JPH0131299B2 - - Google Patents
Info
- Publication number
- JPH0131299B2 JPH0131299B2 JP58187429A JP18742983A JPH0131299B2 JP H0131299 B2 JPH0131299 B2 JP H0131299B2 JP 58187429 A JP58187429 A JP 58187429A JP 18742983 A JP18742983 A JP 18742983A JP H0131299 B2 JPH0131299 B2 JP H0131299B2
- Authority
- JP
- Japan
- Prior art keywords
- ceramic substrate
- adhesive layer
- heat sink
- silicon
- package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/20—Arrangements for cooling
- H10W40/25—Arrangements for cooling characterised by their materials
- H10W40/251—Organics
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Description
【発明の詳細な説明】
[発明の背景と目的]
本発明は発熱性素子を搭載するセラミツク基板
と放熱体とを一体化したセラミツク基板パツケー
ジに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Background and Objectives of the Invention] The present invention relates to a ceramic substrate package that integrates a ceramic substrate on which a heat generating element is mounted and a heat sink.
従来、ICやLSI等の発熱性素子を搭載したセラ
ミツク基板と放熱体とを接着一体化させるために
熱伝導性に優れたエポキシ樹脂が使用されてき
た。 Conventionally, epoxy resin with excellent thermal conductivity has been used to bond and integrate a heat sink and a ceramic substrate on which heat generating elements such as ICs and LSIs are mounted.
一方、近年電子機器の高密度、小型化がすすむ
につれて発熱性素子の放熱が重要な問題となつて
きており、急激な温度変化を伴うことが予想され
る。従来のようにエポキシ樹脂を接着層として使
用する場合、セラミツク基板、エポキシ樹脂、放
熱体の熱膨張係数が異なるため、冷熱サイクルや
熱衝撃の条件において接着層が破損するという問
題が生じることになる。 On the other hand, as electronic devices have become more dense and smaller in recent years, heat dissipation from heat-generating elements has become an important issue, and it is expected that rapid temperature changes will occur. When epoxy resin is used as an adhesive layer as in the past, the ceramic substrate, epoxy resin, and heat sink have different coefficients of thermal expansion, resulting in the problem of the adhesive layer being damaged under conditions of cooling/heating cycles or thermal shock. .
本発明は上記した従来技術の問題を解消するも
のであり、急激な温度変化を伴なう条件において
もセラミツク基板と放熱体とを一体化する接着層
の破損を防止できるセラミツク基板パツケージの
提供を目的とするものである。 The present invention solves the above-mentioned problems of the prior art, and provides a ceramic substrate package that can prevent damage to the adhesive layer that integrates the ceramic substrate and the heat sink even under conditions involving rapid temperature changes. This is the purpose.
[発明の概要]
本発明は、発熱性素子を搭載したセラミツク基
板と放熱体とを一体化する接着層を、付加重合型
シリコーンゴムと無機充填剤とを含有する熱伝導
性組成物により形成したことを特徴とするもので
ある。[Summary of the Invention] The present invention provides an adhesive layer that integrates a ceramic substrate on which a heat generating element is mounted and a heat dissipation body, formed of a thermally conductive composition containing an addition polymerizable silicone rubber and an inorganic filler. It is characterized by this.
本発明において、セラミツク基板としてはアル
ミナ、酸化ベリウム、窒化ホウ素、炭化ケイ素の
ように熱伝導性の大きい材料からなるものがあげ
られる。 In the present invention, the ceramic substrate may be made of a material with high thermal conductivity such as alumina, beryum oxide, boron nitride, or silicon carbide.
セラミツク基板に搭載される発熱性素子として
は、IC、LSI、超LSI、ダイオード、サイリスタ、
パワートランジスタなどがある。 Heat generating elements mounted on ceramic substrates include ICs, LSIs, super LSIs, diodes, thyristors,
power transistors, etc.
放熱体としては、銅、銅合金、アルミニウム、
鉄といつた金属が一般的であるが、セラミツクか
ら構成されるものであつてもよい。 As a heat sink, copper, copper alloy, aluminum,
It is generally made of metal such as iron, but it may also be made of ceramic.
本発明において最も重要なのは、上記セラミツ
ク基板と放熱体を一体化させるための接着層を付
加重合型シリコーンゴムと無機充填剤とを含有す
る熱伝導性組成物でもつて形成した点にある。 The most important point in the present invention is that the adhesive layer for integrating the ceramic substrate and the heat sink is formed of a thermally conductive composition containing an addition polymerizable silicone rubber and an inorganic filler.
この組成物はセラミツクおよび金属の双方に対
して接着力が強く、しかも硬化後も弾性を有する
ため急激な温度変化に伴なう膨張、収縮に追従で
きるものである。 This composition has strong adhesion to both ceramics and metals, and has elasticity even after curing, so it can follow expansion and contraction caused by rapid temperature changes.
また、無機充填剤は付加重合型シリコーンゴム
の熱伝導性を更に向上させるために添加するもの
であるが、無機充填剤はシリコーンゴムに対して
熱膨張係数が小さいため、非充填の場合よりも接
着層の熱膨張係数をセラミツク基板および放熱体
のそれに近付けることが可能となり、熱衝撃に対
する追従性を更に大きくしている。 In addition, inorganic fillers are added to further improve the thermal conductivity of addition-polymerized silicone rubber, but since inorganic fillers have a smaller coefficient of thermal expansion than silicone rubber, It becomes possible to bring the coefficient of thermal expansion of the adhesive layer closer to that of the ceramic substrate and the heat sink, further increasing the ability to follow thermal shock.
本発明における付加重合型シリコーンゴムとし
ては、
(1) 1分子中に少なくとも2個のケイ素原子結合
アルケニル基を有するジオルガノポリシロキサ
ン、
(2) 1分子中に少なくとも2個のケイ素原子結合
水素原子を有する液状オルガノ水素ポリシロキ
サン、
(3) 白金もしくは白金系化合物等の付加反応触
媒、よりなるものがあげられ、成分(3)の触媒作
用のもとに架橋されてゴム弾性体を形成するも
のである。かかる付加重合型シリコーンゴム
は、架橋前は液状で、架橋後は優れた粘通性を
有するものであり、熱伝導性を高める無機充填
剤を充填しても優れた弾力性を長期間にわたり
維持できることになる。 The addition polymerizable silicone rubber in the present invention includes (1) diorganopolysiloxane having at least two silicon-bonded alkenyl groups in one molecule, (2) at least two silicon-bonded hydrogen atoms in one molecule. and (3) an addition reaction catalyst such as platinum or a platinum-based compound, which is crosslinked under the catalytic action of component (3) to form a rubber elastic body. It is. Such addition-polymerized silicone rubber is liquid before crosslinking and has excellent viscosity after crosslinking, and maintains excellent elasticity for a long period of time even when filled with inorganic fillers that increase thermal conductivity. It will be possible.
無機充填剤としては、アルミナ、石英、酸化
亜鉛、マグネシア、窒化ホウ素、窒化アルミニ
ウム、炭化ケイ素、黒鉛、金属等の粉末があげ
られ、これらは単独または2種以上併用して30
〜70容量%の範囲で添加することができる。 Examples of inorganic fillers include powders of alumina, quartz, zinc oxide, magnesia, boron nitride, aluminum nitride, silicon carbide, graphite, metals, etc., and these can be used alone or in combination of two or more.
It can be added in a range of ~70% by volume.
本発明においては、上記成分以外に必要に応じ
て粘度を調節するための反応性希釈剤、シリコー
ン油、有機溶剤、ポツトライフを延長するための
ベンゾトリアゾールやハイドロパーオキサイドと
いつた硬化抑制剤、煙霧質シリカのような補強性
充填剤、着色剤、難燃剤等を適宜添加してもよ
い。また、シランカツプリング剤、チタネートカ
ツプリング剤、エポキシ樹脂等を添加することに
より自己接着性を向上できる。 In the present invention, in addition to the above-mentioned components, reactive diluents, silicone oil, organic solvents, curing inhibitors such as benzotriazole and hydroperoxide to extend the pot life, and fumes are used to adjust the viscosity. Reinforcing fillers such as silica, colorants, flame retardants, etc. may be added as appropriate. Furthermore, the self-adhesiveness can be improved by adding a silane coupling agent, a titanate coupling agent, an epoxy resin, or the like.
上記成分よりなる熱伝導性組成物はセラミツク
基板と放熱体との間に挿入され、その後常温また
は加熱により硬化され両者を一体化する。 A thermally conductive composition comprising the above components is inserted between the ceramic substrate and the heat sink, and then cured at room temperature or by heating to integrate the two.
[発明の実施例]
添付図面は本発明のセラミツク基板パツケージ
の一実施例の断面図を示したものである。[Embodiment of the Invention] The accompanying drawing shows a cross-sectional view of an embodiment of the ceramic substrate package of the present invention.
1は発熱性素子、2はセラミツク基板、3は放
熱体、4は接着層、5はセラミツクキヤツプ、6
は封止用ガラスである。 1 is a heat generating element, 2 is a ceramic substrate, 3 is a heat sink, 4 is an adhesive layer, 5 is a ceramic cap, 6
is the sealing glass.
実施例 1
発熱性素子1としてはLSIシリコン素子、セラ
ミツク基板2として炭化ケイ素基板、放熱体3と
してアルミフインをそれぞれ用い、接着層4を下
記(1)〜(7)の成分よりなる組成物を挿入してからパ
ツケージ全体を150℃、15分間加熱することによ
つて形成した。Example 1 An LSI silicon element was used as the heat generating element 1, a silicon carbide substrate was used as the ceramic substrate 2, an aluminum fin was used as the heat sink 3, and a composition consisting of the following components (1) to (7) was inserted as the adhesive layer 4. The package was then formed by heating the entire package at 150° C. for 15 minutes.
(1) 両端をジメチルビニルシリル基で封鎖したジ
チルポリシロキサン 100重量部
(2) 両末端シラノール基封鎖のジメチルポリシロ
キサン(粘度調整剤) 20重量部
(3) 両末端トリメチルシリル基封鎖のメチル水素
ポリシロキサン 12重量部
(4) ビニルトリメトキシシラン 2重量部
(5) アルミナ 350重量部
(6) 塩化白金酸のイソプロピルアルコール1重量
%溶液 1重量部
(7) ベンゾトリアゾールのイソプロピルアルコー
ル30重量%容液 0.2重量部
得られたパツケージについて、150℃で30分と
−55℃で30分のサイクル試験を100回繰返し何ら
異常は認められなかつた。また素子を動作させた
場合の放熱特性は良好であつた。(1) 100 parts by weight of dithylpolysiloxane with both ends blocked with dimethylvinylsilyl groups (2) 20 parts by weight of dimethylpolysiloxane (viscosity modifier) with both ends blocked with silanol groups (3) Methyl hydrogen polysiloxane with both ends blocked with trimethylsilyl groups Siloxane 12 parts by weight(4) Vinyltrimethoxysilane 2 parts by weight(5) Alumina 350 parts by weight(6) 1% by weight solution of chloroplatinic acid in isopropyl alcohol 1 part by weight(7) 30% by weight solution of benzotriazole in isopropyl alcohol 0.2 parts by weight The resulting package was subjected to a cycle test of 150°C for 30 minutes and -55°C for 30 minutes, repeated 100 times, and no abnormality was observed. Furthermore, the heat dissipation characteristics when the device was operated were good.
実施例 2
発熱性素子1としてはICシリコン素子を使用
した以外は実施例1と同様にしてパツケージを作
成したが、結果は実施例1と同様であつた。Example 2 A package was prepared in the same manner as in Example 1 except that an IC silicon element was used as the heat generating element 1, and the results were the same as in Example 1.
実施例 3
接着層4を形成する組成物としてアルミナに代
えて窒化ホウ素を250重量部含有させた以外は実
施例1と同様にしてパツケージを作成したが、結
果は実施例1と同様であつた。Example 3 A package was prepared in the same manner as in Example 1 except that 250 parts by weight of boron nitride was used instead of alumina in the composition forming the adhesive layer 4, but the results were the same as in Example 1. .
比較例 1
接着層4を熱伝導性ビスフエノール系エポキシ
樹脂で形成した以外は実施例1と同様にしてパツ
ケージを作成した。Comparative Example 1 A package was prepared in the same manner as in Example 1 except that the adhesive layer 4 was formed of a thermally conductive bisphenol epoxy resin.
実施例1と同様のサイクル試験を行つたとこ
ろ、20回以内で亀裂もしくは剥離を生じた。 When the same cycle test as in Example 1 was conducted, cracking or peeling occurred within 20 cycles.
比較例 2
接着層4を形成する組成物においてアルミナを
含有させなかつた以外は実施例1と同様にしてパ
ツケージを作成した。Comparative Example 2 A package was produced in the same manner as in Example 1 except that alumina was not contained in the composition for forming the adhesive layer 4.
実施例1と同様のサイクル試験を行つたとこ
ろ、亀裂は認められなかつたが、若干の剥離が認
められた。 When the same cycle test as in Example 1 was conducted, no cracks were observed, but some peeling was observed.
また、素子を動作させた場合の放熱特性は悪
く、素子の寿命を短かくすることが確認された。 Furthermore, it was confirmed that the heat dissipation characteristics when the device is operated are poor, shortening the lifespan of the device.
[発明の効果]
以上説明してきた通り、本発明は付加重合型シ
リコーンゴムと無機充填剤とを含有する熱伝導性
組成物でもつてセラミツク基板と放熱体とを一体
化したセラミツク基板パツケージを提供するもの
であり、これによつて苛酷な熱衝撃に対して十分
耐えるパツケージを得ることができる。[Effects of the Invention] As explained above, the present invention provides a ceramic substrate package in which a ceramic substrate and a heat sink are integrated using a thermally conductive composition containing an addition-polymerized silicone rubber and an inorganic filler. This makes it possible to obtain a package that is sufficiently resistant to severe thermal shock.
しかも、本発明においてはセラミツク基板から
放熱体への熱伝導性は極めて良好であり、発熱性
素子の寿命を長くすることが可能となる。 Moreover, in the present invention, the thermal conductivity from the ceramic substrate to the heat sink is extremely good, making it possible to extend the life of the heat generating element.
添付図面は本発明の一実施例の断面説明図であ
る。
1:発熱性素子、2:セラミツク基板、3:放
熱体、4:接着層。
The accompanying drawings are cross-sectional explanatory views of one embodiment of the present invention. 1: Heat generating element, 2: Ceramic substrate, 3: Heat sink, 4: Adhesive layer.
Claims (1)
体とを、1分子中に少なくとも2個のケイ素原子
結合アルケニル基を有するジオルガノポリシロキ
サンと、1分子中に少なくとも2個のケイ素原子
結合水素原子を有する液状オルガノポリシロキサ
ンと、付加反応触媒からなる付加重合型シリコー
ンゴムに無機充填剤を混合した熱伝導性組成物か
らなる接着層を介して一体化したことを特徴とす
るセラミツク基板パツケージ。1. The ceramic substrate on which the exothermic element is mounted and the heat sink are made of diorganopolysiloxane having at least two silicon-bonded alkenyl groups in one molecule and at least two silicon-bonded hydrogen atoms in one molecule. What is claimed is: 1. A ceramic substrate package characterized in that liquid organopolysiloxane and a thermally conductive composition made of an addition-polymerizable silicone rubber made of an addition reaction catalyst mixed with an inorganic filler are integrated via an adhesive layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58187429A JPS6079757A (en) | 1983-10-06 | 1983-10-06 | Ceramic substrate package |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58187429A JPS6079757A (en) | 1983-10-06 | 1983-10-06 | Ceramic substrate package |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6079757A JPS6079757A (en) | 1985-05-07 |
| JPH0131299B2 true JPH0131299B2 (en) | 1989-06-26 |
Family
ID=16205898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58187429A Granted JPS6079757A (en) | 1983-10-06 | 1983-10-06 | Ceramic substrate package |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6079757A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0543483Y2 (en) * | 1987-10-12 | 1993-11-02 | ||
| JPH07297560A (en) * | 1994-04-28 | 1995-11-10 | Hitachi Ltd | Multilayer printed wiring board and its mounting structure |
| WO2018033992A1 (en) * | 2016-08-18 | 2018-02-22 | デンカ株式会社 | Composition for thermally-conductive grease, thermally-conductive grease, and heat dissipation member |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54106173A (en) * | 1978-02-08 | 1979-08-20 | Nec Corp | Semiconductor device |
| JPS562349A (en) * | 1979-06-21 | 1981-01-12 | Toshiba Silicone Co Ltd | Molded rubber article for heat dissipation |
| JPS5944152B2 (en) * | 1979-07-04 | 1984-10-26 | セイコーインスツルメンツ株式会社 | airtight chamber |
| JPS5656272U (en) * | 1979-10-04 | 1981-05-15 | ||
| JPS57168247U (en) * | 1981-04-17 | 1982-10-23 | ||
| JPS5821446A (en) * | 1981-07-29 | 1983-02-08 | Hitachi Cable Ltd | Method for manufacturing thermally conductive insulation sheet |
-
1983
- 1983-10-06 JP JP58187429A patent/JPS6079757A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6079757A (en) | 1985-05-07 |
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