JPH01296446A - Member for magneto-optical recording and its production - Google Patents

Member for magneto-optical recording and its production

Info

Publication number
JPH01296446A
JPH01296446A JP12495688A JP12495688A JPH01296446A JP H01296446 A JPH01296446 A JP H01296446A JP 12495688 A JP12495688 A JP 12495688A JP 12495688 A JP12495688 A JP 12495688A JP H01296446 A JPH01296446 A JP H01296446A
Authority
JP
Japan
Prior art keywords
magneto
optical recording
film
recording film
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12495688A
Other languages
Japanese (ja)
Other versions
JP2718695B2 (en
Inventor
Fumiyoshi Kirino
文良 桐野
Noriyuki Ogiwara
荻原 典之
Norio Ota
憲雄 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Maxell Ltd
Original Assignee
Hitachi Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Maxell Ltd filed Critical Hitachi Ltd
Priority to JP63124956A priority Critical patent/JP2718695B2/en
Publication of JPH01296446A publication Critical patent/JPH01296446A/en
Application granted granted Critical
Publication of JP2718695B2 publication Critical patent/JP2718695B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To greatly improve corrosion resistance without fluctuating magnetic characteristics and to form a secure protective film by providing a compd. layer in which Cr and N are bonded near to the boundary faces of magneto- optical recording films. CONSTITUTION:An underlying film 2 consisting of silicon nitride is formed by, for example, a sputtering method, to 600A film thickness on a substrate 1 and in succession, the magneto-optical recording film 3 having the compsn. Tb26Fe44Co20Cr3Pt7 is formed by a sputtering method thereon. A TbFeCoPt alloy and Cr are used for targets and Ar is used for a discharge gas at this time. The film formation is executed by two-dimensional simultaneous sputtering method and simultaneously impressing RF electric power to both the targets to form about 800A film. The discharge gas is in succession changed with N2 and an oxygen diffusion preventive layer 4 is formed to about 200A. The nitrogen layer boned to the Cr is thus formed near the boundary face. The diffusion of oxygen, etc., into the films is thereby prevented and the corrosion is suppressed.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光を用いて情報の記録、再生、消去を行なう
光磁気記録用部材及びその製造方法に係り、特に高信頼
性を有し、長寿命の光磁気記録用部材及びその製造方法
に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magneto-optical recording member for recording, reproducing, and erasing information using light, and a method for manufacturing the same, and particularly relates to a highly reliable and magneto-optical recording member. , relates to a long-life magneto-optical recording member and a method for manufacturing the same.

〔従来の技術〕[Conventional technology]

高度情報化社会の進展に伴ない、高密度、大容量でかつ
書き換え可能なファイルメモリーへのニーズが高まって
いる。これを満たすものとして、光ディスクが着目され
ており、中でも光磁気記録は実用化に最も近い段階にあ
る。
With the development of an advanced information society, the need for high-density, large-capacity, and rewritable file memory is increasing. Optical disks are attracting attention as something that satisfies this requirement, and magneto-optical recording is at the closest stage to practical use.

ところで、光磁気記録に用いる記録材料とじてTbFe
Co系をはじめとする希土類元素と鉄族元素とからなる
非晶質合金系と、PtMnSbを主体としたホイスラー
合金系等が知られているが、いずれも大気中の酸素や水
に対して活性で、容易に腐食して水酸化物や酸化物を形
成する。そのため、時間の経過とともにディスクの諸特
性が低下する、記録した情報が保持できない等、ディス
クの寿命又はディスクの信頼性の低下をきたしていた。
By the way, the recording material used for magneto-optical recording is TbFe.
Amorphous alloys consisting of rare earth elements such as Co and iron group elements, and Heusler alloys mainly consisting of PtMnSb are known, but both are active against oxygen and water in the atmosphere. It corrodes easily to form hydroxides and oxides. As a result, various characteristics of the disk deteriorate over time, recorded information cannot be retained, and the life of the disk or reliability of the disk decreases.

これを防止するため、特開昭61−51806にはCo
Tb合金にCr、Mo、W等を添加することが、また特
開昭61−87306にはCoFe及び希土類元素から
なる合金にCr、Ti等を添加することが記載されてい
る。
In order to prevent this, Japanese Patent Application Laid-Open No. 61-51806
It is described that Cr, Mo, W, etc. are added to a Tb alloy, and JP-A-61-87306 describes that Cr, Ti, etc. are added to an alloy consisting of CoFe and rare earth elements.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は、光磁気記録膜に、大気中の水等によっ
て生じる腐食と局部的に生じる孔食とを同時に抑制する
という点について配慮されておらず、光磁気記録用部材
の信頼性が十分でないといった問題があった。
The above-mentioned conventional technology does not consider simultaneously suppressing corrosion caused by water in the atmosphere and pitting corrosion caused locally in the magneto-optical recording film, and the reliability of the magneto-optical recording member is insufficient. There was a problem that it was not.

本発明の目的は、高信頼性を有する光磁気記録用部材及
びその製造方法を提供することにある。
An object of the present invention is to provide a highly reliable magneto-optical recording member and a method for manufacturing the same.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、垂直磁気異方性を有し、光によって情報の
記録、再生、消去を行なう光磁気記録膜を有する光磁気
記録用部材において、上記光磁気記録膜は、Crを含み
、かっ該光磁気記録膜の界面の少なくとも一方にCrと
結合した窒素が存在する層を有することを特徴とする光
磁気記録用部材、基板上に、スパッタリング又は電子線
蒸着により、垂直磁気異方性を有し、光によって情報の
記録、再生、消去を行なう光磁気記録膜を形成する光磁
気記録用部材の製造方法において、上記光磁気記録膜は
Crを含有し、該光磁気記録膜の形成の初期若しくは終
期又はその両者の時に窒素を含む雰囲気中でスパッタリ
ング又は電子線蒸着を行ない、上記光磁気記録膜の界面
の少なくとも一方に、Crと結合した窒素が存在する層
を形成せしめたことを特徴とする光磁気記録用部材の製
造方法の少なくとも1項によって達成される。
The above object is a magneto-optical recording member having a magneto-optical recording film having perpendicular magnetic anisotropy and recording, reproducing and erasing information using light, wherein the magneto-optical recording film contains Cr and A magneto-optical recording member characterized by having a layer in which nitrogen bonded to Cr is present on at least one of the interfaces of a magneto-optical recording film, which has perpendicular magnetic anisotropy on a substrate by sputtering or electron beam evaporation. In the method for manufacturing a magneto-optical recording member that forms a magneto-optical recording film that records, reproduces, and erases information using light, the magneto-optical recording film contains Cr, and the magneto-optical recording film contains Cr, and Alternatively, at the final stage or both, sputtering or electron beam evaporation is performed in an atmosphere containing nitrogen to form a layer containing nitrogen combined with Cr on at least one of the interfaces of the magneto-optical recording film. This is achieved by at least one method of manufacturing a magneto-optical recording member.

本発明に用いられる光磁気記録膜は、垂直磁気異方性を
有し、Crを含有するものであればどのような合金組成
でもよい。例えば、希土類元素と鉄族元素とからなり、
Crを含むものが用いられる。さらにこの組成にPt、
Au、Pd、Rhから選ばれた少なくとも一種の元素を
加えて用いること、またこれにさらにNb、Ti、Ta
、AQから選ばれた少なくとも一種の元素を加えて用い
ることが好ましい。通常希土類元素と鉄族元素の合計量
は85at%以上であることが好ましい。このような合
金系のほかにCrを含むホイスラー合金等も用いられ、
この場合もさらにptを含むものが好ましい。
The magneto-optical recording film used in the present invention may have any alloy composition as long as it has perpendicular magnetic anisotropy and contains Cr. For example, it consists of rare earth elements and iron group elements,
A material containing Cr is used. Furthermore, this composition includes Pt,
At least one element selected from Au, Pd, and Rh is added and used, and in addition, Nb, Ti, and Ta are used.
, AQ is preferably used in addition. Usually, the total amount of rare earth elements and iron group elements is preferably 85 at % or more. In addition to such alloys, Heusler alloys containing Cr are also used,
In this case as well, it is preferable that the material further contains pt.

記録膜の界面近傍にはCrが0.5at%以上存在する
ことが好ましい。記録膜の厚み方向に元素の組成を変化
させてもよく、Crの量をこのように変化させて界面近
傍で100at%となるようにしてもよい。CrとNと
の結合M(以下酸素拡散防止層という)は、記録膜の界
面近傍で20〜200人の厚さに存在することが好まし
い。20人未満では効果が顕著でない。厚さの上限は2
00人を越えてもよいが、この層の形成には長時間かか
るため不必要に厚くすることは好ましくない。
It is preferable that 0.5 at % or more of Cr is present near the interface of the recording film. The composition of the elements may be changed in the thickness direction of the recording film, and the amount of Cr may be changed in this way so that it becomes 100 at % near the interface. The bond M of Cr and N (hereinafter referred to as the oxygen diffusion prevention layer) is preferably present in a thickness of 20 to 200 nm near the interface of the recording film. The effect is not significant for less than 20 people. The upper limit of thickness is 2
Although the number of layers may exceed 0.00, it takes a long time to form this layer, so it is not preferable to make it unnecessarily thick.

酸素拡散防止層において、Nは0.1〜4at%である
ことが好ましく、0.2〜3at%であることがより好
ましい。0.1at%未満では効果が顕著でない。Nの
量が4at%を越えてもよいが、多量のNを含有させる
のは通常の方法では困難である。
In the oxygen diffusion prevention layer, N is preferably 0.1 to 4 at%, more preferably 0.2 to 3 at%. If the amount is less than 0.1 at%, the effect is not significant. Although the amount of N may exceed 4 at%, it is difficult to contain a large amount of N using normal methods.

〔作用〕[Effect]

光磁気記録膜の界面近傍にCrと結合した窒素層を設け
ることにより、記録膜内部への酸素等の拡散を防止する
ので、記録膜の腐食を抑制できる。
By providing a nitrogen layer bonded to Cr near the interface of the magneto-optical recording film, it is possible to prevent oxygen and the like from diffusing into the recording film, thereby suppressing corrosion of the recording film.

〔実施例〕〔Example〕

以下、本発明の詳細について実施例を用いて詳細に説明
する。
Hereinafter, the details of the present invention will be explained in detail using Examples.

実施例1 下記の方法により作製した光磁気ディスクの断面構造の
模式図を第1図に示す。案内溝を有する基板1の上に、
スパッタ法により窒化シリコンの下地膜2を600人の
膜厚に形成した。作製した膜の屈折率は2.5であった
。それに引き続き、Tb2cFe44Co2゜Cr5P
t7の組成の光磁気記録膜3をスバッタ法により形成し
た。ターゲットにはT b F eCo P を合金ど
Crとを用い、放電ガスにはArを使用し、た。膜形成
は、二元同時スパッタ法により行なった。すなわち、最
初面ターゲット同時にRF電力を印加して灼800人の
膜を形成した。そして放電カスをN、に切換え放電を止
めずにスパッタに続け、約200人の酸素拡散防止層4
を形成し、光磁気ディスクを作製した。
Example 1 FIG. 1 shows a schematic diagram of the cross-sectional structure of a magneto-optical disk manufactured by the method described below. On a substrate 1 having a guide groove,
A base film 2 of silicon nitride was formed to a thickness of 600 mm by sputtering. The refractive index of the produced film was 2.5. Following that, Tb2cFe44Co2゜Cr5P
A magneto-optical recording film 3 having a composition of t7 was formed by a sputtering method. The target was T b FeCo P alloyed with Cr, and the discharge gas was Ar. Film formation was performed by a two-dimensional simultaneous sputtering method. That is, RF power was applied to the first target at the same time to form a film of 800 layers. Then, the discharge scum was switched to N, and the sputtering continued without stopping the discharge, and about 200 people made an oxygen diffusion prevention layer 4.
was formed to produce a magneto-optical disk.

このようにして作製したディスクの特性は、搬送波対雑
音比(C/N) 58dB (パルス幅:50011S
eC,周波数:IMHz、外部印加磁界:4000e。
The characteristics of the disc manufactured in this way are: carrier-to-noise ratio (C/N) 58 dB (pulse width: 50011S
eC, frequency: IMHz, externally applied magnetic field: 4000e.

N A =0.5 + レーザーパワー8mW、回転数
1200rpm)であった。このディスクを60℃−9
0%RH中に放置したときのエラーレイ1〜の経時変化
を調へ第2図にその結果を示す。比較例として膜形成す
べてをArのみで作製したディスクを用いた。その結果
、この環境中にディスクを放置した場合、本実施例のデ
ィスクを用いると3000時間放置してもエラーレイ1
−の増加はみられず2X]0−+(件/bit)で一定
であるのに対し、比較例の膜を用いると、3000時間
後に6X10−6(件/bit)と約3倍に増加した。
N A =0.5 + laser power 8 mW, rotation speed 1200 rpm). This disc at 60℃-9
The results are shown in Fig. 2, showing the changes over time in Error Ray 1 when left in 0% RH. As a comparative example, a disk was used in which the entire film was formed using only Ar. As a result, when the disk was left in this environment, the error rate was 1.
- No increase was observed and the value remained constant at 2X]0-+ (cases/bit), whereas when using the membrane of the comparative example, it increased approximately three times to 6X10-6 (cases/bit) after 3000 hours. did.

ところで、表面層の窒素の状態分析をxPSを用いて行
なったところ、Crは単体として存在せず結合状態にあ
った。また、メスバウワーによる測定からCrと窒素の
結合を示唆する結果を得た。
By the way, when the state of nitrogen in the surface layer was analyzed using xPS, it was found that Cr did not exist as a single substance but in a bonded state. In addition, results suggesting a bond between Cr and nitrogen were obtained from measurements using a Mössbauer.

酸素拡散防止層の窒素の量は約0.5〜Eat%である
。このように、エラーレイ1への増加がみられないのは
、Crの窒化物が存在しているためである。
The amount of nitrogen in the oxygen diffusion prevention layer is about 0.5 to Eat%. The reason why no increase in error to 1 is observed is due to the presence of Cr nitride.

これに対し、酸素拡散防止層の存在しない比較例では、
添加元素の効果により腐食の進行は抑制されるものの不
十分である。これは、Crを主体とした不働態皮膜の緻
密さの違いによることがわかる。
On the other hand, in the comparative example without the oxygen diffusion prevention layer,
Although the progress of corrosion is suppressed by the effect of the additive elements, it is insufficient. It can be seen that this is due to the difference in the density of the passive film mainly composed of Cr.

実施例2 本実施例では、イオンビームスパッタ装置を用いてディ
スクの作製を行なった場合で、装置の概略図を第3図に
示す。また、作製したディスクの断面構造の模式図を第
4図に示す装置はロードロック式であるが、図にはその
内スパッタリングを行なうための主要部分を示す。通常
のスパッタリングは、デポガン側へアルゴンガスを導入
、イオン化して加速し、合金ターゲットTb1g Nd
s Fe37COz8CraPtt)とそのイオンとを
衝突させてスパッタを行なう。ディスクの作製は、記録
膜形成に先立ちミリングガンより窒素イオンを発射し、
案内溝付基板]の表面を清澄化した。そして、ミリング
ガンを作動させたまま、デポガンも同時に作動させ、ミ
リングをかけながら膜形成を行ない酸素拡散防止層4を
設け、その厚さが100人となったところでミリングガ
ンを停止し、デポガンを用いて記録膜3を形成し、80
0人の厚さとなったところで再びミリングをかけ、その
上に200人の酸素拡散防止層4を形成し、所望の光磁
気ディスクとした。比較例として、ミリングガンを用い
ずデポガンのみで1100人の膜を形成した光磁気ディ
スクを用いた。
Example 2 In this example, a disk was manufactured using an ion beam sputtering apparatus, and a schematic diagram of the apparatus is shown in FIG. The apparatus shown in FIG. 4, which is a schematic diagram of the cross-sectional structure of the manufactured disk, is of a load-lock type, and the figure shows the main parts for sputtering. In normal sputtering, argon gas is introduced to the depot gun side, ionized and accelerated, and the alloy target Tb1g Nd
Sputtering is performed by colliding the ions of s Fe37COz8CraPtt) with its ions. To manufacture the disc, prior to forming the recording film, nitrogen ions are fired from a milling gun.
The surface of the substrate with guide grooves was clarified. Then, with the milling gun operating, the depot gun was also operated at the same time, and a film was formed while milling to provide the oxygen diffusion prevention layer 4. When the thickness reached 100 layers, the milling gun was stopped, and the depot gun was used to form a film. A recording film 3 is formed, and 80
When the thickness reached 0 mm, milling was performed again, and an oxygen diffusion prevention layer 4 of 200 mm was formed thereon to obtain a desired magneto-optical disk. As a comparative example, a magneto-optical disk was used in which 1,100 films were formed using only a deposit gun without using a milling gun.

このディスクの特性を評価したところ、C/N=52d
B (周波数:IMHz、パルス幅; 500ns。
When the characteristics of this disk were evaluated, C/N=52d
B (Frequency: IMHz, pulse width: 500ns.

外部印加磁界:4000e、N^=0.5.記録レーザ
パワー10mW、読み出しレーザーパワー1.5mW)
であった。また記録膜の磁気特性は、キュリー温度:T
c=250℃、補償温度: T comp = 90°
C,カー回転角: 0K=0.34°、保磁カニ Hc
=9KOeであった。
Externally applied magnetic field: 4000e, N^=0.5. Recording laser power 10mW, readout laser power 1.5mW)
Met. In addition, the magnetic properties of the recording film are Curie temperature: T
c=250°C, compensation temperature: T comp = 90°
C, Kerr rotation angle: 0K=0.34°, coercive crab Hc
=9KOe.

次にこのディスクを60℃−90%RH中に放置した時
のエラーレイトの経時変化の結果を第S図に示す。この
図より、本発明により作製したディスクのエラーレイト
は、1500時間放置までは作製初期とまったく変化な
く 2 Xl0−6(件/bit)と−定であったが、
その後わずかづつ増太し、3000時間後で3X10−
’(件/bit)となった。これに対し、本発明を用い
ていない比較例では、作製初期2X10−’(件/bi
t)であったエラーレイトが、1000時間経過後から
れずかづつ増大してゆき、3000時間後でI Xl0
−5(件/bit)となった。このように本発明を用い
ることにより、エラーの発生を著しく抑制できることが
分かる。
Next, Fig. S shows the results of the change in error rate over time when this disk was left at 60° C. and 90% RH. From this figure, the error rate of the disk manufactured according to the present invention remained constant at 2 Xl0-6 (items/bit), with no change at all from the initial stage of manufacture until it was left for 1500 hours.
After that, it gradually increased in thickness to 3X10- after 3000 hours.
'(case/bit). On the other hand, in a comparative example that does not use the present invention, 2X10-' (items/bi
t) gradually increases after 1000 hours, and after 3000 hours I
-5 (cases/bit). It can be seen that by using the present invention as described above, the occurrence of errors can be significantly suppressed.

ところで、記録膜表面の金属材料と窒素の結合状態をオ
ージェ電子分光法とメスバウワースペクトルとを併用し
て調べたところ、材料中の主にCrと窒素とが強く結合
していることがわかった。
By the way, when we investigated the bonding state between the metal material and nitrogen on the surface of the recording film using Auger electron spectroscopy and Mossbauer spectroscopy, we found that mainly Cr and nitrogen in the material were strongly bonded. .

Crの他にFeも一部窒素と結合していた。このCrと
窒素の化合物は、安定かつ緻密で保護効果は著しく高い
ので、表面層として設けるのみならず、保護膜として設
けても良い。なお、酸素拡散防止層における窒素の量は
約0.5〜lat%であった。
In addition to Cr, some Fe was also bonded to nitrogen. Since this compound of Cr and nitrogen is stable and dense and has a significantly high protective effect, it may be provided not only as a surface layer but also as a protective film. Note that the amount of nitrogen in the oxygen diffusion prevention layer was about 0.5 to lat%.

実施例3 本実施例において作製した光磁気ディスクの構造は、実
施例2と同様で第4図に示すとおりである。ディスクの
作製は、DC二元同時スパッタ法により行なった。装置
概略図を第6図に示す。用いた装置は、蒸着ソース源は
TbFeCoPtの合金ターゲットとCrターゲットの
二つとN2プラズマ発生源とからなり、放電ガスとして
Arを主体とし、窒化のためのN2は適ぎプラズマ化し
た。ディスク作製手順は、まず案内溝付き基板1表面に
N2プラズマガンよりプラズマを照射した後に、Crタ
ーゲットを放電させ約50人の膜を形成したところで、
プラズマ照射量及びCrターゲットへ流す電流を徐々に
低下してゆくとともにTbFeCoPtターゲットを放
電させ記録層3を形成した。
Example 3 The structure of the magneto-optical disk manufactured in this example is the same as that of Example 2, as shown in FIG. The disk was manufactured by a DC dual-sputtering method. A schematic diagram of the device is shown in FIG. The apparatus used consisted of two evaporation sources, a TbFeCoPt alloy target and a Cr target, and a N2 plasma source, and the discharge gas was mainly Ar, with N2 for nitriding being turned into plasma. The disk manufacturing procedure was as follows: First, the surface of the substrate 1 with guide grooves was irradiated with plasma from an N2 plasma gun, and then a Cr target was discharged to form a film of about 50 layers.
The recording layer 3 was formed by gradually decreasing the amount of plasma irradiation and the current flowing through the Cr target, and discharging the TbFeCoPt target.

ここで100人の膜厚となったところで、窒素プラズマ
の照射を停止した。そして全膜厚が800人となったと
ころで、T b F e Co P tに印加する電流
を徐々に低下してゆき、全膜厚が900人となったとこ
ろで完全に停止した。これとは逆にCrターゲットに流
す電流を徐々に上げるとともにN2プラズマ照射量を増
大させた。そして、全膜厚が1100人となったところ
で成膜を停止した。記録層の組成はTb26Fe44C
o2oCr3Pt7であり、酸素拡散防止層の組成は記
録層と接する側では記録層と同じ組成で、外側に向かっ
てCrの量が多く、他の金属元素の量は少なくなるよう
に変化し、表面では金属元素はCrのみである。
When the film thickness reached 100 people, the nitrogen plasma irradiation was stopped. Then, when the total film thickness reached 800 wafers, the current applied to the T b Fe Co P t was gradually lowered, and stopped completely when the total film thickness reached 900 wafers. On the contrary, the current flowing through the Cr target was gradually increased and the amount of N2 plasma irradiation was increased. Then, the film formation was stopped when the total film thickness reached 1100 layers. The composition of the recording layer is Tb26Fe44C
o2oCr3Pt7, and the composition of the oxygen diffusion prevention layer is the same as the recording layer on the side in contact with the recording layer, and changes toward the outside so that the amount of Cr increases and the amount of other metal elements decreases, and on the surface. The metal element is only Cr.

こうして作製したディスクのC/Nを実施例2と同様の
記録再生条件で測定すると53dBであった。このディ
スクを用いて寿命試験を行ない、その結果は第7図に示
すとおりである。比較例に、N2プラズマを照射しない
で作製したものを用いた。試験方法として実施例1と同
じ<60℃−90%RH中にディスクを放置したときの
エラーレイ1〜の経時変化を測定した。その結果、本発
明を用いずに作製したディスクは、作製初期のエラーレ
イトが2X10−’(件/bit) テあったのが、1
000時間経過後から徐々に増大しはじめ、3000時
間後で5x1o−’(件/bit) トなった。これに
対し、本発明を用いて作製したディスクのエラーレイト
は、作製初期も3000時間放置後もまったく変らず2
×10−’ (件/bit)であった。
When the C/N of the disc thus produced was measured under the same recording and reproducing conditions as in Example 2, it was 53 dB. A life test was conducted using this disk, and the results are shown in FIG. As a comparative example, one manufactured without irradiation with N2 plasma was used. As a test method, the discs were left in the same environment as in Example 1 at <60° C. and 90% RH, and changes in error rays 1 to 1 were measured over time. As a result, disks manufactured without using the present invention had an error rate of 2X10-' (cases/bit) at the initial stage of manufacture, but the error rate was 1
It started to gradually increase after 000 hours and reached 5x1o-'(cases/bit) after 3000 hours. On the other hand, the error rate of the disc manufactured using the present invention did not change at all both at the initial stage of manufacture and after being left for 3000 hours.
×10-' (items/bit).

このディスクの表面層の窒素とCrの結合状態をXPS
及びメスバウワーにより調べたところ、Cr及び窒素と
も結合していることを示唆する結果を得た。また、本実
施例において作製したディスクの記録膜を構成する元素
の内Cr、N及び0の分布について調べた結果を第8図
に示す。酸素は記録層の表面近傍のみに存在し、Crは
表面から膜中に至る間で組成勾配を設けることにより、
窒素との結合をさらに強くするとともに層のはく離を抑
制することができるので、最も大きな保護効果を得るこ
とができた。なお、酸素拡散防止層における窒素の量は
約0.5〜lat%であった。
The bonding state of nitrogen and Cr in the surface layer of this disk was examined using XPS.
and Mössbauer, results suggesting that Cr and nitrogen are also bonded were obtained. Further, FIG. 8 shows the results of examining the distribution of Cr, N, and O among the elements constituting the recording film of the disk manufactured in this example. Oxygen exists only near the surface of the recording layer, and Cr creates a composition gradient from the surface to the inside of the film.
Since it was possible to further strengthen the bond with nitrogen and suppress layer peeling, it was possible to obtain the greatest protective effect. Note that the amount of nitrogen in the oxygen diffusion prevention layer was about 0.5 to lat%.

実施例4 作製したディスクの構造は、実施例2と同様で第4図に
示すとおりである。ディスクの作製は、エレクトロンビ
ーム(EB)蒸着装置により行なった。蒸着のソース源
としてPtMnSb合金とCrを用いた。まず、案内溝
を有するディスク基板を300℃に保ち、この上に、N
2雰囲気中でCr層を50人程度積層したところで、A
r雰囲気に切換えてPtMnSbとCrとを同時に蒸着
し、膜厚が900人となったころで、再びN2雰囲気に
変えてCrのみとして1100人になるまで蒸着した。
Example 4 The structure of the manufactured disk was the same as that of Example 2, as shown in FIG. The disk was manufactured using an electron beam (EB) evaporation device. PtMnSb alloy and Cr were used as the source for vapor deposition. First, a disk substrate with guide grooves is kept at 300°C, and N
2 After about 50 people laminated the Cr layer in an atmosphere, A
Switching to the r atmosphere, PtMnSb and Cr were deposited at the same time, and when the film thickness reached 900 layers, the atmosphere was changed again to N2 atmosphere and Cr was deposited only until the film thickness reached 1100 layers.

このディスクの寿命試験を実施例1と同様の環境条件に
て行なった。寿命評価は、表面の酸化層の膜厚の変化を
エリプソメトリ−にて測定した結果にて行なった。その
結果は第9図に示すとおりである。ここで比較例として
、膜形成をすべてAr雰囲気中で行なったディスクを用
いた。その結果、本発明を用いた場合、最初300時間
まで表面層の膜厚は大きく増加するが、その後3000
時間までは表面層の成長はまったくみら札なかった。
A life test of this disk was conducted under the same environmental conditions as in Example 1. The lifespan was evaluated based on the results of measuring changes in the thickness of the oxide layer on the surface using ellipsometry. The results are shown in FIG. Here, as a comparative example, a disk in which all film formation was performed in an Ar atmosphere was used. As a result, when using the present invention, the film thickness of the surface layer increases significantly for the first 300 hours;
Until then, there was no growth of the surface layer at all.

これに対して、N、雰囲気中で作製しなかった比較例で
は、表面層の膜厚は、環境中への放置直後300時間で
大きく変化し、その後、徐々に膜厚の増加かみられた。
On the other hand, in the comparative example that was not produced in an N atmosphere, the film thickness of the surface layer changed significantly immediately after 300 hours after being left in the environment, and then a gradual increase in film thickness was observed.

このことは、腐食が時間の経過とともに進行しているこ
と祭示している。本実施例にみられるようにCrとNの
結合層を設けることにより腐食の進行を大きく抑制でき
ることがわかった。なお、記録膜の組成はP t4oM
n2s S b311Cr、であり、酸素拡散防止層し
こおける窒素の量は約1〜1.5at%である。
This indicates that corrosion is progressing over time. It was found that the progress of corrosion can be greatly suppressed by providing a bonding layer of Cr and N as seen in this example. The composition of the recording film is P t4oM
n2s S b311Cr, and the amount of nitrogen in the oxygen diffusion prevention layer is about 1 to 1.5 at%.

このように本発明は、磁性材料の種類に依存することな
くまた、作製手法にも依存せず、CrとNの結合した化
合物層が記録膜の界面近傍に存在することにより、耐食
性向上に効果がある。
In this way, the present invention is effective in improving corrosion resistance by having a compound layer of Cr and N bonded near the interface of the recording film, regardless of the type of magnetic material or the manufacturing method. There is.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、光磁気記録膜の界面近傍にGrとNの
結合した化合物層を存在させることにより、磁気特性を
変動させることなく耐食性詮太きく向上させる効果があ
る。また、表面層の形成にあたり、主に作製雰囲気を変
えることにより簡単に行なえ、かつ連続した膜形成が行
なえるので、はく離やクラックが生しることなく、強固
な保護層を形成することができる。さらに、作製した窒
化物層特にCrとNの化合物は、硬度も著しく高く機械
的保護性能も高い。
According to the present invention, the presence of a compound layer in which Gr and N are combined in the vicinity of the interface of the magneto-optical recording film has the effect of significantly improving corrosion resistance without changing the magnetic properties. In addition, the surface layer can be easily formed by changing the production atmosphere, and continuous film formation is possible, making it possible to form a strong protective layer without peeling or cracking. . Furthermore, the produced nitride layer, particularly the compound of Cr and N, has extremely high hardness and high mechanical protection performance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の光磁気ディスクの断面構造
の模式図、第2図、第5図、第7図は本発明を説明する
ためのエラーレイトの経時変化を示す図、第3図はイオ
ンビームスパッタ装置の概略図、第4図は本発明の他の
実施例の光磁気ディスクの断面構造の模式図、第6図は
DC二元同時スパッタ装置の概略図、第8図は本発明の
他の実施例の光磁気ディスクの分桁結果を示す図、第9
図は本発明を説明するための説明図である。 1 基板      2・・・下地膜 3・光磁気記録膜  4・・酸素拡散防止層代理人弁理
士  中 村 純之助 第1図 第2図 第3図 第4図 第5図
FIG. 1 is a schematic diagram of a cross-sectional structure of a magneto-optical disk according to an embodiment of the present invention; FIGS. 2, 5, and 7 are diagrams showing changes in error rate over time to explain the present invention; 3 is a schematic diagram of an ion beam sputtering device, FIG. 4 is a schematic diagram of a cross-sectional structure of a magneto-optical disk according to another embodiment of the present invention, FIG. 6 is a schematic diagram of a DC binary simultaneous sputtering device, and FIG. 8 FIG. 9 is a diagram showing the minute digit result of a magneto-optical disk according to another embodiment of the present invention.
The figure is an explanatory diagram for explaining the present invention. 1 Substrate 2... Base film 3/Magneto-optical recording film 4... Oxygen diffusion prevention layer Attorney Junnosuke Nakamura Figure 1 Figure 2 Figure 3 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】 1、垂直磁気異方性を有し、光によって情報の記録、再
生、消去を行なう光磁気記録膜を有する光磁気記録用部
材において、上記光磁気記録膜は、Crを含み、かつ該
光磁気記録膜の界面の少なくとも一方にCrと結合した
窒素が存在する層を有することを特徴とする光磁気記録
用部材。 2、上記光磁気記録膜の組成が膜厚方向に変化し、該光
磁気記録膜の界面近傍部分においてCr濃度が増加して
いることを特徴とする請求項1記載の光磁気記録用部材
。 3、基板上に、スパッタリング又は電子線蒸着により、
垂直磁気異方性を有し、光によって情報の記録、再生、
消去を行なう光磁気記録膜を形成する光磁気記録用部材
の製造方法において、上記光磁気記録膜はCrを含有し
、該光磁気記録膜の形成の初期若しくは終期又はその両
者の時に窒素を含む雰囲気中でスパッタリング又は電子
線蒸着を行ない、上記光磁気記録膜の界面の少なくとも
一方に、Crと結合した窒素が存在する層を形成せしめ
たことを特徴とする光磁気記録用部材の製造方法。
[Claims] 1. A magneto-optical recording member having a magneto-optical recording film that has perpendicular magnetic anisotropy and records, reproduces and erases information using light, wherein the magneto-optical recording film contains Cr. 1. A magneto-optical recording member comprising a layer containing nitrogen bonded to Cr on at least one of the interfaces of the magneto-optical recording film. 2. The magneto-optical recording member according to claim 1, wherein the composition of the magneto-optical recording film changes in the film thickness direction, and the Cr concentration increases in a portion of the magneto-optical recording film near an interface. 3. On the substrate by sputtering or electron beam evaporation,
It has perpendicular magnetic anisotropy and can record, reproduce, and reproduce information using light.
In the method for manufacturing a magneto-optical recording member forming a magneto-optical recording film for erasing, the magneto-optical recording film contains Cr and nitrogen at the beginning or end of formation of the magneto-optical recording film or both. A method for producing a magneto-optical recording member, characterized in that a layer containing nitrogen bonded to Cr is formed on at least one of the interfaces of the magneto-optical recording film by sputtering or electron beam evaporation in an atmosphere.
JP63124956A 1988-05-24 1988-05-24 Magneto-optical recording member and method of manufacturing the same Expired - Fee Related JP2718695B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63124956A JP2718695B2 (en) 1988-05-24 1988-05-24 Magneto-optical recording member and method of manufacturing the same

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Application Number Priority Date Filing Date Title
JP63124956A JP2718695B2 (en) 1988-05-24 1988-05-24 Magneto-optical recording member and method of manufacturing the same

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JPH01296446A true JPH01296446A (en) 1989-11-29
JP2718695B2 JP2718695B2 (en) 1998-02-25

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0354746A (en) * 1989-07-21 1991-03-08 Kao Corp Magneto-optical recording medium

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6214349A (en) * 1985-07-12 1987-01-22 Hitachi Ltd Manufacturing method of magneto-optical recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6214349A (en) * 1985-07-12 1987-01-22 Hitachi Ltd Manufacturing method of magneto-optical recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0354746A (en) * 1989-07-21 1991-03-08 Kao Corp Magneto-optical recording medium

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Publication number Publication date
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