集光位置Pが変
化し、かくて、レーザビームスキャンニングが電気的に
行なえるようになる。Therefore, due to a change in the voltage applied between the circular electrodes 14 and 15, that is, a change in the electric field, the focusing position P of the emitted light L2 changes, and thus laser beam scanning can be performed electrically. .
γ発明の効果j
以上説明した通り、本発明に係るレーザビームスキャナ
は、レーザビームの集光位置を電界変化により変化させ
ることができるので、所望のレーザビームスキャンニン
グが、電気的かつ簡易に行なえ、しかも、多重量子井戸
構造、チャープトゲレーティング機能をもつ半導体FI
j膜積層構造など、これら主要な構成部が、エピタキシ
ャル法により再現生よく容易に形成できる。γ Effects of the Invention j As explained above, the laser beam scanner according to the present invention can change the focusing position of the laser beam by changing the electric field, so desired laser beam scanning can be performed electrically and easily. , Moreover, the semiconductor FI has a multi-quantum well structure and a chirp gelating function.
These main components, such as the J-film stacked structure, can be easily formed with good reproducibility by epitaxial methods.
第1図は本発明に係るレーザビームスキャナの一実施例
を略示した層構造の説明図、第2図は従来のレーザビー
ム集光装置を略示した層構造の説明図である。
11・・・・・・半導体基板
12・・・・・・多重量子井戸構造
13・・・・・・半導体薄IA積層構造14・・・・・
・電極
15・・・・・・電極
Ll・・・・・・レーザビームの入射光L2・・・・・
・レーザビームの出射光P・・・・・・レーザビームの
集光位置代理人 弁理士 斎 藤 義 雄
第1図
第2図FIG. 1 is an explanatory diagram of a layer structure schematically showing an embodiment of a laser beam scanner according to the present invention, and FIG. 2 is an explanatory diagram of a layer structure schematically showing a conventional laser beam focusing device. 11...Semiconductor substrate 12...Multi-quantum well structure 13...Semiconductor thin IA laminated structure 14...
・Electrode 15... Electrode Ll... Incident light L2 of laser beam...
・Output light P of the laser beam...Concentration position of the laser beam Agent Patent attorney Yoshio Saito Figure 1 Figure 2
Claims (1)
層構造とが相互に隣接して設けられており、上記半導体
薄膜積層構造は、交互に積層された高屈折率半導体薄膜
と低屈折率半導体薄膜とで構成されているとともに、そ
の周期がこれら薄膜の積層方向に徐々に変化しており、
上記多重量子井戸構造の屈折率を変化させるための電極
が、当該多重量子井戸構造の表面および上記半導体基板
の裏面にそれぞれ設けられていることを特徴とするレー
ザビームスキャナ。A multi-quantum well structure and a semiconductor thin film stacked structure are provided adjacent to each other on the surface of a semiconductor substrate, and the semiconductor thin film stacked structure includes a high refractive index semiconductor thin film and a low refractive index semiconductor thin film stacked alternately. and the period gradually changes in the stacking direction of these thin films.
A laser beam scanner characterized in that electrodes for changing the refractive index of the multiple quantum well structure are provided on the front surface of the multiple quantum well structure and the back surface of the semiconductor substrate, respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9968888A JPH01270033A (en) | 1988-04-22 | 1988-04-22 | Laser beam scanner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9968888A JPH01270033A (en) | 1988-04-22 | 1988-04-22 | Laser beam scanner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01270033A true JPH01270033A (en) | 1989-10-27 |
Family
ID=14253979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9968888A Pending JPH01270033A (en) | 1988-04-22 | 1988-04-22 | Laser beam scanner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01270033A (en) |
-
1988
- 1988-04-22 JP JP9968888A patent/JPH01270033A/en active Pending
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