JPH01274411A - Semiconductor porcelain substance - Google Patents
Semiconductor porcelain substanceInfo
- Publication number
- JPH01274411A JPH01274411A JP10495388A JP10495388A JPH01274411A JP H01274411 A JPH01274411 A JP H01274411A JP 10495388 A JP10495388 A JP 10495388A JP 10495388 A JP10495388 A JP 10495388A JP H01274411 A JPH01274411 A JP H01274411A
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- Prior art keywords
- oxide
- mol
- silica
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- titanate
- Prior art date
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- Inorganic Insulating Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体磁器の粒界に絶縁層を設けてなる半導
体磁器物質に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor ceramic material in which an insulating layer is provided at the grain boundaries of semiconductor ceramic.
近年、チタン酸バリウム(BaTiO,2)、又はチタ
ン酸ストロンチウム(SrTiO3)等を主体とする半
導体磁器の粒界に、誘電体として高絶縁層を設けてなる
粒界誘電体型の半導体磁器コンデンサ等の半導体磁器物
質が、広く用いられている。そしてこの半導体磁器物質
は、まずチタン酸バリウム(BaTiO2)、又はチタ
ン酸ストロンチウム(SrTiO3)を主材料としてこ
れに、原子価制御用助剤として酸化ニオブ(NbzO3
) 、酸化イツトリウム(Y2O2) 、酸化ディスプ
ロシウム(DyzOi) 、酸化セリウム(Cent)
等を添加し、また焼結用助剤として酸化ケイ素(SiO
□)、酸化アルミニウム(AlzQ3) 、酸化マンガ
ン(MnO2) 、酸化銅(CuO) 、酸化マンガン
(MnO2)十酸化銅(CuO) 、酸化ビスマス(B
i、0.)等の少なくとも1種以上を添加し、中性又は
還元雰囲気中にて焼結して半導体磁器を得、次にこの半
導体磁器の粒界に誘電体層を設けるべく、酸化マンガン
(MnO□)、酸化銅(CuO)、酸化ビスマス(Bi
g(h)等の金属酸化物を前記拡散物質として熱拡散さ
せて得られていた(特公昭56−51820号公報、特
公昭56−74913号公報)。In recent years, grain boundary dielectric type semiconductor porcelain capacitors have been developed in which a highly insulating layer is provided as a dielectric material at the grain boundaries of semiconductor porcelain mainly made of barium titanate (BaTiO,2) or strontium titanate (SrTiO3). Semiconducting porcelain materials are widely used. This semiconductor ceramic material is first made of barium titanate (BaTiO2) or strontium titanate (SrTiO3) as a main material, and niobium oxide (NbzO3) as an auxiliary agent for valence control.
), yttrium oxide (Y2O2), dysprosium oxide (DyzOi), cerium oxide (Cent)
silicon oxide (SiO) as a sintering aid.
□), aluminum oxide (AlzQ3), manganese oxide (MnO2), copper oxide (CuO), manganese oxide (MnO2), copper decaoxide (CuO), bismuth oxide (B
i, 0. ) and sintered in a neutral or reducing atmosphere to obtain semiconductor porcelain.Next, in order to provide a dielectric layer at the grain boundaries of this semiconductor porcelain, manganese oxide (MnO□) , copper oxide (CuO), bismuth oxide (Bi
It was obtained by thermally diffusing metal oxides such as g(h) as the above-mentioned diffusing substance (Japanese Patent Publication No. 56-51820, Japanese Patent Publication No. 56-74913).
原子価制御用助剤又は焼結用助剤としてどのような物質
を用いるかにより、得られる半導体磁器物質の電気的な
特性〔誘電率(εapp) +誘電正接(tan δ)
1体積抵抗率(ρapp) +静電容量温度特性(TC
値)等〕に相違がある。例えば、チタン酸バリウム(B
aTiO2)を主成分とし、原子価制御用助剤として酸
化ディスプロシウム(DyzOt)を添加して得られる
半導体磁器物質にあっては、誘電率は60.000〜8
0,000と高いが、静電容量温度特性(TC値)は2
0℃における静電容量を基準値とした場合−25℃〜+
85℃の温度範囲内の最大変化率が±35%と大きく、
また誘電正接(tan δ)も8%と高くなる。The electrical properties of the resulting semiconductor ceramic material [permittivity (εapp) + dielectric loss tangent (tan δ)] depend on what kind of material is used as the valence control aid or sintering aid.
1 Volume resistivity (ρapp) + Capacitance temperature characteristic (TC
value), etc.]. For example, barium titanate (B
In a semiconductor ceramic material obtained by adding dysprosium oxide (DyzOt) as a valence control agent to a main component of aTiO2), the dielectric constant is 60.000 to 8.
Although it is high at 0,000, the capacitance temperature characteristic (TC value) is 2
When the capacitance at 0°C is used as the reference value, -25°C to +
The maximum rate of change within the temperature range of 85℃ is as large as ±35%.
Furthermore, the dielectric loss tangent (tan δ) is also as high as 8%.
また、チタン酸ストロンチウム(SrTiOi)を主成
分とし、原子価制御用助剤として酸化ディスプロシウム
(DVz(h)又は酸化セリウム(CeO□)を添加す
る場合には誘電正接は2%と低く、また静電容量温度特
性(TC値)は±15%と低いが、誘電率が30.00
0〜40.000と低くなる。一方焼結用助剤として酸
化マンガン(MnO□)を添加する場合には、体積抵抗
率は良好である反面誘電率等の電気的特性は十分でなく
、また焼結用助剤として酸化ビスマス(Bi、O,)又
は酸化アルミニウム(AhO+)を添加する場合には誘
電率、誘電正接は良好である反面静電容量温度特性(T
C値)は不十分であった。In addition, when strontium titanate (SrTiOi) is the main component and dysprosium oxide (DVz(h) or cerium oxide (CeO□) is added as a valence control agent, the dielectric loss tangent is as low as 2%. In addition, the capacitance temperature characteristic (TC value) is as low as ±15%, but the dielectric constant is 30.00.
It will be as low as 0 to 40.000. On the other hand, when manganese oxide (MnO When adding Bi, O, ) or aluminum oxide (AhO+), the dielectric constant and dielectric loss tangent are good, but the capacitance temperature characteristics (T
C value) was insufficient.
このように、すべての電気的特性について良好な結果(
誘電率及び体積抵抗率は高く、誘電正接及び静電容量温
度特性(TC値)は低い)を存する半導体磁器物質は未
だ得られていない。Thus, good results for all electrical characteristics (
A semiconductor ceramic material having high dielectric constant and volume resistivity and low dielectric loss tangent and capacitance temperature characteristics (TC value) has not yet been obtained.
本発明者は、原子価制御用助剤又は焼結用助剤として種
々の材料を用いてなる半導体磁器物質について、その電
気的特性を調査した結果、主成分としてチタン酸ストロ
ンチウム(SrTiO3)とチタン酸カルシウム(Ca
TiO,)とを組合わせ、原子価制御用助剤として酸化
ニオブ(NbJ3)又は酸化イツトリウム(YzO3)
のうち1種又は2種を添加し、焼結用助剤としてシリカ
(St(h)と酸化マンガン(MnO2)と酸化銅(C
uO)との混合物を添加した場合には、すべての電気的
特性が良好である半導体磁器物質が得られることを知見
した。As a result of investigating the electrical properties of semiconductor ceramic materials using various materials as valence control aids or sintering aids, the present inventor found that strontium titanate (SrTiO3) and titanium as the main components. Calcium acid (Ca
TiO,), and niobium oxide (NbJ3) or yttrium oxide (YzO3) as an auxiliary agent for valence control.
Silica (St(h), manganese oxide (MnO2), and copper oxide (C) are added as sintering aids.
It has been found that if a mixture with uO) is added, a semiconducting porcelain material with good all electrical properties is obtained.
本発明はかかる知見に基づいてなされたものであり、前
述のすべての電気的特性について良好な結果が得られる
半導体磁器物質を提供することを目的とする。The present invention was made based on this knowledge, and it is an object of the present invention to provide a semiconductor ceramic material that can obtain good results in all of the above-mentioned electrical properties.
本発明に係る半導体磁器物質は、チタン酸ストロンチウ
ム(SrTi(h)97〜80モル、チタン酸カルシウ
ム(CaTiO+) 3〜20モルよりなる主成分10
0モルに対し、残部が酸化ニオブ(NbzO3) 、酸
化イットリ”y L (YzO3) (7)うち1種又
は2種が0.1〜0.4 モ)L、、シリカ(Stot
)が0.1〜0.4モル、酸化マンガン(MnO2)が
0.05〜0.2 モ、I+/、酸化銅(CuO)が0
.05〜0.2モルおよび不可避の不純物からなること
を特徴とするか、又はチタン酸ストロンチウム(SrT
i(h)97〜80モル、チタン酸カルシウム(CaT
iO*) 3〜20モルよりなる主成分100モルに対
し、残部が酸化ニオブ(Nb、O,)、酸化イツトリウ
ム(YzO2)のうち1種又は2種が0.1〜0.4モ
ル、シリカ(SiO2)が0.1〜0.4−1−/L/
、酸化マンガフ(MnO2)が0.05〜0.2−T−
ル、酸化銅(CuO)が0.05〜0.2−[:/l/
および不可避の不純物からなる磁器の結晶粒界に、絶縁
化のための組成物が拡散してなることを特徴とする。The semiconductor ceramic material according to the present invention has a main component of 10 to 80 moles of strontium titanate (SrTi(h) and 3 to 20 moles of calcium titanate (CaTiO+).
With respect to 0 mole, the balance is niobium oxide (NbzO3), yttrioxide (YzO3) (7) one or two of which are 0.1 to 0.4 mole), silica (Stot
) is 0.1 to 0.4 mole, manganese oxide (MnO2) is 0.05 to 0.2 mole, I+/, copper oxide (CuO) is 0
.. or strontium titanate (SrT).
i(h) 97-80 mol, calcium titanate (CaT
iO*) 3 to 20 moles of the main component, the balance is 0.1 to 0.4 mole of one or two of niobium oxide (Nb, O,), yttrium oxide (YzO2), and silica. (SiO2) is 0.1 to 0.4-1-/L/
, manganese oxide (MnO2) is 0.05-0.2-T-
Copper oxide (CuO) is 0.05-0.2-[:/l/
It is characterized in that an insulating composition is diffused into the grain boundaries of the porcelain, which is made up of unavoidable impurities.
半導体磁器の電気的特性を改善すべく上述した如き組成
物を採用した場合、得られる半導体磁器物質は誘電正接
及び静電容量温度特性(TC値)は十分に低くなり、し
かも誘電率及び体積抵抗率が大幅に向上する。When the above-mentioned composition is employed to improve the electrical properties of semiconductor ceramics, the resulting semiconductor ceramic material has sufficiently low dielectric loss tangent and capacitance temperature characteristics (TC value), and has low dielectric constant and volume resistivity. rate will be significantly improved.
以下本発明を、例えばコンデンサの製造に適用した場合
の実施例謡ついて具体的に説明する。Hereinafter, the present invention will be described in detail with reference to embodiments in which the present invention is applied to, for example, the manufacture of capacitors.
まず、本発明の半導体磁器物質の製造方法にっいて説明
する。例えばチタン酸ストロンチウム(SrTi(h)
97〜80モル%、チタン酸カルシウム(CaTiOい
3〜20モル%からなる主原料100モル%に原子価制
御用助剤として酸化ニオブ(NbzO3)又は酸化イツ
トリウム(’bO+)のうち、1種又は2種を0.1〜
0.4モル%の範囲で添加し、さらに、焼結用助剤とし
てシリカ(SiO□)を0.1〜0.4モル%、酸化マ
ンガン(MnO2)を0.05〜0.2モル%、酸化銅
(CuO)を0.05〜0.2モル%の各範囲で夫々添
加し、十分に混合した後、直径10fi、厚さ0.8m
mの円板状の素体に加圧成形する。この後水素1〜15
%、窒素99〜85%からなる雰囲気中で1400〜1
540℃の範囲で4〜10時間焼成して半導体磁器を製
造する。次に該半導体磁器の片面に拡散物質として酸化
ビスマス(BizOx)及び酸化銅(CuO)を夫々モ
ル比9:1で半導体磁器1つにつき1mg〜5mgの量
を泥漿状にして塗布し、1000〜1350℃で1〜2
時間加熱して拡散物質を熱拡散させる。最後に、このよ
うにして得られた半導体磁器物質の両面に銀ペーストを
印刷し、800℃程度で焼付けて銀電極とし、コンデン
サを得る。First, the method for manufacturing a semiconductor ceramic material of the present invention will be explained. For example, strontium titanate (SrTi(h)
97 to 80 mol%, calcium titanate (CaTiO) to 100 mol% of the main raw material consisting of 3 to 20 mol%, and one or more of niobium oxide (NbzO3) or yttrium oxide ('bO+) as a valence control auxiliary agent. 2 types from 0.1
In addition, 0.1 to 0.4 mol% of silica (SiO□) and 0.05 to 0.2 mol% of manganese oxide (MnO2) are added as sintering aids. , copper oxide (CuO) was added in each range of 0.05 to 0.2 mol%, and after thorough mixing, a diameter of 10 fi and a thickness of 0.8 m was added.
The material is pressure-molded into a disk-shaped element body of m. After this hydrogen 1-15
%, 1400-1 in an atmosphere consisting of 99-85% nitrogen.
Semiconductor porcelain is manufactured by firing at a temperature of 540° C. for 4 to 10 hours. Next, on one side of the semiconductor porcelain, bismuth oxide (BizOx) and copper oxide (CuO) are applied as a diffusion substance in the form of a slurry at a molar ratio of 9:1 in an amount of 1 mg to 5 mg per semiconductor porcelain. 1-2 at 1350℃
Heat for a period of time to thermally diffuse the diffusing substance. Finally, silver paste is printed on both sides of the semiconductor ceramic material thus obtained and baked at about 800° C. to form silver electrodes, thereby obtaining a capacitor.
主成分としてチタン酸ストロンチウム(SrTi03)
及びチタン酸カルシウム(CaTiO2)、原子価制御
剤として酸化ニオブ(NbzO3)を用い、焼結用助剤
としてシリカ(SiO□)、酸化マンガン(MnO2)
及び酸化銅(CuO)を用いて種々の組成比にて混合し
、半導体磁器に塗布して得た半導体磁器物質の電気的特
性を下記第1表に示す。なお、表中の最右欄に※印を付
したものは、前記混合物の組成比が本発明の条件に一致
するものを示している。また表中の誘電率(εapp)
及び誘電正接(tanδ)は、周波数1ktlz、電圧
1■にて測定した値であり、また、静電容量温度特性(
TC値)は、20℃で測定した静電容量を基準値とし、
−25℃〜+85℃の温度範囲で測定した静電容量の前
記基準値に対する変化率のうち、代表として一25℃お
よび+85℃での変化率を示している。Strontium titanate (SrTi03) as the main component
and calcium titanate (CaTiO2), using niobium oxide (NbzO3) as a valence control agent, and using silica (SiO□) and manganese oxide (MnO2) as sintering aids.
Table 1 below shows the electrical properties of semiconductor ceramic materials obtained by mixing copper oxide (CuO) and copper oxide (CuO) in various composition ratios and applying the mixture to semiconductor ceramics. In addition, those marked with * in the rightmost column of the table indicate those whose composition ratios of the mixtures correspond to the conditions of the present invention. Also, the dielectric constant (εapp) in the table
and dielectric loss tangent (tanδ) are values measured at a frequency of 1ktlz and a voltage of 1■, and the capacitance temperature characteristics (
TC value) is based on the capacitance measured at 20℃,
Among the rates of change in capacitance with respect to the reference value measured in the temperature range of -25°C to +85°C, the rates of change at -25°C and +85°C are shown as representative.
一方、体積抵抗率(ρapp)はDC25V1分値によ
って求めた値である。On the other hand, the volume resistivity (ρapp) is a value determined from a DC25V 1 minute value.
第1表から、前記混合物の組成比が本発明の条件を満足
しているもの(図中※印)、即ちチタン酸ストロンチウ
ム(SrTi(h)97〜80モル%、チタン酸カルシ
ウム(CaTiO:+) 3〜20モル%、酸化ニオブ
(NbtO,) 、酸化イツトリウム(yzoi)のう
ち1種又は2種がO91〜0.4モル%、シリカ(Si
ng)が0.1〜0.4モル%、酸化マンガン(MnO
2)が0.05〜0.2モル%、酸化銅(CuO)が0
.05〜0.2モル%の条件を満足しているものは、良
好な電気的特性が得られていることが分かる。From Table 1, it can be seen that the composition ratio of the mixture satisfies the conditions of the present invention (marked with * in the figure), that is, strontium titanate (SrTi(h) 97 to 80 mol%, calcium titanate (CaTiO: + ) 3 to 20 mol%, one or two of niobium oxide (NbtO, ), yztrium oxide (yzoi), O91 to 0.4 mol%, silica
ng) is 0.1 to 0.4 mol%, manganese oxide (MnO
2) is 0.05 to 0.2 mol%, copper oxide (CuO) is 0
.. It can be seen that those satisfying the condition of 0.05 to 0.2 mol % have good electrical characteristics.
つまり、チタン酸ストロンチウム(SrTiO2)が3
モル%未満では静電容量温度特性(TC値)及び誘電正
接が共に高い値を示しており、25モル%以上では誘電
率が低下し、誘電正接は劣化する。また酸化ニオブ(N
bzO3)及びシリカ(SiO2)が0.4モル%より
多い場合、又は酸化マンガン(MnO□)及び酸化銅(
CuO)が0.2モル%より多い場合には誘電率が著し
く劣化する傾向にあり、酸化ニオブ(NbzO3)及び
シリカC3iO□)が0.1モル%より少ない場合、又
は酸化マンガン(MnO□)及び酸化銅(CuO)が0
.05モル%より少ない場合にはTC値が特に劣化する
のである。In other words, strontium titanate (SrTiO2) is
If it is less than mol %, both the capacitance temperature characteristic (TC value) and the dielectric loss tangent show high values, and if it is more than 25 mol %, the dielectric constant decreases and the dielectric loss tangent deteriorates. Also, niobium oxide (N
bzO3) and silica (SiO2) are more than 0.4 mol%, or manganese oxide (MnO□) and copper oxide (
When CuO) is more than 0.2 mol%, the dielectric constant tends to deteriorate significantly, and when niobium oxide (NbzO3) and silica C3iO□) is less than 0.1 mol%, or manganese oxide (MnO□) and copper oxide (CuO) is 0
.. When the amount is less than 0.05 mol %, the TC value is particularly deteriorated.
本発明例は第1表中*印で示した従来例に比して誘電率
が最高で約2.4倍と高くなり、特にTC値が±1%〜
±3%に抑えられており、また誘電正接も1%以下と良
好であり、体積抵抗率も従来より1〜2桁向上している
等電気的特性が著しく向上している。The example of the present invention has a maximum dielectric constant of about 2.4 times higher than the conventional example indicated by * in Table 1, and in particular, the TC value is ±1% to
Moreover, the dielectric loss tangent is good at 1% or less, and the volume resistivity is improved by 1 to 2 orders of magnitude compared to the conventional one, and the electrical properties are significantly improved.
第1図は温度と静電容量変化率(%)との関係を示す図
であり、第1表中※印で示された本発明の条件を満足す
る組成比を有する混合物のうち静電容量温度特性(TC
値)が最も優れた混合物、即ちチタン酸ストロンチウム
(SrTi(h)が85モル%、チタン酸カルシウム(
CaTiO,)が15モル%、酸化ニオブ(NbzO3
) 、シリカ(Si(h)、酸化マンガン(MnO2)
、及び酸化銅(CuO)が夫々0.2モル%の構成をな
すものについて一25℃〜+85℃の温度範囲でLtし
た静電容量温度特性(TC値)を測定した結果を図中A
にて示し、また、前記従来の組成比を有する混合物、即
ちチタン酸ストロンチウム(SrTiO,)が100モ
ル%、酸化ニオブ(NbzO3)が0.4モル%、酸化
マンガン(MnO□)が0.2モル%の構成をなすもの
について同様に一25℃〜+85℃の温度範囲で測定し
た静電容量温度特性(TC値)を測定した結果を図中B
にて示している。図に示す如く、本発明品は従来品に比
して温度変化に対する静電容量の変化が殆どなく、著し
く優れていると言える。Figure 1 is a diagram showing the relationship between temperature and capacitance change rate (%). Temperature characteristics (TC
strontium titanate (85 mol% SrTi(h), calcium titanate (
15 mol% of CaTiO,) and 15 mol% of niobium oxide (NbzO3
), silica (Si(h), manganese oxide (MnO2)
A in the figure shows the results of measuring the capacitance temperature characteristics (TC value) of Lt in the temperature range of -25°C to +85°C for those containing 0.2 mol % of copper oxide (CuO) and 0.2 mol% of copper oxide (CuO).
In addition, a mixture having the conventional composition ratio, that is, strontium titanate (SrTiO,) is 100 mol%, niobium oxide (NbzO3) is 0.4 mol%, and manganese oxide (MnO□) is 0.2 mol%. B in the figure shows the results of capacitance temperature characteristics (TC values) similarly measured in the temperature range of -25°C to +85°C for the composition of mol%.
It is shown in As shown in the figure, the product of the present invention shows almost no change in capacitance due to temperature change compared to the conventional product, and can be said to be significantly superior to the conventional product.
また上述した如き本発明の半導体磁器物質は、拡散物質
の塗布及び大気中焼成という従来通りの簡単な製造プロ
セスで得ることができるという利点もある。The semiconductor ceramic material of the present invention as described above also has the advantage that it can be obtained by a conventional and simple manufacturing process of applying a diffusive substance and firing in the atmosphere.
なお、上述の実施例においては、半導体磁器の片面に拡
散物質として酸化ビスマス(BizO2)と酸化銅(C
uO)との混合物を塗布することとしたが、該混合物に
替えて下記第2表に示す如き単体又は混合物を塗布して
も上述の実施例と同様、電気的特性が従来例に比して向
上する。In the above embodiment, bismuth oxide (BizO2) and copper oxide (C) were used as diffusion substances on one side of the semiconductor ceramic.
Although it was decided to apply a mixture with uO), even if a single substance or a mixture as shown in Table 2 below is applied instead of the mixture, the electrical characteristics will be similar to the above example and the electrical characteristics will be better than the conventional example. improves.
(以下余白)
第2表
また上述の実施例では、前記半導体磁器物質の両面に銀
ペーストを印刷してこれを焼付け、銀電極としたが、そ
の他の公知の電極材料を用いてもよいことはいうまでも
ない。また半導体磁器製造時の焼成雰囲気は、上述の実
施例の如く水素1〜15%、窒素99〜85%からなる
雰囲気に限定されるものではなく、試料が十分に半導体
化され得る雰囲気であれば他の雰囲気であっても差し支
えないのはいうまでもない。(Margin below) Table 2 Also, in the above-mentioned embodiments, silver paste was printed on both sides of the semiconductor ceramic material and baked to form a silver electrode, but other known electrode materials may also be used. Needless to say. Furthermore, the firing atmosphere during the production of semiconductor porcelain is not limited to an atmosphere consisting of 1 to 15% hydrogen and 99 to 85% nitrogen as in the above-mentioned example, but as long as the atmosphere can sufficiently convert the sample into a semiconductor. Needless to say, other atmospheres are acceptable.
以上詳述した如く、本発明の半導体磁器物質では、チタ
ン酸ストロンチウム(SrTiO3)97〜80モル%
、チタン酸カルシウム(CaTiO3) 3〜20モル
%からなる主成分100モル%に対して酸化ニオブ(N
bzO3)又は、酸化イツトリウム(yzoi)のうち
、1種又は2種を0.1〜0.4モル%原子価制御用助
剤として添加し、更に、シリカ(SiO□)を0.1〜
0.4モル%、酸化マンガン(MnO2)を0.05〜
0.2モル%、酸化銅(CuO)を0.05〜0.2モ
ル%、夫々焼結用助剤として添加するので、その半導体
磁器物質は、誘電率。As detailed above, the semiconductor ceramic material of the present invention contains 97 to 80 mol% of strontium titanate (SrTiO3).
, niobium oxide (N
0.1 to 0.4 mol % of one or two of yztrium oxide (yzoi) or yzoi is added as an auxiliary agent for valence control, and 0.1 to 0.4 mol % of silica (SiO□) is added as a valence control aid.
0.4 mol%, manganese oxide (MnO2) 0.05~
Since 0.2 mol% and 0.05 to 0.2 mol% of copper oxide (CuO) are added as sintering aids, the semiconductor ceramic material has a dielectric constant.
誘電正接9体積抵抗率、静電容量温度特性(TC値)等
の電気的特性において良好な結果を有し、特にTC値は
誘電率10,000以上のクラスで初めて1%以下を達
成しており、コンデンサ、バリスター、サーミスタ等へ
の応用範囲は広い。It has good results in electrical properties such as dielectric loss tangent 9 volume resistivity and capacitance temperature characteristics (TC value), and in particular, it is the first in its class with a dielectric constant of 10,000 or more to achieve a TC value of 1% or less. It has a wide range of applications such as capacitors, varistors, and thermistors.
第1図は20℃での静電容量を基準とした各温度での静
電容量変化率と温度との関係を示す図である。FIG. 1 is a diagram showing the relationship between the capacitance change rate and temperature at each temperature based on the capacitance at 20°C.
Claims (2)
80モル、チタン酸カルシウム(CaTiO_3)3〜
20モルよりなる主成分100モルに対し、残部が酸化
ニオブ(Nb_2O_3),酸化イットリウム(Y_2
O_3)のうち1種又は2種が0.1〜0.4モル、シ
リカ(SiO_2)が0.1〜0.4モル、酸化マンガ
ン(MnO_2)が0.05〜0.2モル、酸化銅(C
uO)が0.05〜0.2モルおよび不可避の不純物か
らなることを特徴とする半導体磁器物質。1. Strontium titanate (SrTiO_3) 97~
80 mol, calcium titanate (CaTiO_3) 3~
The remainder is niobium oxide (Nb_2O_3) and yttrium oxide (Y_2
0.1 to 0.4 mol of one or two of O_3), 0.1 to 0.4 mol of silica (SiO_2), 0.05 to 0.2 mol of manganese oxide (MnO_2), and copper oxide. (C
A semiconductor ceramic material comprising 0.05 to 0.2 mol of uO) and inevitable impurities.
80モル、チタン酸カルシウム(CaTiO_3)3〜
20モルよりなる主成分100モルに対し、残部が酸化
ニオブ(Nb_2O_3),酸化イットリウム(Y_2
O_3)のうち1種又は2種が0.1〜0.4モル、シ
リカ(SiO_2)が0.1〜0.4モル、酸化マンガ
ン(MnO_2)が0.05〜0.2モル、酸化銅(C
uO)が0.05〜0.2モルおよび不可避の不純物か
らなる磁器の結晶粒界に、絶縁化のための組成物が拡散
してなることを特徴とする半導体磁器物質。2. Strontium titanate (SrTiO_3) 97~
80 mol, calcium titanate (CaTiO_3) 3~
The remainder is niobium oxide (Nb_2O_3) and yttrium oxide (Y_2
0.1 to 0.4 mol of one or two of O_3), 0.1 to 0.4 mol of silica (SiO_2), 0.05 to 0.2 mol of manganese oxide (MnO_2), and copper oxide. (C
A semiconductor ceramic material characterized in that an insulating composition is diffused into the grain boundaries of a ceramic containing 0.05 to 0.2 moles of uO) and inevitable impurities.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10495388A JPH01274411A (en) | 1988-04-26 | 1988-04-26 | Semiconductor porcelain substance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10495388A JPH01274411A (en) | 1988-04-26 | 1988-04-26 | Semiconductor porcelain substance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01274411A true JPH01274411A (en) | 1989-11-02 |
Family
ID=14394459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10495388A Pending JPH01274411A (en) | 1988-04-26 | 1988-04-26 | Semiconductor porcelain substance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01274411A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1125904A1 (en) * | 2000-02-09 | 2001-08-22 | TDK Corporation | Dielectric ceramic composition, electronic device, and method for producing the same |
| EP1134203A1 (en) * | 2000-02-09 | 2001-09-19 | TDK Corporation | Dielectric ceramic composition, electronic device, and method for producing the same |
-
1988
- 1988-04-26 JP JP10495388A patent/JPH01274411A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1125904A1 (en) * | 2000-02-09 | 2001-08-22 | TDK Corporation | Dielectric ceramic composition, electronic device, and method for producing the same |
| EP1134203A1 (en) * | 2000-02-09 | 2001-09-19 | TDK Corporation | Dielectric ceramic composition, electronic device, and method for producing the same |
| US6627570B2 (en) | 2000-02-09 | 2003-09-30 | Tdk Corporation | Dielectric ceramic composition, electronic device, and method of producing the same |
| US6656863B2 (en) | 2000-02-09 | 2003-12-02 | Tdk Corporation | Dielectric ceramic composition, electronic device, and method for producing the same |
| US6933256B2 (en) | 2000-02-09 | 2005-08-23 | Tdk Corporation | Dielectric ceramic composition, electronic device, and method for producing same |
| CN100440392C (en) * | 2000-02-09 | 2008-12-03 | Tdk株式会社 | Electronic device with dielectric layer and production method thereof |
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