JPH01304584A - Wiring design method for integrated circuit - Google Patents

Wiring design method for integrated circuit

Info

Publication number
JPH01304584A
JPH01304584A JP63135878A JP13587888A JPH01304584A JP H01304584 A JPH01304584 A JP H01304584A JP 63135878 A JP63135878 A JP 63135878A JP 13587888 A JP13587888 A JP 13587888A JP H01304584 A JPH01304584 A JP H01304584A
Authority
JP
Japan
Prior art keywords
wiring
sparse
area
areas
processing process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63135878A
Other languages
Japanese (ja)
Inventor
Akio Ishizuka
石塚 昭夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63135878A priority Critical patent/JPH01304584A/en
Publication of JPH01304584A publication Critical patent/JPH01304584A/en
Pending legal-status Critical Current

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  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To improve the route finding capability and to quickly design wiring by using a quick wiring technique for the inside of a sparse area and using a wiring technique superior in route finding capability for the area between sparse areas. CONSTITUTION:In a processing process 1, a group of sparse areas where the degree of thickness of already arranged wiring patterns is lower than a threshold is extracted. In a processing process 2, the manner in which wiring should pass extracted sparse areas is determined. In a processing process 3, concrete wiring routes in the sparse area are obtained by the quick wiring technique. In a processing process 4, wiring routes between sparse areas are obtained by the wiring technique superior in route finding capability. In a processing process 5, sparse areas are corrected in accordance with wiring information newly generated in the processing process 3 for wiring in sparse areas and the processing process 4 for wiring between sparse areas.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は集fIf回路の配線設計法に関し、特に大規模
な集積回路の配線設計法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a wiring design method for integrated fIf circuits, and particularly to a wiring design method for large-scale integrated circuits.

〔従来の技術〕[Conventional technology]

従来、集積回路の配線設計においては、すべての配線を
同一の配線手法で配線するか、または高速な配線手法で
配線できなかった結線要求に対しては経路発見能力の優
れた低速な配線手法を用いている。
Conventionally, in integrated circuit wiring design, all wiring is routed using the same wiring method, or for connection requests that cannot be routed using high-speed wiring methods, a low-speed wiring method with excellent route finding ability is used. I am using it.

例えば、高速な配線手法にはハイタワーのアルゴリズム
があり、また経路発見能力に優れた低速の配線手法には
り一のアルゴリズムがある。尚、両者ともにその詳細は
、スーカツプの「回路のレイアウト」、プロシーデイン
ダス・オブ・ザ・アイトリプルイー(1’ROCF、E
DINGS OF THE IEEE>1981 年 
  No、10     PP1.281 〜1304
 に 5己載されている。
For example, Hightower's algorithm is a high-speed wiring method, and Hiichi's algorithm is a low-speed wiring method with excellent route finding ability. The details of both can be found in Sucup's ``Circuit Layout'' and Proceedings of the ITriple E (1'ROCF,E
DINGS OF THE IEEE>1981
No, 10 PP1.281 ~1304
5 of them are listed in .

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の配線設計法は、すべての配線を高速な配
線手法で行う場合には配線不可能な結線要求(以下、未
結線とよぶ)が数多く残るという欠点があり、すべての
配線を低速だが経路発見能力に優れた配線手法て行う場
合には計算機処理の時間が膨大になるという欠点がある
The conventional wiring design method described above has the disadvantage that if all wiring is done using a high-speed wiring method, many connection requests that cannot be routed (hereinafter referred to as unconnected lines) remain. If this is done using a wiring method that has excellent route discovery ability, it has the disadvantage that the computer processing time will be enormous.

また、高速な配線手法を用いた後の未結線についてのみ
、経路発見能力に優れた配線手法を用いつ場合も、未結
線の端子対が基板上で遠く離れた場所にある場合は、非
常に配線設計に時間がかがるという欠点がある。すなわ
ち、経路発見能力に1憂れた配線手法は、経路の存在す
る全可能性を調べるため、その処理時間が端子対をがこ
む矩形の面積に比例して増大するからである。
In addition, even if a wiring method with excellent route finding ability is used only for unconnected wires after using a high-speed wiring method, if the unconnected terminal pairs are located far apart on the board, The disadvantage is that wiring design takes time. That is, the wiring method, which has a poor route discovery ability, has to investigate all possibilities of the existence of a route, so the processing time increases in proportion to the area of the rectangle that encloses the terminal pair.

本発明の目的は、かがる集積回路の配線設計を短時間で
効率よく行うものて、結線すべき端子間が遠く離れてい
ても容易に配線設計を行うことのできる集積回路の配線
設計法を提供することにある。
An object of the present invention is to provide a wiring design method for integrated circuits that enables wiring design for integrated circuits to be performed efficiently in a short period of time, and that allows wiring design to be easily performed even if the terminals to be connected are far apart. Our goal is to provide the following.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の集積回路の配線設計法は、半導体基板上に形成
された複数の機能セルの信号入出力端子間に配線パター
ンを計算機処理により形成して所望の論理機能を有する
集積回路を実現する集積回路の配線設計法において、す
でに配置されている配線パターンの密集度がしきい値以
下の踵領域群を抽出する工程と、前記端子間の各結線要
求を疎領域内配線と線領域間配線とに分割する工程と、
前記疎領域内配線に高速配線手法を用いて配線を行う工
程と、前記線領域間配線に高能力経路検出配線手法を用
いて配線を行う工程とを含んで構成される。
The integrated circuit wiring design method of the present invention is an integrated circuit that realizes an integrated circuit having a desired logical function by forming a wiring pattern between signal input and output terminals of a plurality of functional cells formed on a semiconductor substrate by computer processing. In a circuit wiring design method, there is a step of extracting a heel region group in which the density of already placed wiring patterns is less than a threshold value, and a step of extracting each connection request between the terminals as wiring within a sparse region and wiring between line regions. The process of dividing into
The method includes a step of wiring the sparse area wiring using a high-speed wiring method, and a step of wiring the inter-line region wiring using a high-performance route detection wiring method.

〔実施例〕〔Example〕

次に、本発明の実施例について図面を参照して説明する
Next, embodiments of the present invention will be described with reference to the drawings.

第1図は本発明の配線設計の概略を説明するためのフロ
ー図である。
FIG. 1 is a flow diagram for explaining the outline of wiring design according to the present invention.

第1図に示すように、ががる配線設計はまず半導体基板
上に存在する配線および配線禁止領域の情報から配線ま
たは配線禁止が密集していない線領域を抽出する処理工
程1と、次に一つの結線要求に対し前記線領域抽出工程
で抽出した疎6y域をどのように経由して配線を行うが
を決定する処理工程2と、前記経由配線の決定処理工程
で経由すると決定した疎領域内の具体的な配線経路を求
める処理工程3と、前記疎領域内配線の経路決定処理工
程で求めた配線経路の間の配線経路すなわら踵領域間の
配線経路を密集領域内で求める工程4と、前記疎領域内
配線処理工程3および線領域間配線処理工程4で新たに
発生した配線情報から線領域を修正する処理工程5とを
含んている。
As shown in Figure 1, the Gagaru wiring design begins with processing step 1 of extracting a line area where wiring or wiring prohibitions are not concentrated from information on the wiring and wiring prohibition areas existing on the semiconductor substrate, and then Processing step 2 for determining how to route wiring through the sparse 6y area extracted in the line area extraction step for one connection request, and the sparse area determined to be routed through in the routing determination processing step. Step 3 of determining a specific wiring route in the sparse area and determining a wiring route between the heel areas, that is, a wiring route between the heel areas in the dense area. 4, and a processing step 5 of correcting the line area from the wiring information newly generated in the sparse area wiring processing step 3 and the line area wiring processing step 4.

第2図は第1図に示すフローに基すき形成される配線パ
ターンを有する半導体基板の平面図である。
FIG. 2 is a plan view of a semiconductor substrate having a wiring pattern formed according to the flow shown in FIG. 1.

第2図に示すように、この半導体基板12は端子6,7
の結線のため線領域8,11を利用している。まず、半
導体基板]2上で線領域8〜]、1を決定し、端子6,
7間を接続する経路を決定するにあたって使用する線領
域8.11を決める。
As shown in FIG. 2, this semiconductor substrate 12 has terminals 6 and 7.
The line areas 8 and 11 are used for connection. First, line regions 8~], 1 are determined on the semiconductor substrate]2, and terminals 6,
Determine the line area 8.11 to be used in determining the route connecting between 7 and 7.

しかる後、線領域8.11内の配線13.14を行い、
次に踵領域間の配線15.16を行う。この踵領域8,
11内は高速配線手法を用いて形成し、また踵領域8,
11問および線領域11と端子7間は高能力配線手法を
用いて形成する。従って、端子6,7が基板12上で遠
く離れていても、高能力配線手法を適用する領域は密集
領域17内の配線13.14問および配線14と端子1
7間の比較的狭い領域に限定されているため、処理時間
を著しく短縮できるという利点がある。
After that, wiring 13.14 in the line area 8.11 is performed,
Next, wiring 15 and 16 between the heel regions is performed. This heel area 8,
11 is formed using a high-speed wiring method, and the heel area 8,
The 11 questions and between the line area 11 and the terminal 7 are formed using a high-performance wiring method. Therefore, even if the terminals 6 and 7 are far apart on the board 12, the areas to which the high-performance wiring method is applied are the wiring 13 and 14 in the dense area 17, and the wiring 14 and terminal 1.
Since it is limited to a relatively narrow area between 7 and 7, it has the advantage that processing time can be significantly shortened.

第3図(a)〜(f>は本発明の一実施例を説明するた
めの工程順に示した半導体基板上の線領域決定にあたっ
ての平面図である。尚、半導体基板上には配線格子がX
軸方向、Y軸方向にそれぞれ定義されている。
FIGS. 3(a) to 3(f) are plan views for determining line areas on a semiconductor substrate shown in the order of steps for explaining an embodiment of the present invention. Note that a wiring grid is formed on the semiconductor substrate. X
They are defined in the axial direction and the Y-axis direction, respectively.

かかる線領域抽出処理においては、まず第3図(a)に
示すように、配線格子」二で配線パターン18および禁
止の存在しない長さ2以上のX軸方向の直線領域1つを
求める。次に、第3図(b)に示すように、第3図(a
)で求めた直線領域19を上下α本複製する。次に、第
3図(c)に示すように、第3図(a)、(b)で求め
た直線領域19のうち互いに重なり合うものの和をとり
一本にする。次に、第3図(d)に示すように、第3図
(c)で得られた直線領域19のうち互す1に隣接し長
さの等しいものの和をとり一つのX方向矩形とする。次
に、第3図(e)に示すように、前述の第3図(a)〜
(d)と同様にしてY方向についての矩形21とする。
In such a line region extraction process, first, as shown in FIG. 3(a), a wiring pattern 18 and one straight region in the X-axis direction with a length of 2 or more where no inhibition exists are determined using a wiring grid. Next, as shown in FIG. 3(b),
) The linear region 19 obtained in step 2 is duplicated α times in the upper and lower directions. Next, as shown in FIG. 3(c), the sum of the overlapping linear regions 19 obtained in FIGS. 3(a) and 3(b) is taken to make one line. Next, as shown in FIG. 3(d), among the straight line regions 19 obtained in FIG. 3(c), those adjacent to each other and having the same length are summed to form one X-direction rectangle. . Next, as shown in FIG. 3(e), the above-mentioned FIG.
A rectangle 21 in the Y direction is created in the same manner as in (d).

さらに、第3図(f)に示すように、第3図<a)〜(
e)で求めた矩形のうち互いに重なり合うものの和をと
り、一つの疎領域22とする。
Furthermore, as shown in FIG. 3(f), FIG.
Among the rectangles obtained in step e), those that overlap each other are summed to form one sparse region 22.

次に、かかる疎領域内外の配線パターン形成について第
4図(a)〜(c)を参照して説明する。
Next, the formation of wiring patterns inside and outside the sparse area will be explained with reference to FIGS. 4(a) to 4(c).

第4図(a)〜(c)はかかる本発明の一実施例を説明
するための工程順に示した疎領域内外の配線パターン図
である。
FIGS. 4(a) to 4(c) are diagrams of wiring patterns inside and outside the sparse region shown in the order of steps for explaining one embodiment of the present invention.

第4図(a)に示すように、まず疎領域のj■択にあた
っては、疎領域22を通過するのに要する第一のコスト
(予想処理時間と経路長の関数)を求める。次に、この
疎領域22間を結線するのに要する第二のコスI・を求
める。次に、結線要求の端子21から疎領域22まで結
線するのに要する第三のコストおよび結線要求端子21
間の結線に要する第四のコストを求める。次に、結線要
求端子21間を結線するために経由する端子と疎領域2
2の系列およびその系列上の連続する疎領域22間の前
記第二のコストの和と、系列上の疎領域22の第一のコ
ストの相と、系列の始めと終りの疎領域22とそれぞれ
の端子21までの第三および第四のコストの総和が最小
となるようにコスト最小の系列23を求める。
As shown in FIG. 4(a), when selecting the sparse area, first, the first cost (a function of expected processing time and path length) required for passing through the sparse area 22 is determined. Next, the second cost I· required to connect the sparse regions 22 is determined. Next, the third cost required to connect from the connection request terminal 21 to the sparse area 22 and the connection request terminal 21
Find the fourth cost required for the connection between. Next, the terminals to be passed through to connect between the connection request terminals 21 and the sparse area 2
2 series and the sum of the second costs between consecutive sparse regions 22 on the series, the phase of the first cost of the sparse regions 22 on the series, and the sparse regions 22 at the beginning and end of the series, respectively. The series 23 with the minimum cost is determined such that the sum of the third and fourth costs up to the terminal 21 is the minimum.

次に、第4図(b)に示すように、疎領域内の配線処理
にあたっては、前述の第4図(a)の処理で求めた系列
上で連続した2つの疎領域の位置関係より線領域間配線
が疎領域22に侵入する境界の辺を求める。このように
すべての疎領域について境界辺を求めた後、各疎領域2
2内で今求めたその疎領域22の境界の2辺間をハイタ
ワー法を用いて配線禁止パターン24等がないところに
求められた配線パターン25を配線する。
Next, as shown in FIG. 4(b), in the wiring process within the sparse area, a line is drawn from the positional relationship of two consecutive sparse areas on the series obtained in the process of FIG. 4(a) above. The edge of the boundary where the inter-area wiring intrudes into the sparse area 22 is determined. After finding the boundary edges for all sparse regions in this way, each sparse region 2
Using the Hightower method, the determined wiring pattern 25 is routed between the two sides of the boundary of the sparse region 22 just determined in 2, where there is no wiring prohibition pattern 24 or the like.

次に、第4図(c)に示すように、線領域間の配線処理
にあたっては、前述の第4図(a)で求めな系列上の2
つの連続する疎領域22(まなは端子21〉に対し、第
4図(b)で求めた配線パターン25間(まなは第4図
(b)で求めた配線パターンと端子間)をり−の方法を
用いて配線禁止パターン24がないところに求められた
配線パターン27を配線する。
Next, as shown in FIG. 4(c), in the wiring process between the line areas, 2
Between the two continuous sparse areas 22 (the terminals 21), the wiring pattern 25 obtained in Fig. 4(b) (between the wiring pattern and the terminals obtained in Fig. 4(b)) is The obtained wiring pattern 27 is wired in a place where there is no wiring prohibition pattern 24 using the method.

尚、全結線要求処理が終了していない場合の疎領域の再
構成処理5については、疎領域の選択処理2で経由した
疎領域について新たに線領域抽出処理1と同様の処理を
施し疎領域を更新する。
Regarding sparse region reconstruction processing 5 when all connection request processing has not been completed, the same processing as line region extraction processing 1 is newly performed on the sparse regions passed through sparse region selection processing 2, and the sparse region is Update.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明の集積回路の配線設計法は
、配線経路の決定を疎領域内と線領域間とに分け、疎領
域内には高速な配線手法を用い、線領域間には経路発見
能力に優れた配線手法を用いることにより、配線処理を
高速な配線手法のみを用いる場合に比較して経路発見能
力が高く、且つ経路発見能力に優れた配線手法のみを用
いる場合に比較して高速に行えるという効果がある。
As explained above, the integrated circuit wiring design method of the present invention divides the determination of wiring routes into sparse areas and between line areas, uses a high-speed wiring method within the sparse areas, and uses a high-speed wiring method between line areas. By using a wiring method with excellent route discovery ability, the route discovery ability is higher than when only using a high-speed wiring method, and when compared with only using a wiring method with excellent route discovery ability. This has the advantage that it can be performed at high speed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の配線処理の概略を説明するためのフロ
ー図、第2図は第1図に示すフローに基すき形成される
配線パターンを有する半導体基板の平面図、第3図(a
)〜(f)は本発明の一実施例を説明するための工程順
に示した半導体基板上の線領域平面図、第4図(a)〜
(c)は本発明の一実施例を説明するための工程順に示
した疎領域内外の配線パターン図である。 ■・・・線領域抽出処理、2・・・疎領域の選択処理、
3・・・疎領域内の配線処理、4・・・線領域間の配線
処理、5・・・疎領域の再構成処理、6,7.21・・
・信号入出力端子、8〜11.22・・・疎領域、12
・・・半導体基板、13〜16,1.8,25.27・
・・配線パターン、17・・・密集領域、1つ・・・直
線領域、20・・・X方向矩形、21・・・X方向矩形
、23・・・コスト最小の線領域系列、24・・・配線
禁止または既配線パターン。 拓  j  霞 藁  Z  霞 刀 3 困 22       ゛、23コス、弓霞・2)の躬11
拾 4 図
FIG. 1 is a flowchart for explaining the outline of the wiring process of the present invention, FIG. 2 is a plan view of a semiconductor substrate having a wiring pattern formed based on the flow shown in FIG. 1, and FIG.
) to (f) are plan views of line regions on a semiconductor substrate shown in the order of steps for explaining an embodiment of the present invention, and FIGS.
(c) is a wiring pattern diagram inside and outside the sparse region shown in the order of steps for explaining one embodiment of the present invention. ■...Line area extraction processing, 2...Sparse area selection processing,
3... Wiring processing within the sparse area, 4... Wiring processing between line areas, 5... Reconfiguration processing of the sparse area, 6, 7.21...
・Signal input/output terminal, 8 to 11.22...Sparse area, 12
...Semiconductor substrate, 13-16, 1.8, 25.27.
... Wiring pattern, 17... Dense area, 1... Straight line area, 20... Rectangle in the X direction, 21... Rectangle in the X direction, 23... Line area series with minimum cost, 24...・Wiring prohibited or already wired pattern. Taku j Kasumi Straw Z Kasumi Sword 3 Trouble 22 ゛, 23 Kos, Yumika/2) no Mi 11
Figure 4

Claims (1)

【特許請求の範囲】[Claims]  半導体基板上に形成された複数の機能セルの信号入出
力端子間に配線パターンを計算機処理により形成して所
望の論理機能を有する集積回路を実現する集積回路の配
線設計法において、すでに配置されている配線パターン
の密集度がしきい値以下の疎領域群を抽出する工程と、
前記端子間の各結線要求を疎領域内配線と疎領域間配線
とに分割する工程と、前記疎領域内配線に高速配線手法
を用いて配線を行う工程と、前記疎領域間配線に高能力
経路検出配線手法を用いて配線を行う工程とを含むこと
を特徴とする集積回路の配線設計法。
In an integrated circuit wiring design method, a wiring pattern is formed between the signal input and output terminals of a plurality of functional cells formed on a semiconductor substrate by computer processing to realize an integrated circuit having a desired logical function. a step of extracting a group of sparse regions in which the density of wiring patterns is less than a threshold;
a step of dividing each connection request between the terminals into wiring within the sparse area and wiring between the sparse areas; a process of wiring the wiring within the sparse area using a high-speed wiring method; 1. A wiring design method for an integrated circuit, comprising the step of wiring using a route detection wiring method.
JP63135878A 1988-06-01 1988-06-01 Wiring design method for integrated circuit Pending JPH01304584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63135878A JPH01304584A (en) 1988-06-01 1988-06-01 Wiring design method for integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63135878A JPH01304584A (en) 1988-06-01 1988-06-01 Wiring design method for integrated circuit

Publications (1)

Publication Number Publication Date
JPH01304584A true JPH01304584A (en) 1989-12-08

Family

ID=15161884

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63135878A Pending JPH01304584A (en) 1988-06-01 1988-06-01 Wiring design method for integrated circuit

Country Status (1)

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JP (1) JPH01304584A (en)

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