JPH0127151B2 - - Google Patents

Info

Publication number
JPH0127151B2
JPH0127151B2 JP21498781A JP21498781A JPH0127151B2 JP H0127151 B2 JPH0127151 B2 JP H0127151B2 JP 21498781 A JP21498781 A JP 21498781A JP 21498781 A JP21498781 A JP 21498781A JP H0127151 B2 JPH0127151 B2 JP H0127151B2
Authority
JP
Japan
Prior art keywords
sliding member
boron nitride
thin film
sputtering
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21498781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58126983A (ja
Inventor
Kazuyuki Ozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nok Corp
Original Assignee
Nok Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nok Corp filed Critical Nok Corp
Priority to JP21498781A priority Critical patent/JPS58126983A/ja
Publication of JPS58126983A publication Critical patent/JPS58126983A/ja
Publication of JPH0127151B2 publication Critical patent/JPH0127151B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP21498781A 1981-12-29 1981-12-29 金属の表面処理方法 Granted JPS58126983A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21498781A JPS58126983A (ja) 1981-12-29 1981-12-29 金属の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21498781A JPS58126983A (ja) 1981-12-29 1981-12-29 金属の表面処理方法

Publications (2)

Publication Number Publication Date
JPS58126983A JPS58126983A (ja) 1983-07-28
JPH0127151B2 true JPH0127151B2 (de) 1989-05-26

Family

ID=16664821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21498781A Granted JPS58126983A (ja) 1981-12-29 1981-12-29 金属の表面処理方法

Country Status (1)

Country Link
JP (1) JPS58126983A (de)

Also Published As

Publication number Publication date
JPS58126983A (ja) 1983-07-28

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