JPH01319121A - Thin film magnetic disk - Google Patents
Thin film magnetic diskInfo
- Publication number
- JPH01319121A JPH01319121A JP15193088A JP15193088A JPH01319121A JP H01319121 A JPH01319121 A JP H01319121A JP 15193088 A JP15193088 A JP 15193088A JP 15193088 A JP15193088 A JP 15193088A JP H01319121 A JPH01319121 A JP H01319121A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic disk
- particles
- disk
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 26
- 239000010409 thin film Substances 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000002245 particle Substances 0.000 claims abstract description 15
- 239000000919 ceramic Substances 0.000 claims abstract description 11
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 6
- 239000011241 protective layer Substances 0.000 claims abstract description 6
- 239000010408 film Substances 0.000 claims abstract description 5
- 239000010419 fine particle Substances 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 14
- 239000010410 layer Substances 0.000 abstract description 8
- 230000001050 lubricating effect Effects 0.000 abstract description 3
- 230000003746 surface roughness Effects 0.000 abstract description 3
- 239000011362 coarse particle Substances 0.000 abstract description 2
- 238000001914 filtration Methods 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000004816 latex Substances 0.000 description 3
- 229920000126 latex Polymers 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000010953 base metal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は記録媒体として好適な薄膜磁気ディスクに係り
、特に製造上の前処理を改善した薄WAli!気ディス
クに関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a thin-film magnetic disk suitable as a recording medium, and in particular to a thin-film magnetic disk with improved manufacturing pretreatment. Regarding the air disc.
〔従来技術及び発明が解決しようとする課題〕磁気記録
媒体の一種である磁気テープを製造する技術では、高分
子ラテックス粒子等の微粒子をバインダーに分散させ、
チーブベース上にスピンコードさせて、その上に磁性層
を作り、表面に突起を形成させ、耐スチル特性を向上さ
せるという製造方法、技術内容が、例えば特開昭59−
94227号公報、特開昭59−92428号公報、特
開昭61−8720号公報等に紹介されている。また、
バインダーを用いず、高分子ラテックス粒子を塗布分散
させる方法もあり、これは例えば特開昭61−9822
号公報等に開示されている。[Prior art and problems to be solved by the invention] In the technology of manufacturing magnetic tape, which is a type of magnetic recording medium, fine particles such as polymer latex particles are dispersed in a binder.
For example, Japanese Patent Laid-Open No. 1983-1984 discloses a manufacturing method and technical content of spin-cording on a chip base, forming a magnetic layer thereon, and forming protrusions on the surface to improve still resistance properties.
It is introduced in JP-A-94227, JP-A-59-92428, JP-A-61-8720, etc. Also,
There is also a method of coating and dispersing polymer latex particles without using a binder, and this method is described, for example, in JP-A-61-9822.
It is disclosed in the publication number etc.
しかるに、微粒子をバインダーに分散させて基板上に形
成させる方法は、スパッタリングを用いる薄膜形成法で
は、真空中において基板加熱、イオンエツチング等を受
けるために好ましくなく、また、高分子ラテックス粒子
も硬度や耐熱性が不十分であるという問題点があった。However, the thin film forming method using sputtering involves dispersing fine particles in a binder and forming them on a substrate, which is not preferable because the substrate is heated in a vacuum, ion etching, etc. Also, polymer latex particles also have hardness and There was a problem that heat resistance was insufficient.
本発明の薄膜磁気ディスクは、非磁性の基板上に粒径1
00八〜1000人の同一粒径の球形セラミック微粒子
をほぼ均一に分散させ、その上に少なくとら強磁性金属
膜及び保護層薄膜を形成して作成することにより上記問
題点を解決した。The thin-film magnetic disk of the present invention has a grain size of 1 on a non-magnetic substrate.
The above-mentioned problems were solved by dispersing almost uniformly spherical ceramic fine particles of 0.08 to 1000 particles and forming at least a ferromagnetic metal film and a thin protective layer thereon.
以下、第1図を参照しながら、具体的な実施例について
説明する。第1図は、本発明になる薄膜磁気ディスクの
一実施例の断面図である。この図に示すように、薄膜磁
気ディスク用の基板2上に、真球に近い粒径100〜1
000^の範囲の球形セラミック微粒子3をほぼ均一に
分散させ、その上に下地金属層41強磁性金属WA5.
保護層6.潤滑層7等の薄膜を形成して薄膜磁気ディス
ク1を完成する。Hereinafter, a specific example will be described with reference to FIG. FIG. 1 is a sectional view of an embodiment of a thin film magnetic disk according to the present invention. As shown in this figure, on a substrate 2 for a thin film magnetic disk, grains with a diameter of 100 to 1
000^ of spherical ceramic fine particles 3 are dispersed almost uniformly, and a base metal layer 41 ferromagnetic metal WA5.
Protective layer 6. Thin films such as the lubricating layer 7 are formed to complete the thin film magnetic disk 1.
球形セラミック微粒子として例えばシリカ微粒子を用い
る場合は、シリカ微粒子水溶液(例えばスノーテックス
、口座化学工業(株))等を水溶液に分散させ、必要に
応じて粗大粒子を濾過除去して使用するとよい。When using, for example, silica fine particles as the spherical ceramic fine particles, it is preferable to disperse an aqueous solution of silica fine particles (for example, Snowtex, Kaguchi Kagaku Kogyo Co., Ltd.) into the aqueous solution, and if necessary, remove coarse particles by filtration before use.
磁気ディスク基板2上に吸着分散させる場合は、スピン
コード、浸漬引上げ後、スピン乾燥する等の方法を用い
る。吸着させる球形セラミック微粒子3の密度は、10
万個/d以下では耐久性の向上は望めず、100万個/
−以上では薄膜の生成に悪影響を及ぼし、磁気記録特性
に劣化を生じさせる。When adsorbing and dispersing on the magnetic disk substrate 2, a method such as a spin cord, dipping, pulling, and spin drying is used. The density of the spherical ceramic fine particles 3 to be adsorbed is 10
If it is less than 10,000 pieces/d, no improvement in durability can be expected;
- or above, it adversely affects the formation of a thin film and causes deterioration in magnetic recording characteristics.
また、薄膜の密着性も低下するので、20万〜30万個
/−が適当である。なお、分散させる表面形状は特定し
なくてもよい。In addition, since the adhesion of the thin film also decreases, the number of 200,000 to 300,000 pieces/- is appropriate. Note that the surface shape to be dispersed does not need to be specified.
また、用いる球形セラミック微粒子3の粒径は、100
八より小さければ効果がなく、1000人より大きいも
のでは磁気ヘッドの浮上量を越えてしまい、ヘッドクラ
ッシュを引起すことが実験結果かられかったので、粒径
は100人〜1000^とする。Further, the particle size of the spherical ceramic fine particles 3 used is 100
If the particle size is smaller than 8, there is no effect, and if it is larger than 1,000 particles, the flying height of the magnetic head will be exceeded, and experimental results have shown that it will cause a head crash.
〈実施例1〉
無電解N1PlJ金(メツキ)を施され、ポリッシュさ
れたA4基板2上に、シリカ微粒子を20万〜30万a
!/−の密度となるように、10%の水溶液に浸漬させ
、引上げ後、水によるリンスを行ないながらスピン乾燥
させ、1000への粒状突起を形成させた。次いで、こ
の基板2上にスパッタリングを用いてCr下地層4 、
Co−N i−Cr合金5.カーボン保護WA6を夫
々 600人、500人、400^形成させた。<Example 1> On a polished A4 substrate 2 coated with electroless N1PlJ gold (plated), 200,000 to 300,000 µm of silica particles were deposited.
! The sample was immersed in a 10% aqueous solution so as to have a density of /-, and after being pulled up, it was spin-dried while rinsing with water to form 1000 granular protrusions. Next, a Cr underlayer 4 is formed on this substrate 2 by sputtering.
Co-Ni-Cr alloy5. 600, 500, and 400 layers of carbon-protected WA6 were formed, respectively.
〈実施例2〉
実施例1で用いたA1基板2に、ホワイトアルミナ粒径
5μmの研磨テープでテクスチャリングを施した。この
基板をシリカゾル10%水溶液を含ませた布テープで擦
り、シリカ微粒子3を基板2上に吸着させ、その浸水で
リンスし乍らスピン乾燥させた。<Example 2> The A1 substrate 2 used in Example 1 was textured with a polishing tape having a white alumina particle size of 5 μm. This substrate was rubbed with a cloth tape impregnated with a 10% aqueous solution of silica sol to adsorb the silica fine particles 3 onto the substrate 2, which was then rinsed with water and spin-dried.
この基板2を実施例1と同様に金属薄[4,5をスパッ
タリングにより形成させた。On this substrate 2, metal thin films [4, 5] were formed by sputtering in the same manner as in Example 1.
比較例として、実施例1.2の方法で作製した基板2に
、シリカ微粒子3を吸着させずに金属薄膜4.5をスパ
ッタリング形成したものを作製し、夫々弗素系潤滑剤7
を塗布した後、各ディスクについて初期の勤牽擦係数を
測定し、C85fContactstart 5tOI
))試験を行なった。その結果を第1表に示す。As a comparative example, a metal thin film 4.5 was formed by sputtering on the substrate 2 prepared by the method of Example 1.2 without adsorbing the silica fine particles 3, and each was coated with a fluorine-based lubricant 7.
After applying C85fContactstart 5tOI, the initial friction coefficient was measured for each disc.
)) Tests were conducted. The results are shown in Table 1.
この第1表から、本発明の薄膜磁気ディスクの方が、従
来例(比較例)よりも動牽擦係数が小さく、これにより
寿命は大幅に増加することがわかる。その理由は、真球
に近い同一粒径100〜1000人のシリカ微粒子等の
球形セラミック微粒子3をほぼ均一に分散させたために
、ディスクの表面粗さが均一になったためと思われる。From Table 1, it can be seen that the thin film magnetic disk of the present invention has a smaller dynamic traction coefficient than the conventional example (comparative example), and as a result, the service life is significantly increased. The reason for this is thought to be that the surface roughness of the disk became uniform because the spherical ceramic fine particles 3 such as silica fine particles having the same particle diameter of 100 to 1000 particles close to perfect spheres were almost uniformly dispersed.
(第 1 表 )
(注:第1表において、「実1」、「比2」等は夫々実
施例1.比較例2のことである。また、◎は3万回の試
験でも貼着き及びヘッドクラッシュが生じなかったこと
を意味し、Xは貼着きが生じたこと及びその時点での回
数を示す、)〔効果〕
本発明の薄膜磁気ディスクは以上のようにして製造する
ので、ディスクの表面粗さを均一にでき、そのため動I
II擦係数が小さくなり、ディスクと磁気ヘッドの間の
貼着きゃクラッシュが起り難くなり、寿命は大幅に増加
し、信頼性が格段に向上するという優れた特長を有する
。(Table 1) (Note: In Table 1, "Example 1", "Comparison 2", etc. refer to Example 1 and Comparative Example 2, respectively. In addition, ◎ indicates that there was no sticking or sticking even after 30,000 tests. (X means that no head crash occurred, and X indicates that sticking occurred and the number of times at that point.) [Effect] Since the thin film magnetic disk of the present invention is manufactured as described above, the disk The surface roughness can be made uniform, so the dynamic I
It has excellent features such as a smaller II friction coefficient, less chance of crashes due to sticking between the disk and the magnetic head, significantly increased lifespan, and significantly improved reliability.
第1図は本発明の薄Mli!気ディスクの一実施例の断
面図である。
1・・・薄膜磁気ディスク、2・・・基板、3・・・球
形セラミック(シリカ)微粒子、4・・・下地金属層、
5・・・強磁性金属膜、6・・・保護層、7・・・潤滑
層。
特許出願人 日本ビクター株式会社
代表者 埋木 邦人
第11図
手続補正書
1、事件の表示
昭和63年特許願第151930号
2、発明の名称
薄膜磁気ディスク
3、補正をする者
事件との関係 特許出願人
住所 神奈川県横浜市神祭用区守屋町3丁目12番地ス
クと磁気ヘッド間の接触面積が低下し」と補正する。
(2)同、第6頁第17行の「そのjを「かつディスク
と磁気ヘッド間の接触面積が低下する」と補正する。FIG. 1 shows the thin Mli! of the present invention! 1 is a cross-sectional view of one embodiment of an air disk; FIG. DESCRIPTION OF SYMBOLS 1... Thin film magnetic disk, 2... Substrate, 3... Spherical ceramic (silica) fine particles, 4... Base metal layer,
5... Ferromagnetic metal film, 6... Protective layer, 7... Lubricating layer. Patent applicant: Japan Victor Co., Ltd. Representative: Japanese Figure 11 Procedural amendment 1, Indication of the case Patent application No. 151930 of 1988 2, Name of the invention Thin film magnetic disk 3, Person making the amendment Relationship to the case Patent application Address: 3-12 Moriya-cho, Kamisatsuyo-ku, Yokohama, Kanagawa Prefecture The contact area between the disk and the magnetic head has decreased.'' (2) Correct j on page 6, line 17 of the same document to ``and the contact area between the disk and the magnetic head decreases''.
Claims (1)
の球形セラミック微粒子をほぼ均一に分散させ、その上
に少なくとも強磁性金属膜及び保護層薄膜を形成して作
成したことを特徴とする薄膜磁気ディスク。A thin film characterized in that it is created by substantially uniformly dispersing spherical ceramic fine particles having the same particle size of 100 Å to 1000 Å on a non-magnetic substrate, and forming at least a ferromagnetic metal film and a protective layer thin film thereon. magnetic disk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15193088A JPH01319121A (en) | 1988-06-20 | 1988-06-20 | Thin film magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15193088A JPH01319121A (en) | 1988-06-20 | 1988-06-20 | Thin film magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01319121A true JPH01319121A (en) | 1989-12-25 |
Family
ID=15529308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15193088A Pending JPH01319121A (en) | 1988-06-20 | 1988-06-20 | Thin film magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01319121A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0542423A3 (en) * | 1991-12-11 | 1994-09-14 | Minnesota Mining & Mfg | Improved recording disk hub bond |
| KR100438802B1 (en) * | 1996-12-17 | 2004-08-31 | 삼성전자주식회사 | A quantum disk and a method for fabricating the same |
-
1988
- 1988-06-20 JP JP15193088A patent/JPH01319121A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0542423A3 (en) * | 1991-12-11 | 1994-09-14 | Minnesota Mining & Mfg | Improved recording disk hub bond |
| KR100438802B1 (en) * | 1996-12-17 | 2004-08-31 | 삼성전자주식회사 | A quantum disk and a method for fabricating the same |
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